TW200423404A - Integrated circuit with one metal layer for programming functionality of a logic operation module - Google Patents

Integrated circuit with one metal layer for programming functionality of a logic operation module Download PDF

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Publication number
TW200423404A
TW200423404A TW92120899A TW92120899A TW200423404A TW 200423404 A TW200423404 A TW 200423404A TW 92120899 A TW92120899 A TW 92120899A TW 92120899 A TW92120899 A TW 92120899A TW 200423404 A TW200423404 A TW 200423404A
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Taiwan
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circuit
logic
input
operation module
electrically connected
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TW92120899A
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Chinese (zh)
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TW594991B (en
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Hsin-Shih Wang
Shang-Jyh Shieh
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Faraday Tech Corp
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Abstract

An integrated circuit with one metal layer for programming functionality of a logic operation module formed on a semiconductor body. The logic operation module has an input circuit and a logic gate circuit. The input circuit has n output units. Each output unit is electrically connected a first predetermined voltage level or a corresponding input port of the input circuit. The logic gate circuit is electrically connected to the input circuit, and has 2<SP>(n-1)</SP> input ports. At least an input port of the 2<SP>(n-1)</SP> input ports is electrically connected to a first output port of a first output unit or a second output port of the first output unit. The logic gate circuit performs a combinational function according to connections of the n output units of the input circuit and the 2<SP>(n-1)</SP> input ports of the logic gate circuit.

Description

200423404 五、發明說明(1) 發明所屬之技術領域 本發明提供一種可規劃金屬層積體電路(metal programmable integrated circuit),尤指一種可使用 單一金屬層規劃其邏輯運算模組之積體電路。 先前技術 過去,電子元件(例如電容、電阻等)係經由硬體電路 板(rigid circuit board)來進行彼此間的連接,然 而,半導體技術的發展也進一步地促進積體電路 (integrated circuit, 1C)的應用,亦即於同一半導 體製程中,不僅習知的電子元件製作於一晶片上,且所 需的接線(trace)亦同時設置於該晶片上。近年來,半 導體製程應用了次微米製程(sub-micro process)或深 次微米製程·( deepsub-micro process)的製作技術而 大幅降低接線的線寬,所以,當規劃一更複雜的電路 時,同一晶片上所能容納的元件數便可大幅地增加。過 去,由於半導體技術的限制,一個系統電路需要多個晶 片經由適當外部連接來實施一預定邏輯運算,然而,隨 著半導體製程的精進,單一晶片可容納的電路規模越來 越大,所以組成一個系統電路的複數個晶片便可經由整 合而降低所需晶片數目與外部接線數量。舉例來說,目 前業界已提出系統單晶片(System On a Chip, s〇c)的概200423404 V. Description of the invention (1) Technical field to which the invention belongs The present invention provides a metal programmable integrated circuit, in particular a integrated circuit that can use a single metal layer to plan its logic operation module. In the past, electronic components (such as capacitors, resistors, etc.) were connected to each other via a rigid circuit board. However, the development of semiconductor technology has further promoted integrated circuits (1C). In the same semiconductor process, not only the conventional electronic components are fabricated on a wafer, but the required traces are also set on the wafer at the same time. In recent years, semiconductor processes have used sub-micro process or deep sub-micro process manufacturing techniques to significantly reduce the line width of the wiring. Therefore, when planning a more complex circuit, The number of components that can be accommodated on the same wafer can be greatly increased. In the past, due to the limitation of semiconductor technology, a system circuit required multiple chips to implement a predetermined logic operation through appropriate external connections. However, with the advancement of semiconductor processes, the size of circuits that can be accommodated by a single chip has become larger and larger. A plurality of chips of the system circuit can be integrated to reduce the number of required chips and external wiring. For example, the industry has proposed an overview of System On a Chip (SOC).

200423404 五、發明說明(2) 念來實現單一晶片即為一個系統的目標。然而,如此複 雜的晶片設計需要更有效率的設計方法(meth〇d〇1〇gy^ 電腦輔助設計(computer-aided design、CAD)軟體的協、 助方得以完成。 積體電路的發展也逐漸帶動電子產品的發展,舉例來 說,原本以獨立單元出現於電路板上之電子元件改以 體電路的型式來製作,相較於過去電子元件之間以金1 f線^例如銅線)來加以連接,由於積體電路 與較窄的接線而使内部因接線所產生的寄生電容 =’二即使得積體電路運作的準確度大幅提升而優‘以 可經由半導體製程而整合於同一積胃硬,個電路 電子產品普遍朝向輕、薄、展因 ^產品的功率損耗(power dissipation)盥 成乂 ,筆記型電腦(Uptop computer)與個人,例 (personal digital assistant Pda、 &lt; 彳助理 大的重視與歡迎,因此也進一步帶’党到使用者廣 的蓬勃發展。理論上,任何電路= :攜式裝置 而形成於單一晶片上’但在實務考由,體電路製程 路的大小並不一致,其中,數位積 敗^員型積體電 最低,因此可大幅提升元件密度,而 因/、功率損耗 路,例如類比積體電路,射頻積,、他類型的積體電 藏路因其功率損耗較200423404 V. Description of the invention (2) The idea of achieving a single chip is the goal of a system. However, such a complicated chip design requires more efficient design methods (meth0d〇1〇gy ^ computer-aided design (computer-aided design, CAD) software collaboration, helpers can be completed. The development of integrated circuit is also gradually Drive the development of electronic products. For example, electronic components that originally appeared as independent units on circuit boards were changed to be made in the form of body circuits. Compared to the past, electronic components were made of gold 1 f wires (such as copper wires). Connected, because of the integrated circuit and narrow wiring, the internal parasitic capacitance generated by the wiring = 'two, which makes the accuracy of integrated circuit operation greatly improved and excellent' so that it can be integrated in the same product stomach through semiconductor processing Hard, circuit electronic products are generally oriented towards light, thin, power dissipation products, power dissipation (uptop computer) and personal, for example (personal digital assistant Pda, &lt; Attention and welcome, so it further brings 'the party to the user's extensive development. In theory, any circuit =: portable device formed on a single chip' In practical terms, the size of the body circuit process path is not consistent. Among them, the digital product has the lowest power loss, so the component density can be greatly improved, and due to the power loss circuit, such as analog integrated circuit, RF product Because of its power loss,

R7£ 第7頁 200423404 五、發明說明(3) 高或因金屬連線轉折在高頻訊號傳輸中造成能量損耗, 所以在散巧或信號傳輸的考量下無法提高其元件密度, 此外’隨著電路的改良,部份低功率而高速運作的類比 電路已與數位電路結合為混和式(Mixed-Mode)積體電 路,如上所述,積體電路已經廣泛地應用於各種電子產 品中,而如何規劃積體電路内部元件之間的接線也成為 一重要課題。 由於半導體製程的進步而擴展了積體電路的電路規模, 例如一超大型積體電路(very-large — scale integrated circuit, VLSI)的晶片設計工作已非單一工程師的人力 可以應付,因此一積體電路的製造流程進一步分化為製 程、光罩佈局、元件測試等工作。如業界所習知之佈局 獨立性(pattern independent),其係將光罩佈局的設計 與晶片實際半導體製程加以區隔,並根據所應用的半導 體製程技術(例如可容許的接線間隔)來進一步規範光 罩佈局中元件與接線的幾何配置,亦即透過習知設計規 範(design rule)來進行光罩上的圖樣(pattern广設 計,因此積體電路設計工程師便可以不需要了解實際晶 片的製造細節即可從事各式各樣積體電路晶片的設計; 同理,晶片製造者亦無需瞭解該積體電路的性能細節即 可從事製造該積體電路。由於該設計規範的使用,所以 積體電路設計工作便與半導體製程技術分離,減輕了電 路設計者與晶片製作者各別的工作負荷,因此兩者之間R7 £ Page 7 200423404 V. Description of the invention (3) High or high frequency signal transmission causes energy loss in the transmission of high-frequency signals, so the component density cannot be increased under consideration of loose or signal transmission. Circuit improvement. Some low-power and high-speed analog circuits have been combined with digital circuits into mixed-mode integrated circuits. As mentioned above, integrated circuits have been widely used in various electronic products. It is also an important issue to plan the wiring between the internal components of the integrated circuit. Due to the advancement of semiconductor manufacturing processes, the circuit scale of integrated circuits has been expanded. For example, the chip design of a very large-scale integrated circuit (VLSI) has been beyond the manpower of a single engineer, so an integrated circuit The manufacturing process of the circuit is further divided into tasks such as manufacturing process, mask layout, and component testing. As is known in the industry as pattern independence, it separates the design of the mask layout from the actual semiconductor process of the wafer, and further regulates the light according to the applied semiconductor process technology (such as the allowable wiring interval). The geometric configuration of the components and wiring in the mask layout, that is, the pattern on the mask (pattern wide design) through a known design rule, so the integrated circuit design engineer can eliminate the need to understand the actual manufacturing details of the chip. Can be engaged in the design of a variety of integrated circuit chips; Similarly, the chip manufacturer does not need to know the performance details of the integrated circuit to engage in the manufacture of the integrated circuit. Because of the use of the design specification, the integrated circuit design The work is separated from the semiconductor process technology, which reduces the separate workload of circuit designers and chip makers.

200423404 五、發明說明(4) 只要依循該設計規範的原則,積體電路的製造 可接受的良岸(yield)。 之仔到一 現今的電子產品相繼採用特定用途積體電路 (application specific integrated circuit, ASTC^ 以,高該電子產品的功能以及降低其成本,許多電腦 邊設備的產品,例如硬碟機與掃描機等,在其電路^上 均設置有各自的特定用途積體電路,該特定用途 路的目的主要是一方面更有效率地整合所需的電路,而 另一方面可以保護其使電路設計而不易被競爭者輕易地 盜拷。然而,一雛型系統(Prototype)的開發係二為該特 定用途積體電路製造的瓶頸,近年來業界都在找尋一/ ’ 快速系統雛型的製程方法,其能在短時間内製作出該系 統雛型,以便驗證該特定用途積體電路的功能以及g言玄 特定用途積體電路進行除錯,並進而縮短該特定用途^ 體電路的上市時間(tim.e-t〇 —以增加其市場競 爭力(competitiveness)。一般而言,目前積體電路只的 設計方法主要可區分為全客戶設計(full—cust〇ln design) ’ 間陣列設計(gate array design),與標準 細胞原設計(standard cell design),其中全客戶設 計指的疋積體電路佈局的工作從設計基礎的電晶體開 始,所以積體電路設計工程師從元件的尺寸,元件的位 置以及兀件間的連線等各項佈局細節均需從事設計,此 種設計方式可以獲得最佳的性能(如高運算速度與低消耗200423404 V. Description of the invention (4) As long as the principles of this design specification are followed, the manufacture of integrated circuits is acceptable for yield. Zhizai to today's electronic products have successively adopted application specific integrated circuits (ASTC ^) to increase the functionality of the electronic product and reduce its cost. Many computer-side equipment products, such as hard drives and scanners Etc., each circuit is provided with its own special-purpose integrated circuit. The purpose of the special-purpose circuit is mainly to integrate the required circuits more efficiently on the one hand, and to protect the circuit design from being difficult on the other. It was easily stolen by competitors. However, the development of a prototype system was the bottleneck for the manufacture of integrated circuits for this specific purpose. In recent years, the industry has been looking for a prototype method for rapid system prototypes. The prototype of the system can be made in a short time, in order to verify the function of the special-purpose integrated circuit and debug the special-purpose integrated circuit, and then shorten the time to market of the special-purpose integrated circuit (tim. et〇—In order to increase its market competitiveness (competitiveness). In general, the current design methods of integrated circuits can be mainly divided into full Customer design (full-cust〇ln design) 'gate array design, and standard cell design, in which all-customer design refers to the integrated circuit layout work from the design of the basic transistor Beginning, so the integrated circuit design engineer needs to design the layout details such as the size of the component, the location of the component, and the wiring between the components. This design method can obtain the best performance (such as high operation speed and low Consume

I1H 200423404 五、發明說明(5) 功率等)以及最高的元件密度(亦即最小的曰 m铰小的晶片面積而獲得最低的製u因 而,王客戶設計的方式所耗費的人力最多,^中二 局開發時間(lead time)也較久。 所而的佈 標準細胞原與閘陣列的設計方式則 工作的複雜度,其中標準細胞原的設計計 元件庫(cen library)中已設計好之小以 以拼湊成一大型的電路,因此主要的工作内 口 件模組的擺置(placement)與元件模組間的繞f 34二70 (routing)。該元件庫係由過去已開發之小型電 成,由於該元件庫内所包含之小型電路的特性 先前開發階段的驗證,因此組合後之大型雷 :^ 機率可正確地運作以及有較高的良率。此外,由二二^ 耗費的人力可大幅減少,因此開發時間亦得以大^縮而 短,美中不足的是每一元件模組的電路結構不同因此 當於一晶圓(wafer)上形成各元件模組時,各元件模組 本身需要一獨特的光罩設計,亦即需要較多的光 製。 造出所要的各種元件模組,且各元件模組之光罩設計彼 此互不相容而造成晶片製造成本較高,另外,各$件模 組的幾何尺寸並不一致,所以不容易有效地縮小晶片面 積0 晶圓鹿^ 另一方面,對於閘陣列的設計方式來說,其是一I1H 200423404 V. Description of the invention (5) Power, etc.) and the highest component density (that is, the smallest chip area with a minimum m hinge) to obtain the lowest system u. Therefore, Wang ’s design method consumes the most manpower. The second bureau also has a long lead time. The design method of the standard cell prototyping and gate array is complicated, and the standard cell prototyping design cen library has a small design. In order to make a large-scale circuit, the main work is the placement of the internal mouthpiece module and the winding of the component module f 34 to 70 (routing). The component library is a small electrical component that has been developed in the past. Due to the verification of the characteristics of the small circuit contained in the component library in the previous development stage, the combined large-scale mine: ^ probability can operate correctly and have a high yield. In addition, the manpower consumed by the second two ^ can be Significantly reduced, so development time can be greatly reduced and shortened. The disadvantage is that the circuit structure of each component module is different. Therefore, when forming each component module on a wafer, each component The group itself needs a unique photomask design, that is, it requires more light. To produce the various component modules required, and the photomask designs of each component module are incompatible with each other, resulting in higher wafer manufacturing costs. In addition, the geometrical dimensions of the modules are not consistent, so it is not easy to effectively reduce the wafer area. On the other hand, for the design method of the gate array, it is one

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200423404 五、發明說明(6) (foundry)提供固定尺寸的標準電晶體以及接線間可容許 的間距,因此該晶圓廠僅製作電晶體,亦即在晶圓上僅 形成包含有電晶體陣列的晶片半成品,但不進行各電晶 體之間所需的接線,所以該積體電路設計者便可根據該 晶圓上電晶體的硬體規格來從事各電晶體間的繞線設 計,換句話說,該積體電路設計者的主要工作係規劃 (program)該積體電路上層之金屬層(metai iayer) 的光罩佈局,然後將該光罩佈局送到該晶圓廠來進行後 續的金屬層製程以完成各電晶體間的連線,最後即可製 造出包含該積體電路的晶片,如上所述,由於各電晶體 對應相同的硬體規格,因此同一光罩可重複地用來製造 電晶體於該晶片上,因此可大幅降低生產該電晶體所需 耗費的光罩成本。 此外,於習知閘陣列的設計方式中,半導體基座經由半 導體製程而僅預先製造至接點層(contact layer),所 以該積體電路設計者必須依據該積體電路的功能來進行 光罩圖樣設計,以便該半導體製程於該接點層上形成相 對應金屬層以設置所需接線來啟動積體電路的功能 (functional ity)。然而,隨著半導體製程技術的快速 發展,積體電路中的接線線寬亦越來越窄,相對地,半 導體製程所需的光罩亦越來越精密,換句話說,光罩的 仏格會隨著半導體製程的進步而大幅上升,所以,由於 習知閘陣列技術需要多層光罩來產生金屬層上的繞線, 因此造成應用習知閘陣列技術所生產之積體電路的成本200423404 V. Description of the invention (6) (foundry) Provides standard transistors of a fixed size and allowable spacing between wirings. Therefore, the fab only manufactures transistors, that is, only the transistor arrays are formed on the wafer. The semi-finished product of the wafer, but does not perform the required wiring between the transistors, so the integrated circuit designer can design the windings between the transistors according to the hardware specifications of the transistors on the wafer, in other words The main work of the integrated circuit designer is to program the mask layout of the metal layer on the integrated circuit, and then send the mask layout to the fab for subsequent metal layers. The process is to complete the connection between the transistors, and finally a wafer containing the integrated circuit can be manufactured. As described above, since each transistor corresponds to the same hardware specification, the same photomask can be used repeatedly to manufacture the transistor. The crystal is on the wafer, so the cost of the photomask required to produce the transistor can be greatly reduced. In addition, in the conventional gate array design method, the semiconductor base is only manufactured in advance to a contact layer through a semiconductor process, so the designer of the integrated circuit must perform a photomask according to the function of the integrated circuit. The pattern is designed so that the semiconductor process forms a corresponding metal layer on the contact layer to set the required wiring to activate the functionality of the integrated circuit. However, with the rapid development of semiconductor process technology, the width of wiring lines in integrated circuits has also become narrower. In contrast, the photomasks required for semiconductor processes have become more and more precise. In other words, the grid of photomasks It will increase significantly with the progress of semiconductor processes. Therefore, because the conventional gate array technology requires multiple photomasks to generate windings on the metal layer, the cost of the integrated circuit produced by the conventional gate array technology is caused.

200423404 五、發明說明(7) 上升而影響該積體電路於市場上的競爭力。 發明内容 因此本發明之主要目的在於提供一種可使用單一金屬層 規劃其邏輯運算模組之積體電路,以解決上述問題。 本發明之申請專利範圍提供一種形成於積體電路之半導 體基座(semiconductor body)上之邏輯運算模組,其 包含有一輸入電路以及一邏輯閘電路。該輸入電路包含 有η個輸出單元,每一輸出單元電連接於一第一預定電壓 準位或該輸入電路之相對應輸入端。該邏輯閘電路係電 連接於該輸入電路,其包含有2( ηΜ)個輸入端,該2 ( η_1〕個 喷入端中至少一輸入端係電連接於該輸入電路之第一輸 出單元之第一輸出端或第二輸出端。該邏輯運算模組可 依據該輸入電路之η個輸出單元及該邏輯閘電路之2 ( η_υ個 瑜入端所電連接的位置而對應一組合邏輯函數 (combinational function) 〇200423404 V. Description of the invention (7) The rise affects the competitiveness of the integrated circuit in the market. SUMMARY OF THE INVENTION Therefore, the main object of the present invention is to provide an integrated circuit that can use a single metal layer to plan its logic operation module to solve the above problems. The patent application scope of the present invention provides a logic operation module formed on a semiconductor body of a semiconductor circuit, which includes an input circuit and a logic gate circuit. The input circuit includes n output units, and each output unit is electrically connected to a first predetermined voltage level or a corresponding input terminal of the input circuit. The logic gate circuit is electrically connected to the input circuit and includes 2 (ηM) input terminals. At least one of the 2 (η_1) injection terminals is electrically connected to the first output unit of the input circuit. The first output terminal or the second output terminal. The logic operation module may correspond to a combined logic function according to the positions of the n output units of the input circuit and 2 (n_υ Yu input terminals) of the logic circuit. combinational function) 〇

本發明之申請專利範圍另提供一種形成於積體電路之半 導體基座(semiconductor body)上之邏輯運算模組, 其包含有一輸入電路以及一邏輯閘電路。該輸入電路包 含有η個輸出單元,每一輸出單元電連接於一第—預定i電 壓準位或該輸入電路之相對應輸入端。該邏輯閘電路係 200423404 五、發明說明(8) i-l) 電連接於該輸入電路’其僅包含有2 ( η-υ個輸入端,該 】)個輸入端中之每一輸入端電連接於該第一預定電歷準 |位’一第二預定電壓準位,或者該輸入電路之第一輸出 I單元之第一輸出端或第二輸出端。其中該邏輯運算模組 丨可依據該輸入電路之η個輸出單元及該邏輯閘電路之2( |個輸入端所電連接的位置形成一組合邏輯函數 (combinational function) ° I本發明 I造複數 丨模組, |該邏輯 |說,一 I該複數 因此該 上設置 I本發明 少的水 I層中, 線。換 體電路 降低生 積體電 個運算 且邏輯 運算模 積體電 個規劃 晶圓廢 實施該 邏輯運 平軌道 便可擁 句話說 的製造 產成本The patent application scope of the present invention further provides a logic operation module formed on a semiconductor body of a semiconductor circuit, which includes an input circuit and a logic gate circuit. The input circuit package includes n output units, and each output unit is electrically connected to a first predetermined voltage level or a corresponding input terminal of the input circuit. The logic gate circuit is 200423404 V. Description of the invention (8) il) Electrically connected to the input circuit 'It only contains 2 (η-υ input terminals, each) of the input terminals are electrically connected to The first predetermined electrical calendar level | position is a second predetermined voltage level, or the first output terminal or the second output terminal of the first output I unit of the input circuit. The logic operation module 丨 can form a combined logic function according to the n output units of the input circuit and the position of the 2 (input terminals electrically connected to the logic circuit).丨 Module, | the logic | said, I, the complex number, so there should be less water in the present invention, the I layer, the line. The swap circuit reduces the productive operation of the product and the logical operation of the product. The implementation of this logical leveling track in round waste can hold the cost of manufacturing production

先經由一 上設置有 規劃節點 邏輯運算 圖樣設計 運算模組 樣設計於 需的繞線 劃節點係 製程所形 算區塊之 輯運算模 罩,因而 晶圓廠製 邏輯運算 用來規劃 模組來 即可決定 的功能, 一金屬層 。此外, 佈局於最 成的金屬 間的繞 組於該積 可大幅地 :實施方式First, a logic operation pattern is set on the planning node to design the operation module. The operation module mask is designed on the required operation pattern of the winding node system to form the block. Therefore, the fab-based logic operation is used to plan the module. You can decide the function, a metal layer. In addition, the windings laid out between the most formed metals can greatly increase:

第13頁 200423404 五、發明說明(9) 請C含中所縮然座而預中算者屬線路 參閱圖一,圖一為本發明積體電路之半導體基座 semiconductor body) 10的示意圖。半導體基座1〇包 有複數個運算區塊(bas i c un i t) 1 2,於本實施例 ,運算區塊1 2係以矩陣方式排列於半導體基座1 〇上, 以可使運算區塊1 2的設置對應較高的元件密度,亦即 小半導體基座10所需的面積而降低積體電路的尺寸。 而,運算區塊1 2亦可以其他排列方式設置於半導體基 10上,例如排列於同一行(row)或同一列(column) 形成一陣列(array)。半導體基座1 0係經由一晶圓廠 先製造,然後一積體電路設計者便可對半導體基座1 0 的每一運算區塊1 2來進行相關光罩佈局以規劃每一運 區塊1 2的繞線,最後該晶圓廠便依據該積體電路設計 所提供的光罩佈局而於半導體基座10上形成至少一金 層以設置每一運算區塊1 2實施其相對應功能所需的接 ,然後每一運算區塊1 2便可執行其功能來使該積體電 依據該積體電路設計者的設計而正常地運作。 請參閲圖二,圖二為圖一所示之運算區塊1 2的功能方塊 圖。運算區塊1 2包含有複數個邏輯運算模組1 4。本實施 例中,邏輯運算模組1 4係用來執行一邏輯函數運算,此 外,運算區塊1 2亦可包含有一驅動模組1 6以及一儲存模 組1 8。儲存模組1 8可用來執行資料儲存的功能,而驅動 模組1 6可用來驅動〆預定訊號,例如一資料訊號(dataPage 13 200423404 V. Description of the invention (9) Please refer to Figure 1 for the abbreviation of C, and refer to Figure 1. Figure 1 is a schematic diagram of the semiconductor body (semiconductor body) 10 of the integrated circuit of the present invention. The semiconductor base 10 includes a plurality of computing blocks (basic unit) 12. In this embodiment, the computing blocks 12 are arranged in a matrix on the semiconductor base 10 to enable the computing blocks. The setting of 12 corresponds to a higher element density, that is, a smaller area required for the semiconductor base 10 and a reduction in the size of the integrated circuit. In addition, the operation blocks 12 can also be arranged on the semiconductor substrate 10 in other arrangements, for example, arranged in the same row (row) or the same column (column) to form an array. The semiconductor pedestal 10 is first manufactured by a fab, and then an integrated circuit designer can perform a related photomask layout for each operation block 12 of the semiconductor pedestal 10 to plan each operation block. 1 2 winding, at last the fab will form at least one gold layer on the semiconductor base 10 according to the photomask layout provided by the integrated circuit design to set each computing block 12 to implement its corresponding function The required connection, and then each operation block 12 can perform its function to make the integrated circuit operate normally according to the design of the integrated circuit designer. Please refer to FIG. 2, which is a functional block diagram of the operation block 12 shown in FIG. 1. The operation block 12 includes a plurality of logic operation modules 14. In this embodiment, the logic operation module 14 is used to perform a logical function operation. In addition, the operation block 12 may also include a driving module 16 and a storage module 18. The storage module 18 can be used to perform data storage functions, and the drive module 16 can be used to drive a predetermined signal, such as a data signal (data

ft§3 第14頁 200423404ft§3 p. 14 200423404

=ignal或疋一時脈訊號(cl〇ck signai),亦即驅動 f ί尸可,來驅動該資料訊號或該時脈訊號,而後輸入 該資料訊號或該時脈訊號至邏輯運算模組丨4或儲存模組 或者驅動模組16亦可用來驅動邏輯運算模組14的運 鼻結果或儲存樽組1 8的儲存資料而後輸入同一運算區塊 1 2之另一邏輯運算模組i 4或另一儲存模组i 8,此外,驅 動模组16亦可用來驅動邏輯運算模組14的運算結果或儲 f模組1 8的儲存資料而後輸入另一運算區塊丨2之邏輯運 算模纟且1 4或儲存模組1 8。 請同時參閱圖二與圖三,圖三為圖二所示之邏輯運算模 組1 4的功能方塊圖。邏輯運算模組丨4包含有複數個運算 電路15a、15b,每一運算電路i5a、15 b係分別用來執行 一組合邏輯函數(combinational function),例如運 算電路15 a可包含有AND·邏輯閘,〇R邏輯閘,以及X0R邏輯 閘等構成的組合邏輯函數來對輸入運算電路1 5a的資·料進 行處理,並將處理後的運算資料輸出。本實施例申,該 積體電路設計者可經由一光罩佈局來規劃邏輯運算模組 1 4所執行的組合邏輯函數,舉例來說,邏輯運算模組1 4 包含有η個輸入端用來接收η個變數資料,而該積體電路 設計者可規劃該光罩圖樣佈局以設計邏輯運算模組1 4所 處理的變數資料與對應該變數資料的組合邏輯函數,亦 即該積體電路設計者可選取運算電路15a,其係用來處理 k個變數資料(η),或是該積體電路設計者可選取運= ignal or clOck signai, that is, driving f 尸 ke to drive the data signal or the clock signal, and then input the data signal or the clock signal to the logic operation module 丨 4 Or the storage module or the driving module 16 can also be used to drive the nose operation result of the logical operation module 14 or the storage data of the storage bottle group 18 and then enter another logical operation module i 4 of the same operation block 12 or another A storage module i 8. In addition, the driving module 16 can also be used to drive the operation result of the logical operation module 14 or the storage data of the f module 18 and then input the logical operation module of another operation block 2 and 1 4 or storage module 1 8. Please refer to FIG. 2 and FIG. 3 at the same time. FIG. 3 is a functional block diagram of the logic operation module 14 shown in FIG. The logic operation module 丨 4 includes a plurality of operation circuits 15a and 15b. Each operation circuit i5a and 15b is used to execute a combined logic function, for example, operation circuit 15a may include an AND logic gate. , Logic logic gates, logic logic gates, X0R logic gates and other combined logic functions to process the input operation circuit 15a data, and output the processed computing data. In this embodiment, the designer of the integrated circuit can plan a combined logic function executed by the logic operation module 14 through a photomask layout. For example, the logic operation module 14 includes n input terminals for Receiving n variable data, and the designer of the integrated circuit can plan the layout of the mask pattern to design a combination of the variable data processed by the logic operation module 14 and the corresponding logical function of the variable data, that is, the integrated circuit design The operator may select an operation circuit 15a, which is used to process k variable data (η), or the designer of the integrated circuit may select an operation circuit

§34 第15頁 200423404 五、發明說明(11) 算電路15b,其係用來處理k + m個變數資料(k + mg η)。 換句話说’違積體電路设計者可依據所要的組合邏輯函 數來規劃適當光罩圖樣佈局以決定邏輯運算模組i 4所要 啟動的運算電路15a或運算電路15b。請注意,本實施例 中,該晶圓廠係預先於邏輯運算模組1 4中製作各運算電 路1 5 a、1 5 b所需的基礎元件,因此該積體電路設計者僅 需使用一層光罩即可快速地設定對應該基礎元件的相關 繞線以選取邏輯運算模組14中運算電路15 a或運算電路 1 5 b所對應的組合邏輯函數。 請參閱圖四,圖四為圖二所示之邏輯運算模組14的第一. 種電路示意圖。邏輯運算模組1 4包含有一輸入電路2 0以 及一邏輯閘電路2 2。輸入電路2 0包含有複數個規劃節點 24a、24b、24c,以及複數個反相器(inverter) 25a、 25b、 25c、 26a、 26b、 26c,其中規劃節點 24a、 24b、 24c係用來規劃(program)相對應反相器25a、25b、25c 的輸入端係連接於接地電壓Gnd或是輸入訊號la、lb、§34 Page 15 200423404 V. Description of the invention (11) The arithmetic circuit 15b is used to process k + m variable data (k + mg η). In other words, the designer of the circuit of the non-integral body can plan an appropriate mask pattern layout according to the desired combinational logic function to determine the operation circuit 15a or operation circuit 15b to be started by the logic operation module i4. Please note that, in this embodiment, the wafer fab prepares the basic components required for each operation circuit 15a, 15b in the logic operation module 14 in advance, so the integrated circuit designer only needs to use one layer The photomask can quickly set the relevant windings corresponding to the basic components to select the combined logic function corresponding to the operation circuit 15 a or the operation circuit 15 b in the logic operation module 14. Please refer to FIG. 4, which is a schematic diagram of the first circuit of the logic operation module 14 shown in FIG. 2. The logic operation module 14 includes an input circuit 20 and a logic gate circuit 22. The input circuit 20 includes a plurality of planning nodes 24a, 24b, and 24c, and a plurality of inverters 25a, 25b, 25c, 26a, 26b, and 26c. The planning nodes 24a, 24b, and 24c are used for planning ( (program) The input terminals of the corresponding inverters 25a, 25b, 25c are connected to the ground voltage Gnd or the input signals la, lb,

Ic,而反相器 25a、25b、25c、26a、26b、26c主要係用 來輸出互為反相的訊號至邏輯閘電路2 2,例如反相器2 5 a 可自端點A輸出與輸入訊號I a反相的訊號I A,而反相器 26a可自端點B輸出與輸入訊號U同相的訊號IB ;若規劃 節點24a規劃接地電壓Gnd輸入反相器25a,則訊號ΙΑ、IB 當然均為接地電壓Gnd。此外,其他反相器25b、26b、 25c、26 c的運作與反相器25a、26 a相同而於此不再重複Ic, and the inverters 25a, 25b, 25c, 26a, 26b, 26c are mainly used to output signals that are inverted to each other to the logic gate circuit 2 2, for example, the inverter 2 5 a can be output and input from the terminal A The signal I a is an inverted signal IA, and the inverter 26a can output a signal IB in the same phase as the input signal U from the terminal B. If the planning node 24a plans the ground voltage Gnd to be input to the inverter 25a, of course, the signals IA and IB are both Is the ground voltage Gnd. In addition, the operation of the other inverters 25b, 26b, 25c, 26c is the same as that of the inverters 25a, 26a, and will not be repeated here.

9ΛΚ 第16頁 200423404 五、發明說明(12) 地贅述。邏輯閘電路22包含有複數個規劃節點24d、 24e、24f、24g與複數個電晶體28a' 28b,其中規劃節點 2 4d、24e、24f、24g係用來規劃輸入邏輯閘電路22的訊 號為接地電壓G n d,操作電壓V c c,訊號I A,或者訊號 IB。本實施例中,電晶體28a係為η型金屬氧化半導體電 晶體(NMOS transistor),以及電晶體28b係為ρ型金屬 氧化半導體電晶體(PMOS transistor),且複數個電晶 體2 8 a、2 8 b可經由習知互補金屬氧化半導體電晶體製程 所形成,另外,η型金屬氧化半導體電晶體與ρ型金屬氧 化半導體電晶體互相並聯(例如兩電晶體2 8 a、2 8 b)而 用來作為電晶體開關(transistor switch) 30a、30b。 因此,複數個電晶體28a、28b可依據規劃節點24d、 2 4 e、2 4 f、2 4 g的不同規劃而對應不同的組合邏輯函數。 舉例來說,規劃節點24f可規劃操作電壓Vcc輸入邏輯閘 電路2 2,規劃節點2 4 b規劃輸入訊號I b輸入邏輯閘電路 2 2,以及規劃節點2 4 c規劃輸入訊號I c輸入邏輯閘電路 2 2 ’因此電晶體開關3 0 a、3 0 b的串接電路對於輸入訊號 lb、Ic而言即為一 AND邏輯閘,亦即僅有當輸入訊號ib、 I c均為南邏輯準位1時’電晶體開關30a、30 b才會同時 導通。當電晶體開關3 0 a、3 0 b的輸出經由一反相器3 2後 產生一輸出訊號lout,亦即輸出訊號i〇ut與輸入訊號 lb、Ic之間最後會對應一 NAND邏輯運算。換句話說,圖 三之邏輯運算模組14中,可經由規劃節點24a、24b、 24c、24d、24e、24f、24g來規劃邏輯運算模組η所使用9ΛΚ page 16 200423404 V. Explanation of the invention (12). The logic gate circuit 22 includes a plurality of planning nodes 24d, 24e, 24f, 24g and a plurality of transistors 28a '28b, of which the planning nodes 24d, 24e, 24f, 24g are used to plan the signal input to the logic gate circuit 22 as ground Voltage G nd, operating voltage V cc, signal IA, or signal IB. In this embodiment, the transistor 28a is an n-type metal oxide semiconductor transistor (NMOS transistor), and the transistor 28b is a p-type metal oxide semiconductor transistor (PMOS transistor), and a plurality of transistors 2 8 a, 2 8 b can be formed by a conventional complementary metal oxide semiconductor transistor process. In addition, an η-type metal oxide semiconductor transistor and a p-type metal oxide semiconductor transistor are connected in parallel with each other (for example, two transistors 2 8 a, 2 8 b). It serves as a transistor switch 30a, 30b. Therefore, the plurality of transistors 28a and 28b can correspond to different combination logic functions according to different plans of the planning nodes 24d, 2e, 2e, and 4g. For example, the planning node 24f may plan the operating voltage Vcc input to the logic gate circuit 2 2, the planning node 2 4 b to plan the input signal I b input to the logic gate circuit 2 2, and the planning node 2 4 c to plan the input signal I c to input the logic gate Circuit 2 2 'Therefore, the series connection circuit of the transistor switches 3 0 a and 3 0 b is an AND logic gate for the input signals lb and Ic, that is, only when the input signals ib and I c are south logic standards. When the bit 1 is set, the transistor switches 30a and 30b are turned on at the same time. When the outputs of the transistor switches 30 a and 30 b pass through an inverter 32, an output signal lout is generated, that is, a NAND logic operation is finally corresponding between the output signal iout and the input signals lb and Ic. In other words, in the logical operation module 14 of FIG. 3, the logical operation module η used by the planning nodes 24a, 24b, 24c, 24d, 24e, 24f, and 24g can be planned.

R9.a 第17頁 200423404 五、發明說明(13) 的輸入訊號I a、I b、I c及對應該輸入訊號I a、I b、I c的 組合邏輯函數,因此邏輯運算模組1 4可應用於任何需要 一個輸入訊號的組合邏輯函數,任何需要兩個輸入訊號 的組合邏輯函數,以及任何需要三個輸入訊號的組合邏 輯函數。 請參閱圖五,圖五為圖二所示之邏輯運算模組14的第二 種電路示意圖。邏輯運算模組14包含有一輸入電路40以 及一邏輯閘電路42。輸入電路40包含有複數個規劃節點 44a、44b、44c、44d,以及複數個反相器45a、45b、 45c、 45d、 46a、 46b、 46c、 46d,其中規劃節點 44a、 44b、44c、44d係用來規劃相對應反相器45a、4 5b、 4 5c、45d的輸入端係連接於接地電壓Gnd或是輸入訊號 la、lb、 Ic、 Id,而反相器 45a、45b、45c、45d、46a、 46b、46c、46d則主要用來產生互為反相的訊號至邏輯閘 電路42。舉例來說,反相器45a可自端點A輸出與輸入訊 號I a反相的訊號I A,而反相器4 6 b可自端點B輸出與輸入 訊號I a同相的訊號I B,若規劃節點44a規劃接地電壓Gnd 輸入反相器45 a,則訊號I A、I B均為接地電壓Gnd。此 外,其他反相器45b、46b、45c、46c、45d、46d的運作 與反相器4 5 a、4 6 a相同而於此不再重複地贅述。邏輯閘 電路42包含有複數個規劃節點44e、44f、44g、44h、 4 4 i、4 4 j、4 4 k、4 4 1以及複數個電晶體4 8 a、4 8 b。規劃 節點 44e、 44f、 44g、 44h、 44i、 44j、 44k、 441係用來R9.a Page 17 200423404 V. Description of the invention (13) The input signals I a, I b, I c and the combined logical functions corresponding to the input signals I a, I b, I c, so the logic operation module 1 4 It can be applied to any combinational logic function that requires one input signal, any combinational logic function that requires two input signals, and any combinational logic function that requires three input signals. Please refer to FIG. 5, which is a schematic diagram of the second circuit of the logic operation module 14 shown in FIG. 2. The logic operation module 14 includes an input circuit 40 and a logic gate circuit 42. The input circuit 40 includes a plurality of planning nodes 44a, 44b, 44c, and 44d, and a plurality of inverters 45a, 45b, 45c, 45d, 46a, 46b, 46c, and 46d. The planning nodes 44a, 44b, 44c, and 44d are related to each other. The input terminals for planning the corresponding inverters 45a, 4 5b, 4 5c, 45d are connected to the ground voltage Gnd or the input signals la, lb, Ic, Id, and the inverters 45a, 45b, 45c, 45d, 46a, 46b, 46c, and 46d are mainly used to generate signals that are in antiphase to each other to the logic gate circuit 42. For example, the inverter 45a can output the signal IA inverted from the input signal I a from the terminal A, and the inverter 4 6 b can output the signal IB in phase with the input signal I a from the terminal B. The node 44a plans the ground voltage Gnd to be input to the inverter 45a, and the signals IA and IB are both ground voltage Gnd. In addition, the operation of the other inverters 45b, 46b, 45c, 46c, 45d, and 46d is the same as that of the inverters 4 5a and 4 6a and will not be repeated here. The logic gate circuit 42 includes a plurality of planning nodes 44e, 44f, 44g, 44h, 4 4i, 4 4 j, 4 4 k, 4 4 1 and a plurality of transistors 4 8 a, 4 8 b. Planning nodes 44e, 44f, 44g, 44h, 44i, 44j, 44k, 441 are used to

200423404200423404

規劃輸入邏輯閘電路42的訊號為接地電壓Gnd,操作電壓 Vcc,訊號IA,或者訊號IB。本實施例中,電晶體28&amp;係 為π型金屬氧化半導體電晶體,以及電晶體28b係為p型金 屬氧化半導體電晶體,且複數個電晶體28a、28b可經由 習知互補金屬氧化半導體電晶體製程所形成,另外,〇型 金屬氧化半導體電晶體與p型金屬氧化半導體電晶體互相 並聯(例如兩電晶體48a、48b)而用來作為電晶體開 關。 圖五所示之邏輯運舁模組1 4與圖四所示之邏輯運算模組 1 4的電路架構類似,主要的不同之處在於圖五所示之邏 輯運异模組1 4最多可接收四個輸入訊號,並依據該四個 輸入號來規劃所需的組合邏輯函數,而圖二所示之邏 輯運舁模組1 4最多僅可接收三個輸入訊號,並依據該三 個輸入訊號來規劃所需的組合邏輯函數。對於圖四所示 之邏輯運鼻模組1 4來說’規劃節點2 4 c係對應於兩個電晶 體開關’而另一規劃卽點2 4 b則對應於四(亦即2 9個電 晶體開關,因此圖三所示之邏輯運算模組丨4必須使用四 個規劃節點24d、24e、24f、24g來控制對應規劃節點24b 之相對應四個電晶體開關;對於圖五所示之邏輯運算模 組1 4來說,規劃節點4 4 d係對應於兩個電晶體開關,另一 規劃節點44c則對應於四(亦即2 Ο個電晶3體^關,而另 一規劃節點44b則對應於八(亦即2 3)個電晶體開關,因 此圖四所示之邏輯運算模組1 4必須使用八個規割節點The signal of the input logic gate circuit 42 is planned to be a ground voltage Gnd, an operating voltage Vcc, a signal IA, or a signal IB. In this embodiment, the transistor 28 &amp; is a π-type metal oxide semiconductor transistor, and the transistor 28b is a p-type metal oxide semiconductor transistor, and the plurality of transistors 28a, 28b may be passed through a conventional complementary metal oxide semiconductor transistor. It is formed by a crystal process. In addition, a 0-type metal oxide semiconductor transistor and a p-type metal oxide semiconductor transistor are connected in parallel with each other (for example, the two transistors 48a and 48b) and are used as a transistor switch. The logical operation module 14 shown in FIG. 5 is similar to the logical operation module 14 shown in FIG. 4 in the circuit structure. The main difference is that the logical operation module 14 shown in FIG. 5 can receive at most. Four input signals, and the required combinational logic function is planned according to the four input signals. The logic operation module 14 shown in Figure 2 can only receive up to three input signals, and according to the three input signals To plan the required combinational logic function. For the logic nose module 14 shown in Fig. 4, 'planning node 2 4 c corresponds to two transistor switches' and the other planning point 2 4 b corresponds to four (that is, 29 electric circuits). Crystal switch, so the logic operation module shown in Figure 3 must use four planning nodes 24d, 24e, 24f, and 24g to control the corresponding four transistor switches corresponding to planning node 24b. For the logic shown in Figure 5, For the computing module 14, planning node 4 4 d corresponds to two transistor switches, and the other planning node 44 c corresponds to four (that is, 20 transistors 3 bodies, and the other planning node 44 b Corresponding to eight (ie, 2 3) transistor switches, so the logic operation module 14 shown in Figure 4 must use eight cut nodes

200423404 五、發明說明(15) 44e、44f、44g、44h、44i、44j、44k、441 來控制對應 規劃節點44b之相對應八個電晶體開關。換句話說,本實 施例中,邏輯運算模組1 4每增加一個輸入訊號,邏輯運 算模組1 4之邏輯閘電路所需之規劃節點亦需增加兩倍以 便可規劃邏輯運算模組1 4所執行之組合邏輯函數,亦即 若邏輯運算模組1 4可處理η個輸入訊號,則其邏輯閘電路 所需之規劃節點數目即為2 ( η_υ。综合上述,本發明邏輯 運算模組1 4並未侷限輸入訊號的數量,亦即其可處理η個 輸入訊號所對應的各種組合邏輯函數,舉例來說,圖五 所示之邏輯運算模組14可經由規劃節點24a、24b、24c、 24d、24e、24f、24g、24h、24i、24j、24k、241來實現 · 對應一個輸入訊號、二個輸入訊號、三個輸入訊號、或 四個輸入訊號的任意組合邏輯函數。 請同時參閱圖六,圖七,圖八,以及圖九。圖六係為圖 四所示之邏輯運算模組1 4的第一佈局圖,圖七係為圖四 所示之邏輯運算模組1 4的第二佈局圖,圖八係為圖四所 示之邏輯運算模組14的第三佈局圖,以及圖九係為圖四 所示之邏輯運算模組1 4的第四佈局圖。如圖六所示,圖 四所示之邏輯運算模組1 4的第一佈局圖係為一元件層, 其包含有氧化層(oxide) 92,多晶石夕(polysilicon) W 94,連接墊(contact) 96,以及 η型井(η-well) 98, 而於該元件層之上層則逐一設置有第一金屬層(顯示於 第二佈局圖),第二金屬層(顯示於第三佈局圖),以200423404 V. Description of the invention (15) 44e, 44f, 44g, 44h, 44i, 44j, 44k, 441 to control the corresponding eight transistor switches corresponding to the planning node 44b. In other words, in this embodiment, each time an input signal is added to the logic operation module 14, the planning node required for the logic gate circuit of the logic operation module 14 also needs to be doubled so that the logic operation module 14 can be planned. The combined logic function that is executed, that is, if the logic operation module 14 can process n input signals, the number of planned nodes required by its logic gate circuit is 2 (η_υ. In summary, the logic operation module 1 of the present invention 4 does not limit the number of input signals, that is, it can process various combined logic functions corresponding to n input signals. For example, the logic operation module 14 shown in FIG. 5 can be passed through the planning nodes 24a, 24b, 24c, 24d, 24e, 24f, 24g, 24h, 24i, 24j, 24k, 241 to achieve · Corresponds to one input signal, two input signals, three input signals, or any combination of four input signals. See also the figure 6, Figure 7, Figure 8, and Figure 9. Figure 6 is the first layout of the logical operation module 14 shown in Figure 4, and Figure 7 is the first layout of the logical operation module 14 shown in Figure 4. Second layout, figure eight FIG. 4 is a third layout diagram of the logic operation module 14 shown in FIG. 4, and FIG. 9 is a fourth layout diagram of the logic operation module 14 shown in FIG. 4. As shown in FIG. 6, FIG. The first layout of the logic operation module 14 is an element layer, which includes an oxide layer 92, polysilicon W 94, a contact pad 96, and an n-type well (η -well) 98, and a layer above the element layer is provided with a first metal layer (shown in the second layout diagram) and a second metal layer (shown in the third layout diagram) one by one.

SS9 第20頁 200423404 五、發明說明(16) 及第三金屬層(顯示於第四佈局圖)來進行繞線的規 劃。於該第一、二金屬層中分別包含有繞線1 〇 〇、2 0 〇來 定義邏輯運算模組14中各元件的基礎連接,而於第三金 屬層中則設置有對應各規劃節點24a、24b、24c、24d、 24e、24f、24g,接地電壓Gnd,以及操作電壓vcc的連接 墊。本發明積體電路之半導體基座1 〇係經由一晶圓廠預 先依據上述第一至第四佈局圖來製作邏輯運算模組14, 因此一積體電路設計者便可依據邏第三金屬層上之各規 劃節點 24a、 24b、 24c、 24d、 24e、24f、 24g,接地電壓SS9 Page 20 200423404 V. Description of the invention (16) and the third metal layer (shown in the fourth layout diagram) to plan the winding. The first and second metal layers respectively include windings 100 and 200 to define the basic connection of each element in the logic operation module 14, and the third metal layer is provided with corresponding planning nodes 24a. , 24b, 24c, 24d, 24e, 24f, 24g, connection pads for ground voltage Gnd, and operating voltage vcc. The semiconductor pedestal 10 of the integrated circuit of the present invention is prepared in advance by a wafer fab according to the first to fourth layout diagrams described above, so that a designer of an integrated circuit can design a third metal layer based on logic. Each of the planning nodes 24a, 24b, 24c, 24d, 24e, 24f, 24g, ground voltage

Gnd,以及操作電壓Vcc的連接墊來定義邏輯運算模組i4 所實施的組合邏輯函數。請參閱圖四與圖十,圖十為圖 九所示之第四佈局圖上之第三金屬層30 0的示意圖。第三 金屬層30 0包含有複數個連接墊l〇6a、106b、106c、 106d、 10 6e、 106卜 106g、 107a、 107b 、107c、 107d、 107e、 107卜 107g、 107h、 107卜 107 j ,其中連接墊 106a、 106b、 10 6c、 106d、 106e' 106f 、1 0 6 g對應於各 規劃節點2 4 a、 24b、 24c、 24d、24e、24f、24g,連接墊 107a、 107b、 107 j則對應接地電壓 Gnd, 連接墊107 i則對 應操作電壓Vcc,連接墊107d、107f、107h對應端點B, 以及連接墊1 0 7e、1 0 7g則對應端點A。另外,連接墊1 〇 7c 則用來作為一輸出端以輸出該輸出訊號lout。 如圖四所示,規劃節點2 4a係用來規劃輸入一輸入訊號I a 或一接地電壓Gnd,因此第三金屬層3 0 0上對應規劃節點Gnd and the connection pad of the operating voltage Vcc define the combinational logic function implemented by the logic operation module i4. Please refer to FIG. 4 and FIG. 10. FIG. 10 is a schematic diagram of the third metal layer 300 on the fourth layout shown in FIG. The third metal layer 300 includes a plurality of connection pads 106a, 106b, 106c, 106d, 106e, 106b, 106g, 107a, 107b, 107c, 107d, 107e, 107b, 107g, 107h, 107b, 107j, Among them, the connection pads 106a, 106b, 10 6c, 106d, 106e ', 106f, and 10g correspond to the planning nodes 24a, 24b, 24c, 24d, 24e, 24f, and 24g, and the connection pads 107a, 107b, and 107j are Corresponds to the ground voltage Gnd, the connection pad 107 i corresponds to the operating voltage Vcc, the connection pads 107d, 107f, and 107h correspond to the terminal B, and the connection pads 10 7e and 107g correspond to the terminal A. In addition, the connection pad 107c is used as an output terminal to output the output signal lout. As shown in FIG. 4, the planning node 24a is used to plan an input signal Ia or a ground voltage Gnd, so the corresponding planning node on the third metal layer 300

RQQ 第21頁 200423404 五、發明說明(17) 2 4 a之連接墊106a可用來接收該輸入訊號Ia,或經由一光 罩圖樣設計以經由另一半導體製程而形成連接墊1 〇 6 3與 連接墊107a (對應接地電壓Gnd)之間的繞線。同樣地, 對於規劃節點24g而言,其可規劃接地電壓Gnd,操作電 壓V c c ’端點A ’或端點B連接邏輯閘電路22,因此第三金 屬層3 0 0上之相對應連接墊1 0 6 g可經由該光罩圖樣設計而 經由後續半導體製程來形成連接墊1 0 6 g與連接墊1 〇 7 i (對應操作電壓Vcc)、連接墊107d (對應端點B)、連 接墊107e (對應端點A)、或連接墊107 j (對應接地電壓 Gnd)之間的繞線。關於對應其他規劃節點24b、24c、 24d、24e、24f 之連接墊 106b、106c、106d、106e、106f 來說,其繞線的設置原理均連接墊1 0 6 g (對應規劃節點 2 4 a)相同,因此在此不再重複贅述。本實施例中,對應 規劃節點2 4 a、2 4 b、2 4 c之連接墊1 0 6 a、1 0 6 b、1 0 6 c係設 置於第三金屬層3 0 0上同一水平軌道,而對應規劃節點 24d、24e、24f、24g 之連接墊 106d、106e、106f、106g 亦設置於第三金屬層300上同一水平軌道,因此第三金屬 層3 0 0僅使用四個水平軌道即可設置對應於規劃節點,接 地電壓,操作電壓,及端點A、B的連接墊。因此,第三 金屬層30 0本身金屬層便可擁有較大空間來設置運算區塊 1 2中邏輯運算模組1 4,驅動模組1 6,以及儲存模組1 8之 間的繞線。此外,本實施例中,僅需使用一層光罩即可 規劃邏輯運算模組1 4的組合邏輯函數,因此對於應用半 導體基座10的積體電路而言,製造該積體電路所需光罩RQQ Page 21 200423404 V. Description of the invention (17) The connection pad 106a of 2 4 a can be used to receive the input signal Ia, or can be designed through a photomask pattern to form a connection pad through another semiconductor process 106 and connection Winding between pads 107a (corresponding to ground voltage Gnd). Similarly, for the planning node 24g, the planned ground voltage Gnd, the operating voltage V cc 'end A' or end B are connected to the logic gate circuit 22, so the corresponding connection pads on the third metal layer 300 1 0 6 g can be formed through the photoresist pattern design and subsequent semiconductor processes to form a connection pad 1 0 6 g and a connection pad 1 07i (corresponding to the operating voltage Vcc), a connection pad 107d (corresponding to the end point B), and a connection pad 107e (corresponds to terminal A), or the connection between 107j (corresponds to ground voltage Gnd). For the connection pads 106b, 106c, 106d, 106e, and 106f corresponding to other planning nodes 24b, 24c, 24d, 24e, and 24f, the winding setting principles are all connected to the pad 1 0 6 g (corresponding to the planning node 2 4 a) It is the same, so it will not be repeated here. In this embodiment, the connection pads 1 0 6 a, 10 6 b, 1 0 6 c corresponding to the planning nodes 2 4 a, 2 4 b, 2 4 c are arranged on the same horizontal track on the third metal layer 3 0 0 , And the connection pads 106d, 106e, 106f, and 106g corresponding to the planning nodes 24d, 24e, 24f, and 24g are also arranged on the same horizontal track on the third metal layer 300, so the third metal layer 300 uses only four horizontal tracks, ie Connection pads corresponding to the planning node, ground voltage, operating voltage, and endpoints A and B can be set. Therefore, the third metal layer 300 itself can have a larger space for setting the wiring between the logic operation module 14 in the computing block 12, the driving module 16 and the storage module 18. In addition, in this embodiment, only one layer of mask is needed to plan the combined logic function of the logic operation module 14. Therefore, for an integrated circuit using the semiconductor base 10, a mask required for manufacturing the integrated circuit

第22頁 200423404 五、發明說明(18) 的成本可大幅地降低。 本發明積體電路之半導體基座上係預先經由一晶圓廠製 造複數個運算區塊,而每一運算區塊上設置有邏輯運算 模組,而邏輯運算模組包含有複數個規劃節點。因此, 對於邏輯運算模組來說,一積體電路設計者僅需一層光 罩圖樣設計即可規劃邏輯運算模組的功能,因此當該晶 圓廠依據該光罩圖樣設計即可於另一金屬層上完成實施 該邏輯運异模組之功能所需的繞線。此外,本發明邏輯 運算模組中,該複數個規劃節點係佈局於最少的水平軌 道中,因此於同一金屬層中,便可擁有較大空間來設置 各運异區塊之間所需的繞線。換句話說,本發明積體電 路之邏輯運算模組於該積體電路的製造過程中可使用較 少的光罩’因而大幅地降低生產成本。此外,本發明積 體電路之邏輯運算模組可應用習知特定用途積體電路的 没什流耘(des i gn f 1 〇w)·來進行邏輯運算模組的相關邏 輯合成(synthesis),時序修正,以及自動化佈局等操 作,因此當依據具有本發明邏輯運算模組之半導體基座· 來設計一積體電路時,不需修改習知特定用途積體電路 的設計流程,所以本發明邏輯運算模組便可透過習知設 計流程而輕易地實作。 以上所述僅為本發明之較佳實施例,凡依本發明申請專 利範圍所做之均等變化與修飾,皆應屬本發明專利之涵Page 22 200423404 V. Description of the invention (18) The cost can be greatly reduced. The semiconductor base of the integrated circuit of the present invention is manufactured in advance with a plurality of arithmetic blocks through a wafer fab. Each arithmetic block is provided with a logic operation module, and the logic operation module includes a plurality of planning nodes. Therefore, for a logic operation module, an integrated circuit designer only needs one layer of mask design to plan the function of the logic operation module. Therefore, when the fab is designed based on the mask pattern, it can be used in another The windings on the metal layer to complete the functions of the logic operation module are implemented. In addition, in the logic operation module of the present invention, the plurality of planning nodes are arranged in a minimum horizontal orbit, so that in the same metal layer, there can be a large space to set the required routing between different transport blocks. line. In other words, the logic operation module of the integrated circuit of the present invention can use fewer photomasks' in the manufacturing process of the integrated circuit, thereby greatly reducing the production cost. In addition, the logic operation module of the integrated circuit of the present invention may apply des i gn f 1 0w of the integrated circuit of a specific application, to perform related logic synthesis of the logical operation module. Timing correction, and automatic layout operations, so when designing an integrated circuit based on the semiconductor base with the logical operation module of the present invention, there is no need to modify the design flow of the integrated circuit of a specific purpose, so the logic of the present invention The computing module can be easily implemented through the conventional design process. The above description is only a preferred embodiment of the present invention. Any equivalent changes and modifications made in accordance with the scope of the patent application for the present invention shall all belong to the scope of the invention patent.

200423404 五、發明說明(19) 蓋範圍。200423404 V. Description of the invention (19) Cover range.

II

Bill 第24頁 200423404 圖式簡單說明 圖式之簡單說明 圖為本發明,體電路之半導體基座的示意圖。 圖亡,圖一所示之運算區塊的功能方塊圖。 圖二為圖,所示之邏輯運算模組的功能方塊圖。 圖四為圖二所示之邏輯運算模組的第一種電路示意圖。 圖五為圖二所示之邏輯運算模組的第二種電路示意圖。 圖六係為圖四所示之邏輯運算模組的第一佈局圖。 圖七係為圖四所示之邏輯運算模組的第二佈局圖。 圖八係為圖四所示之邏輯運算模組的第三佈局圖。 圖九係為圖四所示之邏輯運算模組的第四佈局圖。 圖十為圖九所示之第四佈局圖上之第三金屬層的示意 圖。 圖式之Γ符號說明Bill Page 24 200423404 Brief description of the drawings Brief description of the drawings The figure is a schematic diagram of a semiconductor base of a bulk circuit according to the present invention. Figure 1 is a functional block diagram of the operation block shown in Figure 1. Figure 2 is a functional block diagram of the logic operation module shown in the figure. FIG. 4 is a schematic diagram of a first circuit of the logic operation module shown in FIG. 2. FIG. 5 is a schematic diagram of a second circuit of the logic operation module shown in FIG. 2. FIG. 6 is a first layout diagram of the logic operation module shown in FIG. 4. FIG. 7 is a second layout diagram of the logic operation module shown in FIG. 4. FIG. 8 is a third layout diagram of the logic operation module shown in FIG. 4. FIG. 9 is a fourth layout diagram of the logic operation module shown in FIG. 4. FIG. 10 is a schematic view of the third metal layer on the fourth layout shown in FIG. Explanation of the Γ symbol of the schema

10 半導體 基座 12 運算區塊 14 邏輯運 算模組 16 驅動模組 18 儲存模 組 15a、 15b 運 算電 路 20' 40 輸 入電路 22 ^ 42 邏輯 閘電 路 24a 、24b、 24c、 24d、 24e 24f、 24g、 44a 、44b、 44c ' 44d、 44d、44e、 44f 44g、 44h、 44i 、4 4 j、4 4 k 規劃 節點 25a 、25b、 2 5 c、 2 6 a、 26b 26c' 45a' 45b 、45c、 594 第25頁 200423404 圖式簡單說明 45d、46a、46b、46c、46d 反相器 28a、 28b、 48a、 48b 電晶體 9 2 氧化層 9 4 多晶矽 96、 106a、 106b、 106c、 106d、 106e、 106f、 106g、 107a、 107b、 107c、 107d、 107e、 107f、 l〇7g、 l〇7h、 1 0 7 i、1 0 7 j 連接墊 98 n型井10 Semiconductor base 12 Calculation block 14 Logic operation module 16 Drive module 18 Storage module 15a, 15b Operation circuit 20 '40 Input circuit 22 ^ 42 Logic gate circuit 24a, 24b, 24c, 24d, 24e 24f, 24g, 44a, 44b, 44c '44d, 44d, 44e, 44f 44g, 44h, 44i, 4 4j, 4 4 k Planning nodes 25a, 25b, 2 5 c, 2 6 a, 26b 26c' 45a '45b, 45c, 594 Page 25 200423404 Brief description of the diagram 45d, 46a, 46b, 46c, 46d Inverter 28a, 28b, 48a, 48b Transistor 9 2 Oxide 9 9 Polycrystalline silicon 96, 106a, 106b, 106c, 106d, 106e, 106f, 106g, 107a, 107b, 107c, 107d, 107e, 107f, 107g, 107h, 107i, 107j connection pads 98n wells

