TH135024B - Peroxide-activated formula oxomethalate formulation for removal of Residue from the bite - Google Patents
Peroxide-activated formula oxomethalate formulation for removal of Residue from the biteInfo
- Publication number
- TH135024B TH135024B TH801000687A TH0801000687A TH135024B TH 135024 B TH135024 B TH 135024B TH 801000687 A TH801000687 A TH 801000687A TH 0801000687 A TH0801000687 A TH 0801000687A TH 135024 B TH135024 B TH 135024B
- Authority
- TH
- Thailand
- Prior art keywords
- approximately
- formulation
- weight
- peroxide
- type
- Prior art date
Links
- 239000000203 mixture Substances 0.000 title claims abstract 7
- 238000009472 formulation Methods 0.000 title claims abstract 5
- 150000002978 peroxides Chemical class 0.000 title claims abstract 3
- 239000002184 metal Substances 0.000 claims abstract 5
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims abstract 4
- 238000004377 microelectronic Methods 0.000 claims abstract 3
- 238000004140 cleaning Methods 0.000 claims abstract 2
- 229910052681 coesite Inorganic materials 0.000 claims abstract 2
- 238000005260 corrosion Methods 0.000 claims abstract 2
- 229910052906 cristobalite Inorganic materials 0.000 claims abstract 2
- 239000003112 inhibitor Substances 0.000 claims abstract 2
- 230000002401 inhibitory effect Effects 0.000 claims abstract 2
- 229910052904 quartz Inorganic materials 0.000 claims abstract 2
- 239000000377 silicon dioxide Substances 0.000 claims abstract 2
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract 2
- 229910052682 stishovite Inorganic materials 0.000 claims abstract 2
- 229910052905 tridymite Inorganic materials 0.000 claims abstract 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N silicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims 1
- 150000002500 ions Chemical class 0.000 abstract 2
- 239000000356 contaminant Substances 0.000 abstract 1
- 150000004760 silicates Chemical class 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Abstract
สูตรผสมเอเควียสที่เป็นแอลคาไลน์สูงซึ่งรวมถึง (a) น้ำ,(b) อย่างน้อยที่สุดหนึ่งชนิดของเบส ที่ปราศจากไอออนโลหะที่ปริมาณเพียงพอเพื่อผลิตสูตรผสมขั้นสุดท้ายที่มี pH เป็นแอลคาไลน์, (c) ตั้งแต่ประมาณ 0.01% ถึงประมาณ 5% โดยน้ำหนัก (แสดงเป็น % SiO2) ของตัวยับยั้งการกัดกร่อน ซิลิเกทที่ปราศจากไอออนโลหะที่ละลายน้ำได้อย่างน้อยที่สุดหนึ่งชนิด;(d) ตั้งแต่ประมาณ 0.01% ถึง ประมาณ 10% โดยน้ำหนักของอย่างน้อยที่สุดหนึ่งชนิดของสารคีเลตโลหะ, และ (e) จากไม่มากกว่า 0 ถึงประมาณ 2.0% โดยน้ำหนักของอย่างน้อยที่สุดหนึ่งชนิดของออกซิเมตาเลตที่ให้ไว้ตามการ ประดิษฐ์นี้ สูตรผสมดังกล่าวรวมเข้ากับเปอร์ออกไซด์เพื่อที่ว่าทำให้เกิดเปอร์ออกซิเมตาเลตขึ้น เพื่อผลิตสารผสมทำความสะอาดไใโครอิเลกโทรนิค ที่ใช้เพื่อกำจัดสิ่งปนเปื้อนและสิ่งตกค้างจาก อุปกรณ์ไมโครอิเลกโทรนิค, เช่น ไมโครอิเลกโทรนิคซับสเตรท A highly alkaline alkaline formula, which includes (a) water, (b) at least one type of base. The metal ions are free of sufficient quantities to produce a final formulation with an alkaline pH, (c) ranging from approximately 0.01% to approximately 5% by weight (expressed as% SiO2) of the corrosion inhibitor. Dehydrated silicate of at least one soluble metal ion; (d) from approximately 0.01% to approximately 10% by weight of at least one type of metal chelate, and (e) from no more than 0. To approximately 2.0% by weight of at least one type of oximetalate provided by this invention, the formulation is combined with peroxide so that the peroximetalates are formed. To produce electronic cleaning mixtures Used to remove contaminants and residues from Micro-electronic devices, such as microelectronic substrates
Claims (1)
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TH135024B true TH135024B (en) | 2014-07-04 |
| TH135024A TH135024A (en) | 2014-07-04 |
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