TW200428060A - Manufacturing method of light guide with dense micro-structure - Google Patents

Abstract

The present invention provides a manufacturing method of light guide with dense micro-structure, which is to form dense micro-patterns on a substrate and compose the dense micro-structure with a plurality of micro-patterns; plating with a passivation layer; then, conducting the photoresist spraying; and, conducting the exposure and development with the adjusted masks to form a plurality of etched portions on the photoresist with gradually enlarging shapes, and gradually dense intervals, and the etched portions of the photoresist will protrude from the passivation layer on the shape of the micro-structure; then, plating with a second passivation layer; conducting the electroforming to form the master mold for the light guide; and, using the master mold of the light guide board to form the light guide with an in-plane reflection portion and a diffraction portion with the micro-structure.

Description

200428060 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a method for manufacturing a light guide plate with a dense microstructure, especially a microstructure and a reflection part are separately formed in two processes, which can reduce light loss. And a light guide plate manufacturing method for improving light utilization ratio and improving light guide efficiency of the light guide plate. [Previous technology] According to the general, the scattering type light guide plate is mostly made by the etching process to produce the scattering surface of the light guide plate, but because the stability of the last name engraving process is not high, under the same conditions, the roughness of different batches of etching There may be considerable differences in their scattering capabilities. The reason is mainly due to the rough surface formed by etching, as shown in Figure 6, in which the distribution of the deeper etched part A and the shallower etched part B cannot be grasped, so the result of each etching will not be The same phenomenon, and the deeper etched part A and the shallower etched part B have different reflection effects on light. After the light is projected and scattered on the rough surface generated by the etching, there must be some light loss. , Resulting in a low light utilization rate, which in turn leads to a problem that the light utilization rate of the light guide plate is not high. Therefore, it is necessary to improve the method for manufacturing the light guide plate scattering surface by using the money engraving process, so as to improve the light utilization efficiency of the light guide plate. [Summary of the Invention] The main object of the present invention is to solve the above-mentioned problems and provide a method for manufacturing a light guide plate with dense microstructures, which forms the shape of the scattering portion with dense microstructures, and then adjusts the microstructures by adjusting the photomask It is distributed to form a planar reflecting part to reduce the light loss and improve the light utilization rate, so as to achieve the effect of improving the light guide efficiency of the light guide plate.

Page 5 200428060 V. Description of the invention (2) In order to achieve the aforementioned object, the method for manufacturing a light guide plate with dense microstructures according to the present invention includes the following steps: Forming a microstructure to form dense micro-patterns on a substrate. Most micro-patterns make up dense micro-structures; Protective film plating: A protective film is plated on the substrate and the graphic array so that the protective film forms the shape of the corresponding micro-structure; Coating photoresist: Coating photoresist on the protective film; Exposure: Expose the photoresist with an adjustment mask. The pattern arrangement on the adjustment mask is arranged in order from small to large, and the smaller part of the pattern is more spaced, and the larger the part of the pattern, the more spaced it is. The smaller the development is: the exposed photoresist is developed, and most of the shapes are formed on the protective film from small to large, and the space is gradually etched, and the etched part of the photoresist is exposed. Microstructure-shaped protective film part; Second protective film plating: A second protective film is plated on the protective film exposed by the photoresist and the etched part; Electroforming mold: Electroforming on the protective film Flip over The light guide plate master mold is formed;

Page 6 200428060 V. Description of the invention (3) ^ Detach the electroformed light guide plate master mold from components such as the substrate and the protective film ^ to obtain a complete light guide plate master mold, which corresponds to the light guide plate master mold. The step resistance part will form a first recessed part, and the light guide plate mother mold corresponding to the microstructured film of the security film will form a second recessed part. The seeding includes the use of a hot plate, a recess in the present example «ί ',,, and the same, and the application side, please refer to the actual structure of the example, the following press and shoot to make the light guide flat parts clear In detail, the present invention is selected from the attached drawings.] The first structure is limited. Steps of the embodiment: The corresponding reflections of the plate are described separately, and their display and the attached display are shown in a certain application. This is only for a type with ^ m, and each of the first concave portions of the light plate master is separately ^ A light guide plate corresponding to each type of the light guide plate mother mold has a scattering structure with a microstructure shape. His purpose and advantages are not difficult to obtain from the selected applications below. , F Examples are allowed on other parts, or on the arrangement of the other parts, and they are structured in this specification. The following figure shows the method used in the present invention, which is not used in the patent application.

a · Coated photoresist: on a flat substrate 1 b · Exposure: With a dense pattern

A layer of photoresist is evenly distributed on 0 1 The first photomask i 2 exposes the photoresist

200428060 V. Description of the invention (4) Light. c. Development: The exposed photoresist 1 1 is developed, and a large number of dense circular photoresist points 1 1 a are formed on the substrate. d · Heat flow: The photoresist point 1 1 a after development is heated to cause thermal rheology to form each photoresist point 1 1 a into a spherical microstructure. 俾 is formed by most spherical photoresist points 1 1 b Dense microstructure. In this embodiment, the ratio of the width to the height of the spherical photoresist point 1 1 a formed by thermal rheology is about 2: 1 oe. Plating protective film: A protective film is plated on the microstructure and the substrate 10 13 In this embodiment, a method of vapor deposition or sputtering can be used to deposit a layer of silver metal on the microstructure and the substrate 10 to form a protective film 1 3, so that the protective film 13 forms a corresponding microstructure. The smooth surface of the shape. f. Secondary coating photoresist: A second photoresist 14 is coated on the protective film 13. g · Double exposure: Expose the second photoresist 14 with the adjustment mask 15. The adjustment {The pattern arrangement on the mask 15 is arranged in ascending order as shown in Figure 2, and The smaller the part of the pattern, the larger the interval, and the smaller the part toward the larger the pattern. h · Secondary development: Develop the second photoresist after the second exposure on the protective film

Page 8 200428060 V. Description of the invention (5) Form most etched portions C from small to large and space from sparse to dense, as shown in Figure 3, and each etched portion C on the second photoresist Then, the protective film 13 corresponding to the shape of the microstructure is exposed. i · Plating the second protective film: The second protective film 1 6 is plated on the second photoresist 14 and the protective film 1 3 that is etched out by the etched portion C. In this embodiment, vapor deposition can be used Or, one of the methods is to deposit a layer of silver metal to form a second protective film 16. j · Electroforming flip mold: Electroforming flip mold is performed on the second protective film 16 to form the light guide plate master mold. k · Demolding: Detach and separate the light guide plate master mold 2 from the substrate and components such as the substrate and the second protective film to obtain a complete light guide plate master mold 2 that corresponds to the second light. The first concave portion 2 1 will be formed in the resistance 14 portion, and the protective film 1 3 in the microstructure shape corresponding to the second photoresist 14 by the etched portion C will form the first concave portion 2 1. Two recessed portions 2 2 〇 Please refer to Annex I, which is a 3D diagram of the light guide plate master mold 2 made by the present invention. It can be clearly seen from Annex I that the light guide plate master mold 2 has a flat first recessed portion. The shape of the second recessed portion with dense microstructure. 1 · Molding: The light guide plate 3 is formed on the light guide plate mother mold 2 by one of hot pressing and injection, so that the light guide plate 3 corresponds to each first recess of the light guide plate mother mold 2

