TH7154C3 - Production process of titanium dioxide film containing silicon dioxide derived from rice husk. - Google Patents

Abstract

DC60 (15/06/54) The addition of MCM 41 nanomaterial, which is synthesized from silica husk or rice husk ash, to the film structure. Titanium dioxide by adding MCM 41 solution to the titanium butoxide solution in The mole ratio of MCM 41 per mole of titanium dioxide is 1 0.25-1. Stir the solution at 80 ° C for 4 days and apply the solution to film on the glass surface by dip method. Coating film preparation by this method will improve the properties of titanium dioxide film to be effective for treatment. Pollution of water and air. The addition of Nano MCM 41 material, which is synthesized from silica rice husk or rice husk ash, was added to the film structure. Titanium dioxide by adding MCM 41 strains to a solution of titanium butoxide in The mole fraction of MCM 41 per mole of titanium dioxide was 1: 0.25-1. Stir the solution at 80 ° C for 4 days and the solution was filmed on the glass surface by means of the method. Dipping, coating, film preparation by this method will improve the properties of titanium dioxide film to be effective for treatment. Water and air pollution can be:

Claims (6)

1. The production process of titanium dioxide film containing silicon dioxide from rice husk has the following steps: a. Take a silicon dioxide solution (M MCM 41) was mixed with titanium dioxide solution. B. Stir the solution obtained from the clause A at 80 ° C for 4 days in a closed system. C. Dip the solution obtained from the clause on the glass plate with a dip coating machine. That controls The coating speed is 8-15 centimeters per minute. Depends on the required film thickness prior to the dipping process. Glass plates must be washed with a solution. Sulfuric acid and hydrogen peroxide solution for 15 minutes to remove Dirt on the glass surface and this increases the surface roughness which will help make the film Stick firmly on the glass surface D. The coated film is baked at 103 ° C for 30 minutes and burned at 550 ° C for 1-5 hours depending on film thickness. 2. 1.1.3 Wash the rice husk as well. Water until the washing water has a neutral pH. Test the bottom water with litmus paper until the litmus paper doesn't change its color. 1.1.4 The husk is baked at a temperature of 100-115 degrees Celsius for 24 hours.1.1.5 The dried husk will be burned in an oven set at 500-700 degrees Celsius for a total duration of approximately 4. -6 hours depending on the quantity 1.2 Preparation of MCM 41 Jsc silica gall solution 1.2.1 Prepare CTAB solution. By dissolving 1 g of sodium hydroxide, 3 g of STA, and 150 ml of distilled water, stir to dissolve homogeneously. 1.2.2 Prepare a solution of sodium silicate. By dissolving 2 g of sodium hydroxide, 5 g of silica extracted from rice husk, depending on the purity of the extracted silica, 10 ml of distillation was stirred to homogeneously. 1.2.3 Mix the solution obtained from clauses 1.2.1 and 1.2.2 together, adjust the pH of the solution by adding 1 molar concentration of hydroloric acid until the solution has a pH of 10. With PH meter stirring, leave for 1-3 days at room temperature 1.3 Preparation of TM41 film 1.3.1 Prepare titanium solution By mixing 35 ml of titanium butoxide, 175 ml of ethyl alcohol and 10 ml of acetone, stir and leave them at room temperature for 15 minutes. MCM 41 solution prepared in clause 1.2 was mixed with titanium solution. The mole ratio of MCM 41 per mole of titanium dioxide is 1: 0.25-1, depending on the desired film transparency. 1.3.3 Stir the solution obtained in item 1.3.2 at 80 ° C for 4 days in a closed system. 1.3.4 The solution obtained in item 1.3.3 is dipped into the glass plate with a speed-controlled dip-coating machine. The coating is 8-15 centimeters per minute. Depends on required film thickness before dipping coating process The glass panels must be washed with sulfuric acid and hydrogen peroxide solution for 15 minutes to remove dirt on the glass surface and to increase surface roughness, which will help the film to adhere to the surface. Better glass. 1.3.5 The coated film was baked at 103 ° C for 30 minutes and burned at 550 ° C for 1-5 hours depending on the thickness of the film. 2. Production process of titanium dioxide film containing silicon dioxide obtained from rice husk according to claim 1, where the titanium dioxide solution is 35 ml of titanium butoxide, mix with ethyl alcohol (175) and 10 ml of acetone, stir and leave at Room temperature for 15 minutes 3. Production process of titanium dioxide film containing silicon dioxide obtained from rice husk according to claim 1, where the titanium dioxide solution is The hexadecyl tymethylammonium bromide (CTAB) compound was mixed with a stirred sodium silicate solution for 1-3 days at room temperature, adjusting the pH (pH) to have PH value (pH) 10 4. Production process of titanium dioxide film containing silicon dioxide obtained from husk according to claim 31, where hexadecyl trimethyl ammonia compounds Mbromide (CTAB) is a solution of 1 g of sodium hydroxide, 3 g of CTA B, and 150 ml of distilled water, stirred to be dissolved. 5. Production process of titanium dioxide film containing silicon dioxide obtained from rice husk according to claim 3, where the sodium silicate solution Is a solution of 2 g of sodium hydroxide mixed with 5 g of silica husk and 10 ml of distilled water. 6. Production process of titanium dioxide film containing silicon dioxide from rice husk according to claim 5, where silica husk is Rice husk that has been processed Wash and clean b. Reflux gall with hydrochloric acid at a concentration of 1-5 molar at a temperature of 50-80 ° C. C. Rinse the husk with water until the rinse water has a pH value. neutral Test the water, rinse with litmus paper until The lattice paper does not change color. D. The chaff is baked at a temperature of 100-115 degrees Celsius for 24 hours. E. The dried rice husk will be burned in an oven at 500-700 degrees Celsius. The total duration is approximately 4-6 hours depending on the quantity.