TW200623300A - Method and system for dynamically adjusting metrology sampling based upon available metrology capacity - Google Patents
Method and system for dynamically adjusting metrology sampling based upon available metrology capacityInfo
- Publication number
- TW200623300A TW200623300A TW094131773A TW94131773A TW200623300A TW 200623300 A TW200623300 A TW 200623300A TW 094131773 A TW094131773 A TW 094131773A TW 94131773 A TW94131773 A TW 94131773A TW 200623300 A TW200623300 A TW 200623300A
- Authority
- TW
- Taiwan
- Prior art keywords
- metrology
- capacity
- available
- dynamically adjusting
- sampling based
- Prior art date
Links
- 238000005070 sampling Methods 0.000 title abstract 4
- 238000000034 method Methods 0.000 title abstract 3
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
- H01L22/20—Sequence of activities consisting of a plurality of measurements, corrections, marking or sorting steps
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L22/00—Testing or measuring during manufacture or treatment; Reliability measurements, i.e. testing of parts without further processing to modify the parts as such; Structural arrangements therefor
-
- G—PHYSICS
- G05—CONTROLLING; REGULATING
- G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
- G05B19/00—Programme-control systems
- G05B19/02—Programme-control systems electric
- G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
- G05B19/41865—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by job scheduling, process planning, material flow
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Quality & Reliability (AREA)
- Automation & Control Theory (AREA)
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- General Engineering & Computer Science (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- General Factory Administration (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/958,891 US7076321B2 (en) | 2004-10-05 | 2004-10-05 | Method and system for dynamically adjusting metrology sampling based upon available metrology capacity |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200623300A true TW200623300A (en) | 2006-07-01 |
TWI369749B TWI369749B (en) | 2012-08-01 |
Family
ID=34979412
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094131773A TWI369749B (en) | 2004-10-05 | 2005-09-15 | Method and system for dynamically adjusting metrology sampling based upon available metrology capacity |
Country Status (8)
Country | Link |
---|---|
US (1) | US7076321B2 (zh) |
JP (1) | JP2008516447A (zh) |
KR (1) | KR20070061868A (zh) |
CN (1) | CN101032013B (zh) |
DE (1) | DE112005002474B4 (zh) |
GB (1) | GB2434882B (zh) |
TW (1) | TWI369749B (zh) |
WO (1) | WO2006041543A1 (zh) |
Families Citing this family (21)
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US7296103B1 (en) * | 2004-10-05 | 2007-11-13 | Advanced Micro Devices, Inc. | Method and system for dynamically selecting wafer lots for metrology processing |
US7305320B2 (en) | 2006-02-15 | 2007-12-04 | International Business Machines Corporation | Metrology tool recipe validator using best known methods |
US7257502B1 (en) * | 2006-02-28 | 2007-08-14 | Advanced Micro Devices, Inc. | Determining metrology sampling decisions based on fabrication simulation |
DE102008023906B4 (de) | 2008-03-31 | 2021-12-30 | Taiwan Semiconductor Manufacturing Company, Ltd. | Verfahren und System zum automatischen Erzeugen von Durchsatzmodellen für Halbleiteranlagen |
