SU1723198A1 - Device for chemical treatment of articles - Google Patents

Abstract

The invention relates to devices for the chemical treatment of articles. The purpose of the invention is to increase productivity and simplify the design. The device for chemical processing of products includes a table 1 with brackets 2 and 3. In the bearings of which a bath 4 is installed. On the side walls of the bath 4, flexible hoses are mounted on the fittings. Bath 4 can be rotated p to align with horizontal slots. Movable covers 26 and 27 are installed in the upper part of the bath. When the processed products are lowered into the bath 4, the cassette in which they are placed receives a rotational movement.

Description

When the bath is rotated by an angle (p to the vertical in the direction of the horizontal slot, the pickling solution is pumped into the bath through the fitting from the pickling tank of the pickling solution. The excess of it is poured into the solution preparation tank through the slit. whereupon the bath 4 turns to the opposite angle p and

through the other fitting, a washing liquid is fed into the bath. After washing, the liquid is sucked off, and the rotation drive of the loading device moves the product cartridge upward for removal and disassembly. Such a device design by using a single bath reduces labor intensity, improves productivity, reduces overall dimensions and simplifies device design. 6 Il.

The invention relates to devices for the chemical treatment of products and can be used in the electronic, radio, instrument, engineering and other industries.

Known and widely used devices for the chemical treatment of products, including for degreasing, painting, etching, cleaning, etc. These devices are collectively similar to the one proposed. They contain baths (tanks), loading and unloading and transport mechanisms, each bath is designed to be filled with pumps with working fluid. Baths are installed sequentially on the technological process. Maintaining the composition, temperature, and movement parameters of the working fluid or workpieces within the specified limits is carried out directly in the working baths. The volume of baths, their design are determined by the requirements of the technological process, overall dimensions and material of the products being processed. Loading and transport mechanisms are grippers or baskets suspended on conveyors, made of materials resistant to the corresponding working fluid, with which the processed products are transferred from the bath to the bath along the technological route with a time delay of 8 each of the baths due to the technological process. .

Drum etching devices are known, consisting of a row of tanks in which perforated drums rotate. Processed products are loaded through a funnel in the first drum and then transported by a screw welded to the inner surface of the drum. The individual drums are connected to one another by rotating flanges. The drums are supported on rollers with ball bearings.

The technological process of manufacturing products using chemical etching, where high accuracy of their geometrical parameters is required, such as group etching of single-crystal silicon plates in a solution of caustic potassium (conc. 25%) in order to create a profile of elastic elements and separate the plates into crystals when producing integral energy sensor transducers parameters are determined by the relatively stringent requirements for the composition of the pickling solution and the residence time of the processed products in it, as well as a significant reduction of the time (and stability) between the transitions in the process, i.e., the time of transfer of the processed products from the pickling solution in the wash. In a number of cases, the accuracy of maintaining the temperature of the pickling solution should not be lower than 1 ° C in the range of operating temperatures of 85-105 ° C.

and the etching time accuracy should not be lower than 1 s. In known devices, these requirements are not met. In addition, the presence of rotational elements with supports directly in the working fluids

It imposes additional requirements on their protection from the environment, complicates the design and increases the size of the working baths, impairs their working conditions, and consequently, their reliability.

The disadvantages of the known devices should also include the fact that during the transportation of the processed products under the conditions of a sharply limited time, an increased consumption of pickling occurs.

liquid (lack of time for its flow) and the release of vapors of the pickling solution into the environment, and the use of a separate bath and transport mechanisms for each working solution, incl. swiveling, complicates the design and increases the size of the device.

These drawbacks are also characteristic of an etching unit containing an etching and washing bath, a bar with a rocker arm and a cassette, a mechanism for turning and raising and lowering the bar, an actuator and a control unit, in which

The pickling device has a level in the form of a telescopic stand with an adjustable rod contact electrically connected to the control unit, a turning mechanism and raising the lowering of the rod with a rocker arm and an emphasis rigidly mounted on the rocker arm with the possibility of interacting with the control device, with the turning and lifting mechanism -puskan rod completed in the form of a clutch with a carrier, Maltese cross and cam, interacting with the locking disk, fixed together with the Maltese cross on guide hollow rack.

The known device is selected as a prototype as the closest in technical essence to the proposed.

