TW200422418A - Method of bonding sputtering target materials - Google Patents

Method of bonding sputtering target materials Download PDF

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Publication number
TW200422418A
TW200422418A TW092127195A TW92127195A TW200422418A TW 200422418 A TW200422418 A TW 200422418A TW 092127195 A TW092127195 A TW 092127195A TW 92127195 A TW92127195 A TW 92127195A TW 200422418 A TW200422418 A TW 200422418A
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TW
Taiwan
Prior art keywords
scope
target
patent application
item
support plate
Prior art date
Application number
TW092127195A
Other languages
Chinese (zh)
Inventor
Charles E Wickersham Jr
Original Assignee
Cabot Corp
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Publication date
Application filed by Cabot Corp filed Critical Cabot Corp
Publication of TW200422418A publication Critical patent/TW200422418A/en

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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32Gas-filled discharge tubes
    • H01J37/34Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3411Constructional aspects of the reactor
    • H01J37/3435Target holders (includes backing plates and endblocks)
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target
    • C23C14/3414Metallurgical or chemical aspects of target preparation, e.g. casting, powder metallurgy

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

A method of forming a sputtering target is described that involves bonding a backing plate onto a casement having one or more recesses that contain target material to form a bonded target. During the bonding process, the bonded target is optionally vacuum sealed within the recess. The bonded target is then optionally annealed while under vacuum to form an annealed sputtering target. The sputtering target can then be retrieved by removing at least a portion of the casement from the sputtering target in one or several steps. Also described is a casement having one or more recesses containing bonded target material that is optionally vacuum sealed in the casement. The casement, as well as the backing plate that is optionally bonded onto the casement, are further described as well as other options and methods.

Description

200422418 玖、發明說明: 【發明所屬之技術領域】 本申請案申請專利範圍在先前2002年1〇月i曰 國臨時專刹由& & # , 。月的美 專利申 h 木號 60/415,272 之 35 U.S.C. §119(e)之 下,及2003年2月25日申請的美國臨時專利申浐安 6〇/449,783,其全部皆併入本文中做參考。 卞 【先前技術】 本發明關於濺鍍靶材及其他金屬物件。更特別地 明關於黏結各種不同的金屬在—起的方法.以形成黏結㈣ 靶材及其他黏結的金屬物件。 1 有許多種技術用來黏結兩金屬在一起,如擴散黏結,爆 炸為結及其心4 m >這些製程包括—滅鍍料或 未加工的靶材黏結在一支撐板上及在一個時間製作一靶材 組件。不用說,在-個時間黏結—支樓板在—㈣上可能 相田費日^•及浪費成本以及進_步可能導致品管的不—致。 進一步,黏結的靶材為了各種理由常要退火’如為了肖 除黏結期間產生在黏結材料中的機械應力,為了材料微結 構的結晶〖,及通常為了達到濺㈣材組件所需的冶金性 質。典型地’在真空下、鈍氣中、或兩者中實施退火,以 避免在退火製程中引人雜質到黏結的材料中(例如,從氧化 中)。真空退火是相當地具能源效益。 據此,為了節省時間及製造黏結濺鍍靶材的成本,需要 改進黏結製程的方法及其他金屬物件。 【發明内容】200422418 发明, Description of the invention: [Technical field to which the invention belongs] The scope of patent application for this application was previously on October 2002, i.e. the national temporary special brake & &#,. U.S. Patent Application No. 60 / 415,272, 35 U.S.C. §119 (e) and US Provisional Patent Application No. 60 / 449,783 filed on February 25, 2003, all of which are incorporated herein by reference.先前 [Prior art] The present invention relates to sputtering targets and other metal objects. More specifically, it explains how to bond different metals together to form bonded targets and other bonded metal objects. 1 There are many techniques used to bond two metals together, such as diffusion bonding, explosion to the knot and its core 4 m > These processes include-extinguishing plating or raw target bonding on a support plate and at a time Make a target assembly. Needless to say, bonding at a time—supporting the floor slabs—may be costly and costly and further progress may lead to non-compliance with quality control. Further, bonded targets are often annealed for a variety of reasons, such as to remove mechanical stresses generated in the bonding material during bonding, to crystallize the microstructure of the material, and generally to achieve the metallurgical properties required for sputtered hafnium components. Annealing is typically performed under vacuum, in an inert atmosphere, or both to avoid introducing impurities into the bonded material during the annealing process (for example, from oxidation). Vacuum annealing is quite energy efficient. Accordingly, in order to save time and the cost of manufacturing a sputter target, it is necessary to improve the bonding process method and other metal objects. [Summary of the Invention]

O:\88\88457.DOC 200422418 本發明的-個特徵是提供一黏結支撐板到濺鍍靶材的改 進方法,反之亦然。 本I月的進步特徵是提供一方法形成許多濺鍍靶材在 一支撐板上。 本^月的進步特徵是提供一方法形成許多濺鍍靶材及 其他金屬物件具有—致的物理性質及黏結強度。 本發明的進一步特徵是提供一方法黏結一支撐板到一罩 框中的一靶材及以致該靶材在黏、结期間4皮冑空密封在在該 罩框中。 ~ 本發明另外的特徵及好處將部份陳述在下面的說明,及 部份將出現在說明巾,或可以利用本發明的練習來學到。 本發明的目的及其他好處利用元件與特別地在說明中指出 及附錄的申請專利範圍的組合將可實現及達到。 為了達到t些及其他好處,及根據本發明目的,如具體 實施例及廣泛地朗在文中,本發明關於形成—賤錢= 或:他金屬物件的方法包括黏結一支撐板到具有含靶材料 凹至的-罩框中。黏結支撐板到罩框上形成許多黏結的靶 材料I可以包括從該黏結的乾材料移除任一剩 下的罩框部份。 本發明也關於形成一濺鍍靶材 括配置一靶材在一罩框的凹室中以致露出靶材的一黏、名 面及貫際上平行於該罩框的上表面。該方法進一步包々 結-支撑板到㈣的黏結表面及到至少_部份罩框的」 面以形成一黏結的靶材其被真空密封在凹室中。該方^O: \ 88 \ 88457.DOC 200422418 One feature of the present invention is to provide an improved method for bonding a support plate to a sputtering target, and vice versa. An advance feature of this month is to provide a method for forming a plurality of sputtering targets on a support plate. The advance feature of this month is to provide a method for forming many sputter targets and other metal objects with uniform physical properties and bonding strength. A further feature of the present invention is to provide a method for bonding a support plate to a target material in a cover frame so that the target material is hermetically sealed in the cover frame during bonding and knotting. ~ Additional features and benefits of the present invention will be partially stated in the following description, and some will appear in the explanation towel, or can be learned by using the exercises of the present invention. The objects and other benefits of the present invention will be achieved and achieved using a combination of elements and the patentable scope specifically pointed out and appended in the description. In order to achieve these and other benefits, and in accordance with the purpose of the present invention, such as specific embodiments and widely described in the text, the present invention relates to the method of forming-cheap money = or: other metal objects include bonding a support plate to a target-containing material Recessed-mask box. Bonding the support plate to the mask frame to form a plurality of bonded target materials I may include removing any remaining mask frame portion from the bonded dry material. The present invention also relates to forming a sputtering target, including arranging a target in a recess of a mask frame so as to expose a sticky, nominal surface of the target material and a surface parallel to the upper surface of the mask frame. The method further includes the bonding-supporting plate to the bonding surface of the bonding material and to at least a portion of the mask frame to form a bonded target which is vacuum-sealed in the cavity.该 方 ^

O:\88\88457 DOC 200422418 -步包括退火該真空密封的黏結乾材以、 革巴材。該方法接著# y 退火的满:鍍 者g括利用從濺鍍革# 框來取出該濺鍍靶材。 才私除至>、一部份罩 黏結支撐板到含乾材料 完成及較佳地可以是爆炸料式fμ任何黏結技術 地直允宓封υ〇 3 &政黏結。黏結步驟較佳 一 ,..〇的靶材料在罩框的凹室中。 本發明進-步關於—罩框 tF U rU ^ 丨^ U S ^域或凹室含有 靶㈣其令該頂端或露出的靶材料之 的間隙與支撐板材料分離 、一利用-控制 m 士 a 離及。亥支按板貫際上與罩框表面在 U 十面0本發明進一步關於 哭丄 入士 7關於一罩框具有凹室區域或凹室 B有許多靶材料,如上說 〆 ,^ 其中一支撐板黏結到至少古亥 靶材料頂端或露出的黏結表面。 〜 做為一選擇項,在黏結支 —+ _ 叉保扳之刖,可以置放一中間層 在支撑板與罩框的表面之間。 應該了解前面一般的說明與下 Ά人% —卜 f 5兄明兩者是實施例 及僅疋貫鈿例以及期望提供本發 專利範圍。 “進步^兄明,如申請 附圖其結合及組成本申請案的一 刀况明本發明某些 /、肢貫施例及結合本說明用來解釋本發明的原理。 【貫施方式】 本發明關於賤絲材及其他金屬物件。更特別地,本發 明提供在黏結支撐板到許多濺鍍靶材上之期間,同時" 許多賤㈣材的方法。該製程也可以應用到其他金屬物:牛。 在本發明,—個或更多個乾材利用黏結-支擇板到一配O: \ 88 \ 88457 DOC 200422418-The step includes annealing the vacuum-sealed bonded dry material to the base material. This method is followed by #y annealed full: The plater uses the sputtered leather # frame to remove the sputter target. Only private parts are removed, part of the cover is bonded to the supporting material to contain dry materials, and it can be made of explosive materials, fμ, any bonding technology, and it can be sealed directly. The bonding step is preferred. The target material of ..〇 is in the recess of the mask frame. The invention further advances-the mask frame tF U rU ^ ^ ^ US ^ field or cavity contains a target, which separates the gap between the top or exposed target material from the support plate material, and utilizes-controls m ± a and. The helium press board is in contact with the surface of the mask frame on the U surface. The present invention further relates to the crying priests. 7 The mask frame has a recessed area or the recess B has many target materials, as described above. One of the supports The board is bonded to at least the top of the ancient target material or the exposed bonding surface. ~ As an option, you can place an intermediate layer between the support plate and the surface of the cover frame on the sticky branch — + _ fork protector. It should be understood that the foregoing general description and the following are both examples and only examples, and it is expected that the scope of this patent will be provided. "Progress ^ Brother, if you apply for drawings, the combination and the composition of this application show that some /, the embodiment of the present invention and the description together with this description are used to explain the principles of the present invention. [Implementation mode] the present invention Regarding the base wire and other metal objects. More particularly, the present invention provides a method of simultaneously " many base materials while bonding the support plate to many sputtering targets. The process can also be applied to other metal objects: In the present invention, one or more dry materials are bonded to one

O:\88\88457.DOC 200422418 置或位在-凹室區域或形成在一凹 上。位在凹室中是免材料或未 “的政剛才 面向下及相對面向上的點結表面,。材具有乾材難表 平行於罩框的上表面、^ _結表面實際上 上表面之間的一間阳,::為了形成支撐板與罩框的 凹室中)可以實際上平:::觸面或乾材的頂端㈣ 罩框的上表面之上 ,匚的上表面同-平面,或在 _ 一 。s泫支撐板黏結到位在罩框凹 至中的靶材料之上時,彡 u 料]位… 黏結的靶材料其中該支撐板 1:1在罩框凹室中的乾材料露出的上或黏結的表面。 而且,利賴黏結技術,該露出的罩框上表面可 以黏結到支禮板。較佳地,該黏結製程在凹室中產生2 空條件,及湘黏結切板到罩框上表㈣㈣料兩者: ㈣成的黏結靶材是真空密封在罩框的凹室中。 -當支撑板黏結到乾材料及罩框表面露出的區域上,至 少一部份罩框可以從黏結的㈣料移除。通常,在該 移除㈣份是支撐板表面區域以上的部份其用做任—支標 板的法_。接著’任一罩框剩下的部份仍舊位在黏結的靶 材料上或其周圍可以接著從黏結的靶材料移除。 假如該支撐板黏結到乾材料而不是罩框表面露出的區域 上’那麼基本上整個罩框可以容易地從黏結的靶材料移 除。這兩部份將在下面更詳細的解釋。 更詳細的’為了本發明的目的,金屬物件較佳地是濺鍍 靶材但可以是任何形狀的物件其中兩片金屬,如金屬板7 黏結在一起。在較佳具體實施例,其通常包括一支撐板黏O: \ 88 \ 88457.DOC 200422418 is placed or located in the -recess area or formed in a recess. Located in the alcove is a no-knot surface that is free of materials or not just now. The material has a dry material that is difficult to parallel to the upper surface of the cover frame, and the surface of the knot is actually between the upper surface. A sun :: in order to form the support plate and the alcove of the cover frame) can be practically flat ::: the top of the contact surface or the dry material 之上 above the upper surface of the cover frame, the upper surface of 匚 is the same-plane, Or at _. When the support plate is bonded to the target material that is recessed in the cover frame, the material] position ... The bonded target material where the support plate 1: 1 is a dry material in the cover frame cavity. The exposed upper or bonded surface. Moreover, depending on the bonding technology, the exposed upper surface of the mask frame can be bonded to the giftboard. Preferably, the bonding process produces 2 empty conditions in the cavity, and the Hunan bonded cutting board Both of the materials are displayed on the mask frame: The formed bonding target is vacuum-sealed in the recess of the mask frame.-When the support plate is bonded to the dry material and the exposed area of the mask frame surface, at least a part of the mask frame It can be removed from the bonded concrete. Usually, the removal material is above the surface area of the support plate. Part of it is used as the method of supporting the target plate. Then 'the rest of any mask frame is still on or around the bonded target material and can then be removed from the bonded target material. If the support plate Bonding to dry material rather than to the exposed area of the mask frame surface 'then basically the entire mask frame can be easily removed from the bonded target material. These two parts will be explained in more detail below. For the sake of the present invention in more detail For the purpose, the metal object is preferably a sputtering target but can be any shape of the object. Two pieces of metal, such as metal plate 7, are bonded together. In a preferred embodiment, it usually includes a support plate

O:\88\88457.DOC 200422418 結到一乾材料上。該支稽板可以是任何用做錢鍍應 ’、他應用之一支撐板的適當金屬材料。該靶材料可是任作 能夠濺鍍的材料。支撐板的實施例包括,但不限制,銅 或銅合金、紐、銳、鈦、链、及其合金,如Taw、ν_、 仙、NbZr、TaNb、懸' TaTi、阳丨、τ爲、咖〇 及相似者。 關於利用本發明方法要黏結的靶材料,實施例包括,但 不限制’ μ、鈮、鈷、鈦、銅、鋁,及其合金,例如上面 說明的合金。 在本發明,要與支撐板物件黏結的靶材級材料可以是例 如吴國專利號6,348,113(Michaluk等人)說明❺靶材級材 料,全部併入本文做參考。該專利表示支撐板的實施例可 以從起始鑄錠、板材或圓胚製備。純度、組織、及/或晶粒 大小與其他性質,包括尺寸及相似者對本發明不嚴格。用 來製造乾材級支#板㈣末及㈣本身可以具有關於金屬 的任-純度。例如’純度可以是99%或更高如從約的冗或 更高及更加地99.95 %或更高以及縱然更加地99 99 %或更 高,或99.995 %或更高,99.999%或更高。該靶材可以具有 任何的晶粒大小(例如平均晶粒大小小於3〇〇微米,小於丨〇〇 微米,小於50微米,小於20微米)及/或組織。例如,該組織 可以是隨意的,-基本的(111)組織,或—基本的(1〇〇)組織 其可以是在靶材表面上或通過整個厚度。較佳地,組織是 均勻的。而且,靶材可以具有一混合的(111):(11〇)組織遍佈 靶材表面上或遍佈整個厚度。並且,靶材可以實際上是組 0\88\88457.DOC -9- 200422418 織條紋的空洞,如(100)組織條紋實際上的"。 厚度心μ來形錢料 適當厚度。或者’支樓板及乾材料或其他要心 ^ 上的金屬板可以是任何適合所需應用的厚度。支標板: ==:Γ例包括,但不限制,,板具有: (度攸教25或較小到約2英^較大的厚 從約°·060英忖到約削或較大的厚卢。在太:有 結到支撐板…材可以是傳心二柄明’要黏 Λ 、、充的乾材級材料例如O: \ 88 \ 88457.DOC 200422418 to a dry material. The support board can be any suitable metal material used for money plating and one of the other support board applications. The target material may be any material capable of being sputtered. Examples of support plates include, but are not limited to, copper or copper alloys, copper, copper, sharp, titanium, chains, and alloys thereof, such as Taw, ν_, Sin, NbZr, TaNb, Suspension, TaTi, Yang, Tau, Ca 〇 and similar. Regarding the target material to be bonded using the method of the present invention, examples include, but are not limited to, 'µ, niobium, cobalt, titanium, copper, aluminum, and alloys thereof, such as the alloys described above. In the present invention, the target-grade material to be bonded to the supporting plate object may be, for example, Wu Guo Patent No. 6,348,113 (Michaluk et al.), Which describes a target-grade material, all of which is incorporated herein by reference. The patent states that examples of support plates can be prepared from starting ingots, plates or round billets. Purity, structure, and / or grain size and other properties, including size and similarity, are not critical to the invention. It is used to make the dry material grade support # 板 ㈣ 底 ㈣ and ㈣ itself can have any purity with respect to the metal. For example, the purity may be 99% or higher, such as from about redundant or higher and more 99.95% or higher and even more 9999% or higher, or 99.995% or higher, 99.999% or higher. The target can have any grain size (for example, an average grain size of less than 300 microns, less than 1000 microns, less than 50 microns, less than 20 microns) and / or structure. For example, the tissue can be random,-basic (111) tissue, or-basic (100) tissue which can be on the surface of the target or through the entire thickness. Preferably, the tissue is homogeneous. Moreover, the target can have a mixed (111) :( 110) tissue spread over the surface of the target or over the entire thickness. In addition, the target material can actually be a hollow of the group 0 \ 88 \ 88457.DOC -9- 200422418 weaving stripes, such as (100) tissue stripes actually ". The thickness μ is used to shape the material to an appropriate thickness. Or ’slabs and dry materials or other important metal plates may be of any thickness suitable for the desired application. Support plate: ==: Γ Examples include, but are not limited to, plates with: (degrees taught 25 or less to about 2 inches ^ larger thickness from about ° · 060 inches to about cut or larger Hou Lu. In the Tai: there is a knot to the support plate ... The material can be a two-handed, transparent, dry material-grade material such as sticky Λ.

Mwhaluk等人的說明。一當決 -罩框其具有一個或更多個『「枓形狀,可以製備 〗更夕個凹至區域或凹室以致靶材料套 ::或更多個凹室中。基本上,罩框可以具有-個或更 少個凹室切割或形成在罩框中 矜、宫疮民ώ t成凹曼其匹配關於直 二、-、長度及局度的靶材料形狀。通常,在—余 Π,:室具有適當的W材料以-控制尺;二 二=…分離。該間隙可以是任何距離,如。.25 小或如1或2英时或較大。換句話說,在—具體忠 施例’靶材頂端或黏結表面 料可以稍低於或稍高於罩框的表面及^表面上。該乾材 齊平是不嚴格的。 '表面及關於與罩框的上表面 關於罩框’該罩框較佳地是—金屬等級,如鋼材或立他 m 受喜好的鋼材是由於其強度及可用性與價 料金屬板’如可以使用具有—厚度大於乾材 "冋:及直控的鋼材及經由傳統切割與加工技術可以呈有 或更多個凹室切割或形成革框。傳統切割與加工技術Instructions by Mwhaluk et al. A duel-the mask frame has one or more "『 shape, can be prepared "and more recessed into the area or cavity so that the target material sets: or more recesses. Basically, the mask frame can With-one or less alcoves cut or formed in the mask frame, uterine ulcers, or uterine ulcers, which match the shape of the target material about the straight two,-, length, and locality. Generally, in-Π, : The chamber has the appropriate W material to control the ruler; two two = ... separation. The gap can be any distance, such as .25 small or as large as 1 or 2 inches or larger. In other words, in-specific Zhongshi Example 'The top of the target material or the bonding surface material may be slightly lower or higher than the surface and surface of the mask frame. The level of the dry material is not critical.' The surface and the upper surface of the mask frame are related to the mask frame ' The cover frame is preferably a metal grade, such as steel or litam. The preferred steel is due to its strength and availability, and the price of the metal plate. If it can be used, the thickness is greater than the dry material. Steel and through traditional cutting and processing techniques can be cut or formed into leather frames with one or more recesses. Traditional Cutting and processing technology

O:\88\88457.DOC ' 10- 200422418 的實施例包括’但不限制,鑽孔 '研磨、碾磨、電極放電 加工或其他適當的方法。該凹室尺寸大於靶材料尺寸。例 如,革巴材料直徑或大小與凹室直徑或大小的差異可以從約 1mm至約10mm,及更佳地從約lmm至約5mm。換句話說, 凹室邊緣/邊際及靶材的邊緣是該大小的範圍。或者,當靶 材料放入凹室區域以確保套入靶材在凹室中,為了產生一 合適或緊配在凹室區域,該凹室區域的尺寸基本上仿照靶 材料的尺寸。縱使當形成凹室區域時,該罩框應有具體的 厚度,特別地在凹室區域之下的區域,罩框仍舊是足夠強, 以忍受一黏結的步驟,如爆炸黏結。 至於配置一個或更多個靶材在一罩框的凹室中,該靶材 是位在或置放黏結邊向上及相對的濺鍍邊向下進入對應的 罩框凹室中。注意地,不是每個凹室需要包含一靶材。而 且义過一個未加工的靶材或其他金屬層可以配置在凹室 中。配置可以包括壓力套入靶材料進入凹室中以致靶材確 保進入凹室中。 根據本發明-具體實施例,本方法進_步包括在該乾材 配置在相同凹室中之前,配置一内襯或保護層在至少一凹 室中。该保護層作用防止靶材的濺鍍邊黏結到罩框凹室中 的底表面。該保護層可以覆蓋所有或任何凹室底表面的部 份。亚且,該保護層也可以覆蓋所有或任何凹室側邊表面 的部份。例如”該保護層可以是任何厚度或從任何材料製 造。該保護層較佳地是從紙張製造,及更佳地是卡紙。 配置或置放靶材料在罩框凹室區域中之前,罩框可以拋O: \ 88 \ 88457.DOC 'Examples of 10-200422418 include, but are not limited to, drilling, grinding, milling, electrode discharge machining, or other suitable methods. The size of the cavity is larger than the size of the target material. For example, the diameter or size of the leather material may differ from the diameter or size of the cavity by about 1 mm to about 10 mm, and more preferably from about 1 mm to about 5 mm. In other words, the edge / margin of the alcove and the edge of the target are the ranges of this size. Alternatively, when the target material is placed in the cavity area to ensure that the target material is nested in the cavity, in order to produce a suitable or tight fit in the cavity area, the size of the cavity area is substantially similar to the size of the target material. Even when the recessed area is formed, the mask frame should have a specific thickness, especially in the area below the recessed area, the mask frame is still strong enough to withstand a bonding step, such as explosive bonding. As for arranging one or more targets in a mask frame cavity, the target material is positioned or placed with the adhesive edge upward and the opposite sputtered edge down into the corresponding mask frame cavity. Note that not every cavity needs to contain a target. Furthermore, a raw target or other metal layer can be arranged in the recess. The configuration may include pressure-sleeving the target material into the cavity such that the target material is guaranteed to enter the cavity. According to a specific embodiment of the present invention, the method further includes arranging a lining or a protective layer in at least one cavity before the dry material is disposed in the same cavity. This protective layer prevents the sputtered edges of the target from sticking to the bottom surface in the cavity of the mask frame. The protective layer can cover all or any part of the bottom surface of the cavity. The protective layer may cover all or any part of the side surface of the recess. For example, "the protective layer may be of any thickness or made from any material. The protective layer is preferably made of paper, and more preferably a cardboard. Before the target material is disposed or placed in the area of the housing cavity, the cover Box can throw

O:\88\884S7 DOC 200422418 光或清潔,及假如使用一爆炸黏結機制,一黏膠高分子或 其他黏結材料(例如’保護材料)可以選擇性使^確保革巴材 進入罩框中及防止或使容易黏結靶材與罩框。較佳地,假 如使用該黏結材料,填滿罩框與支撐板間存在的間隙。 ,關於罩框大小或罩框尺寸,只要—金屬罩框或其他適當 材料可以形成或獲得’可以使用任何尺寸。在本發明—具 體實施例,該罩框具有^夠尺寸以致根絲材料的數目及 大小:以製備-足夠凹室區域的數目。在-較佳具體實施 例’該罩框具有—長度的尺寸從約卜尺或較短些至約5吸或 更長些以及一寬度從約1呎或較短些至約5呎或更長些。更 加地,罩框的尺寸約42吋乘約42吋。該罩框的厚度或高产 义從約w或較短些至約1〇尺<更長些。較佳地,至少2凹= 區域或凹室存在罩框中及為了調整—相等數目的乾材料具 有將套入這些凹室區域的尺寸,可以存在至少3、至少4、 至少5、至少6、至少7、至少δ、至少%至少1〇或更多凹室 區,其可以是相同的或不同的尺寸。如圖1所示,例如,可 以製備一罩框其基本上調整4個靶材料其中2個靶材具有相 同尺寸及另2個乾材具有相同尺寸。而且,做為選擇的,可 :有杈小形狀的凹室區域以接收靶材料的黏結品質測試樣 品。為了測試靶材料與支撐板間的黏結品質與強度,這些 1至區域其可以具有直徑尺寸從約1吋或較短些乘約i吋 或較短些至約6对或較長些乘約6忖或更長些是重要的。這 '。〇貝’則试樣品的凹室區域可以位在整個罩框,如圖1 所不。而且’如圖1所示,可以有點圓線包圍乾材料或在支O: \ 88 \ 884S7 DOC 200422418 Light or clean, and if an explosive bonding mechanism is used, a glue polymer or other bonding material (such as a 'protective material') can selectively enable ^ to ensure that the leather material enters the frame and prevents Or make it easy to bond the target and the mask frame. Preferably, if the bonding material is used, the gap existing between the mask frame and the support plate is filled. Regarding the mask frame size or mask frame size, as long as a metal mask frame or other suitable material can be formed or obtained, any size can be used. In a specific embodiment of the present invention, the mask frame has a sufficient size so that the number and size of root filament materials: to prepare-enough number of recessed area. In the -preferred embodiment ', the cover frame has a length dimension from about a ruler or shorter to about 5 feet or longer and a width from about 1 foot or shorter to about 5 feet or longer some. Furthermore, the size of the mask frame is about 42 inches by about 42 inches. The thickness or high yield of the mask frame ranges from about w or shorter to about 10 feet < longer. Preferably, at least 2 recesses = areas or chambers are present in the enclosure and for adjustment-an equal number of dry materials have dimensions that will fit into these recessed regions, and there may be at least 3, at least 4, at least 5, at least 6, At least 7, at least δ, at least%, at least 10 or more alcove regions, which may be the same or different sizes. As shown in FIG. 1, for example, a mask frame can be prepared which basically adjusts 4 target materials, of which 2 target materials have the same size and the other 2 dry materials have the same size. Moreover, as an option, a small-shaped recessed area can be used to receive a bond quality test sample of the target material. In order to test the bonding quality and strength between the target material and the support plate, these 1 to regions can have a diameter size from about 1 inch or shorter by about i inches or shorter by about 6 pairs or longer by about 6 Or longer is important. This '. 〇 贝 ’, the alcove region of the test sample can be located in the entire mask frame, as shown in Figure 1. And as shown in Figure 1, it can be a little round line surrounding the dry material or

O:\88\88457.DOC -12- 200422418 撐板的背邊。這些點圓線代表將切割形成當產生黏結時之 _革巴材的法蘭。這些點圓線或其他相似記號可以位在罩 框背面上以致黏結後,為了取出黏結的謎乾材料,可以 馬上決定何處將發生罩框的切割。這些記號可以是姓刻線 的型式,塗佈記號及相似者。或者,或組合地,該記號可 以是在支樓板的背面上以表示法蘭部份的位置。 -當乾材料被配置或位在罩框的凹室區域,在凹室區域 中包含乾材料的該罩框可以與—支樓板配對以致該支撐板 4近罩框的上表面其具有㈣料露出的黏結表面在凹室區 域。具有乾材料與支樓板面對面的罩框接著可以使用任何 傳統技術如固定夾、今屬鉻册 心上 人正屬條T、老虎鉗及其他鎖住裝置。 為了達到爆炸黏結,假如使用該點結技術,位在支撑板後 可以是-爆炸物的荷載。通常,爆炸物的荷載量是一足以 提絲材料與支撑板之間一黏結的一荷載。該爆炸物的荷 載量較佳地是也足以提供支擇板與罩框露出的表面區域之 間的-黏結。通常’使用堆積至密度i g/cc的炸藥,對具有 約〇 · 2 5呼間隙的w厚支撐板的爆炸物荷載量從⑽刚銅 支撐板的約〇.018碎/平方忖至cl82〇〇銅合金支撑板的約 0.02何/平方忖。其他爆炸物如卜則h、咖、化则_ N〇. 1、C4、《錄或其他適當的爆炸物可以使用,但該爆 炸物荷載應該調整至爆炸的能量。對爆炸物荷載的計算之 更多的資訊見化】.Carlson,V.D_ Linse&RH评出则〜O: \ 88 \ 88457.DOC -12- 200422418 The back edge of the stay. These dots and circles represent flanges that will be cut to form a leather material when adhesion occurs. These dotted lines or other similar marks can be placed on the back of the mask frame so as to be bonded. In order to remove the stuck puzzle material, you can immediately decide where the mask frame cutting will occur. These marks can be the type of the last name engraved line, coated marks and the like. Alternatively, or in combination, the mark may be on the back of the branch floor to indicate the position of the flange portion. -When the dry material is arranged or located in the alcove region of the hood frame, the hood frame containing the dry material in the alcove region can be paired with a support slab such that the support plate 4 is near the upper surface of the hood frame and has exposed materials. The bonding surface is in the area of the alcove. The mask frame with the dry material facing the support floor can then use any conventional technique such as retaining clips, today's chrome book sweetheart bar T, vise and other locking devices. In order to achieve explosive adhesion, if this point-knot technology is used, the load behind the support plate can be-explosives. Generally, the explosive load is a load sufficient to cause a bond between the filament material and the support plate. The load of the explosive is preferably also sufficient to provide a bond between the support plate and the exposed surface area of the mask frame. Generally, using explosives stacked to a density of ig / cc, the explosive load on a w-thick support plate with a gap of about .25 is from about 0.018 pieces / square 忖 to about 8200 pieces of ⑽copper support plate. The copper alloy support plate is about 0.02 Ho / square. Other explosives such as Bulletin H, Café, Huatze _ No. 1, C4, or other appropriate explosives can be used, but the explosive load should be adjusted to the energy of the explosion. For the calculation of explosive load, see more information]. Carlson, V.D_ Linse & RH evaluation ~

Materials Engineering 68, 7〇 (1968)的文章,其全部併入本 文做參考。Materials Engineering 68, 70 (1968), all of which are incorporated herein by reference.

O:\88\88457.DOC -13 - 200422418 如上所述,藉靶材黏結表面高於或低於軍框的上表面, 支撐板與罩框之間可以存在一間隙。假如使用爆炸黏結, 較佳地該間隙被填滿以致至少與乾材黏結表面齊平及較佳 地被填滿在靶材黏結表面的高度以上。 當使用爆炸黏結時’在發生爆炸之前,支料與藏㈣ 材之間最好具有—間隙存在。假如沒有一間隙而發生爆炸 黏f,可能形成不適當的黏結或不形成黏結。據此,具有 该選擇,在一具體實施例,支撐板與乾材黏結表面之間可 以存在-間隙及較佳地在罩框表面與支撐板之間沒有間隙 存在。該間隙一較佳的位置可以利用產生—足夠的深度在 凹室區域來完成以具有錢錄乾材黏結表面在罩框的上表面 之下以致該支撐板接觸罩框而不接觸藏餘材。而且,该 間隙可以利用具有基本上與罩框表面齊平之乾材料的黏結 表面來產生。接著’應用該黏結或保護的材料包圍罩框露 出的表面區域及/或支撐板的相反表面,該支樓板將黏結到 乾材黏結表面上但不黏結任何罩框表面上’因為黏結材料 不是在任何乾材的表面上。因此’可以使用產生-間隙在 支撐板與乾材之間而不是產生一間隙在支撑板與罩框之間 的任何方式以及上面的方法是如何達到該較佳 實施例。 n早 較佳地’該黏結的預形具有一树材擁有相崎材 等級平板之冶金性質。例如,根據本發明,爆炸性黏結— 具有-平均晶粒大小小於約100微米及—組織ι際上在 (10。)組織帶空洞的靶材等級平板較佳地形成具有一;有—O: \ 88 \ 88457.DOC -13-200422418 As mentioned above, there can be a gap between the support plate and the cover frame by using the target bonding surface above or below the upper surface of the military frame. If explosive bonding is used, it is preferred that the gap is filled so that it is at least flush with the dry material bonding surface and is preferably filled above the height of the target material bonding surface. When using explosive bonding 'it is preferred that there is a gap between the branch and the Tibetan mastiff material before the explosion occurs. If there is no gap and an explosive bond f is formed, an inappropriate bond may not be formed. According to this, with this option, in a specific embodiment, there may be a gap between the support plate and the dry material bonding surface and preferably no gap exists between the surface of the cover frame and the support plate. A better position of the gap can be created using a sufficient depth in the recessed area to have a dry material bonding surface under the upper surface of the cover frame so that the support plate contacts the cover frame without touching the remaining material. Moreover, the gap can be created using a bonding surface having a dry material substantially flush with the surface of the mask frame. Then 'apply the adhesive or protective material to surround the exposed surface area of the mask frame and / or the opposite surface of the support plate, and the supporting floor will adhere to the dry material bonding surface but not to any mask frame surface' because the bonding material is not on On any dry wood surface. Therefore, 'any method of generating-gap between the support plate and the dry material, rather than creating a gap between the support plate and the cover frame, and how the above method can achieve the preferred embodiment can be used. n early, preferably, 'the bonded preform has the metallurgical properties of a tree material having Aizaki grade flat plates. For example, according to the present invention, explosive adhesion—having—an average grain size of less than about 100 microns and—at the organization level, a target-grade flat plate with holes in the (10.) tissue is preferably formed with one; there is—

O:\88\88457.DOC -14- 200422418 平均晶粒大小小於約100微米及一組織實際上在(1〇〇)組織 π空洞的濺鍍靶材之一黏結的預形。並且,爆炸黏結的結 不’泫黏結的預形較佳地具有比在黏結之前支撐板零件更 更的支撐板’如定量地量測,例如,Rockwell B刻度。 例如’硬度增加5%或更高,如%或更高,及30 %-60 %或 更高。在一特別的實施例,一支撐板,如C464〇〇在爆炸黏 結到一塊體硬度85之前的Rockwell B刻度硬度63及黏結之 後一界面硬度1〇〇。 該黏結預形較佳地具有一黏結界面在靶材與支撐板零件 之間,該黏結界面具有較高強度。例如,該黏結強度可以 從10,000Psi至約75,000psi或更高,其是近似地,例如,由 擴散黏結得到的典型黏結強度之兩倍。其他範圍包括從約 25,000 psi 至約 55,000 psi及從約 40,〇〇〇 pSi 至約 56,〇〇〇 pSi及 相似者。該黏結強度較佳地均勻在整個黏結表面。如上陳 述,當濺鍍靶材的直徑增加,增加黏結強度是特別地重要。 亚且,由本發明形成的黏結界面較佳地包括靶材等級平板 與支撐板零件沒有交互的擴散。因此,濺鍍靶材與支撐板 零件在使用回收後可以更容易地分離,例如,減少再製金 屬彼此污染的量。 域將被黏結及具有間隙或黏結障礙的區域可以仍舊未 。在擴散黏結的例子,設計罩框以致未加工的乾材及 替代爆炸黏結,可以使用擴 疋擴散黏結到包含使用傳統擴 乾材料的罩框上。在擴散黏結 的區 黏結 散黏結技術,其中該支撐板 散技術如熱均壓及相似者的 的例子,水平接觸到支撐板O: \ 88 \ 88457.DOC -14- 200422418 The preform with an average grain size of less than about 100 microns and a structure that is actually bonded to one of the (100) structure π void sputtering targets. Also, the explosively bonded knots, 'the bonded preforms, preferably have more support plates than the support plate parts prior to bonding' as measured quantitatively, for example, Rockwell B scale. For example, 'the hardness increases by 5% or more, such as% or more, and 30% -60% or more. In a particular embodiment, a support plate, such as C464 00, has a Rockwell B scale hardness of 63 before being bonded to a block hardness of 85 and an interface hardness of 100 after bonding. The bonding preform preferably has a bonding interface between the target and the support plate part, and the bonding interface has a higher strength. For example, the bond strength can be from 10,000 Psi to about 75,000 psi or higher, which is approximately, for example, twice the typical bond strength obtained by diffusion bonding. Other ranges include from about 25,000 psi to about 55,000 psi and from about 40,000 pSi to about 5,600,000 pSi and the like. The bonding strength is preferably uniform over the entire bonding surface. As stated above, it is particularly important to increase the bonding strength as the diameter of the sputtering target increases. Furthermore, the bonding interface formed by the present invention preferably includes a target-grade flat plate and a support plate that do not interact with each other. Therefore, the sputtering target and the support plate part can be separated more easily after recycling, for example, reducing the amount of contamination of the reprocessed metal with each other. The domains will be stuck and areas with gaps or adhesion problems can still be left. In the case of diffusion bonding, the mask frame is designed so that raw dry materials and instead of explosive bonding can be spread to the mask frame using traditional expansion materials. In the area of diffusion bonding, the bonding and bonding techniques are adopted, in which the supporting plate is applied to the supporting plate horizontally, such as the example of heat equalizing pressure and the like.

