TH66590A - Multiple film-coated substrates and processes for the manufacture of such substrates. - Google Patents

Abstract

DC60 (30/10/56) Substrate with multi-layer film coating where stress Be relaxed by Added a multi-layer film composed of a metal oxide film and a silicon oxide film. On high-speed substrates by means of sputtering methods by using sputtering materials that Conductors and processes for the manufacture of such low stress multi-layer film-coated substrates are presented. A multi-layered film-coated substrate incorporating a substrate and a film. At least one metal oxide and a highly re-laminated silicon oxide film. At least once on the substrate Where at least one layer of the metal oxide film Such is the metal oxide film treated by sputtering by using metal oxide MOx as the target material. Which contains less oxygen than chemical mixtures To make The lack of oxygen is corrected. And the multi-layer film stress ranges from - 100 Mpa to + 100 Mpa substrates with multilayer film coating where the resentment Be relaxed by Added a multi-layer film composed of a metal oxide film and a silicon oxide film. On substrates at high speeds by means for plastering by using a plastering material that Conductive and process for the manufacture of multi-layer stressed film-coated substrates. Such a low has been presented. A multi-layered film-coated substrate incorporating a substrate and a film. At least one metal oxide and a highly re-laminated silicon oxide film. At least once on the substrate Where at least one layer of the metal oxide film It is a metal oxide film that has been treated by plastering using metal oxides of MOx as the target material. Which contains less oxygen than chemical mixtures To make The lack of oxygen is corrected. And the multi-layer film stress ranges from - 100 Mpa to + 100 Mpa.

Claims (1)

: DC60 (30/10/56) Substrate with multi-layer film coating where stress Be relaxed by Added a multi-layer film composed of a metal oxide film and a silicon oxide film. On high-speed substrates by means of sputtering methods by using sputtering materials that Conductors and processes for the manufacture of such low stress multi-layer film-coated substrates are presented. A multi-layered film-coated substrate incorporating a substrate and a film. At least one metal oxide and a highly re-laminated silicon oxide film. At least once on the substrate Where at least one layer of the metal oxide film Such is the metal oxide film treated by sputtering by using metal oxide MOx as the target material. Which contains less oxygen than chemical mixtures To make The lack of oxygen is corrected. And the multi-layer film stress ranges from - 100 Mpa to + 100 Mpa substrates with multilayer film coating where the resentment Be relaxed by Added a multi-layer film composed of a metal oxide film and a silicon oxide film. On substrates at high speeds by means for plastering by using a plastering material that Conductive and process for the manufacture of multi-layer stressed film-coated substrates. Such a low has been presented. A multi-layered film-coated substrate incorporating a substrate and a film. At least one metal oxide and a highly re-laminated silicon oxide film. At least once on the substrate Where at least one layer of the metal oxide film It is a metal oxide film that has been treated by plastering using metal oxides of MOx as the target material. Which contains less oxygen than chemical mixtures To make The lack of oxygen is corrected. And the multi-layer film stress ranges from - 100 Mpa to + 100 Mpa. (Section One), which will appear on the notice page: 1. Substrates with a multi-layered film include: substrates; and a number of oxide films, by metal oxide films and films Vilicon Oxides that laminate alternately and form layers. At least twenty layers, where the metal is deposited by sputtering with the target material one layer of the film. MOx metal oxides in which metal M is at least one metal selected from the group consisting of Ti, Nb, Ta, Mo, W, Zr and Hf by Mox metal oxide.