TW200422417A - Sputtering target and the manufacture thereof - Google Patents

Sputtering target and the manufacture thereof Download PDF

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Publication number
TW200422417A
TW200422417A TW092123232A TW92123232A TW200422417A TW 200422417 A TW200422417 A TW 200422417A TW 092123232 A TW092123232 A TW 092123232A TW 92123232 A TW92123232 A TW 92123232A TW 200422417 A TW200422417 A TW 200422417A
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Taiwan
Prior art keywords
target
item
divided
manufacturing
thickness
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TW092123232A
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Chinese (zh)
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TWI265203B (en
Inventor
Naoki Ono
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Mitsui Mining & Smelting Co
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    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3407Cathode assembly for sputtering apparatus, e.g. Target

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

The present invention relates to a sputtering target and the manufacture thereof. The target of the present invention would not occur arcing, is capable of forming a film steadily and of preventing the quality of a substrate plate from degrading owing to particles when nodules is happen. A target material constituted from a plurality of divided target materials is bonded with a backing plate through a bonding material to form a sputtering target. Among the divided target material, in connection part between divided targets having different thickness, the connection part of a divided target material having thicker thickness form a level part having a thickness substantially the same as that of the divide target materials having thinner thickness. And, on the divided target material having thicker thickness, a continuous inclined part is formed from the level part to an upper face of the target.

Description

IP030045/SF-929 玖、發明說明: 【發明所屬之技術領域】 本發明財_由_法製造轉鮮的__制的經由黏 、:、。材料接合崎和她所_錄,制___魏個把材在 襯板上的多重分割型的濺射靶。 【先前技術】 山=口 ^列如以半導體等的電子和電器用品材料的膜形成法而 吕’為了可谷脸舰厚和成分,廣泛使_射法。 ㉝在此種麟法巾使用⑽峰__般使驗由雜材料接合從欲形 2=1ΐ形成晴和峨性及輸_物成的襯板 ^平==Γλ剛糊⑽,_部分使用 在此種液晶平板顯示器的領域,有大型化的 數錄材於襯板上的多重分割型的_巴的方案被提出因而配置複 對於賴大_齡濺練,就實行_的 心 仃使配置絲倾的磁;5顯雜顏的枝。° 然而,在此種搖動磁石型的賤射裝 的侵細亍加速,此侵蝴亍的加=,^^場所,乾材 結層時,即會使J:它部分的跏鉍 妾。靶材和襯板的黏 用。 L匕°卩刀的轉大讀留,濺躲整體亦變得不能使 因而’依據習知,如第7圖所示,龄描屮 構為侵舰行快的部分_巴材⑽^ 進;1地⑽,其結 104的厚度更厚。 仏蝕進仃忮的部分的靶材 但是,這種姆102和姆104的厚度(高 射面102a、l〇4a之間形成段差1〇6。因此,在二网,在這些濺 在此段差106的部分之中,互相相鄰的姆内声 1革巴1〇〇會產生 藉由濺射跳出的粒子附著於相鄰的厚度較厚的喪材fn^的革巴材104 的現象。 〇2的側面i〇2b IP030045/SF-929 附著於此厚度較厚的革巴材1〇2的側面 二,,離,剝離的薄片附著於基板時,形::伴,量 才,液晶顯不元件(LCD)等的品質劣化。 y'绝種顆粒附 難以ί定=厚度較厚的姆102的邊緣部耻,容易產生弧光, 口而’在日本特開2_—綱棚號公報中, 其為多重分割濺綠且在分割的 減射乾, 使生成的顆粒產生量降低所構成義雜的Γ度持間不同的乾之中, 在此特開2000-204486號公報,如第8圖所亍 ,,間之中’對厚度較厚的 差,降低錄陶输爾嶋^_樣,處段 所示在號公報⑽峰200,如第8圖 材挪形成伸出材,經由直接傾斜部2G6在厚度較厚的乾 因,’若與顯示在第7圖的錢射fel0 【發明内容】 、 本發明係為達成上述習知技術的難題以及目的而產生,本 鄰接Ζίΐϊ崎之中,在互相相鄰接合之厚度不同的分餘材的相 200422417 IP030045/SF-929 在前述厚度較厚之一方的分割靶材中, 分材的水平部分到上部㈣形成連魏斜厚度較厚的一方的 又,本發明的濺練的製造方法係藉 ^ # 個把材所構成的乾材和襯板的賤練的製造方^材^^由複嫌刀 之中,分·㈣,㈣目咖厚物的分雜材的鄰接部 在厚度較厚之一方的分割靶材的鄰接 的分割輕材的厚度略同的厚度的水平部分;且7 '與厚度較薄 在前述厚度較厚之-方的分雜材中,由前述厚度較厚之 为割把材的水平部分壯雜姻彡錢續傾斜部分。 ’ 因為在此厚度較厚的-方的分餘材的鄰接部分,㈣ ,較,分#池材的厚度略同的厚度的水平部分,而且;形成自ϋ a連結到上棘面的傾斜部分,因此由於在鄰接部壯段差 斜面’結球不產生,沒有由顆麵導致的基板等 寬舰倾轉絲厚之—㈣糾姆躲平部分 結果如分離傾斜部分使放電安定,弧光不易產生,其 又’本發_概鱗财雜厚—方八 水平部分所成的角度為45。以下。 何義斜4刀和 ㈣二二做ΐ古1 為在鄰接部份無段差,所以粒子不附著於傾斜面, =不產生,〉 又有由顆粒導致的基板等的品f的劣化 平部分所成的角度若為45。以τ,在厚度較厚的— 材的邊緣部的弧光《產生,其結果,可安定形成膜。 又,本發明的龍係麵轉絲顧—方的分細 分和傾斜部份之間的部分形成1?部分。 可叼八十邛 如$藉由厚度較厚-方的的分#池材的水平部分賴斜部份之 心形成r部分’因為斜料和讎雜之間不存在邊緣部分,:: 7 I.P030045/SF-929 所以可防止此部份的弧光產生。 又,本發明的特徵係在前述厚度較厚之一方的分 分和傾斜部份之間所形成的R部份為R 0·-以上。° ^材的水平部 =::==一她存在邊緣^ 面^仏梅陶的增 =藉由在厚度較厚之一方的分絲材的上雜面和 上部-和傾斜部份之_緣部料“,( 和傾辑部麵 之間::成和傾斜部分 在,所以可更纽:::;;^^斜部叙财料份部不存 平部分形成的肖料45。訂、It 轉之—方的分_材的水邐 上)形成。 長度〇· 1職以上的直線(C0· 1咖以_ 如此,藉由厚度較厚之一 八 間的部分,係由與厚声耖尸 9刀d靶材的水平部分和傾斜部份之 為45。以下,長度予以上=的^革巴材的水平部分形成的角度 部分和傾斜部份之間變得 ' 、、、(co·1腿1以上)所形成,水平 又,本發明的特防止此部份的弧光產生。 和傾斜部份之間的部分由遠綠1 =又乂厚之一方的分割靶材的水平部分 如此,因為厚:;以匕,線群, 的为割I巴材的水平部分和傾斜部份之 200422417 IP030045ZSF-929 ^的^由連續變化的直線群所形成,所以水平部分和傾斜部份之間 化成更滑順的曲線形狀,可更有效防止此部份孤光的產生。 又,本發明的特徵係前述厚度較厚之一方的分割靶材的上部靶面 口頃斜部份之_部分與前述厚紐厚之―方的分顺材的上部革巴下 的角度為45°以下且由長度以上的直線(C(). lmm以上) 所形成。 如此’ ϋ由厚度較厚之一方的分割乾材的上部乾面和傾斜部份之 曰的部分與上鱗度較厚之—方的分難材社部麵形成的角度為 下且由長度為u_以上的直線(a).lmm)所形成,上部革巴面 和傾斜部份之晴的更滑順,可防止此部份絲的產生。 麻i,本發明的特徵係前述厚雜厚-方的分聽材社部乾面和 傾斜挪之間的部分由連績變化的直線群形成。 八如此度較厚之一方的分割姆的上部把面和傾斜部之間的部 夕由連績變化的直線群所形成,因此由於上部靶面和傾斜部份 续邮/蘭近似於崎_狀,在上部麵和傾斜部份之間邊 緣挪不存在,所以可更有效果防止此部份的弧光產生。 伽的特徵係在前述分娜材之中,互相鄰接的不同厚度的分 釗靶f的鄰接部角落,實施邊緣處理。 構成,因為在分割革巴材的鄰接部角落部,實施邊緣處理, 此#邊緣部份不存在,所以可有效防止此部份·光的產生。 ^本毛明的特徵係别述邊緣處理為1刪〜_的R面處理。 形狀错:分綱的鄰接部的角落部,形成更滑順的曲線 □為雜Μ不存在齡·材的雜部 止此部份的弧光產生。 J有放防 t本發明的特徵係前述邊緣處理為⑶· lmm〜5刪的c面處理。 精由此種構成,邊緣部變得滑順,可防止弧光產生。 成間1^。,本發明的特徵係在前述分聽材的相互鄰接的鄰接部之間形 進行崎時藉由轟Μ離子_材,加熱於崎。此時,在間 9 200422417 IP030045/SF-929 隙不存在於分割崎的鄰接部之間的情況,於革巴材膨服時,由分割部 產生碎片,形成顆粒和弧光的產生原因。又,在補的 稍IP030045 / SF-929 发明 、 Explanation of the invention: [Technical field to which the invention belongs] The invention of this invention _ made by _ law to fresh _ _ made by __ through. The material was joined by Saki and her, and a multi-split sputtering target with materials on the lining was made. [Prior art] Mountain = mouth ^ The film formation method of electronic and electrical appliances such as semiconductors, etc. Lu's method is widely used in order to reduce the thickness and composition of the ship. ㉝Using the ⑽ peak in this kind of towel, the joint is made of miscellaneous materials. From the shape 2 = 1, it forms a sunny and pristine lining. 平平 == Γλ rigid paste, _ partially used In the field of this type of liquid crystal flat panel display, a multi-division _bar solution with a large number of digital recording materials on the backing board has been proposed. Therefore, the configuration is complicated. Silk tilted magnetism; 5 motley branches. ° However, the invasion rate of this type of rocker-type low-level shooting equipment is accelerated. When the invasion rate is increased, and the dry material is layered, it will cause J: part of it. Target and liner bonding. L Diao ° 卩 刀 's turn to read and stay, the splash and hiding as a whole can not be made so' according to conventional knowledge, as shown in Figure 7, the age depiction structure is part of the invasion of the ship _ 巴 材 ⑽ ^ 进; 1 floor, the thickness of the knot 104 is thicker. However, the thickness of this part 102 and 104 (the high-radiation surfaces 102a, 104a form a step difference of 106). Therefore, in the second net, the splashes in this section differ by 106. Among the parts, the adjacent mne sound 1 geba 100 will cause particles jumping out by sputtering to adhere to the adjacent geba material 104 of the thicker fungus fn ^. 〇2 The side surface i〇2b IP030045 / SF-929 is attached to the side surface of this thicker leather material 102. When the detached and peeled sheet is attached to the substrate, it is shaped like: companion, quantity, liquid crystal display element. (LCD), etc. The quality of the extinct particles is difficult to determine = the thickness of the edges of the thicker M 102 is more shame, which is prone to arcing. Multi-segment splashing green and splitting the reduced shot dry to reduce the amount of particles generated by the formation of different heterogeneous interspersed stems. In this JP 2000-204486, as shown in Figure 8 The difference between the thickness and the thickness is relatively low, which reduces the amount of recording and recording. It is shown in the paragraph at the peak 200 of the bulletin, as shown in Figure 8 Forming the protruding material, through the directly inclined portion 2G6, the thickness is thicker, "If it is with the money shot fel0 shown in Fig. 7 [Summary of the invention], the present invention is to achieve the problems and objectives of the conventional technology In this adjoining ΐϊ ΐϊ ΐϊ 余, the phases of the separated materials with different thicknesses joined to each other 200422417 IP030045 / SF-929 In the aforementioned divided target with a thicker one, the horizontal part of the divided material goes to the upper part. To form the thicker one of Lien Wei, the manufacturing method of the splash training method of the present invention is to use ^ # dry materials composed of handles and the base manufacturing methods of the lining materials. In the middle, cent, ㈣, and thick part of the adjoining part of the miscellaneous material, the horizontal part of the thickness of the adjacent divided light material that is adjacent to the divided target of the thicker one is 7; It is thin in the thicker square-shaped mixed material, which is thicker as the horizontal part of the torch material, and the continually inclined part is thinner. '' Because the thicker squared material is thicker here The adjoining part of the wood, ㈣, is relatively thin The horizontal part of the surface is also formed; since the sloping part connected to the upper spine surface is formed by the 斜 a, because of the lack of ball formation in the abutment section of the abutment section, the ball is not tilted by the width of the substrate. As a result of the partial hiding part, if the inclined part is separated, the discharge is stabilized, and the arc light is not easy to produce, and the angle of the horizontal part of Fangba is 45. Below. He Yi oblique 4 knife and ㈣ 二Second, ΐ 古 1 is because there is no step in the adjacent part, so the particles do not adhere to the inclined surface, = does not occur, and the angle formed by the flat part of the product f, which is caused by the particles, is 45. τ, an arc at the edge of the material with a relatively thick thickness is generated, and as a result, a film can be formed stably. In addition, the portion between the subdivision and the inclined portion of the dragon-based surface of the present invention forms a portion. May be eighty, such as $, by the thicker-square part #The horizontal part of the pool material is formed by the heart of the oblique part, because there is no edge part between the oblique material and the impurity: 7 I .P030045 / SF-929 So it can prevent arc light in this part. The present invention is characterized in that the R portion formed between the thicker one of the thicker portions and the inclined portion is R 0 ·-or more. ° ^ the horizontal part of the material = :: ==-she has edges ^ face ^ Mei Tao increase = by dividing the upper surface of the wire with a thicker side and the upper part-and the edge of the inclined part部 料 ", ((Between the surface of the inclination section :: 成 and slanted part, so you can change it ::: ;; ^^ The oblique section describes the material 45 that is not formed by the flat part. Order, It turns—the square is divided into _ materials of water leeches). The length is more than 1 straight line (C0 · 1 coffee to _ so), with the thicker one of the eight parts, it is made with thick sound. The horizontal and inclined parts of the target of the 9 dead knife 9 d are 45. Below, the length between the angled part formed by the horizontal part of the leather and the inclined part becomes' 、,, (co · 1 leg 1 or more) formed horizontally, the present invention prevents the arc of this part from occurring. The part between the inclined part and the green part is far green 1 = the horizontal part of the divided target. , Because the thickness is: 200422417 IP030045ZSF-929 ^ is formed by the group of straight lines that cuts the horizontal part and the inclined part of the bar material with dagger and line group, so The horizontal part and the inclined part are formed into a smoother curved shape, which can effectively prevent the generation of solitary light in this part. Moreover, the feature of the present invention is the upper target surface opening of the aforementioned divided target with a thicker one. The angle of the _ part of the oblique part and the above-mentioned thick and thick square-shaped sub-shun material is 45 ° or less and formed by a straight line (C (). 1mm or more) above the length. So '' The angle formed by the upper dry surface and the inclined part of the thicker one-part divided dry material and the upper scale is thicker-the side of the part-different material company's surface is downward and the length is u_ or more Formed by the straight line (a) .lmm), the upper leather surface and the inclined part are smoother and smoother, which can prevent the generation of silk in this part. Hemp i, the feature of the present invention is the aforementioned thick miscellaneous thick-square The part between the branch surface and the inclined surface of the branch of the material society is formed by a straight line group that changes in succession. The part between the upper part of the upper split surface and the inclined part that is thicker than this is changed by the succession. The formation of a straight line group, so because the upper target surface and the inclined part continue The edge between the upper surface and the inclined part does not exist, so it can prevent the arcing of this part more effectively. The characteristic of Gamma is the abutment of the fractal targets f of different thicknesses which are adjacent to each other among the aforementioned materials. Edge processing is performed at the corners of the parts. Because the edge processing is performed at the corners of the adjacent parts of the split leather, this #edge part does not exist, so it can effectively prevent the generation of this part of light. ^ 本 毛 明 的The feature is different from the edge processing of 1 to the R surface processing. Wrong shape: The corners of the adjacent part of the outline form a smoother curve. This is the part where there is no age or material. The arc light is generated. J 有 防 防 t The feature of the present invention is that the aforementioned edge processing is CU · mm ~ 5 deleted c-plane processing. With this structure, the edges become smooth, and arc light can be prevented. Into 1 ^. A feature of the present invention is that the saki is heated by the ions ion material when the saki is formed between the adjacent abutting portions of the aforementioned sound-distributing materials. At this time, in the case where the gap between 2004200417 IP030045 / SF-929 does not exist between the adjacent parts of the dividing slab, when the leather is expanded, the dividing part generates fragments, forming particles and arcing causes. Again, slightly

扭曲時亦產生碎片等。 "寻稍U #但是,如此在分割靶材的互相鄰接的鄰接部之間,藉由形成 吸收膨脹和安裝時的扭曲,可有效防止由此碎片等產生的 又’本發明的特徵係前述分雜材的鄰接部之間的間 〜0.7mm的間隙。 · 1111 y有效PI止B]為此碎片等的產生引起_粒和弧光。 驻吐!!f具有職A小制_隙,經由間隙可更有效魏膨脹和安 摘的扭曲’可有效防止由此碎片等產生_粒和弧光。 化物^ ’在本發明,前述補希望為將ίη或Sn作為主成分的金屬氧 【實施方式】 =下’基於®式麟細說明本判的實施麵(實施奶。 f 1圖係斜視圖,顯示本發明的第丨實施例麟練,第2圖係 線的截面圖。第3圖係第2圖的部分擴大截面圖。 在^ 1圖之中,1G表示本發明峡射轉體。 板12 ^由’賤射喪1〇係由矩形板狀的概板與在纖 材16所:成广(妾合之侵•部所構成之複數個矩形狀分割把 此It;兄材16的材料雖無特卿 想,尺寸變大的平板面板顯示器的製造材料為 (In-Sn氧化物),IZO (In-Zn氧化铷、处 使用11 以及氧傾等。 氧化物)、鉻、銦、ZAG (Al-Ζη氧化物) 又,以襯板12的材質而言,盔 無特別限定,但若考慮強度,例f鋼在兄,襯板12的厚度D雖 該厚度希望為1。刪〜5〇mm。 材貝為CU (厕G2G)的情況, 10 IP030045/SF-929 更且’以用於乾材16和襯板12的接合 照靶材16和襯板12的材質,雖亦盔特別、^ ;: * 系等的金屬形成的黏結焊ί材亦…特別限疋’但可使用独系和Sn 谁—ΐί 2和第f圖所示,在麟峰1G ’就赠16而言,將侵敍 進订夬的部分的端部之端部經分宝彳賤 進行慢的中央部份的㈣的厚綱讎 18和因,在互相輸卿厚_緣部分_ 一 j中央抑刀割乾材20的鄰接部分24和36之中, ^方的分割姆的邊緣部分割純18的鄰接部分%,形^平部分 部分割靶材20的厚的希成與厚度較薄的分割靶材的中央 *以此水平部分26的寬度w而言,厚度較厚之一方的分 材18的邊緣部28,藉由與厚雜狀Μ的巾央部_ 祕隔離’為了可壓制弧級產生和安定形成膜: 希i為1刪以上,敢好是5mm以上。· 26 5 18 32 所以=接Iff足水平部份連接到上部細32的傾斜部份34, 钟妾4和36間無段差,粒子不附著斜面,結球不產生, 導致由顆粒所產生的的基板等品質的劣化。 此情況’可抑齡厚度較厚之—方的分· 的邊緣部28的孤光產生,其結果 成m乾材 於傾斜面,傾斜部份34和水平部份26的形成角度二74=下1 好希望是30。以下。 以下,較 ㈣更3騎示’在分雜材18、2()的互_接_接部 伤24 36之間,形成間隙洲。 亦卩進行,賤射時,藉由離子轟擊把材π,加熱於免 。 在此時’於分割乾材18和20的鄰接部份24和36之間不存在間隙的 200422417 IP030045/SF-929 ^ TTIT: ’、曰θ在靶材的安裝時,於稍微扭曲時亦產生碎片。 藉由才18、2〇的互相鄰接的鄰接部分24、36間, 止因駐碎片所引起之 ==_和安裝時的扭曲,可有效的防 大小止因產生碎片所引起之顆粒和弧光,此間隙38的 幻S希絲〇· 05麵〜〇· 7刪,最好為0.1〜〇 5刪。 分擴與顯示本發明的濺餘的第2實施例的_同樣的部 此實施例職練係與顯示在第 在此只知例的賤射革巴10,於邊緩立八 傾斜部份34之間的部份形成==刀_18的水平部㈣和 如此,藉由形成在水平部份26和傾 部份40,因為邊緣部份不存在於水平部間的部份形成R 以可防止此部份_光產生。奸礼26和傾斜部㈣之間,所 此情況,在水平部份26和傾斜部份34 希望為R(U咖以上,最好是R〇. 5删〜R5〇晒。曰的*中之㈣份4〇 如此,藉由於水平部份26和傾斜部份%Debris and the like also occur when twisted. " 寻 略 U #However, in this way, it is possible to effectively prevent the fragmentation and the like caused by the debris and the like between the adjacent adjacent portions of the divided target material by forming the distortion during the absorption and expansion, and the distortion during installation. A gap of ~ 0.7 mm between the adjacent portions of the miscellaneous materials. · 1111 y effective PI stop B] causes the generation of debris and arc light. The spit !! f has a small system _ gap, which can be more effective to distort and distort through the gap ’, which can effectively prevent the generation of particles and arcs from the debris. Compound ^ 'In the present invention, the aforementioned supplement is preferably metal oxygen containing η or Sn as a main component. [Embodiment] = Next' A detailed description of the implementation of this judgment based on ® formula (implementation of milk. F 1 is a perspective view, A cross-sectional view of the second embodiment of the present invention is shown in FIG. 2, which is a cross-sectional view of FIG. 2. FIG. 3 is a partially enlarged cross-sectional view of FIG. 2. 12 ^ '由 射 丧 10 is composed of a rectangular plate-shaped outline plate and the fiber material 16: Cheng Guang (combined invasion • Ministry of multiple rectangular-shaped divisions to divide this; Brother material 16 material Although there is no special thought, the manufacturing materials of flat panel displays with larger sizes are (In-Sn oxide), IZO (In-Zn hafnium oxide, 11 used everywhere, and oxygen tilt. Oxides), chromium, indium, ZAG (Al-Zη oxide) In terms of the material of the backing plate 12, there is no particular limitation on the helmet, but if considering the strength, for example, the steel f, the thickness of the backing plate 12 is desirably 1. However, the thickness is 1. 〇mm. In the case where the material is CU (toilet G2G), 10 IP030045 / SF-929 is also used for the joining of the dry material 16 and the liner 12 according to the material of the target 16 and the liner 12 Although the helmet is special, ^ ;: * is a bond welding material made of metals such as… is particularly limited to 但, but you can use the unique line and Sn Who-ΐ 2 and f, as shown in Lin Feng 1G ' In terms of gift 16, the thick end of the central part of the central part of the end of the end of the part that is invaded into the order is divided into the thick part and the thick part of the central part. Among the adjacent portions 24 and 36 of the central blade-cutting dry material 20, the edge portion of the square dividing portion divides the adjacent portion of pure 18%, and the flat portion portion of the target material 20 is thicker than the thickness. The center of the thin divided target material * In terms of the width w of the horizontal portion 26, the edge portion 28 of the thicker one of the partial materials 18 is separated from the central portion of the thick M-shaped towel _ Pressing arc level generation and stability to form a film: i is more than 1 deleted, and it is better to be more than 5mm. · 26 5 18 32 So = iff If the horizontal part is connected to the inclined part 34 of the upper part 32, the bell 4 and There is no step difference between 36, particles do not adhere to the inclined surface, no ball formation, resulting in deterioration of the quality of the substrate and the like caused by the particles. In this case, the thickness can be suppressed. The solitary light at the edge portion 28 of the square is generated, and the result is that m dry material is on the inclined surface, and the angle of formation of the inclined portion 34 and the horizontal portion 26 is 74 = lower 1 It is hoped that it is 30. Below. It ’s more than 3 rides, and it ’s a gap continuum between the mutual material 18, 2 () and the joint damage 24 to 36. It is also carried out. When shooting, the material π is bombarded by ion bombardment. At this time, 200422417 IP030045 / SF-929 with no gap between the adjoining parts 24 and 36 of the divided dry materials 18 and 20 ^ TTIT: ", θ is slightly different when the target is installed. Debris also occurs when twisted. With the adjacent sections 24 and 36 adjacent to each other only 18 and 20, to stop the distortion caused by the debris and the installation, it can effectively prevent the particles and arcs caused by the debris, The magic S. Hess 05 surface to 0.7 of this gap 38 is deleted, preferably 0.1 to 0.05. The same part as the second embodiment of the second embodiment of the present invention is shown in this example. The vocational training system of this embodiment and the base shot 10 shown only in this example are shown here. The part formed between the == knife_18 horizontal part 如此 and so, by forming in the horizontal part 26 and the inclined part 40, the part where the edge part does not exist between the horizontal parts forms R to prevent This part _ light is generated. Between the rite of worship 26 and the slanted part 此, in this case, it is desirable that the horizontal part 26 and the slanted part 34 be R (Uca or more, preferably R0.5 to R50). Said * 中 之This is 40% because of the horizontal part 26 and the inclined part%

部份4〇舰Wu,水平雜26和=的精所形成之R 的曲線’因為邊緣部份不存在於水平部份26科=i 以更可有效防止此部份的弧光產生。 、’邛伤34之間,所 又,本實施例的濺雜10,於端部好从 傾斜部份34之間的部份形成R部份公。 8的上部靶面32和 又,如此,藉由在上部靶面32和傾 部份42,因為邊緣部不存在於上部革巴、=34之間的部份形成R 可防止此部份孤光的產生。 和傾斜部份34之間,所以 又,此實施例的濺射靶1〇 ,於上部 形成R部份42希望為R0· lmm以上,最杯^2和傾斜部份34之間所 疋肋· 5mm〜R5〇mm。 12 200422417 IP030045/SF-929 如此’藉由於上雜面32和傾斜部份34之間所形成的R部份42 以上,上雜面32和傾斜部份34之間形成更滑順的曲線, 因為邊緣部份不存在於上部乾面32和傾斜部份3 效防止此部份的弧光產生。 j β X j兩 的R 在此實補,賴可設置水平部份26與傾斜部份34之間 =挪40及上雜面32與傾斜部份34之間的 部份,但可只設置任何一方的R部份。 ,八 又,水平部份26和傾斜部份34之間的部份的R部份4(),如第6 =不’亦可代之為由水平部份26和傾斜部份抑之間的部份仙,盘 2Γ26 度$為45。以下,長度u為G.1腿以上的直線 的所形成。再者,在第6圖的實施例,顯示々為】 如此,藉由與水平部份26所形成的角度為奶。 〇· 1咖以上的直線(CO· lmm以上)50 下長度L1為 ^ 34 48 , 這些水.平部份26和傾斜部份34之門 為銳角。不存在於 又,上部細32和二部士此部份,光產生。 亦可代之為上部乾面32和傾斜部% 晶42’如第6圖所示, 面形成的角度r為45。以下且長/L2 ^間的部份52係由與上部靶 以上)形成。再者,在第6圖的實X「的直線(OU刪 如此,藉由上部乾面32和J,丁為30 。 歡面所形成的角度r為45。以下日Y之間的部份52由與上部 (CO. 1刪以上)54形成,因 Ί L2為〇· 1刪以上的直線 於這些上部乾面32和傾钭邻n X ♦ ’所以因為銳角部份不存在 生。 34之間’所以可防止此部份的弧光產 再者,在此情況,亦可由角产、 直線(CO. lmra以上)形成水平^、、以下且長度為〇· 1咖以上的 上部靶面32和傾斜部分34 ^ ϋ傾斜部分34之間的部分以及 更且,雖去- \ 的部分的任何一方。 ^’水平部分26和傾斜部分34之間的部分的 200422417 IP030045/SF-929 分40可代之以此水平部分26和傾 度為45°以下且長度為〇1咖以上直77 ^間的部份從上述的角 續變化的直線群形成。 |丨_以上)形成的連 又,同樣地,上部靶面32和傾 之以此上部靶面32和傾斜部分間刀的R部分42,可代 且長度為〇_ i刪以上的直線(C0 lmm m由上述角度為45。以下 形成。 上)形成的連續變化的直線群 如此,因為這些水平部份26和傾 革巴面32和傾斜部分34之間的部從°刀34=的部分以及上部 〇. 1咖以上的直線(C0. lmm以上)^度為45以下且長度為 以這些水平部分26和傾斜部分34 ’所 狀的曲線,所以.因為在這些部分邊更近姆順曲線形 止此部份的弧光產生。 兄角邊緣柯存在,所以可更有效防 再者,在此情況,亦可由此種連續 和傾斜部分34之間的部分 、、柄形成水平部分26 部分的任何—方。P刀以及上雜面32和傾斜部分34之間的 更且’可將水平部分26和傾斜部分抑之間的部分,以墙 =和傾斜部分34之間的部分,使R部分,角度為45。且= 為(U刪以上的直線(C0. i咖以上)的連續變化直線群组合使用長度 分擴與顯不本發明醜躲的第3實施例的第3圖同樣的部 ,實補義射減本讀齡在第丨圖姻躲W同樣 成,相同的構成部件賦予相同的參考號,其詳細說明則省略。 在此實關_練1G,分#騎之巾,於互帅 的邊緣部分巧材18和中央分_材2G的鄰接部分24、邪 部44、46,實施邊緣處理。 再各 藉由這樣的構成,在分練材18、2G的鄰接部分24、36的 部44、46,因為實施邊緣處理,所以因為在此部份不存在 所以可更有效防止此部份的弧光產生。刀 14 200422417 IP030045/SF-929 此情況’以邊緣處理而言,希望是趾丨画〜5顏的R面處理。 至於此邊緣處理,藉由作成助山職〜加㈤的R面處理,分割把 材18、20的鄰接部分24、36的角落部44、46呈現更滑順的曲線形 狀,因為在分纖材18、2〇的鄰接部分的角落部44、46不存在邊緣 部分,所以可更有效防止此部份的弧光產生。 又,以邊緣處理而言,希望是CO.lnmi〜5mm的C面處理。 藉由這樣的構成,沒有銳角的邊緣,可更有效防止弧光產生。 再者,在此情況,亦如上述的第2實施例,可將水平部分26和 傾斜部分34之間的部分,以及上部紙面32和傾斜部分%之間的部 分為R部分,角度為45。以下且長度為〇· lmm以上的直線(c〇· _ 以上)的連續變化的直線群組合使用。 【實施例】, 【實施例1】 如第3圖所示’寬度127刪X長度4〇6.4mm的矩形ITO輕材(氧 化銦和氧化肺材,Sn〇2=l〇.0wt%,相對密度w以上)兩端的長 度的1/3分別作成厚度1〇刪_部分割乾材18、18,剩下的1/3的 長度製作成厚度5mm的中央分割靶材2〇。 如弗d圃所不圆序厌的端邵分割靶材18的葬 割部)24,形成寬W為5mm的水平部分26和傾斜部分34。 此傾斜部分34為了傾斜部分34和水平部分%卿 成為60。、45°和30。,進行研磨加工製作傾斜部分料。 a 因而,在預熱板上加熱無氧銅製襯板12 (15〇職χ 44〇· 7職)’使由低融點銲錫(純ιη) (99·9%〜99.99%程声 成之黏結材料14熔解。 ^ ^; η 其次,首先使用這些具有餘熱的分割靶材18、2〇,生立 插入物且_齡_隔〇.4mm載題著於她127 由從襯板的内面側以冷風冷卻而接合,製作本發明的賤射乾。i ’ 又,作為比較例,則不形成水平部分,如第8 。 206,與傾斜部分34同樣,製作成角度時45。以外, 15 200422417 1P030045/SF-929 習知的濺射靶200。 對這些錢射把’藉由孤光計數器(Landmark technology公司製), 監控弧光的產生次數。 以濺射條件而言,用下述的條件進行。 製程壓力=3mTorr (Ar) 投入電力量=1· 2W/cm2 濺射時間=40小時 膜形成溫度=室溫 其結果顯示於下述表1。從表1可明瞭,與習知的濺射靶2〇〇比 較’本發明的濺射靶ίο ’弧光的產生次數亦少。特別是,傾斜部分34 和水平部分26所形成的角度α為45。以下,弧光的產生次數少是良 好的。 【實施例2】 除了水平部分26的寬度W為〇· 5mm和lmra,傾斜部分34和水平 部分26所成的角度α為45以外,與實施例一樣,製作本發明的濺 射靶10。 這些本發明的錢射把10 ’與實施例一樣,藉由弧光計數器,監控 弧光的產生次數。 其結果顯示於下述表1。從表1可明瞭,水平部分26的寬度W若 為1· 0mm以上,弧光的產生次數少且優良。 【實施例3】 如第4圖所示的實施例,在水平部分26和傾斜部分34之間的部 分形成R部分40,在上部靶面32和傾斜部分34之間的部分形成R部 分42,且除了傾斜部分34和水平部分26所形成的角度α為奶。以 外’與實施例1 一樣,製作本發明的賤射乾。 再者,就這些R部分40和42,製作RO.lmm和R5mm的藏射粑10。 就這些本發明的濺射靶10,與實施例丨一樣,藉由弧光計數器, 監控孤光產生次數。 其結果顯示於下述表1。從表1可明瞭,r部分4〇、42的R若為 16 200422417 IP030045/SF-929 【實:::】,弧光的產生次數少且優良。 部分26所成的角产α^5。^的邊緣處理,且傾斜部分34和水平 蘭乾10。 外,與實施例1 —樣,製作本發明的 再者’製作這些R部分的R為R〇.—和R2_濺射無1〇。 控弧==嶋1〇 ’與實施例1-樣’籍由一,監 A八其結果顯示於下述表1,由表1可明暸,分割姆18、20的鄰接 Γί i4、36的角落部44、46的R部分的R若從RU麵至刪,孤 九的產支。欠數少且優良。 __實施例 ....... 條件 _| 弓H次數 貫施例1 _a=30°,W=5,無邊緣處理 251 f45<> ’ ,無邊緣處理 511 ^^~~__- 貫施例2 〇=60° > W=5,無邊緣處理 683 ^5: 無邊緣處理 735 -__ 。,無邊緣處理 637 實施例3 γ=45。,w=5,傾斜部 Π=0·1 459 -__ 貫施例4 α=45° ,傾斜部 R=5 413 α=45。’ W=5,分割部 R=〇.i 464 —_ f45° ,W=5,分割部 370 "" ---"—--—-- α^45° ^W=〇,無邊緣處理 707 再者’在上述的實施例,雖然水平部分26 為慢慢下降的緩傾斜面。 &十1一 作^又在上述實施例,雖就襯板12的上面為平坦的實施例說明, 〜右端部分鄕材18的水平部分26和中央部分割姆2〇的上面成 17 200422417 iP030045/SF-929 為相同高度亦可’襯板u的厚度在邊緣部分 靶材20的部份可作成不同高度(有段差)。 才;P央。丨刀d 以上’雖就本發較讀施例制,但本發日林限定於此,例如, ’雖就矩形狀的_月,但圓盤形狀的靶材的情況 亦可適財,在不脫離本發明的目的的範圍,可有_ 、若由本發明,在厚度解之—方的分割麵_ 形 成具有與厚度較薄的分贿材的厚度略_厚 二 == 度Τ一方的傾斜,藉由餘分割=,放i安 疋孤光不易產生,其結果,可安定形成膜。 =,因敏水平部分形錢結於上雜面賴斜部分,所以因 為/又有在«部分的段差,所峰子不崎於傾斜面, 不招致由顆粒的基板等的品質的劣化。 〆 又,若由本發明,水平部分和傾斜部份之 ^The curve of R formed by part 40, Wu, horizontal impurity 26 and = fine because the edge part does not exist in the horizontal part 26 section = i, which can more effectively prevent the generation of arc light in this part. ′, Stabbing 34, so that the spatter 10 of this embodiment is formed at the end from the portion between the inclined portion 34 to the R portion. The upper target surface 32 of 8 and again, so, by forming an R on the upper target surface 32 and the inclined portion 42 because the edge portion does not exist in the upper gap, = 34 can prevent this part from being lonely. The generation. And the inclined portion 34, so, again, the sputtering target 10 of this embodiment, the R portion 42 formed on the upper portion is desirably R0 · lmm or more, the rib between the cup 2 and the inclined portion 34. 5mm ~ R50mm. 12 200422417 IP030045 / SF-929 In this way, with the R portion 42 formed between the upper miscellaneous surface 32 and the inclined portion 34 above, a smoother curve is formed between the upper miscellaneous surface 32 and the inclined portion 34 because The edge portion does not exist on the upper dry surface 32 and the inclined portion 3 to prevent arcing in this portion. j β X j The two Rs are complemented here, depending on whether the horizontal part 26 and the inclined part 34 can be set = the distance between 40 and the upper surface 32 and the inclined part 34, but only any The R part of one side. Eight, and the R part 4 () of the part between the horizontal part 26 and the inclined part 34, if the 6 = no ', it can be replaced by the horizontal part 26 and the inclined part. Part of cents, the plate 2Γ26 degrees $ 45. Hereinafter, the length u is formed by a straight line having a length of G.1 or more. Furthermore, in the embodiment of FIG. 6, it is shown that 々 is so. Thus, the angle formed by the horizontal portion 26 is milk. The length L1 of a straight line (CO · lmm or more) above 50 ° is ^ 34 48, and the gates of the flat portion 26 and the inclined portion 34 are at an acute angle. Light does not exist in the upper part 32 and the second part. Alternatively, the upper dry surface 32 and the inclined portion% crystal 42 'may be replaced by an angle r formed by the surface as shown in FIG. The portion 52 below and long / L2 ^ is formed above the upper target). Furthermore, the straight line ("OU" in Fig. 6 is the same as in Fig. 6). With the upper dry surface 32 and J, D is 30. The angle r formed by the happy surface is 45. The portion 52 between Y on the following day It is formed with the upper part (CO. 1 or more) 54. Since L2 is · 1 or more, the straight lines above the upper dry surface 32 and the inclined adjacent n X ♦ 'There is no sharp angle part. 34 between 'So it can prevent arc light from being produced in this part. In this case, it can also be formed by angle production, straight lines (above CO. Lmra) to form horizontal ^, upper and lower target surfaces 32 and lengths of 0.1 or more, and tilt. Part 34 ^ 之间 The part between the inclined part 34 and more, though, go to either of the parts of \. ^ '200422417 IP030045 / SF-929 points 40 which can be replaced by the part between the horizontal part 26 and the inclined part 34 From this, the horizontal portion 26 and the portion with an inclination of 45 ° or less and a length of 77 cm or more are formed from the above-mentioned group of linearly continuously changing angles. | 丨 _) The formation of the same, and similarly, the upper part The target surface 32 and the R portion 42 of the knife between the upper target surface 32 and the inclined portion can be replaced and the length is 0. The straight line above (C0 lmm m is formed by the above-mentioned angle of 45. Below. Top) is formed by the group of continuously changing straight lines, because the part between these horizontal portion 26 and tilting surface 32 and inclined portion 34 is from the knife The 34 = portion and the straight line above the top 0.1 cm (above 0.1 mm), the degree is 45 or less, and the length is a curve shaped by these horizontal portions 26 and inclined portions 34 ′. The near-musciform curve stops the arcing of this part. The existence of the edge of the corner of the brother angle, so it can be more effective to prevent further, in this case, the horizontal part can also be formed by the part between the continuous and inclined part 34, and the handle. Any part of the 26 part. The P knife and the part between the upper miscellaneous surface 32 and the inclined part 34 can be used to reduce the part between the horizontal part 26 and the inclined part to the part between the wall = and the inclined part 34. Let R be an angle of 45. and = is a continuous change of a straight line group (above the U line above (C0. I coffee line) or more) in combination with the use of length extension and showing the third embodiment of the ugly hiding of the present invention. In the same department, the actual supplementary age is reduced in the age of figure 丨Hiding W is the same, and the same components are given the same reference numbers, and detailed descriptions are omitted. Here is the _ practice 1G, points # Riding the towel, in the edge part of the mutual handsome 18 and the central points _ 2G Adjacent parts 24, evil parts 44, 46 are subjected to edge processing. With such a structure, each of the parts 44, 46 of the adjacent parts 24, 36 of the training materials 18, 2G is subjected to edge processing. This part does not exist so it can more effectively prevent the occurrence of arc light in this part. Knife 14 200422417 IP030045 / SF-929 In this case, in terms of edge processing, it is hoped that the toe is painted with ~ 5 colors of R surface processing. As for this edge treatment, the corner surface 44 and 46 of the adjoining portions 24 and 36 of the divided materials 18 and 20 have a smoother curved shape by making the R-surface treatment of Sukeyama to Kasuga. There is no edge portion at the corner portions 44 and 46 of the adjacent portions of 18 and 20, so it is possible to more effectively prevent the occurrence of arc light in this portion. In terms of edge processing, C-plane processing from CO.lnmi to 5 mm is desired. With such a configuration, there is no sharp-edged edge, and it is possible to more effectively prevent arc light from occurring. Furthermore, in this case, as in the second embodiment described above, the portion between the horizontal portion 26 and the inclined portion 34 and the portion between the upper paper surface 32 and the inclined portion% may be divided into R portions at an angle of 45. The following group of straight lines (continuously varying c0 · _) with a length of 0.1 mm or more is used in combination. [Example], [Example 1] As shown in FIG. 3, 'width 127 X X rectangular ITO light material of 406.4mm (indium oxide and oxidized lung material, Sn〇2 = 10.0wt%, relative Density w or more) 1/3 of the length at both ends were made into thickness 10, respectively, and the divided dry materials 18, 18 were made, and the remaining 1/3 length was made into a central divided target material 20 having a thickness of 5 mm. For example, the burial-cutting section of the target 18 divided by the end-of-round (18) is a horizontal section 26 and an inclined section 34 having a width W of 5 mm. This inclined portion 34 becomes 60 for the inclined portion 34 and the horizontal portion. , 45 ° and 30. , Grinding is performed to make the inclined part. a Therefore, heating the oxygen-free copper backing plate 12 on the pre-heating plate (150 positions x 440.7 positions) to make a low-melting point solder (pure) (99 · 9% ~ 99.99% Cheng Sheng adhesive material 14) Melting. ^ ^; Η Secondly, first use these split targets 18, 20 with residual heat, and stand up the inserts and _age_separated by 0.4mm on her 127. It is cooled by cold air from the inner side of the lining And the joint is made to produce the base shot of the present invention. As a comparative example, a horizontal portion is not formed, such as No. 8. 206, the same as the inclined portion 34, when made at an angle of 45. Other than 15 200422417 1P030045 / SF -929 Conventional sputtering target 200. For these money shooters, a solitary light counter (manufactured by Landmark technology) is used to monitor the number of times of arc light generation. For sputtering conditions, the following conditions are used. Process pressure = 3mTorr (Ar) Input power amount = 1.2 W / cm2 Sputtering time = 40 hours Film formation temperature = room temperature The results are shown in the following Table 1. As can be seen from Table 1, the conventional sputtering target 2 is obtained. 〇Comparing with the sputtering target of the present invention, the number of times of arc light generation is small. In particular, the inclined portion 34 The angle α formed with the horizontal portion 26 is 45. In the following, it is good to reduce the number of arcs. [Example 2] Except that the width W of the horizontal portion 26 is 0.5 mm and lmra, the inclined portion 34 and the horizontal portion 26 are The angle α formed was 45, and the sputtering target 10 of the present invention was produced in the same manner as in the embodiment. The money shooter 10 'of the present invention was the same as in the embodiment, and the number of arcs was monitored by an arc counter. The results are shown. The following is shown in Table 1. As can be seen from Table 1, if the width W of the horizontal portion 26 is greater than or equal to 1.0 mm, the number of occurrences of arc light is small and excellent. [Example 3] The example shown in FIG. The portion between the portion 26 and the inclined portion 34 forms an R portion 40, the portion between the upper target surface 32 and the inclined portion 34 forms an R portion 42, and the angle α formed by the inclined portion 34 and the horizontal portion 26 is milk. Other than the same as in Example 1, a low-quality shot of the present invention was produced. Furthermore, for these R portions 40 and 42, a rifle shot 10 of RO.lmm and R5mm was produced. With regard to these sputtering targets 10 of the present invention, As in the embodiment 丨, with an arc counter, The number of occurrences of solitary light is monitored. The results are shown in the following Table 1. As can be seen from Table 1, if the R of the r part 40 and 42 is 16 200422417 IP030045 / SF-929 [Real :::], the number of arc light generation is small And it is excellent. The angle formed by the part 26 is α ^ 5. The edge is processed, and the inclined part 34 and the horizontal orchid are 10. In addition, as in Example 1, the present invention is made again. R is R0.— and R2—sputtered without 10. Control arc == 嶋 1〇 'and Example 1-like' by one, the results of the monitoring A eight are shown in the following Table 1, as can be seen from Table 1, the corners of the adjacent i4, 36 divided by 18,20 If the R of the R part of the sections 44 and 46 is deleted from the RU surface, the production and support of the lonely nine. The number of defects is small and excellent. __Example ....... Conditions _ | Bow H times throughout Example 1 _a = 30 °, W = 5, no edge processing 251 f45 < > ', no edge processing 511 ^^ ~~ __- Example 2 〇 = 60 ° > W = 5, no edge processing 683 ^ 5: no edge processing 735 -__. , No edge processing 637 Example 3 γ = 45. , W = 5, inclined portion Π = 0 · 1 459 -__ In the fourth embodiment, α = 45 °, inclined portion R = 5 413 α = 45. 'W = 5, division R = 〇.i 464 —_ f45 °, W = 5, division 370 " " --- " α--45 ° ^ W = 〇, none The edge processing 707 is further described in the above-mentioned embodiment, although the horizontal portion 26 is a gently inclined surface that gradually descends. & Eleventh, in the above embodiment, although the upper surface of the lining plate 12 is flat, the horizontal portion 26 of the right end portion 18 and the upper portion of the central portion 20 are divided into 17 200422417 iP030045 / SF-929 is the same height. The thickness of the backing plate u can be made to different heights (with step) in the edge part of the target material 20. Only; P Yang.丨 Above the knife d. Although this example is better than the example system, this example is limited to this. For example, "Although it is a rectangular _ month, the situation of a disc-shaped target can also be suitable. Without departing from the scope of the object of the present invention, there may be _, if the present invention, the thickness of the square-partition plane _ is formed to have a thickness of a thin material with a thickness of slightly thinner_thickness == degree T With co-division =, it is difficult to generate i-solitary light, and as a result, a film can be formed stably. =, Because the sensitive horizontal part is shaped on the oblique part of the upper miscellaneous surface, so / there is a step difference in the «part, so the peak is not inferior to the inclined surface, and does not cause the deterioration of the quality of the substrate such as particles. 〆 Also, according to the present invention, ^

, , R =長度為o.lmm以上的直線(C(Umm以上),或由連續變化的直 以呈現更滑順的曲線形狀.,所以因為在上部㈣和傾 的產I銳角的邊緣部分,所以可更有效防止此部份的弧光 緣^且裕若2發明,在分割靶材的鄰接部的角落部,因為施與邊 此Ϊμ二Ιΐΐ此部份不存在邊緣部分’所以可達到更有效防止 =晶弧摘產生相幾個顯著且難的效果,係—極為優良的發 【圖式簡單說明】 ^圖係-斜視圖,顯示本發明的第i實施例的錢射革巴; 第2圖係在第1圖沿IMI線的截面圖; 第3圖係第2圖的部分擴大截面圖; 顯示本發明賴練的第2實施例的第3圖同樣的部糾 18 200422417 IP030045/SF-929 第5圖係與顯示本發明的濺射靶的第3實施例的第3圖同樣的部分擴 大截面圖; 第6圖係顯示本發明的濺射靶的其它實施例的部分擴大概略圖; 第7圖係習知的濺射靶的部分擴大截面圖;以及 第8圖係習知的濺射靶的部分擴大截面圖。 【圖號簡單說明】 11 濺射把 38 間隙 12 襯板 40 R部分 14 黏結材料 42 R部分 16 靶材 44 角落部 18 端部分割靶材 102 靶材 20 中央部份分割靶材 102b 側面 22、 24鄰接部分 104 靶材 26 水平部分 106 段差 28 邊緣部 200 濺射靶 30 端部 202 靶材 32 上部靶面 204 靶材 34 傾斜部分 206 傾斜部 208 襯板,, R = a straight line with a length above o.lmm (C (above Umm)), or a straight line that changes continuously to present a smoother curve shape. Therefore, because the upper part of the upper part and the inclined part produce an acute angle, Therefore, the arc edge of this part can be prevented more effectively ^ and Yuruo 2 invented that in the corner of the adjacent part of the divided target, because the edge is applied, there is no edge part in this part, so it can be more effective Prevention = Crystal arc extraction produces several significant and difficult effects, which is extremely excellent hair [Simplified description of the figure] ^ Figure system-oblique view, showing the Qianshe Geba of the i embodiment of the present invention; 2 The figure is a cross-sectional view along the IMI line in FIG. 1; FIG. 3 is an enlarged cross-sectional view of a part of FIG. 2; FIG. 3 shows the same part of FIG. 3 of the second embodiment of the present invention. 18 200422417 IP030045 / SF- 929 FIG. 5 is a partially enlarged sectional view similar to FIG. 3 showing the third embodiment of the sputtering target of the present invention; FIG. 6 is a partially enlarged schematic view showing another embodiment of the sputtering target of the present invention; Figure 7 is a partially enlarged sectional view of a conventional sputtering target; and Figure 8 is a conventional Partially enlarged sectional view of the sputtering target. [Simplified description of drawing number] 11 Sputtering 38 Gap 12 Liner 40 R Part 14 Adhesive material 42 R Part 16 Target 44 Corner 18 End split target 102 Target 20 Center Partially divided target 102b Side 22, 24 Adjacent part 104 Target 26 Horizontal part 106 Segment 28 Edge 200 Sputtering target 30 End 202 Target 32 Upper target surface 204 Target 34 Inclined part 206 Inclined part 208 Liner

1919

Claims (1)

200422417 IP030045/SF-929 拾、申請專利範圍: =述分割赠之中,在互相鄰接的不同厚度的分雜材的鄰接部 ,蝴核厚卿的 在前述厚度較厚之-方的分割妹,從上述厚度較戶之 把材的水平部分至上部乾面連續形成傾斜部分。+ 、刀刻 2. 如申請專利範丨項所記載的 一方__財转分寬度為lnm以上—遂厚度較厚之 3. ,申請專利細第丨或2項所記載_餘,轉 =-方的分割乾材的傾斜部分和水平部分所成的角‘ 4. =申=,細第丨項所記載喊練,其特 述 n分難材的水平部分和傾斜雜,的 5. 圍第4項所記載的姆,其特徵為在二二 Γ〇=Γί割輕材的水平部分和傾斜部份之間所形成的^份為予 6. 圍第!項所記載的濺雜’其特徵為在前述厚度較厚 的分割靶材的上部靶面和傾斜部份之 刪Γΐ聽材的上释面和傾斜部份之間所形成的R部份為 8·如申請專利範圍第卜2、6或7項中任一項所 徵為前述厚度較厚之-方的分割麵的水平部 = ==r 一方的分_水平部== 9 ί二f 9刪以上的直線(cg. 1刪以上)所形成。 9·々申㉖專利範圍第卜2、4或5項中任一項所記載的賤雜,其特 20 200422417 JP030045/Si^929 徵,' 部分係部1師和傾斜部份之間的 输以下且長度上雜面形成的角度 10.如申請專利範圍第卜2 任.刪以上)所形成。 徵為前述厚度較厚的—方J二員中任一項所記載的濺錄,其特 部分由物崎鱗2猶的_分和傾斜部份之間的 徵為前述厚]=:丄:2方二:::任-項所記载的濺射靶’其特 部分由連續變化的直線群所^乾材的上雜面和傾斜部份之間的 ",其特徵為前述分- 緣處理。雜的不同厚度分割姆的鄰接部的角落部施予邊 為記載賴躲’其特徵為前述邊緣處理 靶二載的濺射靶’其特徵為在前述分割 、如之間,形成_。 的鄰接部“_二=記载的賤射把,其特徵為前述分割挺材 ”·如申請專利範圍i 15刪鳥^ 福 以1他為主成分_項=的獅,其特徵為前綱係 立8· 一種濺射靶的製诰大、、土 構成的乾材应概拓^、,’、!由黏結材料接合由複數個分割輕材所 在前述分職賤株的製造方法;其特徵為: 之中,· 互相鄰接的不同厚度的分割靶材的鄰接部 在厚度較厚的一方的八 分割乾材略同的厚声=平部才^鄰接部分,形成具有與厚度較薄的 在則私錄厚之1的分_材,從上轉餘狀—方的分割 21 200422417 1P030045/SF-929 靶材的水平部分至上部靶面形成連續之傾斜部分。 範圍第18項所記載的濺練的製造方法,其特徵為前述 予度較;之一方的分割靶材的水平部分寬度為1刪以上。 2〇· 2睛專利範圍第18或19項所記載的濺射㈣製造方法,发特 度厚^厚之—獨分雜材的傾斜部分和水平部分所成的^ 18項,載賴練的製造方法,其特徵為在 形成!^ Γ彳的分細怕水平部分和倾雜之間的部分 第21項所記載騎躲的製造方法,其特徵為在 圍第18項所記載的滅射靶的製造方法,其特徵為在 厚之—方的分贿材的上部麵和傾斜部份之 第23項所記載的濺射㈣製造方法,其特徵為在 的^^0=7割赠的上部娜傾斜部份之間所形成 ^===:二::23或24項中任—項所記載的贿鶴 傾斜部份之間的部二传g度一方的分割乾材的水平部分和. 部分形成的角“ = 較方的分練材的水平< 以上)形成。 Λ下且長度為〇·1咖以上的直線(C0.1咖 26. 如申請專利範圍第18μ 由 製造方法,其特徵為箭、+、陌21或22項中任一項所記載的进射㈣ 傾斜部份之間的部^較厚之一方的分割赠的上部把面和 乾面形成的角度為45:广述厚度較厚之一方的分割輕材的上部 以上)形成。 以下且長度為U刪以上的直線(OUmm 27. 如申請專利範圍第18、19、23或24項中任—項所記載_雜的 22 200422417 IP030045/SF-929 製造方法,:i:牿料炎1 傾斜部份之間的部分方的分嶋的水平部分和 說如申請專利範園第線群形成。 製造方法,其特徵為前述厚度較::任-項所記載的濺射靶的 29 部分由連她^、_^雜材的上雜面和 瓜如申清專利範圍第18或19頊所㈣从成 為前述分割乾材之令,在、^載的濺射無的製造方法,其特徵 角落部施予邊緣處^。 的不同厚度分割㈣的鄰接部的 的製造方法,其特徵為前丨 18或19項所記載的_的製造方法’其特徵 為^述分聽材的互相鄰接的鄰接部之間形成 3=申=專利範圍第32項所記載的崎乾的製造方法,其特徵為前 述分練材的鄰接部之間的間隙為〇. 〇5麵〜〇. 7醜的間隙。 34.=請專利範圍第18或19項所記載的濺射㈣製造方法,其槪 為珂述靶材係以In或Sn為主成分的金屬氧化物。 23200422417 IP030045 / SF-929 The scope of patent application: In the above-mentioned segmentation gift, in the abutment part of the sub-materials of different thicknesses adjacent to each other, the thick and thin segmentation of the butterfly-thickness, Inclined portions are continuously formed from the horizontal portion of the above-mentioned thicker material to the upper dry surface. + 、 Knife carving 2. As described in the patent application, one party __ the width of the financial transfer sub-point is greater than 1nm—then the thickness is thicker 3., the patent application details 丨 or 2 described in the _ more, Zhuan =- The angle formed by the inclined part and the horizontal part of the divided dry material '4. = 申 =, as described in item 丨, it specifically mentions that the horizontal part and the inclined part of the n-difficult material are mixed. 5. 围 第The Mu described in item 4 is characterized in that the ^ portion formed between the horizontal part and the inclined part of the two-three Γ〇 = Γί cut light material is Yu 6. 围 第! The spatter described in the item is characterized in that the R portion formed between the upper target surface and the inclined portion of the aforementioned thicker divided target material is 8. The R portion formed between the upper release surface and the inclined portion of the listening material is 8 · As claimed in any one of items 2, 6, or 7 of the scope of the patent application, the horizontal part of the aforementioned thicker-square split surface = == r one side_ horizontal part == 9 ί 二 f 9 It is formed by deleting the above straight line (cg. 1 or more). 9. The miscellaneous items described in any one of items 2, 4, or 5 of the scope of patent application of the patent, its special 20 200422417 JP030045 / Si ^ 929 sign, 'part of the division between the division 1 division and the inclined part The angle formed by the miscellaneous surface in the following and length 10. It is formed as described in the scope of patent application (No. 2 and above). The feature is the thicker one mentioned above—the spatter recorded in any of the two members of Fang J, the special part of which is the feature described above between the _ points and the inclined part of Wuzaki scale 2 Ju] =: 丄: 2Fang 2 ::: The sputter target described in any-item is characterized by the " between the top surface of the dry material and the inclined portion of the dry material, which is a continuously changing linear group, and is characterized by the foregoing points-缘 处理。 Edge processing. The corners of the adjacent parts of the different thicknesses of the different thicknesses are described as “Lai”, which is characterized by the aforementioned edge processing target, and the sputtering target with two loads, which is characterized in that _ is formed between the aforementioned divisions. The adjoining part of "_ 二 = the base shot recorded as described above is characterized by the aforementioned split straight material". For example, the scope of patent application i 15 deletes the bird ^ The lion with 1 as its main component _ item = the lion is characterized by the outline System 8 · A large-scale, dry earth material made of a sputtering target should be expanded ^ ,, ',! A manufacturing method for joining a plurality of divided light plants in which a plurality of divided light materials are joined by a bonding material; wherein, the adjacent portions of the divided target materials of different thicknesses adjacent to each other are divided into eight thicker ones. The thick sound of the material is the same as that of the flat part ^ adjoining part, forming a sub-material with a thickness of less than the thickness of the private record, turning from the top to the residual shape—the division of the square 21 200422417 1P030045 / SF-929 target The horizontal part of the wood to the upper target surface forms a continuous inclined part. The method for manufacturing a splash drill according to item 18 of the scope is characterized in that the above-mentioned comparison is comparative; the width of the horizontal portion of one of the divided target materials is 1 or more. The method of manufacturing the sputtered plutonium as described in item 20 or 19 of the patent scope of 20 · 2, the thickness is thick ^ thickness—the ^ 18 item formed by the inclined part and the horizontal part of the miscellaneous material is separately included The manufacturing method is characterized by the formation of the part between the horizontal part and the miscellaneous part of the formation of ^ Γ 彳. The manufacturing method described in item 21 is characterized in that the shot target described in item 18 is described. The manufacturing method is characterized by the method of manufacturing sputtered cymbals described in item 23 on the upper side and the inclined part of the thick-square split briquette material, and is characterized by the upper part of ^^ 0 = 7 Na formed between the inclined parts ^ ===: 2: 2: any of 23 or 24-the horizontal part of the divided dry wood between the second part of the g-degree of the bridging crane inclined part recorded in the item and sum. Partially formed angle "= the level of the more sophisticated training material < above) is formed. A straight line below Λ and with a length of more than 0.1 coffee (C0.1 coffee 26. Such as the scope of patent application No. 18μ by the manufacturing method, which It is characterized by the shot as described in any of arrows, +, Mo 21 or 22. 之间 The part between the inclined parts ^ The thicker one is divided by the upper part. The angle formed by the surface and the dry surface is 45: above the upper part of the divided light material whose thickness is broader.) The following is a straight line with a length greater than or equal to U (27 mm). Any of 23 or 24-described in the item _ Miscellaneous 22 200422417 IP030045 / SF-929 Manufacturing method: i: 牿 料 炎 1 The horizontal part of the tiller between the inclined parts and said as a patent application The production line is formed. The manufacturing method is characterized in that the thickness is greater than: The 29 parts of the sputtering target described in any-item are composed of the upper surface of the miscellaneous material of ^ and _ ^ and the scope of the patent application From 18 or 19, the manufacturing method of the above-mentioned divided dry material, the method of manufacturing sputtering without sputtering, the characteristic corners are applied to the edges, and the manufacturing method of the adjacent parts of the divided cuttings with different thicknesses, It is characterized by the _ manufacturing method described in the above 丨 18 or 19, and it is characterized by the formation of between the adjacent adjacent parts of the audio materials 3 = application = the rugged manufacturing described in item 32 of the patent scope Method, characterized in that the gap between adjacent portions of the aforementioned training material is 0. 〇5 面 ~ 0.7 ugly gap. 34. = Please refer to the sputtering method described in item 18 or 19 of the patent scope, wherein the target is a metal oxide whose main component is In or Sn. . twenty three
TW092123232A 2002-08-26 2003-08-22 Sputtering target and the manufacture thereof TWI265203B (en)

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Cited By (2)

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TWI510660B (en) * 2011-01-26 2015-12-01 Jx Nippon Mining & Metals Corp Sputtering target
CN110312821A (en) * 2017-01-09 2019-10-08 应用材料公司 For method, equipment and the target in vacuum deposition process in depositing materials on substrates

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JP5228245B2 (en) * 2007-08-31 2013-07-03 株式会社三井金属韓国 Sputtering target
JP5412728B2 (en) * 2008-02-08 2014-02-12 大日本印刷株式会社 Target plate and sputtering equipment
US9752228B2 (en) * 2009-04-03 2017-09-05 Applied Materials, Inc. Sputtering target for PVD chamber
WO2012066810A1 (en) 2010-11-19 2012-05-24 Jx日鉱日石金属株式会社 Ito sputtering target
CN110892089B (en) * 2017-08-01 2022-05-24 出光兴产株式会社 Sputtering target, method for forming oxide semiconductor film, and backing plate
US20210230739A1 (en) * 2020-01-27 2021-07-29 Applied Materials, Inc. Physical Vapor Deposition Apparatus And Methods With Gradient Thickness Target

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI510660B (en) * 2011-01-26 2015-12-01 Jx Nippon Mining & Metals Corp Sputtering target
CN110312821A (en) * 2017-01-09 2019-10-08 应用材料公司 For method, equipment and the target in vacuum deposition process in depositing materials on substrates

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