JPWO2012020665A1 - Adhesive composition containing aromatic polyether derivative - Google Patents
Adhesive composition containing aromatic polyether derivative Download PDFInfo
- Publication number
- JPWO2012020665A1 JPWO2012020665A1 JP2012528646A JP2012528646A JPWO2012020665A1 JP WO2012020665 A1 JPWO2012020665 A1 JP WO2012020665A1 JP 2012528646 A JP2012528646 A JP 2012528646A JP 2012528646 A JP2012528646 A JP 2012528646A JP WO2012020665 A1 JPWO2012020665 A1 JP WO2012020665A1
- Authority
- JP
- Japan
- Prior art keywords
- group
- adhesive composition
- carbon atoms
- composition according
- methyl
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000853 adhesive Substances 0.000 title claims abstract description 114
- 230000001070 adhesive effect Effects 0.000 title claims abstract description 114
- 239000000203 mixture Substances 0.000 title claims abstract description 101
- 125000003118 aryl group Chemical group 0.000 title description 67
- 229920000570 polyether Polymers 0.000 title description 41
- 239000004721 Polyphenylene oxide Substances 0.000 title description 38
- 229920000642 polymer Polymers 0.000 claims abstract description 56
- 125000004432 carbon atom Chemical group C* 0.000 claims abstract description 44
- 125000000732 arylene group Chemical group 0.000 claims abstract description 35
- 125000002947 alkylene group Chemical group 0.000 claims abstract description 29
- 239000012790 adhesive layer Substances 0.000 claims abstract description 21
- 125000001424 substituent group Chemical group 0.000 claims abstract description 18
- 125000004122 cyclic group Chemical group 0.000 claims abstract description 17
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims abstract description 13
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims abstract description 13
- 229920001577 copolymer Polymers 0.000 claims abstract description 11
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims abstract description 8
- 125000004653 anthracenylene group Chemical group 0.000 claims abstract description 6
- 125000004957 naphthylene group Chemical group 0.000 claims abstract description 6
- 229920001519 homopolymer Polymers 0.000 claims abstract description 5
- 229920005989 resin Polymers 0.000 claims description 40
- 239000011347 resin Substances 0.000 claims description 40
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims description 22
- 239000000758 substrate Substances 0.000 claims description 19
- 125000000217 alkyl group Chemical group 0.000 claims description 18
- 239000003431 cross linking reagent Substances 0.000 claims description 16
- 125000003709 fluoroalkyl group Chemical group 0.000 claims description 15
- 229910052710 silicon Inorganic materials 0.000 claims description 14
- 239000010703 silicon Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 13
- 125000002252 acyl group Chemical group 0.000 claims description 13
- 125000004423 acyloxy group Chemical group 0.000 claims description 13
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 13
- 239000002904 solvent Substances 0.000 claims description 13
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 claims description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims description 12
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims description 11
- 125000003277 amino group Chemical group 0.000 claims description 10
- 239000011521 glass Substances 0.000 claims description 10
- 125000005336 allyloxy group Chemical group 0.000 claims description 9
- 125000004093 cyano group Chemical group *C#N 0.000 claims description 9
- 125000000449 nitro group Chemical group [O-][N+](*)=O 0.000 claims description 9
- 125000000484 butyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 claims description 4
- 239000000919 ceramic Substances 0.000 claims description 3
- 238000000034 method Methods 0.000 abstract description 15
- 239000003960 organic solvent Substances 0.000 abstract description 6
- 238000009792 diffusion process Methods 0.000 abstract description 5
- 229910052751 metal Inorganic materials 0.000 abstract description 5
- 239000002184 metal Substances 0.000 abstract description 5
- 230000004580 weight loss Effects 0.000 abstract description 5
- 101100386054 Saccharomyces cerevisiae (strain ATCC 204508 / S288c) CYS3 gene Proteins 0.000 abstract 1
- 101150035983 str1 gene Proteins 0.000 abstract 1
- -1 fluoromethylene group Chemical group 0.000 description 184
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 66
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 57
- 230000015572 biosynthetic process Effects 0.000 description 48
- 238000003786 synthesis reaction Methods 0.000 description 48
- JHIVVAPYMSGYDF-UHFFFAOYSA-N cyclohexanone Chemical compound O=C1CCCCC1 JHIVVAPYMSGYDF-UHFFFAOYSA-N 0.000 description 36
- 230000000052 comparative effect Effects 0.000 description 31
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 22
- 150000001875 compounds Chemical class 0.000 description 22
- BWHMMNNQKKPAPP-UHFFFAOYSA-L potassium carbonate Chemical compound [K+].[K+].[O-]C([O-])=O BWHMMNNQKKPAPP-UHFFFAOYSA-L 0.000 description 22
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 21
- 239000007787 solid Substances 0.000 description 21
- 229920005649 polyetherethersulfone Polymers 0.000 description 16
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 14
- 239000004793 Polystyrene Substances 0.000 description 13
- 229910052757 nitrogen Inorganic materials 0.000 description 13
- 229920002223 polystyrene Polymers 0.000 description 13
- 238000004458 analytical method Methods 0.000 description 12
- 239000004696 Poly ether ether ketone Substances 0.000 description 11
- 239000000706 filtrate Substances 0.000 description 11
- 239000011259 mixed solution Substances 0.000 description 11
- 229920002530 polyetherether ketone Polymers 0.000 description 11
- 229910000027 potassium carbonate Inorganic materials 0.000 description 11
- 239000002244 precipitate Substances 0.000 description 11
- 238000000746 purification Methods 0.000 description 11
- 238000001226 reprecipitation Methods 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000004925 Acrylic resin Substances 0.000 description 10
- 229920000178 Acrylic resin Polymers 0.000 description 10
- 238000011156 evaluation Methods 0.000 description 10
- 239000003054 catalyst Substances 0.000 description 9
- 239000000047 product Substances 0.000 description 9
- GPAPPPVRLPGFEQ-UHFFFAOYSA-N 4,4'-dichlorodiphenyl sulfone Chemical compound C1=CC(Cl)=CC=C1S(=O)(=O)C1=CC=C(Cl)C=C1 GPAPPPVRLPGFEQ-UHFFFAOYSA-N 0.000 description 8
- 229920003270 Cymel® Polymers 0.000 description 8
- LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 8
- 238000006243 chemical reaction Methods 0.000 description 8
- 238000004132 cross linking Methods 0.000 description 8
- LZCLXQDLBQLTDK-UHFFFAOYSA-N ethyl 2-hydroxypropanoate Chemical compound CCOC(=O)C(C)O LZCLXQDLBQLTDK-UHFFFAOYSA-N 0.000 description 8
- JDSHMPZPIAZGSV-UHFFFAOYSA-N melamine Chemical compound NC1=NC(N)=NC(N)=N1 JDSHMPZPIAZGSV-UHFFFAOYSA-N 0.000 description 8
- 239000004065 semiconductor Substances 0.000 description 8
- FFWSICBKRCICMR-UHFFFAOYSA-N 5-methyl-2-hexanone Chemical compound CC(C)CCC(C)=O FFWSICBKRCICMR-UHFFFAOYSA-N 0.000 description 7
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 7
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 7
- RSWGJHLUYNHPMX-UHFFFAOYSA-N Abietic-Saeure Natural products C12CCC(C(C)C)=CC2=CCC2C1(C)CCCC2(C)C(O)=O RSWGJHLUYNHPMX-UHFFFAOYSA-N 0.000 description 6
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 6
- KHPCPRHQVVSZAH-HUOMCSJISA-N Rosin Natural products O(C/C=C/c1ccccc1)[C@H]1[C@H](O)[C@@H](O)[C@@H](O)[C@@H](CO)O1 KHPCPRHQVVSZAH-HUOMCSJISA-N 0.000 description 6
- ZFVMWEVVKGLCIJ-UHFFFAOYSA-N bisphenol AF Chemical compound C1=CC(O)=CC=C1C(C(F)(F)F)(C(F)(F)F)C1=CC=C(O)C=C1 ZFVMWEVVKGLCIJ-UHFFFAOYSA-N 0.000 description 6
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 6
- 229920003986 novolac Polymers 0.000 description 6
- KHPCPRHQVVSZAH-UHFFFAOYSA-N trans-cinnamyl beta-D-glucopyranoside Natural products OC1C(O)C(O)C(CO)OC1OCC=CC1=CC=CC=C1 KHPCPRHQVVSZAH-UHFFFAOYSA-N 0.000 description 6
- PFSUALBMVZDPBQ-UHFFFAOYSA-N F.F.F.FC1=CC=CC=C1 Chemical compound F.F.F.FC1=CC=CC=C1 PFSUALBMVZDPBQ-UHFFFAOYSA-N 0.000 description 5
- 238000012644 addition polymerization Methods 0.000 description 5
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 5
- 238000000576 coating method Methods 0.000 description 5
