SU508974A1 - Photomask - Google Patents

Photomask

Info

Publication number
SU508974A1
SU508974A1 SU2025520A SU2025520A SU508974A1 SU 508974 A1 SU508974 A1 SU 508974A1 SU 2025520 A SU2025520 A SU 2025520A SU 2025520 A SU2025520 A SU 2025520A SU 508974 A1 SU508974 A1 SU 508974A1
Authority
SU
USSR - Soviet Union
Prior art keywords
photomask
substrate
opaque
alignment
working surface
Prior art date
Application number
SU2025520A
Other languages
Russian (ru)
Inventor
Николай Дмитриевич Корнюшин
Аркадий Хаимович Оренман
Владимир Викторович Фандеев
Original Assignee
Предприятие П/Я Р-6707
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Предприятие П/Я Р-6707 filed Critical Предприятие П/Я Р-6707
Priority to SU2025520A priority Critical patent/SU508974A1/en
Application granted granted Critical
Publication of SU508974A1 publication Critical patent/SU508974A1/en

Links

Classifications

    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P80/00—Climate change mitigation technologies for sector-wide applications
    • Y02P80/30—Reducing waste in manufacturing processes; Calculations of released waste quantities

Description

ним и тем же меткам, содержащимс  на полупроводниковой подложке, что позвол ет повысить точность совмещени .These include the same labels contained on the semiconductor substrate, which allows for improved alignment accuracy.

Claims (1)

Формула изобретени Invention Formula Фотошаблон, содержащий стекл нную подложку , на рабочей поверхности которой выполнены рисунок из маскирующего материала, непрозрачного дл  экспонирующего излучени , и базовые метки дл  совмещени  упом нутого рисунка фотошаблона с подложкой микросхемы, отличающийс  тем, что, с целью повышени  точности совмещени  и сокращени  потерь материала подложки микросхемы , на нерабочей поверхности стекл нной подложки фотошаблона напротив каждой базовой метки нанесено покрытие из материала с селективным светопропусканием, прозрачного дл  области спектра, в которой производ т совмещение, и непрозрачного дл  экспонирующего излучени .A photomask containing a glass substrate, on the working surface of which a pattern is made of a masking material that is opaque to the exposure radiation, and basic marks for combining the above-mentioned pattern of the photomask with the substrate, characterized in that, in order to improve the accuracy of alignment and reduce the loss of the substrate material microcircuits, on the non-working surface of the glass substrate of the photomask in front of each base mark there is a coating made of a material with selective light transmission, transparent for the region of the spectrum in which the alignment is made, and opaque to the exposure radiation. / // / //
SU2025520A 1974-05-05 1974-05-05 Photomask SU508974A1 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU2025520A SU508974A1 (en) 1974-05-05 1974-05-05 Photomask

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU2025520A SU508974A1 (en) 1974-05-05 1974-05-05 Photomask

Publications (1)

Publication Number Publication Date
SU508974A1 true SU508974A1 (en) 1976-03-30

Family

ID=48227830

Family Applications (1)

Application Number Title Priority Date Filing Date
SU2025520A SU508974A1 (en) 1974-05-05 1974-05-05 Photomask

Country Status (1)

Country Link
SU (1) SU508974A1 (en)

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