O:\88\88457.DOC -15- 200422418 支樓板是緊密接觸的。相似地,罩框 接觸的或者,利用一門咕十* 板了以疋緊岔 有㈣fm切”礙分離使 與支撐板材料。因此,當金 77 框 ^ , 泰炸黏結的間隙之較佳位署士 較%,使用擴散黏結,關於 置 相/5的姓 ,、之1乂佳位置的較佳策略是 相反的。放另外的方式’當乾材頂端或黏結表疋 接觸時,該間隙較佳地存在 二知板 可以使用相似上面說明的技術完成,例:==此 以致乾材頂端或黏結表面是位在罩框的表面上。而且^ 以使用任何機制達到該較佳的間隙位置。 :支撐板黏結到乾材料的上表面與罩 上後,支撐板所需的尺寸可以從較早說明表^ 黏結到支,—“有—部份輩框 點,罩框剩=二用餘材任何可能的法蘭。在該 使用任何傳 部份及因此得到—…… 移除任何罩框剩下的 點,可以使用任㈣: 在其上的乾材料。在該 =任何傳崎材製程,光及相似者。 面《形成,叫然而在:==的… 部份的同時,也直— *黏、..°支投板到罩框露出的 爆炸黏結期間,凹室未佔用的空間被抽=;二 另-方式’罩框與支樓板爆炸㉟放到 支撐板之間以及密封罩離開罩框與 板將雙重…以 没板之間的乾材。結果支撐 亦即’黏結到罩框表面與點結到乾材料的O: \ 88 \ 88457.DOC -15- 200422418 The branch floors are in close contact. Similarly, if the cover frame is in contact with, or a door is used, the board is cut with a clamp, and the fm is cut off to prevent the material from being separated from the support plate. Therefore, when the gold 77 frame ^, the Thai fried sticky gap is better. The percentage is better, using diffusion bonding, and the preferred strategy for placing the last name of / 5, which is the best position, is the opposite. Put another way 'When the top of the dry material or the bonding surface is in contact, the gap is better The presence of the second knowledge board can be accomplished using techniques similar to those described above, for example: == so that the top of the dry material or the bonding surface is located on the surface of the mask frame. And ^ use any mechanism to achieve the better gap position.: After the support plate is bonded to the upper surface of the dry material and the cover, the required size of the support plate can be shown from the earlier description. Possible flange. At this point use any transmission parts and thus get ... Remove any remaining points of the mask frame, you can use any of the following: dry material on it. In the = any Chuanzaki process, light and similar. The surface "formation is called, but at the same time as the part of ===, it is also straight — * sticky, .. ° support board to the explosive bonding exposed by the cover frame, the unoccupied space of the cavity is drawn =; two other -The way 'the cover frame and the supporting floor exploded and placed between the support plate and the sealing cover leaving the cover frame and the plate would be double ... with no dry material between the plates. As a result, the support, that is,

O:\88\88457.DOC -16- 200422418 黏結表面,在爆炸期間產生在凹室内的真空條件在黏結之 後仍維持。 在支撐板黏結到靶材料的黏結表面與罩框露出的上表面 之上以形成一黏結的靶材其真空密封在凹室内後,根據本 發明方法較佳地包括退火黏結的靶材/罩框/支撐板以形成 一退火的靶材。上面說明的該黏結方法於黏結期間可以產 生機械應力在支撐板中。在支撐板中的應力可以利用退火 該黏結的靶材減低或消除。較佳地,該黏結的靶材於其他 物件間在一真空下退火以避免靶材料的氧化。然而,因為 根據本發明方法的黏結產生一真空密封的黏結靶材在凹室 中,因為沒有空氣將與靶材反應,該黏結的靶材可以在一 空氣爐中退火。如此容許一很簡單及很經濟的退火。退火 可以在任何溫度,及較佳地在低於約8〇(rc的溫度。例如, 退火可以是在從約200至約80(TC,及較佳地從約3⑻至約 500°C,及更佳地在低於約45〇χ:的溫度。較佳地,該黏結 的靶材在一足夠的溫度及足夠的時間退火以減低或消除在 支撐板中的應力,退火時間可以從約丨分鐘至約4小時或更 多’及較佳地從約1小時至約2·5小時。 根據本發明一具體實施例,本方法可以包括在退火步驟 之珂,從其他黏結的靶材選擇性分割一個或更多個黏結的 靶材歧佳地,該分割的黏結靶材被分割以致黏結的靶材 仍舊真空密封在凹室中。該分割的黏結靶材接著可以個別 退火。分割可以包括從其他在罩框中之黏結的靶材分離黏 、·口靶材的任何適當方法。例如,該分割可以是利用加工、O: \ 88 \ 88457.DOC -16- 200422418 On the bonded surface, the vacuum conditions created in the cavity during the explosion are maintained after bonding. After the support plate is bonded to the bonding surface of the target material and the exposed upper surface of the cover frame to form a bonded target which is vacuum sealed in the recess, the method according to the present invention preferably includes annealing the bonded target material / cover frame. / Support the plate to form an annealed target. The bonding method described above can generate mechanical stress in the support plate during bonding. The stress in the support plate can be reduced or eliminated by annealing the bonded target. Preferably, the bonded target material is annealed under vacuum in other objects to avoid oxidation of the target material. However, because the bonding according to the method of the present invention produces a vacuum-tight bonded target in the recess, because no air will react with the target, the bonded target can be annealed in an air furnace. This allows a very simple and economical annealing. The annealing may be at any temperature, and preferably at a temperature below about 80 ° C. For example, the annealing may be at about 200 to about 80 ° C., and preferably from about 3 ° C. to about 500 ° C., and More preferably, at a temperature lower than about 45 × χ. Preferably, the bonded target is annealed at a sufficient temperature and a sufficient time to reduce or eliminate the stress in the support plate, and the annealing time may be from about 丨Minutes to about 4 hours or more 'and preferably from about 1 hour to about 2.5 hours. According to a specific embodiment of the present invention, the method may include the step of annealing, selectively from other bonded targets Splitting one or more of the bonded targets is poorly divided, so that the bonded targets are still vacuum-sealed in the cavity. The split bonded targets may then be individually annealed. The split may include from Any other suitable method of separating and sticking the target in the mask frame. For example, the segmentation can be processed,

O:\88\884S7.DOC -17- 200422418 水刀切割、打孔加壓、電 ^ 窀水切剎、火焰切割、研磨、碾磨、 鑛開、雷射切割、鑽別、+ 汝孔电極放電加工或其任何组合。 利用從濺鍍靶材移除 / 邛饬罩框以取出該濺鍍靶 材’所需支撐板的尺寸可 罩框切割分離,如較早說明 ’戈' 又乾材硌出的濺鍍表 wχ 田k人的點結靶材料/支撐板是 仗罩框切割分離時,一 4 又仍有一口^伤罩框黏結到支撐板區 或上其將用做濺鍍靶材任 t 一 7 了此的法闌。在該點,該剩下 的罩框及黏結到革巴好、'土 # 材法闌區域上的部份接著可以使用任何 傳、,充的加工技術加工處理 θ 私除任何剩下的罩框部份及因 此仔到具有一支撐板黏处 —…在其上的的一靶材料。在該點, 使用任何靶材的傳統製程,如拋光及相似者。 本:Τ具體實施例容許在一黏結製程把眾則黏結 到 支樓板上及因此i告$1丨&4 k到靶材料黏結到支撐板上的更大輸 出以及進一步達到眾多靶 、, 、 双的黏、,Ό。並且,小凹室固 :二為一選擇,黏結品質測試材料其可以分散在整個罩 框對確保整個罩框尺寸-致性的黏技極佳的。 如上所述,假如罩框盥 〃支撐板 >又有黏結發生,那麼基本 上罩框可以在一步驟蒋呤爲罢α IΑ 土不 示及罩框將完整無損及因此可再 使用。 # 仏為^擇,一當乾材料放在罩框的凹室區域,一中間 層或保護層可以位在罩框的頂端。該中間層或保護層可以 將黏結到靶材料及支撐板O: \ 88 \ 884S7.DOC -17- 200422418 Waterjet cutting, punching pressure, electric ^ water cutting brake, flame cutting, grinding, grinding, mining, laser cutting, drilling, + ru hole electrode EDM or any combination thereof. The size of the support plate required to remove the sputtering target can be removed by using the / removed mask frame from the sputtering target, as shown in the earlier description of the 'Ge' sputtered sheet. Tian Kren ’s point-knot target material / support plate was cut and separated from the hood frame, and there was still a mouthful of ^ The injury hood frame was stuck to the support plate area or it would be used as a sputtering target. Of the law. At this point, the remaining mask frame and the part bonded to the Geba Hao, '土 # material method area can then be processed using any processing technology, and any remaining mask frame is removed. Partially and consequently to a target material with a support plate adhesive ... At this point, traditional processes using any target, such as polishing and the like. This: The specific embodiment allows a large number of targets to be bonded to the support floor in a bonding process and therefore the output of the target material is bonded to the support plate for a larger output and to further reach many targets. Sticky, 黏. In addition, the small cavity is solid: two are one choice, and the bonding quality test material can be dispersed throughout the frame to ensure the size and consistency of the entire frame. As mentioned above, if the mask frame toilet support plate > adhesion occurs again, then the mask frame can basically be removed in one step and the mask frame will be intact and therefore reusable. # 仏 is optional. When the dry material is placed in the alcove area of the mask frame, a middle layer or protective layer can be positioned on the top of the mask frame. The intermediate layer or protective layer can be bonded to the target material and the support plate

A T間層或保墁層可以是任 何傳統的中間層材料,‘ 7 L ,但非限制,钽黏結到銅合金支 樓板的例子,中間;4 曰、b 、。、鈦或釩是可以增強黏結品The A and T interlayers or retaining layers can be any traditional interlayer material, ‘7 L, but not limited, an example of tantalum bonded to a copper alloy branch floor, the middle; 4, b ,. , Titanium or Vanadium can strengthen the cement

