SG187763A1 - Adhesive composition comprising aromatic polyether derivative - Google Patents
Adhesive composition comprising aromatic polyether derivative Download PDFInfo
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- SG187763A1 SG187763A1 SG2013009444A SG2013009444A SG187763A1 SG 187763 A1 SG187763 A1 SG 187763A1 SG 2013009444 A SG2013009444 A SG 2013009444A SG 2013009444 A SG2013009444 A SG 2013009444A SG 187763 A1 SG187763 A1 SG 187763A1
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- SG
- Singapore
- Prior art keywords
- group
- adhesive composition
- formula
- composition according
- polymer
- Prior art date
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- 239000000853 adhesive Substances 0.000 title claims abstract description 101
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 101
- 239000000203 mixture Substances 0.000 title claims abstract description 97
- 229920000570 polyether Polymers 0.000 title abstract description 42
- 239000004721 Polyphenylene oxide Substances 0.000 title abstract description 36
- 125000003118 aryl group Chemical group 0.000 title description 65
- 229920000642 polymer Polymers 0.000 claims abstract description 60
- 125000000732 arylene group Chemical group 0.000 claims abstract description 34
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 30
- 239000012790 adhesive layer Substances 0.000 claims abstract description 21
- 125000001424 substituent group Chemical group 0.000 claims abstract description 18
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 16
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims abstract description 13
- 229920001577 copolymer Polymers 0.000 claims abstract description 11
- 125000004653 anthracenylene group Chemical group 0.000 claims abstract description 6
- 125000004957 naphthylene group Chemical group 0.000 claims abstract description 6
- 229920001519 homopolymer Polymers 0.000 claims abstract description 5
- 229920005989 resin Polymers 0.000 claims description 39
- 239000011347 resin Substances 0.000 claims description 39
- 125000000217 alkyl group Chemical group 0.000 claims description 20
- 239000000758 substrate Substances 0.000 claims description 19
- 239000004971 Cross linker Substances 0.000 claims description 17
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 16
- 229910052710 silicon Inorganic materials 0.000 claims description 16
- 239000010703 silicon Substances 0.000 claims description 16
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 15
- 125000002252 acyl group Chemical group 0.000 claims description 14
- 125000004423 acyloxy group Chemical group 0.000 claims description 14
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 13
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 11
- 125000003277 amino group Chemical group 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 10
- 125000005336 allyloxy group Chemical group 0.000 claims description 9
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 9
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims description 7
- 239000000919 ceramic Substances 0.000 claims description 3
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 2
- -1 sulphonyl group Chemical group 0.000 abstract description 185
- 238000000034 method Methods 0.000 abstract description 20
- 239000011248 coating agent Substances 0.000 abstract description 15
- 238000000576 coating method Methods 0.000 abstract description 15
- 239000003960 organic solvent Substances 0.000 abstract description 7
- 229910052751 metal Inorganic materials 0.000 abstract description 6
- 239000002184 metal Substances 0.000 abstract description 6
- 238000009792 diffusion process Methods 0.000 abstract description 5
- 238000002411 thermogravimetry Methods 0.000 abstract description 4
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 66
- 230000015572 biosynthetic process Effects 0.000 description 61
- 238000003786 synthesis reaction Methods 0.000 description 61
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 58
- 230000000052 comparative effect Effects 0.000 description 37
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 35
- 239000000706 filtrate Substances 0.000 description 22
- 239000011259 mixed solution Substances 0.000 description 22
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 22
- 239000007787 solid Substances 0.000 description 22
- 150000001875 compounds Chemical class 0.000 description 21
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 20
- 229920005649 polyetherethersulfone Polymers 0.000 description 17
- 239000004696 Poly ether ether ketone Substances 0.000 description 14
- 229920002530 polyetherether ketone Polymers 0.000 description 14
- 239000004793 Polystyrene Substances 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 229920002223 polystyrene Polymers 0.000 description 13
- 238000004458 analytical method Methods 0.000 description 12
- 238000006243 chemical reaction Methods 0.000 description 12
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 12
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N nitrogen Substances N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 11
- 229910000027 potassium carbonate Inorganic materials 0.000 description 11
- 239000002244 precipitate Substances 0.000 description 11
- 238000000746 purification Methods 0.000 description 11
- 238000010992 reflux Methods 0.000 description 11
- 238000001226 reprecipitation Methods 0.000 description 11
- 238000003756 stirring Methods 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000004925 Acrylic resin Substances 0.000 description 10
- 229920000178 Acrylic resin Polymers 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 10
- 238000004132 cross linking Methods 0.000 description 9
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 9
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 8
- 229920003270 Cymel® Polymers 0.000 description 8
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 8
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- 238000004528 spin coating Methods 0.000 description 8
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 6
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 6
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 6
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 238000003475 lamination Methods 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 6
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 description 5
- PFSUALBMVZDPBQ-UHFFFAOYSA-N F.F.F.FC1=CC=CC=C1 Chemical compound F.F.F.FC1=CC=CC=C1 PFSUALBMVZDPBQ-UHFFFAOYSA-N 0.000 description 5
- 238000005259 measurement Methods 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 239000004593 Epoxy Substances 0.000 description 4
- 239000002253 acid Substances 0.000 description 4
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 4
- 238000012644 addition polymerization Methods 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000010538 cationic polymerization reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- LKJWDWUXGCKFPN-UHFFFAOYSA-N 4-(1,1,1,3,3,3-hexafluoropropan-2-yl)phenol Chemical compound OC1=CC=C(C(C(F)(F)F)C(F)(F)F)C=C1 LKJWDWUXGCKFPN-UHFFFAOYSA-N 0.000 description 3
- 241001050985 Disco Species 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 125000001931 aliphatic group Chemical group 0.000 description 3
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 3
- 229940116333 ethyl lactate Drugs 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- 150000003505 terpenes Chemical class 0.000 description 3
- 235000007586 terpenes Nutrition 0.000 description 3
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 3
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 2
- YNDCPHMNPGEGLV-UHFFFAOYSA-N 2-[(2-amino-1-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CCCC(N)C1(C)CC1(C)CCCCC1N YNDCPHMNPGEGLV-UHFFFAOYSA-N 0.000 description 2
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 2
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 2
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 2
- KOGSPLLRMRSADR-UHFFFAOYSA-N 4-(2-aminopropan-2-yl)-1-methylcyclohexan-1-amine Chemical compound CC(C)(N)C1CCC(C)(N)CC1 KOGSPLLRMRSADR-UHFFFAOYSA-N 0.000 description 2
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 2
- KWOLFJPFCHCOCG-UHFFFAOYSA-N Acetophenone Chemical compound CC(=O)C1=CC=CC=C1 KWOLFJPFCHCOCG-UHFFFAOYSA-N 0.000 description 2
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 229920003319 Araldite® Polymers 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 2
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 2
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- CERQOIWHTDAKMF-UHFFFAOYSA-M Methacrylate Chemical compound CC(=C)C([O-])=O CERQOIWHTDAKMF-UHFFFAOYSA-M 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical group SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000004849 alkoxymethyl group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- KEIQPMUPONZJJH-UHFFFAOYSA-N dicyclohexylmethanediamine Chemical compound C1CCCCC1C(N)(N)C1CCCCC1 KEIQPMUPONZJJH-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 2
- 125000003827 glycol group Chemical group 0.000 description 2
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- 230000010354 integration Effects 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000007974 melamines Chemical class 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 2
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 2
- YDSPXEVWSDMKEJ-UHFFFAOYSA-N n-anthracen-1-ylprop-2-enamide Chemical compound C1=CC=C2C=C3C(NC(=O)C=C)=CC=CC3=CC2=C1 YDSPXEVWSDMKEJ-UHFFFAOYSA-N 0.000 description 2
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- 125000000959 isobutyl group Chemical group [H]C([H])([H])C([H])(C([H])([H])[H])C([H])([H])* 0.000 description 1
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- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 229920002521 macromolecule Polymers 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical compound CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 1
- BDJSOPWXYLFTNW-UHFFFAOYSA-N methyl 3-methoxypropanoate Chemical compound COCCC(=O)OC BDJSOPWXYLFTNW-UHFFFAOYSA-N 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 125000004674 methylcarbonyl group Chemical group CC(=O)* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- WFKDPJRCBCBQNT-UHFFFAOYSA-N n,2-dimethylprop-2-enamide Chemical compound CNC(=O)C(C)=C WFKDPJRCBCBQNT-UHFFFAOYSA-N 0.000 description 1
- QRWZCJXEAOZAAW-UHFFFAOYSA-N n,n,2-trimethylprop-2-enamide Chemical compound CN(C)C(=O)C(C)=C QRWZCJXEAOZAAW-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- ADGJZVKOKVENDN-UHFFFAOYSA-N n-(butoxymethyl)-2-methylprop-2-enamide Chemical compound CCCCOCNC(=O)C(C)=C ADGJZVKOKVENDN-UHFFFAOYSA-N 0.000 description 1
- YGRMNBNGHHDGCX-UHFFFAOYSA-N n-(ethoxymethyl)-2-methylprop-2-enamide Chemical compound CCOCNC(=O)C(C)=C YGRMNBNGHHDGCX-UHFFFAOYSA-N 0.000 description 1
- LSWADWIFYOAQRZ-UHFFFAOYSA-N n-(ethoxymethyl)prop-2-enamide Chemical compound CCOCNC(=O)C=C LSWADWIFYOAQRZ-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- YOZHLACIXDCHPV-UHFFFAOYSA-N n-(methoxymethyl)-2-methylprop-2-enamide Chemical compound COCNC(=O)C(C)=C YOZHLACIXDCHPV-UHFFFAOYSA-N 0.000 description 1
- CEBFLGHPYLIZSC-UHFFFAOYSA-N n-benzyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCC1=CC=CC=C1 CEBFLGHPYLIZSC-UHFFFAOYSA-N 0.000 description 1
- OHLHOLGYGRKZMU-UHFFFAOYSA-N n-benzylprop-2-enamide Chemical compound C=CC(=O)NCC1=CC=CC=C1 OHLHOLGYGRKZMU-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004676 n-butylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- ZIWDVJPPVMGJGR-UHFFFAOYSA-N n-ethyl-2-methylprop-2-enamide Chemical compound CCNC(=O)C(C)=C ZIWDVJPPVMGJGR-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006252 n-propylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- RDMQYWPHYCZEKB-UHFFFAOYSA-N naphthalene-1-sulfonate;pyridin-1-ium Chemical compound C1=CC=[NH+]C=C1.C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 RDMQYWPHYCZEKB-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- WWZKQHOCKIZLMA-UHFFFAOYSA-N octanoic acid Chemical compound CCCCCCCC(O)=O WWZKQHOCKIZLMA-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 229920000962 poly(amidoamine) Polymers 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- STJLVHWMYQXCPB-UHFFFAOYSA-N propiconazole Chemical compound O1C(CCC)COC1(C=1C(=CC(Cl)=CC=1)Cl)CN1N=CN=C1 STJLVHWMYQXCPB-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000006253 t-butylcarbonyl group Chemical group [H]C([H])([H])C(C(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- DQFBYFPFKXHELB-VAWYXSNFSA-N trans-chalcone Chemical compound C=1C=CC=CC=1C(=O)\C=C\C1=CC=CC=C1 DQFBYFPFKXHELB-VAWYXSNFSA-N 0.000 description 1
- 150000003628 tricarboxylic acids Chemical class 0.000 description 1
- QQQSFSZALRVCSZ-UHFFFAOYSA-N triethoxysilane Chemical compound CCO[SiH](OCC)OCC QQQSFSZALRVCSZ-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000005591 trimellitate group Chemical group 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- 239000008096 xylene Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
- C09J171/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C09J171/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C09J171/12—Polyphenylene oxides
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J181/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Adhesives based on polysulfones; Adhesives based on derivatives of such polymers
- C09J181/06—Polysulfones; Polyethersulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
- C08G2650/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group
- C08G2650/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group containing ketone groups, e.g. polyarylethylketones, PEEK or PEK
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
TITLE OF THE INVENTION: ADHESIVE COMPOSITION COMPRISING AROMATIC POLYETHER DERIVATIVEThere is provided a highly thermostable adhesive composition which dissolves easily into various organic solvents and which is capable of forming an adhesive layer5 with sufficient thickness and excellent coating properties, wherein the adhesive layer has an extremely small thermogravimetry loss in thermal processes such as metal bump bonding, CVD, ion diffusion processes, and the like and has excellent adhesion. Anadhesive composition comprising a polymer having a unit structure of Formula (1). +Ar1_x_Ar2_0_14 0 Formula (1) 10 (Where X is a sulphonyl group or a carbonyl group; A? and Ar2 each are a C6.30 arylene group; and T1 is a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group optionally having substituent and a fluoroalkylene group or a cyclic alkylene group). The arylene group is a phenylene15 group, a naphthylene group or an anthrylene group. The polymer is either a homopolymer having one unit structure, or a copolymer having at least two unit structures.
Description
AROMATIC POLYETHER DERIVATIVE
[0001] The present invention relates to an adhesive composition. More particularly, the present invention relates to an adhesive composition adhering between layers of a laminate in a process of forming the laminate such as a semiconductor including an IC chip and an optical system product.
[0002] Recently, higher integration of a semiconductor device has been required in association with development of electronic devices such as mobile phones and IC cards having higher performance and smaller size. As a method for the higher integration, a semiconductor itself having a finer structure or a stacked structure made by stacking semiconductor elements in a longitudinal direction has been studied.
In production of the stacked structure, an adhesive is used for bonding between the semiconductor elements.
However, an acrylic resin, an epoxy resin, or a silicone resin publicly known as an adhesive only has a thermostability of about 250°C. Therefore, these adhesives cannot be used in processes requiring a high temperature of 250°C or more such as an electrode bonding process of a metal bump and an ion diffusion process.
[0003] On the other hand, a substrate for thick film technique of forming an undercoating film containing 30% by volume to 45% by volume of polyetheretherketone resin powder and a thermosetting resin on an inorganic insulating substrate made by impregnating a silicone resin to a glass substrate is disclosed (Patent Document 1).
Related Art Documents
Patent Document
[6004] Patent Document 1: Japanese Patent Application Publication No. 2009-070875 (JP 2009-070875 A)
Problem to be Solved by the Invention
[0005] The substrate on which the undercoating film is formed described above has dimensions that hardly change with moisture and heat, and thus, has excellent J moisture resistance. However, polyetheretherketone contained in the undercoating film - is not dissolved in a solvent or a resin solution. Therefore, polyetheretherketone cannot : form a coating-type adhesive, and thus, adopted is a method for coating a substrate by a screen printing method using polyetheretherketone in the form of paste-type ink. In this composition, screen printable ink cannot be formed when content of the ‘polyetheretherketone is too high. As a result, the resin can be contained in a ratio of only 30% by volume to 45% by volume, and the composition has a problem of thermostability.
As described above, the acrylic resin, the epoxy resin, or the silicone resin publicly : known as an adhesive only has a thermostability of about 250°C, and cannot be used under a high temperature of 250°C or more.
On the other hand, an adhesive made by wholly aromatic polyether such as polyetheretherketone is exemplified in Patent Document 1. However, polyetheretherketone has extremely low solvent solubility and is not soluble, so that the adhesive has poor solvent selectivity and is difficult to form a thick film. The adhesive also has a problem of an insufficient coating property.
As a method for increasing the solvent solubility, introduction of a flexible structure represented by long-chain alkyl is suggested. However, this method generally causes deterioration in thermostability.
[0006] The present invention was devised in view of the problems described above, and an object of the present invention is to provide a highly thermostable adhesive composition that dissolves easily into various organic solvents and that can form an adhesive layer with sufficient thickness and an excellent coating property, in which the adhesive layer has an extremely small thermogravimetry loss in thermal processes such as metal bump bonding, CVD, ion diffusion process, and the like and has excellent ) adhesion.
Means for Solving the Problem
[0007] The present invention relates to: as a first aspect, an adhesive composition including a polymer that contains a unit structure of Formula (1): ~-Arl-X—A-0—T!~0-— Formula (1) (where X is a sulfonyl group or a carbonyl group; Ar and Ar* each are a Ce.3 arylene group; and T' is a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group optionally having a substituent and a fluoroalkylene group or a cyclic alkylene group); as a second aspect, the adhesive composition according to the first aspect, in which the arylene group is a phenylene group, a naphthylene group, or an anthrylene group; as a third aspect, the adhesive composition according to the first aspect or the second aspect, in which the polymer is a homopolymer containing one kind of unit structure; as a fourth aspect, the adhesive composition according to the first aspect or the second aspect, in which the polymer is a copolymer containing at least two kinds of unit structures; as a fifth aspect, the adhesive composition according to any one of the first aspect to the fourth aspect including a polymer that contains the unit structure of Formula (1) with
Ar! and Ar? each being a group of Formula (2): :
a ) nl _ 7 J Formula (2) “A : (where R' is a Cy.19 alkyl group, a C14 fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these, and nl is an integer of 0 to 4); : as a sixth aspect, the adhesive composition according to any one of the first aspect to the fifth aspect including a polymer that contains the unit structure of Formula (1) with T! being a group of Formula (3), the unit structure of Formula (1) with T! being a group of
Formula (4), or a combination of the unit structures: : ’ (B)ng (RY ne £73 oh Cy
A 7
Formula (3) Formula (4)
CT
(where R2, R>, and R* each are a Ci.10 alkyl group, a Cy4 fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these; n2, n3, and n4 each are an integer of 0 to 4; and T” is a fluoroalkylene group, a cyclic alkylene group, or a combination of these); as a seventh aspect, the adhesive composition according to the sixth aspect, in which, in Formula (3), R? includes at least a group containing a tertiary-carbon structure, and n2 is an integer of 1 to 4; as an eighth aspect, the adhesive composition according to any one of the first aspect, the second aspect, and the fourth aspect to the seventh aspect further including a polymer that contains a unit structure of Formula (3):
+ ad-x—art-0—1—0F— Formula (5) (where X is a sulfonyl group or a carbonyl group; Ar® and Ar* each are a Cs.30 arylene group; and T° is an alkylene group, a sulfonyl group, a carbonyl group, a Cs.a9 arylene group, or a combination of these); 5 as a ninth aspect, the adhesive composition according to the eighth aspect, in which the arylene group is a phenylene group, a naphthylene group, or an anthrylene group; as a tenth aspect, the adhesive composition according to the eighth aspect or the ninth aspect, in which T° is a group of Formula (6):
N ) nb ik né
I rf
Formula (6) (where R® and R® each are a Cy. alkyl group, a C4 fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these; n5 and né each are an integer of 0 to 4; T* is an alkylene group, a sulfonyl group, a carbonyl group, a Cs.30 arylene group, or acombination of these); as an eleventh aspect, the adhesive composition according to any one of the first aspect to the tenth aspect, in which the group containing a tertiary-carbon structure is a tertiary butyl group; as a twelfth aspect, the adhesive composition according to any one of the first aspect to the eleventh aspect, in which the polymer has a weight average molecular weight of 500 to 5,000,000; as a thirteenth aspect, the adhesive composition according to any one of the first aspect to the twelfth aspect further including a cross-linker; as a fourteenth aspect, the adhesive composition according to any one of first aspect to the thirteenth aspect further including a solvent, in which the adhesive composition has 5 a viscosity of 0.001 to 5,000 Pas; as a fifteenth aspect, a laminate including: at least two adhered articles; and an adhesive layer that is provided between the adhered articles, is formed from the adhesive composition according to any one of the first aspect to the fourteenth aspect, and has a thickness of 0.1 um to 200 um; and as a sixteenth aspect, the laminate according to the fifteenth aspect, in which the adhered articles each are selected from the group consisting of a silicon substrate, a glass substrate, a resin substrate, or a ceramic substrate. :
[0008] According to the present invention, the adhesive composition of the present invention includes a polymer that contains an aromatic polyether structure such as aromatic polyetheretherketone and aromatic polyetherethersulfone. Therefore, the adhesive composition can be easily dissolved into various organic solvents, and an excellent coating property can be obtained. Also, the adhesive composition of the present invention can form an adhesive layer with sufficient thickness for adhesion, and can form the adhesive layer, which has an extremely small thermogravimetry loss in thermal processes such as metal bump bonding, CVD, ion diffusion process, and the like, and that can retain high adhesion even after the thermal processes.
The adhesive composition of the present invention containing the polymer that contains the polyether structure is therefore effective for adhesion of a processed article (for example, a layered substance processed through heating treatment, pressure treatment, lithography, or the like) such as an electronic substrate used for a : semiconductor device and the like that requires processing in the thermal processes.
The laminate of the present invention has an adhesive layer having high thermostability. Therefore, the adhered article can be processed in the thermal processes and the laminate can be used under high temperature conditions.
[0009] The present invention includes the adhesive composition including the polymer that contains the unit structure of Formula (1).
The adhesive composition includes the polymer that contains the unit structure of
S Formula (1) and a solvent. Furthermore, as optional components, the adhesive composition may include an additional resin, a tackifier, a plasticizer, an adhesion improving agent, a stabilizer, a colorant, a surfactant, and the like for improving performance of the adhesive.
The adhesive composition of the present invention has a solid content of 0.1% by mass to 80% by mass, and preferably 1% by mass to 60% by mass. The solid content is represented as a ratio of residual part formed by removing the solvent from the adhesive composition, to the adhesive composition. A ratio of the polymer that contains the unit structure of Formula (1) in the solid content can be set to 30% by mass to 100% by mass, and preferably 50% by mass to 100% by mass.
[0010] A preferable polymer used in the present invention is a thermoplastic resin.
A molecular weight of the polymer used in the present invention is, as weight average molecular weight, 500 to 5,000,000, preferably 1,000 to 1,000,000, and 1,000 to 100,000.
[0011] In Formula (1), X is a sulfonyl group or a carbonyl group; Ar' and Ar? each are a Cg.30 arylene group; and T! is a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent or a combination of an arylene group optionally having a substituent and a fluoroalkylene group or a cyclic alkylene group.
The arylene group having a substituent is an arylene group having the substituents described below.
The arylene group optionally having a substituent is a substituted or an unsubstituted arylene group, and is a combination of an arylene group and a fluoroalkylene group or a cyclic alkylene group.
The arylene group may be a phenylene group, a naphthyl group, an anthryl group,
or the like, and is preferably the phenylene group or the naphthyl group. 5
The fluoroalkylene group described above includes a Cy.1o fluoroalkylene group.
Specific examples thereof include a fluoromethylene group, a fluoroethylene group, a fluoro-n-propylene group, a fluoroisopropylene group, a fluoropropane-2,2-diyl group, a fluoro-n-butylene group, a fluoroisobutylene group, a fluoro-s-butylene group, and a fluoro-t-butylene group. Among them, the specific examples include C4 i fluoroalkylene groups such as the perfluoropropane-2,2-diyl group. Also, a completely : fluorinated (perfluorinated) alkylene group and a partially fluorinated (monofluorinated, diftuorinated, and the like) alkylene group can be used as these fluoroalkylene groups.
The cyclic alkylene group may be a Cs.3p cyclic alkylene group.
Examples of the cyclic alkylene group include a cyclopropylene group, a . cyclobutylene group, a cyclohexylene group, a 1-methyl-cyclopentylene group, a 2-methyl-cyclopentylene group, a 3-methyl-cyclopentylene group, a 1-ethyl-cyclobutylene group, a 2-ethyl-cyclobutylene group, a 3-ethyl-cyclobutylene group, a 1,2-dimethyl-cyclobutylene group, a 1,3-dimethyl-cyclobutylene group, a 2,2-dimethyl-cyclobutylene group, a 2,3-dimethyl-cyclobutylene group, a 2,4-dimethyl-cyclobutylene group, a 3,3-dimethyl-cyclobutylene group, a 1-n-propyl-cyclopropylene group, a 2-n-propyl-cyclopropylene group, a 1-i-propyl-cyclopropylene group, a 2-i-propyl-cyclopropylene group, a 1,2,2-trimethyl-cyclopropylene group, a 1,2,3-trimethyl-cyclopropylene group, a 2,2,3-trimethyl-cyclopropylene group, a 1-cthyl-2-methyl-cyclopropylene group, a 2-ethyl-1-methyl-cyclopropylene group, a 2-ethyl-2-methyl-cyclopropylene group, and a 2-ethyl-3-methyl-cyclopropylene group, and the like. Bivalent organic groups derived from adamantane and norbornene can also be used.
[0012] In the polymer that contains the unit structure of Formula (1) used in the present invention, these functional groups can be used, as T', singly or in combination.
The polymer can be used as a homopolymer containing one type of repeating unit structure or a copolymer containing two or more types of repeating unit structures.
[0013] The present invention may include the polymer that contains the unit structure of Formula (1) with Ar! and Ar” each being a group of Formula (2).
In Formula (2), R! is a Cy.10 alkyl group, a C4 fluoroalky! group, a hydroxy group, : an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, acyclic alkyl group, or a combination of these, and nl is an integer of 0 to 4
In Formula (2), the alkyl group of R is the Cy.1o alkyl group. Examples of R! include a methyl! group, an ethyl group, an n-propyl group, an i-propyl group, an n-butyl group, an i-butyl group, an s-butyl group, a t-butyl group, an n-pentyl group, a 1-methyl-n-butyl group, a 2-methyl-n-butyl group, a 3-methyl-n-butyl group, a 1,1-dimethyl-n-propyl group, a 1,2-dimethyl-n-propyl group, a 2,2-dimethyl-n-propyl group, a l-ethyl-n-propyl group, an n-hexyl group, a 1-methyl-n-pentyl group, a 2-methyl-n-pentyl group, a 3-methyl-n-pentyl group, a 4-methyl-n-pentyl group, a 1,1-dimethyl-n-butyl group, a 1,2-dimethyl-n-butyl group, a 1,3-dimethyl-n-butyl group, a 2,2-dimethyl-n-butyl group, a 2,3-dimethyl-n-butyl group, a 3,3-dimethyl-n-butyl group, a l-ethyl-n-butyl group, a 2-ethyl-n-butyl group, a 1,1,2-trimethyl-n-propyl group, a 1,2,2-trimethyl-n-propyl group, a 1-ethyl-1-methyl-n-propyl group, and a 1-ethyl-2-methyl-n-propyl group,
The fluoroalkyl group may be a Cy.jg fluoroalkyl group, or may be a C;.4 fluoroalkyl group. Further, examples of the fluoroalkyl group include a fluoromethyl group, a fluoroethyl group, a fluoro-n-propyl group, a fluoroisopropyl group, a fluoro-n-butyl group, a fluoroisobutyl group, a fluoro-s-butyl group, and a fluoro-t-butyl group. A completely fluorinated (perfluorinated) alkyl group and a partially fluorinated alkyl group can be used as these fluoroalkyl groups.
The acyl group may be a C,.10 acyl group. Examples of the acyl group include a methylcarbonyl group, an ethylcarbonyl group, an n-propylcarbonyl group, an i-propylcarbonyl group, a cyclopropylcarbonyl group, an n-butylcarbonyl group, an i-butylearbonyl group, an s-butylcarbonyl group, a t-butylcarbonyl group, a cyclobutylcarbonyl group, a 1-methyl-cyclopropylcarbonyl group, a 2-methylcyclopropylcarbonyl group, an n-pentylcarbonyl group, a
1-methyl-n-butylcarbony! group, a 2-methyl-n-butylcarbonyl group, a 3-methyl-n-butylcarbonyl group, a 1,1-dimethyl-n-propylcarbonyl group, a 1,2-dimethyl-n-propylearbonyl group, a 2,2-dimethyl-n-propylcarbonyl group, a 1-ethyl-n-propylcarbonyl group, a cyclopentylcarbonyl group, a 1-methyl-cyclobutylcarbonyl group, a 2-methyl-cyclobutylcarbonyl group, a 3-methyl-cyclobutylcarbonyl group, a 1,2-dimethyl-cyclopropylearbonyl group, a 2,3-dimethyl-cyclopropylcarbonyl group, a 1-ethyl-cyclopropylcarbonyl group, a 2-ethyl-cyclopropylcarbonyl group, an n-hexylcarbonyl group, a 1-methyl-n-pentylcarbonyl group, a 2-methyl-n-pentylcarbonyl group, a 3-methyl-n-pentylcarbonyl group, a 4-methyl-n-pentylcarbonyl group, a 1,1-dimethyl-n-butylcarbonyl group, a 1,2-dimethyl-n-butylcarbonyl group, a 1,3-dimethyl-n-butylcarbonyl group, a 2,2-dimethyl-n-butylcarbonyl group, a 2,3-dimethyl-n-butylcarbonyl group, a 3,3-dimethyl-n-butylcarbonyl group, a 1-ethyl-n-butylcarbonyl group, a 2-ethyl-n-butylcarbonyl group, and a 1,1,2-trimethyl-n-propylcarbonyl group.
The acyloxy group may be a C,.1p acyloxy group. Examples of the acyloxy group include a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an i-propylearbonyloxy group, a cyclopropylearbonyloxy group, an n-butylcarbonyloxy group, an i-butylcarbonyloxy group, an s-butylcarbonyloxy group, a t-butylcarbonyloxy group, a cyclobutylcarbonyloxy group, a 1-methyl-cyclopropylcarbonyloxy group, a 2-methyl-cyclopropylcarbonyloxy group, an n-pentylcarbonyloxy group, a 1-methyl-n-butylcarbonyloxy group, a 2-methyl-n-butylcarbonyloxy group, a 3-methyl-n-butylcarbonyloxy group, a 1,1-dimethyl-n-propylcarbonyloxy group, a 1,2-dimethyl-n-propylcarbonyloxy group, a 2,2-dimethyl-n-propylcarbonyloxy group, a 1-sthyl-n-propylcarbonyloxy group, a cyclopentylcarbonyloxy group, a 1-methyl-cyclobutylcarbonyloxy group, a 2-methyl-cyclobutylcarbonyloxy group, a 3-methyl-cyclobutylcarbonyloxy group, a 1,2-dimethyl-cyclopropylcarbonyloxy group, a 2,3-dimethyl-cyclopropylcarbonyloxy group, a 1-ethyl-cyclopropylcarbonyloxy group, a 2-ethyl-cyclopropylcarbonyloxy group,
an n-hexylcarbonyloxy group, a 1-methyl-n-pentylcarbonyloxy group, a 2-methyl-n-pentylcarbonyloxy group, a 3-methyl-n-pentylcarbonyloxy group, a 4-methyl-n-pentylcarbonyloxy group, a 1,1-dimethyl-n-butylcarbonyloxy group, a - 1,2-dimethyl-n-butylcarbonyloxy group, a 1,3-dimethyl-n-butylcarbonyloxy group, a 2,2-dimethyl-n-butylcarbonyloxy group, a 2,3-dimethyl-n-butylcarbonyloxy group, a 3,3-dimethyl-n-butylcarbonyloxy group, a 1-ethyl-n-butylcarbonyloxy group, a 2-ethyl-n-butylcarbonyloxy group, and a 1,1,2-trimethyl-n-propylcarbonyloxy group.
A tertiary-butyl group can be preferably used as the group containing a tertiary-carbon structure.
The cyclic alkyl group may be a Cz.39 cyclic alkyl group. Examples of the cyclic alkyl group include a cyclopropyl group, a cyclobutyl group, a cyclohexyl group, a 1-methyl-cyclopentyl group, a 2-methyl-cyclopenty! group, a 3-methyl-cyclopentyl group, - a l-ethyl-cyclobutyl group, a 2-ethyl-cyclobutyl group, a 3-ethyl-cyclobutyl group, a 1,2-dimethyl-cyclobutyl group, a 1,3-dimethyl-cyclobutyl group, a 2,2-dimethyl-cyclobutyl group, a 2,3-dimethyl-cyclobutyl group, a 2,4-dimethyl-cyclobutyl group, a 3,3-dimethyl-cyclobutyl group, a 1-n-propyl-cyclopropyl group, a 2-n-propyl-cyclopropyl group, a 1-i-propyl-cyclopropyl group, a 2-i-propyl-cyclopropyl group, a 1,2,2-trimethyl-cyclopropyl group, a 1,2,3-trimethyl-cyclopropyl group, a 2,2,3-trimethyl-cyclopropyl group, a l-ethyl-2-methyl-cyclopropyl group, a 2-ethyl-1-methyl-cyclopropyl group, a . 2-cthyl-2-methyl-cyclopropyl group, and a 2-ethyl-3-methyl-cyclopropyl group.
Monovalent organic groups derived from adamantane and norbornene can also be used.
[0014] The polymer used in the present invention may include a polymer that contains the unit structure of Formula (1) with T' being a group of Formula (3), the unit structure of Formula (1) with T being a group of Formula (4), or a combination of these unit structures, other than the selection of Ar! and Ar? described above or with the selection of Ar' and Ar? described above. )
In other words, the polymer can be used that contains the unit structure of Formula (1) with Ar! and Ar? being groups of Formula (2), the unit structure of Formula (1) with
T' being a group of Formula (3), the unit structure of Formula (1) with T' being a group of Formula (4), the unit structure of Formula (1) with Ar' and Ar? being groups of
Formula (2) and T® being a group of Formula (3), the unit structure of Formula (1) with
Ar’ and Ar? being groups of Formula (2) and T' being a group of Formula (4), or the combination of these.
[0015] In Formula (3) and Formula (4), R?, R?, and R* are a Cy.i0 alkyl group, a
C4 fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these; and n2, n3, and nd each are an integer of 0 to 4. T? is a fluoroalkylene group, a : cyclic alkylene group, or a combination of these.
For the C.1g alkyl group, the C;4 fluoroalkyl group, the group containing a tertiary-carbon structure, the cyclic alkyl group, the acyl group, and the acyloxy group, the examples described above can be used.
For the fluoroalkylene group and the cyclic alkylene group, the examples described above can be used. These examples can be used singly or in combination.
In Formula (3), a unit structure in which R? includes at least a group containing a . tertiary-carbon structure, and n2 is an integer of 1 to 4 can be used.
[0016] In the present invention, in addition to the unit structure of Formula (1), a copolymer containing the unit structure of Formula (5) can be used. In Formula (5), X is a sulfonyl group or a carbonyl group; Ar’ and Ar* each are a C.39 arylene group; and
T® is an alkylene group, sulfonyl group, a carbonyl group, a Cs.3 arylene group, or a combination of these. For the arylene group and the alkylene group, the examples described above can be used.
In Formula (5), a phenylene group, a naphthylene group, or an anthrylene group that are substituted or unsubstituted can be used.
In Formula (5), the alkylene group may be a Cy.j alkylene group. Examples of the alkylene group include a methylene group, an ethylene group, a propylene group, an isopropylene group, a propane-2,2-diyl group, an n-butylene group, an isobutylene group,
an s-butylene group, and a t-butylene group. Among them, the examples include C4 5 alkylene groups such as the propane-2,2-diyl group.
In Formula (5), a group of Formula (6) can be used as T*, In Formula (6), R® and
R® each are a Cy.1 alkyl group, a Cy fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these; n5 and n6 cach are an integer of 0 to 4. T isan alkylene group, a sulfonyl group, a carbonyl group, a Cg.30 arylene group, or a combination of these. For the alkyl group, the C4 fluoroalkyl group, the acyl group, the acyloxy group, the group containing a tertiary-carbon structure, the cyclic alkyl group, ) the alkylene group, and the arylene group, the examples described above can be used.
In the present invention, the group containing a tertiary-carbon structure is a functional group containing a tertiary-carbon structure. This functional group substitutes for a hydrogen atom on the carbon atom to form a quaternary carbon.
Examples of an organic group bonding to the tertiary-carbon atom in the tertiary-carbon structure include alkyl groups such as a methyl group, an ethyl group, and a propyl group, and aryl groups such as a phenyl group. Among them, the methyl group is preferably used. A tertiarybutyl group having three methyl groups can be preferably used as a group containing a tertiary-carbon structure.
[0017] The unit structure of Formula (1) used in the present invention can be exemplified as follows:
0 Fa .
OO o<—Oro Formula (1-1) ’ 0 CF3 0 (oto Formula (1-2) 0
FO UpyUror Formula (1-3) 0 ; or
HOA) 0 CFs : Formula (1-4) 7 Te
HOI ¢<ot
GC CHj oloeofa 1 0 I oF Formula (1-5) 0 (OOo 0 0 0 ob Oder 10-00
Formula (1-6)
0 CFs g
Il
S 0 C
Rs a Yaa Vaa aly ‘0 CFs Formula (1-7) 0 fl +O ane Yar: 0 . 0 CFs
I
C 0 C 0 :
CFs 0 :
I}
HOE-Oroo 0 CFs il : 4 —C— 0 —c—~ )—0 :
T Formula (1-9) :
CFs 0 HO CHa OH ll : 0 C
HOE-Oo-Chor
HO CH; OH
[0018] The polymer that contains the unit structure of Formula (1) may be a polymer that contains a hydroxy group or a halogen group as a terminal group, or a polymer that is capped by substituting the hydrogen atom of the hydroxy group or the halogen group with a phenyl group or the like. The capping group is a group of
Formula (A): 1 ( n ) kl —") Formula (A) where Q' is the alkyl group, or the alkyl group substituted with a halogen atom (fluorine, chlorine, bromine, and iodine), and kl is an integer of 0 to 5.
[0019] Inthe present invention, a cross-linker may be used. The cross-linker has no limitation. However, a cross-linker having 2 or more, for example, 2 to 6, or 2 to 4 substituents that can react with the functional group in the polymer is preferable. A ratio of the cross-linker in the solid content can be 0% by mass to 50% by mass, and preferably 5% by mass to 40% by mass.
[0020] Examples of the cross-linker used in the present invention include a . nitrogen-containing compound having a nitrogen atom substituted with a hydroxymethyl group or an alkoxymethyl group. Examples of the cross-linker include a . nitrogen-containing compound having a nitrogen atom substituted by a hydroxymethyl group, a methoxymethyl group, an ethoxymethy! group, a butoxymethyl group, and a hexyloxymethyl group. An epoxy group-containing compound, an epoxy : group-containing polymer, an allyl group-containing compound, an allyl group-containing polymer, an isocyanate group-containing compound, and an isocyanate group-containing polymer can be used as the cross-linker. f0021] Specific examples of the nitrogen-containing compound include nitrogen-containing compounds such as hexamethoxymethylmelamine, ) tetramethoxymethylbenzoguanamine, 1,3,4,6-tetrakis(butoxymethyl)glycoluril, 1,3,4,6-tetrakis(hydroxymethyl)glycoluril, 1.3-bis(hydroxymethyl)urea, 1,1,3,3- tetrakis(butoxymethyl)urea, 1,1,3,3-tetrakis(methoxymethyl)urea, 1,3-bis(thydroxymethyl)-4,5-dihydroxy-2-imidazolinone, and 1,3-bis(methoxymethyl)-4,5-dimethoxy-2-imidazolinone.
Examples of the cross-linker also include commercially available compounds such as methoxymethyl-type melamine compounds (trade name: Cymel 300, Cymel 301,
Cymel 303, and Cymel 350), butoxy methyl-type melamine compounds (irade name: :
Mycoat 506, and Mycoat 508), glycoluril compounds (trade name: Cymel 1170 and
Powderlink 1174), a methylated urea resin (trade name: UFR 65), butylated urea resins (trade name: UFR 330, U-VAN 10S60, U-VAN 10R, and U-VAN 11HV), which are manufactured by Mitsui Cytec Ltd.; and urea/ formaldehyde-based resin (high condensation type, trade name: Beckamine J-300S, Beckamine P-955, and Beckamine N) manufactured by DIC Corporation, and the like.
The cross-linker may be a compound obtained by condensing the melamine compound, the urea compound, the glycoluril compound, and the benzoguanamine compound in which a hydrogen atom in an amino group is substituted with the hydroxymethyl group or the alkoxymethy! group as described above. For example, a high molecular weight compound manufactured from the melamine compound (trade name: Cymel 303) and the benzoguanamine compound (trade name: Cymel 1123) . described in U.S. Patent No. 6323310 can be used as a crosslinkable compound.
As the cross-linker, a polymer compound manufactured by using an acrylamide compound or a methacrylamide compound that are substituted by a hydroxymethyl group or an alkoxymethyl group such as N-hydroxymethylacrylamide, )
N-methoxymethylmethacrylamide, N-ethoxymethylacrylamide, and
N-butoxymethylmethacrylamide can be used. Examples of such a polymer compound may include poly(N-butoxymethylacrylamide), a copolymer of N-butoxymethylacrylamide and styrene, a copolymer of :
N-hydroxymethylmethacrylamide and methyl methacrylate, a copolymer of :
N-ethoxymethylmethacrylamide and benzyl methacrylate, and a copolymer of
N-butoxymethylacrylamide, benzyl methacrylate, and 2-hydroxypropyl methacrylate.
[0022] A compound having 1 to 6, or 2 to 4 epoxy ring(s) can be used as the cross-linker containing epoxy group(s). Examples of the compound having the epoxy ring(s) may include a compound having two or more hydroxy groups or carboxy groups such as a diol compound, a triol compound, a dicarboxylic acid compound, and a tricarboxylic acid, and a compound having two or more glycidyl ether structures or glycidyl ester structures manufactured from a glycidyl compound such as epichlorohydrin. :
Examples of the compound having the epoxy ring(s) include 1,4-butanediol diglycidyl ether, 1,2-epoxy-4-(epoxyethyl)cyclohexane, glycerol triglycidyl ether, diethylene glycol diglycidyl ether, 2,6-diglycidylphenyl glycidyl ether, 1,1,3-tris[p-(2,3-epoxypropoxy)phenyl]propane, 1,2-cyclohexanedicarboxylic acid diglycidyl ester, 4,4’ -methylenebis(N,N-diglycidylaniline), 3,4-epoxycyclohexylmethyl-3,4-epoxycyclohexanecarboxylate, trimethylolethane triglycidyl ether, triglycidyl-p-aminophenol, tetraglycidyl meta-xylenediamine, tetraglycidyl diaminodiphenyl methane, tetraglycidyl-1,3-bisaminomethyicyclohexane, bisphenol-A-diglycidyl ether, bisphenol-S-diglycidyl ether, pentaerythritol tetraglycidyl ether, resorcinol diglycidyl ether, phthalic acid diglycidyl ester, neopentyl glycol diglycidyl ether, polypropylene glycol diglycidyl ether, tetrabromobisphenol-A-diglycidyl ether, bisphenolhexafluoroacetone diglycidyl ether, pentaerythritol diglycidyl ether, tris-(2,3-epoxypropyl)isocyanurate, monoallyl diglycidy! isocyanurate, diglycerol polydiglycidyl ether, pentaerythritol polygltycidyl ether, 1,4-bis(2,3-epoxypropoxyperfluoroisopropyl)cyclohexane, sorbitol polyglycidyl ether, trimethylolpropane polyglycidyl ether, resorcin diglycidyl ether, 1,6-hexanediol diglycidyl ether, polyethylene glycol diglycidyl ether, phenyl glycidyl ether, . p-tertiary-butylphenyl glycidyl ether, adipic acid diglycidyl ether, o-phthalic acid glycidyl ether, dibromopheny! glycidyl ether, 1,2,7,8-diepoxyoctane, 1,6-dimethylolperfluorohexane diglycidyl ether, 4,4’ -bis(2,3-epoxypropoxyperfluoroisopropyl)diphenyl ether, 2,2-bis(4-glycidyloxyphenyl)propane, 3,4-epoxycyclohexylmethyl-3’.4’-epoxycyclohexane carboxylate, 3,4-epoxycyclohexyloxirane, 2-(3,4-epoxycyclohexyl)-3’,4’-epoxy-1,3-dioxane-5-spiro-cyclohexane, 1,2-ethylenedioxy-bis(3,4-epoxycyclohexylmethane), 4’,5’-epoxy-2’-methylcyclohexylmethyl-4,5-epoxy-2-methylcyclohexane carboxylate, ethylene glycol-bis(3,4-epoxycyclohexane carboxylate), bis-(3,4-epoxycyclohexylmethyl) adipate, and bis(2,3-epoxycyclopentyl) ether.
As the cross-linker, only one-type compound can be used, or a combination of two or more types of compounds can also be used.
[0023] The adhesive composition of the present invention may include a crosslinking catalyst. Reaction of a crosslinkable compound is accelerated by using the crosslinking catalyst.
An acid compound such as p-toluenesulfonic acid, trifluoromethanesulfonic acid, methanesulfonic acid, pyridinium-p-toluenesulfonic acid, salicylic acid, camphorsulfonic acid, sulfosalicylic acid, citric acid, benzoic acid, and hydroxybenzoic acid can be used as the crosslinking catalyst.
An aromatic sulfonic acid compound can be used as the crosslinking catalyst.
Specific examples of the aromatic sulfonic acid compound include p-toluenesulfonic acid, pyridinium-p-toluenesulfonic acid, sulfosalicylic acid, 4-chlorobenzenesulfonic acid, 4-hydroxybenzenesulfonic acid, benzenedisulfonic acid, 1-naphthalenesulfonic acid, and pyridinium-1-naphthalenesulfonic acid.
[0024] When the cross-linker having epoxy groups is used, a phenol resin, amines, a polyamide resin, imidazoles, polymercaptan, and an acid anhydride can be used : as the crosslinking catalyst. :
Examples of the phenol resin include a phenol-novolac resin and cresol-novolac resin. ]
Examples of the amines include piperidine, N,N-dimethylpiperadine, ) triethylenediamine, 2.4,6-tris(dimethylaminomethyl)phenol, benzyldimethylamine, 2-(dimethylaminomethyl)phenol, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, diethylaminopropylamine, N-aminoethylpiperadine, di(1-methyl-2-aminocyclohexyl)methane, menthane diamine, isophoronediamine, diaminodicyclohexylmethane, 1,3-diaminomethylcyclohexane, xylenediamine, meta-phenylenediamine, diaminodiphenylmethane, and diaminodiphenylsulfone.
Among them, diethylenetriamine, triethylenetetramine, tetracthylenepentamine, diethylaminopropylamine, N-aminoethylpiperadine, di(1-methyl-2-aminocyclohexyl)methane, menthane diamine, isophoronediamine, diaminodicyclohexylmethane, and the like can be preferably used.
Examples of the polyamide resin include a polyamidoamine having primary amines and secondary amines in its molecule, which is generated by condensing a dimer acid and a polyamine.
Examples of the imidazoles include 2-methylimidazole, 2-ethyl-4-methylimidazoie, l-cyanoethyl-2-undecylimidazolium trimellitate, and an epoxyimidazole adduct.
Examples of the polymercaptan include a polymercaptan having a mercaptan group at the terminal of a polypropylene glycol chain and a polymercaptan having a mercaptan group at the terminal of a polyethylene glycol chain.
As the acid anhydride, an anhydride of a compound having a plurality of carboxy groups in its one molecule is preferable. Examples of the acid anhydride include : phthalic anhydride, trimellitic anhydride, pyromellitic dianhydride, benzophenonetetracarboxylic dianhydride, ethylene glycol bistrimellitate, glycerol tristrimellitate, maleic anhydride, tetrahydrophthalic anhydride, methyltetrahydrophthalic anhydride, endo-methylenetetrahydrophthalic anhydride, methyl-endo-methylenetetrahydrophthalic anhydride, methylbutenyltetrahydrophthalic anhydride, dodecenylsuccinic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, succinic anhydride, methylcyclohexenedicarboxylic anhydride, and chlorendic anhydride.
Examples of other crosslinking catalysts include an organic phosphorus compound such as triphenylphosphine and tributylphsphine; quaternary phosphonium salts such as ethyl triphenylphosphonium bromide and tetrabutylphosphonium diethyl dithiophosphate; and quaternary ammonium salts such as 1,8-diazabicyclo(5,4,0)undecane-7-ene, a salt of 1,8-diazabicyclo(5,4,0)undecane-7-ene and octylic acid, zinc octylate, and tetrabutylammonium bromide.
[0025] When a cross-linker having an allyl group is used, for example, a radical polymerization initiator and a cation polymerization initiator can be used as a curing catalyst.
Examples of the radical polymerization initiator include an imidazole compound, a diazo compound, a bisimidazole compound, an N-arylglycine compound, an organic azide compound, a titanocene compound, an alminate compound, an organic peroxide, an
N-alkoxypyridinium chloride compound, and a thioxanthone compound.
Examples of the organic azide compound include p-azide benzaldehyde, p-azide acetophenone, p-azide benzoic acid, p-azidebenzalacetophenone, 4,4°-diazide chalcone, 4,4-diazide diphenyl sulfide, and 2,6-bis(4’-azide benzal)-4-methylcyclohexanone,
Examples of the diazo compound include 1-diazo-2,5-diethoxy-4-p-tolylmercaptobenzene borofluoride, 1-diazo-4-N,N-dimethylaminobenzene chloride, and 1-diazo-4-N,N-diethylaminobenzene borofluoride.
Examples of the bisimidazole compound include .. 2,2’-bis(o-chlorophenyl)-4,5,4°,5°-tetrakis(3,4,5-trimethoxyphenyl) 1,2°-bisimidazole and 2,2’-bis(o-chlorophenyl}-4,5,4°,5’ -tetraphenyl-1,2’-bisimidazole.
Examples of the titanocene compound include dicyclopentadienyl-titanium-dichloride, dicyclopentadienyl-titanium-bisphenyl, dicyclopentadienyl-titanium-bis(2,3,4,5,6-pentafluorophenyl), dicyclopentadienyl-titanium-bis(2,3,5,6-tetrafluorophenyl), dicyclopentadienyl-titanium-bis(2,4,6-trifluorophenyl), dicyclopentadienyl-titanium-bis(2,6-difluorophenyl), : dicyclopentadienyl-titanium-bis(2,4-difluoropheny}), : bis(methylcyclopentadienyl)-titanium-bis(2,3,4,5,6-pentafluorophenyl), bis(methylcyclopentadienyl)-titanium-bis(2,3,5,6-tetrafluorophenyl), bis(methylcyclopentadienyl)-titanium-bis(2,6-difluorophenyl) and dicyclopentadienyl-titanium-bis(2,6-difluoro-3-(1H-pyrrol-1-yl)-phenyl).
Examples of the radical polymerization initiator also include 1,3-di(tert-butyldioxycarbonyl)benzophenone, 3,3’,4,4’-tetrakis(tert-butyldioxycarbonyl)benzophenone, 3-phenyl-5-isooxazolone, 2-mercaptobenzimidazole, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, and 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone.
[0026] Examples of the cationic polymerization initiator include a sulfonic acid ester, a sulfonimide compound, a disuifonyl diazomethane compound, a dialkyl-4-hydroxysulfonium salt, arylsulfonic acid p-nitrobenzyl ester, a silanol-aluminum complex, and (n6-benzene)(n5-cyclopentadienyl) iron (II).
Examples of the sulfonimide compound include
N-(trifluoromethanesulfonyloxy)succinimide,
N-(nonafluoro-normalbutanesulfonyloxy)succinimide,
N-(camphorsulfonyloxy)succinimide, and
N-(trifluoromethanesulfonyloxy)naphthalimide.
Examples of the disulfonyl diazomethane compound include - bis(trifluoromethylsulfonyl)diazomethane, bis(cyclohexylsufonyl)diazomethane, bis(phenylsulfonyl)diazomethane, bis(p-toluencsulfonyl)diazomethane, bis(2,4-dimethylbenzenesulfonyl)diazomethane, and methylsulfonyl-p-toluenesulfonyldiazomethane.
Examples of the cationic polymerization initiator also include 2-methyl-1-(4-methylthiophenyl)-2-morpholinopropane-1-one.
An aromatic iodonium salt compound, an aromatic sulfonium salt compound, an aromatic diazonium salt compound, an aromatic phosphonium salt compound, a triazine compound, an iron-arene complex compound, and the like can be used as both of the radical polymerization initiator and the cationic polymerization initiator.
Examples of the aromatic iodonium salt compound include diphenyliodoniumhexafluorophosphate, diphenyliodoniumtrifluoromethanesulfonate, diphenyliodoniumnonafluoro-normalbutanesulfonate, diphenyliodoniumperfluoro-normaloctanesulfonate, diphenyliodoniumcamphorsulfonate, bis(4-tert-butylphenyl)iodoniumcamphorsulfonate, and bis(4-tert-butylphenyl) iodoniumtrifluoromethanesulfonate.
Examples of the aromatic sulfonium salt compound include triphenylsulfoninmhexafluoroantimonate, : triphenylsulfoniumnonafluoro-normalbutanesulfonate, triphenylsulfoniumcamphorsulfonate, and triphenylsulfoniumtrifluoromethanesulfonate.
The crosslinking catalyst can be used singly or in combination of two or more of the crosslinking catalysts.
[0027] The crosslinking catalyst of 0 parts by mass to 10 parts by mass, or 0.01 parts by mass to 10 parts by mass, or 0.05 parts by mass to 8 parts by mass, or 0.1 parts by mass to 5 parts by mass, or 0.3 parts by mass to 3 parts by mass, or 0.5 parts by mass to 1 part by mass to the polymer can be used.
[0028] Asilicon substrate, a glass substrate, a resin substrate, and a ceramic substrate can be exemplified as an adhered article used in the present invention. These substrates can be used as a supporting body of the laminate of the present invention.
[0029] Examples of the adhered article used in the present invention include inorganic materials such as silicon, silicon oxide, glass, and silicon nitride; metals such as aluminum and copper; and resin materials such as a polyamide resin, a polyimide resin, an epoxy resin, a polyacrylic acid resin, a polymethacrylic acid resin, a polybenzoxazole resin, a polyhydroxystyrene resin, and a benzocyclobutene resin,
[0030] The adhesive composition can be dissolved using an organic solvent for ) spin coating. A polymer solution in which the polymer is dissolved in an organic solvent and its solution viscosity is in a range of 0.001 Pa-s to 5000 Pas can be prepared as a coating solution having a spin coating property.
The organic solvent is not particularly limited as long as the solvent can be used in other semiconductor processes. However, ketones such as cyclohexanone, methyl isoamyl ketone, and 2-hepainone; polyvalent alcohols, and derivatives thereof, such as ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, propylene glycol, propylene glycol monoacetate, monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether, and monophenyl ether of dipropylene glycol or dipropylene glycol monoacetate; cyclic ethers such as dioxane, and esters such as methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, methyl methoxypropionate, and ethyl ethoxypropionate are preferably used. These solvents can be used singly or in combination of two or more solvents.
[0031] Commonly used additives such as an additional resin, a tackifier, a plasticizer, an adhesion improving agent, a stabilizer, a colorant, a surfactant, and the like for improving performance of a miscible additive such as an adhesive can be further added to the adhesive composition according to this embodiment within a range that does not impair the substantial characteristics in the present invention.
Addition polymerization polymers and polycondensation polymers such as polyester, polystyrene, polyimide, an acrylic polymer, a methacrylic polymer, polyvinyl ether, phenol-novolac, naphthol-novolac, polyether, polyamide, and polycarbonate can be used as the additional resin (polymer) for improving performance of the adhesive. A ) polymer that contains an aromatic ring structures such as a benzene ring, a naphthalene ring, an anthracene ring, a triazine ring, a quinoline ring, and a quinoxaline ring are . preferably used.
Examples of such an additional resin (polymer) include addition polymerization polymers including addition-polymerizable monomers, such as benzyl acrylate, benzyl methacrylate, phenyl acrylate, naphthyl acrylate, anthryl methacrylate, anthryl methylmethacrylate, styrene, hydroxystyrene, benzyl vinyl ether, and N-phenylmaleimide, as their structural units; and polycondensation polymers such as phenol-novolac and naphthol-novolac.
A polymer that contains no aromatic ring can also be used as the additional resin (polymer). Examples of such a polymer include addition polymerization polymers including, as their structural units, only addition-polymerizable monomers having no aromatic rings, such as an alkyl acrylate, an alkyl methacrylate, a vinyl ether, an alkyl vinyl ether, acrylonitrile, maleimide, an N-alkylmaleimide, and maleic anhydride.
When the addition polymerization polymer is used as the additional resin (polymer), the polymer may be a homopolymer or a copolymer. The addition-polymerizable monomer is used for manufacturing the addition polymerization-type polymer.
Examples of such an addition-polymerizable monomer include acrylic acid, methacrylic acid, an acrylic acid ester compound, a methacrylic acid ester compound, an acrylamide compound, a methacrylamide compound, a vinyl compound, a styrene compound, a maleimide compound, maleic anhydride, and acrylonitrile.
Examples of the acrylic acid ester compound include methyl acrylate, ethyl acrylate, normalhexyl acrylate, isopropyl acrylate, cyclohexyl acrylate, benzyl acrylate, phenyl acrylate, anthrylmethyl acrylate, 2-hydroxyethyl acrylate, 3-chloro-2-hydroxypropyl acrylate, 2-hydroxypropyl acrylate, 2,2,2-trifluoroethyl acrylate, 2,2,2-trichloroethy} acrylate, 2-bromoethyl acrylate, 4-hydroxybutyl acrylate, 2-methoxyethyl acrylate, tetrahydrofurfuryl acrylate, 2-methyl-2-adamantyl acrylate, 5-acryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone, 3-acryloxypropyl triethoxy silane, and glycidyl acrylate.
Examples of the methacrylic acid ester compound include methyl methacrylate, ethyl methacrylate, normalhexyl methacrylate, isopropyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, anthrylmethyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2,2,2-trifluoroethyl methacrylate, 2,2,2-trichloroethyl methacrylate, 2-bromoethyl methacrylate, 4-hydroxybutyl methacrylate, 2-methoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 2-methyl-2-adamantyl methacrylate, 5-methacryloyloxy-6-hydroxynorbornene-2-carboxylic-6-lactone, 3-methacryloxypropyl : triethoxy silane, glycidyl methacrylate, 2-phenylethyl methacrylate, hydroxyphenyl methacrylate, and bromophenyl methacrylate.
Examples of the acrylamide compound include acrylamide, N-methylacrylamide,
N-ethylacrylamide, N-benzylacrylamide, N-phenylacrylamide, N,N-dimethylacrylamide, and N-anthrylacrylamide.
Examples of the methacrylamide compound include methacrylamide,
N-methylmethacrylamide, N-ethylmethacrylamide, N-benzylmethacrylamide,
N-phenylmethacrylamide, N,N-dimethylmethacrylamide, and N-anthrylacrylamide.
Examples of the vinyl compound include vinyl alcohol, 2-hydroxyethy! vinyl ether, methyl vinyl ether, ethyl vinyl ether, benzyl vinyl ether, vinylacetic acid, vinyl trimethoxy silane, 2-chloroethyl vinyl ether, 2-methoxyethy! vinyl ether, vinyl naphthalene, and vinyl anthracene.
Examples of the styrene compound include styrene, hydroxystyrene, chlorostyrene, bromostyrene, methoxystyrene, cyanostyrene, and acetylstyrene.
Examples of the maleimide compound include maleimide, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzyimaleimide, and
N-hydroxyethylmaleimide.
[0032] A molecular weight of the additional resin (polymer) used in the adhesive composition of the present invention is, as weight average molecular weight, 1,000 to 1,00,0000, or 3,000 to 300,000, or 5,000 to 200,000, or 10,000 to 100,000.
When the additional resin (polymer) is included in the adhesive composition of the present invention, the content of the additional resin (polymer) in the solid content is 0% by mass to 40% by mass, or 0% by mass to 20% by mass, or 1% by mass to 19% by . mass.
[0033] The tackifier is added for controlling an elastic modulus, viscosity, and surface conditions of an adhesive layer. The type of such a tackifier is preferably } determined in consideration of the viscosity of the adhesive layer. Specific examples of . the tackifier include a single or a combination of an aliphatic petroleum resin, an aromatic petroleum resin, an aliphatic/aromatic copolymer-based petroleum resin, an aliphatic hydrogenated petroleum resin, an alkylphenol resin, a xylene resin, a coumarone-indene resin, a terpene resin, a terpene-phenol resin, an aromatic modified : terpene resin, a hydrogenated terpene resin, a rosin resin, a hydrogenated rosin resin, a disproportionated rosin resin, a dimerized rosin resin, and an esterified rosin resin. The tackifier can be included in a ratio of 0 parts by weight to 100 parts by weight per 100 parts by weight of the polyether that is the main component of the adhesive composition.
Therefore, an amount of the added tackifier is preferably a value within a range of 0 parts by weight to 100 parts by weight, and further preferably a value within a range of 0 parts by weight to 50 parts by weight.
[0034] The present invention also relates to a laminate including at least two adhered articles and an adhesive layer that is formed from the adhesive composition of the present invention and provided between the adhered articles.
In the present invention, the laminate of the adhered articles can be obtained by a method including applying the adhesive composition of the present invention on a first adhered article by spin coating, baking at a temperature from 50°C to 300°C to form an adhesive layer, and adhering a second adhered article to the first adhered article through the formed adhesive layer. Processing the adhered article layers in the laminate can be further included.
A laminate made of a plurality of adhered articles and adhesive layers formed therebetween can also be formed by repeating methods including further forming an adhesive layer on the second adhered article, adhering a third adhered article to the second adhered article through the formed adhesive layer, and optionally processing the adhered article layers obtained by adhesion. :
In the present invention, a thickness of the adhesive applied to a semiconductor wafer by the spin coating can be set to 0.1 um or more and 200 ym or less. When the : thickness is thinner than 0.1 pum, void may be generated at the time of adhesion because the adhesive layer cannot follow the irregularities of the surface, while when the thickness is thicker than 200 um, the adhesive layer may generate cracks. More preferably, the thickness of the adhesive layer is 1 pm to 50 pm.
[0035] Hereinafter, Examples in which characteristics of the adhesive composition according to the present invention are determined are described.
However, the present invention is not limited to the Examples.
GPC analysis of macromolecular compounds obtained in Synthesis Examples described below is performed using the following device and the following measurement conditions.
Device: Integrated high-speed GPC system HLC-8220GPC, manufactured by Tosoh
Corporation
Column: KF-G, KF804L
Column temperature: 40°C
Solvent: THF
Flow rate: 1.0 mL/minute
Standard sample: Polystyrene
Detector: R1
[0036] Synthesis Example 1
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 20.10 g of 4,4’-dichlorodiphenyl-sulfone, 24.77 g of : 2,2-bis(4-hydroxyphenylhexafluoropropane, 29.02 g of potassium carbonate, and 369.50 -
g of N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160°C and the reaction was performed for 20 hours. The synthesized aromatic polyetherethersulfone was cooled to room : temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 1 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol i to perform reprecipitation purification. .
Thereafter, the obtained precipitate was washed with methanol and water and dried under vacuum at 85 °C for 1 day. Thus, the aromatic polyetherethersulfone (corresponding to formula (1-1)) used in the present invention was obtained. When
GPC analysis of the aromatic polyether was performed, the weight average molecular weight in terms of standard polystyrene was 18,600.
[0037] Synthesis Example 2
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 68.20 g of 4,4’-dichlorodiphenyl-sulfone, 84.06 g of 2,2-bis(4-hydroxyphenyl)hexafluoropropane, 103.68 g of potassium carbonate, and 456.98 g of N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160 °C and the reaction was performed for 20 hours. Thereafter, a sample made by dissolving 32.83 g of 4-fluorobenzenetrifluoride in 160.48 g of N-methyl-2-pyrrolidinone was added dropwise as a capping agent, and the mixture was further stirred for 20 hours. The synthesized aromatic polyetherethersulfone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 100 mi of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10.
Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and dried under vacuum at 85 °C for 1 day. Thus, the aromatic polyether capped with the substituent, which was used in the present invention, was obtained. When GPC analysis of the obtained aromatic polyetherethersulfone (corresponding to formula (1-1)) was - performed, the weight average molecular weight in terms of standard polystyrene was 17,000.
[0038] Synthesis Example 3
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 16.37 g of 4,4°-dichlorodiphenyl-sulfone, 9.97 g of tert-butylhydroquinone, 24.90 g of potassium carbonate, and 79.04 g of
N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160°C and the reaction was performed for 20 hours. Thereafter, a sample made by dissolving 7.90 g of 4-fluorobenzenetrifluoride in 28.94 g of N-methyl-2-pyrrolidinone was added dropwise as a capping agent, and the mixture was further stirred for 20 hours. The synthesized aromatic polyetherethersulfone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and dried under vacuum at 85 °C for 1 day. Thus, the aromatic polyether capped with the substituent, which was used in the present invention, was obtained. When GPC analysis of the obtained aromatic polyetherethersulfone (corresponding to formula (1-2)) was performed, the weight average molecular weight in terms of standard polystyrene was 14,800. 10039] Synthesis Example 4
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 13.64 g of 4,4°-dichlorodiphenyl-sulfone, 13.42 g of 1,1- bis(4-hydroxyphenyl)cyclohexane, 20.78 g of potassium carbonate, and 81.23 g of
N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160°C and the reaction was performed for 20 hours. Thereafter, a sample made by dissolving 6.55 g of 4-fluorobenzenetrifluoride in
28.75 g of N-methyl-2-pyrrolidinone was added dropwise, and the mixture was further - stirred for 20 hours. The synthesized aromatic polyetherethersulfone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 mi of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and dried under vacuum at 85°C for 1 day. Thus, the aromatic polyether capped with the substituent, which was used in the present invention, was obtained. When GPC analysis - of the obtained aromatic polyetherethersulfone (corresponding to formula (1-3)) was . performed, the weight average molecular weight in terms of standard polystyrene was 14,600.
[0040] Synthesis Example 5
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 13.64 g of 4,4’ -dichlorodiphenyl-sulfone, 8.41 g of 2,2-bis(4-hydroxyphenylhexafluoropropane, 5.71 g of 2,2-bis(4-hydroxyphenyl)propane, 34.56 g of potassium carbonate, and 83.44 g of N-methyl-2-pyrrolidinone were added.
Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160°C and the reaction was performed for 20 hours. Thereafter, a sample made by dissolving 6.56 g of 4-fluorobenzenetrifluoride in 29.56 g of N-methyl-2-pyrrolidinone : was added dropwise, and the mixture was further stirred for 20 hours. The synthesized aromatic polyetherethersulfone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10.
Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and dried under vacuum at 85°C for 1 day. Thus, the aromatic polyether capped with the substituent, which was used in the present invention, was obtained. When GPC analysis of the obtained aromatic polyetherethersulfone (corresponding to formula (1-4)) was - performed, the weight average molecular weight in terms of standard polystyrene was 17,700.
[0041] Synthesis Example 6
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a . dropping tank, 13.64 g of 4,4’-dichlorediphenyl-sulfone, 8.41 g of : 2,2-bis(4-hydroxyphenyl)hexafluoropropane, 4.16 g of tert-butylhydroquinone, 34.55 g : of potassium carbonate, and 78.95 g of N-methyl-2-pyrrolidinone were added.
Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160°C and the reaction was performed for 20 hours. Thereafter, a sample made by - dissolving 6.56 g of 4-fluorobenzenetrifluoride in 28.06 g of N-methyl-2-pyrrolidinone j was added dropwise, and the mixture was further stirred for 20 hours. The synthesized - aromatic polyetherethersulfone was cooled to room temperature, and then filtrated to ) recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10.
Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and dried under vacuum at 85°C for 1 day. Thus, the aromatic polyether capped with the substituent, which was used in the present invention, was obtained. When GPC analysis of the obtained aromatic polyetherethersulfone (corresponding to formula (1-5)) was performed, the weight average molecular weight in terms of standard polystyrene was 17,300.
[0042] Synthesis Example 7
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 94.26 g of 4,4°- difluorobenzophenone, 44.88 g of tert-butylhydroquinone, 33.52 g of methylhydroquinone, 82.10 g of potassium carbonate, and 764.27 g of
N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 140°C and the reaction was performed for 20 hours. The synthesized aromatic polyetheretherketone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed - solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification. :
Thereafter, the obtained precipitate was washed with methanol and water and dried under vacuum at 85°C for 1 day. Thus, the aromatic polyether capped with the substituent, which was used in the present invention, was obtained. When GPC analysis of the obtained aromatic polyetheretherketone (corresponding to formula (1-6)) was performed, the weight average molecular weight in terms of standard polystyrene was 15,200. .
[0043] Synthesis Example 8 ;
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 14.07 g of 4,4’-dichlorodiphenylsulfone, 8.40 g of 1,1-bis(4-hydroxyphenyl)hexafluoropropane, 6.71 g of 1,1-bis(4-hydroxyphenyl)cyclohexane, 20.75 g of potassium carbonate, and 87.68 g of
N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160°C and the reaction was performed for 20 : hours. The synthesized aromatic polyetherethersulfone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and dried under vacuum at 85°C for 1 day. Thus, the aromatic polyetherethersulfone (corresponding to formula (1-7)) used in the present invention was obtained. When
GPC analysis of the aromatic polyether was performed, the weight average molecular weight in terms of standard polystyrene was 43,000.
[0044] Synthesis Example 9
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a : dropping tank, 74.19 g of 4,4’- difluorobenzophenone, 94.14 g of 2,2-bis(4-hydroxyphenylhexafluoropropane, 18.26 g of trimethylhydroquinone, 60.81 g of potassium carbonate, and 742.22 g of N-methyl-2-pyrrolidinone were added.
Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 140°C and the reaction was performed for 20 hours. The synthesized aromatic polyetheretherketone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification. ’
Thereafter, the obtained precipitate was washed with methanol and water and dried . under vacuum at 85° for 1 day. Thus, the aromatic polyetheretherketone (corresponding to formula (1-8)) used in the present invention was obtained. When GPC analysis of the aromatic polyether was performed, the weight average molecular weight in terms of standard polystyrene was 24,700.
[0045] Synthesis Example 10
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a dropping tank, 40.42 g of 4,4’- difluorobenzophenone, 73.97 g of 2,2-bis(4-hydroxyphenyl)hexafluoropropane, 4.03 g of : 2,2-bis(4-hydroxy-3,5-dihydroxymethylphenyl)propane, 32.01 g of potassium carbonate, : and 752.16 g of N-methyl-2-pyrrolidinone. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 140°C and the reaction was performed for 20 hours. The synthesized aromatic polyetheretherketone was cooled to room temperature, and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and dried under vacuum at 85°C for 1 day. Thus, the aromatic polyetheretherketone
{corresponding to formula (1-9)) used in the present invention was obtained. When :
GPC analysis of the somate polyether was performed, the weight average molecular weight in terms of standard polystyrene was 19,000.
[0046] Comparative Synthesis Example 1
To a flask equipped with a stirring device, a reflux condenser, a thermometer, and a : dropping tank, 15.00 g of 4,4’-dichlorodiphenyl-sulfone, 12.56 g of 2,2-bis(4-hydroxyphenyl)propane, 8.37 g of potassium carbonate, and 82.61 g of )
N-methyl-2-pyrrolidinone were added. Thereafter, the air in the flask was replaced with nitrogen, and then the flask was heated to 160° and the reaction was performed for 20 hours. The synthesized aromatic polyetherethersulfone was cooled to room temperature, . and then filtrated to recover the filtrate. The filtrate was mixed with 30 ml of a mixed solution in which a volume ratio of N-methyl-2-pyrrolidinone and 2 mol/l hydrochloric : acid was 90:10. Thereafter, the mixed solution was poured into methanol to perform reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and dried under vacuum at 85° for 1 day. Thus, the aromatic polyetherethersulfone (corresponding to formula (2-1) used in Comparative Example 1 was obtained. When :
GPC analysis of the aromatic polyether was performed, the weight average molecular weight in terms of standard polystyrene was 16,700. : i . 0 C 0 Formula (2-1) : _ OFOO 0)
[0047] Comparative Synthesis Example 2
Polymethylmethacrylate that is a commercially available product and a synthesized acrylic resin (manufactured by Wako Pure Chemical Industries, Ltd.) was prepared.
[0048] (Evaluation of solvent solubility)
To 5 parts by mass of the aromatic polyethers obtained in Synthesis Examples 1 to 10 and Comparative Synthesis Example 1 and the acrylic resin in Comparative Synthesis
Example 2, each of 95 parts by mass of (1) propylene glycol monomethyl ether (PGME),
(2) propylene glycol monomethyl ether acetate (PGMEA), (3) ethyl lactate (EL), (4) cyclohexanone (Cy), (5) N-methyl-2-pyrrolidinone (NMP), (6) dimethylacetamide (DMAC), (7) 4-methyl2-pentanone (MIBK), (8) 5-methyl-2-hexanone (MIAK), (9) ethyl E acetoacetate (EAA), (10) gamma-butyrolactone (GBL), and (11) cyclopentanone (Cp) was added to evaluate the solubility.
The results are shown in Table 1. © indicates dissolved; A indicates slightly dissolved; and x indicates hardly dissolved. :
[0049] Table 1 olofel@lele|lo[®]o|ao[dn] bamper |2] [alee felalalo]ole
Example 1
Synthesis
Smpez [2] [aoe lofalalofo]o
Fmpies [2 0 [af o]ofofalalefo].
Example 3 pampes | * | x | xo fofo ll x]xlalo
Synthesis amples |*| oxo fololalalofo)e [ames fo lafofolelolelo]o le]
Example 6
Synthesis
Emptor || % | [ooo |x xxx]
Bremen | > |< [x [oe x]x]xlolo]
Synthesis mies | * | © |x| oe lofololx]a]e] puampieto | ©] © ooo jo olofo]e le]
Example 10
Comparative
Synthesis x x x X x x % x i
Example 1
Comparative
Synthesis
Example 2
[0050] The aromatic polyethers obtained in Synthesis Examples 1 to 10 had solubility similar to that of the acrylic resin used as Comparative Synthesis Example 2 and had solubility higher than that of the polysulfone obtained in Comparative Synthesis
Example 1.
[0051] (Evaluation of thermostability)
Thermostability of the aromatic polyethers obtained in Synthesis Examples 1 to 10 and Comparative Synthesis Example 1 and the polymethylmethacrylate used as
Comparative Synthesis Example 2 was evaluated based on a temperature generating 5% : mass reduction determined by using TG-DTA (manufactured by Bruker AXS,
TG/DTA20108R) in a temperature rising of 10°C/minute. The results are shown in
Table 2.
[0052] Table2 5% mass reduction temperature
Synthesis Example 1 }
Synthesis Example 4
Synthesis Example 6 .
Synthesis Example 7 477°C 491°C
Synthesis Example 10 . 300°C
Comparative Synthesis Example 2 f0053] Similar to the aromatic polyether in Comparative Synthesis Example 1, the aromatic polyethers obtained in Synthesis Examples 1 to 10 used in the present invention had 5% mass reduction temperature exceeding 450°C, and indicated higher thermostability compared to the acrylic resin in Comparative Synthesis Example 2.
[0054] (Preparation of adhesive composition)
Each adhesive composition was prepared in the following compositions using the aromatic polyethers obtained in Synthesis Examples 1 to 10 and Comparative Synthesis
Example 1 and the acrylic resin in Comparative Synthesis Example 2.
[0055] Example 1
The aromatic polyether obtained in Synthesis Example 1 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content. :
[0056] Example 2 .
The aromatic polyether obtained in Synthesis Example 2 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0057] Example 3
The aromatic polyether obtained in Synthesis Example 3 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0058] Example 4
The aromatic polyether obtained in Synthesis Example 4 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content. {0059] Example 5
The aromatic polyether obtained in Synthesis Example 5 was dissolved into - cyclohexanone to prepare an adhesive composition containing 20% by mass of solid ) content. )
[0060] Example 6
The aromatic polyether obtained in Synthesis Example 6 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0061] Example 7
The aromatic polyether obtained in Synthesis Example 7 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0062] Example 8
The aromatic polyether obtained in Synthesis Example 8 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0063] Example 9
The aromatic polyether obtained in Synthesis Example 9 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0064] Example 10
The aromatic polyether obtained in Synthesis Example 10 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid ; content.
[0065] Example 11
To the aromatic polyether obtained in Synthesis Example 10, 5% by mass of Cymel 303 (a cross-linker) was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0066] Example 12
To the aromatic polyether obtained in Synthesis Example 7, 5% by mass of
Pinecrystal KE100 (a plasticizer, manufactured by ARAKAWA CHEMICAL
INDUSTRIES, LTD., trade name, its component is an esterified rosin resin) was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0067] Comparative Example 1
The aromatic polyether obtained in Comparative Synthesis Example 1 was dissolved into N-methyl-2-pytrolidinone to prepare an adhesive composition containing 10% by mass of solid content.
[0068] Comparative Example 2
The polymethylmethacrylate in Comparative Synthesis Example 2 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid content.
[0069] (Evaluation of coating property)
Films were formed in such a manner that each of the adhesive compositions obtained in Examples 1 to 12 and Comparative Example 1 and Comparative Example 2 : was coated by spin coating on a silicon wafer under coating conditions of 1,000 rpm and seconds, and then the coated wafer was baked at 100°C and 250°C each for 2 minutes.
Then, the films were evaluated. The results are shown in Table 3.
[0070] Table 3
Example 5
Example 6
Example 7
Example 8
Example 9
Example 10 oo
Example 11
Example 12
Comparative Example] | Poor [ -
Comparative Example 2 :
[0071] While the adhesive composition prepared in Comparative Example 1 was not able to form a uniform film because of generated coating failure, any of the adhesive compositions of the aromatic polyethers prepared in Examples 1 to 12 of the present invention and the acrylic resin used in Comparative Synthesis Example 2 were ) able to form uniform films having a thickness of 1 um or more. } {0072] (Evaluation of adhesion property)
A coating film was formed on a silicon wafer in such a manner that each of the adhesive compositions obtained in Examples 1 to 12 and Comparative Example 1 and
Comparative Example 2 was coated on the silicon wafer under coating conditions of 1,000 rpm and 30 seconds, and then the coated wafer was baked at each 100°C and 250°C each for 2 minutes. A 2-cm-square piece was cut out from the silicon wafer, and the cutout silicon wafer was placed on a glass wafer, which had been placed in advance on a hot plate of 270°C, such that the coated surface faced downward. The placed silicon wafer was pressurized from above to be bonded and an adhesion property of the } bonded silicon wafer was evaluated. The results are shown in Table 4. The case that the wafer is adhered with no voids (holes) formed seen from the glass wafer surface is determined as good.
[0073] Table4 :
Adnesionstate :
: i
[0074] While the adhesive composition obtained in Comparative Example 1 generated adhesion failure and was not able to uniformly adhere, the adhesive : compositions of the present invention in Examples 1 to 12 and the adhesive composition : in Comparative Example 2 showed the excellent adhesion property.
[0075] (Preparation of sample for evaluating adhesion force)
Samples for evaluating adhesion force of the aromatic polyether prepared in
Synthesis Example 7 and Synthesis Example 9 and the acrylic resin in Comparative
Synthesis Example 2 were prepared by the following method.
[0076] Example 13
The aromatic polyether obtained in Synthesis Example 7 was dissolved into cyclohexanone to prepare an adhesive composition containing 27% by mass of solid content. A film having a thickness of 5.5 pm was formed in such a manner that the obtained adhesive composition was coated by spin coating on a silicon wafer of 4 inches under coating conditions of 1,500 rpm and 60 seconds, and then the coated wafer was baked at 100° C and 230°C each for 2 minutes. Thereafter, the silicon wafer was adhered to a glass wafer of 4 inches through the film under conditions of a degree of vacuum of 10 Pa or less, a temperature of 250°C, and a lamination pressure of 300 Kg using a lamination device (VJ-300, manufactured by Ayumi Industries Company Limited).
The wafer was cut into 1-cm-square pieces to prepare samples using a dicing device (DAD 321, manufactured by DISCO Corporation).
[0077] Example 14
The aromatic polyether obtained in Synthesis Example 9 was dissolved into : cyclohexanone to prepare an adhesive composition containing 27% by mass of solid content. A film having a thickness of 4.9 um was formed in such a manner that the obtained adhesive composition was coated by spin coating on a silicon wafer of 4 inches under coating conditions of 1,500 rpm and 60 seconds, and then the coated wafer was baked at 100°C and 230°C each for 2 minutes. Thereafter, the silicon wafer was adhered to a glass wafer of 4 inches through the film under conditions of a degree of vacuum of 10 Pa or less, a temperature of 270°C, and a lamination pressure of 300 Kg using a lamination device (VJ-300, manufactured by Ayumi Industries Company Limited).
The wafer was cut into 1-cm-square pieces to prepare samples using a dicing device (DAD 321, manufactured by DISCO Corporation).
[0078] Comparative Example 3
The acrylic resin in Comparative Synthesis Example 2 was dissolved into cyclohexanone to prepare an adhesive composition containing 20% by mass of solid : content. A film having a thickness of 5.0 um was formed in such a manner that the - obtained adhesive composition was coated by spin coating on a silicon wafer of 4 inches under coating conditions of 1,300 rpm and 60 seconds, and then the coated wafer was baked at 100°C and 200°C each for 2 minutes. Thereafter, the silicon wafer is adhered to a glass wafer of 4 inches through the film under conditions of a degree of vacuum of 10 Pa or less, a temperature of 270°C, and a lamination pressure of 400 Kg using a lamination device (VJ-300, manufactured by Ayumi Industries Company Limited). The wafer was cut into 1-cm square pieces to prepare samples using a dicing saw (DAD 321, manufactured by DISCO Corporation).
[0079] (Evaluation of adhesion force 1)
Araldite 2014 (trade name, manufactured by Huntsman Advanced Materials) was applied to both surfaces of the samples for evaluating adhesion force, which were obtained in Examples 13 and 14 and Comparative Example 3. After both surfaces of each sample were adhered to a dedicated jig for measuring adhesion force (shear), the adhesion force (shear) was evaluated using Autograph (Autograph AGS-100NX, manufactured by Shimadzu Corporation). The adhesion force was measured at a tensile speed of 1 mm/minute. The results are shown in Table 5.
[0080] Table5 i
[0081] In Table 5, a value of the adhesion force being 1,000 N or more means that the adhesion force is equal to or more than measurement limit of the adhesion force measurement device.
[0082] The samples obtained in Example 13 and Example 14 indicated adhesion force higher than that of the sample obtained in Comparative Example 3.
[0083] (Evaluation of adhesion force 2)
The samples for evaluating adhesion force, which were obtained in Examples 13 and 14 and Comparative Example 3, were placed on a hot plate heated at 350°C for 1 hour, and then Araldite 2014 (trade name, manufactured by Huntsman Advanced
Materials) was applied to the samples. After both surfaces of each sample were adhered to a dedicated jig for measuring adhesion shear force, the adhesion force (shear) was evaluated using Autograph (Autograph AGS-100NX, manufactured by Shimadzu
Corporation). The adhesion force was measured at a tensile speed of 1 mm/minute.
The results are shown in Table 6.
[0084] Table 6 [Adhesion force (shear)
[0085] In Table 6, a value of the adhesion force being 1,000 N or more means that the adhesion force is equal to or more than measurement limit of the adhesion force measurement device.
[0086] While the adhesion forces of the samples obtained in Example 13 and
Example 14 remained high, the adhesion force of the sample obtained in Comparative
Example 3 decreased.
[0087] A highly thermostable adhesive composition can be provided that dissolves easily into various organic solvents and that can form an adhesive layer with an excellent coating property and sufficient thickness, in which the adhesive layer has an extremely small thermogravimetry loss in thermal processes such as metal bump bonding, :
CVD, ion diffusion process, and the like and has excellent adhesion.
Claims (16)
1. An adhesive composition comprising: a polymer that contains a unit structure of Formula (1): +Ar—x—A-0—T'-0F— Formula (1) (where X is a sulfonyl group or a carbonyl group; Ar’ and Ar? each are a Ce.30 arylene group; and T' is a fluoroalkylene group, a cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group optionally having a substituent : and a fluoroalkylene group or a cyclic alkylene group).
2. The adhesive composition according to claim 1, wherein the arylene group is a phenylene group, a naphthylene group, or an anthrylene group.
3. The adhesive composition according to claim 1 or 2, wherein the polymer is a homopolymer containing one unit structure.
4. The adhesive composition according to claim 1 or 2, wherein the polymer is a copolymer containing at least two unit structures.
5. The adhesive composition according to any one of claims 1 to 4, comprising: a polymer that contains the unit structure of Formula (1) with Ar! and Ar? each being a group of Formula (2): 1 7 Jn1 : cn IZ ormula (2) (where R! is a C1.1g alkyl group, a C;.4 fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these, and nl is an integer of 0 to 4). .
6. The adhesive composition according to any one of claims 1 to 5, comprising: a polymer that contains the unit structure of Formula (1) with T' being a group of Formula (3), the unit structure of Formula (1) with T' being a group of Formula (4), or a combination of the unit structures: 2 Na nz ns (R*) ns CA = J. — _ REI - 3 : “ 7 Formula (3) Formula (4) (where R%, R?, and R* each are a C.1¢ alkyl group, a Cy fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these; n2, n3, and n4 each are an integer of 0 to 4; and T? is a fluoroalkylene group, a cyclic alkylene group, or a combination of these).
7. The adhesive composition according to claim 6, wherein, in Formula (3), R? includes at least a group containing a tertiary-carbon structure, and n2 is an integer of 1 to .
8. The adhesive composition according to any one of claims 1, 2, and 4 to 7, further comprising: a polymer that contains a unit structure of Formula (5): al-x—ar' ~0—T3—04— Formula (5) : (where X is a sulfonyl group or a carbonyl group; Ar® and Ar? each are Cg.3 arylene group; and T? isan alkylene group, a sulfonyl group, a carbonyl group, a Cg.30 arylene group, or a combination of these). .
9. The adhesive composition according to claim 8, wherein the arylene group is a phenylene group, a naphthylene group, or an anthrylene group. :
10. The adhesive composition according to claim 8 or 9, wherein T° is a group of g Formula (6): ; a ) nb r nb —t > rf : Formula (6) ; (where R® and R® each are a Cy.19 alkyl group, a C14 fluoroalkyl group, a hydroxy group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxy group, a group containing a tertiary-carbon structure, a cyclic alkyl group, or a combination of these; nS and n6 each are an integer of 0 to 4; T* is alkylene group, a sulfonyl group, a carbonyl group, a Ce.39 arylene group, or a combination of these).
11. The adhesive composition according to any one of claims 1 to 10, wherein the group containing a tertiary-carbon structure is a tertiary butyl group.
12. The adhesive composition according to any one of claims 1 to 11, wherein the polymer has a weight average molecular weight of 500 to 5,000,000.
13. The adhesive composition according to any one of claims 1 to 12, further comprising a cross-linker.
14. The adhesive composition according to any one of claims 1 to 13, further comprising:
solvent, wherein : the adhesive composition has a viscosity of 0.001 to 5,000 Pa-s. 1
15. A laminate comprising: at least two adhered articles, and an adhesive layer that is provided between the adhered articles, is formed from the adhesive composition according to any one of claims 1 to 14, and has a thickness of 0.1 pm to 200 pm.
16. The laminate according to claim 15, wherein the adhered articles each are - selected from the group consisting of a silicon substrate, a glass substrate, a resin substrate, or a ceramic substrate. :
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PCT/JP2011/067677 WO2012020665A1 (en) | 2010-08-10 | 2011-08-02 | Adhesive composition comprising aromatic polyether derivative |
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KR (1) | KR101929835B1 (en) |
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CN109679089A (en) * | 2018-12-29 | 2019-04-26 | 福州通尔达电线电缆有限公司 | A kind of polyether-ether-ketone and its synthetic method containing nitrogen, sulphur cooperative flame retardant material |
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WO1986004079A1 (en) * | 1985-01-04 | 1986-07-17 | Raychem Corporation | Compositions of poly(imides) having phenylindane diamines and/or dianhydride moieties in the poly(imide) backbone |
EP0467847A1 (en) * | 1990-07-20 | 1992-01-22 | Ciba-Geigy Ag | Polyarylene ether with tetraphenylethylene units |
DE4306708A1 (en) * | 1993-03-04 | 1994-09-08 | Basf Ag | Molding compositions based on polyarylene ethers with anhydride groups |
JP2004018739A (en) * | 2002-06-18 | 2004-01-22 | Nitto Denko Corp | Adhesive composition and flexible printed circuit board formed from the same composition |
JP2005264008A (en) * | 2004-03-19 | 2005-09-29 | Toyobo Co Ltd | Crosslinkable sulfo-containing polyarylene ether compound |
JP5532203B2 (en) * | 2009-06-03 | 2014-06-25 | 日産化学工業株式会社 | Adhesive composition |
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