JP2008531298A - System and method for processing nanowires with holographic optical tweezers - Google Patents
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Abstract
液体中のナノワイヤをホログラフィック光トラップのアレイにより操作かつ処理するためのシステムおよび方法。本発明のシステムおよび方法は、物体を3次元で操作する能力を有する数百個の個別に制御される光トラップを生成することができる。20nmもの小ささの断面および20μmを越える長さを有する個々のナノワイヤは、単一トラップが認識可能な影響を及ぼさないような条件下で、ホログラフィック光トラップのアレイにより分離させ、並進させ、回転させ、基板上に堆積させることができる。合焦トラップによって誘発される空間的に局在化する光熱および光化学プロセスも、個々のナノワイヤの局在化された領域を融解させ、かつナノワイヤ接合部を融着させるために使用することができる。 Systems and methods for manipulating and processing nanowires in a liquid with an array of holographic light traps. The system and method of the present invention can generate hundreds of individually controlled light traps with the ability to manipulate objects in three dimensions. Individual nanowires with cross-sections as small as 20 nm and lengths exceeding 20 μm are separated, translated and rotated by an array of holographic optical traps under conditions such that a single trap has no discernable effect. And can be deposited on the substrate. Spatially localized photothermal and photochemical processes induced by focused traps can also be used to melt localized regions of individual nanowires and fuse nanowire junctions.
Description
本出願は、米国特許法第119条(e)項に基づき、2005年1月12日に出願した米国特許仮出願第60/643,384号の利点を主張する出願であり、その内容全体を参照により本明細書に組み込む。 This application is an application claiming the advantages of US Provisional Patent Application No. 60 / 643,384, filed on January 12, 2005, based on section 119 (e) of the US Patent Act. Incorporated herein by reference.
この研究は、認可番号DMR−0233971およびDBI−0450878により米国国立科学財団の支援を受けた。 This study was supported by the National Science Foundation with grant numbers DMR-0233971 and DBI-0450878.
[発明の分野]
本発明は、一般的に半導体および金属ナノワイヤに関する。さらに詳しくは、本発明は、ホログラフィック光トラップのアレイによって、溶液中にある半導体および金属ナノワイヤを操作する手法および処理する手法に関する。
[Field of the Invention]
The present invention relates generally to semiconductor and metal nanowires. More particularly, the present invention relates to techniques for manipulating and processing semiconductor and metal nanowires in solution with an array of holographic light traps.
半導体および金属のナノワイヤは、ナノスケールのデバイスで構成単位として使用される独特な電気的および光学的特性を有する1次元構造物である。それらが低い次元性をもつことは、それらが量子閉じ込め効果を発現することを意味する。このため、およびその他の理由から、そのようなナノワイヤは、機能性を備える電子的なおよびフォトニックなデバイスを組み上げる際の汎用性のある構成単位となる。それらの潜在的能力を実現するには、それらを複雑でありかつ特別に設定された構造となるように組み立てるための効率的な方法が必要である。 Semiconductor and metal nanowires are one-dimensional structures with unique electrical and optical properties that are used as building blocks in nanoscale devices. Their low dimensionality means that they exhibit quantum confinement effects. For this reason, and for other reasons, such nanowires are versatile building blocks in assembling functional electronic and photonic devices. Realizing their potential requires an efficient way to assemble them into complex and specially configured structures.
したがって本発明の目的は、半導体および金属ナノワイヤを操作するための改善されたシステムおよび方法を提供することである。 Accordingly, it is an object of the present invention to provide an improved system and method for manipulating semiconductor and metal nanowires.
本発明の別の目的は、放射による損傷を最小化する一方で半導体および金属ナノワイヤに加えることのできる力の量を増加させるための改善されたシステムおよび方法を提供することである。 Another object of the present invention is to provide an improved system and method for increasing the amount of force that can be applied to semiconductor and metal nanowires while minimizing radiation damage.
本発明の追加の実施形態は、半導体および金属ナノワイヤを並進させるための改善されたシステムおよび方法を提供する。 Additional embodiments of the present invention provide improved systems and methods for translating semiconductor and metal nanowires.
