TW200618918A - Substrate working device and substrate working method - Google Patents

Substrate working device and substrate working method

Info

Publication number
TW200618918A
TW200618918A TW094126443A TW94126443A TW200618918A TW 200618918 A TW200618918 A TW 200618918A TW 094126443 A TW094126443 A TW 094126443A TW 94126443 A TW94126443 A TW 94126443A TW 200618918 A TW200618918 A TW 200618918A
Authority
TW
Taiwan
Prior art keywords
substrate
laser beams
substrate working
laser
sublimed
Prior art date
Application number
TW094126443A
Other languages
Chinese (zh)
Other versions
TWI282295B (en
Inventor
Shin Hotta
Original Assignee
Sony Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sony Corp filed Critical Sony Corp
Publication of TW200618918A publication Critical patent/TW200618918A/en
Application granted granted Critical
Publication of TWI282295B publication Critical patent/TWI282295B/en

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08Devices involving relative movement between laser beam and workpiece
    • B23K26/10Devices involving relative movement between laser beam and workpiece using a fixed support, i.e. involving moving the laser beam
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/02Positioning or observing the workpiece, e.g. with respect to the point of impact; Aligning, aiming or focusing the laser beam
    • B23K26/03Observing, e.g. monitoring, the workpiece
    • B23K26/032Observing, e.g. monitoring, the workpiece using optical means
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00Working by laser beam, e.g. welding, cutting or boring
    • B23K26/50Working by transmitting the laser beam through or within the workpiece
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B23MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23KSOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K37/00Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups
    • B23K37/04Auxiliary devices or processes, not specially adapted to a procedure covered by only one of the preceding main groups for holding or positioning work
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P40/00Technologies relating to the processing of minerals
    • Y02P40/50Glass production, e.g. reusing waste heat during processing or shaping
    • Y02P40/57Improving the yield, e-g- reduction of reject rates

Landscapes

  • Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • Laser Beam Processing (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
  • Liquid Crystal (AREA)
  • Processing Of Stones Or Stones Resemblance Materials (AREA)

Abstract

To provide a substrate working device and a substrate working method for forming a scribe line to stably divide a substrate. Laser beams emitted from a laser beam source 2 are parallelized by a beam shaping optical system 3, and the power of the laser beams is regulated. The deflection direction is regulated by a 1/2 wavelength plate 4, and the laser beams are condensed on a substrate 7 by a condensing optical system 5. By condensing the laser beams on the substrate 7, multiple photon absorption occurs inside the substrate 7, and glass in the ionized zone formed by the multiple photon absorption is sublimed. Since the substrate 7 is relatively moved to the laser beams by an XY-stage 8, a sublimed portion forming a groove forms a scribe line. The rotation of the 1/2 wavelength plate 4 is controlled so that the deflection direction of the laser beams becomes constant in the laser beam moving direction with respect to the substrate 7.
TW094126443A 2004-08-27 2005-08-03 Substrate working device and substrate working method TWI282295B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004248432A JP2006061954A (en) 2004-08-27 2004-08-27 Substrate working device and substrate working method

Publications (2)

Publication Number Publication Date
TW200618918A true TW200618918A (en) 2006-06-16
TWI282295B TWI282295B (en) 2007-06-11

Family

ID=36092513

Family Applications (1)

Application Number Title Priority Date Filing Date
TW094126443A TWI282295B (en) 2004-08-27 2005-08-03 Substrate working device and substrate working method

Country Status (4)

Country Link
JP (1) JP2006061954A (en)
KR (1) KR20060050283A (en)
CN (1) CN1739903A (en)
TW (1) TWI282295B (en)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9138913B2 (en) 2005-09-08 2015-09-22 Imra America, Inc. Transparent material processing with an ultrashort pulse laser
KR100746340B1 (en) * 2006-03-17 2007-08-03 한국광기술원 Real-time and high-precision measurement apparatus by analyzing the fabry-perot interference pattern
JP5154838B2 (en) * 2007-05-31 2013-02-27 株式会社ディスコ Laser processing equipment
CN101515096B (en) * 2008-02-22 2011-02-09 中华映管股份有限公司 Method for manufacturing substrate
JP2011218398A (en) * 2010-04-08 2011-11-04 Fujikura Ltd Method for forming microstructure, laser irradiation device, and substrate
CN102405426B (en) * 2010-05-28 2014-07-09 Lg化学株式会社 Method for manufacturing polarizing plate
JP2012040573A (en) * 2010-08-16 2012-03-01 Fuji Electric Co Ltd Microprocessing method of sample
JP6034097B2 (en) * 2012-08-28 2016-11-30 株式会社ディスコ Laser processing equipment
CN103785947B (en) * 2014-01-27 2018-01-23 英诺激光科技股份有限公司 A kind of laser cutting machine that can improve LED chip splitting yield
KR101581787B1 (en) 2014-06-02 2015-12-31 주식회사 크린? Lift goods case and pull out method using lift goods case
DE112017003592T5 (en) * 2016-07-15 2019-03-28 TeraDiode, Inc. Material processing using a laser with variable beam shape
CN108581182A (en) * 2018-04-28 2018-09-28 大族激光科技产业集团股份有限公司 Laser processing device and method

Also Published As

Publication number Publication date
JP2006061954A (en) 2006-03-09
TWI282295B (en) 2007-06-11
KR20060050283A (en) 2006-05-19
CN1739903A (en) 2006-03-01

Similar Documents

Publication Publication Date Title
TW200618918A (en) Substrate working device and substrate working method
WO2007051537A3 (en) High power euv lamp system
TW200603440A (en) Laser irradiation method and method for manufacturing semiconductor device using the same
TW200600479A (en) Apparatus for cutting nonmetallic substrate and method thereof
EP2260967A3 (en) Arrangement and method for forming one or more separated scores in a surface of a substrate
WO2008027158A3 (en) Source material collection unit for a laser produced plasma euv light source
JP2016517546A (en) Phased array steering for laser beam positioning system
TW200630179A (en) Optical illumination system for creating a line beam
MY157663A (en) Laser irradiating device, laser irradiating method and manufacturing method of semiconductor device
DE60205360D1 (en) DUAL LASER CUTTING OF DISCS
WO2007041444A3 (en) Electron beam column for writing shaped electron beams
TW200727324A (en) Technique for ion beam angle spread control
TW200610241A (en) Semiconductor-laser component, optical device for a semiconductor-laser component and method for the production of an optical device
WO2005057669A3 (en) Irradiation apparatus
TW200715849A (en) Method for producing transmissive screen, apparatus for producing transmissive screen, and transmissive screen
TW200500822A (en) Lithographic apparatus and device manufacturing method
WO2010011260A3 (en) Shearing radiation beam for imaging printing media
MY145353A (en) Laser machining apparatus
WO2023110816A3 (en) Method and device for producing at least one hollow structure, mirror, euv lithography system, fluid supply device and method for supplying a fluid
WO2005064411A3 (en) Lithographic apparatus and with a debris-mitigation system
TW200519433A (en) Waveguide laser light source suitable for projection displays
EP1732086A4 (en) Soft x-ray processing device and soft x-ray processing method
AU2001248206A1 (en) Device for inscribing objects using laser beams
AU1712301A (en) Method for obtaining an extreme ultraviolet radiation source, radiation source and use in lithography
CN103848392A (en) Method for manufacturing large-area black silicon with controllable microstructure period

Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees