M3 50770 八、新型說明： 【新型所屬之技術領域】 本新型係有關於一種敦飾照明投射裝置，其特別有關於一種具有節能 特I·生之雷射絲態裝舰明投射裝置，其係藉由多階繞射之原理，使投射之 影像成為陣列式圖像。 '【先前技術】 ·' 聲光影音系統是目前大型晚會、舞台表演、以及κτν包厢等娛樂 订業製造現場誠氣氛必備之裝置。傳統最鮮義態光影效果設計 疋在㈣球體表面上貼滿亮片，再以高功率白熾燈照射該貼有亮片球 體付到動恶的多重反光效果。數個白熾燈光源的燈幕如搭配不同色彩 之玻璃組口’即犯使裝攻現場表現多彩炫光的動感氣氛。習知設計的 缺點包括，（1)要展現不同色彩之絲，白舰光源㈣需以大型馬達 方疋轉。（2)旋轉球體與白熾燈光源組體積魔大，佔現場空間。⑶因亮片 •鍵，、白熾4光馳皆需要馬達推動旋轉，整體裝i耗費電力甚巨。 .⑷只能有單調的旋轉炫光效果，無法完整搭配現場影音的動態節拍。 ，⑶如需㈣特定陰影或影像綱外安裝大型光調變整形板在燈罩。 雖，'、、目刖已有發光二^體及具縫之旋轉罩達到仿雷射視覺效果之目的，用以 ί1牛低所而功卞。然而，該習知技術採用發先q虽體之光澡光功率與準直性 低’ ^射距離及含蓋面積狹礙，更遑論可用繞射元件作投影整形。 .〜因此有f要提供—種具節能雜之投概置，其係結合雷射投影筆及 動恶繞射先柵的調變，設計出體積輕巧、安裝簡便、炫光多樣化，且 M350770 ”節月匕4寸] 生的田射光^又射系統。本創作亦適用於日益普及的大型水舞秀 與特殊節慶的高樓大廈光雕表演，僅需制高功率諸並搭配可變化 的奴衫及卩車顺置’即可使雷射水舞賴絲表演更具碱臨場效果。 【新型内容】 本新型之主要目的在提供„種具節能特性之雷射光動態裝倚照明投射 .裝置’藉由多階繞射之原理，使其投射之影像成為陣列式圖像。 壯為達上述目的，本創作提出一種具節能雛之雷射絲態裝倚照明投射 衣置，其特徵在於：於—雷射光源前方設置複數個繞射光栅，其中該 f數個繞射光_為相輯疊之轉，雷射絲投射至該複數個 繞射光柵時，係藉由多階繞射之原理，使投射之影像成為陣列式圖像。 根據本創作之具即能榭生之雷射絲態裝御照明投射裝置之一特徵，其 ^個繞射光柵更包含:—x(水平)方向之繞射光栅;以及一 方2 之繞射光柵配置於該X(水平）方向之繞射光柵之上 方與下方之任一位置。 根=排之具之雷射糊裝飾照_裝置之—特徵，其 中忒複數個繞射光柵係以奈米屙 之_形成微結構組成。 在配置於聚賴(PET膜）上 文作之上述和其他目的、特徵、和優點能更明顯易懂，下 认舉數她佳實_，並配麵關式，作詳細制如下。 6 M3 50770 【實施方式】 中：==現為不同形式之實施例’但附圖所示者及打文 可之較佳實施例，並請了解本域揭示者係考量 Μ二?二齋且並非意圖用以將本創作限制於圖示及_苗述 現明芬考弟1圖，其顯示根據本創作實施例之一種具節能謝生之雷 -射光動態裝飾照明投射裝置1〇〇，苴特 、田 、卜 倣在於.於—雷射光源110前方設 J•置複數個繞射綱2Q ’其中該細__12Q輸目互堆最之 結構，且該雷射光源110投射至該複數個繞射光拇120時，係藉由多 “射之原理使#又射之影像成為卩翔式圖像。其巾，該複數個繞射 光柵12G係由配置於聚醋膜(PET膜)上之uv膠所形成之微結構所形 成’且職結構可以是長條形、方形、魏或三角料_。該雷射 光源110為紅、藍與綠光所組成族群之雷射二極體，並於各色光光源 出口㈣il)處覆以動態控制之電腦產生全像片（CQmputer辟職_ h〇1〇gmm，CGH)^gP^^^^^^-# (Diffractive optical element， _ DOE)使光源之投射影像成為預先設計且樣式多變之投影。 ，用於該複數個繞射光柵120之該聚崎m膜）之功用係為增加 UV膠其相對硬度’使該複數個繞射光柵12〇具有增加抗輕曲性、耐磨 性及製造良率之功效。其中，用於製作該具複數個繞射光柵之微結構 之UV膠亦可以環氧樹脂（Ep〇Xy；)取代之。 需注意的是該複數個繞射光柵120更包含··一 x (水平）方向之 繞射光栅140、12G ;以及-γ (垂直）方向之繞射光柵m、12〇。該 7 M350770 Y (垂直）方向之繞射光柵I3G、m係配置於該χ (水平）方向之姨 射光栅刚、120之上方與下方之任一位置。在一實施例中，該雷射Z 源Π0為紅光所組成之雷射二極體，且該γ(垂直）方向之繞射光拇 130 120係配置於χ (水平）方向之繞射光柵⑽、之上方。 在本實施财，該複數個繞射光栅12Q之微賴係在⑽膠上，以 熱塵式奈米屋模陶0_ρι_)技術與紫外線基奈米屢模技術所組成 -奈米壓模技術之一壓出週期僅數微米的微結構，並使其固化成型。夺 丨雜模技術亦可定義為「將具有奈米結構之模仁透過各種方式㈣ 壓、UV光曝照等)將此結構圖案轉印至特定材料上，使其達 印/量產化之目的」。該奈健模技術可達到微米級小線寬··目前技術 =達到嶋〜⑽她壞，遠㈣_嶋影技術 夕且其轉印速度快。在奈米壓模技術中，奈米結構模仁彭作、 光阻材料、轉印製程以及後續钱刻製程等皆為重要的製程步驟。該光 2材枓需考慮：溫度效應、光敏性、流動_曜數)結構等，其在 印過私中’拉仁與壓膜之材料基板之平行度、基板之厚度變異、基 反之表面祕度、光阻均勻塗佈技術、曝光劑量多寡、壓力性、 2物、觀術、定位精密度、爾結構均勻性、脫模技術， 因=的祕細速率等皆係影響該複數個繞射光栅之微結構重要 方2 了上述之奈米壓模技術，該具複數個繞射光栅之微結構之製程 方式亦可採料導體製程技術製作。 卿咖ing)、微影製程（Lith〇graphy)、 電子束微影光罩製作 钱刻（Etching)製程 (Mask 8 M350770 及平版翻模（Molding)等步驟，於uv敎成複_繞射光柵之 微結構之結構，鄕製程⑴加卿⑻）射旨以絲、㈣光罩（Mask) -對晶圓（Wafer)上之阻劑照射，使阻劑產生極性變化、主鏈斷鏈、主 鏈交連等化學作用。經顯影後，該光罩上之特定圖案即可轉移至晶圓。 其中，該光束係由電子束與離子束所組成族群之一。在侧製程方面， 主要分為兩大類：⑴液體化學侧（Wetchemicaletching)與⑵ -乾侧（Dty etching)。為了具有較佳的解析度，乾侧是必要的。 籲，因此在-實施例中係可以採用活性離子名虫刻（处牆e -滅啤， 赃）系、统’其即為乾钱刻系統。藉由選擇氣體的種類、混合比例來達 到控制蝕刻率（Etchingmte)及非等向性（Anis〇tr〇py)的目的。由於 該UV膠，其製程參數易於控做富有彈性，故可精確地侧出該複數 個繞射光栅120。在尚未進行製程步驟之前，該複數個繞射光捕12〇之 距離係必職雕意_目，其必馳合製程設備馳提供的最小解 析度，才能避免製程上的困擾，使複數個繞射光栅12〇能夠順利製 ►作。除了該複數個繞射光柵12〇之距離需注意外，該複數個繞射光拇12〇 .所需軸的厚度亦需注意，純刻的厚度太厚，則尚未達所需侧厚 ‘騎其光阻便已祕刻完畢’無法侧出所需的厚度；反之若餘刻的 厚度太薄，則會因電槳（Plasma)在剛開始不穩定的狀況下，造祕 刻後晶片表斜整度不佳，甚至會造成元件嚴重的散射損失。故在實 際製程實行前’需檢查該複數個繞射光栅u〇之距離與侧厚度是否符 合設備的製程許可範圍内是相當重要的步驟。 又 付 現請麥考第2圖，請所示為本創作之第二實施例2〇〇，其與第—實施例 9 M350770 之不同處在於§亥雷射光源110與該複數個繞射光柵120之間更包含一週期 性圖案單元160。該裝置在操作時，該週期性圖案單元ι6〇係必需持續 旋轉，使投射之影像成為陣列式圖像。 圖3所示為本創作中’該複數個繞射光柵12〇之上視圖與侧視剖面 圖’如圖3所不。其中’該複數個繞射光柵120之間的距離(Distanee)在 〇.5微米至10微米之間。現請參考第_，其齡為本創作之陣列式圖 -像。當該具節能榭生之雷射絲態裝御照明投射裝置1〇〇在操作時，該複數個 φ繞射光柵I2◦可藉由其不同的彎曲角度，使投射之影像成為立體感之陣 列式圖像’其立體感之陣列式圖像如圖4b圖所示。其中，該複數個繞 射光栅120之彎曲角度在〇.5度至9〇度之間。相較於一般以微影製程製 作在石躲板上的繞射光栅12Q，本創作之繞射光栅12Q可大面積量產 並藉由微機械結構對繞射光栅120膜施以振動與微彎，使投射出的多階 繞射影像間距隨之變動造成立體深度感，更能搭配現鄉音節奏= 出更生動多變的燈光效果。 九 ^ 综上所诚，太合丨你罢曰士______ ..M3 50770 VIII. New Description: [New Technology Field] This new type relates to a Dunhuang lighting projection device, which is particularly related to a laser-loaded ship-mounted projection device with energy-saving special I·sheng. The projected image is made into an array image by the principle of multi-order diffraction. '[Prior technology] · 'Sound and light audio and video system is the necessary equipment for the large-scale party, stage performance, and entertainment industry, such as κτν box. Traditionally the most beautiful light and shadow effect design 疋The (4) the surface of the sphere is covered with sequins, and then the high-power incandescent lamp illuminates the multi-reflective effect of the sequined sphere to pay the evil. The lighting curtains of several incandescent light sources, such as glass sets with different colors, are the dynamic atmosphere that makes the installation scene colorful and dazzling. Disadvantages of conventional design include: (1) To display different colors of silk, the white ship light source (4) needs to be turned by a large motor. (2) The rotating sphere and the incandescent light source group are large in size and occupy the space on the spot. (3) Because of the sequins • The keys, the incandescent 4 Guangchi all need the motor to push the rotation, the overall installation i consumes a lot of power. (4) There can only be a monotonous rotating glare effect, and it is impossible to fully match the dynamic beat of the live video. (3) If necessary (four) specific shadow or image outside the installation of large light modulation plastic plate in the lampshade. Although, ',, witnessed the existence of a light-emitting two-body and a rotating rotating cover to achieve the purpose of laser-like visual effects, used to ί1 cattle low. However, the conventional technique adopts the light power and collimation of the light bath, and the collimation distance and the cover area are narrow, let alone the diffraction element can be used for projection shaping. ~ Therefore, there is a need to provide - a kind of energy-saving miscellaneous investment, which is combined with the laser projection pen and the dynamic and evil diffraction first grating modulation, designed to be compact, easy to install, glare diversified, and M350770 "The moon is 4 inches". The field is shot and the system is also used. This creation is also applicable to the increasingly popular large-scale water dance show and special festival high-rise building light sculpture performance, only need to make high-power and match with changeable The sneakers and the brakes can be used to make the laser water dance performance more alkaline. [New content] The main purpose of this new model is to provide „the energy-saving laser light dynamic illuminating projection device. The image projected by the principle of multi-order diffraction becomes an array image. In order to achieve the above objectives, the present invention proposes a laser-loaded illuminating projection garment with energy-saving chicks, characterized in that a plurality of diffraction gratings are arranged in front of the laser light source, wherein the f-number of diffracted lights _ For the rotation of the phase, when the laser is projected onto the plurality of diffraction gratings, the projected image is made into an array image by the principle of multi-order diffraction. According to one of the characteristics of the laser light-loading illumination projection device capable of being produced by the present invention, the diffraction grating further comprises: a diffraction grating of -x (horizontal) direction; and a diffraction grating of one side 2 It is disposed at any position above and below the diffraction grating in the X (horizontal) direction. The root=row has a laser-like decorative photo_device-characteristic, in which a plurality of diffraction gratings are formed by a micro-structure of nanometers. The above and other objects, features, and advantages of the present invention are more apparent and easy to understand. The following is a description of the following. 6 M3 50770 [Embodiment] Medium: == is now a different form of embodiment 'but the figure and the preferred embodiment of the text, and please understand that the domain revealer considers the second and second It is not intended to limit the present creation to the illustration and _ Miao Shuming Ming Fen Kao Di 1 diagram, which shows a kind of energy-saving Xie Shenglei-lighting dynamic decorative lighting projection device according to the present embodiment. Tian and Bu are located in front of the laser light source 110. J is provided with a plurality of diffraction targets 2Q', wherein the fine __12Q is the most common structure, and the laser light source 110 is projected to the plurality of diffracted lights. When the thumb is 120, the image that is shot again by the principle of "shooting" becomes a soaring image. The towel, the plurality of diffraction gratings 12G are made of uv glue disposed on the polyester film (PET film). The formed microstructure can be formed as a long strip, a square, a Wei or a triangle. The laser source 110 is a laser diode composed of red, blue and green light, and is colored. Light source exit (four) il) is covered with a dynamically controlled computer to produce a full picture (CQmputer _ h〇1〇gmm, C GH)^gP^^^^^^-# (Diffractive optical element, _ DOE) makes the projected image of the light source into a pre-designed and versatile projection. The poly-mesh for the plurality of diffraction gratings 120 The function of the film is to increase the relative hardness of the UV glue, so that the plurality of diffraction gratings 12 〇 have the effects of increasing resistance to light curvature, abrasion resistance and manufacturing yield, wherein the plurality of diffractions are used for fabricating the plurality of diffraction gratings. The UV glue of the microstructure of the grating can also be replaced by epoxy resin (Ep〇Xy;). It should be noted that the plurality of diffraction gratings 120 further include diffraction gratings 140 and 12G in an x (horizontal) direction; And diffraction gratings m and 12 - in the -γ (vertical) direction. The diffraction gratings I3G and m of the 7 M350770 Y (vertical) direction are arranged in the 水平 (horizontal) direction of the radiant grating just above 120 In any of the following positions, in one embodiment, the laser source Π0 is a laser diode composed of red light, and the γ (vertical) direction diffracted light 130 120 is disposed at χ (horizontal) The diffraction grating (10) of the direction is above. In the implementation, the plurality of diffraction gratings 12Q are attached to the (10) glue. It is composed of hot dust type nano-model pottery 0_ρι_) technology and UV-based nano-multi-mode technology - one of the nano-molding techniques is used to extrude a microstructure of only a few micrometers and cure it. The technology can also be defined as "transferring the structure pattern to a specific material by various means (four) pressure, UV light exposure, etc.) to achieve the purpose of printing/production. The Naijian mold technology can reach a micron-sized small line width. · Current technology = reach 嶋 ~ (10) her bad, far (four) _ 嶋 shadow technology and its transfer speed is fast. In the nano-molding technology, the nanostructured molds, the photoresist, the transfer process, and the subsequent engraving process are all important process steps. The light 2 material needs to be considered: temperature effect, photosensitivity, flow 曜 number of structures, etc., which is printed in the private sector, the parallelism of the material substrate of the lamin and the film, the thickness variation of the substrate, and the surface Degree, uniform coating technique, exposure dose, pressure, 2 objects, observation, positioning precision, uniformity of the structure, demoulding technology, the rate of the secret, etc. affect the multiple diffraction The microstructure of the grating is important. The above-mentioned nano-die technology, the process of the microstructure of the plurality of diffraction gratings can also be produced by the process of the conductor process. Qing ing), lithography process (Lith〇graphy), electron beam lithography mask production Etch process (Mask 8 M350770 and lithography mold (Molding) and other steps, in uv 敎 complex _ diffraction grating The structure of the microstructure, the process (1) plus (8)) the purpose of the wire, (four) mask (Mask) - on the wafer (Wafer) resist radiation, the resistance of the resist changes, the main chain broken chain, the main Chemical interactions such as chain cross-linking. After development, the specific pattern on the mask can be transferred to the wafer. Wherein, the beam is one of a group consisting of an electron beam and an ion beam. In the side process, there are two main categories: (1) liquid chemical side (Wetchemicaletching) and (2) - dry side (Dty etching). In order to have a better resolution, the dry side is necessary. Therefore, in the embodiment, it is possible to use the active ion name insect engraving (the wall e-beer, 赃) system, which is the dry money engraving system. The purpose of controlling the etching rate (Etchingmte) and the anisotropy (Anis〇tr〇py) is achieved by selecting the type of gas and the mixing ratio. Due to the UV glue, the process parameters are easily controlled to be flexible, so that the plurality of diffraction gratings 120 can be accurately side-out. Before the process step has been carried out, the distance between the plurality of diffracted lights and the 12 〇 系 雕 , , 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目 目The grating 12〇 can be made smoothly. In addition to the distance of the plurality of diffraction gratings 12〇, the plurality of diffracted optical lights 12 〇. The thickness of the required axis should also be noted, the thickness of the pure engraving is too thick, and the required side thickness has not yet reached The photoresist has been secretly finished. 'The thickness cannot be set off. On the other hand, if the thickness of the remaining layer is too thin, the wafer will be skewed after the plasma is in the unstable state. Poor degree, even causing severe scattering loss of components. Therefore, it is a very important step to check whether the distance and side thickness of the plurality of diffraction gratings are in compliance with the process permission of the equipment before the actual process is carried out. In addition, please refer to Mai Khao 2, which is shown as a second embodiment of the present invention, which