O:\88\88457.DOC -18- 200422418 貝的材料。0berg等人,Metallurgical Transactions A,16, 841 (1 985)的技術論文全部併入本文做參考,提供熱力學原理用 來遠擇適當黏結中間層的說明。接著,如上說明,該中間 層可以在革巴材料法蘭區域中加工分離或留在革巴材料法蘭區 域上,依據靶材料的設計而定。 為另4擇,一中間層或保護層可以首先放在罩框上 及接者革巴材料插入凹室區域以致該中間層或保護層被壓入 凹室區域及㈣料位在中間層或保護層之上。使用本選 =’她*期間,該支撐板可以黏結到靶材料上及中間層 或保邊層上。假如保護層是一 3疋貫際上的厚度及堅固的,支 撐板黎結到該保護層上 疋罩框上。使用該選擇,可以 、准持罩框的整合以致為 破壞。或者,為了切開所材料,該罩框不需 將僅是犧牲層。的乾材料與法蘭直徑’保護層 做為另-例,中間層或保 中間層/保護層基本上成开/ 了 乂 /、有一杈板設計以致 非凹室頂端區域。使用爷點m曰表面僅覆盖罩框的 材料上而不是在罩框上,達此黏結發生在保護層餘 做為另-選擇“同的目標。 力适擇,靶材的言菸π 使用哕勒 二可以大於所需最终的直徑。 使用。亥點,其確保支標板與 取、的直位 有—過大尺寸的直徑,p 、間黏結是高品質及具 句話說,過多的乾材可以利用力的外邊界可以被切開。換 具有所需尺寸的乾材及確保言=其他方法移除以留下 尺寸靶材的量可 〇 貝最終耙材的黏結。過大 τξ:任何所愛 ι 的里’如最終所需直徑的O: \ 88 \ 88457.DOC -18- 200422418 shell material. The technical papers of 0berg et al., Metallurgical Transactions A, 16, 841 (1 985) are all incorporated herein by reference, providing a description of the principles of thermodynamics used to select the appropriate bonding intermediate layer. Next, as explained above, the intermediate layer can be processed and separated in the Geba material flange area or left on the Geba material flange area, depending on the design of the target material. For another option, an intermediate layer or protective layer may be first placed on the cover frame and the connector material is inserted into the recessed area so that the intermediate layer or protective layer is pressed into the recessed area and the material is in the intermediate layer or protected Layer above. When using this option = ’she *, the support plate can be bonded to the target material and the middle layer or edge retaining layer. If the protective layer has a thickness of 3 mm and is solid, the supporting plate is connected to the protective layer and the cover frame. With this option, the integration of the hood frame can be damaged. Alternatively, in order to cut through the material, the mask frame need not be just a sacrificial layer. As another example, the intermediate layer or the intermediate layer / protective layer is basically opened / opened 乂 /, and has a branch plate design so as not to be the top area of the cavity. Use the point m, the surface only covers the material of the mask frame, not on the mask frame. This adhesion occurs in the protective layer as another-select "same target. The force is selected, the target's speech is used. 哕Le Er can be larger than the required final diameter. Use. Hey point, which ensures that the support plate and the straight position are-oversized diameter, p, between the bonding is of high quality and in other words, too much dry material can The outer boundary can be cut with force. Change the dry material with the required size and make sure that the amount of other methods to remove the target material is left. The final raking material is bonded. Too large τξ: Any love Li 'as the final desired diameter

O:\88\88457.DOC -19- 200422418 5%、10%至25%或更多。 頂在崎驟期間’一保護材料可以放在罩框 上。伴^不是位在罩框凹室區域中的乾材頂端表面 ^保〜材枓較佳地防止支撐板黏結到罩框頂浐 獅頂端表面上。該保護材 例疋同刀子如—高分子黏膠、金屬及相似者。另― 例可以是-陶竟材料如氧化m切麵。貝& =爆炸黏結’較佳地具有-間隙在支撐板與要黏結到 二反^的乾材料黏絲面之間。其容許使用爆炸黏結的 Γ 擊到㈣頂端或黏結表面之前達到其最佳速 放置罩框頂端表面在-小於最適距_ 期門的速度。放到另一方式,假如在爆炸黏結 古間,罩框頂端表面是緊密或接觸支揮板,該支標板將、、支 有機會在衝擊到罩框頂端之前 ^ ^ ^ Φ ^ 适取彳土速度及因此將防止 ^或重要地防止實際黏結到罩框頂端表面上。在另 卢古Γ罩框是進一步遠離最佳間隙以達到最大速度,那 麼支撐板將以最大速度接觸靶材料頂 其到達罩框頂端表面,最大速不或黏表面但同時 實際上最小化點結到罩框上度將不存在及因此將防止或 上面說明的本發明具體實施例具 在真空下退火黏結的靶材之需 〔夕地,包括消除 ,^ ^ 要其疋I有能源效益的。 "月/、他具體實施例對熟知此項技藝人士從 明書及實用本發明在本文的揭 ^心况 明書及實施例被考慮做例子;月:的。其期望本說 僅在下列申請專利範圍及其O: \ 88 \ 88457.DOC -19- 200422418 5%, 10% to 25% or more. A protective material may be placed on the mask frame during the bump. The partner ^ is not located on the top surface of the dry material in the area of the cover frame cavity. The material preferably prevents the support plate from sticking to the top surface of the cover frame. Examples of this protective material are the same as knives such as high polymer adhesive, metal and the like. Another example could be-ceramic materials such as oxidized m-sections. Shell & = Explosive Bonding 'preferably has a gap between the support plate and the wire surface of the dry material to be bonded to the substrate. It allows the use of explosively bonded Γ to reach its optimal speed before hitting the top of the cymbal or the bonded surface. Place the top surface of the mask frame at -less than the optimal distance _ speed of the door. Put it in another way, if the surface of the top of the mask frame is close to or in contact with the support board during the explosion and adhesion, the support board will have a chance to impact the top of the mask frame before it hits the top of the mask frame. ^ ^ ^ Φ ^ The speed and therefore will prevent, or importantly, prevent actual adhesion to the top surface of the mask frame. In another Lugu Γ mask frame is further away from the optimal gap to achieve the maximum speed, then the support plate will contact the target material at the maximum speed to reach the top surface of the mask frame, the maximum speed is not sticky surface but at the same time actually minimize the point knot There will be no need to cover the frame and therefore the specific embodiments of the present invention described above will prevent or need to anneal the bonded target under vacuum [even, including elimination, if it is energy efficient. " Yue /, his specific embodiment will be disclosed to those skilled in the art from the book and the practical application of the present invention. ^ Mind The book and examples are considered as examples; It is expected that

O:\88\88457.DOC -20- 200422418 相等者所示的真實範圍及本發明的精神 【圖式簡單說明】O: \ 88 \ 88457.DOC -20- 200422418 The true range shown by the equivalent and the spirit of the present invention [Simplified illustration of the drawing]

本發明利用實施例說明與不限定在附 圖1是包含許多靶材料在凹室區域的一 圖2疋包含許多靶材料在罩框凹室區 圖及進一步表示面對罩框及靶材料之一 撐板之後的一爆炸負載Q 圖中。 -罩框之上視圖。 域的一罩框之侧視 支標板以及在該支The present invention is illustrated and not limited by the examples in the accompanying drawings. FIG. 1 is a diagram containing a plurality of target materials in the alcove region. FIG. An explosive load Q diagram after the brace. -Hood frame top view. Side view of a frame of a field

O:\88\88457.DOCO: \ 88 \ 88457.DOC

Claims (1)