The aim of the invention is to improve the quality of manufacture of products, which consists in achieving a high accuracy of their geometrical parameters by increasing the accuracy of maintaining technological regimes, including transition time, pickling solution temperature, and reducing the change time of the working solution, as well as maintaining the constancy of the composition of the working fluids and immersion depth of the processed products, providing additional requirements of the technological process (rotation of the processed products) and simplifying the design.

This goal is achieved by the fact that in known devices for the chemical treatment of products containing a container for working fluids, including pickling solution and washing liquid, loading and unloading, and transport mechanisms, process control system, capacity, made in the form of a bath for working fluids with an inclined bottom, is mounted on a support that can be rotated around a horizontal axis at a certain angle p to the vertical. In the lower part of the bottom of the bath, at its side walls, there are nozzles, the openings of which, together with the rods moving along their axes, controlled by actuators located outside the working fluid, form supply and suction valves for the working fluid, and each are connected respectively to the pickling tank and a tank of washing liquid. There is a horizontal slit on the side wall adjacent to each nipple, connected to the tank with which the nipple adjacent to this side wall is connected, and each slit is positioned so that the horizontal plane,

passing through it, when turning the bath at an angle p in the direction of the slit, is positioned above the products processed in the bath.

One working bath provides the performance of both the etching process and the washing process, while maintaining fairly constant values of the composition, temperature, level and movement of the working fluid flow.

The loading and unloading mechanism has the possibility of limited reciprocating movement in the vertical direction and consists of two suspensions in the form of a flexible connection, for example, a continuous belt, and corresponding slots on the drive disk of the rotation of the holder of the suspensions and the driven disk of the cartridge with the workpiece, the axis which coincides with the axis of the swing bath. On the end walls of the bath there are horizontal slots connected to the suction system of gaseous products released during etching and vapors of working fluids, and on the side walls of the bath in the hinges there are rotatable controlled covers with grooves for passing the suspensions.

The etching time is reliably and accurately ensured by achieving fast filling, suction of the pickling liquid and filling with a washing liquid of the bath using reversible pumps and controllable valves. Rotation of the bath at an angle p allows you to reliably separate and circulate the pickling solution and the washing liquid, while ensuring the specified level of each liquid by draining it through its side slots into its own container. The temperature regime and composition are provided by feeding the pickling solution to the heat-insulated bath from the tank for preparing the pickling solution and circulating it in it. In the pickling fluid preparation tank, the composition and temperature of the fluid are automatically maintained within the prescribed limits. The presence of movable lids and horizontal slots in the end walls of the bath for a constant suction of the products of the discharge from the bath allows to maintain a constant mode of heat transfer, and, thus, practically does not change the temperature mode of the pickling fluid. The presence of a single working bath simplifies the design, eliminates the need for a transport mechanism, improves the conditions of its operation and reduces the overall dimensions of the installation as a whole. The arrangement of the rotational drive and the support of the group cassette with machined from

the use of suspensions from a material resistant to pickling fluid makes it easy to install and remove a group cassette with the products being processed, while ensuring its rotational movement during the execution of the technological process. The device can easily be made in fire-explosion-proof version.

FIG. 1 shows the working body of the device for chemical processing of products, a general view; in fig. 2 - the same, longitudinal section; in fig. 3 shows section A-A in FIG. 2; in fig. 4-6 schematically show the positions of the elements of the working body of the device for chemical processing of products in the process of technological transitions.

Brackets 2 and 3 are fixed on the table 1, in the bearings of which, with the help of pins, bath A is installed, which has the ability to rotate around a horizontal axis by an angle (p left and right relative to the vertical axis using an actuator (for example, pneumatic) 5 (Fig. 2), The outer walls of the bath 5 are thermally insulated. The bottom of the bath is located obliquely relative to the horizontal in the direction from one end wall to the other. In the lower part of it, in the intersection zone of the side walls 7 and 8 of the bath 4 with the end wall, two fittings 9 and 10 are welded (Fig 3) for which Flexible hoses 11 and 12 are attached. Two movable rods are installed coaxially with the openings of fittings 9 and 10 on the end wall of the bath in the guides, the lower part of which is valves 13 and 14, and the upper part is associated with the pistons in one-sided pneumatic cylinders 15 and 16, having the ability to move the water downward with compressed air. In cylinders 15 and 16, springs 17 and 18 are installed to move the pistons upwards, with no compressed air in the pneumatic cylinders 15 and 16, respectively. On the side walls 7, 8 of the bath, slots 19 and 20 are made, exiting the receivers 21 and 22, in the bottom walls of which there are nozzles with flexible rods 23 and 24. The slot 19 is made in the horizontal plane passing over the processed products 25, when the bath 4 is turned at the angle y to the left, and the slit 20 - when the bath 4 is turned at the angle p to the right. In the upper part of bath A, movable covers 26 and 27 are installed, the axes of rotation of which are located at the edges of its side surfaces and can be rotated from pneumatic (or other type) actuators 28 and 29. Each cover has two grooves 30 and 31, providing free passage