上記目的および本明細書で下述する他の目的に従って、本発明は、ホログラフィック光ピンセットのアレイを使用してナノワイヤを精密に編成された2次元および3次元構造物に組み立てるためのシステムおよび方法を含む。20nmもの小ささの断面および20μmを超える長さを有する個々のナノワイヤは、個々のトラップが認識可能な影響を及ぼさないという条件下で、ホログラフィック光トラップのアレイによって分離させ、並進させ、回転させ、若しくは他の方法で操作し、または基板上に堆積させることができる。合焦トラップによって誘発される空間的に局在化する光熱および光化学プロセスも、個々のナノワイヤの局在化された領域を融解させ、かつナノワイヤ接合部を融着させるために使用することができる。 In accordance with the above objectives and other objectives described herein below, the present invention provides a system and method for assembling nanowires into precisely organized 2D and 3D structures using an array of holographic optical tweezers. including. Individual nanowires with cross sections as small as 20 nm and lengths greater than 20 μm are separated, translated and rotated by an array of holographic optical traps, provided that the individual traps have no discernable effect. Or otherwise manipulated or deposited on a substrate. Spatially localized photothermal and photochemical processes induced by focused traps can also be used to melt localized regions of individual nanowires and fuse nanowire junctions.
本発明のこれらおよび他の目的、利点、および特徴は、その構成および動作方法と共に、添付の図面に関連して取り上げる以下の詳細な説明から明らかになる。図中、同様の要素は下述する幾つかの図面を通して同様の符合を有する。 These and other objects, advantages and features of the present invention, as well as its construction and method of operation, will become apparent from the following detailed description taken in conjunction with the accompanying drawings. In the drawings, similar elements have similar designations throughout the several figures described below.
本発明は、溶液中にあるナノワイヤをホログラフィック光トラップのアレイにより操作かつ処理するためのシステムおよび方法を提供する。本発明のある実施形態では、CdSおよびSiナノワイヤが、本発明を実施するために水中に分散される。この特定の実施形態では、CdSナノワイヤは80nmの公称直径および最大20μmまでの長さを有する一方、Siナノワイヤは20nmもの小ささの直径で、よりいっそう大きなアスペクト比を有する。これらの試料は、きれいなカバーガラスの縁を顕微鏡用スライドの表面にして形成された、厚さ約40μmのスリット細孔内に装填される。どちらの材料も水より実質的に高密度であり(ρCdS=4.8g/cm3、ρSi=23g/cm3)、下側のガラス壁上に急速に沈殿し、CdS試料ではほとんど完全に平面内に位置する。本発明の本実施形態では、密封された試料は、観察および操作のために、100倍、NA1.4のS−Plan Apo油浸対物レンズを装備したZeiss Axiovert S100−TV顕微鏡のステージ上に搭載される。このレンズは、分散されたナノワイヤの明視野画像を生成するため、および532nmで動作する連続波(CW)周波数2倍化Nd:YVO4レーザ(Coherent Verdi)からの光を光トラップに合焦させるためにも使用される。 The present invention provides systems and methods for manipulating and processing nanowires in solution with an array of holographic light traps. In certain embodiments of the invention, CdS and Si nanowires are dispersed in water to practice the invention. In this particular embodiment, CdS nanowires have a nominal diameter of 80 nm and a length up to 20 μm, while Si nanowires have diameters as small as 20 nm and an even larger aspect ratio. These samples are loaded into slit pores approximately 40 μm thick formed with a clean cover glass edge on the surface of the microscope slide. Both materials are substantially denser than water (ρ CdS = 4.8 g / cm 3 , ρ Si = 23 g / cm 3 ) and settle rapidly on the lower glass wall, almost complete for CdS samples Located in the plane. In this embodiment of the invention, the sealed sample is mounted on the stage of a Zeiss Axiovert S100-TV microscope equipped with a 100x, NA1.4 S-Plan Apo oil immersion objective for observation and manipulation. Is done. This lens focuses light from a continuous wave (CW) frequency doubled Nd: YVO 4 laser (Coherent Verdi) operating at 532 nm into an optical trap to generate a bright field image of dispersed nanowires Also used for.
