SG89328A1 - Gas delivery metering tube - Google Patents

Gas delivery metering tube

Info

Publication number
SG89328A1
SG89328A1 SG200002705A SG200002705A SG89328A1 SG 89328 A1 SG89328 A1 SG 89328A1 SG 200002705 A SG200002705 A SG 200002705A SG 200002705 A SG200002705 A SG 200002705A SG 89328 A1 SG89328 A1 SG 89328A1
Authority
SG
Singapore
Prior art keywords
gas delivery
metering tube
delivery metering
tube
gas
Prior art date
Application number
SG200002705A
Inventor
Ingle Nitin
Neil Stoddard D
Yao Jack
Hamilton Shawn
Original Assignee
Silicon Valley Group Thermal
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Silicon Valley Group Thermal filed Critical Silicon Valley Group Thermal
Publication of SG89328A1 publication Critical patent/SG89328A1/en

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3244—Gas supply means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01F—MEASURING VOLUME, VOLUME FLOW, MASS FLOW OR LIQUID LEVEL; METERING BY VOLUME
    • G01F1/00—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow
    • G01F1/05—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects
    • G01F1/34—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure
    • G01F1/36—Measuring the volume flow or mass flow of fluid or fluent solid material wherein the fluid passes through a meter in a continuous flow by using mechanical effects by measuring pressure or differential pressure the pressure or differential pressure being created by the use of flow constriction
    • G01F1/40—Details of construction of the flow constriction devices
    • G01F1/42—Orifices or nozzles
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05D—SYSTEMS FOR CONTROLLING OR REGULATING NON-ELECTRIC VARIABLES
    • G05D7/00—Control of flow
    • G05D7/01—Control of flow without auxiliary power
    • G05D7/0186—Control of flow without auxiliary power without moving parts
SG200002705A 1999-05-21 2000-05-16 Gas delivery metering tube SG89328A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US13535899P 1999-05-21 1999-05-21
US47044699A 1999-12-22 1999-12-22

Publications (1)

Publication Number Publication Date
SG89328A1 true SG89328A1 (en) 2002-06-18

Family

ID=26833237

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200002705A SG89328A1 (en) 1999-05-21 2000-05-16 Gas delivery metering tube

Country Status (8)

Country Link
EP (1) EP1054311B1 (en)
JP (1) JP3612002B2 (en)
KR (1) KR100441293B1 (en)
CN (1) CN1109129C (en)
CA (1) CA2308758A1 (en)
DE (1) DE60004290T2 (en)
SG (1) SG89328A1 (en)
TW (1) TW452635B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI287587B (en) * 2001-08-24 2007-10-01 Asml Us Inc Protective shield and system for gas distribution
JP3957549B2 (en) * 2002-04-05 2007-08-15 株式会社日立国際電気 Substrate processing equipment
KR100829327B1 (en) 2002-04-05 2008-05-13 가부시키가이샤 히다치 고쿠사이 덴키 Substrate processing apparatus and reaction tube
JP5008252B2 (en) * 2004-05-18 2012-08-22 パナソニック株式会社 Liquid fuel container for fuel cell and fuel cell system
JP4775641B2 (en) * 2006-05-23 2011-09-21 株式会社島津製作所 Gas introduction device
CN102586739A (en) * 2012-03-14 2012-07-18 无锡康力电子有限公司 Gas-distributing system for vacuum coating
CN103510045A (en) * 2012-06-29 2014-01-15 深圳富泰宏精密工业有限公司 Gas pipe for vacuum coating and vacuum coating device applying gas pipe
EA029037B1 (en) * 2013-02-14 2018-01-31 Алльянс Магнезиум HYDROGEN GAS DIFFUSION ANODE ARRANGEMENT PRODUCING HCl
CN104167345B (en) * 2013-05-17 2016-08-24 中微半导体设备(上海)有限公司 Plasma treatment appts and air transporting arrangement, gas switching method
CN104451583B (en) 2015-01-05 2017-05-10 合肥京东方显示光源有限公司 Magnetron sputtering vacuum chamber air inlet device and magnetron sputtering device
JP6549903B2 (en) * 2015-05-27 2019-07-24 Ｄｏｗａサーモテック株式会社 Deposition apparatus for Si-containing DLC film
JP6509104B2 (en) * 2015-09-30 2019-05-08 東京エレクトロン株式会社 Substrate liquid processing system
CN109306458A (en) * 2018-12-16 2019-02-05 湖南玉丰真空科学技术有限公司 A kind of even device of air of sputter cathode
CN115354303B (en) * 2022-08-25 2024-01-19 拓荆科技(上海)有限公司 Reaction chamber device

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4369031A (en) * 1981-09-15 1983-01-18 Thermco Products Corporation Gas control system for chemical vapor deposition system
US5683516A (en) * 1994-07-18 1997-11-04 Watkins-Johnson Co. Single body injector and method for delivering gases to a surface
US5849088A (en) * 1998-01-16 1998-12-15 Watkins-Johnson Company Free floating shield

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6137969A (en) * 1984-07-31 1986-02-22 Canon Inc Plasma cvd device for manufacturing thin film
US4834020A (en) * 1987-12-04 1989-05-30 Watkins-Johnson Company Atmospheric pressure chemical vapor deposition apparatus
KR100276093B1 (en) * 1992-10-19 2000-12-15 히가시 데쓰로 Plasma etching system

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4369031A (en) * 1981-09-15 1983-01-18 Thermco Products Corporation Gas control system for chemical vapor deposition system
US5683516A (en) * 1994-07-18 1997-11-04 Watkins-Johnson Co. Single body injector and method for delivering gases to a surface
US5849088A (en) * 1998-01-16 1998-12-15 Watkins-Johnson Company Free floating shield

Also Published As

Publication number Publication date
JP2001026874A (en) 2001-01-30
DE60004290D1 (en) 2003-09-11
CN1109129C (en) 2003-05-21
DE60004290T2 (en) 2004-07-01
EP1054311A1 (en) 2000-11-22
JP3612002B2 (en) 2005-01-19
EP1054311B1 (en) 2003-08-06
KR20010087091A (en) 2001-09-15
KR100441293B1 (en) 2004-07-23
CA2308758A1 (en) 2000-11-21
CN1274823A (en) 2000-11-29
TW452635B (en) 2001-09-01

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