拾、申請專利範圍: 種I成錢鍍標乾的方法,包括· 將一支撐板黏結到位在— 中的許多靶材i #的頂端表面巾之凹室 夕靶材上,其中該靶材的一 至 撑板以形成黏結的乾材;及 出表面黏結到該支 從該黏結的乾材移除該罩框 2.如申嗜直一 取出泫〉賤鑛革巴材。 甲。月專利範圍第1項的方法, 結。 /、中σ亥黏結疋一爆炸黏 3·如申請專® ¥ 1㈣H 結。 /、中该黏結是一擴散黏 4.如申請專利範圍第丄項的方法,苴 合金。 ,、中该靶材包括钽或其 5·如申請專利範圍第丨項的方法 合金。 〃中该靶材包括鈮或其 6.Scope of application for patents: A method of plating standard dry marks, including: gluing a support plate to the top surface of a number of targets i # in the alcove of the towel on the top surface of the target, where the target's One to the support plate to form a sticky dry material; and the surface sticking to the branch to remove the cover frame from the sticky dry material 2. Take out the 如> base ore leather and base material if you like. A. The method of item 1 of the monthly patent scope ends. / 、 Medium σ glutinous adhesive 疋 one explosion glutinous 3 · If applying for special ¥ 1 ㈣H knot. / 、 The adhesion is a diffusion adhesion. 4. As the method in the scope of patent application, item 苴, alloy. The target material includes tantalum or a method alloy such as the one in the scope of the patent application. The target in hafnium includes niobium or 6. 其中該靶材包括鈷、鈦、 其中該支撐板包括銅或 如申請專利範圍第1項的方法, 銅、鋁、钽、鈮或其合金。 如申請專利範圍第1項的方法 其合金。 其中該支撐板包括鈷、 其中該凹室包括至少2 其中該凹室包括至少4 δ·如申請專利範圍第1項的方法’ 鈦、銅、鋁、鈮、钽或其合金。 9·如申請專利範圍第i項的方法, 凹室。 , 1〇·如申請專利範圍第1項的方法, 凹室。 O:\88\88457.DOC 200422418 如申請專利範圍第1項的方、、 凹室,該等凹室具有相同或法’其中該凹室包括至少2 進一步包括至少一 ^ 3不同尺寸以接受該靶材,且 议小的凹玄、 測試樣品。 4以接受至少一黏結品質 12.如申請專利範圍第丨項的方、去 框。 /、中5亥罩框是一鋼鐵罩 1 3 ·如申請專利範圍第1項的方、去 該靶材之一露出的本T 其中在該黏結之前至少 各出的表面實際上蛊 ^ " 平。 〃 罩框之该頂表面齊 14·如申請專利範圍第1項的方法, 等至少該靶材之一露出/ ,其中在該黏結之前,該 頂表面齊平。 、表面貫際上不與該罩框之該 其中至少該靶材之一不 其中至少該革巴材之一緊 15·如申請專利範圍第丨項的方法 固著到該凹室中的該罩框。 16·如申請專利範圍第}項的方法 密套入該凹室中。 其中至少該革巴材之一套 丹甲至少該」 入該凹室以致該靶材與該 . u至間存在一間隙。 18·如申請專利範圍第n項的 „10 方法,其中該間隙是從約丨至 約 10 mm。 如申請專利範圍第1項的方法’其 甲在σ亥夺占、,吉之前,在 該支#板與該靶材之該露出砉 17·如申請專利範圍第!項的方法 19. ^ 丹甲在該3 該支標板與糾材之該露出表面之間存在—間隙。 20.如中請專利範圍第!項的方法’其中在該黏結之前,节 支撐板實際上與該罩框之該頂表面齊平,及其中在該支 O:\88\88457.DOC 200422418 撐板與該耙材尤該露出表面之間存在一間隙。 •如巾請專利範圍第1項的方法,其中在該黏結之前,— 保護層配置在該罩框之該頂表面上以防止該罩框黏結 到遠支撐板。 22·如申請專利範圍第21項的方法,其中該保護層是一卡紙 層。 23. 如申請專利範圍第1項的方法,其中在該黏結之前,— 保護層配置在至少該凹室之一以防止該罩框黏結到至 少一凹室中的至少該靶材之一。 24. 如申請專利範圍第#的方法,其中在該黏結之前〜 中間f配置在該罩框之該頂表面上及至少該乾材之〜 的该路出表面以使容易達該黏結。 25. 如申請專利範圍第1項的方法,其中從該減料材移 除忒罩框包括切開包圍 罩框。 Q 5亥黏結的靶材之至少一部份的 26·:::Γ範圍第25項的方法,其中該移除進-步包括 ;k 结的靶材加工 2…請專利範圍第!項的:何剩下的罩框部份。 切開包圍該黏結的革巴材夕=其中該罩框的移除包括 尺寸包圍每-個點結的^份該罩框及提供一足夠的 支撐板形成一法蘭。 才以從包圍該濺鍍靶材的該 28.如申請專利範圍第丨項 除該罩框包括以—彳、 其中從該黏結的靶材移 29·如申請專利範圍第Hi多步驟移除部份該罩框。 第1項的方法,其中在至少該靶材之〜 O:\88\88457.DOC 200422418 與該支標板之pg S 、一扃、纟σ強度是從約10,000至約75,000 psi 〇 30. 31. 32. 33. 34. 35. 3 6. 37. ’如申4專利範圍第1 , t 貞的方法其中在至少該靶材之一 與該支標板之門Μ 3 、一钻結強度是從約29,000至約55,000 psi 〇 如:請專利範圍第W的方法,其中至少純材之一具 有平均晶粒大小小於約1 〇〇微米。 如申請專利範圍第 + 声M心士 、的方&,/、中該支撐板具有一硬 度與黏結至該知44* >、, ……乾村之河的該支撐板比較,在黏結之後該 支撐板至少增加1〇%。 如申凊專利範圍第1頊 办穷 、的方法,/、中該黏結的靶材是真 工饴封在该凹室中。 如申請專利範圍第3 3 的__罩框之前退火該黏、纟::材括。在從該黏結 2請專利範圍第34項的方法,其中該退火是在一空氣 如申請專利範圍第34項 、的乃/£·其中该退火於吐 低於約80(TC。 1人七生的皿度 -種形成-濺鍍靶材的方法,包括: 黏結一支撐板到# 在一罩框的頂端表面中之凹室中 的一 材’JL中兮甲 成-pm 出表㈣結到該支撐板以形 成一黏、的靶材其真空密封在該凹室中; 退火5亥黏結的把好 材以形成一退火的黏結靶材;及 從該退火的黏結乾材移除至少及 y 该罩框以取出 O:\88\88457.DOC -4- 200422418 該藏锻免材。 其中該黏結是爆炸黏 其中遠黏結是擴散黏 3 8.如申請專利範圍第^項的方法 結。 39·如申請專利範圍第37項的方法 結。 刊·如曱睛專利範圍第37項 合金。 41·::請專利範圍第一法,其中妹材包括州 42. 如申請專利範圍第37項的方法,其中該乾 欽、銅、紹、麵、就或其合金。 括钻 43. 如申請專利範圍第37項的 其合金。 〃〒。亥支撐板包括銅或 认如申請專利範圍第37項的 鈦、銅、鋁, m撐板包括钻、 銳、鈕或其合金。 4 5 .如申請專利節 框。 Ο j、、方法,其中該罩框是一鋼鐵罩 46.如申請專利範圍第37項的方法, … 材之該露出的表面實 μ*、,,。之珂該靶 47.如申請專利範圍第37項 "頁表卸齊平。 材之露出的表面實際 ,.·。之别s-亥靶 4 8如申·-主査, /、5亥罩框之該頂表面齊平。 48.如申清專利範圍第37 囬片十 該凹室中的該罩框。方法’其中該乾材不固著到在 49.如申請專利範圍第37 、的方法,其令該靶材緊密套入該 O:\88\88457.DOC ZUU4Z2418 50. 51. 52. 53. 54. 55. 56. 57. 58. 凹室中。 如申凊專利範圍第37項 、)方法,其中該靶材套入該凹室 乂致。亥革巴材與該 至间存在—間隙。 如申請專利範圍第5〇項 ,,1Π 、的方法,其中該間隙是從約1至 約 10 mm。 如申请專利範圍第37項 、的方法,其中在該黏結之前,在 違支撐板與該靶材之該 洛出表面之間存在一間隙。 如申睛專利範圍第3 7項 、的方法,其中在該黏結之前,該 支按板貫際上與該罩框 _ °亥頂表面背平,及其中在該支 樓板與該乾材之該露出 K表面之間存在一間隙。 如申請專利範圍第3? 、的方法,其中在該黏結之前,一 ’、°又θ配置在該罩框之兮 ^ 4頂表面上以防止該罩框黏钍 到該支撐板。 ° 如申請專利範圍第54項的 層。 、的方法,其中該保護層是一卡紙 如申睛專利範圍第3 7項的方 $ 其中在該黏結之前,— 保匕層配置在該凹室以 I万止该罩框黏結到凹室 靶材。 王τ的泫 如申請專利範圍第37項的古、土 ^ 貝的方法,其中在該黏結 中間層配置在該罩框之兮 τ — 4頂衣®上及該靶材的該露屮 表面以使容易達該黏結。 路出 如申請專利範圍第;Π項的方半甘丄 0方法,其中從該黏結的 除該罩框包括切開包圍 移 框。 固孩黏結的靶材之至少一部份罩 O:\88\S8457 DOC 59·如申請 從該黏結的革巴材加工 法,其中該移除進-步包括 60.如申社哀 任何剩下的罩框部份。 申-專利砣圍第37項 切開包_^^ /。中料框的移除包括 尺寸包圍“ 部份該罩框及提供-足夠的 支撐板形成一法蘭。°、才以從包圍該濺鍍靶材的該 61·如申請專利範圍第37項 除該罩框包括以一個其中從該黏結的乾材移 62. — 4夕步驟移除部份該罩框。 文甲各月專利砘圍第37頊 ± ^, 、的方法,其中在至少該靶材盥該 63. 如申請專利範圍第37=卿0至約75〜 板之間的一㈣”:方法,其中在妹材與該支擇 64 “ 。強度疋從約29,_至約55,_psie •如申凊專利範圍第37項 、的方法,其中至少該靶材具有一 +均日日粒大小小於約100微米。 65·如申請專利範圍第37項 度與黏結至該乾材之前〉,/、該支標板具有—硬 j的4支撐板比較,在黏結之歹 支撐板至少增加10 %。 Μ 66. 如申請專利範圍第37項的方法,其中該退火是在一空氣 爐中。 ;、 67. 如申4專利範@第37項的方法,其t該 低於約800〇C。 〜皿度 68. —種錢餘材利用如申請專利範圍第i項的方法开,成 69. -種減㈣材利用如申請專利範圍第37項的方法; 70. —種形成_點結金屬物件的方法,包括. 七 O:\S8\88457.DOC 200422418 早框的頂端矣;+ 的-金屬物件,其中該金屬物件的4表面中之凹室 撐板以形成一黏結的金屬物件其:表面黏結到該 退火該黏結的金屬物件以幵心J空密封在該凹室中 從該退火的黏結物件移除=、—退火的黏結物件“ 該黏結的金屬物件。 夕。卩份該罩框以取: 71. 如申請專利範圍第7 0項的方、去 爐中。 其中該退火是在一空氣 72. 如申請專利範圍第7 0項的方、去 約800°C的溫度。 其中該退火發生在低於 O:\88\88457.DOCWherein the target material includes cobalt, titanium, wherein the support plate includes copper or the method according to item 1 of the scope of patent application, copper, aluminum, tantalum, niobium or an alloy thereof. Such as the method of applying for the scope of the patent No. 1 its alloy. Wherein the supporting plate comprises cobalt, wherein the cavity comprises at least 2 and wherein the cavity comprises at least 4 δ. The method according to item 1 of the scope of patent application 'titanium, copper, aluminum, niobium, tantalum or an alloy thereof. 9. Method as claimed in item i of the patent application, alcove. 10. Method according to the first scope of the patent application, the alcove. O: \ 88 \ 88457.DOC 200422418 If you apply for the square, and the alcove of the first scope of the patent application, these alcoves have the same or law 'where the alcove includes at least 2 and further includes at least one ^ 3 different sizes to accept the Targets, small recesses, and test samples. 4 Accept at least one bonding quality 12. If the item in the scope of the patent application is applied, remove the box. / 、 The cover frame is a steel cover 1 3 · As in the first item of the scope of patent application, one of the targets is exposed to the T where at least each surface before the bonding is actually 蛊 ^ " level.顶 The top surface of the mask frame is flush 14. As in the method of the first patent application, wait for at least one of the targets to be exposed, where the top surface is flush before the bonding. The surface is not tightly connected to at least one of the target materials of the cover frame, not at least one of the leather materials, such as the method of applying for the scope of the patent application, the cover is fixed to the cover in the cavity. frame. 16. The method according to item} of the scope of patent application is tightly fitted into the cavity. Among them, at least one set of tandem of the leather material enters the alcove so that there is a gap between the target and the .u. 18. · Method 10 in the n of the scope of patent application, where the gap is from about 丨 to about 10 mm. Method 1 in the scope of the patent application, whose former is occupied by σ, The support #plate and the target's exposure 如 17. The method as described in the scope of application for the patent! Item 19. ^ Tangiera has a gap between the support plate and the exposed surface of the correction material. The method of the patent scope item No. 'wherein, before the bonding, the section support plate is actually flush with the top surface of the cover frame, and among them, the support O: \ 88 \ 88457.DOC 200422418 There should be a gap between the exposed surface of the rake material. • For example, please apply the method of the first patent scope, in which before the bonding, a protective layer is arranged on the top surface of the cover frame to prevent the cover frame from sticking to the surface. Far support plate. 22. If the method of applying for the scope of patent No. 21, wherein the protective layer is a cardboard layer. 23. If the method of applying for the scope of patent No. 1, wherein before the bonding, the protective layer is arranged at least One of the recesses to prevent the mask frame from sticking into the at least one recess At least one of the targets. 