精密に集束させた単一光ビームは、メゾスコピックな物体を3次元で捕獲することのできる、光ピンセットとして知られる光トラップを形成する。しかし、およそ1W未満のレーザ出力では、個々の光ピンセットは、いずれの型の半導体ナノワイヤも移動させることができないようである。より高い出力での急速加熱によって、焦点がナノワイヤを通過する場合には、蒸気の泡が発生する。そのような急速加熱はまた、曲げ、小結節の形成、および切断さえも含む、ナノワイヤ自体の可視的変化を導く。このことは、焦点体積を通過する光子束のもたらす大きな光吸収による加熱とも矛盾しない。 A precisely focused single light beam forms an optical trap, known as optical tweezers, that can capture mesoscopic objects in three dimensions. However, at laser powers below about 1 W, it appears that individual optical tweezers cannot move any type of semiconductor nanowire. Due to rapid heating at higher power, vapor bubbles are generated when the focal point passes through the nanowire. Such rapid heating also leads to visible changes in the nanowire itself, including bending, nodule formation, and even cutting. This is consistent with the heating due to the large light absorption caused by the photon flux passing through the focal volume.
放射による損傷を最小化しながら、ナノワイヤに対しより大きい力を加えるために、動的ホログラフィック光ピンセット技術を用いて多数の回折限界光トラップが投射される。この手法は、空間光変調器(SLM)(Hamamatsu X7550 PAL−SLM)を使用して、集光前に、所望のトラップのアレイを符号化しているコンピュータ設計された位相オンリホログラムをレーザビームの波面に刻み付ける。アレイにおける各トラップは、中間トラップ構成のシーケンスを符号化する一連のホログラムを投射することにより、独立に3次元において並進させることができる。 A number of diffraction-limited optical traps are projected using dynamic holographic optical tweezer technology to apply more force to the nanowire while minimizing radiation damage. This approach uses a spatial light modulator (SLM) (Hamamatsu X7550 PAL-SLM) to transform a laser-wavefront of a computer-designed phase-only hologram that encodes the desired array of traps before focusing. Engrave on. Each trap in the array can be independently translated in three dimensions by projecting a series of holograms that encode a sequence of intermediate trap configurations.
図1(a)の画像は、図1(b)でCdSナノワイヤを移動させる、線形60トラップのアレイからの集束光を示す。この場合、アレイをナノワイヤの面から0.5μm以内に集束させ、1トラップ当たり3mWの出力とした。当初、光トラップのアレイと直角に向けられたナノワイヤは、そのような比較的低いレーザ出力でさえも、数秒内に回転して整列する。0.4μmのトラップ間距離を前提として、およそ15個のトラップがこのナノワイヤに同時にその最終構成に照準される。 The image in FIG. 1 (a) shows the focused light from an array of linear 60 traps moving the CdS nanowire in FIG. 1 (b). In this case, the array was focused within 0.5 μm from the surface of the nanowire, resulting in an output of 3 mW per trap. Initially, nanowires oriented perpendicular to the array of optical traps rotate and align within a few seconds, even at such relatively low laser power. Assuming a 0.4 μm inter-trap distance, approximately 15 traps are simultaneously aimed at this nanowire in its final configuration.
