TW200303159A - A device for exposing a face of a panel - Google Patents

A device for exposing a face of a panel Download PDF

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Publication number
TW200303159A
TW200303159A TW091132163A TW91132163A TW200303159A TW 200303159 A TW200303159 A TW 200303159A TW 091132163 A TW091132163 A TW 091132163A TW 91132163 A TW91132163 A TW 91132163A TW 200303159 A TW200303159 A TW 200303159A
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Taiwan
Prior art keywords
shutter
shutters
light source
panel
exposure
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TW091132163A
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Chinese (zh)
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TWI284784B (en
Inventor
Gilles Vibet
Manuel Cuevas
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Automa Tech Sa
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Publication of TWI284784B publication Critical patent/TWI284784B/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20Exposure; Apparatus therefor
    • G03F7/2002Exposure; Apparatus therefor with visible light or UV light, through an original having an opaque pattern on a transparent support, e.g. film printing, projection printing; by reflection of visible or UV light from an original such as a printed image
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits

Abstract

The invention provides apparatus for exposing a face (22) of a panel (20), in particular a printed circuit panel, the device including a light source (26). The device further comprising: two moving shutters (16A, 16B) suitable for masking said light source (26), each of said shutters (16A, 16B) presenting a respective edge, said (edges together) defining a window through which a light zone is generated on said face (22) of the panel (20) to be exposed; means (32) for displacing said shutters (16A, 16B) in a plane (P) lying between said light source (26) and said panel (20); and control means (34') for controlling the displacement of said shutters (16A, 16B) (in such a manner) that both shutters (16A, 16B) move past said face (22) of the panel (20) at substantially the same speed (V) and in the same direction.

Description

(i) (i)200303159 玫、發明說明 (發明說明應敘明:發明所屬之技術領域、先前技術、内容、實施方式及圖式簡單說明) 本發明有關一用以曝光一面板,特別是一印刷電路板之 _ 至少一面的裝置,本裝置包括一光源和支撐該面板面向該 β 光源的裝置。 w 上述裝置特別適合於從一面板上塗的感光性材料並以 放於面板前面的原圖製作印刷電路,該原圖傳送欲被產生 在印刷電路上之路徑。一光束適合於暴露整個面板,不是 藉由連續掃描該表面,就是藉由全部暴露此面。 Φ 通常包括一乾膜或墨水之感光材料需要接收一準確量 的光能,為了確保感光材料完整的聚合作用此光能在整個 區域是固定的’因此保證印刷電路的隶終品質。當材料曝 光不足時,後續顯影發生不良,特別是感光材料的聚合作 ^ 用是不規則的,通常導致印刷電路上的線路太細或甚至斷 , 掉;相反過度曝光的例子,重製影像的精確度是不好的, 特別是線路變得超過所要寬度,其會導致一些線路彼此接 觸,因此導致短路。 籲 為了改善生產性,特別是藉由減少曝光面板所需的總時 間,使用永遠更明亮的光源和更敏感的感光材料。然而, 上述光源只能調整一小範圍而已,其使得它需要能夠適應 > 面板曝光時間的期間越來越短。 · 再者,關掉光源需要的暫停太久了,可能長達3 0分鐘, 胃 在再次可能打開光源前,因此最好避免關掉和打開,為了 最佳化曝光裝置的生產性。因此,通常製作防備讓光源繼 續開著,並使用一快門其藉由在光源和要被曝光面之間 200303159 (2) 發明說明續頁 移動來交互關閉和打開光源。 上述裝置具有一快門作為交互遮光和不蓋住光是已知 的,因此讓光源繼續開著是可能的。 而且,感光材料的大敏感範圍,可從小於10 mJ/cnT2到大 於600 mJ/cnr2,需要調整曝光時間是相當重要的。 然而,那些裝置具有一單一快門不能夠縮短曝光時間, 其以一定程度準確的快門移位來得到。(i) (i) 200303159 Description of the invention (The description of the invention should state: the technical field to which the invention belongs, the prior art, the content, the embodiments, and the drawings.) The invention relates to a method for exposing a panel, especially a A device on at least one side of a printed circuit board. The device includes a light source and a device that supports the panel to face the beta light source. w The above device is particularly suitable for making a printed circuit from a photosensitive material coated on a panel and an original image placed in front of the panel, which conveys a path to be generated on the printed circuit. A light beam is suitable for exposing the entire panel, either by continuously scanning the surface or by fully exposing the surface. Φ A photosensitive material that usually includes a dry film or ink needs to receive an accurate amount of light energy. In order to ensure the complete polymerization of the photosensitive material, this light energy is fixed throughout the region ', thus ensuring the final quality of the printed circuit. When the material is underexposed, the subsequent development is defective, especially the cohesion of the photosensitive material is irregular, which usually causes the wiring on the printed circuit to be too thin or even broken, and the over-exposure example, on the other hand, reproduces the image. The accuracy is not good, especially when the lines become larger than the desired width, which can cause some lines to contact each other and therefore short circuits. In order to improve productivity, especially by reducing the total time required to expose the panel, use always brighter light sources and more sensitive photosensitive materials. However, the above-mentioned light source can only be adjusted to a small range, which makes it necessary to be able to adapt to the period of the panel exposure time is getting shorter and shorter. · Furthermore, the time required to turn off the light source is too long, which may be as long as 30 minutes. Before the light source may be turned on again, it is best to avoid turning off and on, in order to optimize the productivity of the exposure device. Therefore, it is common to make precautions to keep the light source on and to use a shutter that moves the light source interactively off and on by moving between the light source and the surface to be exposed. 200303159 (2) Description of the invention It is known that the above-mentioned device has a shutter for interactive shading and does not cover the light, so it is possible to keep the light source on. Moreover, the large sensitive range of photosensitive materials can be from less than 10 mJ / cnT2 to more than 600 mJ / cnr2, and it is important to adjust the exposure time. However, those devices having a single shutter cannot shorten the exposure time, which is obtained with a certain degree of accurate shutter shift.

此外,不是藉由在一平面上移動單一快門遮住光源,就 是藉由在光源周圍來回移動它。 在第一個狀況,平面快門通常進行一去和回的行程通過 光源,且首次曝光的面板區域被曝光較長時間,因為它也 是最後被遮住,其意謂著整個面的曝光是不均勻的。In addition, either the light source is blocked by moving a single shutter on a plane, or it is moved around by the light source. In the first situation, the flat shutter usually makes one go and one back travel through the light source, and the panel area exposed for the first time is exposed for a long time because it is finally blocked, which means that the entire surface is unevenly exposed of.

在第二個狀況,快門通常旋轉並需要一旋轉驅動機構, 其使得它可能得到·快的旋轉速度和短的停止時間。如此一 機構使得面板能夠均勻的曝光且使得曝光時間能夠調整 。然而,為了得到非常短的曝光時間,需要增加快門的旋 轉速度是相當重要的,特別當它們短於1秒時,其產生實 現的技術困難。由於驅動系統慣性和本裝置所接受到驅動 力的動態應力隨著旋轉速度的增加而增加。因此,為了短 曝光時間’本裝置不能滿足二次曝光間保證的重現性’不 管是就旋轉速度方面或是就快門可停止的準確性方面。 本發明的目的是提供一使得面板曝光能夠改善的裝置 ,特別當面板被一非常敏感的材料覆蓋時,該裝置使得一 非常廣範圍的曝光時間能夠實現,因此使得相同裝置能夠 200303159 (3) 使用來曝不同敏感度的材料。 能達到此目的是因為事實是本裝置包括: •第一和第二移動快門適當的連續遮住至少部分的光 源,每個快門代表一個別端,該端一起界定一視窗適合於 調整,且透過它一光區產生在要被曝光的面板之面上; •配置在光源和面板之間的平面内移動快門的移位裝 置;和In the second situation, the shutter usually rotates and requires a rotation drive mechanism, which makes it possible to obtain a fast rotation speed and a short stop time. Such a mechanism enables the panel to be exposed uniformly and the exposure time can be adjusted. However, in order to obtain a very short exposure time, it is important to increase the rotation speed of the shutter, especially when they are shorter than 1 second, which causes technical difficulties in implementation. Due to the inertia of the driving system and the dynamic stress of the driving force received by the device, the rotation speed increases as the rotation speed increases. Therefore, for a short exposure time, 'this device cannot satisfy the reproducibility guaranteed between two exposures', both in terms of the rotation speed and the accuracy in which the shutter can be stopped. The object of the present invention is to provide a device that enables improved panel exposure, especially when the panel is covered by a very sensitive material, which enables a very wide range of exposure times to be achieved, thus enabling the same device to be used in 200303159 (3) To expose materials with different sensitivities. This is achieved because the fact is that the device includes: • The first and second moving shutters properly cover at least part of the light source continuously, each shutter represents a different end, which together defines a window suitable for adjustment and passes through A light area is generated on the face of the panel to be exposed; a shifting device configured to move the shutter in a plane between the light source and the panel; and

•控制快門移位的移位控制裝置,作為要被曝光之面的 靈敏度函數並作為光源功率的函數,二個快門大體上以相 同速度並在相同方向移動通過該面板之面。 既然高功率光源在很難調整的固定功率操作,因而藉由 不同的曝光時間來改變能量層級。• A shift control device that controls the shutter shift as a function of the sensitivity of the face to be exposed and as a function of the power of the light source. The two shutters move at substantially the same speed and in the same direction through the face of the panel. Since the high-power light source operates at a fixed power that is difficult to adjust, the energy level is changed by different exposure times.

擁有二個快門使得它可能來開始和結束曝光在面板的 相同區域。藉由在相同方向並以相同速度移動快門,可保 證整個面的曝光均勻性,縱使當曝光時間是非常短時。相 似地,當使用掃描時,因為每一區相對於視窗的面積,所 以每一區接受到相同的能量,例如,第一次曝光的區域也 是第一次被遮住的區域。 針對非常敏感的材料,需要的曝光時間是非常短的,等 級為幾個十分之一秒,最好·選擇視窗的大小是小於要被曝 光板面的大小,以便藉由移動視窗通過固定面板來掃描整 個面。 相反地,針對較不敏感的材料,其較長的曝光時間可能 長達數十秒,將視窗開到最大並全面地進行整個板面的曝 200303159 (4) 光0 每個快門的移位速度貫穿要被曝光的板面最好是固定 的,但是為了最佳化生產時間,移位速度可隨移位的本性 而變4匕。Having two shutters makes it possible to start and end exposure in the same area of the panel. By moving the shutter in the same direction and at the same speed, the uniformity of exposure across the entire surface can be guaranteed, even when the exposure time is very short. Similarly, when scanning is used, because each area is relative to the area of the window, each area receives the same energy, for example, the area exposed for the first time is also the area covered for the first time. For very sensitive materials, the exposure time required is very short, the grade is a few tenths of a second, it is best to choose the size of the window to be smaller than the size of the panel to be exposed, in order to pass through the fixed panel by moving the window To scan the entire area. Conversely, for less sensitive materials, the longer exposure time may be as long as several tens of seconds. Open the window to the maximum and fully expose the entire surface. 200303159 (4) Light 0 Shift speed of each shutter The surface to be exposed is preferably fixed, but in order to optimize the production time, the displacement speed can be changed according to the nature of the displacement.

應了解當打開曝光視窗時,亦即,直到第一快門已到達 離對應所要視窗大小的第二快門一距離,第一快門的移位 速度可能高於曝光它自己期間的速度。接著在曝光期間後 ,第二快門的速度(完全相同於打開期間第一快門的移位 速度)也是大於在曝光期間第二快門的速度。 類似地,面板可能有不連續的曝光區域,在那之間二快 門可以高於曝光期間他們的速度來移位。 快門的速度可變化當面板正在被處理時(曝光之前、期 間、之後),針對每一相同形式的操作(開/關視窗、曝光 等)二快門之一具有的速度大體上相等於另一快門的速度It should be understood that when the exposure window is opened, that is, until the first shutter has reached a distance from the second shutter corresponding to the desired window size, the shift speed of the first shutter may be higher than the speed during exposure itself. Then after the exposure period, the speed of the second shutter (exactly the same as the shift speed of the first shutter during opening) is also greater than the speed of the second shutter during the exposure. Similarly, panels may have discontinuous exposure areas, between which the two shutters can shift faster than their speed during exposure. Shutter speed can be changed. While the panel is being processed (before, during, and after exposure), for each of the same operations (open / close window, exposure, etc.), one of the two shutters has a speed substantially equal to the other speed

優點是,移位裝置使得每一快門的移位速度能夠調整貫 穿它們的移位。 優點是,移位裝置包括用於第一快門的第一移位裝置和 用於第二快門的第二移位裝置。 因此,每一快門有利地連接到特定的移位裝置以便使它 可能移動一快門而不牽連另一個。二具體實施例可因此被 想像到。第一具體實施例中,快門是彼此不同的且移位時 是一起驅動的,然而在第二具體實施例中,二個快門是相 同且被移位裝置分別驅動,該裝置較佳是相同的、但指定 -9- 200303159 (5) 爹明I兒㉟續頁、 Χλ, , ^ νΐ--*· ν· r· 給每個快門。 為了能夠驅動快門快些並完全地通過要被曝光的板面 ,移位裝置是準確裝置,較佳的是線性裝置以便能夠保證 快門沿著通過面板要被曝光的路徑有一固定的移位速度。 優點是,移位裝置包括一驅動器,較佳的是一無桿氣動 驅動器。The advantage is that the shifting device enables the shifting speed of each shutter to adjust the shifting through them. The advantage is that the shifting means comprises a first shifting means for a first shutter and a second shifting means for a second shutter. Therefore, each shutter is advantageously connected to a specific shifting device so that it is possible to move one shutter without involving the other. Two specific embodiments can thus be imagined. In the first embodiment, the shutters are different from each other and are driven together when shifted. However, in the second embodiment, the two shutters are the same and are driven by the shifting device, respectively. The devices are preferably the same. , But specify -9-200303159 (5) Da Ming I ㉟ ㉟ Continued pages, χλ,, ^ νΐ-* · ν · r · For each shutter. In order to drive the shutter faster and completely through the panel to be exposed, the shifting device is an accurate device, preferably a linear device so as to ensure that the shutter has a fixed shifting speed along the path through the panel to be exposed. The advantage is that the displacement device comprises a drive, preferably a rodless pneumatic drive.

任何其他移位裝置使得快門的移位速度能夠被調整成 準確的、可信的、和重現的,例如一線性馬達。 優點是,移位控制裝置包括用於第一快門初始移位的第 一初始移位裝置和用於第二快門初始移位的第二初始移 位裝置,該第一和第二初始移位裝置是彼此獨立的並且使 得視窗大小能夠調整。 優點是,此控制裝置使得快門的移位速度能夠控制與調 整遍及所有面板製程移位裝置作用的移位。Any other shifting device enables the shifting speed of the shutter to be adjusted to be accurate, reliable, and reproducible, such as a linear motor. The advantage is that the shift control means includes a first initial shift means for a first shutter initial shift and a second initial shift means for a second shutter initial shift, the first and second initial shift means Are independent of each other and enable the window size to be adjusted. The advantage is that this control device enables the shutter speed to control and adjust the shifting effect of all panel process shifting devices.

調整視窗大小使得它可能來調整被感光材料接收的能 量大小,而不需特別對快門的移位速度起作用。因此,每 一次感光材料的敏感度改變時,可能每一次光源的功率也 變了,為了得到所要的能量大小它有能力來調整視窗大小 。這個調整只是藉由修改二個快門的移位參數來執行,所 以一單一曝光裝置可用來由任意型式的感光材料製作印 刷電路。 對於上述想像的第二具體實施例,每一快門具有它自己 的初始移位裝置。對於第一具體實施例,它的第一個差異 為視窗是打開在被曝板面之前,跟第二具體實施例相比, -10- 200303159 (6) 它需要每個快門有它自己的初始裝置。然而,它的第二個 差異為在曝光前相對第二快門將第一快門放在適當位置 ,遍及整個曝光二個被同時移位,以便初始裝置可以是共 通的。 好處是,第一移位裝置配置在第二快門上,以便第一快 門適合來相對第二快門移動。Adjusting the window size makes it possible to adjust the amount of energy received by the photosensitive material without having to specifically affect the shutter speed. Therefore, every time the sensitivity of the photosensitive material changes, the power of the light source may change every time. In order to obtain the required energy level, it has the ability to adjust the window size. This adjustment is only performed by modifying the shift parameters of the two shutters, so a single exposure device can be used to make a print circuit from any type of photosensitive material. For the second specific embodiment imagined above, each shutter has its own initial shifting means. For the first embodiment, the first difference is that the window is opened before the exposed plate surface. Compared with the second embodiment, -10- 200303159 (6) It requires each shutter to have its own initial device . However, its second difference is that the first shutter is placed in an appropriate position relative to the second shutter before the exposure, and the two are shifted simultaneously throughout the entire exposure so that the initial device can be common. The advantage is that the first shifting device is arranged on the second shutter so that the first shutter is adapted to move relative to the second shutter.

因此,第一具體實施例中,第一快門固定到第二快門, 其承載第一快門。在這個例子,第一快門代表一實體面作 為一光罩被放在第二快門前面,其也有一實體面但有一較 大開口面積,在那之前擺著第一快門。Therefore, in the first embodiment, the first shutter is fixed to the second shutter, which carries the first shutter. In this example, the first shutter represents a solid surface placed as a mask in front of the second shutter, which also has a solid surface but has a large opening area, and the first shutter is placed before that.

第一快門位置的補償決定第二次視窗的面積。第一快門 相對第二快門的移位速度是較不重要的,特別因為視窗保 持開著遠離第二快門移位前的曝光區,且可使用任何已知 裝置來實現,不論這個裝置是機械的、氣動的、或其他。 相對第二快門移動第一快門的裝置然而應以使位置能夠 準確並可重製的方式來選擇,以便保證視窗的面積可合適 地調整。 好處是,本裝置更包含一冷卻光源的裝置。 因為本光源是高功率,例如高達1 0千瓦的汞蒸氣放電燈 泡,希望要冷卻它,例如藉由循環冷空氣來消散儘可能多 的熱並避免曝光裝置的升溫,儘管光源的附近溫度可能高 於 1000°C。 當快門放在光源的前面,特別在關的位置,它接收所有 來自光源的強度。因此,為了避免熱傷害到快門和他的週 -11 - 200303159 (7) 煢照說明續頁: 汾 ** > μ * vs >·Χ{. t t <- t a </ *4. 遭(移位裝置、控制裝置等),每一快門有利地包含耐熱材 料。 因此,縱使當快門在關的位置時,保持在光源的前面同 時永久地停留,快門能夠累積大量的熱而無損傷。The compensation of the first shutter position determines the area of the second window. The shift speed of the first shutter relative to the second shutter is less important, especially because the window remains open away from the exposure area before the second shutter is shifted, and can be achieved using any known device, whether this device is mechanical , Pneumatic, or other. The device that moves the first shutter relative to the second shutter, however, should be selected in such a way that the position can be accurately and reproduced, so as to ensure that the area of the window can be adjusted appropriately. The advantage is that the device further includes a device for cooling the light source. Because this light source is high-power, such as a mercury vapor discharge bulb up to 10 kilowatts, it is desirable to cool it, such as to circulate cold air to dissipate as much heat as possible and avoid heating up the exposure device, although the temperature near the light source may be high At 1000 ° C. When the shutter is placed in front of the light source, especially in the off position, it receives all the intensity from the light source. Therefore, in order to avoid thermal damage to the shutter and his week -11-200303159 (7) 茕 According to the continuation page: Fen ** > μ * vs > · × {. Tt <-ta < / * 4. (Shutters, control devices, etc.), each shutter advantageously contains a heat-resistant material. Therefore, even when the shutter is in the off position, it remains in front of the light source and stays permanently, the shutter can accumulate a large amount of heat without damage.

此外,為了保護快門,他們最好儘可能的反射光線回去 光源。因此,每一快門有利地呈現一反射面,使它至少回 送一部份被光源發射的光。因為光源最好是有冷卻的,所 以它能夠處理被快門反射的熱。 在讀完後續具體實施例而不是限制例子的詳細說明,本 發明將更容易瞭解且它的好處將更明顯。 伴隨圖示的說明如下: 圖1是本發明曝光裝置前面的透視圖; 圖2是本發明曝光裝置後面的透視圖; 圖3是一具體實施例中快門的透視圖,二個快門彼此碰 到;In addition, to protect the shutter, they had better reflect the light back to the light source as much as possible. Therefore, each shutter advantageously presents a reflective surface, so that it returns at least a portion of the light emitted by the light source. Because the light source is preferably cooled, it can handle the heat reflected by the shutter. After reading the detailed description of the following specific embodiments rather than limiting examples, the present invention will be easier to understand and its benefits will be more apparent. The description accompanying the illustration is as follows: Fig. 1 is a perspective view of the front of the exposure apparatus of the present invention; Fig. 2 is a perspective view of the rear of the exposure apparatus of the present invention; and Fig. 3 is a perspective view of a shutter in a specific embodiment, two shutters touching each other ;

圖4是類似圖3的視圖,但二個快門是分開的; 圖5是另一具體實施例中快門的透視圖,二個快門彼此 碰到;和 圖6是類似圖4的視圖,但二個快門是分開的。 圖1所示的本發明曝光裝置包括一光箱配件1 0和一反射 器配件1 2以均勻的方式用來準直和分配被光箱配件1 0發 射的光。光箱配件1 〇和反射器配件1 2皆放在一骨架1 4上, 其固定到此曝光裝置的主結構(沒顯示)。 二個快門1 6 A和1 6 B適合來在光箱配件1 0和反射器配件 -12- 200303159 (8) 發明說明續頁 1 2之間移動,根據快門的個別位置以便遮住和/或不蓋住 光箱配件1 0。在圖1,第一快門1 6 A是在關的位置,被放 在光箱配件1 0之前,然而第二快門1 6B是在等待的位置位 於裝置的左手邊。在此結構,沒有光線離開被第一快門 1 6 A關住的光箱配件1 0。此裝置不是在做一個曝光。4 is a view similar to FIG. 3, but the two shutters are separated; FIG. 5 is a perspective view of the shutter in another specific embodiment, the two shutters are touching each other; and FIG. 6 is a view similar to FIG. 4, but two The shutters are separate. The exposure apparatus of the present invention shown in FIG. 1 includes a light box fitting 10 and a reflector fitting 12 for collimating and distributing the light emitted by the light box fitting 10 in a uniform manner. The light box accessory 10 and the reflector accessory 12 are both placed on a frame 14 which is fixed to the main structure (not shown) of the exposure device. Two shutters 1 6 A and 1 6 B are suitable to move between the light box accessory 10 and the reflector accessory -12- 200303159 (8) Description of the invention continued on page 1 2 according to the individual position of the shutter to cover and / or Do not cover the light box accessories 10. In Figure 1, the first shutter 16A is in the off position and is placed before the light box accessory 10, while the second shutter 16B is on the left-hand side of the device in the waiting position. In this structure, no light leaves the light box accessory 10 closed by the first shutter 16A. This device is not doing an exposure.

較佳地,每一快門16A (16B)包括一耐熱材料17A (17B)的 金屬強度構件,此構件被薄片金屬18A (18B)蓋住,代表一 背面的面19A (19B)(看圖2),其反射光線回到光箱1 0。 圖2表示從後面看到的曝光裝置,二個快門16A和16B如 圖1在相同相向。一面板20藉由支撐裝置21如一骨架和裝 置的主結構合作被支撐在反射器配件1 2之前,並適合來放 面板2 0的面2 2登錄到反射器配件1 2之前的光箱配件1 0。Preferably, each shutter 16A (16B) includes a metal-strength member of a heat-resistant material 17A (17B), which is covered by a sheet of metal 18A (18B) and represents a rear surface 19A (19B) (see FIG. 2). , Its reflected light returns to the light box 10. Fig. 2 shows the exposure apparatus seen from the rear, and the two shutters 16A and 16B are in the same direction as Fig. 1. A panel 20 is supported in front of the reflector fitting 12 by a supporting device 21 such as a skeleton and the main structure of the device, and is suitable for placing the face 2 of the panel 2 0 2 into the light box fitting 1 before the reflector fitting 1 2 0.

光箱配件1 0有一額外的反射器24形成一可開的後蓋,特 別為了使它容易更換光源,例如一單一管狀的燈泡2 6。一 冷卻裝置例如空調(沒顯示),藉由注入空氣通過位於靠近 光箱配件1 0 —側的内導管2 8作為冷卻光箱配件1 0。外導管 3 0位於光箱配件1 0的對面側作為排出通過光箱配件1 0的 氣流,並特別通過光源2 6,因此產生一氣流適合來移除大 量的熱。 用來移動快門1 6A和1 6B的移位裝置3 2和骨架1 4合作,以 這樣方式使得快門16A和16B能夠相對固定的骨架14移動 ,因此造成快門16A和16B來相對光箱配件10在大體平行 面板20的平面P内移動。 移位控亲彳裝置3 4連接到移位裝置3 2用來控制快門1 6 A和 -13 - 200303159 (9) 發明說明續頁 16B的一共通移位速度V,其速度遍及曝光面板20的所有 平台最好是固定的,該速度平均範圍在1 m.s·1到1.5 m.s·1 ; 移位控制裝置3 4也具有初始裝置3 6其觸發每一快門的移 位開始。 移位控制裝置34使得每一快門16A和16B能夠以一可變 的速度VD例如大於V獨立移動,在二個分別打開/關閉曝 光視窗的期間。The light box accessory 10 has an additional reflector 24 forming an openable back cover, especially to make it easy to replace the light source, such as a single tubular bulb 26. A cooling device such as an air conditioner (not shown) serves as a cooling light box fitting 10 by injecting air through an inner duct 2 8 located on the side close to the light box fitting 10. The outer duct 30 is located on the opposite side of the light box fitting 10 as the airflow exhausted through the light box fitting 10, and in particular through the light source 26, thus generating an airflow suitable for removing a large amount of heat. The shifting device 32 for moving the shutters 16A and 16B cooperates with the skeleton 14 so that the shutters 16A and 16B can be moved relative to the fixed skeleton 14, thus causing the shutters 16A and 16B to move relative to the light box accessory 10 at The plane P substantially parallel to the panel 20 is moved. The shift control device 3 4 is connected to the shift device 3 2 for controlling the shutter 1 6 A and -13-200303159 (9) Description of the invention A common shift speed V of the subsequent page 16B is provided, which extends through the speed of the exposure panel 20 All platforms are preferably fixed, with an average speed ranging from 1 ms · 1 to 1.5 ms · 1; the shift control device 34 also has an initial device 36 which triggers the start of the shift of each shutter. The shift control device 34 enables each of the shutters 16A and 16B to move independently at a variable speed VD, e.g., greater than V, during two periods when the exposure windows are opened / closed separately.

此外,位特殊執行理由,快門16A和16B的移位速度在曝 光期間最好是可變的。 不管哪個階段(打開/關閉視窗、曝光等),每個快門1 6 A 和16B具有相同速度是必須的,不是在相同時間而是在他 們分別通過相同的幾何位置,並且運用到所有相同位置, 很自然的二個快門16A和16B的速度變化超過時間,亦即從 一幾何位置到另一位置。In addition, for special execution reasons, the shift speeds of the shutters 16A and 16B are preferably variable during exposure. Regardless of the stage (opening / closing the window, exposure, etc.), it is necessary that each of the shutters 16 A and 16B have the same speed, not at the same time but at the same time they pass through the same geometric position, and apply to all the same positions, It is natural that the speed of the two shutters 16A and 16B changes over time, that is, from one geometric position to another.

圖3和4所示第一具體實施例中,快門相對彼此滑動。第 一快門16’A和第二快門16’B合作經由第一移位裝置包括滑 道32’A、一架子或任何其他已知裝置用來產生移動最好被 固定在第二快門16’B上。在此具體實施例中,移位裝置包 括:一方面,對於第一快門16’A,滑道32’A被固定到第二 快門16’B上,且被第一初始裝置36’A驅動;而另一方面, 對於第二快門16’B,第二移位裝置包括例如一固定到固定 骨架14的無桿氣動驅動器32’B,且快門16’B在第二初始裝 置36’B的驅動下在平面P内移動。 控制裝置34’連接到快門16’A和16’B分別的第一和第二 -14- 200303159 (ίο) 發明說明續頁 初始裝置36’A和36’B。圖3中,二快門16’A和16’B顯示在關 的位置,亦即沒有光線從光箱配件1 0通過(顯示於圖1和2) 到達被曝面板2 0的面2 2,該面被放置面對曝光裝置。In the first specific embodiment shown in Figs. 3 and 4, the shutters slide relative to each other. The first shutter 16'A and the second shutter 16'B cooperate via a first shifting device including a slideway 32'A, a shelf or any other known device for generating movement and is preferably fixed to the second shutter 16'B on. In this specific embodiment, the shifting device includes: on the one hand, for the first shutter 16'A, the slideway 32'A is fixed to the second shutter 16'B and is driven by the first initial device 36'A; On the other hand, for the second shutter 16'B, the second shifting device includes, for example, a rodless pneumatic actuator 32'B fixed to the fixed frame 14, and the shutter 16'B is driven by the second initial device 36'B Move down in plane P. The control device 34 'is connected to the first and second of the shutters 16'A and 16'B, respectively. 14-200303159 (ίο) Description of the Invention Continued Initial devices 36'A and 36'B. In Figure 3, the two shutters 16'A and 16'B are shown in the off position, that is, no light passes through the light box accessory 10 (shown in Figures 1 and 2) to the face 2 2 of the exposed panel 20, the face Placed facing the exposure device.

最初,第一快門16’A在含在平面P内的第一方向D1滑動 ,超過第二快門1 6 ’ B以便打開一視窗3 8的大小,作為感光 材料的函數並作為光源2 6功率的函數(顯示在圖2)。視窗 3 8是由在快門16’A和16’B的移位方向邊緣40’A和40’B,和在 橫向第二快門16’B的邊緣40’C或支撐裝置32、或本裝置的 任何其他元件所定義。第二快門16’B有一開口 42’大小和被 曝面板20的面22相當,如此當第一快門16’A完全打開時, 整個面2 2可以一次曝光時間曝完。Initially, the first shutter 16'A slides in the first direction D1 contained in the plane P, exceeding the second shutter 16'B to open a window 38, as a function of the photosensitive material and as a function of the light source 26 6 Function (shown in Figure 2). Window 38 is formed by the edges 40'A and 40'B in the direction of the shift of the shutters 16'A and 16'B, and the edge 40'C or the supporting device 32, or the device in the lateral direction of the second shutter 16'B. Defined by any other element. The second shutter 16'B has an opening 42 'which is equivalent in size to the surface 22 of the exposed panel 20, so that when the first shutter 16'A is fully opened, the entire surface 22 can be exposed in one exposure time.

因此,依據在面22上的感光材料種類,第一快門16’A打 開全部或部分以便露出視窗3 8,使得光區3 8 ’能夠產生在 面22上,藉由第二快門16’B的移位可以掃描整個表面。不 論所選的曝光種類,第一快門16’A最初相對速度V的第二 快門16’B打開到一適當間距L,亦即到圖4所示方向D 1的右 邊。 對於整個曝光在較佳為2秒的曝光時間後,或藉由掃描 一經視窗38打開來曝光,第二快門16’B如第一快門16’A以 相同速度V在相同方向D 1移動,亦即和第一快門16’A到右 邊。第二快門16’B的左邊部分因此移動前進到遮住已被曝 區38’,當視窗38在方向D1移動通過面22。 為了中斷曝光,第二快門16’B關住光箱配件10(如圖1和2 所示)。然後接著以相反方向D2從右到左進行曝光。 -15 - (11) 200303159 發嗶說电續頁 邊離開曝光區,第一快門16’A最好在第一次曝光前打 開’从便第二快門16,B用來關住光箱配件丨〇。在這樣情況 下,打開視窗38的第一快門16,A速度可以是v,不同於由二 决門16’八和Ι6,β驅動的視窗3 8的掃描速度v。 如*硯窗38向外打開曝光區,亦即脫離光源26的範圍,例 在裝置的—側,在每一曝光前視窗38可預先調整到一特 卜在每—面板22的曝光後視窗可移動離開曝光區,Therefore, depending on the type of photosensitive material on the surface 22, the first shutter 16'A is opened in whole or in part so as to expose the window 38, so that the light area 3 8 'can be generated on the surface 22 by the second shutter 16'B. Shift can scan the entire surface. Regardless of the selected exposure type, the first shutter 16'A is initially opened at a proper distance L from the second shutter 16'B at a speed V, that is, to the right of the direction D 1 shown in FIG. For the entire exposure, after an exposure time of preferably 2 seconds, or by scanning once the window 38 is opened to expose, the second shutter 16'B, like the first shutter 16'A, moves at the same speed V in the same direction D1, also That is, the first shutter 16'A to the right. The left part of the second shutter 16'B therefore moves forward to cover the exposed area 38 ', when the window 38 moves through the surface 22 in the direction D1. To interrupt the exposure, the second shutter 16'B closes the light box accessory 10 (as shown in Figs. 1 and 2). Then, exposure is performed from right to left in the opposite direction D2. -15-(11) 200303159 Beeps saying that the electrical margins leave the exposure area. The first shutter 16'A is best opened before the first exposure '. The second shutter 16 is used to close the light box accessories. 〇. In such a case, the speed A of opening the first shutter 16 of the window 38 may be v, which is different from the scanning speed v of the window 38 driven by the two gates 16 'and 16 and β. For example, the window 38 opens the exposure area outward, that is, it is out of the range of the light source 26. For example, on the side of the device, the window 38 can be adjusted to a special value before the exposure in each panel 22. Move out of the exposure area,

子見窗3 8維姓B 、寻開著遍及曝光整個面板22的曝光循環期間。只 又九源26的功率或感光材料種類時,然後需要執行 #先調整。 ° 先’整視窗38大小離開曝光區,在第二快門Μ,b上 的第〜快κ 一、The sub-window 38 has a 8-dimensional surname B and looks for an exposure cycle period that exposes the entire panel 22. When there is only the power of nine sources 26 or the type of photosensitive material, then you need to perform #first adjustment. ° First ’leave the exposure area at the size of the whole window 38, and the second ~ M on the second shutter M, b

可、 内n U’A移位速度V,可能趨近於〇,且第一快門16,A 、手動移動一所要距離乙。 予員先士 時間。 多, 例如去 田要曝光的面板2 2被放到位或當光源2 6被改變時。 圖5和6所-结一 _ 不第二具體實施例中,每一快門16A和16B通過 酉己*"ίΦ* 1 Π υ。在此具體實施例中,二快門16Α和16Β完全相 他們Sr ® 而要以相同速度移動通過光源2 6 (如圖2)。此具 施例:ίΐ7此 , 則面的具體實施例相比只是不同在快門16Α和 的相 $移位和在移位裝置。快門16Α和16Β具有承熱量的 相同性f, 、’具有一耐熱材料(沒顯示)的強度構件,並透過 主上光反4+ u 人对材料的個別滑道19A、19B來移除熱。 / JE'視® 3 8作為減少需要來曝一系列面板2 2的總 田預先調整視窗3 8大小跟其他操作平行時間減少越 光箱 同且 體實 -16- 200303159 (12) 因此’開始從關閉位置顯示於圖5,藉由例子,當第二 快門16B疋在裝置的右手邊時,第一快門ΜΑ關閉整個光箱 1 0,快門的二個別邊緣40A和40B相碰。However, the shift speed V of the internal n U′A may approach 0, and the first shutter 16, A, is manually moved a desired distance B. To the members of the sage time. Many, such as when the panel 22 to be exposed is put in place or when the light source 26 is changed. Figs. 5 and 6-In the second embodiment, each of the shutters 16A and 16B passes through 酉 * * quot Φ * 1 Π υ. In this embodiment, the two shutters 16A and 16B are completely similar to each other Sr ® and must move through the light source 2 6 at the same speed (see Fig. 2). This embodiment: As shown in FIG. 7, the specific embodiment is only different in the phase of the shutter 16A and the phase shift and the shift device. The shutters 16A and 16B have the same heat bearing capacity f, and ′ have a strength member of a heat-resistant material (not shown), and remove the heat through the main glazing to reflect the individual slideways 19A, 19B of the material to the 4+ u person. / JE 'Vision® 3 8 as a reduction of the need to expose a series of panels 2 2 total field pre-adjustment window 3 8 size parallel to other operations to reduce the time parallel to the light box same and solid -16-200303159 (12) Therefore' starting from The closed position is shown in FIG. 5. By way of example, when the second shutter 16B is on the right-hand side of the device, the first shutter MA closes the entire light box 10, and the two individual edges 40A and 40B of the shutter collide.

每一快門16A、16B固定到一對配置在快門16A、16B對面 側的無桿氣動驅動器32A、32B,以便保證每一快門16A、16B 有適當的引導。每一對無桿氣動驅動器32A、32B是由移位 控制裝置34透過第一和第二初始裝置36a*36B控制每一 對無桿氣動驅動器32A、32B。 透過例子,對於掃描式的曝光,視窗3 8被用於第一快門 16A驅動它以速度V移動到左的第一初始裝置36A打開部分 ,亦即如圖6所示在方向D2,同時保持第二快門16B固定。Each shutter 16A, 16B is fixed to a pair of rodless pneumatic actuators 32A, 32B disposed on the opposite side of the shutters 16A, 16B so as to ensure proper guidance of each shutter 16A, 16B. Each pair of rodless pneumatic actuators 32A, 32B is controlled by the displacement control device 34 through the first and second initial devices 36a * 36B. By way of example, for a scanning exposure, the window 38 is used for the first shutter 16A to drive it to move to the left opening portion of the first initial device 36A at the speed V, that is, in the direction D2 as shown in FIG. 6 while maintaining the first Two shutters 16B are fixed.

一經視窗3 8開到所要的大小’亦即一旦第一快門移動以 致距離L存在二邊緣40A和40B之間,藉由第二初始裝置36B 來讓第二快門16B移位,並開始跟著第一快門16A以相同速 度V在相同方向D2移動。視窗3 8的固定大小是根據二快門 16A和16B皆以相同速度V移動之間的間隔,因此它在方向 D2移動通過光箱配件10(顯示於圖1和2)並以速度V通過 被曝面2 2。 在通常約50 cm長行程的端點,藉由移動第二快門的 邊緣40B到固定第一快門16A的邊緣40A來關閉視窗3 8。 藉由如說明的相同方式移動快門16A和16B來進行以下 的曝光,但他們朝右邊回來,亦即在方向D 1。 為了曝整個面22 ’藉由以速度v在方向D2移動第一快門 1 6 A到左邊來將視窗3 8開到最大尺寸後,允許較佳2秒的 -17- 200303159 (13)Once the window 38 is opened to the desired size, that is, once the first shutter is moved so that the distance L exists between the two edges 40A and 40B, the second initial device 36B is used to shift the second shutter 16B and start to follow the first The shutter 16A moves at the same speed V in the same direction D2. The fixed size of window 38 is based on the interval between the two shutters 16A and 16B moving at the same speed V, so it moves in the direction D2 through the light box accessory 10 (shown in Figures 1 and 2) and passes at the speed V through the exposed surface. twenty two. The window 38 is closed at the end point of a generally approximately 50 cm long stroke by moving the edge 40B of the second shutter to the edge 40A of the fixed first shutter 16A. The following exposures are made by moving the shutters 16A and 16B in the same manner as described, but they come back to the right, that is, in the direction D1. In order to expose the entire surface 22 ′, the window 3 8 is opened to the maximum size by moving the first shutter 1 6 A to the left in the direction D2 at the speed v, allowing for a better 2 seconds -17- 200303159 (13)

梦明說:明續頁A 曝光時間消逝在二快門16Α和16Β為固定的期間。_旦時間 過去,第二快門16Β以速度V在方向D2開始移動到左邊, 直到視窗38被再關起來,當邊緣4〇B再來接觸到邊緣4〇八。 .t 不論進行曝光的形式,藉由移動視窗3 8的掃描曝光或是 .· 藉由開啟視窗3 8到最大的全體曝光,在曝面2 2的終點時維 持視窗是開著的。這樣做有能力來移動視窗3 8超過曝光區 ’亦即不論在裝置的左手邊或右手邊。 當曝光時間短於1秒時,特別建議藉由掃描亦即移動視 泰 窗38來曝面22的技術,鑒於全體曝光更適合曝光時間長達 數秒的。 本發明的目的是不論藉由掃描或是藉由全體曝光使得 曝所有面22成為可能,但是將自然了解本裝置也可用來曝 面2 2上的界定區,亦即條狀或一些其他更複雜的形狀。為 了這個目的’它有能力來提供在其他方向移動的快門或視 窗,或是提供更複雜形狀的快門。Mengming said: Ming continued on page A. The exposure time elapsed during the two shutters 16A and 16B for a fixed period. Once the time has passed, the second shutter 16B starts to move to the left at the speed V in the direction D2, until the window 38 is closed again, and when the edge 40B comes in contact with the edge 408 again. .t Regardless of the type of exposure, scanning exposure by moving window 38 or... by opening window 38 to the maximum overall exposure, maintaining the window open at the end of exposure surface 2 2. This has the ability to move the window 3 8 beyond the exposure area, that is, whether it is on the left or right hand side of the device. When the exposure time is shorter than 1 second, the technique of exposing the surface 22 by scanning, that is, moving the window 38 is particularly recommended, in view of the fact that the overall exposure is more suitable for exposure times up to several seconds. The purpose of the present invention is to make it possible to expose all surfaces 22, whether by scanning or by global exposure, but it will be naturally understood that the device can also be used to expose a defined area on the surface 22, that is, a strip or some other more complex shape. For this purpose ’it has the ability to provide shutters or windows that move in other directions, or shutters of more complex shapes.

圖式代表符號說明 10 光 箱 配 件 12 反 射 器 配件 14 骨 架 16A ’ 16B 快 門 17A, 17B 而才 熱 材 料 18A ’ 18B 薄 片 金 屬 19A, • 19B 背 面 20 面 板 21 支 撐 裝 置 -18- 200303159 (14) 22 面 24 反 射 器 26 光 源 28 内 導 管 30 外 導 管 32 移 位 裝 置 34 移 位 控 制 裝 置 36 初 始 裝 置 16,Α ,16,Β 快 門 19,Α ,19,Β 背 面 32,Α 滑 道 32Έ 驅 動 器 34, 移 位 控 制 裝 置 36,Α ,36,Β 初 始 裝 置 40,Α ,40’Β , 40’C 邊 緣 38, 視 窗 42, 開 口 32Α, ,32Β 驅 動 器 34 移 位 控 制 裝 置 36Α ,36Β 初 始 裝 置 40Α ,40Β 邊 緣 38 視 窗 Ρ 平 面 D卜 D2 方 向 L 距 離Description of Symbols for Symbols 10 Light Box Accessories 12 Reflector Accessories 14 Skeleton 16A '16B Shutters 17A, 17B and Thermal Materials 18A' 18B Sheet Metal 19A, • 19B Back 20 Panel 21 Supporting Device-18- 200303159 (14) 22 Sides 24 Reflector 26 Light source 28 Inner tube 30 Outer tube 32 Displacement device 34 Displacement control device 36 Initial device 16, A, 16, B Shutter 19, A, 19, B Back 32, A slideway 32Έ Driver 34, displacement Control device 36, A, 36, B Initial device 40, A, 40'B, 40'C edge 38, window 42, opening 32A, 32B drive 34 shift control device 36A, 36B initial device 40A, 40B edge 38 window Distance from P plane D and D2 direction L

-19--19-

Claims (1)

200303159 拾、申請專利範圍 1· 一種用以曝光一面板(20)之至少一面(22)的裝置,特別 疋印刷電路板,本裝置包括一光源(26)和支撐該面板(2〇) 面向該光源(26)的支撐裝置(21),本裝置之特徵為本裝置 更包括: •第一和第二移動快門(16A , 16B ; 16,A,16,B)適當的連續 遮住至少部分的光源(26),每個快門(ι6Α,; 16,A, 16 B)代表一個別端(4〇A,40B ; 40’A,40,B,40,C),該端 (40A ’ 40B ; 40’A,40’B,40’C)一 起界定一視窗(38)適合於 調整,且透過它一光區(38,)產生在要被曝光的面板 (20)之面(22)上; •移動快門(16A,16B ; 16’A,16’B)的移位裝置(32 ; 32A,32B ;32’A ’ 32’B),以移動配置在光源(26)和面板(20)之間的 平面(P)内之快門(16A,16B ; 16,A,16,B);及 •控制快門(16A,16B ; 16’A,16,B)移位的移位控制裝置(34 ;34’)’作為要被曝光之面(22)的靈敏度函數並作為光 源功率的函數,其方式為二個快門(16A,16B; 16,A,16,B) 大體上以相同速度(V)並在相同方向(Dl,D2)移動通過 該面板(20)之面(22)。 2 ·根據申請專利範圍第1項之裝置,其中該移位裝置(32 ; 32A,32B ; 32’A,32’B)包括用於第一快門(16A ; 16’A)的第 一移位裝置(32A ; 32,A)和用於第二快門(16B ; 16,B)的第 二移位裝置(32B ; 32,B)。 3 ·根據前述申請專利範圍任一項之裝置,其中該移位裝置 200303159 申請專利範圍續頁 包括一驅動器(32B ; 32’A,32’B)。 4 .根據前述申請專利範圍任一項之裝置,其中該移位控制 裝置(34 ; 34’)包括用於開始第一快門(16A ; 16’A)移動的 第一移位開始裝置(36A ; 36’A)和用於開始第二快門(16B ;16’B)移動的第二移位開始裝置(36B ; 36’B),該第一和 第二移位開始裝置(36A,36B ; 36’A,36’B)是彼此獨立並 使得視窗(3 8)的大小是可調整的。 5.根據前述申請專利範圍第2至4項中任一項之裝置,其中 該第一移位裝置(32A)配置在第二快門(16B)上,如此第 一快門(16A)適合於相對第二快門(16B)移動。 6 .根據前述申請專利範圍任一項之裝置,該裝置進一步包 含一冷卻裝置(28,30)用以冷卻該光源(26)。 7 .根據前述申請專利範圍任·一項之裝置,其中每一快門 (16A,16B ; 16’A,16’B)包含耐火材料(17A,17B), 8 .根據前述申請專利範圍任一項之裝置,其中每一快門 (16A,16B ; 16’A,16’B)代表一反射面(19A,19B)使得它至 少反射由光源(26)發射的一部分光。200303159 Patent application scope 1. A device for exposing at least one side (22) of a panel (20), especially a printed circuit board. The device includes a light source (26) and supports the panel (20) facing the The support device (21) of the light source (26). The feature of the device is that the device further includes: • The first and second moving shutters (16A, 16B; 16, A, 16, B) cover at least part of the appropriate continuous Light source (26), each shutter (ι6A ,; 16, A, 16 B) represents one other end (40A, 40B; 40'A, 40, B, 40, C), the end (40A '40B; 40'A, 40'B, 40'C) together define a window (38) suitable for adjustment, and a light area (38,) is generated on the surface (22) of the panel (20) to be exposed through it; • Move the shutter (16A, 16B; 16'A, 16'B) of the shifting device (32; 32A, 32B; 32'A '32'B) to move the light source (26) and panel (20) Between the shutters (16A, 16B; 16, A, 16, B) within the plane (P); and • a shift control device (34;) that controls the shift of the shutters (16A, 16B; 16'A, 16, B); 34 ')' as to be The sensitivity function of the exposed surface (22) as a function of the power of the light source is in the form of two shutters (16A, 16B; 16, A, 16, B) at substantially the same speed (V) and in the same direction (Dl, D2) Move the face (22) through the panel (20). 2. The device according to item 1 of the scope of patent application, wherein the shifting device (32; 32A, 32B; 32'A, 32'B) includes a first shift for the first shutter (16A; 16'A) Device (32A; 32, A) and a second shifting device (32B; 32, B) for a second shutter (16B; 16, B). 3. The device according to any one of the foregoing patent application scopes, wherein the shifting device 200303159 patent application scope continued pages include a driver (32B; 32'A, 32'B). 4. The device according to any one of the foregoing patent applications, wherein the shift control device (34; 34 ') includes a first shift start device (36A; for starting movement of the first shutter (16A; 16'A)); 36'A) and a second shift start device (36B; 36'B) for starting movement of a second shutter (16B; 16'B), the first and second shift start devices (36A, 36B; 36 'A, 36'B) are independent of each other and make the size of the window (38) adjustable. 5. The device according to any one of items 2 to 4 of the aforementioned patent application scope, wherein the first shifting device (32A) is disposed on the second shutter (16B), so that the first shutter (16A) is suitable for relatively The two shutters (16B) move. 6. The device according to any one of the aforementioned patent applications, the device further comprising a cooling device (28, 30) for cooling the light source (26). 7. A device according to any one of the foregoing patent applications, wherein each shutter (16A, 16B; 16'A, 16'B) contains a refractory material (17A, 17B), 8. According to any one of the foregoing patent applications Device, wherein each shutter (16A, 16B; 16'A, 16'B) represents a reflecting surface (19A, 19B) such that it reflects at least a portion of the light emitted by the light source (26).
TW091132163A 2001-10-31 2002-10-30 A device for exposing at least one face of a panel, in particular a printed circuit panel TWI284784B (en)

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FR0114114A FR2831765B1 (en) 2001-10-31 2001-10-31 DEVICE FOR INSOLATING A FACE OF A PANEL

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