SU914526A1 - Method for dissolving chalcogenide glasses - Google Patents

Description

The invention relates to microelectronics and can be used to obtain embossed microimages from chalcogenide glasses doped with a metal of the copper or thallium subgroup.

There is a method of dissolving chalcogenide glasses by treating them at 20-50 ° C with a pyrrolidine chemical reagent at the rate of 4.3-12.9 g per 1 g of chalcogenide SI glass.

The disadvantage of this method is the low dissolution rate of chalcogenide glass, and most importantly a strong dependence of speed on the structure of the film, which is influenced, in particular, by the preliminary irradiation of the film with actinic radiation.

The closest to the invention by its technical essence is the method of dissolving chalcogenide glasses by treating them with a chemical reagent — a solution of caustic soda of various concentrations at 20–50 ° C,

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which allows to dissolve chalco “genid glasses of the Az-5, Ae-5e, Az-5-5e, Az-Ze-Ce, Az-5-Ce systems and does not affect the chalcogenide glasses of these systems doped with copper or thallium metal subgroups ( 2).

The disadvantage of this method is the contamination of the treated surface of chalcogenide glass with alkali metal ions, causing the gradual destruction of the material, as well as some dissolution of doped chalcogenide glass. The latter circumstance becomes especially significant when processing chalcogenide glasses, in which the alloyed areas have micron and submicron dimensions.

The purpose of the invention is the provision

the selectivity of the dissolution of chalcogenide glasses systems Az-5,

Az-5e, Az - $ - 5e, Ae-Z-Se, Az-5e-Se

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relatively chalcogenide glasses of the same systems, alloyed with a metal subgroup of copper or thallium.

This goal is achieved by the fact that the treatment is carried out with monoethanolamine at the rate of 2-50 g per I g of chalcogenide glass.

Processing chalcogenide glasses should be carried out at 20-50 ° C. An increase in temperature above 50 ° C leads to a deterioration in the etching selectivity, and a decrease below 20 ° C sharply reduces the dissolution rate of chalcogenide glass. The need for selected ratios of reagents is justified by obtaining a dissolution time of up to 1-2 minutes when processing thin films of chalcogenide glasses with a thickness of 100-5000 A.

To provide a more uniform etching of thin films of chalcogenide glasses, their treatment can be carried out (20–90%) with an aqueous or alcoholic solution of monoethanolamine.

Example 1. A альδ ^ 5 ₃ chalcogenide agglomerate is applied as a 400 A film thickness onto a glass substrate e with a pre-deposited silver layer 2000 A thick. in the amount of up to 30 at.% depending on the duration of exposure.

The treatment is carried out at the rate of 2 g of monoethanolamine per 1 g of glass. The time of dissolution of the non-irradiated film in concentrated monoethanolamine is 18-20 s at 20 ° C (and 6 * 7 s at 50 ° C), using a 20% aqueous solution monoethanolamine dissolution time is increased to 40-45 s. The residual solvent is removed from the surface of the film from chalcogenide glass with ethyl alcohol.

Example 2. Chalcogenide glass of composition 5e, <is applied in the form of a film with a thickness of 400 A on a glass substrate with a pre-applied layer of thallium with a thickness of 2000 A. The film is irradiated with focused laser radiation (X =

4526 4

e4880 A). The time of dissolution of the non-irradiated film in concentrated monoethanolamine is 15-17 s at a solvent temperature of 20 ° C

₅ (at 50 ° С - 4-5 s). When using a 90% solution of monoethanolamine in ethyl alcohol, the dissolution time is increased to 20-22 s (solvent temperature 20 ° C). Processing

10 are based on 50 g of solvent per 1 g of chalcogenide glass.

Example 3. Chalcogenide

15 glass composition. AZZSe is applied in the form of a film with a thickness of 1600 A on a glass substrate with a preliminarily deposited layer of copper with a thickness of 2000 X. The film of chalcogenide glass is exposed through the mask with actinic electromagnetic radiation. The dissolution is carried out at the rate of 8 g of monoethanolamine per 1 g of glass. The time of dissolution of the unirradiated film in the concentrated monoethanolamine is 45–60 s at a solvent temperature of 25 ° C.

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The application of the method of dissolving chalcogenide glasses makes it possible to obtain high-quality relief images from a copper subgroup or with thallium chalcogenide glass doped with metals, which can be used as a protective coating, in particular for subsequent etching operations of the underlying metal layers. This method of selective dissolution can be used to obtain elements of integrated circuits with micron and submicron dimensions by inorganic photolithography.

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Claims (2)

Claim The method of dissolving chalcogenide ⁵⁰ glasses of the systems Az-5, Αδ-5-бе, Αδ-5ε, А5-5-Се, Az-5e-Сe by processing them with a chemical reagent at to ensure dissolution selectivity ⁵⁵ ciency relatively chalcogenide glasses these same systems, the subgroup metal doped copper or thallium, lead processing monoethanolamine IE calculation 2-50 g per 1 g of glass.