上記の条件を前提として、ひとたびナノワイヤがアレイに対して整列すると、アレイを視野内で移動させることによって、または試料台をアレイに対して動かすことによって、およそu=10μm/秒までの速度で並進させることができる。出力を増大させ、レーザ波長を最適化し、あるいはトラップ当たりの有効な力を高めるための様々な他の機構のいずれかによって、ナノワイヤはu=10μm/秒を超える速度で並進することができることに留意されたい。低レイノルズ数で粘度ηの無限流体中を並進する長さLおよび半径aの円筒の抗力は、近似的に次の通りである。
上記の推定値は、単一光ピンセットがナノワイヤを移動させることができるはずであることを示唆する。しかし、たとえそのようであったとしても、ナノワイヤは運動方向の抗力を最小化する方向に回転し、したがってトラップから逃避する。ホログラフィック光ピンセットのアレイによってもたらされる空間的に延びる捕獲ポテンシャルは、ナノワイヤの向きを維持し、したがって制御された並進を可能にする。 The above estimate suggests that a single optical tweezer should be able to move the nanowire. However, even if so, the nanowire rotates in a direction that minimizes drag in the direction of motion and therefore escapes from the trap. The spatially extended capture potential provided by the array of holographic optical tweezers maintains the orientation of the nanowire and thus allows controlled translation.
光ピンセットに対するナノワイヤの応答の従来の性質は、ヘリカル位相プロファイル
SiおよびCdSナノワイヤはどちらもそれら自体、光のリングの接線方向に整列する傾向がある。ひとたび接線方向に向けられると、放射圧を受ける断面が大きくなり、それらは半径方向に押しのけられる。それにもかかわらず、光渦トラップの領域内にある間、ナノワイヤは、従来のマイクロメートル規模の誘電体球と同じ方向に、周縁部を推進される。これらの観察結果は、ナノワイヤが、それらの極めて小さい断面積にもかかわらず、従来の光勾配力のトラップとして光ピンセットの作用を受けるという解釈と矛盾しない。 Both Si and CdS nanowires themselves tend to align in the tangential direction of the ring of light. Once oriented tangentially, the cross-sections subjected to the radiation pressure become larger and they are displaced in the radial direction. Nevertheless, while in the region of the optical vortex trap, the nanowire is driven around the periphery in the same direction as a conventional micrometer-scale dielectric sphere. These observations are consistent with the interpretation that nanowires are subject to the action of optical tweezers as a trap for conventional optical gradient forces, despite their very small cross-sectional area.
光ピンセットはまた、単一ナノワイヤを光軸に沿って垂直方向に移動させることもでき、それらを基板に対して押し付けることができる。ナノワイヤを堆積させないように安定化させるために特別の注意を払わない場合には、これによって、ナノワイヤがファンデルワールス相互作用によって基板に不可逆的に固着されるという結果を招来する。ナノワイヤが例えば1層の吸着ポリマ界面活性剤によって安定化される場合、それらは依然として、選択的光化学または光熱プロセスによって所定の位置に固定させることができる。これらの最も単純な方法は、安定化層が脱着または破壊されるまでレーザ出力を高めることを含む。そのような選択的接触堆積は、予め作製された機能基板へナノワイヤを制御して組立てるための基礎を提供することができる。そのような光学処理のより積極的な形態を使用して、ナノワイヤ間の接触部を選択的に融解させ、よってそれを融着させて永久的構造物にすることができる。より高精度の変形例は線形または非線形光化学プロセスを使用して、特定の機能性が生成されるように、光化学変化をナノワイヤ接合部に選択的に誘発させることができる。 Optical tweezers can also move single nanowires vertically along the optical axis and press them against the substrate. This results in the nanowires being irreversibly anchored to the substrate by van der Waals interactions if no special care is taken to stabilize the nanowires from depositing. If nanowires are stabilized by, for example, a single layer of adsorbed polymer surfactant, they can still be fixed in place by selective photochemistry or photothermal processes. These simplest methods involve increasing the laser power until the stabilization layer is desorbed or destroyed. Such selective contact deposition can provide a basis for controlling and assembling nanowires on prefabricated functional substrates. More aggressive forms of such optical processing can be used to selectively melt the contacts between nanowires, thus fusing them into a permanent structure. More accurate variations can use linear or non-linear photochemical processes to selectively induce photochemical changes at the nanowire junction so that specific functionality is generated.
