SG81248A1 - Photoimageable compositions for improved adhesion and processing times - Google Patents

Photoimageable compositions for improved adhesion and processing times

Info

Publication number
SG81248A1
SG81248A1 SG9804130A SG1998004130A SG81248A1 SG 81248 A1 SG81248 A1 SG 81248A1 SG 9804130 A SG9804130 A SG 9804130A SG 1998004130 A SG1998004130 A SG 1998004130A SG 81248 A1 SG81248 A1 SG 81248A1
Authority
SG
Singapore
Prior art keywords
processing times
improved adhesion
photoimageable compositions
photoimageable
compositions
Prior art date
Application number
SG9804130A
Other languages
English (en)
Inventor
E Lundy Daniel
Barr Robert
Original Assignee
Nichigo Morton Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichigo Morton Co Ltd filed Critical Nichigo Morton Co Ltd
Publication of SG81248A1 publication Critical patent/SG81248A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Inorganic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials For Photolithography (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Polymerisation Methods In General (AREA)
SG9804130A 1997-12-01 1998-10-08 Photoimageable compositions for improved adhesion and processing times SG81248A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US98219997A 1997-12-01 1997-12-01

Publications (1)

Publication Number Publication Date
SG81248A1 true SG81248A1 (en) 2001-06-19

Family

ID=25528930

Family Applications (1)

Application Number Title Priority Date Filing Date
SG9804130A SG81248A1 (en) 1997-12-01 1998-10-08 Photoimageable compositions for improved adhesion and processing times

Country Status (7)

Country Link
EP (1) EP0919872A3 (ja)
JP (1) JPH11231527A (ja)
KR (1) KR19990062602A (ja)
CN (1) CN1218918A (ja)
CA (1) CA2249697A1 (ja)
IL (1) IL126887A0 (ja)
SG (1) SG81248A1 (ja)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4516412B2 (ja) * 2004-11-18 2010-08-04 サカタインクス株式会社 顔料分散レジスト組成物
JP2007101863A (ja) * 2005-10-04 2007-04-19 Hitachi Chem Co Ltd 感光性樹脂組成物、感光性エレメント、レジストパターンの製造法及びプリント配線板の製造法
JPWO2014200028A1 (ja) * 2013-06-14 2017-02-23 日立化成株式会社 感光性樹脂組成物、感光性エレメント、サンドブラスト用マスク材、及び被処理体の表面加工方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0624825A2 (en) * 1993-05-10 1994-11-17 PT Sub, Inc. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
EP0738927A2 (en) * 1995-04-19 1996-10-23 Hitachi Chemical Company, Ltd. Photosensitive resin composition and photosensitive element using the same

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3905815A (en) * 1971-12-17 1975-09-16 Minnesota Mining & Mfg Photopolymerizable sheet material with diazo resin layer
JPS57123211A (en) * 1981-01-26 1982-07-31 Dainippon Ink & Chem Inc Unsaturated polyester resin composition
GB2237277A (en) * 1989-10-26 1991-05-01 Ici Plc Thixotropic binder system
US5234970A (en) * 1991-07-16 1993-08-10 W. R. Grace & Co.-Conn. Dual curing composition based on isocyanate trimer and use thereof

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0624825A2 (en) * 1993-05-10 1994-11-17 PT Sub, Inc. Photosensitive polymer composition for flexographic printing plates processable in aqueous media
EP0738927A2 (en) * 1995-04-19 1996-10-23 Hitachi Chemical Company, Ltd. Photosensitive resin composition and photosensitive element using the same

Also Published As

Publication number Publication date
JPH11231527A (ja) 1999-08-27
KR19990062602A (ko) 1999-07-26
EP0919872A2 (en) 1999-06-02
EP0919872A3 (en) 2000-05-24
IL126887A0 (en) 1999-09-22
CA2249697A1 (en) 1999-06-01
CN1218918A (zh) 1999-06-09

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