US8170704B2 (en) | 2008-03-31 | 2012-05-01 | Globalfoundries Inc. | Method and system for automatic generation of throughput models for semiconductor tools |
US8559001B2 (en) | 2010-01-11 | 2013-10-15 | Kla-Tencor Corporation | Inspection guided overlay metrology |
US9228943B2 (en) | 2011-10-27 | 2016-01-05 | Kla-Tencor Corporation | Dynamically adjustable semiconductor metrology system |
NL2009853A (en) | 2011-12-23 | 2013-06-26 | Asml Netherlands Bv | Methods and apparatus for measuring a property of a substrate. |
DE102012200066B4 (de) * | 2012-01-03 | 2020-09-03 | Endress + Hauser Process Solutions Ag | Verfahren und Einrichtung zur Visualisierung von Informationen in einer Prozessanlage |
US9816370B2 (en) * | 2012-09-19 | 2017-11-14 | Honeywell International Inc. | System and method for optimizing an operation of a sensor used with wellbore equipment |
CN102945030B (zh) * | 2012-11-02 | 2015-04-01 | 上海华力微电子有限公司 | 一种有效控制晶圆生产过程中生产周期失控的方法 |
US9760020B2 (en) | 2012-11-21 | 2017-09-12 | Kla-Tencor Corporation | In-situ metrology |
US10133263B1 (en) | 2014-08-18 | 2018-11-20 | Kla-Tencor Corporation | Process condition based dynamic defect inspection |
TWI539298B (zh) * | 2015-05-27 | 2016-06-21 | 國立成功大學 | 具取樣率決定機制的量測抽樣方法 與其電腦程式產品 |
US10754260B2 (en) | 2015-06-18 | 2020-08-25 | Kla-Tencor Corporation | Method and system for process control with flexible sampling |
CN108028210B (zh) * | 2015-09-21 | 2022-07-12 | 科磊股份有限公司 | 用于使用灵活取样的过程控制的方法及系统 |
KR102209725B1 (ko) * | 2015-11-11 | 2021-02-02 | 에이에스엠엘 네델란즈 비.브이. | 메트롤로지 시스템의 성능을 예측하는 장치 및 방법 |
CN108931336A (zh) * | 2017-05-23 | 2018-12-04 | 北京航天计量测试技术研究所 | 一种高稳定性压力控制算法 |
KR101995112B1 (ko) * | 2017-06-14 | 2019-09-30 | 에스케이 주식회사 | 장비신뢰지수에 기초한 Lot 리스크 스코어 기반의 동적 Lot 계측 제어방법 및 시스템 |
CN115083936A (zh) * | 2021-03-10 | 2022-09-20 | 长鑫存储技术有限公司 | 采样量测方法、系统、计算机设备及存储介质 |
US12000882B2 (en) | 2021-03-10 | 2024-06-04 | Changxin Memory Technologies, Inc. | Sampling measurement method, system, computer device and storage medium |
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US6868299B2 (en) * | 2003-04-15 | 2005-03-15 | I2 Technologies Us, Inc. | Generating a sampling plan for testing generated content |
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-
2004
- 2004-10-05 US US10/958,891 patent/US7076321B2/en not_active Expired - Fee Related
-
2005
- 2005-06-23 KR KR1020077008344A patent/KR20070061868A/ko not_active Application Discontinuation
- 2005-06-23 DE DE112005002474.1T patent/DE112005002474B4/de not_active Expired - Fee Related
- 2005-06-23 GB GB0705693A patent/GB2434882B/en not_active Expired - Fee Related
- 2005-06-23 JP JP2007535669A patent/JP2008516447A/ja active Pending
- 2005-06-23 CN CN2005800332932A patent/CN101032013B/zh not_active Expired - Fee Related
- 2005-06-23 WO PCT/US2005/022424 patent/WO2006041543A1/en active Application Filing
- 2005-09-15 TW TW094131773A patent/TWI369749B/zh not_active IP Right Cessation
Also Published As
Publication number | Publication date |
---|---|
KR20070061868A (ko) | 2007-06-14 |
JP2008516447A (ja) | 2008-05-15 |
US7076321B2 (en) | 2006-07-11 |
GB2434882A (en) | 2007-08-08 |
DE112005002474B4 (de) | 2017-02-09 |
GB0705693D0 (en) | 2007-05-02 |
WO2006041543A1 (en) | 2006-04-20 |
CN101032013A (zh) | 2007-09-05 |
US20060074503A1 (en) | 2006-04-06 |
GB2434882B (en) | 2009-01-21 |
DE112005002474T5 (de) | 2007-09-06 |
TWI369749B (en) | 2012-08-01 |
CN101032013B (zh) | 2011-07-06 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MM4A | Annulment or lapse of patent due to non-payment of fees |