differs from the first embodiment of M350770 in that the ray light source 110 and the plurality of diffraction gratings 120 A periodic pattern unit 160 is further included between them. When the device is in operation, the periodic pattern unit ι6 must be continuously rotated to make the projected image an array image. Fig. 3 shows a top view and a side cross-sectional view of the plurality of diffraction gratings 12' in the present creation, as shown in Fig. 3. Wherein the distance between the plurality of diffraction gratings 120 is between 微米5 μm and 10 μm. Please refer to the _, the age-based array of images - like. When the energy-saving twin-ray laser-mounted illumination projection device 1 is in operation, the plurality of φ diffraction gratings I2 ◦ can make the projected image into a stereoscopic array by different bending angles thereof. The image of the stereoscopic image is shown in Figure 4b. The bending angle of the plurality of diffraction gratings 120 is between 5.5 degrees and 9 degrees. Compared with the diffraction grating 12Q which is generally fabricated on the stone slab by the lithography process, the diffraction grating 12Q of the present invention can be mass-produced and the vibration and microbend are applied to the diffraction grating 120 film by the micromechanical structure. In order to make the multi-step diffractive image spacing of the projection change, the stereoscopic depth is sensed, and the rhythm of the local sound can be matched with the more vivid and varied lighting effects.九 ^ In summary, sincerely, you are a gentleman ______ ..
不需額外安裝任合光學透鏡組或光整形板即可投射特定陰 化、立體深度感、影像動態形變）， ’可格配現場影音的動態節拍 影像間距變 長節拍，（5) 疋陰影或影No need to install any optional optical lens group or light shaping plate to project a specific clouded, stereoscopic depth, dynamic image deformation), 'The dynamic beat image spacing can be matched with live video and the pitch is longer, (5) 疋 shadow or Shadow
雖然本創作已以前述紀、/未巷^^ ^…一 作，任何熟習此技藝者， M350770 種之更動與修改。如上述的解釋，都可以作各型式的修正與變化，而 不會破壞此創作的精神。因此本創作之保護範圍當視後附之申請專利 - 範圍所界定者為準。 •M350770 【圖式簡單說明】 圖1顯示為本創作之裝置之第—實施例； _ 圖2顯示為本創作之裝置之第二實_; 圖3a顯示為本創作之複數個繞射光柵之上視圖； 圖3b顯示為本創作之複數個繞射光柵之侧視剖面 圖4a顯示為本創作之陣列式圖像；以及 • 圖4b顯示為本創作之立體感之陣列式圖像。 ♦ 【主要元件符號說明】 1⑻具節能特}生之雷射光動態裝飾照明投射裝置 11〇雷射光源 120繞射光柵 130 Y (垂直）方向之繞射光柵 140 X (水平）方向之繞射光柵 160週期性圖案單元 _ 200第二實施例Although this creation has been done in the above-mentioned disciplines, / not lanes ^ ^ ^ ..., any familiar with this skill, M350770 kinds of changes and modifications. As explained above, all types of corrections and changes can be made without destroying the spirit of this creation. Therefore, the scope of protection of this creation is subject to the definition of the patent application - the scope of the application. • M350770 [Simple description of the drawing] Figure 1 shows the first embodiment of the device of the present invention; _ Figure 2 shows the second real device of the device of the present invention; Figure 3a shows a plurality of diffraction gratings of the present invention. Figure 3b shows a side view of a plurality of diffraction gratings of the present invention. Figure 4b shows an array image of the present invention; and Figure 4b shows an array image of the three-dimensional sense of the creation. ♦ [Main component symbol description] 1 (8) Energy-saving laser light dynamic decorative illumination projection device 11 〇 laser light source 120 diffraction grating 130 Y (vertical) direction diffraction grating 140 X (horizontal) direction diffraction grating 160 periodic pattern unit _ 200 second embodiment