TW200600615A - Single workpiece processing chamber - Google Patents

Single workpiece processing chamber

Info

Publication number
TW200600615A
TW200600615A TW094107037A TW94107037A TW200600615A TW 200600615 A TW200600615 A TW 200600615A TW 094107037 A TW094107037 A TW 094107037A TW 94107037 A TW94107037 A TW 94107037A TW 200600615 A TW200600615 A TW 200600615A
Authority
TW
Taiwan
Prior art keywords
processing chamber
workpiece processing
single workpiece
process chamber
rim
Prior art date
Application number
TW094107037A
Other languages
English (en)
Other versions
TWI375736B (en
Inventor
Daniel J Woodruff
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semitool Inc filed Critical Semitool Inc
Publication of TW200600615A publication Critical patent/TW200600615A/zh
Application granted granted Critical
Publication of TWI375736B publication Critical patent/TWI375736B/zh

Links

Landscapes

  • Cleaning Or Drying Semiconductors (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
TW94107037A 2004-03-12 2005-03-08 Single workpiece processing chamber TWI375736B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US55264204P 2004-03-12 2004-03-12

Publications (2)

Publication Number Publication Date
TW200600615A true TW200600615A (en) 2006-01-01
TWI375736B TWI375736B (en) 2012-11-01

Family

ID=38045552

Family Applications (1)

Application Number Title Priority Date Filing Date
TW94107037A TWI375736B (en) 2004-03-12 2005-03-08 Single workpiece processing chamber

Country Status (2)

Country Link
CN (1) CN100413023C (zh)
TW (1) TWI375736B (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI479560B (zh) * 2011-07-29 2015-04-01 Wuxi Huaying Microelectronics Technology Co Ltd 多腔室半導體處理裝置

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10283389B2 (en) * 2011-07-29 2019-05-07 Wuxi Huaying Microelectronics Technology Co., Ltd Adjustable semiconductor processing device and control method thereof
CN110875209B (zh) * 2018-08-29 2024-03-19 紫石能源有限公司 处理装置
CN110875210B (zh) * 2018-08-29 2024-03-19 紫石能源有限公司 处理装置
WO2020042395A1 (zh) * 2018-08-29 2020-03-05 深圳市永盛隆科技有限公司 处理装置
CN110875211B (zh) * 2018-08-29 2024-03-15 紫石能源有限公司 处理装置

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6352623B1 (en) * 1999-12-17 2002-03-05 Nutool, Inc. Vertically configured chamber used for multiple processes
CN1205652C (zh) * 2001-06-01 2005-06-08 S.E.S.株式会社 基板清洗系统
JP2003168673A (ja) * 2001-12-03 2003-06-13 Rix Corp ウエーハの洗浄および乾燥槽
JP2003251255A (ja) * 2002-03-01 2003-09-09 Sumitomo Precision Prod Co Ltd 基板処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI479560B (zh) * 2011-07-29 2015-04-01 Wuxi Huaying Microelectronics Technology Co Ltd 多腔室半導體處理裝置

Also Published As

Publication number Publication date
CN1947220A (zh) 2007-04-11
TWI375736B (en) 2012-11-01
CN100413023C (zh) 2008-08-20

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees