TW200628868A - Image inspection system for correcting focal position in autofocusing - Google Patents

Image inspection system for correcting focal position in autofocusing

Info

Publication number
TW200628868A
TW200628868A TW094145235A TW94145235A TW200628868A TW 200628868 A TW200628868 A TW 200628868A TW 094145235 A TW094145235 A TW 094145235A TW 94145235 A TW94145235 A TW 94145235A TW 200628868 A TW200628868 A TW 200628868A
Authority
TW
Taiwan
Prior art keywords
focal position
subject
target focal
image inspection
inspection system
Prior art date
Application number
TW094145235A
Other languages
English (en)
Other versions
TWI413823B (zh
Inventor
Shunsuke Kurata
Takahiro Komuro
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200628868A publication Critical patent/TW200628868A/zh
Application granted granted Critical
Publication of TWI413823B publication Critical patent/TWI413823B/zh

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/24—Base structure
    • G02B21/241—Devices for focusing
    • G02B21/245—Devices for focusing using auxiliary sources, detectors

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Microscoopes, Condenser (AREA)
  • Automatic Focus Adjustment (AREA)
  • Length Measuring Devices By Optical Means (AREA)
TW094145235A 2004-12-24 2005-12-20 影像檢查裝置 TWI413823B (zh)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004374522A JP2006184303A (ja) 2004-12-24 2004-12-24 画像検査装置

Publications (2)

Publication Number Publication Date
TW200628868A true TW200628868A (en) 2006-08-16
TWI413823B TWI413823B (zh) 2013-11-01

Family

ID=36737501

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094145235A TWI413823B (zh) 2004-12-24 2005-12-20 影像檢查裝置

Country Status (4)

Country Link
US (1) US7365295B2 (zh)
JP (1) JP2006184303A (zh)
CN (1) CN100570341C (zh)
TW (1) TWI413823B (zh)

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* Cited by examiner, † Cited by third party
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CN102478699A (zh) * 2010-11-23 2012-05-30 财团法人工业技术研究院 自动聚焦装置与其方法
TWI499754B (zh) * 2010-06-17 2015-09-11 Dmg Mori Seiki Co Ltd 位移偵測裝置

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JP5038191B2 (ja) * 2008-03-04 2012-10-03 有限会社共同設計企画 電子部品検査方法およびそれに用いられる装置
JP4553030B2 (ja) * 2008-04-11 2010-09-29 ソニー株式会社 自動焦点制御ユニット、電子機器、自動焦点制御方法
DE102008041290A1 (de) * 2008-08-15 2010-02-25 Carl Zeiss Surgical Gmbh Mikroskopieanordnung mit Fokusversatz
JP2010251415A (ja) * 2009-04-13 2010-11-04 Hitachi High-Technologies Corp 作業処理装置あるいは表示基板モジュール組立ラインまたは表示基板モジュール組立方法
US8592739B2 (en) * 2010-11-02 2013-11-26 Microsoft Corporation Detection of configuration changes of an optical element in an illumination system
TWI406025B (zh) 2010-11-25 2013-08-21 Ind Tech Res Inst 自動聚焦裝置及方法
DE102011055294B4 (de) * 2011-11-11 2013-11-07 Leica Microsystems Cms Gmbh Mikroskopische Einrichtung und Verfahren zur dreidimensionalen Lokalisierung von punktförmigen Objekten in einer Probe
US9594230B2 (en) 2011-12-23 2017-03-14 Rudolph Technologies, Inc. On-axis focus sensor and method
JP6014902B2 (ja) * 2012-12-06 2016-10-26 三星電子株式会社Ｓａｍｓｕｎｇ Ｅｌｅｃｔｒｏｎｉｃｓ Ｃｏ．，Ｌｔｄ． 焦点制御装置及びその方法
CN104237239B (zh) * 2013-06-09 2017-02-08 致茂电子(苏州)有限公司 半导体元件的瑕疵检测方法
CN103795933B (zh) * 2014-03-03 2018-02-23 联想(北京)有限公司 一种图像处理方法及电子设备
CN105628710A (zh) * 2014-11-28 2016-06-01 浙江金徕镀膜有限公司 物料检测系统及其检测方法
CN108121364B (zh) * 2017-12-15 2021-04-23 上海索广映像有限公司 一种图像传感器的位置调整系统及方法
CN108897153A (zh) * 2018-08-10 2018-11-27 宁波舜宇仪器有限公司 液晶面板导电粒子自动视觉检测装置
CN109361835B (zh) * 2018-10-25 2021-02-26 浙江大华技术股份有限公司 一种图像采集设备和图像处理方法
JP7160779B2 (ja) * 2019-10-03 2022-10-25 信越半導体株式会社 薄膜付ウェーハの膜厚分布の測定方法
CN111146105B (zh) * 2019-12-30 2023-09-26 上海集成电路研发中心有限公司 一种缺陷检查的装置和方法
CN111735768B (zh) * 2020-07-31 2020-12-08 武汉精立电子技术有限公司 一种Micro LED屏幕的显微成像方法及装置
CN113554687B (zh) * 2021-09-18 2021-12-07 四川赛狄信息技术股份公司 无人机弹载发射偏移校准控制方法、系统、终端及介质

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JP2003185913A (ja) * 2001-12-21 2003-07-03 Nikon Corp 焦点検出装置、焦点合わせ装置、およびそれを備えた顕微鏡
JP3967935B2 (ja) * 2002-02-25 2007-08-29 株式会社日立製作所 合わせ精度計測装置及びその方法
JP2003270524A (ja) * 2002-03-19 2003-09-25 Nikon Corp 焦点検出装置およびこれを備えた顕微鏡、および、焦点検出方法
JP4121849B2 (ja) * 2002-12-26 2008-07-23 オリンパス株式会社 欠陥検査装置及び欠陥検査方法
JP4409183B2 (ja) * 2003-02-10 2010-02-03 オリンパス株式会社 検査装置
JP4652667B2 (ja) * 2003-02-13 2011-03-16 キヤノン株式会社 面位置計測方法及び走査型露光装置

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI499754B (zh) * 2010-06-17 2015-09-11 Dmg Mori Seiki Co Ltd 位移偵測裝置
CN102478699A (zh) * 2010-11-23 2012-05-30 财团法人工业技术研究院 自动聚焦装置与其方法
CN102478699B (zh) * 2010-11-23 2013-09-25 财团法人工业技术研究院 自动聚焦装置与其方法

Also Published As

Publication number Publication date
US7365295B2 (en) 2008-04-29
CN1800836A (zh) 2006-07-12
TWI413823B (zh) 2013-11-01
CN100570341C (zh) 2009-12-16
US20060249651A1 (en) 2006-11-09
JP2006184303A (ja) 2006-07-13

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Legal Events

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