TW594110B - Manufacturing method of light guide with dense micro-structure - Google Patents

Abstract

The present invention provides a manufacturing method of light guide with dense micro-structure, which is to form dense micro-patterns on a substrate and compose the dense micro-structure with a plurality of micro-patterns; plating with a passivation layer; then, conducting the photoresist spraying; and, conducting the exposure and development with the adjusted masks to form a plurality of etched portions on the photoresist with gradually enlarging shapes, and gradually dense intervals, and the etched portions of the photoresist will protrude from the passivation layer on the shape of the micro-structure; then, plating with a second passivation layer; conducting the electroforming to form the master mold for the light guide; and, using the master mold of the light guide board to form the light guide with an in-plane reflection portion and a diffraction portion with the micro-structure.

Description

594110 V. Description of the invention (1) [Technical field to which the invention belongs] The present invention relates to a method for manufacturing a light guide plate with a dense microstructure, especially a microstructure and a reflection part are separately formed in two processes, which can reduce light loss. And a light guide plate manufacturing method for improving light utilization ratio and improving light guide efficiency of the light guide plate. [Previous technology] According to the general scattering light guide plate, the scattering surface of the light guide plate is mostly manufactured by an etching process, but because the stability of the remaining process is not high, under the same conditions, the roughness caused by different batches of etching is rough. There may be considerable differences in their scattering capabilities. The reason is mainly due to the rough surface formed by etching, as shown in Figure 6, in which the distribution of the deeper money engraved part A and the shallower remaining engraved part B cannot be grasped, so it will cause # 刻 的The results are different, and the deeper etched part A and the shallower etched part B have different reflection effects on light. After light is scattered on the rough surface generated by the etching, there must be some The light loss results in a low light utilization rate, which in turn leads to a problem that the light utilization rate of the light guide plate is not high. Therefore, it is necessary to improve the aforementioned method of manufacturing the light guide plate scattering surface by a process of engraving so as to improve the light utilization efficiency of the light guide plate. [Summary of the Invention] The main object of the present invention is to solve the above-mentioned problems and provide a method for manufacturing a light guide plate with dense microstructures, which forms the shape of the scattering portion with dense microstructures, and then adjusts the microstructures by adjusting the photomask It is distributed to form a planar reflecting part to reduce the light loss and improve the light utilization rate, so as to achieve the effect of improving the light guide efficiency of the light guide plate.

594110 V. Description of the invention (2) In order to achieve the aforementioned object, the method for manufacturing a light guide plate with dense microstructures according to the present invention includes the following steps: forming a microstructure to form dense micropatterns on a substrate, and using most micro Graphic composition dense microstructure; Protective film plating: A protective film is plated on the substrate and the graphic array so that the protective film forms the shape of the corresponding microstructure; Coating photoresist: Coating photoresist on the protective film; Exposure: to Adjust the photomask to expose the photoresist. The pattern arrangement on the photomask is arranged in order from small to large, and the smaller part of the pattern is more spaced, and the smaller the part is, the smaller the space is; Development: The exposed photoresist is developed, and most of the shapes are formed on the protective film from small to large and the space is etched, and the etched part of the photoresist penetrates the corresponding microstructure shape. The protective film part; The second protective film is plated: the second protective film is plated on the protective film exposed by the photoresist and the etched part; the electroformed flip mold: the electroformed flip mold is formed on the protective film, To shape out Light board mother die; release:

Page 6 594110 V. Description of the invention (3) The electroformed light guide plate master mold is separated from the substrate and the protective film, and a complete light guide plate master mold can be obtained. The light guide plate master mold corresponds to the photoresist A part will form a first recessed part, and the part of the protective film corresponding to the shape of the microstructure of the light guide plate mother mold will form a second recessed part; Molding: With a hot plate, a recess is of course the same as this example, and The implementer please refer to the actual structure of the example below. The above-mentioned and the detailed description of the light-reflecting plate corresponding to the plane of the light guide plate are respectively described above and a detailed description and attached 'The actual use of the present invention in a certain selected & Shown in the figure] Please refer to Figures 1 to 3, this is for restriction only. Light guide molding is not explained in the second implementation. [A practical way is to form a first concave part of the light guide plate master mold on the light guide plate master mold, and the light guide plate corresponds to each of the light guide plate master mold. A scattering portion having a microstructure shape is molded. His purpose and advantages are not difficult to obtain from the selected applications below. Embodiments are allowed in some other parts, or the arrangement of the other parts, and their structures are detailed in this specification. The picture shown in Figure 3 is used for the purpose of description of the present invention. It is not included in the patent application. It includes the following method for manufacturing a light guide plate with dense microstructures, which is: • Coated photoresistor: A layer of photoresist b is evenly distributed on the substrate 10. • Exposure: Exposure is performed. The first photomask 12 with a collection pattern has a photoresist 594110. V. Description of the invention (4) Light. C. Development: The light after exposure Resist 1 1 develops, and forms most dense circular photoresist points 1 1 a on the substrate. D · Heat flow · The photoresist points 1 1 a after development are heated to cause thermal rheology to cause each photoresist point 1 1 a forms a spherical microstructure, and a plurality of spherical photoresist points 1 1 b form a dense microstructure. In this embodiment, the width of the spherical photoresist point 1 1 a formed by thermal rheology and The height ratio is about 2: 1 〇e. Plating protective film: A protective film 13 is plated on the microstructure and the substrate 10. In this embodiment, one of the methods of vapor deposition or sputtering can be used on the microstructure. A layer of silver metal is plated on the substrate 10 to form a protective film 1 3, so that the protective film 13 forms a corresponding microjunction. The smooth surface of the shape. F · Secondary coating photoresist: Apply a second photoresist 14 to the protective film 1 g. Double exposure: Adjust the photomask 15 to the second photoresist 1 4 For exposure, the arrangement of the patterns on the adjustment mask 15 is arranged in ascending order as shown in FIG. 2, and the smaller part of the pattern has a larger interval. H. Secondary development: Develop the second photoresist after the second exposure and place it on the protective film.

Page 8 594110 V. Description of the invention (5) Form the most etched portion C from small to large and space from sparse to dense, as shown in Figure 3, and each etched portion C on the second photoresist Then, the protective film 13 corresponding to the shape of the microstructure is exposed. i · Plating the second protective film: The second protective film 1 6 is plated on the second photoresist 14 and the protective film 1 3 that is etched out by the etched portion C. In this embodiment, vapor deposition can be used Or sputter plating one of the methods to form a layer of silver metal to form a second protective film 16 ° j. Electroforming flip mold: Electroformed flip mold on the second protective film 16 to form a light guide plate master mold . k · Demoulding: Detach and separate the electroformed light guide plate master 2 from the substrate and the second protective film to obtain a complete light guide plate master 2 corresponding to the second light. The first concave portion 2 1 will be formed in the resistance 14 portion, and the protective film 1 3 in the microstructure shape corresponding to the second photoresist 14 by the etched portion C will form the first concave portion 2 1. Two recessed portions 2 2 〇 Please refer to Annex I, which is a 3D diagram of the light guide plate master mold 2 made by the present invention. It can be clearly seen from Annex I that the light guide plate master mold 2 has a flat first recessed portion. The shape of the second recessed portion with dense microstructure. 1 · Molding: The light guide plate 3 is formed on the light guide plate mother mold 2 by one of hot pressing and injection, so that the light guide plate 3 corresponds to each first recess of the light guide plate mother mold 2

594110 ——- V. Description of the invention (6) Part 2 1 corresponding to the light guide plate mother has a microstructure of the surface due to the pattern of silver metal pattern of the rough surface dent notch scattering effect , Rate. Another 3 has a portion 3 2 # formed by the < scattering pattern portion, and the photoresistance is between 2 + to a large portion 0 and is small 3 1 in the vehicle. Please refer to the majority of the flat portion 3 2 copies (ie, that is, the It is arranged in order as shown in the figure 16 with a larger interval on the side. The area is larger than that of the protective film made by the scattering part of the mold 2 and the light guide plate cannot be used. , Because the second Η Η should be etched in the photomask row, and the smaller the interval, the more the light source is larger, and the surface reflection part 31 is 1 and the light guide plate 3 is a recessed part. 22 places are respectively formed in a 3 2 ° course, and each photoresist layer is plated after being etched. Therefore, the photoresist layer and the protective film are smooth, and there is no simple The problem of etching surface control, so the 'scattering part 3 2 manufactured by the present invention can produce a good and can be expected to avoid unnecessary loss to improve the use of light, with the reflecting part 3 1 of the present invention. Figure 3 Photoresistor 1 6 Adjust the shape of the mask 1 5 Part C, adjust the smaller part of the pattern The light scattering part 3 2 4 is arranged on the light guide plate 3 away from the light source manufacturing method and most of the dense micro-light masks 15 are out of the pattern portion of the corresponding unadjusted pattern of the circle pattern corresponding to the adjustment. A part of the light guide plate 3 with a large scattering on the plate 3 is scattered on the side close to the light source 4 4 to obtain a portion other than the dense mask 1. 'That is, the structural part and the pattern part are large', and the healing part 3 2 is spaced apart. One side of the part 3 emits the non-portion of the light guide plate microstructure 5 of the part 3) and the scattering is the second part, and the part is smaller from the smaller part of the pattern, 2 the surface of the pattern reflecting part 1 594110 V. Description of the invention ( 7) The structural design of the product will gradually and shrink, which can effectively adjust the scattering of 3 2 'in order to transmit the stronger light from the sinner light source 4 through the reflection & 3 1 reflection to conduct the light to the light guide plate 3__ 1 away from the light source 4 to improve the light guide effect, so that the entire light guide plate 3 can have more uniform brightness = 〇2 = a mask 12 forms a dense micro-junction; To adjust the distribution of the light structure, it is shaped into a flat shape on the light guide plate. Reverse = and improve the utilization of light to achieve the effect of improving guidance. Figure 5, which is the second embodiment of the present invention. The manufacturing method of the comprehensive structure of the 俾 supply cover 1 5 radiation part, the light board, and its package a in the majority of the dense b b in the solid silver silver c in d As mentioned above, the light guide efficiency can be reduced by molding to adjust the microjunction. Please refer to the following steps. • Form a micro structure with a micro-level gap. • Mineral protection substrate 50 is formed in the embodiment. • The protective film is coated with light. • Exposure: Adjust the photomask structure: The substrate 50 is engraved with a micro-drilling machine 1...多数 V-shaped groove film is composed of the majority and small v-shaped grooves in the old city: and each V-shaped groove 5 can be vapor-deposited or _% dazzle can 瞪 ^ ',-one way is to set up a membrane 5 2 Formation of smooth surface resistance:. 52 was coated on photoresist 53. Σ is plated with another layer of protective film 5 2, 0 5 5 and photoresist 5 3 is exposed. This adjustment mask

