SG55379A1 - Dielectric composition and integrated circuit device - Google Patents
Dielectric composition and integrated circuit deviceInfo
- Publication number
- SG55379A1 SG55379A1 SG1997003477A SG1997003477A SG55379A1 SG 55379 A1 SG55379 A1 SG 55379A1 SG 1997003477 A SG1997003477 A SG 1997003477A SG 1997003477 A SG1997003477 A SG 1997003477A SG 55379 A1 SG55379 A1 SG 55379A1
- Authority
- SG
- Singapore
- Prior art keywords
- integrated circuit
- circuit device
- dielectric composition
- dielectric
- composition
- Prior art date
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Formation Of Insulating Films (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US73913596A | 1996-10-28 | 1996-10-28 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG55379A1 true SG55379A1 (en) | 1998-12-21 |
Family
ID=24970981
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG1997003477A SG55379A1 (en) | 1996-10-28 | 1997-09-20 | Dielectric composition and integrated circuit device |
Country Status (4)
Country | Link |
---|---|
JP (1) | JPH10135199A (en) |
KR (1) | KR19980032200A (en) |
SG (1) | SG55379A1 (en) |
TW (1) | TW359018B (en) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4998040B2 (en) * | 2007-03-27 | 2012-08-15 | Jsr株式会社 | Polyamic acid imidized polymer insulating film, film-forming composition and production method thereof |
JPWO2022162895A1 (en) * | 2021-01-29 | 2022-08-04 |
-
1997
- 1997-06-30 KR KR1019970029755A patent/KR19980032200A/en not_active Application Discontinuation
- 1997-09-20 SG SG1997003477A patent/SG55379A1/en unknown
- 1997-09-24 JP JP9258163A patent/JPH10135199A/en active Pending
- 1997-11-22 TW TW086115871A patent/TW359018B/en active
Also Published As
Publication number | Publication date |
---|---|
TW359018B (en) | 1999-05-21 |
JPH10135199A (en) | 1998-05-22 |
KR19980032200A (en) | 1998-07-25 |
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