TW200629369A - Method of treating surface of photoresist layer and method of forming patterned photoresist layer - Google Patents
Method of treating surface of photoresist layer and method of forming patterned photoresist layerInfo
- Publication number
- TW200629369A TW200629369A TW094103932A TW94103932A TW200629369A TW 200629369 A TW200629369 A TW 200629369A TW 094103932 A TW094103932 A TW 094103932A TW 94103932 A TW94103932 A TW 94103932A TW 200629369 A TW200629369 A TW 200629369A
- Authority
- TW
- Taiwan
- Prior art keywords
- photoresist layer
- treating surface
- forming patterned
- patterned photoresist
- forming
- Prior art date
Links
Landscapes
- Drying Of Semiconductors (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Abstract
A method of treating the surface of a photoresist layer is described. After forming a patterned photoresist layer on a wafer, the photoresist layer is proceeded by a surface treating step including at least HBr or HI as reactive gas for forming a hard-skin on the surface of the photoresist layer. Wherein, the surface treating step and the etching step are in-situ.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94103932A TWI285915B (en) | 2005-02-05 | 2005-02-05 | Method of treating surface of photoresist layer and method of forming patterned photoresist layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW94103932A TWI285915B (en) | 2005-02-05 | 2005-02-05 | Method of treating surface of photoresist layer and method of forming patterned photoresist layer |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200629369A true TW200629369A (en) | 2006-08-16 |
TWI285915B TWI285915B (en) | 2007-08-21 |
Family
ID=39457400
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW94103932A TWI285915B (en) | 2005-02-05 | 2005-02-05 | Method of treating surface of photoresist layer and method of forming patterned photoresist layer |
Country Status (1)
Country | Link |
---|---|
TW (1) | TWI285915B (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111834204A (en) * | 2020-08-28 | 2020-10-27 | 上海华力微电子有限公司 | Method for manufacturing semiconductor structure |
-
2005
- 2005-02-05 TW TW94103932A patent/TWI285915B/en active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111834204A (en) * | 2020-08-28 | 2020-10-27 | 上海华力微电子有限公司 | Method for manufacturing semiconductor structure |
CN111834204B (en) * | 2020-08-28 | 2023-02-10 | 上海华力微电子有限公司 | Preparation method of semiconductor structure |
Also Published As
Publication number | Publication date |
---|---|
TWI285915B (en) | 2007-08-21 |
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