Page 9, and the light guide is separately formed and etched, and each protective film is plated. Pure etching. The invention is good and can be improved. 200428060 V. Description of the invention (6) Part 2 has a flat reflection formed at 1 The portion 3 i corresponds to each of the second concave portions 22 of the light guide plate mother mold 2 and has a scattering structure 32 having a microstructure. In the process of the present invention, the protective film of silver metal is etched on each photoresist layer. Therefore, the surface of the pattern formed by each photoresist layer and the photoresist layer will be quite smooth, and there will be no single #notch rough And the problem cannot be controlled. Therefore, the scattering portion 32 of the light guide plate obtained by the method can produce a good shot effect, and unnecessary light loss can be avoided. Please refer to FIG. 4 again, the guide 3 produced by the manufacturing method of the present invention has a plurality of planar reflection portions 31 and most of the dense reflection portions 3 2. Since the reflection portion 3 1 corresponds to the adjustment mask 1 5 The pattern part (that is, the part other than the circle pattern as shown in Figures 2 and 3 is formed, that is, the second photoresist 16 is not etched. F 3 2 corresponds to the adjustment The pattern part of the photomask 15 is f, the dense microstructure part exposed by the etched part c of the resist 16 ^ The shape of the photomask shown in FIG. 2 is adjusted, and the pattern of the photomask 15 is adjusted The parts are arranged in order, and the smaller part of the pattern is more spaced, the more the part is: the smaller the interval is, the more the scattering part 3 is on the light guide plate 3; The larger the distance between the larger part of 3 2 is, the light source 4 is arranged on the-side of the scattering part 3 of the light guide plate 3. In other words, the area of the light guide plate 3 near the light source is larger, and The reflection part 3 on the side far from the light source 4 has a shaped surface to produce a non-part which is expected to use the structure of the light plate) The scattering is second, and the pattern is small The surface is small, the surface of the pattern emitting part is 200428060. V. The description of the invention (7) The product will gradually decrease. Such a distribution of 3 2 will be used to reflect the light by 3 1 to improve the light guide effect, so as to sum up The structure is designed for forming the guide cover 15 to adjust the micro-junction, and the light guide efficiency of the light plate can be reduced. Please refer to the first step, which includes the following steps to form a micro + dense microstructure with a plurality of spaces smaller than a flat wall. The present invention The effect of the spectral loss of the structure on the light plate is shown in Fig. 5. Structure: The 5 V-shaped groove structure design of the substrate can effectively adjust the strong light from the light source 4 near the scattering part to the light guide plate 3 through the reflection part and away from the light source 4. On the side, the entire light guide plate 3 can have more uniform brightness. The first photomask 12 forms a dense micro-junction with a scattering structure of a politic structure, and then adjusts the light cloth to be shaped into a flat shape on the light guide plate. Increase the utilization of light to achieve the improvement of the guiding method. The manufacturing method of the second embodiment of the present invention is: 5 1 is machined by a micro-machining method, and is composed of a majority of micro v-shaped grooves. Membrane: in base 5 r \ I? In this embodiment, a protective film 5 2 is plated on each V-shaped groove 5 1, and a layer of silver metal is used. One can be deposited by one of vapor deposition or sputtering methods. / Residual protective film 5 2, to form a smooth surface C. Coating photoresist:

On this protection and d · exposure: 5 2 is coated with a photoresist 5 3 to adjust the photomask 55 to enter the photoresist 53. The photomask 5 is adjusted

Page 11 200428060 V. Description of the invention (8) --- The arrangement of the patterns on 5 is arranged in ascending order as shown in Figure 2, and the smaller part of the pattern is more spaced, the larger the pattern is. The smaller the interval is, e. Development: The exposed photoresist is developed, and most of the shapes are formed on the protective film from small to large and the interval is etched. The photoresist is 5 Each etched portion c on 3 is exposed through the protective film 5 2 corresponding to the shape of the v-shaped groove 5 2. ί · Plating the second protective film:

^ A first protective film 5 6 is plated on the protective film 5 2 that is exposed through the photoresist 5 3 and the etched portion c. In this embodiment, one layer may be formed by evaporation or sputtering. Silver metal to form a second protective film 56. g · Electroforming flip mold: Electroforming flip mold on the second protective film 5 6 to form the light guide plate master mold ° h · Demoulding: The electroscale scaled light guide plate master mold and substrate and the second pass The protective film and other components are demolded and separated to obtain a complete light guide plate master mold 6. The light guide plate master mold 6 ^ should be a photoresist 5 3 part, and a first concave portion 6 1 is formed, and the guide

The V-groove-shaped protective film 5 2 of the light plate mother mold 2 corresponding to the photoresist 5 3 penetrated by the engraved portion c forms a second recessed portion 6 2. i · Molding: The stomach is heated and ejected in one of the ways to mold the light guide plate 7 on the light guide plate master mold 6 so that the light guide plate 7 corresponds to each of the first recesses of the light guide plate master mold 6.

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200428060 V. Description of the invention (9) Part 6 is formed at 1 place corresponding to the light guide plate master mold 6 The scattering part with the array is manufactured in the above method for forming the light guide cover 5 5 Adjust the array to reduce light loss and the same example efficacy. Of course, the methods of micro-structured engraving and micro-drilling or laser engraving are limited to the present invention, so they are examples of the present invention. From the above details, the aforementioned purpose can be achieved + please. Each second concave portion 62 of a planar reflecting portion 7 1 is 72. The obtained light guide plate 7 is formed by using a scattering structure with microstructures on the dense board to form the light guide plate to enhance the utilization of light. The reachable forming method is in addition to the aforementioned two solid machining methods. Production. The disclosure of the example is used to explain the changes in the values or equivalent component descriptions of the present invention, which can enable those skilled in the art to 'actually comply with the provisions of the Patent Law. Annex 1 · 3D drawing of the light guide plate master mold made by the present invention, The light guide plate 7 is respectively formed with a tiny V-shaped groove, and then the light-reflecting portion is adjusted to the micro-discharge of the above-mentioned implementation example. The micro-discharge is not used to replace it, but it should be understood. Invented, patented