24. The method according to the scope of application for patent #, wherein before the bonding ~ the middle f is arranged on the top surface of the cover frame and at least the exit surface of the dry material ~ 25. The method according to item 1 of the patent application scope, wherein removing the mask frame from the subtractive material includes cutting the surrounding mask frame. Q 5 Hai at least a portion of the bonded target 26 · ::: Γ method of item 25, wherein the removing step further includes; k-knot target processing 2 ... Please patent the item of item !: the remaining mask frame part. Cut open the Geba material = Where the removal of the mask frame includes a size of the mask frame that surrounds each knot and provides a sufficient support plate to form a flange. Only from the 28 that surrounds the sputtering target material. If the scope of the patent application item 丨 except the mask frame includes-彳, which is removed from the bonded target 29. If the scope of the patent application scope Hi step, remove part of the mask frame. The method of item 1, wherein At least ~ O: \ 88 \ 88457.DOC 200422418 of the target and pg S, 扃, 纟 σ of the target plate The degree is from about 10,000 to about 75,000 psi. 30. 31. 32. 33. 34. 35. 3 6. 37. 'Russian 4 patent scope No. 1, the method in which at least one of the target and the The strength of the door M3 of the support plate is from about 29,000 to about 55,000 psi. For example, the method in the patent range W, wherein at least one of the pure materials has an average grain size of less than about 100 microns. The scope of the application for patents is + the sound of the heart, the square &, /, in which the support plate has a hardness and adhesion to the knowledge 44 * >, ... comparison of the support plate of the dry village river, after bonding The support plate is increased by at least 10%. For example, in the method of applying for the first patent in the patent scope, the glued target is sealed in the alcove in real. If the __ mask frame of the patent application scope No. 3 3 is annealed before the bonding, 纟 :: material encapsulation. In the method of claiming the 34th patent range from the bonding 2, the annealing is performed in an air such as the 34th of the patent application, where the annealing is less than about 80 (TC. 1 person seven births) A method of forming a target by sputtering, including: bonding a support plate to a material 'JL in a cavity in the top surface of a cover frame, and forming a surface to the -pm, A support plate to form a sticky target which is vacuum-sealed in the recess; annealed a good material to form an annealed bonded target; and removing at least and y from the annealed bonded dry material Cover the frame to take out O: \ 88 \ 88457.DOC -4- 200422418 The Tibetan forging free material. Where the adhesion is explosive adhesion and the far adhesion is diffusion adhesion 3 8. The method of item ^ of the scope of patent application is knotted. 39 · For example, the method of applying for the 37th scope of the patent application is concluded. The publication · Ruyan alloy of the 37th scope of the patent. 41 · :: Please apply the first method of the patent scope, in which the sister material includes the state 42. For the method of the 37th scope of the patent application , Of which Ganqin, Copper, Shao, Noodle, Jiu or its alloys. Including drill 43. Rushen The scope of the patent is 37. 37. The support plate includes copper or titanium, copper, aluminum recognized as the scope of the patent application, and the m-bracket includes drill, sharp, button or its alloy. 4 5. Apply for a patented frame. 〇 j. Method, where the cover frame is a steel cover 46. If the method of the 37th scope of the patent application, the exposed surface of the material is μ * ,,,,,,,,,,,,,,,,,,,,,,, 47 This target 47 If the scope of the patent application is 37, the page sheet is unloaded flush. The exposed surface of the material is actual .. Others s-Hai target 4 8 Rushen · Main inspection, /, 5 The top surface of the cover frame Qiping. 48. As in the 37th application for the patent application, the cover frame in the alcove is used. Method 'where the dry material is not fixed to 49. As in the 37th application method of the patent application, it makes the The target is tightly nested in the O: \ 88 \ 88457.DOC ZUU4Z2418 50. 51. 52. 53. 54. 55. 56. 57. 58. Alcove. For example, the method of claim 37 of the patent scope, where: The target is nested in the cavity. There is a gap between the Haigeba material and this. For example, the method of applying for the scope of the patent No. 50,1,1 ,, wherein the gap is from about 1 to about 10 mm. For example, the method of claim 37 of the patent application scope, wherein before the bonding, there is a gap between the support plate and the protruding surface of the target. For example, the method in item 37 of the patent application scope, wherein before the bonding, the support board is horizontally back to the top surface of the cover frame, and among the support floor board and the dry material, There is a gap between the exposed K surfaces. For example, the method of claim 3, where before the bonding, ′, ° and θ are arranged on the top surface of the cover frame to prevent the cover frame from sticking to the support plate. ° As for layer 54 in the scope of patent application. The method, wherein the protective layer is a cardboard as described in item 37 of the patent scope. Before the bonding, the protective layer is arranged in the cavity to prevent the cover frame from being bonded to the cavity. Target. Wang Tau's ancient and earthen method, such as the 37th in the scope of patent application, in which the adhesive intermediate layer is arranged on the τ-4 topcoat of the cover frame and the exposed surface of the target material. Makes it easy to reach the stick. The way out is the Fangbangangan 0 method of the scope of patent application; item Π, wherein removing the mask frame from the sticking includes cutting and enclosing the moving frame. At least part of the solidified bonded target is covered by O: \ 88 \ S8457 DOC 59. If applying for the bonded leather processing method, the removal step further includes 60. Part of the mask frame. Shen-Patent Encirclement Item 37 Cut Package _ ^^ /. The removal of the material frame includes the size of the enclosure, and part of the cover frame and providing-sufficient support plate to form a flange. °, only to remove from the 61 · such as the scope of the patent application that surrounds the sputtering target The mask frame includes a method in which a portion of the mask frame is removed from the adhered dry material by 62.-4 steps. The method of patents in each month is 37 ° ± ^,, where at least the target 63. For example, the scope of the application for the patent 37 = Qing 0 to about 75 ~ a plate ": method, in which the sister material and the support 64". The strength of from about 29, _ to about 55, _psie • The method of item 37 of the patent application range, wherein at least the target material has a + average daily grain size of less than about 100 microns. 65 · If the application of item 37 of the patent application range and adhesion to the dry material> 、 / 、 Compared to the 4 support plate with hard jig, the support plate is increased by at least 10% on the bonded support plate. Μ 66. For example, the method of the 37th scope of the patent application, wherein the annealing is in an air furnace . 67. The method of the 4th patent model @item 37 in the application, its t should be lower than about 800 ° C. ~ ~ 68. — A method to use the money and other materials such as item i in the scope of the patent application to become 69. — A method to use the reduced material in the scope of patent application to item 37; 70. — a method of forming a _knot metal object , Including. Seven O: \ S8 \ 88457.DOC 200422418 The top of the early frame; +-metal object, in which the cavity plate in the 4 surface of the metal object to form a bonded metal object which: the surface is bonded to The annealed and bonded metal object is sealed in the cavity with a hollow core and is removed from the annealed and bonded object. The annealed and bonded object is the bonded metal object. Xi. Let's share this frame to take: 71. If you apply for the item 70 in the scope of the patent, go to the furnace. The annealing is performed in an air 72. The temperature of about 800 ° C, as in the square of the 70th scope of the patent application. Where the annealing occurs below O: \ 88 \ 88457.DOC
TW092127195A 2002-10-01 2003-10-01 Method of bonding sputtering target materials TW200422418A (en)

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