TW200634114A - Coating solution for forming silica film - Google Patents

Coating solution for forming silica film

Info

Publication number
TW200634114A
TW200634114A TW094142311A TW94142311A TW200634114A TW 200634114 A TW200634114 A TW 200634114A TW 094142311 A TW094142311 A TW 094142311A TW 94142311 A TW94142311 A TW 94142311A TW 200634114 A TW200634114 A TW 200634114A
Authority
TW
Taiwan
Prior art keywords
coating solution
siloxane polymer
silica film
forming silica
basic compound
Prior art date
Application number
TW094142311A
Other languages
Chinese (zh)
Inventor
Masaru Takahama
Yoshinori Sakamoto
Original Assignee
Tokyo Ohka Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Ohka Kogyo Co Ltd filed Critical Tokyo Ohka Kogyo Co Ltd
Publication of TW200634114A publication Critical patent/TW200634114A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
    • C09D7/40—Additives
    • C09D7/60—Additives non-macromolecular
    • C09D7/63—Additives non-macromolecular organic
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/17—Amines; Quaternary ammonium compounds
    • C08K5/19—Quaternary ammonium compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/54—Silicon-containing compounds
    • C08K5/544—Silicon-containing compounds containing nitrogen
    • C08K5/5445—Silicon-containing compounds containing nitrogen containing at least one Si-N bond

Landscapes

  • Chemical & Material Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Paints Or Removers (AREA)
  • Formation Of Insulating Films (AREA)

Abstract

Disclosed is a coating liquid for forming a silica coating which is characterized by containing a siloxane polymer, a basic compound and an organic solvent. The basic compound is preferably composed of at least one substance selected from organic ammonium salts and silazanes, and is preferably contained in an amount of 0.2-10% by mass relative to the siloxane polymer. The siloxane polymer is preferably a reaction product obtained by hydrolyzing at least one compound selected from specific silane compounds.
TW094142311A 2004-12-24 2005-12-01 Coating solution for forming silica film TW200634114A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004374933A JP2006182811A (en) 2004-12-24 2004-12-24 Coating liquid for forming silica-based film

Publications (1)

Publication Number Publication Date
TW200634114A true TW200634114A (en) 2006-10-01

Family

ID=36601626

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094142311A TW200634114A (en) 2004-12-24 2005-12-01 Coating solution for forming silica film

Country Status (3)

Country Link
JP (1) JP2006182811A (en)
TW (1) TW200634114A (en)
WO (1) WO2006068026A1 (en)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8901268B2 (en) 2004-08-03 2014-12-02 Ahila Krishnamoorthy Compositions, layers and films for optoelectronic devices, methods of production and uses thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
JP6803842B2 (en) 2015-04-13 2020-12-23 ハネウェル・インターナショナル・インコーポレーテッドＨｏｎｅｙｗｅｌｌ Ｉｎｔｅｒｎａｔｉｏｎａｌ Ｉｎｃ． Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH03221577A (en) * 1990-01-26 1991-09-30 Sumitomo Chem Co Ltd Coating solution for insulating film formation
JP2893243B2 (en) * 1994-11-25 1999-05-17 昭和電工株式会社 Composition for semiconductor insulating film and planarizing film, and method for forming the film
JP3824334B2 (en) * 1995-08-07 2006-09-20 東京応化工業株式会社 Silica-based coating forming coating solution and coating forming method
US6576568B2 (en) * 2000-04-04 2003-06-10 Applied Materials, Inc. Ionic additives for extreme low dielectric constant chemical formulations
JP4572444B2 (en) * 2000-05-22 2010-11-04 Ｊｓｒ株式会社 Film forming composition, film forming method, and silica-based film
JP2002129103A (en) * 2000-10-23 2002-05-09 Jsr Corp Film-forming composition and insulating film-forming material
JP2003183575A (en) * 2001-12-20 2003-07-03 Mitsui Chemicals Inc Porous silica film-forming coating having excellent storage stability, method for producing coating, and method for producing porous silica film having regularly arranged uniform mesopore, porous silica film and its use
JP4110797B2 (en) * 2002-02-27 2008-07-02 日立化成工業株式会社 Composition for forming silica-based film, method for producing silica-based film, and electronic component
JP2004161875A (en) * 2002-11-13 2004-06-10 Shin Etsu Chem Co Ltd Composition for forming porous film, porous film and its manufacturing process, interlayer dielectrics and semiconductor device
JP3674041B2 (en) * 2003-03-13 2005-07-20 日立化成工業株式会社 Composition for forming silica-based film, silica-based film and method for forming the same, and electronic component including silica-based film
JP2004307694A (en) * 2003-04-09 2004-11-04 Shin Etsu Chem Co Ltd Composition for forming porous film, method for producing porous film, porous film, interlayer dielectric film and semiconductor device
JP2005139265A (en) * 2003-11-05 2005-06-02 Tokyo Ohka Kogyo Co Ltd Coating liquid for forming silica-based film
JP4447283B2 (en) * 2003-11-05 2010-04-07 東京応化工業株式会社 Coating liquid for silica-based film formation
JP2006045352A (en) * 2004-08-04 2006-02-16 Hitachi Chem Co Ltd Silica film-forming composition, silica film, its forming method and electronic part having silica film

Also Published As

Publication number Publication date
JP2006182811A (en) 2006-07-13
WO2006068026A1 (en) 2006-06-29

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