Page 13 200428060 Brief description of the drawings [Simplified description of the drawings] Figure 1 is a schematic diagram of the manufacturing process of the present invention. Figure 2 is a schematic diagram of the pattern distribution of the adjusting mask of the present invention. Figure 3 is a second development of the present invention. Schematic diagram of the shape of the second photoresist. Figure 4 is a schematic diagram of the light guide plate and light source configuration and light reflection made in the present invention. Figure 5 is a schematic diagram of the manufacturing process of the second embodiment of the present invention. Figure 6 is an etching method in conventional technology. Illustration of rough surface formed after etching [Illustration of drawing number] (conventional part) Deeper ik engraved part A, shallower engraved part B (part of the present invention) Photoresist a exposure b development C heat flow d plating protection Film e _ 丨 Yi times coating photoresist f secondary exposure g secondary development h plating a second protective film i electroforming flip mold j demolding k forming 1 substrate 1 0 photoresist 1 1 first photomask 1 2 Circular photoresistance point 11 Spherical photoresistance point 1 lb Protective film 1 3 Second photoresist 1 4 Adjusting the photomask 1 5 Second photo Protective film 1 6 Light guide plate female mold 2

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Claims (1)

200428060 VI. Scope of patent application1. A method for manufacturing a light guide plate with dense microstructures, which includes the following steps: forming a microstructure to form dense micropatterns on a substrate, and forming a dense microstructure from most micropatterns; plating protection Film: A protective film is plated on the substrate and the graphic array, so that the protective film forms the shape of the corresponding microstructure; Coating photoresist: Coating the photoresist on the protective film; Exposure: Adjusting the photomask to expose the photoresist The arrangement of the patterns on the adjusting mask is arranged in order from small to large, and the smaller part of the pattern has a larger interval, and the smaller the part of the pattern, the smaller the interval; the developing z will expose the photoresist after exposure. Development, and the majority of the shape formed on the protective film from small to large, spaced from sparse to dense, and the etched part of the photoresist penetrates the protective film part corresponding to the shape of the microstructure. Two protective films: a second protective film is plated on the protective film that is exposed through the photoresist and the etched part; electroformed flip mold: an electroformed flip mold is formed on the protective film to form a light guide plate Mold Page 16 200428060 VI. Patent application scope '~ η Demolding: Detach and separate the electroformed light guide plate master mold from components such as substrates and protective films to obtain a complete light guide plate master mold. The light guide plate master The photoresistive part of the mold forms a first recessed part, and the protective film part corresponding to the microstructure shape of the light guide plate mother mold forms a second recessed part; Molding: One of the methods of hot pressing and injection, A light guide plate is formed on the mold, so that the light guide plate corresponds to each of the first concave portions of the light guide plate mother mold, and a planar reflecting portion is respectively formed, and the light guide plate corresponds to each of the second concave portions of the light guide plate mother mold. A scattering part with a microstructure U structure is produced. 2 · The method for manufacturing a light guide plate with dense microstructures according to item 1 of the scope of patent application, wherein step a · The process of forming a microstructure includes: a · Coating the first photoresist: uniformly on a flat substrate The first photoresist of the cloth; b. — Exposure: exposure with the dense pattern, the photomask; c • development: the first light after exposure is developed and formed on the substrate Dense circular photoresist points; d. Heat flow: The photoresist after development is heated to cause thermal rheology to form each photoresist point into a spherical structure, which is composed of most spherical photoresist points. 200428060 6. Scope of patent application Dense microstructure. 3 · According to the method for manufacturing a light guide plate with dense microstructures as described in item 1 of the scope of the patent application, the method of forming the microstructure steps is to engrav the micro V-shaped micro-bits on a flat substrate with a plurality of micro-drills. Slots and ridges consist of dense microstructures composed of many tiny V-shaped grooves. 4 · According to the method for manufacturing a light guide plate with a dense microstructure as described in item 1 of the scope of the patent application, wherein the protective film plated in the step of coating the protective film is made of silver metal. 5. The manufacturing method of the light guide plate with dense microstructure according to item 1 of the scope of the patent application, wherein the second protective film plated in the second protective film plating step is made of silver metal. 6. The method for manufacturing a light guide plate with dense microstructures as described in item 2 of the scope of the patent application, wherein the ratio of the width to the height of the spherical photoresist point formed by thermal rheology in step d is about 2: 1. Page 18