Page 4 W4110 V. Description of the invention (G ~~~~ — '—'—__ __ 5 The arrangement of the patterns on 5 is as shown in Figure 2. The smaller part of the small pattern is more spaced, the more it goes to the pattern column. And u. The smaller the interval shown in u is, the smaller the interval is. E. Development: The photoresist after exposure is markedly%, and the portion on the protective film is gradually increased from small to large, and the interval is gradually sparsely and densely carved. The ^ tf etched portions C are exposed through the corresponding V-shaped groove 5 丄: the film 5 2 portion. 4 1 shows the side f. Plate a second protective film: the photoresist 53 and the etched portion C are transparent. The second protective film 56 is formed on the produced protective film 5 2 by ^ two protective films 5 6. In this embodiment, a layer of silver metal can be formed by evaporation or sputtering ^ ^ φ. G · Electroforming mold: 'Mold to shape the light guide on the second protective film 5 6 for electroforming plate master mold. H · Denucleation · The electroformed light guide plate mother mold and substrate and the second pass Protective film and other components can be demolded and separated 'to obtain a complete light guide plate mother mold 6, the light guide plate mother mold 6 corresponding to the photoresist 5 3 part will form a first concave portion 6 1, and the guide

The V-groove-shaped protective film 5 2 of the light plate mother mold 2 corresponding to the photoresist 5 3 penetrated by the etched portion C forms a second recessed portion 6 2. i · Molding: The light guide plate 7 is formed on the light guide plate mother mold 6 by one of hot pressing and injection, so that the light guide plate 7 corresponds to each first recess of the light guide plate mother mold 6.

Page 12 594110 V. Description of the invention (9)-a flat reflecting part 7 i is formed at 61 places, and the light guide plate 7 corresponds to each of the second concave portions 6 of the light guide plate mother mold 6 2 Then, a scattering portion 72 having an array is formed. The light guide plate 7 obtained by the above method is formed with a dense micro-v-shaped groove structure to form a scattering portion having a microstructure on the light guide plate, and then the distribution of the array is adjusted by adjusting the photomask 5 5 to form a plane on the light guide plate. The shape of the reflecting portion reduces the light loss and improves the light utilization rate, and can achieve the same effect as the previous embodiment.当然 Of course, the microstructure forming method can be made by micro-discharge machining or laser engraving in addition to the machining methods described in the previous two embodiments and the machining method of the cylindrical drill. Φ The disclosure of the embodiments described above is used to illustrate the present invention, and is not used to make the present invention. Therefore, changes in numerical values or replacement of equivalent components should still belong to the scope of the present invention. From the above detailed description, those skilled in the art can understand that the present invention can indeed achieve the aforementioned purpose, and it has indeed complied with the provisions of the Patent Law, and filed a patent application. Attachment 1: 3D drawing of the light guide plate master mold made by the present invention.