第26頁 855Page 855

Claims (1)

200423404200423404 六、申請專利範圍 1.一種形成於積體電路之半導體基座(semiconductor body)上之邏輯運算模組,其包含有: 一輸入電路,其包含有n個輸出單元,每一輸出單元電連 接於一第一預定電壓準位或該輸入電路之相對應輸入 端;以及 一邏輯閘電路,電連接於該輸入電路,其包含有2( ηΜ)個 輸入端,該2 ( ηΜ)個輸入端令至少一輸入端係電連接於該 輸入電路之第一輸出單元之第一輸出端或第二輸出端; 其中該邏輯運鼻模組可依據該輸入電路之η個輸出單元及 該邏輯閘電路之2 ( 個輸入端所電連接的位置而對應一 組合邏輯函數(combinational function) 。 塊 區 算 運。 個組 第數模 圍複算 範有運· 利含輯 專包邏 請座一 申基少 如體至 2導有 半 該 中 其 組 模 算 ^1 輯 邏 之 述 所 項 置 設 塊 區 算 邊 I 每 且 3 ·如申請專利範圍第1項所述之邏輯運算模組,其係使用 一層光罩(photomask)形成該_輸出單元與該2 ( η-υ個 輸入端之接線(trace)以執行該組合邏輯函數。 4 ·如申請專利範圍第1項所述之邏輯運算模組,其中該邏 輯閘電路包含有複數個金屬氧化半導體電晶體(M〇s transistor) °6. Scope of patent application 1. A logic operation module formed on a semiconductor body of a semiconductor circuit, which includes: An input circuit including n output units, each output unit is electrically connected At a first predetermined voltage level or a corresponding input terminal of the input circuit; and a logic gate circuit electrically connected to the input circuit, which includes 2 (ηΜ) input terminals, and the 2 (ηΜ) input terminals The at least one input terminal is electrically connected to the first output terminal or the second output terminal of the first output unit of the input circuit; wherein the logic nose module can be based on the n output units of the input circuit and the logic gate circuit. No. 2 (the position of the input terminals electrically connected corresponds to a combinatorial function. Block calculation and operation. Each group of digital and analogue complex calculations has operation It is as few as two to two. It has half of its group modulo calculation. ^ 1 Set the block calculation side I in the description of the logic I each and 3. · As the logical operation module described in the first scope of the patent application, it is use A layer of photomask forms a trace between the _ output unit and the 2 (η-υ input terminals) to execute the combined logic function. 4 · The logic operation module described in item 1 of the scope of patent application, The logic gate circuit includes a plurality of metal oxide semiconductor transistors (Mos transistor) ° 第27頁 200423404 六、申請專利範圍 5 ·如申請專利範圍第4項所述之邏輯運算模組,其中該邏 輯閘電路係經由一互補金屬氧化半導體電晶體(CMOS) 製程所製造。 6 ·如申請專利範圍第1項所述之邏輯運算模組,其中該第 一預定電塵準位係為一接地電壓(ground voltage)。 7·—種形成於積體電路之半導體基座(semiconductor body)上之邏輯運算模組,其包含有: 一輸入電路,其包含有η個輸出單元,每一輸出單元電連 接於一第一預定電壓準位或該輸入電路之相對應輸入 端;以及 一邏輯閘電路,電連接於該輸入電路,其僅包含有2( η_υ 個輸入端,該2 ( 個輸入端中之每一輸入端電連接於該 第一預定電壓準位,一·第二預定電壓準位,或者該輸入 電路之第一輸出單元之第一輸出端或第二輸出端.; 其中該邏輯運算模組可依據該輸入電路個輸出單元及 該邏輯閘電路之2 (&quot;-〖Μ固輸入端所電連接的位置形成一組 合邏輯函數(combinational function)。 8·如申請專利範圍第7項所述之邏輯運算模組,其中該半 導體基座包含有複數甸運算區塊,且每一運算區塊設置 有至少一邏輯運算模組。Page 27 200423404 6. Scope of patent application 5 · The logic operation module as described in item 4 of the scope of patent application, wherein the logic gate circuit is manufactured through a complementary metal oxide semiconductor transistor (CMOS) process. 6. The logic operation module according to item 1 of the scope of patent application, wherein the first predetermined electric dust level is a ground voltage. 7 · —A logic operation module formed on a semiconductor body of a semiconductor circuit, including: an input circuit including n output units, each output unit is electrically connected to a first A predetermined voltage level or a corresponding input terminal of the input circuit; and a logic gate circuit electrically connected to the input circuit, which includes only 2 (η_υ input terminals, each of the 2 (input terminals) Electrically connected to the first predetermined voltage level, a second predetermined voltage level, or the first output terminal or the second output terminal of the first output unit of the input circuit; wherein the logic operation module may be based on the The output unit of the input circuit and the logic gate circuit 2 (&quot;-[The position of the M solid input terminal is electrically connected to form a combined logical function (combinational function). 8. The logical operation described in item 7 of the scope of patent application A module, wherein the semiconductor base includes a plurality of arithmetic operation blocks, and each operation block is provided with at least one logical operation module. 200423404 六、申請專利範圍 9.如申請專利範圍第7項所述之邏輯運算模組,其係使用 一光罩(photomask)形成該η個輸出單元與該2( n_1)個輸 入端之接線(trace)以執行該組合邏輯函數。200423404 6. Scope of patent application 9. The logic operation module described in item 7 of the scope of patent application, which uses a photomask to form the wiring between the n output units and the 2 (n_1) input terminals ( trace) to execute the combinational logic function.
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Publication number Priority date Publication date Assignee Title
US10141335B2 (en) 2006-03-09 2018-11-27 Tela Innovations, Inc. Semiconductor CIP including region having rectangular-shaped gate structures and first metal structures
US10217763B2 (en) 2006-03-09 2019-02-26 Tela Innovations, Inc. Semiconductor chip having region including gate electrode features of rectangular shape on gate horizontal grid and first-metal structures of rectangular shape on at least eight first-metal gridlines of first-metal vertical grid
US9859277B2 (en) 2006-03-09 2018-01-02 Tela Innovations, Inc. Methods, structures, and designs for self-aligning local interconnects used in integrated circuits
US10141334B2 (en) 2006-03-09 2018-11-27 Tela Innovations, Inc. Semiconductor chip including region having rectangular-shaped gate structures and first-metal structures
US9917056B2 (en) 2006-03-09 2018-03-13 Tela Innovations, Inc. Coarse grid design methods and structures
US10230377B2 (en) 2006-03-09 2019-03-12 Tela Innovations, Inc. Circuitry and layouts for XOR and XNOR logic
US9905576B2 (en) 2006-03-09 2018-02-27 Tela Innovations, Inc. Semiconductor chip including region having rectangular-shaped gate structures and first metal structures
US10186523B2 (en) 2006-03-09 2019-01-22 Tela Innovations, Inc. Semiconductor chip having region including gate electrode features formed in part from rectangular layout shapes on gate horizontal grid and first-metal structures formed in part from rectangular layout shapes on at least eight first-metal gridlines of first-metal vertical grid
TWI623845B (en) * 2007-03-05 2018-05-11 泰拉創新股份有限公司 Semiconductor chip
US10074640B2 (en) 2007-03-05 2018-09-11 Tela Innovations, Inc. Integrated circuit cell library for multiple patterning
US10734383B2 (en) 2007-10-26 2020-08-04 Tela Innovations, Inc. Methods, structures, and designs for self-aligning local interconnects used in integrated circuits
US10461081B2 (en) 2007-12-13 2019-10-29 Tel Innovations, Inc. Super-self-aligned contacts and method for making the same
US9871056B2 (en) 2008-03-13 2018-01-16 Tela Innovations, Inc. Semiconductor chip including integrated circuit having cross-coupled transistor configuration and method for manufacturing the same
US10020321B2 (en) 2008-03-13 2018-07-10 Tela Innovations, Inc. Cross-coupled transistor circuit defined on two gate electrode tracks
US10651200B2 (en) 2008-03-13 2020-05-12 Tela Innovations, Inc. Cross-coupled transistor circuit defined on three gate electrode tracks
US10658385B2 (en) 2008-03-13 2020-05-19 Tela Innovations, Inc. Cross-coupled transistor circuit defined on four gate electrode tracks
US10727252B2 (en) 2008-03-13 2020-07-28 Tela Innovations, Inc. Semiconductor chip including integrated circuit having cross-coupled transistor configuration and method for manufacturing the same
US10446536B2 (en) 2009-05-06 2019-10-15 Tela Innovations, Inc. Cell circuit and layout with linear finfet structures
TWI616764B (en) * 2011-11-22 2018-03-01 邁威爾世界貿易有限公司 Layouts for memory and logic circuits in a system-on-chip

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