suspension 32 and 33 boot device. On each of the end walls of the bath there are grooves 34 and 35, which are connected through collectors 36 and 37 and flexible rods 38 and 39.

with a suction system for gaseous products released during the process. A group cassette 40 in which the workpieces 25 are fixed, for example silicon wafers for

0 manufacturing semiconductor integrated microdevices with their anisotropic chemical etching, when performing a technological process, has the ability to rotate around its

5 axis with a certain speed. The group cassette 40 consists of two disks 41 and their connecting rods 42, in which the workpiece 25 is fixed. The disks 41 serve simultaneously as carriers

0 structural elements and provide rotational movement of the cassette using a flexible connection - suspensions 32 and 33, for which V-shaped grooves (when applied as a flexible connection of belts) or a tooth (when used as flexible communication chains). The rotational drive of the loading device 43 is located at a certain distance from the bath 4 of the track, providing sufficient convenience in operating the installation, and has the possibility of limited reciprocating movement in the vertical direction. On the rotational drive disks

5, the loading device 44 and (45) also have V-shaped grooves (or teeth) that transmit the movement to the suspensions 32 and 33. To keep the suspensions from falling out on the drive case of the loading device, peaks 46 are installed. The partition 47 is located at the end wall of the bath 4 and valves 13 and 14 to limit the movement of the cluster cassette 40 in the working zone of the bath 4. The partition 48

5 is installed in the lower part of the bath 4 at its end wall and valves 13 and 14 and provides the desired direction of flow of the working fluid. The bath 4 is connected through a fitting 9 and a hose 11 by means of a reversible pump 49 with a storage tank and providing the set parameters of the pickling solution; fitting THAT of the bath 4 through a hose 12 is connected by means of a reverse pump with a storage tank and providing the specified parameters of denounced water.

The operation of the device is as follows.

Prepared pickling solution of a given concentration, for example 25% KOH. poured into the storage tank and the depreciation of the specified parameters of the etching solution, where it is heated to a certain temperature, which is then automatically maintained during the operation of the installation with an accuracy of ± 1 ° C. Deionized water is poured into the storage tank and to provide the predetermined parameters of deionized water. On the control panel, set the values of the process parameters. A suction system is included, which, through flexible hoses 38 and 39, collectors 36 and 37, and slots 34 and 35 remove gaseous products released during the etching process. The products to be treated, for example, round silicon plates 25, are installed in the corresponding grooves of the rods 42, which are fixed in the disks 41, i.e. form a group cassette 40.

The working parts of the device are in the initial position (Fig. 4-a). Manually group the cassette 40 using V-shaped grooves (or teeth) on the disks 41 is installed in the suspension 32 and 33. At the command of the operator begins the automatic process of the operation. The rotational drive of the loading device 43 moves down (Fig. 4-6), inserts the group cassette 40 into the bath 4, positioning it in the working area bounded by the side walls 7 and 8, the end wall and the partition 48, and excluding its contact with the latter, when this ensures the coincidence of the axis of rotation of the bath 4 in the brackets 2 and

3, mounted on the table 1, with the axis of rotation of the group cassette 40. Next, when actuating the actuators, the pneumatic actuators 28 and 29 close the covers 26 and 27 with the slots 30 and 31, ensuring the passage of the suspensions 32 and 33 free without jamming (Fig. 4B). The rotational drive of the loading device 43 is turned on (Fig. 4-g), the e.V-shaped grooves (or teeth x) of the disks 44 and 45 are mounted with the suspensions 32 and 33. Thus, the rotation is transmitted to the group cassette 40, ensuring the requirements of the process. At the same time, air is released from the pneumatic cylinder 15, under the action of the spring 15, the valve opens the passage to the pickling solution in the bath

4, the pickling solution supply pump 49 is turned on through the hose 11 at the maximum flow rate until a float gauge command (not shown) is received that is adjusted to the level of the workpiece to cut off the pickling solution. Having received the command of the air sensor, the pump 49 switches to the feeding mode of the pickling solution, ensuring the maintenance of its technological parameters, including composition, temperature and level.

An excess of the pickling solution through the slit 19 is discharged into the receiver 21 and then through the fitting with the flexible hose 23 into the preparation tank of the pickling solution. Constructions

the end walls and walls 6-8 of bath 4 provides sufficient heat insulation and, in combination with the optimal consumption of the pickling solution, stably maintains its temperature regime. Partition 48

profiled so as to ensure uniform velocity of the fluid at various points in the working zone of the bath. After a predetermined time has elapsed, the pump 49 switches to the reverse mode (Fig. 5-a) and

pumps the pickling solution into the appropriate tank. Upon completion of pumping the pickling solution (Fig. 5-6), the valve 13 under the action of compressed air in the pneumatic cylinder 15 closes the opening of the fitting 9, the actuator 5 turns the bath 4 to the right by an angle p to the vertical axis. Then (Fig. 5-c) air is discharged from the pneumatic cylinder 16; under the action of the spring 18, the valve 14 opens a hole in the nozzle 10 for supplying deionized water, which is pumped through the hose 12 into the bath 4-in the maximum flow mode before receiving a command from the float gauge (not shown) adjusted to the level of the treated parts with deionized water . Having received the command of the air sensor, the pump goes to work. In the mode of supplying deionized water, providing sufficient quality

washing the processed products. The excess deionized water through the slit 20 is discharged into the receiver 22 and then through a fitting with a flexible hose 24 - into the deionized water preparation tank. After the set time has elapsed, the pump switches to the reverse mode (Fig. 5-g) and pumps the deionized water from the bath 4 to the corresponding tank. At the end of this process, compressed air is supplied to cylinder 16

(Fig. 6-a) and the valve 14 Locks the opening of the fitting 10, the rotation of the disks 44 and 45 of the drive of the rotation of the loading device 43 and, accordingly, the rotation of the group cartridge 40 with the processed

details 25. At the same time using the pneumatic (or other) drive 28 and 29 of the roof-. The ki 26 and 27 rotate to the Open position, and with the aid of the actuator 5, the bath 4 is turned to the left by an angle p to the vertical axis. The rotational drive of the loading device 43 is then moved upwards (Fig. 6-6), the group cassette 40 with the processed articles 25 is removed from the suspensions 32 and 33, which in turn

are kept from falling by peaks 46 and 47, and are placed on the operator's table for dismantling and quality control of the etched operation performed.

To process the next batch of products, the process is repeated.

The use of the proposed device will make it possible to more efficiently carry out the precision process of chemical processing of products from both metals and nonmetals, significantly increase the percentage of usable products, reduce the laboriousness of manufacturing devices, their consumption of materials, size and improve their operating conditions. A preliminary calculation of the technical and economic efficiency obtained from the use of the proposed device in the anisotropic chemical etching of silicon wafers for the production of semiconductor microdevices showed that the unit cost per unit reduced almost 2.2 times by taking advantage of the proposed device.

Claims (1)

Claims An apparatus for the chemical treatment of products, comprising a bath for working solutions with a sloping bottom, tanks for preparing and maintaining specified parameters of the working solutions, a unloading-loading mechanism and a control unit characterized in that. in order to increase productivity and simplify the design, it equipped with fittings mounted in the lower part of the bath at the side walls, with rods installed with the possibility of interaction with the openings of the fittings during reciprocating movement, while the loading and unloading mechanism is made in the form of two flexible closed suspensions with drive disks and a removable cassette with driven disks, mounted with the possibility of in the vertical plane, with the upper side walls of the bath adjacent to each fitting having a horizontal slot for connecting to the corresponding tank, and the bath being installed with turning possibility. 2f Rie. Z Fig.Z