TW200517600A - Reaction force processing system for stage apparatus - Google Patents

Reaction force processing system for stage apparatus

Info

Publication number
TW200517600A
TW200517600A TW093119903A TW93119903A TW200517600A TW 200517600 A TW200517600 A TW 200517600A TW 093119903 A TW093119903 A TW 093119903A TW 93119903 A TW93119903 A TW 93119903A TW 200517600 A TW200517600 A TW 200517600A
Authority
TW
Taiwan
Prior art keywords
reaction force
base
processing system
stage apparatus
force processing
Prior art date
Application number
TW093119903A
Other languages
English (en)
Other versions
TWI316588B (zh
Inventor
Hideo Nishimoto
Makoto Kaneko
Original Assignee
Sumitomo Heavy Industries
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries filed Critical Sumitomo Heavy Industries
Publication of TW200517600A publication Critical patent/TW200517600A/zh
Application granted granted Critical
Publication of TWI316588B publication Critical patent/TWI316588B/zh

Links

Classifications

    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P7/00—Arrangements for regulating or controlling the speed or torque of electric DC motors
    • H02P7/02—Arrangements for regulating or controlling the speed or torque of electric DC motors the DC motors being of the linear type
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F16—ENGINEERING ELEMENTS AND UNITS; GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVE FUNCTIONING OF MACHINES OR INSTALLATIONS; THERMAL INSULATION IN GENERAL
    • F16F—SPRINGS; SHOCK-ABSORBERS; MEANS FOR DAMPING VIBRATION
    • F16F15/00—Suppression of vibrations in systems; Means or arrangements for avoiding or reducing out-of-balance forces, e.g. due to motion
    • F16F15/02—Suppression of vibrations of non-rotating, e.g. reciprocating systems; Suppression of vibrations of rotating systems by use of members not moving with the rotating systems
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B11/00—Automatic controllers
    • G05B11/01—Automatic controllers electric
    • G05B11/36—Automatic controllers electric with provision for obtaining particular characteristics, e.g. proportional, integral, differential
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K33/00—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system
    • H02K33/16—Motors with reciprocating, oscillating or vibrating magnet, armature or coil system with polarised armatures moving in alternate directions by reversal or energisation of a single coil system
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02K—DYNAMO-ELECTRIC MACHINES
    • H02K41/00—Propulsion systems in which a rigid body is moved along a path due to dynamo-electric interaction between the body and a magnetic field travelling along the path
    • H02K41/02—Linear motors; Sectional motors
    • H02K41/03—Synchronous motors; Motors moving step by step; Reluctance motors
    • H—ELECTRICITY
    • H02—GENERATION; CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
    • H02P—CONTROL OR REGULATION OF ELECTRIC MOTORS, ELECTRIC GENERATORS OR DYNAMO-ELECTRIC CONVERTERS; CONTROLLING TRANSFORMERS, REACTORS OR CHOKE COILS
    • H02P2203/00—Indexing scheme relating to controlling arrangements characterised by the means for detecting the position of the rotor
    • H02P2203/03—Determination of the rotor position, e.g. initial rotor position, during standstill or low speed operation

Landscapes

  • Engineering & Computer Science (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Automation & Control Theory (AREA)
  • Acoustics & Sound (AREA)
  • Aviation & Aerospace Engineering (AREA)
  • Chemical & Material Sciences (AREA)
  • Mechanical Engineering (AREA)
  • General Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Control Of Position Or Direction (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Control Of Linear Motors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Machine Tool Units (AREA)
TW093119903A 2003-08-04 2004-06-30 Reaction force processing system for stage apparatus TW200517600A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003285754A JP3940388B2 (ja) 2003-08-04 2003-08-04 ステージ装置用の反力処理システム

Publications (2)

Publication Number Publication Date
TW200517600A true TW200517600A (en) 2005-06-01
TWI316588B TWI316588B (zh) 2009-11-01

Family

ID=34365291

Family Applications (1)

Application Number Title Priority Date Filing Date
TW093119903A TW200517600A (en) 2003-08-04 2004-06-30 Reaction force processing system for stage apparatus

Country Status (4)

Country Link
JP (1) JP3940388B2 (zh)
KR (1) KR100659479B1 (zh)
CN (1) CN100352147C (zh)
TW (1) TW200517600A (zh)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007188251A (ja) * 2006-01-12 2007-07-26 Sumitomo Heavy Ind Ltd ステージ装置
JP4636034B2 (ja) * 2007-02-15 2011-02-23 株式会社安川電機 可動テーブルの制御装置およびそれを備えた可動テーブル装置
JP2009033058A (ja) * 2007-07-30 2009-02-12 Sumitomo Heavy Ind Ltd 反力処理装置
JP4485550B2 (ja) 2007-07-30 2010-06-23 住友重機械工業株式会社 反力処理装置
KR20180029145A (ko) 2016-09-09 2018-03-20 삼성전자주식회사 기판 처리 장치
CN114270286B (zh) * 2019-09-02 2024-03-26 松下知识产权经营株式会社 载物台位置控制装置和载物台位置控制方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN2273871Y (zh) * 1995-12-27 1998-02-04 中国科学院光电技术研究所 一种接近式缩小光刻曝光台
JPH09236149A (ja) * 1996-02-29 1997-09-09 Nikon Corp 防振装置の制御方法及び該方法を使用する防振装置
KR100436418B1 (ko) * 1999-05-27 2004-06-16 미래산업 주식회사 리니어 모터의 구동장치
KR100336361B1 (ko) * 1999-10-11 2002-05-13 장병우 도어구동장치용 리니어모터
JP2003009494A (ja) * 2001-06-21 2003-01-10 Canon Inc 能動制振装置、露光装置およびデバイス製造方法
CN1166913C (zh) * 2001-07-26 2004-09-15 华中科技大学 一种位移传感器

Also Published As

Publication number Publication date
KR20050016029A (ko) 2005-02-21
JP2005057876A (ja) 2005-03-03
CN1581651A (zh) 2005-02-16
JP3940388B2 (ja) 2007-07-04
TWI316588B (zh) 2009-11-01
CN100352147C (zh) 2007-11-28
KR100659479B1 (ko) 2006-12-20

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees