TW200413843A - Colored photosensitive resin composition - Google Patents

Colored photosensitive resin composition Download PDF

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Publication number
TW200413843A
TW200413843A TW092128809A TW92128809A TW200413843A TW 200413843 A TW200413843 A TW 200413843A TW 092128809 A TW092128809 A TW 092128809A TW 92128809 A TW92128809 A TW 92128809A TW 200413843 A TW200413843 A TW 200413843A
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TW
Taiwan
Prior art keywords
resin composition
photosensitive resin
compound
pigment
colored photosensitive
Prior art date
Application number
TW092128809A
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Chinese (zh)
Inventor
Koji Ichikawa
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Sumitomo Chemical Co
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Publication of TW200413843A publication Critical patent/TW200413843A/en

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Optics & Photonics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The present invention provides a colored photosensitive resin composition comprising a coloring agent (A), a binder resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), a solvent (E) and a compound having benzylidene skeleton (F). The invention also provides a method of forming a pattern, a color filter comprising a pattern formed by using the method, and a liquid crystal display device equipped with the color filter. The method includes the steps of: applying the colored photosensitive resin composition on a substrate, removing volatile components from the applied layer of the colored photosensitive resin composition, and exposing the layer of the colored photosensitive resin composition with the volatile components therein removed by using a mask and then developing it.

Description

200413843 政、發明說明 [發明所屬之技術領域] 本發明係有關可廣泛利用於紫外線硬化型油墨或光阻 弹J等之感光性樹脂組成物，尤其是有關為了形成彩色液晶 顯不農置或攝像元件等所使用著色畫像（以下稱為畫素）之 阻之理想著色感光性樹脂組成物。 [先前技術] 於彩色液晶顯示裝置或攝像元件等之濾光片通常可經 由在玻璃或矽晶元等基板上形成紅、綠及藍三原色畫素製 造。又’為了將該等晝素間遮光，通常設置黑色基材。於 形成該等各色之晝素採用在以黑色基材形成圖案之基板上 將含有與各色相當顏料之阻液經由旋轉塗覆均一塗抹後加 煞乾(以下稱為預烘焙），將其塗膜曝光、顯影，必要時 加熱硬化（以下稱為後烘焙）之方法，於每種需要濾光片之 =員色反覆進行該等操作，可獲得各色之晝素。該等阻劑大 夕使用3有顏色及黏合劑樹脂之同時亦含有光聚合性單體 及光聚合引發劑之組成物。又，於形成黑色基材亦使用含 有黑色顏料之阻劑。 该等阻劑所使用之光聚合引發劑受製作濾光片所必要 ，特性及品質影響，研究感度高、所製作之濾光片之表面 平滑性、圖案形狀、耐藥品性或信賴性高之化合物。該等 k术有使用一嗪系化合物、三。秦系化合物與味唾系化合 物之此合物、二嗪系化合物與咪唑系化合物及胺基乙醯苯 -同’丁、化σ物或一苯甲_之混合物之著色感光性樹脂組成物 315150 5 200413843 (參照例如特開平6-201913號公報、特開平6_324484號公 報、特開平7-261014號公報等）。有關高感度化提案^由" 至少一種選自由多官能硫醇化合物及聯二咪唑化合物、鈦 |化3物、二嗪化合物及噁二唑化合物組成之混合物、2 胡^基_4,6_雙（三氯甲基）_第二_三嗪、由上述三嗪化合物 與聯二咪唑系化合物及氫供給體組成之混合物（參照例如 特開平1〇-2538 1 5號公報、特開2⑽〇-221675號公報）。使 ’以該等光聚合引發劑作為成分之著色感光性樹脂組成物 所形成之渡光片雖然有±述之優.點，但是其缺點為有所形 成之彩色晝素形狀變差之問題。 [發明内容] 本發明之目的為提供可作成形狀良好之著色晝素圖 木感度良好之著色感光性樹脂組成物，形狀良好之著色 畫素圖案之形成方法，含有形狀良好之著色畫素圖;= 光片及具有含有形狀良好之著色晝素圖案之遽光片之液晶 瞻顯不裝置。 本發明係提供含有著色劑（A)、黏合劑樹脂⑻、光聚 =性化合物（c)、光聚合引發劑（D)、溶劑（E)及具有苄叉骨 中之化σ物（F)之著色感光性樹脂組成物，將上述之著色感 光性樹脂組成物塗抹於基板上，㈣抹有著色感光性樹脂 組成物層除去揮發成公，益+ ^ 77 精由先罩將從該著色感光性樹脂 組成物層除去揮發成分之層曝光、顯影形成圖案之方法， 3有X上it方:所形成圖案之渡光片及安裝有上述渡光片 之液晶顯不裝置。 6 315150 200413843 [實施方式] 本务明之著色感光性樹脂組成物主要作為 頌料分散阻 劑使用，通常將著色劑（A)分散，更將黏合劑樹脂（b)、光 聚合性化合物（C)、光聚合引發劑及具有苄又骨架之化 合物（F)及其他任意之添加劑溶解或分散於溶劑（e)中。 著色劑（A)通常由顏料組成，可為通常顏料分散阻劑所 使用之有機顏料或無機顏料。無機顏料可列舉金屬氧化物 或如金屬配位化合物之金屬化合物，具體而言可列舉鐵、 鈷、鋁、鎘、鉛、銅、鈦、鎂、鉻、鋅、銻等金屬氧化物 或複合金屬氧化物。有機顏料具體上可列舉顏色指標 (Colour Index)[染料及顏色協會（The s〇ciety 〇f Dyers and200413843 Policy and invention description [Technical field to which the invention belongs] The present invention relates to a photosensitive resin composition that can be widely used in UV-curable inks, photoresistors, etc., and particularly relates to the development of color liquid crystals for display or imaging. An ideally colored photosensitive resin composition for the resistance of colored images (hereinafter referred to as pixels) used in devices and the like. [Prior art] Filters for color liquid crystal display devices or imaging elements are usually manufactured by forming red, green, and blue primary pixels on a substrate such as glass or silicon wafer. In addition, in order to block these daylight rays, a black substrate is usually provided. For the formation of these various colors, the liquid barrier containing a pigment equivalent to each color is uniformly applied on a substrate formed with a pattern on a black substrate by spin coating, followed by drying (hereinafter referred to as pre-baking), and then coating the film. The method of exposure, development, and heating and hardening (hereinafter referred to as post-baking) if necessary. Repeat these operations for each color of each filter that requires a filter to obtain various colors of daylight. These inhibitors use 3 colored and adhesive resins, and they also contain a photopolymerizable monomer and a photopolymerization initiator composition. In addition, a black pigment-containing resist is also used for forming a black substrate. The photopolymerization initiators used in these resists are affected by the characteristics and quality necessary for the production of filters, and study the high sensitivity, the surface smoothness, pattern shape, chemical resistance or reliability of the produced filters. Compounds. These k operations include the use of monoazine compounds, three. Coloring photosensitive resin composition of this compound of a Qin compound and a salivary compound, a diazine compound and an imidazole compound, and an aminoacetophenone-isobutylene, isocyanate, or monobenzyl group 315150 5 200413843 (refer to, for example, Japanese Unexamined Patent Publication No. 6-201913, Japanese Unexamined Patent Publication No. 6_324484, and Japanese Unexamined Patent Publication No. 7-261014). Proposal for high sensitivity ^ consists of at least one selected from the group consisting of a polyfunctional thiol compound and a biimidazole compound, a titanium compound, a diazine compound, and an oxadiazole compound, and a 2H ^ 4,6 _Bis (trichloromethyl) _second_triazine, a mixture of the above triazine compound, a biimidazole-based compound, and a hydrogen donor (see, for example, Japanese Patent Application Laid-Open No. 10-2538 15 and Japanese Patent Application Laid-Open No. 2) 〇-221675). Although the light-transmitting sheet formed of the colored photosensitive resin composition using these photopolymerization initiators as a component has the advantages described above, it has the disadvantage that the formed color daylight has a poor shape. [Summary of the invention] An object of the present invention is to provide a colored photosensitive resin composition that can be made into a well-colored daylight map with good sensitivity, a method for forming a well-shaped colored pixel pattern, and a well-shaped colored pixel map; = Light film and liquid crystal display devices with a phosphor film containing a well-shaped colored daylight pattern. The present invention provides a coloring agent (A), a binder resin ⑻, a photopolymerizable compound (c), a photopolymerization initiator (D), a solvent (E), and a chemical compound (F) having a benzyl wishbone. The colored photosensitive resin composition is applied to the substrate, and the colored photosensitive resin composition layer is wiped off to remove the volatilization into the public. The benefit is first covered by the coloring photosensitive resin composition. The method of exposing and developing the layer of the volatile resin composition layer to remove the volatile components is to form a pattern on the X side: a patterned light sheet and a liquid crystal display device equipped with the light sheet. 6 315150 200413843 [Embodiment] The coloring photosensitive resin composition of the present invention is mainly used as a dispersion inhibitor, and usually the colorant (A) is dispersed, and the binder resin (b) and the photopolymerizable compound (C) are also dispersed. The photopolymerization initiator, the compound (F) having a benzyl skeleton, and any other additives are dissolved or dispersed in the solvent (e). The colorant (A) is generally composed of a pigment, and may be an organic pigment or an inorganic pigment used in a conventional pigment dispersion resist. Examples of the inorganic pigment include metal oxides or metal compounds such as metal complexes, and specifically, metal oxides such as iron, cobalt, aluminum, cadmium, lead, copper, titanium, magnesium, chromium, zinc, antimony, or composite metals Oxide. Specific examples of organic pigments include the Color Index [The Dye and Color Association (The s〇ciety 〇f Dyers and

Colourists)出版]顏料（Pigment)所分類之化合物。更具體而 言可列舉如以下顏色指標（C.I.)編號之化合物，但是並不只 限於該等化合物。 有機顏料及無機顏料具體而言可列舉顏色指標 (Coloui Index)[染料及顏色協會（The Society of Dyers and Colourists)出版]顏料（pigment)所分類之化合物。具體而言 可列舉例如C.I·顏料黃色、c.I·顏料黃色-3、C.I.顏料黃 色-12、C.I.顏料黃色_13、C I•顏料黃色-14、C I.顏料黃色 -15、C.I.顏料黃色-16、c·〗·顏料黃色_17、c·!.顏料黃色-20、 C.I·顏料黃色·2 4、C.I·顏料黃色_3 1、C.I·顏料黃色-53、C.I· 顏料黃色-83、C.I·顏料黃色_86、C.I·顏料黃色-93、C.I.顏 料黃色-94、C.I·顏料黃色_1〇9、C.I·顏料黃色-1 10、C.I.顏 7 3)5150 200413843 料黃色-1 17、C.I.顏料黃色-125、C.I.顏料黃色-128、C.I· 顏料黃色-137、C.I.顏料黃色-138、C.I.顏料黃色-139、C.I. 顏料黃色-147、C.I.顏料黃色-148、C.I.顏料黃色-150、C.I. 顏料黃色-153、C.I.顏料黃色-154、C.I·顏料黃色-166、C.I. 顏料黃色-173、C.I.顏料黃色-194、C.I.顏料黃色-214等黃 色顏料；C.I.顏料橙色13、C.I.顏料橙色31、C.I.顏料橙色 36、C.I.顏料橙色38、C.I.顏料橙色40、C.I.顏料橙色42、 •：·Ι·顏料橙色43、C.I.顏料橙色51、C.I.顏料橙色55、C.I. 顏料橙色59、C.I.顏料橙色61、C.I.顏料橙色64、C.I.顏 料橙色65、C.I.顏料橙色71、C.I.顏料橙色73等橙色顏料； C.I.顏料紅色9、C.I.顏料紅色97、C.I.顏料紅色105、C.I. 顏料紅色122、C.I.顏料紅色123、C.I.顏料紅色144、C.I. 顏料紅色149、C.I.顏料紅色166、C.I.顏料紅色168、C.I. 顏料紅色176、C.I.顏料紅色177、C.I.顏料紅色180、C.I. 顏料紅色192、C.I.顏料紅色209、C.I.顏料紅色215、C.I. •員 料紅色216、C.I.顏料紅色224、C.I.顏料紅色242、C.I. 顏料紅色254、C.I.顏料紅色264、C.I.顏料紅色265等紅 色顏料；C.I.顏料藍色-15、C.I.顏料藍色-15 : 3、C.I.顏料 藍色-15 : 4、C.I.顏料藍色-15 : 6、C.I.顏料藍色-60等藍 色顏料；C.I.顏料紫色1、C.I.顏料紫色19、C.I.顏料紫色 23、C.I·顏料紫色29、C.I.顏料紫色32、C.I.顏料紫色36、 C.I.顏料紫色38等紫色顏料；C.I.顏料綠色7、C.I.顏料綠 色36等綠色顏料；C.I.顏料棕色23、C.I.顏料棕色25等棕 色顏料；C.I.顏料黑色1、C.I.顏料黑色7等黑色顏料，以 8 315150 200413843 含有至少一種選自c.i·顏料黃色·138、C I•顏料黃色_i39、 C.I.顏料黃色-150、C.I·顏料紅色177、CI.顏料紅色2〇9、 c.l·顏料紅色254、C.I·顏料紫色23、C I•顏料藍色_15 : 6 及C.I.顏料綠色36之顏料者較佳。 該等著色劑（A)可各自單獨使用，亦可2種以上組合使 用。著色劑（A)以著色感光性樹脂組成物中之固體成分量為 基準通常在5至60質量％，較好1〇至55質量％之範圍使 用著色劑（A)之含1若在上述基準為5至60質量分之範 圍，則即使作成薄膜，晝素之色濃度足夠，於顯影時非畫 ，丁、刀之消除性不會降低，有殘渣不易產生之傾向，較佳。 又方；本發明，著色感光性樹脂組成物中之固體成分量為 除去溶劑（E)之成分合計量，著色感光性樹脂組成物之固體 成分為由著色感光性樹脂組成物除去溶劑（E)之成分組成 之組成物。 本發明所使用之黏合劑樹脂可使用丙烯系共聚 物，可列舉例如含有羧基之單體及可與該單體共聚合之其 他單體之共聚物。 含有羧基之單體可列舉例如不飽和單羧酸、不飽和二 羧酸、不飽和三羧酸等不飽和多元羧酸等分子中至少具有 1個羧基之不飽和羧酸。不飽和單羧酸可列舉例如丙烯 酸、曱基丙烯酸、巴豆酸、α •氣丙烯酸、肉桂酸等。不飽 和二羧酸可列舉例如馬來酸、富馬酸、衣康酸、檸康酸、 中康酸等。不飽和多元羧酸其酸酐具體上可為馬來酸酐、 衣康酸酐、檸康酸酐等。此處所稱之不飽和多元羧酸亦包 9 315150 200413843 含多元幾酸之單（2-甲基丙婦酿氧基貌基）酷’可列 琥轴酸單（2-丙烯醯氧基乙酯）、琥琏酸 :° 其7終、# 干^ Τ基丙細醒氧 土-g)、本二甲酸皁（2_丙稀醯氧基乙醋）、苯二甲酸 甲㈣稀醒氧基乙醋)等。不飽和多元幾酸包含例- 基承己内醒胺單丙烯酸醋、〇_叛基聚己内酿胺 酸酯等。含有該等緩某之里雕 土丙~ 各寺羧暴之早體可各自單獨使用， 以上混合使用。 』』-種 “與含有上述魏基之單體可共聚之其他單體可列舉例如 本乙烯、α_甲基苯乙烯、鄰-乙烯基甲笨、間-乙烯基甲苯、 對乙烯基甲苯、對'氣苯乙烯、鄰_甲氧基苯乙烯、間-甲氧 基苯乙烯、·對-甲氧基苯乙稀、舞卜乙稀基节基甲峻、間-乙 烯基节基甲醚、對-乙烯基节基甲_、舞卜乙稀基节基縮水 甘油_乙稀基节基縮水甘油_、對_乙稀基节基縮水 甘油醚、印等方族乙稀基化合物；丙稀酸甲酷、曱基丙烤 酸甲醋、丙烯酸乙_、甲基丙稀酸乙醋、丙稀酸正丙醋、 •基丙稀酸正丙_、基丙烯酸異丙8旨、甲基丙稀酸異丙醋、 丙烯酸正丁酯、曱基丙烯正丁酸酯、丙烯酸異丁酯、甲基 丙烯酸異丁酯、丙烯酸第二-丁酯、曱基丙烯酸第二-丁酯、 基丙烯酸第二-丁酯、曱基丙烯酸第三_丁酯、丙烯酸2_羥 乙酯、曱基丙烯酸2-羥乙酯、丙烯酸2_羥丙酯、甲基丙烯 酸2-羥丙酯、丙烯酸3-羥丙酯、曱基丙烯酸3_羥丙酯、丙 烯酸2-羥丁酯、曱基丙烯酸羥丁酯、丙烯酸3_羥丁酯、 曱基丙烯酸3 -羥丁酯、丙烯酸4_羥丁酯、曱基丙烯酸4_ 羥丁酯、丙烯酸烯丙酯、曱基丙烯酸烯丙酯、丙烯酸苄酯、 315150 200413843 甲基丙烯酸苄酯、丙烯酸環己酯、甲基丙烯酸環己、丙 烯酸苯酯、甲基丙烯酸苯酯、丙烯酸2-甲氧基乙§旨、丙丈希 酸2-甲氧基乙基甲酯、丙烯酸2-笨氧基乙酯、丙缔酸2_ 苯氧基乙基甲酯、甲氧基二乙二醇丙烯酸酯、曱氧基二乙 二醇甲基丙烯酸酯、曱氧基三乙二醇丙烯酸酯、甲氧基三 乙二醇曱基丙烯酸酯、曱氧基丙二醇丙烯酸酯、曱氧基丙 二醇甲基丙烯酸酯、曱氧基二丙二醇丙烯酸酯、曱氧基二 丙，一醇曱基丙稀酸醋、異冰片醇丙稀酸i旨、異冰片醇甲具 丙烯酸酯、二環戊二烯醇丙烯酸酯、二環戊二烯醇甲基丙 稀酸、2 -經基-3-苯氧醇丙基丙烯酸酷、2 -經基-3-苯氧基 丙醇甲基丙烯酸酯、丙三醇單丙烯酸酯、丙三醇單甲基丙 烯酸酯等不飽和羧酸酯類；丙烯酸2 -胺基乙酯、甲基丙稀 酸2 -胺基乙、丙細酸2 -二甲胺基乙g旨、曱基丙稀酸 二甲胺基乙酯、丙烯酸2-胺基丙酯、甲基丙烯酸胺基丙 酯、丙烯酸2-二甲胺基丙酯、曱基丙烯酸2-二甲胺基丙醋、 丙細酸3 -胺基丙醋、曱基丙炸酸3 -胺基丙醋、丙烯酸3 _ 二甲胺基丙基酯、甲基丙烯酸3-二甲胺基丙酯等不飽和緩 酸胺烧基酯類；丙稀酸縮水甘油酯、曱基丙稀酸縮水甘油 酯等不飽和魏酸縮水甘油酯類；乙酸乙稀酯、丙酸乙稀s旨、 丁酸乙烯酯、苯甲酸乙烯酯等羧酸乙烯酯類；乙稀基甲喊、 乙稀基乙醚、稀丙基縮水甘油醚等不飽和鍵類；丙烯腈、 曱基丙烯腈、α -氣丙烯腈、偏二氰乙烯等丙稀腈化合物； 丙稀醯胺、甲基丙稀醯胺、α -氯丙稀酸胺、2-經乙基丙 少市&&胺、N - 2 -沒乙基甲基丙細SE胺等不飽(和酸胺類；馬來 315150 200413843 醯亞胺、N-苯基馬來醯亞胺、N-環己基馬來醯亞胺等不飽 和Sm亞胺類，1，3 - 丁一稀、兴戊二稀、氣戊二稀等脂肪族 共輛一烤類；聚苯乙烯、聚甲基丙稀酸酯、聚甲基甲基丙 烯酸酯、聚-正丁基丙烯酸酯、聚-正丁基甲基丙烯酸酯、 聚矽氧烷之聚合物分子鏈末端具有單丙烯醯基或單甲基丙 烯醯基之大單體類。該等單體可各自單獨使用，亦可2種 以上混合使用。 _ 方；上述之共聚物含有敌基單體單位之含量，質量分率 通常為10至50質量％，較好15至40質量％，更好25 至40貝。含有上述叛基之單體單位之含量若為1〇至 5〇質量％，則對於顯影液之溶解性良好，顯影時有圖案可 正確形成之傾向，較佳。 上述丙烯系聚合物可列舉例如（甲基）丙烯酸/甲基（甲 ^ )丙烯酸酯共聚物、（甲基）丙烯酸/苄基（甲基）丙烯酸酯共 來物(甲基）丙烯酸/2-羥乙基（甲基）丙烯酸酯/节基（甲基） .稀酸醋共聚物、（曱基）丙烤酸/曱基（甲基）丙烯酸酷/聚苯 乙稀大單體共聚物、（曱基）丙烯酸/甲基（甲基）丙稀酸醋/聚 甲基（:基）丙㈣酷大單體共聚物、（曱基）丙料/节基（甲 二)丙烯馱S曰共聚物/聚苯乙烯大單體共聚物、(甲基)丙烯酸 下土（曱土）丙烯酸酯共聚物/聚甲基（甲基）丙烯酸酯大單 體共聚物、（曱 土）丙烯S欠/2-羥乙基（甲基）丙烯酸酯/苄基（甲 基）丙婦酸g旨/平# 、 烯大單體共聚物、（甲基）丙稀酸/2-羥 乙基（甲基）丙歸酿而匕 次S曰/下基（甲基）丙烯酸酯/聚曱基（甲基） 烯酸酯大單體此取仏 ； ~ 物、（曱基）丙烯酸/笨乙烯/苄基（曱基）丙 315150 19 200413843 烯酸酯/N-苯基馬來醯亞胺共聚物、（甲基）丙烯酸/琥珀酸單 (2-丙烯醯氧基乙酯）/苯乙烯/节基（曱基）丙烯酸酯/n/苯基 馬來醯亞胺共聚物、（曱基）丙烯酸/琥珀酸單丙烯醯氧基 乙酯）/苯乙烯/烯丙基（甲基）丙烯酸酯/N_笨基馬來醯亞胺 共聚物、（甲基）丙烯酸g旨/节基（甲基）丙烯酸醋/n_苯基馬來 醯亞胺/苯乙烯/丙三醇單（曱基）丙烯酸酯共聚物等。又，（曱 基）丙烯酸酯為丙烯酸酯或甲基丙烯酸g旨。 其中，以（曱基）丙烯酸/节基（甲基）丙*希酸醋共聚物、 (甲基）丙稀酸/节基（甲基）丙烯酸sl/笨乙稀共聚物、（甲基) 丙稀酸/甲基（甲基）丙烯酸共聚物、（甲基）丙稀酸❸甲基 (曱基）丙烯酸酯/笨乙烯共聚物較佳。 於上述之丙烯系聚合物其聚苯乙烯換算重量平均分子 量（將聚苯乙燁作為標準品’經由凝膠滲透層析法求得之值 通常為5,〇〇〇至5〇，_，較好在8,〇〇()至4()，_範圍 好為1〇，剛至35，_。分子量若為至50，_，則塗 膜硬度提昇，殘膜率亦蠻离，斟 土 ^^ ^ 兀又问對於未曝光部顯影液之溶解 I·生良好，有解像度提高之傾向，較佳。 上述丙烯系聚合物其酸值通常為5〇至15〇,較好Μ 至140,更好80至135。上述之酸值若為至⑼ 2於顯影液之溶解性’未曝光部分容易溶解，又進行ί 感度化顯料曝光部分之圖案“，线料提^ 向：較佳。酸值為測定中和1公克丙稀系聚合物所必需之 氫氧化鉀量(毫克)之值，通常 斤义而之 經由滴定求得。 吏用風乳化鉀水溶液’ 315150 13 200413843 、上述黏合劑樹脂於本發明著色感光性樹脂組成物中固 2分$之基準通常含有5至9G f量％，較好⑺至川 質量％之範圍。黏合劑樹脂⑻於上述之 上=易發生顯影殘渣，於顯影時曝光部之晝素部分不易發 生膜減少’非晝素部分之消除性良好，較佳。 本發明著色感光性樹脂組成物所含之光聚合性化合物 ㈡為用光及後述之光聚合引發劑作用可聚合之化合物，單 官能單體之外亦可為2官能、其他多官能單體。 單官能單體之具體例可列舉壬基苯基卡必醇丙烯酸 醋、2-羥基-3-苯氧基丙基丙烯酸酯、2_乙基己基卡必醇丙 烯酸酯、2-羥乙基丙烯酸酯、N_乙烯基吡咯烷酮等。 2官能單體之具體例可列舉M•己：醇二（甲基）丙稀 酸醋、乙二醇二（甲基）丙稀酸醋、新戍二醇（曱基）丙稀酸 酯、三乙二醇二（甲基）丙烯酸醋、雙齡A之雙（丙烯酸氧基 t基）醚、3-曱基戊二醇二（甲基）丙烯酸酯等。 土 其他多官能單體之具體例可列舉三經甲基丙烷三（甲 基）丙烯酸醋、季戊四醇三（甲基）丙烯酸酷、季戊四醇四（甲 基）丙烯酸酯、二季戊四醇五（甲基）丙烯酸酯、二季戊四醇 六（曱基）丙烯酸酯等。其中以2官能以上之多官能單體可 理想地使用。 光聚合性化合物（C)對於著色感光性樹脂組成物中黏 合劑樹脂（B)及光聚合性化合物（C)合計1〇〇質量分通常含 有1至60質量，較好含有5至5〇質量分之範圍。光聚5人 315150 14 200413843 性化合物（C)之含量在上述之基準若在丨至6〇冑量分之範 圍，則畫素部分之強度或平滑性有變佳之傾向，較佳。 其次，本發明著色感光性樹脂組成物所含之光聚合引 U (D)以含有至少i種選自三嘻化合物、乙酿苯綱化合物 及聨二咪唑化合物所成組群及多官能硫醇化合物者較佳。 更好為含有聯二咪唑化合物及多官能硫醇化合物。含有上 ^光聚合引發劑（D)之著色感光性樹脂組成物感光度更 问，又，使用此種組成物形成之膜使該晝素部分之強度戋 表面平滑性更良好。若併用光聚合引發助劑，所獲得2著 色感光性樹脂組成物之感光度更高，使用此種組成物可提 幵於形成渡光片時之生產性，較佳。 本發明著色感光性樹脂組成物之光聚合引發劑（D)所 含之三嗪化合物可列舉2,仁雙（三氯曱基）_6_(4_甲氧基笨 基）-1，3,5-三嗪、2,4_雙（三氯甲基卜6-(4_甲氧基萘基） 二嗪、2,4_雙（三氯甲基）-6-胡椒基_1，3,5_三嗪、2,4_雙（三 氣曱基）-6-(4-甲氧基苯乙烯基）_i，3,5_三嗪、2,4_雙（三氣甲 基）-6-[2-(5-甲基呋喃-2_基）乙烯基pus•三嗪、2,4_雙（三 氣甲基）-6-[2-呋喃-2-基]乙烯基μι，3,5-三嗪、2,4-雙（三氣 甲基）-6-[2-(4-二乙胺基甲基笨基）乙烯基μι，3,5_三嗪、 2,4-雙（二氯甲基>6_[2气3,4_二甲氧基笨基）乙烯基]_1，3,5· 三嗪等。 又本舍明著色感光性樹脂組成物之光聚合引發劑（〇) 所含之乙醒苯酮系化合物可列舉二乙氧基乙醯苯酮、2 _ _ 基-2-甲基-丨·苯基丙烷―^酮、苄基二甲基酮縮醇、2_羥基— 15 315150 200413843 • 1 [4 (2-羥基乙氧基）苯基-曱基丙烷-卜酮、卜羥基環己基 苯基曱酮、2-曱基-丨彳各曱基苯硫基）嗎啉代基丙烷 • 酮、孓下基二甲胺基“-(扣嗎啉代基苯基）丁烷-丨-酮、2- Λ ^基曱基甲基乙烯基）苯基]丙烷-ί-酮等低聚物 等。 此外，本發明著色感光性樹脂組成物之光聚合引發劑 (D)所含之聯二咪唑化合物可列舉2,2、雙（2_氯苯基）_ •Μ’』’四苯基聯二味。坐、2,2，-雙（2,3_二氯苯基广 4’4，5,5 -四笨基聯二咪唑（參照例如特開平號公 報及特開平6-75373號公報等）、2,2、雙(2-氯苯基> 4,4’，5,5，-四苯基聯二咪σ坐、2,2，_雙（2_氯笨基）_4,4，，5,5，_四 (烷氧基苯基）聯二咪唑、2,2，_雙（2_氯苯基）_4,4，，5,5，-四（二 烷氧基苯基）聯二咪唑、2,2，·雙（2-氯笨基）-4,4，，5,5、四（三 ’ 烷氧基苯基）聯二咪唑（苓照例如特公昭48-38403號公報及 μ特開昭62] 742G4號公報等）、4,4，，5,5，·位之苯基經由㈣ 觀基取代之口米唾化合物（參照例如特開平7-1〇913號公報等） 等。較理想可列舉2,2、雙（2_氯笨基）-4,4，，5,5、四笨基聯二 米唑2,2 -雙（2,3-—氯笨基）-4,4’，5,5，-四苯基聯二咪唑。 多官能硫醇化合物為分子中具有2個以上硫醇基之化 合物，又以於脂肪族基具有複數個硫醇基之脂肪族多官能 硫酵化合物較佳。 本叙明所用之月曰肪族多官能硫醇之例可列舉己二硫 醇、癸二硫醇、1.4-二甲基巯基苯、丁二醇雙巯基丙酸酯、 丁二醇雙巯基乙酸酯、乙二醇雙毓基乙酸酯、三羥甲基丙 315150 16 200413843 炫*二敏基乙？^ & ^ s曰、丁二醇雙巯基丙酸酯、 薇基丙酸醋、—^ 二螋甲基丙烷三巯基乙酸酯 基丙酸S旨、查士 +戍四醇四巯基乙酸酯、三羥 酯及該等以外 卜之夕元羥基化合物之锍基乙 商旨寺^較奸*5ΓΓ 7； t rt：» 列舉三經曱基丙烧三魏基丙 丙^兀一別L基乙酸酯及季戊四醇四魏基丙酸 舉季戊四醇四锍基丙酸酯等。 只要不損壞本發明之效果，可併用通 用之光聚合引發劑等，可列舉例如笨偶因^ _ °頓顯1系、蒽系及其他之引發劑。更具體 之化合物，該等化合物可各自單獨使用， 合使用。 (a) 苯偶因系 本偶因、 笨偶因曱喊、 笨偶因乙_、 笨偶因異丙醚、 笨偶因異丁 _等。 (b) 二笨曱酮系 二笨甲酮、 郝-本臨基笨甲酸甲醋、 4-笨基二笨曱酮、 4-苯酸基-4，-甲基二苯基硫化物、 3,3’，4,4、四（第三-丁基過氧化羰基）二笨甲 三羥曱基丙紀三 、季戊四醇四魏 乙基三魏基丙酸 酸S旨、魏基丙酸 酸酯、三羥甲基 酯等，更好可列 常於該領域所使 卜、、二苯曱S同系、 而言可列舉以下 亦可2種以上組 酉同、 315150 17 200413843 2.4.6- 三甲基二苯甲酮等。 (c)噻°頓S同系 2-異丙基噻噸酮、 4-異丙基噻噸酮、 2,4-二乙基噻噸酮、 2，4 -二氯噻σ頓酮、 1 -氯-4 -丙氧基噻°頓酮等。 _d)蒽系 9，10-二曱氧基蒽、 2 -乙基-9,10 -二甲氧基恩、 9,10 -二乙氧基恩、 2-乙基-9,10-二乙氧基恩等。 (e)其他 2.4.6- 三甲基苯醯基二苯基膦氧化物、 2,2’-雙（鄰-氯笨基）-4,4’，5,5’-四苯基-1，2-聯二咪唑、 •J0-丁基-2-氯吖啶酮、 2-乙基蒽醌、节基、 9,10-菲醌、 樟腦醌、 苯基乙醛酸甲酯、 鈦鹽化合物等。 又，光聚合引發劑亦可與光聚合引發助劑組合使用。 光聚合引發助劑可列舉胺系化合物、烷氧基蒽系化合物、 噻噸酮系化合物等。 18 315150 200413843 胺系化合物可列舉例如三乙醇胺、甲基二乙醇胺、三 異丙醇胺、4-二甲胺基苯甲酸甲酯、4_二甲胺基苯曱酸乙 酯、4-二曱胺基苯曱酸異戊酯、笨甲酸八二甲胺基乙酯、 4-一甲胺基苯甲酸2-乙基己酯、N，N-二曱基對甲苯胺、4,4，_ 雙（二甲胺基）二笨甲酮（通稱為米烯勒酮（MicMer，s ketone))、4,4 _雙（二乙胺基）二笨曱酮、4,4，·雙（乙基曱胺 基）二苯曱酮等，其中以 烷氧基蒽系化合物 4,4’-雙（二乙胺基）二苯曱酮較佳 可列舉例如9,10-二甲氧基蒽、2- 乙基-9，10-二甲氧基蒽、9，1〇_二乙氧基蒽、2_乙基_9，1〇 乙氧基蒽等。 卷頓酮；r、化合物可列舉例如2 _異丙基噻噸酮、心異丙 基噻镇酮、2，‘二乙基噻噸酮、2，‘二氯噻噸酮、丨_氯·扣 丙氧基噻°頓酮等。 光聚合引發劑可單獨使用’亦可複數種組合使用。光 聚合引發助劑可#田^β。丄 使用市售之助劑。市售之光聚合引發助劑 可列舉例如商品名「Ρ Δ Α ρ ,, 门口名EAB_F」（保土谷化學工業（股）公司製 造）等。 於本發明著色感光性樹 聚合引發助劑之組合可列舉 乙月女基）一笨甲晴、2 -曱基-2 月曰組成物’光聚合引發劑及光 一乙氧基乙驗苯酮M，4’-雙（二 -嗎啉代基-1-(4-曱基苯硫基） ^ 又（一乙月女基）二苯曱酮、2-羥基-2-甲基-1 本基丙烧- Ι- g同/ 44，她,—，i ，4 -又（一乙月文基）二苯甲酮、节基二甲基g 子/4j ·雙（二乙胺基）二苯甲酮、2-經基-2-甲基小[4-(2-經基乙氧基）笨基]丙烧小酮/4,4，-雙（二乙胺基）二笨甲 19 315150 200413843 •酮、卜羥基環己基苯基甲酮/4,4、雙（二乙胺基）二苯甲酮、 -匕基-2-甲基[扣（1_甲基乙烯基）苯基]丙烷酮之低聚 .物/4,4 雙（二乙胺基）二苯甲S同、2-节基-2-二甲胺基小（4一 ，^代基笨基）丁燒小_/4,4，-雙（二乙胺基）二笨甲@同之組 口等車乂好可列舉2-甲基-2-嗎琳代基]-(4-甲基苯硫基） 丙烷-1-酮/4,4，-雙（二乙胺基）二苯甲酮之組合。 方、光來合引發劑⑴），對於黏合劑樹脂（b)及光聚合性 •匕二物(C)之合計1〇〇質量分，光聚合引發劑⑼之合計量 通书為丄0·1至40質量分，較好為1至30質量分，光聚合 引餐助劑之合計量在上述之基準通常含有〇」至5〇質量 — 分，較好1至4〇質量分之範圍。 一光聚合引發劑（D)之合計量若在上述之範圍，則著色感 光性樹脂組成物變成高感度，使用上述之著色感光性樹脂 -組成:所形成之畫素部分之強度或在上述畫素表面之平滑 又锃之傾向，較佳。除此之外，光聚合引發助劑之量 上述之範圍，則所獲得著色感光性樹脂組成物之感度 使用上述之著色感光性樹脂組成物所形成濾光片之 生產性有提昇之傾向，較佳。 溶劑（E)可使用該領域所使用之各種溶劑。溶劑（£)之 具體例可列舉如乙二醇一甲鱗、乙二醇一乙峻、乙二醇一 丙醚及乙二醇一 丁醚之乙二醇一烷基醚類；如二乙二醇二 甲醚、一乙二醇二乙醚、二乙二醇二丙醚及乙二醇二丁醚 之一=一醇二烷基醚類；如甲基溶纖素乙酸酯及乙基溶纖 素乙馱g曰之乙二酵烷基醚乙酸酯類；如丙二醇一甲醚乙酸 3J5150 20 200413843Published by Colourists] Compounds classified by Pigment. More specific examples include compounds numbered by the following color index (C.I.), but they are not limited to these compounds. Specific examples of the organic pigment and the inorganic pigment include compounds classified by the Color Index [published by The Society of Dyers and Colourists] pigment. Specific examples include CI Pigment Yellow, CI Pigment Yellow-3, CI Pigment Yellow-12, CI Pigment Yellow_13, CI Pigment Yellow-14, C I. Pigment Yellow-15, CI Pigment Yellow-16 , C ·〗 · Pigment Yellow_17, c ·! .Pigment Yellow-20, CI · Pigment Yellow · 2 4, CI · Pigment Yellow_3 1, CI · Pigment Yellow-53, CI · Pigment Yellow-83, CI · Pigment Yellow_86, CI · Pigment Yellow-93, CI Pigment Yellow-94, CI · Pigment Yellow_1109, CI · Pigment Yellow-1 10, CI Color 7 3) 5150 200413843 Material Yellow-1 17, CI Pigment Yellow-125, CI Pigment Yellow-128, CI Pigment Yellow-137, CI Pigment Yellow-138, CI Pigment Yellow-139, CI Pigment Yellow-147, CI Pigment Yellow-148, CI Pigment Yellow-150, CI Pigment Yellow-153, CI Pigment Yellow-154, CI · Pigment Yellow-166, CI Pigment Yellow-173, CI Pigment Yellow-194, CI Pigment Yellow-214 and other yellow pigments; CI Pigment Orange 13, CI Pigment Orange 31, CI Pigment Orange 36, CI Pigment Orange 38, CI Pigment Orange 40, CI Pigment Orange 42, •: · I · Pigment Orange 43, CI Orange 51, CI Pigment Orange 55, CI Pigment Orange 59, CI Pigment Orange 61, CI Pigment Orange 64, CI Pigment Orange 65, CI Pigment Orange 71, CI Pigment Orange 73 and other orange pigments; CI Pigment Red 9, CI Pigment Red 97, CI Pigment Red 105, CI Pigment Red 122, CI Pigment Red 123, CI Pigment Red 144, CI Pigment Red 149, CI Pigment Red 166, CI Pigment Red 168, CI Pigment Red 176, CI Pigment Red 177, CI Pigment Red 180, CI Pigment Red 192, CI Pigment Red 209, CI Pigment Red 215, CI • Staff Red 216, CI Pigment Red 224, CI Pigment Red 242, CI Pigment Red 254, CI Pigment Red 264, CI Pigment Red 265, and other red Pigments; CI Pigment Blue-15, CI Pigment Blue-15: 3, CI Pigment Blue-15: 4, CI Pigment Blue-15: 6, CI Pigment Blue-60 and other blue pigments; CI Pigment Purple 1. CI Pigment Purple 19, CI Pigment Purple 23, CI · Pigment Purple 29, CI Pigment Purple 32, CI Pigment Purple 36, CI Pigment Purple 38, and other purple pigments; CI Pigment Green 7, CI Pigment Green pigments such as Color 36; brown pigments such as CI Pigment Brown 23, CI pigment brown 25; Black pigments such as CI Pigment Black 1, CI Pigment Black 7, and 8 315150 200413843 containing at least one selected from ci · pigment yellow · 138, CI • Pigment Yellow_i39, CI Pigment Yellow-150, CI · Pigment Red 177, CI. Pigment Red 209, cl · Pigment Red 254, CI · Pigment Purple 23, CI · Pigment Blue_15: 6 and CI Pigment Green 36 pigments are preferred. These colorants (A) may be used alone or in combination of two or more kinds. The colorant (A) is usually in the range of 5 to 60% by mass, preferably 10 to 55% by mass based on the solid content of the colored photosensitive resin composition. In the range of 5 to 60 mass%, even if a thin film is made, the color density of the day pigment is sufficient, and when it is developed, it is non-painting, and the elimination of dices and knives does not decrease, and the residue tends to be less likely to be generated. In the present invention, the solid content of the colored photosensitive resin composition is the total amount of the component except the solvent (E), and the solid content of the colored photosensitive resin composition is the solvent (E) removed from the colored photosensitive resin composition. Composition of ingredients. As the binder resin used in the present invention, a propylene-based copolymer can be used, and examples thereof include copolymers of a carboxyl group-containing monomer and other monomers copolymerizable with the monomer. Examples of the carboxyl group-containing monomer include an unsaturated carboxylic acid having at least one carboxyl group in a molecule such as an unsaturated monocarboxylic acid, an unsaturated dicarboxylic acid, or an unsaturated tricarboxylic acid such as an unsaturated tricarboxylic acid. Examples of the unsaturated monocarboxylic acid include acrylic acid, methacrylic acid, crotonic acid, α-acryl acrylic acid, and cinnamic acid. Examples of the unsaturated dicarboxylic acid include maleic acid, fumaric acid, itaconic acid, citraconic acid, mesaconic acid, and the like. The anhydride of the unsaturated polycarboxylic acid may be specifically maleic anhydride, itaconic anhydride, citraconic anhydride, and the like. The unsaturated polycarboxylic acids referred to here also include 9 315150 200413843 mono- (2-methylpropanyloxymethyl) -containing monokisuccinic acid mono (2-propenyloxyethyl) ), Succinic acid: ° 其 7Terminal, # dry ^ thiopropyl acetate -g), this dicarboxylic acid soap (2-propoxyethyl acetate), methyl phthalate Ethyl acetate) and so on. Unsaturated polybasic acids include examples-based on caprolactam monoacrylic acid ester, o-caproyl polycaprolactone, and the like. Containing the engravings of such a certain soil, soil C ~ ~ The early body of each temple can be used alone, and the above can be used in combination. ""-"" Other monomers copolymerizable with monomers containing the above-mentioned weidyl group include, for example, the present ethylene, α-methylstyrene, o-vinylmethylbenzyl, m-vinyltoluene, p-vinyltoluene, P-aerostyrene, o-methoxystyrene, m-methoxystyrene, p-methoxystyrene, mabuethenylmethyl, m-vinylbenzyl methyl ether , P-vinylbenzyl_, buethenylbenzyl glycidol_ethenylbenzylglycidyl_, para_ethenylbenzylglycidyl ether, India and other square group vinyl compounds; C Methyl Acrylic Acid, Methyl Acrylic Acid, Ethyl Acrylic Acid, Ethyl Acrylic Acid, Ethyl Acrylic Acid Methyl Acetate, N-Ethyl Acrylic Acid, N-Acrylic Acrylic Acid, Isopropyl Acrylic Acid Isopropyl Acrylic Acid, n-Butyl Acrylate, N-Butyl Acrylic N-Butyrate, Isobutyl Acrylate, Isobutyl Methacrylate, Second-Butyl Acrylate, Second-Butyl Acrylate, Acrylic Acid Second-butyl ester, tertiary butyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl acrylate, 2-hydroxypropyl acrylate, 2-hydroxypropyl methacrylate , 3-hydroxypropyl acrylate, 3-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, hydroxybutyl acrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl acrylate, 4-hydroxy acrylate Hydroxybutyl ester, 4-hydroxybutyl acrylate, allyl acrylate, allyl acrylate, benzyl acrylate, 315150 200413843 benzyl methacrylate, cyclohexyl acrylate, cyclohexyl methacrylate, phenyl acrylate , Phenyl methacrylate, 2-methoxyethyl acrylate, 2-methoxyethyl methyl propionate, 2-benzyl ethyl acrylate, 2-phenoxyethyl methyl Ester, methoxydiethylene glycol acrylate, methoxydiethylene glycol methacrylate, methoxytriethylene glycol acrylate, methoxytriethylene glycol acrylate, methoxypropylene glycol Acrylate, methoxypropanediol methacrylate, ethoxydipropylene glycol acrylate, ethoxydipropylene, monoalcohol acrylic acid vinegar, isobornyl alcohol acrylic acid, isobornyl methyl acrylic acid Esters, dicyclopentadienol acrylate, dicyclopentadienol methyl acrylic acid, 2-mercapto- Unsaturated carboxylic acid esters such as 3-phenoxy alcohol propyl acrylic acid, 2-meryl-3-phenoxypropanol methacrylate, glycerol monoacrylate, glycerol monomethacrylate, etc .; 2-aminoethyl acrylate, 2-aminoethyl methacrylic acid, 2-dimethylaminoethyl methacrylate, dimethylaminoethyl methacrylate, 2-aminopropyl acrylate Esters, aminopropyl methacrylate, 2-dimethylaminopropyl acrylate, 2-dimethylaminopropyl acetic acid, 3-propanyl malonate, 3-aminopropyl acetic acid Unsaturated acetic acid esters such as propyl vinegar, 3-dimethylaminopropyl acrylate, 3-dimethylaminopropyl methacrylate, etc .; glycidyl acrylate, methyl propyl acrylate Glycerides and other unsaturated glycidyl glycidyl esters; vinyl acetate, vinyl propionate, vinyl butyrate, vinyl benzoate and other carboxylic acid vinyl esters; vinyl methyl ester, ethyl ether Unsaturated bonds such as dichloropropyl glycidyl ether; Acrylonitrile compounds such as acrylonitrile, fluorenyl acrylonitrile, α-gas acrylonitrile, vinylidene dicyanide; acrylic amine, methyl propyl amine, α - Unsaturated amines, 2-Ethyl Acetate & & Amines, N-2-Ethylmethylpropane SE amines, etc. (and acid amines; Malay 315150 200413843 Amines, N -Unsaturated Sm imines such as phenylmaleimide, N-cyclohexylmaleimide, and 1,3-butane-dioxane, glutarene, diammonium, etc. Class; polystyrene, polymethacrylic acid ester, polymethmethacrylate, poly-n-butyl acrylate, poly-n-butyl methacrylate, polysiloxane Macromonomers of acrylfluorenyl or monomethacrylfluorenyl. These monomers may be used alone or in combination of two or more. The above-mentioned copolymer contains the content of the enemy-based monomer unit, and the mass fraction is usually 10 to 50% by mass, preferably 15 to 40% by mass, and more preferably 25 to 40 shells. If the content of the monomer unit containing the above-mentioned radical is 10 to 50% by mass, the solubility in the developing solution is good, and the pattern tends to be formed correctly during development, which is preferable. Examples of the propylene-based polymer include (meth) acrylic acid / meth (meth) acrylate copolymer, (meth) acrylic acid / benzyl (meth) acrylate copolymer (meth) acrylic acid / 2- Hydroxyethyl (meth) acrylate / benzyl (meth). Dilute vinegar copolymer, (fluorenyl) propionic acid / fluorenyl (meth) acrylic acid cool / polystyrene copolymer, (Fluorenyl) acrylic acid / methyl (meth) acrylic acid / polymethyl (: yl) acrylamide macromer copolymer, (fluorenyl) acrylic acid / synthetic (methyl) acrylic acid Copolymer / Polystyrene Macromer Copolymer, (meth) acrylic lower earth (soil) acrylate copolymer / Polymethyl (meth) acrylate macromonomer copolymer, (soil) propylene S / 2-hydroxyethyl (meth) acrylate / benzyl (meth) propionic acid / flat #, olefin macromonomer copolymer, (meth) acrylic acid / 2-hydroxyethyl (methyl Base) Propionate and succinyl group / lower (meth) acrylate / polyfluorenyl (meth) enoate macromonomers are taken here; ~, (fluorenyl) acrylic acid / benzyl ethylene / benzyl Base (fluorenyl) C 31 5150 19 200413843 enoate / N-phenylmaleimide copolymer, (meth) acrylic acid / mono (2-propenyloxyethyl) succinate / styrene / benzyl (fluorenyl) acrylate / n / phenyl maleimide copolymer, (fluorenyl) acrylic acid / monopropenyloxyethyl succinate) / styrene / allyl (meth) acrylate / N_benzyl maleimide Imine copolymer, g- (meth) acrylic acid / benzyl (meth) acrylate / n-phenylmaleimide / styrene / glycerol mono (fluorenyl) acrylate copolymer, etc. The (fluorenyl) acrylate is an acrylate or a methacrylic acid. Among them, (fluorenyl) acrylic acid / benzyl (meth) acrylic acid ester copolymer, (meth) acrylic acid / benzyl (meth) acrylic acid sl / styrenic copolymer, (meth) Acrylic acid / meth (meth) acrylic acid copolymer and (meth) acrylic acid methyl (meth) acrylic acid ester / polyethylene copolymer are preferred. The above-mentioned propylene-based polymer has a polystyrene-equivalent weight-average molecular weight (the value obtained by gel permeation chromatography using polystyrene as a standard product) is usually 5,000 to 50, Fortunately, the range of 8, 00 () to 4 (), the range of _ is preferably 10, just to 35, _. If the molecular weight is to 50, _, the hardness of the coating film will increase, and the residual film rate will be quite different. ^ ^ I also asked that the developer in the unexposed part has good solubility and good tendency to improve the resolution, and is preferred. The propylene-based polymer usually has an acid value of 50 to 150, preferably M to 140, more Good 80 to 135. If the above acid value is up to 之 2 in the developer's solubility, the unexposed part is easy to dissolve, and the pattern of the exposed part of the sensitive material is carried out. The value is the amount of potassium hydroxide (mg) necessary to neutralize 1 gram of acrylic polymer, which is usually determined by titration. Emulsified potassium aqueous solution with wind is used. 315150 13 200413843, the above-mentioned binder resin The basis of 2 cents in the colored photosensitive resin composition of the present invention usually contains 5 to 9G f% by weight, preferably ⑺ to In the range of 5% by mass, the binder resin is above the above = development residues are liable to occur, and the daylight portion of the exposed portion is less likely to cause film reduction during development. The non-daylight portion has good elimination properties, and is preferred. The photopolymerizable compound ㈡ contained in the resin composition is a compound which can be polymerized by the action of light and a photopolymerization initiator to be described later, and the monofunctional monomer may be a bifunctional or other polyfunctional monomer. Specific examples include nonylphenyl carbitol acrylate, 2-hydroxy-3-phenoxypropyl acrylate, 2-ethylhexylcarbitol acrylate, 2-hydroxyethyl acrylate, and N_ Vinylpyrrolidone, etc. Specific examples of the bifunctional monomer include M • Hexanol: alcohol bis (methyl) acrylic acid, ethylene glycol bis (methyl) acrylic acid, neofluorene glycol (fluorenyl) Acrylic acid ester, triethylene glycol di (meth) acrylic acid vinegar, double age A bis (acrylic oxyt-based) ether, 3-fluorenylpentanediol di (meth) acrylate, etc. Specific examples of the functional monomer include tris (meth) propane tri (meth) acrylic acid vinegar, Pentaerythritol tri (meth) acrylic acid, pentaerythritol tetra (meth) acrylate, dipentaerythritol penta (meth) acrylate, dipentaerythritol hexa (fluorenyl) acrylate, etc. Among them, there are more than two functional polyfunctional monomers The photopolymerizable compound (C) generally contains 1 to 60 masses based on a total of 100 mass parts of the binder resin (B) and the photopolymerizable compound (C) in the colored photosensitive resin composition. Contains a range of 5 to 50 mass points. Guangju 5 people 315 150 14 200413843 The content of the sexual compound (C) is within the range of the above-mentioned standard, and the intensity or smoothness of the pixel portion is Second, the photopolymerization primer U (D) contained in the colored photosensitive resin composition of the present invention is formed by containing at least i kinds of compounds selected from the group consisting of Sanhe compounds, ethyl benzene class compounds, and diimidazole compounds. Groups and polyfunctional thiol compounds are preferred. More preferably, it contains a biimidazole compound and a polyfunctional thiol compound. The sensitivity of the colored photosensitive resin composition containing the above-mentioned photopolymerization initiator (D) is further increased, and a film formed using this composition makes the strength and surface smoothness of the daylight portion more favorable. If a photopolymerization initiation adjuvant is used in combination, the sensitivity of the obtained two-color photosensitive resin composition is higher, and the use of such a composition can improve productivity when forming a light-transmitting sheet, which is preferable. Examples of the triazine compound contained in the photopolymerization initiator (D) of the colored photosensitive resin composition of the present invention include 2, renbis (trichlorofluorenyl) _6_ (4_methoxybenzyl) -1,3,5 -Triazine, 2,4-bis (trichloromethylb-6- (4-methoxynaphthyl) diazine, 2,4-bis (trichloromethyl) -6-piperidyl-1,3, 5_triazine, 2,4_bis (trifluoromethyl) -6- (4-methoxystyryl) _i, 3,5_triazine, 2,4_bis (trifluoromethyl)- 6- [2- (5-methylfuran-2_yl) vinyl pus • triazine, 2,4-bis (trifluoromethyl) -6- [2-furan-2-yl] vinyl μm, 3,5-triazine, 2,4-bis (trifluoromethyl) -6- [2- (4-diethylaminomethylbenzyl) vinyl μm, 3,5-triazine, 2,4 -Bis (dichloromethyl)> 6_ [2-Gas 3,4_dimethoxybenzyl] vinyl] _1,3,5 · triazine, etc. Photopolymerization of Bensamine coloring photosensitive resin composition Examples of the acetophenone-based compounds contained in the initiator (〇) include diethoxyacetophenone, 2__yl-2-methyl-phenylpropane-one, benzyl dimethyl ketone, and the like. Acetal, 2-hydroxyl — 15 315 150 200413843 • 1 [4 (2-hydroxyethoxy) phenyl-fluorenyl-propane-butanone, Bu Hydroxycyclohexylphenylfluorenone, 2-fluorenyl- 丨 fluorenylphenylthio) morpholinopropane • ketone, fluorenyldimethylamino "-(comorpholinylphenyl) butane -丨 -ketone, 2-Λ ^ -methylfluorenylmethylvinyl) phenyl] propane-ί-ketone and other oligomers, etc. In addition, the photopolymerization initiator (D) of the colored photosensitive resin composition of the present invention Examples of the biimidazole compounds included include 2,2, bis (2-chlorophenyl) _ • M ′ ′ ′ tetraphenylbidimer. 2,2,2-bis (2,3_dichlorophenyl) 4'4,5,5 -tetrabenzylbiimidazole (refer to, for example, Japanese Unexamined Patent Publication and Japanese Unexamined Patent Publication No. 6-75373), 2, 2, bis (2-chlorophenyl) > 4,4 ' , 5,5, -tetraphenylbiimid sigma, 2,2, _bis (2-chlorobenzyl) _4,4,5,5, _tetra (alkoxyphenyl) biimidazole, 2,2, _bis (2_chlorophenyl) _4,4,5,5, -tetrakis (dialkoxyphenyl) biimidazole, 2,2, · bis (2-chlorobenzyl)- 4,4,5,5, Tetrakis (tri'alkoxyphenyl) biimidazole (Ling Zhao, for example, Japanese Patent Publication No. 48-38403 and Japanese Patent Publication No. 62] 742G4, etc.) , 5,5, · phenyl via Kansai substituted saliva compounds (refer to, for example, Japanese Unexamined Patent Publication No. 7-10913) and the like. Ideally, 2,2,2- (2-chlorobenzyl) -4,4,5,5, Tetra-benzylbi-imidazole 2,2-bis (2,3--chlorobenzyl) -4,4 ', 5,5, -tetraphenylbiimidazole. A multifunctional thiol compound has 2 in the molecule Compounds having more than one thiol group are also preferred, and aliphatic polyfunctional thiol compounds having a plurality of thiol groups in the aliphatic group. Examples of the aliphatic polyfunctional thiols used in this description include hexamethylene dithiol, sebacyl mercaptan, 1.4-dimethylmercaptobenzene, butanediol bismercaptopropionate, butanediol bismercaptoethyl Acid esters, ethylene glycol bismethyl acetic acid esters, trimethylolpropane 315150 16 2004 13843 ^ & ^ s, butanediol bismercaptopropionate, victoryl propionate, ^ dimethyl methylpropane trimercaptoacetate propionate S purpose, Chass + gadotetraol tetramercaptoacetate Esters, trihydroxy esters, and other hydroxy-based compounds of the above-mentioned ethoxylated hydroxy compounds ^ Comparative * 5ΓΓ 7; t rt: »List the three classics of sulfonyl propionate and trisyl propionate. Examples of pentaerythritol and pentaerythritol tetraweilyl propionic acid include pentaerythritol tetrafluorenyl propionate and the like. As long as the effects of the present invention are not impaired, general photopolymerization initiators and the like can be used in combination, and examples thereof include duphanin ^ ° ° Dianxian 1 series, anthracene series and other initiators. More specific compounds can be used individually and in combination. (a) Benzoin is Benzoin, Benzoin shouts, Benzoin B_, Benzoin in isopropyl ether, Benzoin in isobutyl etc. (b) Dibenzone is dibenzone, Hao-Benylbenzylformate, 4-benzylbenzidone, 4-benzoate-4, -methyldiphenyl sulfide, 3 , 3 ', 4,4, tetrakis (tertiary-butylperoxycarbonyl) dibenzyltrimethylolpropanetriene, pentaerythritol tetraweiethyltriweilylpropionate S, weylpropionate, trihydroxy Methyl esters, etc., can be more commonly listed in the field, and diphenyl hydrazine homologues. For example, the following can also be used in two or more groups, 315 150 17 200413843 2.4.6- trimethyl dibenzene Ketone and so on. (c) Titonton S homologue 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothiosigmatone, 1- Chloro-4-propoxythiatonone and the like. _d) Anthracene 9,10-dioxanthracene, 2-ethyl-9,10-dimethoxyen, 9,10-diethoxyen, 2-ethyl-9,10-diethyl Oxon and others. (e) Other 2.4.6-trimethylphenylphosphonium diphenylphosphine oxides, 2,2'-bis (o-chlorobenzyl) -4,4 ', 5,5'-tetraphenyl-1 2,2-biimidazole, • J0-butyl-2-chloroacridone, 2-ethylanthraquinone, benzyl, 9,10-phenanthrenequinone, camphorquinone, methyl phenylglyoxylate, titanium salt Compounds etc. The photopolymerization initiator may be used in combination with a photopolymerization initiator. Examples of the photopolymerization initiation aid include amine compounds, alkoxyanthracene compounds, and thioxanthone compounds. 18 315150 200413843 Examples of the amine-based compound include triethanolamine, methyldiethanolamine, triisopropanolamine, methyl 4-dimethylaminobenzoate, ethyl 4-dimethylaminobenzoate, and 4-difluorene Isoamyl phenyl benzoate, octamethylamino ethyl benzoate, 2-ethylhexyl 4-monomethylamino benzoate, N, N-dimethyl p-toluidine, 4,4, _ Bis (dimethylamino) dibenzone (commonly known as MicMer, sketone), 4,4 _bis (diethylamino) dibenzone, 4,4, · bis (ethyl Methyl fluorenyl) benzophenone and the like, among which alkoxyanthracene-based compounds 4,4'-bis (diethylamino) benzophenone are preferably exemplified by 9,10-dimethoxyanthracene, 2-ethyl-9,10-dimethoxyanthracene, 9,10_diethoxyanthracene, 2-ethyl-9,10ethoxyanthracene, and the like. Rolltonone; r, compounds include, for example, 2-isopropylthioxanthone, cardiac isopropylthioxanthone, 2, 'diethylthioxanthone, 2,' dichlorothioxanthone, 丨 _chloro · Deoxypropiothiazone and so on. The photopolymerization initiator may be used singly or in combination. Photopolymerization initiation adjuvant can be used.丄 Use commercially available additives. Commercially available photopolymerization initiation aids include, for example, the trade name "P Δ Α ρ, and the entrance name EAB_F" (manufactured by Hodogaya Chemical Industry Co., Ltd.). The combination of the coloring photosensitive tree polymerization initiation aid in the present invention can be listed as Etothene), Benzene, 2-Phenyl-February-February Composition 'Photopolymerization Initiator and Photo-Ethoxy Acetylphenone M , 4'-bis (di-morpholino-1- (4-fluorenylphenylthio) ^ (monoethynyl) benzophenone, 2-hydroxy-2-methyl-1 base Propylene-I-g same as / 44, she,-, i, 4-again (monoethenyl) benzophenone, benzyl dimethyl g / 4j · bis (diethylamino) diphenyl Methyl ketone, 2-meryl-2-methyl small [4- (2-merylethoxy) benzyl] propanone ketone / 4,4, -bis (diethylamino) dibenzyl 19 315150 200413843 • Ketone, hydroxycyclohexyl phenyl ketone / 4,4, bis (diethylamino) benzophenone, -doxy-2-methyl [K (1-methylvinyl) phenyl] Oligomers of propane ketones / 4,4 bis (diethylamino) diphenyl S homo, 2-benzyl-2-dimethylamino small (4-one, ^ -benzyl) butyrate small_ / 4,4, -bis (diethylamino) dibenzyl @ 同 之 组 口 etc. Good examples include 2-methyl-2-morpholinyl]-(4-methylphenylthio) propane -1-one / 4,4, -bis (diethylamino) benzophenone Combination: square, photo-lamination initiator ⑴), for the binder resin (b) and photopolymerizable • dextrose (C) total 100 mass points, the total amount of photo-polymerization initiator ⑼ is 丄0 · 1 to 40 mass parts, preferably 1 to 30 mass parts, the total amount of the photopolymerization food-feeding auxiliary agent usually contains 0 "to 50 mass parts, preferably 1 to 40 mass parts, on the above-mentioned basis. range. If the total amount of the photopolymerization initiator (D) is within the above range, the colored photosensitive resin composition becomes highly sensitive, and the above-mentioned colored photosensitive resin is used. Composition: The strength of the formed pixel portion or the The plain surface tends to be smooth and sloppy, which is preferred. In addition, if the amount of the photopolymerization initiation aid is within the above range, the sensitivity of the obtained colored photosensitive resin composition using the colored photosensitive resin composition described above tends to improve the productivity, good. As the solvent (E), various solvents used in this field can be used. Specific examples of the solvent (£) include ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, ethylene glycol monopropyl ether, and ethylene glycol monoalkyl ethers of ethylene glycol monobutyl ether; such as diethyl ether. One of glycol dimethyl ether, monoethylene glycol diethyl ether, diethylene glycol dipropyl ether, and ethylene glycol dibutyl ether = monoalcohol dialkyl ethers; such as methyl lysone acetate and ethyl Fibrinolysin, ethyl acetate, glyoxalyl ether ether acetates; such as propylene glycol monomethyl ether acetate 3J5150 20 200413843

乙暖酉I 酯、丙二醇一乙_乙酸酯、丙二醇一丙_乙酸g旨 丁基乙酸酯及甲氧基戊基乙酸酯之烷撐醇烷基醚 類；如苯、甲笨、二甲苯及1，3,5-均三甲苯之芳族蛵类員· 如甲基乙基甲s同、丙s同、甲基戊基曱酮、曱基異 基甲商同 及環己酮之酮類；如乙醇、丙醇、丁醇、己醇、 ^ 展己醇、 乙二醇及丙二醇之醇類，如3 -乙氧基丙酸乙酿及， J -曱氡式 丙酸曱酯之酯類；如γ - 丁内酯之環狀酯類等。复 土 、、 Ί ,較奸 可列舉丙二醇一甲乙酸S旨。 該等溶劑（E)可各自單獨使用，亦可2種類 用 犬、Λ上混合使 執九性樹脂植 成物全體通常為60至90質量％，較好7〇 主85質奮叱 溶劑（Ε)之含量在上述之基準若在6〇至9〇質量〇 μ /〇 則有塗抹性變佳之傾向，較佳。 〇之範圍 本發明所使用具有（F)苄叉骨架之化合物。 式⑴所示部分構造之化合物。 可列舉具有 又 具有 物Ethyl acetic acid esters, propylene glycol monoethyl acetate, propylene glycol monopropyl acetate, butyl acetate, and alkylene alcohol alkyl ethers of methoxypentyl acetate; such as benzene, methylbenzyl, Aromatic fluorene members of xylene and 1,3,5-mesitylene · such as methyl ethyl methyl s, propyl s, methyl amyl fluorenone, fluorenyl isomethyl methion and cyclohexanone Ketones; alcohols such as ethanol, propanol, butanol, hexanol, ^ hexanol, ethylene glycol, and propylene glycol, such as ethyl 3-propoxypropionate, and Ester esters; such as cyclic esters of γ-butyrolactone. Compound soil, tritium, and treacherous can include propylene glycol monomethyl acetate. These solvents (E) can be used individually, or two kinds can be mixed with dogs and Λ to make the total resin plantings generally 60 to 90% by mass, preferably 70% to 85%. If the content of) is in the range of 60 to 90 mass / μ / 0, the spreadability tends to be improved, and it is preferable. Scope of 〇 A compound having (F) a benzyl skeleton used in the present invention. A partially structured compound represented by formula (I). Examples of having and having

(I) 苄叉骨架之化合物可列舉式 所 示之化合 315150 21 200413843 〇(I) The compounds of the benzyl skeleton can be listed as the compound shown by the formula 315 150 21 200413843.

C: H XC: H X

II C—OQ> (II) 式（1)及式（II)中Q】至Q3各自獨立為氫原子、經基、烧 基或烷氧基。 式（Π)中Q4為烷基，X為氰基或烷氧基羰基。該等定 #1中之烧基、烷氧基及烷氧基羰基之碳原子數可各自為i 至6。又’於式（ιι)χ為烧氧基羰基時兩個酯部分可相同或 不同。式（II)所示之不飽和羧酸酯化合物中χ為氛基之化 合物可經由對應之笨曱醛類與氰基乙酸酯類進行反應製 造。又’ X為烷氧基羰基之化合物可經由對應之笨曱酸類 與丙二酸二酯類進行反應製造。 用於本發明理想之具有苄叉骨架之化合物具體而言可 列舉节叉馬來酸二烷基酯、4-羥基-3-曱氧基苄又馬來酸二 #基酯、4-羥基苄叉馬來酸二烷基酯、2,4-二經基节叉焉 來酸二烷基酯、2-氰基-3-(4-羥基甲氧基苯基）丙烯酸烷 基S旨等。 具有苄叉骨架之化合物（F)之使用量於感光性樹脂組 成物之固體中通常為0.001至3質量％，較好為〇〇1至2 質量％，更妤為0.1至1質量％。具有苄叉骨架之化合物 (F)之使用量在上述之基準若為0.001至3質量％，則有解 像度及消除性變佳之傾向，較佳。 本發明之感光性樹脂組成物必要時可將填充劑、其他 315150 22 200413843 之高分子化合物、顏料分散劑、黏著促進劑、氧化防止劑 紫外線吸收劑、凝集防止材料等添加劑（G)混合使用。 填充劑具體而言可使用破璃、二氧化秒、氧化紹等 其他之高分子化合物具體而言可使用聚乙烯醇、聚丙烯 酸、聚乙二醇一烷基醚、聚氟烷基丙烯酸酯等。 顏料分散劑可使用市售之 機石夕系、氟系、si系、陽離子 兩性等界面活性劑，可各自單 用。上述界面活性劑之例除了 氧乙烷烷基笨基醚類、聚乙二 酸酯、脂肪酸改性聚酯類、3， 顏料分散劑，可列舉例如有 系、陰離子系、非離子系、 獨使用亦可2種以上組合使 聚環氧乙烧烧基_類、聚環 醇二酯類、山梨糖醇酐脂肪 及胺改性聚胺基曱酸酯類、 聚乙烯亞胺類之外還可列舉商品名為κρ(信越化學工業 (股）公司製造）、聚弗（共榮化學（股）公司製造）、伊佛德普（特 姆產品公司製造）、美卡法斯（大曰本油墨化學工業（股）公司 製造）、佛拉德（住友史利-姆（股）公司製造）、朝曰卡德、薩 弗隆（以上為旭硝子（股）公司製造）、索斯巴斯（傑那卡（股） 公司製造）、EFKA(EFKA化學公司製造）、ΡΒ821(味之素（股） 公司製造）等。 黏著促進劑具體而言可列舉乙烯基三甲氧基矽烷、乙 烯基三乙氧基矽烷、乙烯基三（2-甲氧基乙氧基）矽烷、 (2-胺基乙基）-3-胺基丙基甲基二甲氧基矽烷、ν_(2-胺基乙 基）-3-胺基丙基三甲氧基矽烷、3-胺基丙基三乙氧基矽烷、 3-環氧丙氧基丙基三甲氧基矽烷、環氧丙氧基丙基甲基 二甲氧基矽烷、2-(3,4-環氧基環己基）乙基三甲氧基矽烷、 23 3】515〇 200413843 J -氯丙基甲基二甲氧基矽烷、3 -氯丙基三甲氧基矽烷、3_ 甲基丙烯氧基丙基三甲氧基矽烷、3-巯基丙基三甲氧基矽 烷等。 氧化防止劑具體而言可列舉2,2-硫代雙（4-甲基-6-第 三-丁基苯酚）、2,6-二-第三-丁基_4_甲基苯酚等。 紫外線吸收劑具體而言可列舉2_(弘第三-丁基一2-羥 基-5-甲基苯基）_5-氯苯并三唑、烷氧基二苯甲酮等。 鲁’旋集劑具體而言可列舉聚丙烯酸鈉等。 本毛月之著色感光性樹脂組成物可經由例如以下之操 作调製。亦即，將著色劑（A)預先與溶劑（E)混合至著色材 料之平均粒徑在約〇·2 # m以下，用顆粒研磨機（badsmi⑴ 莩刀政此8才必要日τ可使用顏料分散劑，亦有配合一部分 f全部之黏合劑樹脂（B)。於所獲得之分散液（以下稱為研 磨基底（millbase)添加剩餘之黏合劑樹脂（B)、光聚合性化 合物（C)及光聚合引發劑（D)、必要時所使用之其他成分、 »必要時追加之溶劑⑻至所規^之濃度，獲得目的之著色 感光性樹脂組成物。 由此调製之本發明著色感光性樹脂組成物可絲由例如 以下之操作塗抹在基材上，進行光硬化及顯影，^成黑色 基材或著色晝像。 自元，將該組成 … 八、〜φ）上旋轉汝覆， 經由加熱乾燥（預烘培）除去溶劑’獲得平滑之塗膜^此時 塗膜之厚度為約1至3 V m。 於由此操作所獲得之塗膜藉由用於形成目的之黑色基 315150 24 200413843 材或晝像之負片罩進行紫外線照射。此時，曝光部分全體 均一的用平行光線照射，且使罩與基板在正確位置配合以 使用罩校正等裝置較佳。 、立=後，將已硬化之塗膜於稀鹼性水溶液接觸，將非曝 光#刀洛解，㈣顯影獲得目的之黑色基材或晝像。續參 後必要時可於15〇至23(rc實施約1G至6G分鐘之後魏 (後烘培）。 圖案曝光後之顯影所使用 合物及界面活性劑之水溶液。 驗性化合物之任何一種。 之顯影液通常為含有鹼性化 鹼性化合物可為無機及有機 、， …丁 A平^。奶、虱氧化 鉀、磷酸氫二鈉、磷酸二氫鈉、+ 总奶&酸虱二銨、磷酸二氫銨 磷酸二氫鉀、矽酸鈉、矽酸钿、 ^ 7 &鉀蛱酸鈉、碳酸鉀、碳酸 鈉、碳酸氫鉀、硼酸鈉、硼酸鉀、氨等。 有機鹼性化合物之具體例 J〜举虱虱化四曱銨、2 — 乙基氫氧化三甲銨、單甲胺、- > 一 —甲月女、三曱胺、一乙胺 二乙胺、二乙胺、一異丙胺、二昱 ，、丙月女、乙醇胺等。該 無機及有機鹼性化合物可各自置 早獨使用，亦可2種以上 合使用。fe性顯影液中鹼性化合 ^ 里想 >辰度在0.01至 質量％之靶圍，更好為0.03至5質量％ 驗性顯影液中之界面活性劑里。。/ 十丨a雠孚备炅品、工 為非綠子系界面活性 劑、陰硪子糸界面活性劑或陽離 不界面活性劑之任何, 種0 列舉聚環氧乙烷烷基 #離子系界面活性劑之具體例可 315150 25 200413843 醚、聚環氧乙烧芳基鍵、聚環氧乙烷烷芳基醚、其他之聚 環氧乙烷衍生物、羥基乙烯/羥基丙烯嵌段聚合物、山梨糖 醇酐脂肪酸醋、聚環氧乙烧山梨糖醇酐脂肪酸酯、聚環氧 乙烧山梨糖醇酐脂肪酸醋、丙三醇脂肪酸酯、聚環氧乙烷 脂肪酸酯、聚環氧乙烷烷基胺等。 陰離子系界面活性劑之具體例可列舉如月桂醇硫酸酯 鈉鹽或油醇硫酸脂鈉鹽之高級醇硫酸s旨鹽類、如月桂硫酸 β或月桂硫酸鐘之烧基硫酸鹽類、如十三烷基苯項酸鈉或 十二烧基蔡項酸納之烧基芳基續酸鹽類等。 陽離子系界面活性劑之具體例可列舉如硬脂胺鹽酸鹽 或月桂三甲基氣化錄之胺鹽或第四級銨鹽等。 該等界面活性劑可各自單獨使用，亦可2種以上組合 使用。 鹼性顯影液中界面活性劑之濃度通常在〇〇1至1〇質 量％之範圍，較好為〇·05至8質量％，更好為〇1至5質 由上述感光性樹脂液之塗抹、乾燥，所獲得之乾燥塗 膜經圖案曝光、顯影各種操作，獲得與感光性樹脂組成物 令著色材料顏色相當之晝素或黑色基材，該等操作只在需 濾光片之顏色反覆操作，可獲得濾光片。亦即，濾光片雖 然通常為在基板上配置黑色基材及紅、綠及藍三原色晝素 之/慮光片仁疋使用含有與特定顏色相當之著色材料之本 發明者色感光性樹脂組成物，經由上述之操作獲得該色之 黑色基材或晝素，其他之顏色可使用含有與期待之顏色相 26 315150 200413843 著色材料之本發明著色感光性樹脂物進行同樣之操 作，可在基板上配置黑色基材及三原色畫素。基板上一旦 配置捋疋色之畫素或黑色基材後，在處理其他顏色之著色 感光性樹脂組成物時，在配置有該特定顏色之晝素或黑色 基材之基板上將其他顏色之著色感光性樹脂組成物塗抹、 乾秌佼，通常該特定顏色之畫素或黑色基材在未配置之位 置進行圖案曝光，於經曝光位置配置該其他顏色之畫素或 ：： 材田：、’丨本务明之著色感光性樹脂組成物亦適用 於黑色基材及三原色中之任何_種、二種或三種。作為遮 光層之黑色基材由於可用鉻層等形成，所以在形成黑色基 材的情況下不需使用本發明之著色感光性樹脂組成物。 使用本發明之感光液製造之濾光片面内膜厚差小，例 如於1至3//m之膜厚，面内膜厚差在〇15“m以下，更 可在〇·〇5 // m以下。所以，由此所獲得濾光片之平滑性及 透明性優越，將此組裝至彩色液晶顯示裴置，可以高成品 率製造優越品質之液晶控制板。 一於上述對本發明之實施形態加以說明，但是上述所揭 :之本發明實施形態終究為例示’本發明之範圍不只限於 該等實施形態。本發明之範圍為申請專利之範圍，包含與 申請專利範圍揭示者相同意義及在範圍内之所有變更者。 以下，根據實施例對本發明作更詳細之說明，但是本發明 亚不只限於該等實施例。例中，含量及使用量所示之％及，， 分”若無特別之記載即為質量基準。 315150 27 200413843 • 本實施例所使用之成分如下所示，以下省略表示。 (a-l)C.I.頭料監色 15 : 6 ^ (a - 2) C · I ·顏料紫色2 3 ， （b-Ι)黏合劑樹脂：甲基丙烯酸及甲基丙烯酸苄酯之共聚物 (曱基丙稀酸單位與曱基丙烯酸苄酯單位之比為物質量比 (莫耳比）為3 0 ·· 70，酸價為11 3，聚苯乙烯換算重量平均 分子量為25,000 馨P-1)光聚合性化合物：二季戊四醇六丙烯酸酯（曰本化藥 (股）公司製造KAYARAD DPHA) (c-2)光聚合性化合物：二羥甲基三環癸烷二丙烯酸酯（日本 化藥（股）公司製造KAYARAD R-684)II C—OQ> (II) In the formula (1) and Q] to Q3, each is independently a hydrogen atom, a vial group, an alkyl group, or an alkoxy group. In the formula (Π), Q4 is an alkyl group, and X is a cyano group or an alkoxycarbonyl group. The number of carbon atoms of the alkyl group, the alkoxy group, and the alkoxycarbonyl group in the determination # 1 may be i to 6 each. Also, when the formula (ι) χ is a oxycarbonyl group, the two ester moieties may be the same or different. Among the unsaturated carboxylic acid ester compounds represented by formula (II), compounds in which χ is an aryl group can be produced by reacting the corresponding benzaldehydes with cyanoacetates. A compound in which X is an alkoxycarbonyl group can be produced by reacting a corresponding fatty acid with a malonic acid diester. Specific examples of the compound having a benzylidene skeleton used in the present invention include dialkyl maleic acid dialkyl ester, 4-hydroxy-3-methoxybenzyl maleate di # yl ester, and 4-hydroxybenzyl ester. Fork dimaleic acid dialkyl, 2,4-dimethylidene dialkyl maleic acid dialkyl, 2-cyano-3- (4-hydroxymethoxyphenyl) acrylic acid alkyl, and the like. The amount of the compound (F) having a benzylidene skeleton in the solid of the photosensitive resin composition is usually 0.001 to 3% by mass, preferably 0.001 to 2% by mass, and more preferably 0.1 to 1% by mass. If the amount of the compound (F) having a benzylidene skeleton is 0.001 to 3% by mass based on the above-mentioned standard, the resolution and the erasability tend to be improved, which is preferable. The photosensitive resin composition of the present invention may be used in combination with fillers, other high molecular compounds of 315150 22 200413843, pigment dispersants, adhesion promoters, oxidation inhibitors, ultraviolet absorbers, aggregation prevention materials and other additives (G). As the filler, specifically, other polymer compounds such as glass-breaking, second seconds, and oxides can be specifically used. Polyvinyl alcohol, polyacrylic acid, polyethylene glycol monoalkyl ether, polyfluoroalkyl acrylate, etc. can be used. . As the pigment dispersant, commercially available surface active agents such as ishiishi series, fluorine series, si series, and cationic amphoteric can be used, and they can be used alone. Examples of the surfactants described above include, in addition to oxyethane alkylbenzyl ethers, polyethylene glycol esters, fatty acid modified polyesters, and pigment dispersants, for example, organic, anionic, nonionic, and unique It can also be used in combination of 2 or more types to make polyethylene oxides, polycyclic alcohol diesters, sorbitan fats, amine-modified polyaminophosphonates, and polyethyleneimines. Examples of product names include κρ (made by Shin-Etsu Chemical Industry Co., Ltd.), Jupho (made by Kyoei Chemicals Co., Ltd.), Everdeep (manufactured by Tem Products Co., Ltd.), Mekafas (Da Yueben) Ink Chemical Industry Co., Ltd.), Vlad (manufactured by Sumitomo Slim-Co., Ltd.), Chaoyue Card, Saffron (above manufactured by Asahi Glass Co., Ltd.), Sosbas ( Genaka (Co., Ltd.), EFKA (Manufactured by EFKA Chemical Co., Ltd.), PB821 (Made by Ajinomoto Co., Ltd.), etc. Specific examples of the adhesion promoter include vinyltrimethoxysilane, vinyltriethoxysilane, vinyltri (2-methoxyethoxy) silane, and (2-aminoethyl) -3-amine Propylmethyldimethoxysilane, ν_ (2-aminoethyl) -3-aminopropyltrimethoxysilane, 3-aminopropyltriethoxysilane, 3-glycidoxy Propyltrimethoxysilane, glycidoxypropylmethyldimethoxysilane, 2- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, 23 3] 515〇200413843 J -Chloropropylmethyldimethoxysilane, 3-chloropropyltrimethoxysilane, 3-methacryloxypropyltrimethoxysilane, 3-mercaptopropyltrimethoxysilane, and the like. Specific examples of the oxidation inhibitor include 2,2-thiobis (4-methyl-6-third-butylphenol), 2,6-di-third-butyl-4-methylphenol, and the like. Specific examples of the ultraviolet absorber include 2- (3-tert-butyl-2-hydroxy-5-methylphenyl) -5-chlorobenzotriazole, alkoxybenzophenone, and the like. Specific examples of the Lu 'aggregating agent include sodium polyacrylate. The coloring photosensitive resin composition of the present month can be prepared by, for example, the following operations. That is, the colorant (A) is mixed with the solvent (E) in advance until the average particle diameter of the coloring material is below about 0.2 m, and the pigment is used with a particle mill (badsmi⑴ ⑴ 刀 莩 8). The dispersant also contains a part of the entire binder resin (B). To the obtained dispersion (hereinafter referred to as a millbase), the remaining binder resin (B), photopolymerizable compound (C), and Photopolymerization initiator (D), other components used if necessary, and »additional solvent if necessary to the required concentration, to obtain the intended colored photosensitive resin composition. The colored photosensitivity of the present invention prepared in this way The resin composition can be applied to a substrate by the following operations, for example, to be light-cured and developed to form a black substrate or a colored day image. From the original element, the composition is rotated on the substrate. Dry by heating (pre-baking) to remove the solvent 'to obtain a smooth coating film ^ At this time, the thickness of the coating film is about 1 to 3 V m. The coating film obtained in this operation has a black base for forming purposes 315 150 24 200413843 Material or day image negative mask UV irradiation. At this time, the entire exposed part is uniformly irradiated with parallel light, and it is better to match the cover and the substrate at the correct position to use a device such as the cover correction. After standing, the hardened coating film is diluted with alkaline. Contact the aqueous solution, non-exposure #knife solution, and develop the target to obtain the target black substrate or day image. After the continuous reference, if necessary, from 15 to 23 (rc implementation of about 1G to 6G minutes after Wei (post-baking)). An aqueous solution of a compound and a surfactant used for development after pattern exposure. Any one of the test compounds. The developing solution is usually an alkaline and alkaline compound, which can be inorganic and organic. Lice potassium oxide, disodium hydrogen phosphate, sodium dihydrogen phosphate, + total milk & acid diammonium diammonium phosphate, potassium dihydrogen ammonium dihydrogen phosphate, sodium silicate, sodium silicate, ^ 7 & sodium potassium arsenate, Potassium carbonate, sodium carbonate, potassium bicarbonate, sodium borate, potassium borate, ammonia, etc. Specific examples of organic basic compounds J ~ liceated tetramethylammonium, 2-ethyltrimethylammonium hydroxide, monomethylamine,- > Mono-Female, Trimethylamine, Monoethylamine, Diethylamine, Ethylamine, Isopropylamine, Diyu, Bingyue Women, Ethanolamine, etc. The inorganic and organic basic compounds can be used alone or in combination of two or more types. The basic compound in the fe developer is ^ I want to have a target range of 0.01 to mass%, more preferably 0.03 to 5% by mass of the surfactant in the sensible developer solution. / 丨 a 雠 Fu preparation, non-green sub-system Any of a surfactant, an yin yin zi surfactant, or an anionic surfactant, species 0 is listed. Specific examples of polyethylene oxide alkyl # ionic surfactants can be 315 150 25 200413843 ether, polyethylene oxide Burning aryl bonds, polyethylene oxide alkyl aryl ethers, other polyethylene oxide derivatives, hydroxyethylene / hydroxypropylene block polymers, sorbitan fatty acid vinegar, polyethylene oxide sorbitol Anhydride fatty acid ester, polyethylene oxide sorbitan fatty acid vinegar, glycerin fatty acid ester, polyethylene oxide fatty acid ester, polyethylene oxide alkylamine, and the like. Specific examples of the anionic surfactant include higher alcohol sulfuric acid salts such as lauryl alcohol sodium sulfate or oleyl alcohol sodium sulfate, such as lauric sulfate β or lauric sulfuric acid sodium sulfate, such as ten Sodium trialkyl benzoate or sodium aryl aryl contanoate of dodecyl zeolite sodium. Specific examples of the cationic surfactant include stearylamine hydrochloride or lauric acid trimethylammonium amine salt or quaternary ammonium salt. These surfactants may be used alone or in combination of two or more kinds. The concentration of the surfactant in the alkaline developing solution is usually in the range of 0.001 to 10% by mass, preferably 0.05 to 8% by mass, and more preferably 0.001 to 5% by the application of the above-mentioned photosensitive resin solution. And drying. The obtained dried coating film is subjected to various operations of pattern exposure and development to obtain a daylight or black substrate equivalent to the color of the photosensitive resin composition to make the coloring material. These operations are only required to repeat the operation of the color of the filter. , To obtain a filter. That is, although the filter is usually a black substrate and three primary colors of red, green, and blue on the substrate, the light filter is used. The inventor's color photosensitive resin containing a coloring material equivalent to a specific color is used. The black base material or day pigment of this color can be obtained through the above operation. For other colors, the same operation can be performed using the colored photosensitive resin material of the present invention containing a color phase 26 315150 200413843, which can be used on the substrate. Equipped with black substrate and three primary color pixels. Once a base pixel or a black substrate is disposed on the substrate, when processing a photosensitive resin composition of other colors, the substrate of the specific color is placed on the substrate or the black substrate. The photosensitive resin composition is applied and dried. Usually, the pixels of the specific color or the black substrate are subjected to pattern exposure at an unconfigured position, and the pixels of the other colors are disposed at the exposed positions or:丨 The color-sensitive photosensitive resin composition of this matter is also applicable to any one, two, or three of the black substrate and the three primary colors. Since the black substrate as the light-shielding layer can be formed by a chromium layer or the like, it is not necessary to use the colored photosensitive resin composition of the present invention when forming a black substrate. The in-plane film thickness difference of a filter manufactured using the photosensitive liquid of the present invention is small, for example, a film thickness of 1 to 3 // m, and the in-plane film thickness difference is below 0.15 "m, and more / m or less. Therefore, the obtained filter is excellent in smoothness and transparency. When assembled into a color liquid crystal display panel, it is possible to manufacture a high-quality liquid crystal control panel with high yield. First, the above-mentioned implementation of the present invention The form is explained, but the above-mentioned embodiment of the present invention is an example. The scope of the present invention is not limited to these embodiments. The scope of the present invention is the scope of applying for a patent, and it includes the same meaning as that disclosed in the scope of the patent application. All changes within the scope. Hereinafter, the present invention will be described in more detail based on the examples, but the present invention is not limited to these examples. In the examples, the percentages and amounts shown in the content and the amount of use, if not specified The record is the quality benchmark. 315150 27 200413843 • The components used in this example are shown below, and are not shown below. (al) CI head color monitor 15: 6 ^ (a-2) C · I · Pigment purple 2 3, (b-1) binder resin: copolymer of methacrylic acid and benzyl methacrylate (fluorenyl group) The ratio of the acrylic acid unit to the benzyl methacrylate unit is a mass ratio (molar ratio) of 30 ·· 70, an acid value of 11 3, and a polystyrene-equivalent weight average molecular weight of 25,000 (Pin-1). Polymerizable compound: Dipentaerythritol hexaacrylate (KAYARAD DPHA, manufactured by Benwa Pharmaceutical Co., Ltd.) (c-2) Photopolymerizable compound: Dimethylol tricyclodecane diacrylate (Nippon Kayaku Co., Ltd.) (KAYARAD R-684 made by the company)

-(d-1)光聚合引發劑·· 2-曱基-2-嗎啉代基-1-(4-曱基苯硫基） 丙烧-1 -酿I ， （d-2)光聚合引發劑：2-苄基-2-二曱胺基-1-(4-嗎。林代基笨 基）丁烷-1 -酮 春d-3)光聚合引發劑：2,2、雙（2-氣苯基）-4,4，，5,5，-四苯基聨 二咪唑（黑金化成（股）公司製造） (d - 4 )光聚合引發剩：李戊四醇四硫代丙酸酯 (g-Ι)光聚合引發助劑：2,4-二乙基噻噸酮 (g-2)光聚合引發助劑：4,4，-雙（二乙胺基）二笨甲g同 (h)環氧化合物[鄰甲酚清漆型環氧樹脂、「史蜜環氧 ESCN-195XL-80」（住友化學工業（股）公司製造）] (f)4-經基-3-甲氧基苄叉馬來酸二乙酯溶劑 (E):丙二醇單甲醚乙酸酯 315150 28 200413843 實施例1 [著色感光性樹脂組成物之調製] 將（a-1) 6.869質量分 (a-2) 0·105質量分 2.094質量分 6.242質量分 4.162質量分 0.832質量分 0.208質量分 0.416質量分 1.040質量分 0.022質量分 聚S旨糸顏料分散劑 (b-1) (c-1) (扣3) (d-4) (g-2) (h) (f) (e) 78.000質量分 混合’獲得著色感光性樹脂組成物1。 將2英吋角之科寧公司製造# 1 737玻璃基板以中性洗 劑、水及醇之順序洗淨、乾燥。於該玻璃基板上旋轉塗覆 上述之感光性樹脂組成物丨，接著在乾淨烘箱中於i 〇〇。〇預 烘培3分鐘。冷卻後將該阻劑塗抹基板與石英玻璃製光罩 (透過率在1至1 00%範圍進行階段狀變化之圖案、具有從 1 V m至5 0 // m線/間隙圖案之光罩1及為了形成線寬3 “ m、4//m、5//m、6//m、7//m、8//m、9#m、10//m、 20 // m、30 // m、40 v m、50 // m 及 100 以 m 線狀著色圖案 之光罩2)之間隔作成1 〇 〇 V m，使用吳席電機（股）公司製造 之超高壓水銀燈’在大氣氣壓下用5〇mJ/cm2或l5〇mJ/cm2 29 315150 200413843 之曝光量進行光照射後將上述塗膜於23艺在含有非離子 系界面活性劑0.12%及氫氧化鉀〇·04%之水系顯影液浸潰 8〇秒鐘，顯影，水洗後於220°C進行20分鐘之後烘培。 (評估） 使用光罩1可形成圖案之感度為2mJ/cm2，於光罩2 隨著50mJ/cm2曝光、150mJ/cm2曝光依序遞減。 實施例2 丨著色感光性樹脂組成物之調製] 將（a-1) 6.869質量分 (a_2) 0.105 質量分 永S旨糸顏料分散劑 2 · 0 9 4質量分 (b-1) (c-1) (c-2) (d-3) μ-4) (g-2) (h) (0 (e) 6·73 1質量分 2.244質量分 1 · 1 22質量分 〇·897質量分 〇·3 3 7質量分 0.449質量分 1 · 1 22質量分 〇·〇22質量分 78·0〇〇質量分 晃合’獲得著色感光性樹脂組成物2。 (評估） 除了使用著色感光性樹脂組成物2以外，與實施例丄 同樣操作，形成圖案。使用光罩丨可形成圖案之感度為 315150 30 200413843 1 5 0 m J / c m2 曝光 3mJ/cm2，於光罩2隨著5〇mJ/cm2曝光、 依序遞減。 比較例1 [著色感光性樹脂i 將（a-1) (a-2) 聚醋糸顏料分散 (b-1) (c-1) (d_l) (g-l) (h) (e) 混合，獲得著色 L成物之調製] 6·869質量分 〇·105質量分 2·094質量分 4.644質量分 5·452質量分 1·212質量分 〇·606質量分 1.010質量分 78.000質量分 光性樹脂組成物3。 (評估） 外，與實施例 圖案之感度為 .未殘留。於 除了使用著色感光性樹脂組成物3以 同樣操作’形成圖案。使用光罩1可形成 50mJ/cm2，於光罩2在50mJ/cm2曝光圖| 15 0mJ/cm2曝光雖然形成圖案，但是角遞; 比較例2 [著色感光性樹脂組成物之調製] 將（a-1) 6.869質量分 0-2) 0.105質量分 聚酯系顏料分散劑 2.0 9 4質量分 315150 200413843 (b-1) 6.264 質量分 (c-1) 4.162 質量分 (d-3) 0.832 質量分 (d-4) 0.208 質量分 (g-2) 0.416 質量分 (h) 1.040 質量分 (e) 78.000 質量分 0昆合，獲得著色感光性樹脂組成物4。 (評估） 除了使用著色感光性樹脂組成物4以外，與實施例1 同樣操作，形成圖案。使用光罩1可形成圖案之感度為 2mJ/cm2，於光罩2隨著5OmJ/cm2曝光、1 50mJ/cm2曝光 圖案未消除。 比較例3 [著色感光性樹脂組成物之調製] 蒙（a-1) 6.869 質量分 (a-2) 0.105 質量分 聚酯系顏料分散劑 2.094 質量分 (b-1) 6.753 質量分 (c-1) 2.244 質量分 (c-2) 1.122 質量分 (d-3) 0.897 質量分 (d-4) 0.337 質量分 (g-2) 0.449 質量分 315150 200413843 1 ； 1·122質量分 (e) 78.000質量分 混合，獲得著色感光性樹脂組成物 (評估） 除了使用著色感光性樹脂組成物5以外，與 同樣操作，形成圖f。使用光罩i可形成圖案之：：：1 ,細2’於光罩2在5〇mW曝光雖然為依序遞二 疋於150mJ/cm2曝光圖案未消除。 本發明之著色感光性樹脂組成物為感度優越之組成 物’使用本發明之著色感光性樹脂組成物獲得之著色書素 圖案形狀優越。所以，將本發明之著色感光性樹脂組成物 ^[乍 ^ ·± 、， …、須料分散阻劑使用，在製作濾光片時可獲得生產性優 越且為高品質之濾光片。 315150-(d-1) Photopolymerization Initiator ·· 2-fluorenyl-2-morpholino-1- (4-fluorenylphenylthio) propane-1, 1- (1-2) photopolymerization Initiator: 2-benzyl-2-diamidoamino-1- (4- ?. linylbenzyl) butane-1 -one keto d-3) photopolymerization initiator: 2, 2, bis (2- (Phenylphenyl) -4,4,5,5, -tetraphenylphosphonium diimidazole (manufactured by Kurojin Kasei Co., Ltd.) (d-4) Photopolymerization initiation residue: Pentylenetetraol tetrathiopropionate (g-1) Photopolymerization initiation aid: 2,4-diethylthioxanthone (g-2) Photopolymerization initiation aid: 4,4, -bis (diethylamino) dibenzyl g h) Epoxy compound [o-cresol varnish-type epoxy resin, "Shimi Epoxy ESCN-195XL-80" (manufactured by Sumitomo Chemical Industries, Ltd.)] (f) 4-keto-3-methoxy Diethyl benzyl maleate solvent (E): propylene glycol monomethyl ether acetate 315150 28 200413843 Example 1 [Preparation of colored photosensitive resin composition] (a-1) 6.869 mass fraction (a-2) 0 · 105 mass fraction 2.094 mass fraction 6.242 mass fraction 4.162 mass fraction 0.832 mass fraction 0.208 mass fraction 0.416 mass fraction 1.040 mass fraction 0.022 mass fraction S Sulfur pigment dispersant (b-1) ( c-1) (Buck 3) (d-4) (g-2) (h) (f) (e) 78.000 mass parts Mixing 'to obtain a colored photosensitive resin composition 1. A 2 inch corner # 1 737 glass substrate manufactured by Corning Corporation was washed and dried in the order of neutral detergent, water and alcohol. The above-mentioned photosensitive resin composition was spin-coated on the glass substrate, and then in a clean oven at 100 ° C. 〇 Pre-bake for 3 minutes. After cooling, apply the resist to a substrate and a mask made of quartz glass (a pattern with a step change in transmittance in the range of 1 to 100%, a mask 1 with a line / gap pattern from 1 V m to 5 0 // m And in order to form a line width of 3 "m, 4 // m, 5 // m, 6 // m, 7 // m, 8 // m, 9 # m, 10 // m, 20 // m, 30 / / m, 40 vm, 50 // m, and 100 masks with m-line coloring patterns 2) to create 1000V m, using ultra-high pressure mercury lamps made by Wu Xi Electric Co., Ltd. under atmospheric pressure After light irradiation with an exposure amount of 50 mJ / cm2 or 150 mJ / cm2 29 315150 200413843, the above coating film was developed in an aqueous system containing non-ionic surfactant 0.12% and potassium hydroxide 0.04% at 23 times. The solution was immersed for 80 seconds, developed, washed with water and baked at 220 ° C for 20 minutes. (Evaluation) Sensitivity of pattern formation using photomask 1 was 2mJ / cm2, and exposure was performed at 50mJ / cm2 on photomask 2. And 150mJ / cm2 exposure decreases in order. Example 2 丨 Preparation of Colored Photosensitive Resin Composition] (a-1) 6.869 mass fraction (a_2) 0.105 mass fraction Yong S purpose pigment dispersant 2 · 0 9 4 mass Points (b-1) (c-1) (c-2) (d-3) μ-4) (g-2) (h) (0 (e) 6.73 1 mass fraction 2.244 mass fraction 1.12 22 mass fraction 897 mass fraction 0.33 7 mass fraction 0.449 Mass fraction 1 · 1 22 mass fraction 0.02 · mass fraction 78.0 000 mass fraction "was obtained to obtain a colored photosensitive resin composition 2. (Evaluation) Except that the colored photosensitive resin composition 2 was used, it was the same as in Example.丄 The same operation is used to form a pattern. The sensitivity of the pattern that can be formed using a mask is 315150 30 200413843 1 50 m J / cm 2 Exposure 3mJ / cm2, and the photomask 2 gradually decreases with 50mJ / cm2 exposure. Comparative Example 1 [Coloring photosensitive resin i (a-1) (a-2) polyacetic acid pigment dispersion (b-1) (c-1) (d_l) (gl) (h) (e) was mixed to obtain Modulation of colored L products] 6.869 mass points, 105 mass points, 2.094 mass points, 4.644 mass points, 5.452 mass points, 1.452 mass points, 1,606 mass points, 1.010 mass points, and 78.000 mass spectroscopic resin compositions. 3. (Evaluation) Except that the sensitivity of the pattern of the example is. No residue. The pattern is formed in the same manner except that the colored photosensitive resin composition 3 is used. The pattern 1 can be used to form 50 mJ / cm2. Exposure image of hood 2 at 50mJ / cm2 | 150mJ / cm2 exposure is patterned, but angularly distributed; Comparative Example 2 [Modification of colored photosensitive resin composition] (a-1) 6.869 mass points 0-2) 0.105 mass Polyester pigment dispersant 2.0 9 4 mass fraction 315 150 200413843 (b-1) 6.264 mass fraction (c-1) 4.162 mass fraction (d-3) 0.832 mass fraction (d-4) 0.208 mass fraction (g-2 ) 0.416 mass fraction (h) 1.040 mass fraction (e) 78.000 mass fraction 0 kunhe, to obtain a colored photosensitive resin composition 4. (Evaluation) A pattern was formed in the same manner as in Example 1 except that the colored photosensitive resin composition 4 was used. The sensitivity of the pattern that can be formed using the reticle 1 is 2 mJ / cm2, and the pattern is not eliminated when the reticle 2 is exposed at 50 mJ / cm2 and 150 mJ / cm2. Comparative Example 3 [Preparation of colored photosensitive resin composition] Mongolia (a-1) 6.869 mass fraction (a-2) 0.105 mass fraction polyester pigment dispersant 2.094 mass fraction (b-1) 6.753 mass fraction (c- 1) 2.244 mass points (c-2) 1.122 mass points (d-3) 0.897 mass points (d-4) 0.337 mass points (g-2) 0.449 mass points 315 150 200413843 1; 1.122 mass points (e) 78.000 The mass fractions were mixed to obtain a colored photosensitive resin composition (evaluation). The same procedure was performed except that the colored photosensitive resin composition 5 was used to form FIG. F. The pattern can be formed using the photomask i :: 1, thin 2 'and the photomask 2 are exposed at 50mW, although they are sequentially repeated. The exposure pattern is not eliminated at 150mJ / cm2. The coloring photosensitive resin composition of the present invention is a composition having excellent sensitivity 'and the coloring book element pattern obtained by using the coloring photosensitive resin composition of the present invention is excellent in shape. Therefore, by using the colored photosensitive resin composition of the present invention ^ [^^, ±, ..., a dispersing resist, it is possible to obtain a filter with excellent productivity and high quality when manufacturing a filter. 315150

Claims (1)

200413843 拾、申請專利範圍： 1 · 種者色感光性樹脂組成物，含有· 著色劑（A)、 黏合劑樹脂、 光5^合性化合物（C)、 光聚合引發劑（D)、 溶劑（E)及 修具有苄叉骨架之化合物（F)。 杜樹脂組成物，其 為具有式（I)所示部 2·如申請專利範圍第1項之著色感光 中，該具有苄叉骨架之化合物（F)係 分構造之化合物者200413843 Scope of patent application: 1 · Seed color photosensitive resin composition containing: · colorant (A), binder resin, photopolymer (C), photopolymerization initiator (D), solvent ( E) and a compound (F) having a benzylidene skeleton. Du resin composition, which has a portion represented by formula (I) 2. The compound (F) having a benzylidene skeleton is a compound having a structure as described in the color-sensitivity of item 1 of the patent application. (式中’ Q至Qj各自獨立為氫原子、羥基、碳原子數 1至θ之烷基或碳原子數i至6之烷氧基）。 3-如申請專利範圍第i項或第2項之著色感光性樹脂組成 物？、中’该具有节叉骨架之化合物⑺係為具有式(11) 所不之不飽和羧酸酯化合物者 〇(Wherein 'Q to Qj are each independently a hydrogen atom, a hydroxyl group, an alkyl group having 1 to θ carbon atoms or an alkoxy group having 1 to 6 carbon atoms). 3- If the color-sensitive photosensitive resin composition of item i or item 2 of the scope of patent application? "," The compound having a branched skeleton is a compound having an unsaturated carboxylic acid ester compound not represented by formula (11). c=c Η X II c—OQ^ (II) (式中，Q1至Q3各 獨立為氫原子、羥基、碳原子數i 315150 34 200413843 至6之烧基或碳原子數i至6之烷氧基，q4為碳原子 數1至6之烧基，X為氰基或碳原子數1至6之烷氧基 美炭基）。 4 ·如申μ專利範圍第3項之著色感光性樹脂組成物，其 中，該X係為碳原子數丨至6之烷氧基羰基者。 5·如申請專利範圍第丨項之著色感光性樹脂組成物，其 中，忒具有苄叉骨架之化合物（F)係為4_羥基曱氧基 苄叉馬來酸二乙酯者。 6·如申。月專利乾圍第i項至第5項中任何一項之著色感光 I*生树月曰、、且成物，其中，該著色感光性樹脂組成物之固體 成分量100質晉中呈古# π 1 + 里甲具有下又骨架之化合物（F)0·001至3 質量％者。 7 ·如申請專利範圍第1 、至弟6項中任何一項之著色感光 性樹脂組成物，苴中，兮,π人， /、T 5玄光聚合引發劑（D)係含有至少 一種選自由三味/f卜人斗‘ ’、口物、乙醯笨酮化合物及聯二咪。坐化 合物所成之組群及容古+ f及夕s施硫醇化合物者。 8 ·如申請專利範圍第7頊 負之者色感光性樹脂組成物，其 :’該光聚合引發劑(D)係含有聯二她合物及多官 月匕硫醇化合物者。 9·如申請專利範圍第1項 .、 貝主弟8項中任何一項之著色感光 吐Μ脂組成物，盆中， /、甲该組成物更含有光聚合引發助劑 ^ 〇 10· 一種圖案之形成方法， 1項至第9項中任何一 其特徵為：將如申請專利範圍第 項之著色感光性樹脂組成物塗抹 315150 35 200413843 在基板上，從已塗抹著色感光性樹脂組成物層除去揮發 成分，藉由光罩將從著色感光性樹脂組成物層除去揮發 成分之層曝光、顯影。 11 · 一種濾光片，其特徵為：含有以申請專利範圍第1 0項 之方法形成之圖案。 12·—種液晶顯示裝置，其特徵為：該裝置安裝有如申請專 利範圍第11項之濾光片。 雩 36 315150 柒、指定代表圖：無代表圖 (一） 本案指定代表圖為··第（ ）圖。 (二） 本代表圖之元件代表符號簡單說明： 捌、本案若有化學式時，請揭示最能顯示發明特徵的化學式：c = c Η X II c—OQ ^ (II) (wherein Q1 to Q3 are each independently a hydrogen atom, a hydroxyl group, and a carbon number i 315150 34 200413843 to 6 or an alkoxy group with a carbon number i to 6 Group, q4 is an alkyl group having 1 to 6 carbon atoms, and X is a cyano group or an alkoxymethylene group having 1 to 6 carbon atoms). 4. The colored photosensitive resin composition as claimed in item 3 of the patent, wherein the X is an alkoxycarbonyl group having 6 to 6 carbon atoms. 5. The colored photosensitive resin composition according to item 丨 of the application, wherein the compound (F) having a benzylidene skeleton is a 4-hydroxyethoxybenzylidene maleate diethyl ester. 6 · As applied. The color photosensitivity I * of any one of the items i through 5 of the patent on the dryness of the month, and the finished product, wherein the solid content of the coloring photosensitive resin composition is 100% Jinzhong Chenggu # π 1 + The compound (F) having a lower skeleton and a lower skeleton of 0.001 to 3% by mass. 7 · If the coloring photosensitive resin composition of any one of claims 1 to 6 of the scope of patent application, 苴 中, ，, π, /, T 5 Xuanguang polymerization initiator (D) contains at least one selected from the group consisting of Sanwei / f Bu Rendou ', mouthpieces, acetophenone compounds, and dianimide. Groups formed by compounds, and Ronggu + f and Xi thiol compounds. 8 · If the patent application scope is 7th, the negative-color photosensitive resin composition is: ′ The photopolymerization initiator (D) is a compound containing a didiene compound and a polythiol thiol compound. 9 · As described in the scope of application for patent No.1. The coloring composition for photosensitivity in any one of 8 items, in the pot, /, A This composition further contains a photopolymerization initiation aid ^ 〇10 · A The method for forming a pattern, any one of the items 1 to 9, is characterized in that the colored photosensitive resin composition as described in the patent application item No. 315150 35 200413843 is applied on the substrate from the colored photosensitive resin composition layer The volatile component is removed, and a layer from which the volatile component is removed from the colored photosensitive resin composition layer is exposed and developed with a photomask. 11 · An optical filter, characterized in that it contains a pattern formed by the method of item 10 of the scope of patent application. 12. A liquid crystal display device, characterized in that the device is equipped with a filter as described in item 11 of the patent application scope.雩 36 315150 指定 Designated representative map: no representative map (1) The designated representative map in this case is the () map. (2) Brief description of the element representative symbols in this representative map: 捌 If there is a chemical formula in this case, please disclose the chemical formula that can best show the characteristics of the invention: 4 3151504 315 150
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