TH34401B - Cerium-based abrasives and cerium-based abrasives slurry - Google Patents

Abstract

DC60 (13/12/45) An abrasive containing cerium oxide as the main ingredient. dense The total specificity of the sludge ranges from 0.8 g/ml to 1.0 g/ml when dispersed in water as 10% by mass. The initial particle size ranges from 40 nm to 80 nm and the specific surface area in the range is 2 tables. m/g to 5 m/g The abrasive obtained like this provides a cerium-based abrasive and slurry of Cerium-based abrasives which increase the polishing speed and cause a small number of damaging scratches on the abrasive surface and achieve high quality of the polished surface. An abrasive containing cerium oxide as the main ingredient. dense The total specificity of the sludge ranges from 0.8 g/ml to 1.0 g/ml when dispersed in water as 10% by mass. It has an initial particle size in the range of 40 nm to 80 nm and a specific surface area in the range of 2 m2. /g to 5 m2/g The abrasive obtained like this provides a cerium-based abrasive and a slurry of Cerium-based abrasives which increase the polishing speed and cause a small number of damaging scratches on the abrasive surface and achieve high quality of the polished surface.

Claims (2)

1. Cerium-based abrasives containing cerium oxide as the main component. The abrasives have a total specific density of the sludge in the range of 0.8 g / ml to 1.0 g / ml when they are distributed in 10% water. The initial obtaining of the particle size was from 40 nm to 80 nm and was characterized by Specific surface areas were obtained in the range of 2m2 / g to 5m2 / g 2. Cerium-based abrasives in accordance with the characteristic claim 1. It consists of 35% Ce by mass or more, as measured in the amount of cerium oxide. 3. The slurry of a cerium-based abrasive was formed by dispersing the abrasive base. Cerium in the dispersion medium in accordance with claim 1 or 2, achieving a concentration in the range of 5% to 30% by mass 4. Concentrate of a cerium-based abrasive in accordance with claim 3. Characterized by the dispersion medium is water 5. The slurry of the cerium-based abrasive in accordance with claim 3 is characterized by the dispersion medium is an organic solvent. 6. Concentrate of a cerium-based abrasive in accordance with claim 5 is characterized by that the organic solvent consists of at least one selected from Group consisting of alcohol, polyol, acetone and tetrahydrofuran 7. fluid concentrate of a cerium-based abrasive in accordance with any of the claims 3 to 6 shown. Characteristics consisting of surfactants 8. The concentrate of a cerium-based abrasive, in accordance with claim 7, is characterized by at least one surfactant is selected from among which include Anionic surfactant and non-ionic surfactant 9. Liquid concentrate of cerium-based abrasive according to any one of Clause 8 Clause 8. Is characterized by that at least one anionic surfactant The type was selected from a group consisting of carboxylates, sulfonates, sulfates and or phosphates which have Low molecular weight or high molecular weight 1 0. The slurry of a cerium-based abrasive in accordance with any one of Clause 8 is characterized by that non-vapor surfactant Onyx, at least cheap Choose from a group consisting of polyoxymethylene alkylphenol ether. Polyoxymethylene Alkyl ether And polyoxyethylene fat acid ester 1 1. Method for polishing glass substrates using a concentrated liquid of cerium-based abrasives. In accordance with any one of Claims 3 to 10 1. 2. The process for producing glass substrates, including the process of applying the method For polishing glass substrates in accordance with claim 11.