本明細書に記載した型のナノワイヤは、特定の強度または特定の波長の光をナノワイヤに照射することによって変更することもできる。それぞれの強度および波長は、ナノワイヤの長さに沿って特定の変化に影響するように選択される。達成することのできる変化は、ナノワイヤの融解、ナノワイヤの切断、および化学的変換を含む。これらの変化は全て、同様または異なる材料から構成されるナノワイヤ間の接合部で発生することができる。そのような変換は結果的に、ナノワイヤ間のみならず、ナノワイヤと他の基板との間にも、機械的、電気的、または光学的接触部を形成することもできる。 Nanowires of the type described herein can also be modified by irradiating the nanowire with a specific intensity or wavelength of light. Each intensity and wavelength is selected to affect certain changes along the length of the nanowire. Changes that can be achieved include nanowire melting, nanowire cutting, and chemical transformations. All of these changes can occur at the junction between nanowires composed of similar or different materials. Such a conversion can result in mechanical, electrical or optical contact not only between nanowires, but also between nanowires and other substrates.
ここに提示する結果は、ホログラフィック光ピンセットのアレイを使用して、半導体ナノワイヤを精密編成2次元および3次元構造物に組み立てることができることを実証する。このプロセスは、光捕獲力を増強するようにレーザ波長を調整することによって最適化することができ、ホログラフィック捕獲技術の進歩と並行してかなり高速化し、かつ大きく前進する。 The results presented here demonstrate that an array of holographic optical tweezers can be used to assemble semiconductor nanowires into precision organized 2D and 3D structures. This process can be optimized by adjusting the laser wavelength to enhance the light capture power, significantly speeding up and making significant progress in parallel with advances in holographic capture technology.
本発明の実施形態の上述の説明は、例証および解説のために提示したものである。それは全てを余すところなく記載し尽くしたものではなく、本発明を開示した厳密な形に限定する意図は無く、上記教示に照らして変形および変化が可能であり、あるいは本発明の実施から得られるかもしれない。本実施形態は、当業者が本発明を様々な実施形態で、かつ考えられる特定の用途に適するように様々な変形を施して利用することができるように、本発明の原理および実際の適用を説明するために選択され記載された。 The foregoing descriptions of embodiments of the present invention have been presented for purposes of illustration and description. It is not exhaustive and is not intended to limit the invention to the precise form disclosed, and may be modified and varied in light of the above teachings or may be derived from practice of the invention. It may be. This embodiment illustrates the principles and practical application of the present invention so that one skilled in the art can utilize the present invention in various embodiments and with various modifications to suit the particular application envisaged. Selected and described for explanation.
Claims (11)
複数の光トラップを形成するステップと、
前記複数の光トラップを第1のナノワイヤに投射するステップと、
前記少なくとも第1のナノワイヤを処理するステップと
を含むナノワイヤを処理する方法。 Inputting a plurality of light beams;
Forming a plurality of optical traps;
Projecting the plurality of optical traps onto a first nanowire;
Treating the at least first nanowire; and treating the nanowire.
前記光トラップのアレイの少なくともいずれかによって投射される出力を増加させることによって、前記少なくとも第1のナノワイヤを前記第2のナノワイヤに融着させるステップと
をさらに含む、請求項1に記載の方法。 Providing a second nanowire;
The method of claim 1, further comprising fusing the at least first nanowire to the second nanowire by increasing the power projected by at least one of the array of light traps.
前記少なくともいずれかの光渦を使用して、前記少なくとも第1のナノワイヤを半径方向に並進させるステップと
をさらに含む請求項1に記載の方法。 Converting at least one of the plurality of optical traps into at least one optical vortex;
The method of claim 1, further comprising: radially translating the at least first nanowire using the at least one optical vortex.
前記接触部が、機械的接触部、電気的接触部、および光学的接触部からなる群から選択される、請求項1に記載の方法。 The change forms a contact between the at least first nanowire and the second nanowire, the second nanowire and non-nanowire substrate, and at least two of the at least first nanowire and non-nanowire substrate. Is,
The method of claim 1, wherein the contact is selected from the group consisting of a mechanical contact, an electrical contact, and an optical contact.
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