ATE438923T1 - Einzel-arbeitsstück-verarbeitungskammer - Google Patents

Einzel-arbeitsstück-verarbeitungskammer

Info

Publication number
ATE438923T1
ATE438923T1 AT05725306T AT05725306T ATE438923T1 AT E438923 T1 ATE438923 T1 AT E438923T1 AT 05725306 T AT05725306 T AT 05725306T AT 05725306 T AT05725306 T AT 05725306T AT E438923 T1 ATE438923 T1 AT E438923T1
Authority
AT
Austria
Prior art keywords
processing chamber
workpiece processing
single workpiece
process chamber
rim
Prior art date
Application number
AT05725306T
Other languages
English (en)
Inventor
Daniel Woodruff
Original Assignee
Semitool Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Semitool Inc filed Critical Semitool Inc
Application granted granted Critical
Publication of ATE438923T1 publication Critical patent/ATE438923T1/de

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/001—Apparatus specially adapted for electrolytic coating of wafers, e.g. semiconductors or solar cells
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D17/00—Constructional parts, or assemblies thereof, of cells for electrolytic coating
    • C25D17/16—Apparatus for electrolytic coating of small objects in bulk
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S134/00—Cleaning and liquid contact with solids
    • Y10S134/902—Semiconductor wafer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Sustainable Development (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
  • Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
AT05725306T 2004-03-12 2005-03-09 Einzel-arbeitsstück-verarbeitungskammer ATE438923T1 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US55264204P 2004-03-12 2004-03-12
US11/075,099 US8118044B2 (en) 2004-03-12 2005-03-08 Single workpiece processing chamber with tilting load/unload upper rim
PCT/US2005/008066 WO2005091340A1 (en) 2004-03-12 2005-03-09 Single workpiece processing chamber

Publications (1)

Publication Number Publication Date
ATE438923T1 true ATE438923T1 (de) 2009-08-15

Family

ID=34922232

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05725306T ATE438923T1 (de) 2004-03-12 2005-03-09 Einzel-arbeitsstück-verarbeitungskammer

Country Status (7)

Country Link
US (2) US8118044B2 (de)
EP (1) EP1735817B1 (de)
JP (1) JP4624406B2 (de)
KR (1) KR100836447B1 (de)
AT (1) ATE438923T1 (de)
DE (1) DE602005015830D1 (de)
WO (1) WO2005091340A1 (de)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6423642B1 (en) * 1998-03-13 2002-07-23 Semitool, Inc. Reactor for processing a semiconductor wafer
US7849865B2 (en) * 2007-01-05 2010-12-14 Semitool, Inc. System for processing a workpiece
WO2013016941A1 (zh) * 2011-07-29 2013-02-07 无锡华瑛微电子技术有限公司 可调式半导体处理装置及其控制方法
CN104395736B (zh) 2012-06-29 2018-12-11 皇家飞利浦有限公司 对结合的磁性粒子和未结合的磁性粒子进行处理
US10707099B2 (en) 2013-08-12 2020-07-07 Veeco Instruments Inc. Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle
US11342215B2 (en) 2017-04-25 2022-05-24 Veeco Instruments Inc. Semiconductor wafer processing chamber
WO2018200401A1 (en) * 2017-04-25 2018-11-01 Veeco Precision Surface Processing Llc Collection chamber apparatus to separate multiple fluids during the semiconductor wafer processing cycle
CN108508956B (zh) * 2018-07-11 2019-05-03 南京卡普科技有限公司 一种线性稳压器
WO2020039849A1 (ja) * 2018-08-22 2020-02-27 東京エレクトロン株式会社 基板処理方法および基板処理装置
US11270898B2 (en) 2018-09-16 2022-03-08 Applied Materials, Inc. Apparatus for enhancing flow uniformity in a process chamber

