TW200603194A - Plasma generator, plasma processing apparatus using same and electronic device - Google Patents
Plasma generator, plasma processing apparatus using same and electronic deviceInfo
- Publication number
- TW200603194A TW200603194A TW094117017A TW94117017A TW200603194A TW 200603194 A TW200603194 A TW 200603194A TW 094117017 A TW094117017 A TW 094117017A TW 94117017 A TW94117017 A TW 94117017A TW 200603194 A TW200603194 A TW 200603194A
- Authority
- TW
- Taiwan
- Prior art keywords
- plasma
- plasma chamber
- electronic device
- processing apparatus
- same
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/32458—Vessel
- H01J37/32522—Temperature
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Plasma Technology (AREA)
- Electron Sources, Ion Sources (AREA)
Abstract
Disclosed is a plasma generator which is capable of efficiently generating both molecular ions and atomic ions by using a single ion source. By providing a channel for passing a refrigerant through and a heater for heating in a part of or throughout the wall defining the plasma chamber of the plasma source, or by providing a temperature-controlling plate in the vicinity of the plasma chamber in such a manner that the temperature-controlling plate is close to or in close contact with the plasma chamber, the gas temperature within the plasma chamber is controlled in situ, and thus there can be highly efficiently generated different ion species such as molecular ions and atomic ions without taking out the plasma source.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004183111A JP2007266022A (en) | 2004-05-25 | 2004-05-25 | Plasma generator, plasma treating apparatus using same, and electronic apparatus |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| TW200603194A true TW200603194A (en) | 2006-01-16 |
Family
ID=35451139
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW094117017A TW200603194A (en) | 2004-05-25 | 2005-05-25 | Plasma generator, plasma processing apparatus using same and electronic device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2007266022A (en) |
| TW (1) | TW200603194A (en) |
| WO (1) | WO2005117080A1 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7414602B2 (en) | 2020-03-18 | 2024-01-16 | 住友重機械イオンテクノロジー株式会社 | ion generator |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6479828B2 (en) * | 2000-12-15 | 2002-11-12 | Axcelis Tech Inc | Method and system for icosaborane implantation |
| JP4037149B2 (en) * | 2002-04-05 | 2008-01-23 | 株式会社半導体エネルギー研究所 | Ion doping apparatus and ion doping method |
-
2004
- 2004-05-25 JP JP2004183111A patent/JP2007266022A/en active Pending
-
2005
- 2005-05-24 WO PCT/JP2005/009459 patent/WO2005117080A1/en active Application Filing
- 2005-05-25 TW TW094117017A patent/TW200603194A/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2005117080A1 (en) | 2005-12-08 |
| JP2007266022A (en) | 2007-10-11 |
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