SU410491A1 - - Google Patents

Info

Publication number
SU410491A1
SU410491A1 SU1770558A SU1770558A SU410491A1 SU 410491 A1 SU410491 A1 SU 410491A1 SU 1770558 A SU1770558 A SU 1770558A SU 1770558 A SU1770558 A SU 1770558A SU 410491 A1 SU410491 A1 SU 410491A1
Authority
SU
USSR - Soviet Union
Prior art keywords
frequency
radiator
reflector
electrodeless
uniform
Prior art date
Application number
SU1770558A
Other languages
English (en)
Russian (ru)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to SU1770558A priority Critical patent/SU410491A1/ru
Application granted granted Critical
Publication of SU410491A1 publication Critical patent/SU410491A1/ru

Links

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
SU1770558A 1972-04-06 1972-04-06 SU410491A1 (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
SU1770558A SU410491A1 (https=) 1972-04-06 1972-04-06

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SU1770558A SU410491A1 (https=) 1972-04-06 1972-04-06

Publications (1)

Publication Number Publication Date
SU410491A1 true SU410491A1 (https=) 1974-01-05

Family

ID=20509962

Family Applications (1)

Application Number Title Priority Date Filing Date
SU1770558A SU410491A1 (https=) 1972-04-06 1972-04-06

Country Status (1)

Country Link
SU (1) SU410491A1 (https=)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4202734A1 (de) * 1992-01-31 1993-08-05 Leybold Ag Strahlungsquelle, insbesondere fuer strahlungs-induzierte aetz- und cvd-anlagen

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4202734A1 (de) * 1992-01-31 1993-08-05 Leybold Ag Strahlungsquelle, insbesondere fuer strahlungs-induzierte aetz- und cvd-anlagen

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