Page 13 594110 Brief description of the drawings [Simplified description of the drawings] Figure 1 is a schematic diagram of the manufacturing process of the present invention. Figure 2 is a schematic diagram of the pattern distribution of the adjusting mask of the present invention. Figure 3 is a second development of the present invention. Schematic diagram of the shape of the second photoresist. Figure 4 is a schematic diagram of the light guide plate and light source configuration and light reflection made in the present invention. Figure 5 is a schematic diagram of the manufacturing process of the second embodiment of the present invention. Figure 6 is an etching method in conventional technology. Figure of rough surface formed after etching [Illustration of drawing number]

(Conventional part) Deeper etched part A (Part of the present invention)

Coated photoresist a development c plated protective film e double exposure g plated second protective film i demolding k substrate 1 0 first photomask 1 2 spherical photoresist point 1 1 b second photoresist 1 4 Two protective films 1 6 Shallowly etched area B Exposure b Heat flow d Secondary coating photoresist f Secondary development h Electroforming flip mold j Molding 1 Photoresist 1 1 Round photoresist point 1 1 a Protective film 1 3 Adjustment Photomask 1 5 Light guide female model 2

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The drawing briefly explains the first recessed portion 2 1 the second recessed portion 2 2 the light guide plate 3 the reflecting portion 3 1 the scattering portion 3 2 the light source 4 the substrate 5 0 the micro V-groove 5 1 the protective film 5 2 the photoresist 5 3 the adjustment mask 5 5 The second protective film 5 6 The light guide plate female mold 6 The first recessed portion 6 1 The second recessed portion 6 2 The light guide plate 7 The reflection portion 7 1 The scattering portion 7 2 The remaining portion C ί ❶

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Claims (1)

594110 VI. Scope of patent application1. A method for manufacturing a light guide plate with dense microstructures, which includes the following steps: forming a microstructure to form dense micropatterns on a substrate, and forming a dense microstructure from most micropatterns; plating protection Film: A protective film is plated on the substrate and the graphic array, so that the protective film forms the shape of the corresponding microstructure; Coating photoresist: Coating the photoresist on the protective film; Exposure: Adjusting the photomask to expose the photoresist The arrangement of the patterns on the adjusting reticle is arranged in order from small to large, and the interval between the smaller part of the pattern is larger, and the interval between the larger part of the pattern is smaller; development: the photoresist after exposure Development, and the majority of the shapes on the protective film are etched from small to large, and the spacing is sparse and dense, and the etched portion of the photoresist penetrates the protective film corresponding to the shape of the microstructure. Channel protective film: A second protective film is plated on the protective film that is exposed through the photoresist and the etched part; Electroformed flip mold: Electroformed flip mold on the protective film to form the light guide plate mother mold Page 16 594110 VI. Patent application demoulding: Detach and separate the electroformed light guide plate master mold from components such as substrates and protective films to obtain a complete light guide plate master mold. The light guide plate master mold corresponds to light. The resistance part will form a first recessed part, and the protective film part corresponding to the microstructure shape of the light guide plate master mold forms a second recessed part; Molding: u One way of hot pressing and injection is on the light guide plate master mold. If the light guide plate corresponds to each of the first recesses of the light guide plate female mold, ^ = knife-out—planar reflecting portion, and the light guide plate corresponds to each second concave portion of the light guide plate female branch. A scattering portion having a microstructure is formed. According to the method for manufacturing a light guide plate with dense microstructures described in item 1 of the scope of the patent application, where step a • The process of forming a microstructure includes: a. Coating the first photoresist: Distribute the first uniformly on a flat substrate Channel photoresistance; b ·-exposure: exposure with the first / channel mask with dense pattern; c · development: ', and shape on the substrate and the first light exposure after exposure and development into most dense Circular photoresistance points; d. Heat flow: heating the photoresist after development to cause thermal rheology to form each photoresistance point into a spherical structure ", which is composed of most spherical photoresistance points. No. 17 Buy 594110 VI. Patent application scope Dense microstructure. 3 · According to the method for manufacturing a light guide plate with dense microstructures as described in item 1 of the scope of the patent application, the method of forming the microstructure steps is to engrav the micro V-shaped micro-bits on a flat substrate with a plurality of micro-drills. Slots and ridges consist of dense microstructures composed of many tiny V-shaped grooves. 4 · According to the method for manufacturing a light guide plate with a dense microstructure as described in item 1 of the scope of the patent application, wherein the protective film plated in the step of coating the protective film is made of silver metal. 5. The manufacturing method of the light guide plate with dense microstructure according to item 1 of the scope of the patent application, wherein the second protective film plated in the second protective film plating step is made of silver metal. 6. The method for manufacturing a light guide plate with dense microstructures as described in item 2 of the scope of the patent application, wherein the ratio of the width to the height of the spherical photoresist point formed by thermal rheology in step d is about 2: 1. Page 18