TW200619853A - Sublayer coating-forming composition containing metal oxide for lithography - Google Patents
Sublayer coating-forming composition containing metal oxide for lithographyInfo
- Publication number
- TW200619853A TW200619853A TW094135723A TW94135723A TW200619853A TW 200619853 A TW200619853 A TW 200619853A TW 094135723 A TW094135723 A TW 094135723A TW 94135723 A TW94135723 A TW 94135723A TW 200619853 A TW200619853 A TW 200619853A
- Authority
- TW
- Taiwan
- Prior art keywords
- lithography
- metal oxide
- forming composition
- composition containing
- containing metal
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/11—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having cover layers or intermediate layers, e.g. subbing layers
Abstract
Disclosed is a bottom coating having a high content of an inorganic substance (hard mask) which is used in a lithography process for manufacturing a semiconductor device, is free from the intermixing with a photoresist and can be formed by the spin coating method, and a bottom coating forming composition for forming said bottom coating. A composition for forming a bottom coating for lithography which comprises a metal oxide obtainable through the hydrolysis reaction of an oxymetal compound such as zirconium alkoxide, and a solvent.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004299716 | 2004-10-14 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200619853A true TW200619853A (en) | 2006-06-16 |
TWI370329B TWI370329B (en) | 2012-08-11 |
Family
ID=36148252
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW094135723A TWI370329B (en) | 2004-10-14 | 2005-10-13 | Sublayer coating-forming composition containing metal oxide for lithography |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP4793583B2 (en) |
TW (1) | TWI370329B (en) |
WO (1) | WO2006040956A1 (en) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4793592B2 (en) | 2007-11-22 | 2011-10-12 | 信越化学工業株式会社 | Metal oxide-containing film forming composition, metal oxide-containing film, metal oxide-containing film-forming substrate, and pattern forming method using the same |
JP5015892B2 (en) | 2008-10-02 | 2012-08-29 | 信越化学工業株式会社 | Silicon-containing film-forming composition, silicon-containing film-forming substrate, and pattern forming method |
JP5015891B2 (en) | 2008-10-02 | 2012-08-29 | 信越化学工業株式会社 | Metal oxide-containing film forming composition, metal oxide-containing film forming substrate, and pattern forming method |
WO2012133597A1 (en) * | 2011-03-30 | 2012-10-04 | Jsr株式会社 | Multilayer resist process pattern forming method and inorganic film forming composition for multilayer resist process |
JP5970933B2 (en) * | 2011-09-15 | 2016-08-17 | Jsr株式会社 | Pattern formation method |
JP5756134B2 (en) | 2013-01-08 | 2015-07-29 | 信越化学工業株式会社 | Metal oxide-containing film forming composition and pattern forming method |
KR101674989B1 (en) | 2013-05-21 | 2016-11-22 | 제일모직 주식회사 | Resist underlayer composition, method of forming patterns and semiconductor integrated circuit device including the patterns |
JP6288090B2 (en) | 2013-07-24 | 2018-03-07 | Jsr株式会社 | Pattern formation method |
JP6327484B2 (en) * | 2013-10-07 | 2018-05-23 | 日産化学工業株式会社 | Metal-containing resist underlayer film forming composition containing polyacid |
JP6460899B2 (en) * | 2015-04-24 | 2019-01-30 | 積水化学工業株式会社 | Adhesive for semiconductor bonding |
WO2023136260A1 (en) * | 2022-01-14 | 2023-07-20 | Jsr株式会社 | Method for producing semiconductor substrate, method for forming resist underlayer film, and cleaning fluid |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CA1184321A (en) * | 1981-06-30 | 1985-03-19 | John C. Marinace | Adhesion of a photoresist to a substrate |
US4826564A (en) * | 1987-10-30 | 1989-05-02 | International Business Machines Corporation | Method of selective reactive ion etching of substrates |
JP2000010293A (en) * | 1998-06-17 | 2000-01-14 | Jsr Corp | Composition for forming antireflection film and antireflection film |
JP2000275820A (en) * | 1999-03-24 | 2000-10-06 | Dainippon Ink & Chem Inc | Original plate of planographic printing plate and manufacture of printing plate using same |
US6890448B2 (en) * | 1999-06-11 | 2005-05-10 | Shipley Company, L.L.C. | Antireflective hard mask compositions |
JP4320883B2 (en) * | 1999-12-13 | 2009-08-26 | Jsr株式会社 | Composition for resist underlayer film |
JP2002198495A (en) * | 2000-12-25 | 2002-07-12 | Sony Corp | Semiconductor device and manufacturing method therefor |
JP2002343767A (en) * | 2001-05-14 | 2002-11-29 | Toshiba Corp | Pattern forming method |
JP3934996B2 (en) * | 2001-06-11 | 2007-06-20 | 富士フイルム株式会社 | Support for lithographic printing plate |
US6740469B2 (en) * | 2002-06-25 | 2004-05-25 | Brewer Science Inc. | Developer-soluble metal alkoxide coatings for microelectronic applications |
-
2005
- 2005-10-03 WO PCT/JP2005/018294 patent/WO2006040956A1/en active Application Filing
- 2005-10-03 JP JP2006540877A patent/JP4793583B2/en active Active
- 2005-10-13 TW TW094135723A patent/TWI370329B/en active
Also Published As
Publication number | Publication date |
---|---|
TWI370329B (en) | 2012-08-11 |
JPWO2006040956A1 (en) | 2008-05-15 |
JP4793583B2 (en) | 2011-10-12 |
WO2006040956A1 (en) | 2006-04-20 |
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