TW200624597A - Coating installation suitable for clean room conditions - Google Patents

Coating installation suitable for clean room conditions

Info

Publication number
TW200624597A
TW200624597A TW094124512A TW94124512A TW200624597A TW 200624597 A TW200624597 A TW 200624597A TW 094124512 A TW094124512 A TW 094124512A TW 94124512 A TW94124512 A TW 94124512A TW 200624597 A TW200624597 A TW 200624597A
Authority
TW
Taiwan
Prior art keywords
ceramic
coating installation
clean room
vacuum chamber
room conditions
Prior art date
Application number
TW094124512A
Other languages
English (en)
Inventor
Dietrich Mund
Wolfgang Fukarek
Jurgen Leib
Original Assignee
Schott Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Schott Ag filed Critical Schott Ag
Publication of TW200624597A publication Critical patent/TW200624597A/zh

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32458—Vessel
    • H01J37/32477—Vessel characterised by the means for protecting vessels or internal parts, e.g. coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
TW094124512A 2004-07-21 2005-07-20 Coating installation suitable for clean room conditions TW200624597A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102004035335A DE102004035335A1 (de) 2004-07-21 2004-07-21 Reinraumfähige Beschichtungsanlage

Publications (1)

Publication Number Publication Date
TW200624597A true TW200624597A (en) 2006-07-16

Family

ID=35058237

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094124512A TW200624597A (en) 2004-07-21 2005-07-20 Coating installation suitable for clean room conditions

Country Status (6)

Country Link
US (1) US20080053373A1 (zh)
EP (1) EP1778889A1 (zh)
JP (1) JP2008506848A (zh)
DE (1) DE102004035335A1 (zh)
TW (1) TW200624597A (zh)
WO (1) WO2006008060A1 (zh)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005056324A1 (de) * 2005-11-25 2007-06-06 Aixtron Ag CVD-Reaktor mit auswechselbarer Prozesskammerdecke
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
ES2513866T3 (es) 2009-05-13 2014-10-27 Sio2 Medical Products, Inc. Revestimiento e inspección de recipientes
DE102009025971A1 (de) * 2009-06-15 2010-12-16 Aixtron Ag Verfahren zum Einrichten eines Epitaxie-Reaktors
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
WO2014071061A1 (en) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
EP2925903B1 (en) 2012-11-30 2022-04-13 Si02 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2971228B1 (en) 2013-03-11 2023-06-21 Si02 Medical Products, Inc. Coated packaging
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
DE102013110802A1 (de) * 2013-09-30 2015-04-02 Von Ardenne Gmbh Vakuumbeschichtungsvorrichtung
EP3693493A1 (en) 2014-03-28 2020-08-12 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
US9236354B2 (en) * 2014-04-21 2016-01-12 Xilinx, Inc. Integrated circuit package with thermal neutron shielding
CN116982977A (zh) 2015-08-18 2023-11-03 Sio2医药产品公司 具有低氧气传输速率的药物和其他包装

Family Cites Families (12)

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Publication number Priority date Publication date Assignee Title
US4104418A (en) * 1975-09-23 1978-08-01 International Business Machines Corporation Glass layer fabrication
JPS58221275A (ja) * 1982-06-16 1983-12-22 Anelva Corp スパツタリング装置
JPH0387358A (ja) * 1989-06-02 1991-04-12 Toshiba Corp 成膜装置と成膜方法およびスパッタ装置
US5307568A (en) * 1991-09-09 1994-05-03 Tokyo Electron Limited Gas supply system
JPH0936198A (ja) * 1995-07-19 1997-02-07 Hitachi Ltd 真空処理装置およびそれを用いた半導体製造ライン
US6514390B1 (en) * 1996-10-17 2003-02-04 Applied Materials, Inc. Method to eliminate coil sputtering in an ICP source
SG54602A1 (en) * 1996-11-26 1998-11-16 Applied Materials Inc Coated deposition chamber equipment
GB9713390D0 (en) * 1997-06-26 1997-08-27 Trikon Equip Ltd Apparatus for processing workpieces
US20020090464A1 (en) * 2000-11-28 2002-07-11 Mingwei Jiang Sputter chamber shield
US20030143837A1 (en) * 2002-01-28 2003-07-31 Applied Materials, Inc. Method of depositing a catalytic layer
US20030188685A1 (en) * 2002-04-08 2003-10-09 Applied Materials, Inc. Laser drilled surfaces for substrate processing chambers
US7780786B2 (en) * 2002-11-28 2010-08-24 Tokyo Electron Limited Internal member of a plasma processing vessel

Also Published As

Publication number Publication date
JP2008506848A (ja) 2008-03-06
EP1778889A1 (de) 2007-05-02
WO2006008060A1 (de) 2006-01-26
DE102004035335A1 (de) 2006-02-16
US20080053373A1 (en) 2008-03-06

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