TW200631975A - Polyurethane compound and manufacturing method, resin composition and cured article thereof - Google Patents

Polyurethane compound and manufacturing method, resin composition and cured article thereof

Info

Publication number
TW200631975A
TW200631975A TW095103432A TW95103432A TW200631975A TW 200631975 A TW200631975 A TW 200631975A TW 095103432 A TW095103432 A TW 095103432A TW 95103432 A TW95103432 A TW 95103432A TW 200631975 A TW200631975 A TW 200631975A
Authority
TW
Taiwan
Prior art keywords
resin composition
cured article
manufacturing
polyurethane compound
compounds
Prior art date
Application number
TW095103432A
Other languages
Chinese (zh)
Inventor
Toru Kurihashi
Ryutaro Tanaka
Hirokazu Karino
Original Assignee
Nippon Kayaku Kk
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Kayaku Kk filed Critical Nippon Kayaku Kk
Publication of TW200631975A publication Critical patent/TW200631975A/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C08F290/067—Polyurethanes; Polyureas
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/06—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material
    • B32B27/08—Layered products comprising a layer of synthetic resin as the main or only constituent of a layer, which is next to another layer of the same or of a different material of synthetic resin
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B27/00—Layered products comprising a layer of synthetic resin
    • B32B27/40—Layered products comprising a layer of synthetic resin comprising polyurethanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F290/00—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups
    • C08F290/02—Macromolecular compounds obtained by polymerising monomers on to polymers modified by introduction of aliphatic unsaturated end or side groups on to polymers modified by introduction of unsaturated end groups
    • C08F290/06—Polymers provided for in subclass C08G
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G18/00—Polymeric products of isocyanates or isothiocyanates
    • C08G18/06—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen
    • C08G18/70—Polymeric products of isocyanates or isothiocyanates with compounds having active hydrogen characterised by the isocyanates or isothiocyanates used
    • C08G18/72—Polyisocyanates or polyisothiocyanates
    • C08G18/73—Polyisocyanates or polyisothiocyanates acyclic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D175/00—Coating compositions based on polyureas or polyurethanes; Coating compositions based on derivatives of such polymers
    • C09D175/04—Polyurethanes
    • C09D175/14—Polyurethanes having carbon-to-carbon unsaturated bonds
    • C09D175/16—Polyurethanes having carbon-to-carbon unsaturated bonds having terminal carbon-to-carbon unsaturated bonds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/30—Properties of the layers or laminate having particular thermal properties
    • B32B2307/306—Resistant to heat
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/536—Hardness
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/50—Properties of the layers or laminate having particular mechanical properties
    • B32B2307/582—Tearability
    • B32B2307/5825—Tear resistant
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B32—LAYERED PRODUCTS
    • B32B—LAYERED PRODUCTS, i.e. PRODUCTS BUILT-UP OF STRATA OF FLAT OR NON-FLAT, e.g. CELLULAR OR HONEYCOMB, FORM
    • B32B2307/00—Properties of the layers or laminate
    • B32B2307/70—Other properties
    • B32B2307/714—Inert, i.e. inert to chemical degradation, corrosion

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polyurethanes Or Polyureas (AREA)

Abstract

The present invention is related to a novel reactive polyurethane compound (A) obtained by reacting a diol compound (a) having a number average molecular weight in a range of 300 to 5000, lysine triisocyanate (b) and an ethylenically unsaturated polyol compound (c); a high energy radiation curable resin composition comprising the aforesaid (A) and other reactive compounds (B) (for example, acrylic compounds or vinylic compounds); and a resin composition comprising the aforsaid (A), the aforesaid (B) and an aqueous alkali solution-soluble resin composition (C). The cured article, especially the coating on a substrate, formed from the high-energy-radiation-curable resin composition has high hardness, and excellent adhesion and flexibility.
TW095103432A 2005-02-01 2006-01-27 Polyurethane compound and manufacturing method, resin composition and cured article thereof TW200631975A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005025027 2005-02-01

Publications (1)

Publication Number Publication Date
TW200631975A true TW200631975A (en) 2006-09-16

Family

ID=36777160

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095103432A TW200631975A (en) 2005-02-01 2006-01-27 Polyurethane compound and manufacturing method, resin composition and cured article thereof

Country Status (3)

Country Link
JP (1) JP4953381B2 (en)
TW (1) TW200631975A (en)
WO (1) WO2006082776A1 (en)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20090142506A1 (en) * 2007-11-29 2009-06-04 Bayer Material Science Llc Ethylenically unsaturated polyisocyanate addition compounds based on lysine triisocyanate, their use in coating compositions and processes for their preparation
JP4807604B2 (en) * 2009-03-23 2011-11-02 Ｄｉｃ株式会社 Protective adhesive film, screen panel, and portable electronic terminal
WO2011034035A1 (en) * 2009-09-18 2011-03-24 Dic株式会社 Actinic-radiation-curable resin composition, and cured products and films thereof
JP5264691B2 (en) * 2009-12-14 2013-08-14 日本化薬株式会社 Photosensitive resin and photosensitive resin composition containing the same
JP2012013965A (en) * 2010-06-30 2012-01-19 Dainippon Printing Co Ltd Wavelength-selective reflection film
JP2012013964A (en) * 2010-06-30 2012-01-19 Dainippon Printing Co Ltd Wavelength-selective reflection film and manufacturing method thereof
JP5901213B2 (en) * 2011-10-07 2016-04-06 旭化成イーマテリアルズ株式会社 Photosensitive resin composition and photosensitive resin laminate
CN106458774B (en) * 2014-05-21 2019-06-04 三菱化学株式会社 Concrete surface coating, which is formed, uses laminate film, concrete producing building material and its manufacturing method
KR20200125965A (en) * 2018-02-22 2020-11-05 바스프 에스이 Polyurethane polymer material with excellent resistance to thermal deformation and elongation at break
JP7413762B2 (en) * 2019-12-23 2024-01-16 東洋インキＳｃホールディングス株式会社 Curable resin composition and cured film

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05320287A (en) * 1992-05-27 1993-12-03 Nippon Kayaku Co Ltd Resin composition and cured material thereof
JP2894167B2 (en) * 1992-09-10 1999-05-24 株式会社日本触媒 Ink composition for photocurable liquid solder resist
JPH10287718A (en) * 1997-02-13 1998-10-27 Jsr Corp Photocurable resin composition
JP2002226801A (en) * 2001-02-05 2002-08-14 Hitachi Chem Co Ltd Adhesive sheet, method for using the same, and semiconductor device
WO2002094904A1 (en) * 2001-05-17 2002-11-28 Nippon Kayaku Kabushiki Kaisha Photosensitive resin, photosensitive resin compositions containing the same and cured articles of the compositions

Also Published As

Publication number Publication date
JP4953381B2 (en) 2012-06-13
WO2006082776A1 (en) 2006-08-10
JPWO2006082776A1 (en) 2008-06-26

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