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US13797A (en) * 1855-11-13 Mode of hanging carriage-bodies
US5658387A (en) * 1991-03-06 1997-08-19 Semitool, Inc. Semiconductor processing spray coating apparatus
US5980706A (en) * 1996-07-15 1999-11-09 Semitool, Inc. Electrode semiconductor workpiece holder
JP3666138B2 (ja) * 1996-08-30 2005-06-29 澁谷工業株式会社 容器処理装置
US5975097A (en) * 1996-09-02 1999-11-02 Tokyo Electron Limited Processing apparatus for target processing substrate
JP3317855B2 (ja) * 1996-09-02 2002-08-26 東京エレクトロン株式会社 洗浄装置
US6247479B1 (en) * 1997-05-27 2001-06-19 Tokyo Electron Limited Washing/drying process apparatus and washing/drying process method
JP3265237B2 (ja) * 1997-08-01 2002-03-11 東京エレクトロン株式会社 基板縁部の薄膜除去装置
JP3110370B2 (ja) 1998-02-26 2000-11-20 日本電気ファクトリエンジニアリング株式会社 半導体基板現像装置及び現像方法
US6900132B2 (en) * 1998-03-13 2005-05-31 Semitool, Inc. Single workpiece processing system
US6930046B2 (en) * 1999-01-22 2005-08-16 Semitool, Inc. Single workpiece processing system
EP1038593B1 (de) * 1999-04-06 2000-10-04 SEZ Semiconductor-Equipment Zubehör für die Halbleiterfertigung AG Einrichtung zum Austrag von zwei oder mehreren Medien mit Mediendüsen
US6623609B2 (en) * 1999-07-12 2003-09-23 Semitool, Inc. Lift and rotate assembly for use in a workpiece processing station and a method of attaching the same
US6415804B1 (en) * 1999-12-23 2002-07-09 Lam Research Corporation Bowl for processing semiconductor wafers
US6923192B2 (en) * 2001-06-12 2005-08-02 Goldfinger Technologies, Llc Stackable process chambers
JP2003168673A (ja) 2001-12-03 2003-06-13 Rix Corp ウエーハの洗浄および乾燥槽
WO2003060987A1 (en) * 2002-01-10 2003-07-24 Nec Corporation Method of arranging micro spheres with liquid, micro sphere arranging device, and semiconductor device
JP2003251255A (ja) 2002-03-01 2003-09-09 Sumitomo Precision Prod Co Ltd 基板処理装置
US7144459B2 (en) * 2002-07-19 2006-12-05 Semitool, Inc. Centrifugal swing arm spray processor
US7313462B2 (en) * 2003-06-06 2007-12-25 Semitool, Inc. Integrated tool with automated calibration system and interchangeable wet processing components for processing microfeature workpieces
US7198694B2 (en) * 2003-06-06 2007-04-03 Semitool, Inc. Integrated tool with interchangeable wet processing components for processing microfeature workpieces and automated calibration systems
US7393439B2 (en) * 2003-06-06 2008-07-01 Semitool, Inc. Integrated microfeature workpiece processing tools with registration systems for paddle reactors
US20050178402A1 (en) * 2004-02-12 2005-08-18 Stowell R. M. Methods and apparatus for cleaning and drying a work piece
US7337663B2 (en) * 2004-03-12 2008-03-04 Semitool, Inc. Sonic energy process chamber

Also Published As

Publication number Publication date
US20050199503A1 (en) 2005-09-15
US8118044B2 (en) 2012-02-21
JP4624406B2 (ja) 2011-02-02
US20120060869A1 (en) 2012-03-15
WO2005091340A1 (en) 2005-09-29
EP1735817B1 (de) 2009-08-05
EP1735817A1 (de) 2006-12-27
KR20060131912A (ko) 2006-12-20
KR100836447B1 (ko) 2008-06-09
US8562752B2 (en) 2013-10-22
DE602005015830D1 (de) 2009-09-17
JP2007529120A (ja) 2007-10-18

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