TW200632571A - Protection of surfaces exposed to charged particles - Google Patents
Protection of surfaces exposed to charged particlesInfo
- Publication number
- TW200632571A TW200632571A TW094137704A TW94137704A TW200632571A TW 200632571 A TW200632571 A TW 200632571A TW 094137704 A TW094137704 A TW 094137704A TW 94137704 A TW94137704 A TW 94137704A TW 200632571 A TW200632571 A TW 200632571A
- Authority
- TW
- Taiwan
- Prior art keywords
- mirror surface
- deposits
- charged particles
- euv radiation
- coating
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70983—Optical system protection, e.g. pellicles or removable covers for protection of mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
- G03F7/70933—Purge, e.g. exchanging fluid or gas to remove pollutants
Landscapes
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Atmospheric Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Toxicology (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Chemical Vapour Deposition (AREA)
- X-Ray Techniques (AREA)
- Physical Vapour Deposition (AREA)
- Optical Elements Other Than Lenses (AREA)
Abstract
A method is described of protecting a surface of a mirror located in a chamber exposed to extreme ultra violet (EUV) radiation. The EUV radiation is generated from a plasma, which emits both EUV radiation and electrically charged particles. Organic molecules are supplied to the chamber, which interact with the EUV radiation to form a coating of carbonaceous deposits on the mirror surface. The charged particles emitted from the plasma impact the deposits, causing the deposits to be sputtered from the mirror surface. By controlling at least one of the rate of deposition of deposits on the mirror surface and the rate of removal of the deposits from the mirror surface, the thickness of the coating can be actively controlled both to prevent impact of the charged particles directly on to the mirror surface and to minimise the loss of reflectivity of the mirror surface due to the formation of the coating. The method is also suitable for protecting the surface of a window used to transmit EUV radiation from the chamber.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GBGB0426036.0A GB0426036D0 (en) | 2004-11-26 | 2004-11-26 | Protection of surfaces exposed to charged particles |
Publications (1)
Publication Number | Publication Date |
---|---|
TW200632571A true TW200632571A (en) | 2006-09-16 |
Family
ID=33561420
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094137704A TW200632571A (en) | 2004-11-26 | 2005-10-27 | Protection of surfaces exposed to charged particles |
Country Status (7)
Country | Link |
---|---|
EP (1) | EP1815294A2 (en) |
JP (1) | JP2008522399A (en) |
KR (1) | KR20070084558A (en) |
CN (1) | CN101061435A (en) |
GB (1) | GB0426036D0 (en) |
TW (1) | TW200632571A (en) |
WO (1) | WO2006056730A2 (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI486715B (en) * | 2007-06-26 | 2015-06-01 | Advanced Micro Devices Inc | Hydrocarbon getter for lithographic exposure tools |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7279690B2 (en) * | 2005-03-31 | 2007-10-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
GB0605725D0 (en) * | 2006-03-23 | 2006-05-03 | Boc Group Plc | Spectral filter repair |
GB0614028D0 (en) * | 2006-07-14 | 2006-08-23 | Boc Group Plc | Method of controlling contamination of a surface |
KR101333032B1 (en) * | 2007-06-12 | 2013-11-26 | 코닌클리케 필립스 엔.브이. | Optical device and method of in situ treating an euv optical component to enhance a reduced reflectivity |
EP2297746A1 (en) | 2008-07-07 | 2011-03-23 | Philips Intellectual Property & Standards GmbH | Extreme uv radiation reflecting element comprising a sputter-resistant material |
US20220066071A1 (en) * | 2020-08-27 | 2022-03-03 | Kla Corporation | Protection of optical materials of optical components from radiation degradation |
CN114280893B (en) * | 2021-11-25 | 2023-08-01 | 中国科学院微电子研究所 | Pollution control system and method of photoetching machine and photoetching machine |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6533952B2 (en) * | 1999-06-08 | 2003-03-18 | Euv Llc | Mitigation of radiation induced surface contamination |
TW548524B (en) * | 2000-09-04 | 2003-08-21 | Asm Lithography Bv | Lithographic projection apparatus, device manufacturing method and device manufactured thereby |
-
2004
- 2004-11-26 GB GBGB0426036.0A patent/GB0426036D0/en not_active Ceased
-
2005
- 2005-10-11 JP JP2007542076A patent/JP2008522399A/en active Pending
- 2005-10-11 WO PCT/GB2005/003918 patent/WO2006056730A2/en not_active Application Discontinuation
- 2005-10-11 EP EP05791381A patent/EP1815294A2/en not_active Withdrawn
- 2005-10-11 KR KR1020077011862A patent/KR20070084558A/en not_active Application Discontinuation
- 2005-10-11 CN CNA2005800399152A patent/CN101061435A/en active Pending
- 2005-10-27 TW TW094137704A patent/TW200632571A/en unknown
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI486715B (en) * | 2007-06-26 | 2015-06-01 | Advanced Micro Devices Inc | Hydrocarbon getter for lithographic exposure tools |
Also Published As
Publication number | Publication date |
---|---|
CN101061435A (en) | 2007-10-24 |
KR20070084558A (en) | 2007-08-24 |
WO2006056730A3 (en) | 2007-03-22 |
GB0426036D0 (en) | 2004-12-29 |
EP1815294A2 (en) | 2007-08-08 |
WO2006056730A2 (en) | 2006-06-01 |
JP2008522399A (en) | 2008-06-26 |
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