- GYZLOYUZLJXAJU-UHFFFAOYSA-N diglycidyl ether Chemical group C1OC1COCC1CO1 GYZLOYUZLJXAJU-UHFFFAOYSA-N 0.000 description 5
- 125000004029 hydroxymethyl group Chemical group [H]OC([H])([H])* 0.000 description 5
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 5
- 239000002253 acid Substances 0.000 description 4
- ORILYTVJVMAKLC-UHFFFAOYSA-N adamantane Chemical compound C1C(C2)CC3CC1CC2C3 ORILYTVJVMAKLC-UHFFFAOYSA-N 0.000 description 4
- AOJOEFVRHOZDFN-UHFFFAOYSA-N benzyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC1=CC=CC=C1 AOJOEFVRHOZDFN-UHFFFAOYSA-N 0.000 description 4
- 238000010538 cationic polymerization reaction Methods 0.000 description 4
- 239000003795 chemical substances by application Substances 0.000 description 4
- 125000003700 epoxy group Chemical group 0.000 description 4
- XYIBRDXRRQCHLP-UHFFFAOYSA-N ethyl acetoacetate Chemical compound CCOC(=O)CC(C)=O XYIBRDXRRQCHLP-UHFFFAOYSA-N 0.000 description 4
- 125000000524 functional group Chemical group 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000178 monomer Substances 0.000 description 4
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 4
- 239000003208 petroleum Substances 0.000 description 4
- 239000003505 polymerization initiator Substances 0.000 description 4
- 239000007870 radical polymerization initiator Substances 0.000 description 4
- 239000000243 solution Substances 0.000 description 4
- 238000004528 spin coating Methods 0.000 description 4
- 150000003505 terpenes Chemical class 0.000 description 4
- 235000007586 terpenes Nutrition 0.000 description 4
- JOXIMZWYDAKGHI-UHFFFAOYSA-N toluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1 JOXIMZWYDAKGHI-UHFFFAOYSA-N 0.000 description 4
- LSQARZALBDFYQZ-UHFFFAOYSA-N 4,4'-difluorobenzophenone Chemical compound C1=CC(F)=CC=C1C(=O)C1=CC=C(F)C=C1 LSQARZALBDFYQZ-UHFFFAOYSA-N 0.000 description 3
- 241001050985 Disco Species 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 3
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Chemical compound NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 3
- 150000008065 acid anhydrides Chemical class 0.000 description 3
- 125000004849 alkoxymethyl group Chemical group 0.000 description 3
- 150000001412 amines Chemical class 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 3
- BGTOWKSIORTVQH-UHFFFAOYSA-N cyclopentanone Chemical compound O=C1CCCC1 BGTOWKSIORTVQH-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- USIUVYZYUHIAEV-UHFFFAOYSA-N diphenyl ether Chemical compound C=1C=CC=CC=1OC1=CC=CC=C1 USIUVYZYUHIAEV-UHFFFAOYSA-N 0.000 description 3
- 239000003822 epoxy resin Substances 0.000 description 3
- 229940116333 ethyl lactate Drugs 0.000 description 3
- 125000005843 halogen group Chemical group 0.000 description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 3
- 239000010410 layer Substances 0.000 description 3
- FPYJFEHAWHCUMM-UHFFFAOYSA-N maleic anhydride Chemical compound O=C1OC(=O)C=C1 FPYJFEHAWHCUMM-UHFFFAOYSA-N 0.000 description 3
- FQPSGWSUVKBHSU-UHFFFAOYSA-N methacrylamide Chemical group CC(=C)C(N)=O FQPSGWSUVKBHSU-UHFFFAOYSA-N 0.000 description 3
- 125000004184 methoxymethyl group Chemical group [H]C([H])([H])OC([H])([H])* 0.000 description 3
- UTSYWKJYFPPRAP-UHFFFAOYSA-N n-(butoxymethyl)prop-2-enamide Chemical compound CCCCOCNC(=O)C=C UTSYWKJYFPPRAP-UHFFFAOYSA-N 0.000 description 3
- 125000001624 naphthyl group Chemical group 0.000 description 3
- 125000000962 organic group Chemical group 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 3
- 239000004014 plasticizer Substances 0.000 description 3
- 229920003229 poly(methyl methacrylate) Polymers 0.000 description 3
- 229920006122 polyamide resin Polymers 0.000 description 3
- 229920000647 polyepoxide Polymers 0.000 description 3
- 239000004926 polymethyl methacrylate Substances 0.000 description 3
- 229920002050 silicone resin Polymers 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- ARXJGSRGQADJSQ-UHFFFAOYSA-N 1-methoxypropan-2-ol Chemical compound COCC(C)O ARXJGSRGQADJSQ-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- HIDBROSJWZYGSZ-UHFFFAOYSA-N 1-phenylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1=CC=CC=C1 HIDBROSJWZYGSZ-UHFFFAOYSA-N 0.000 description 2
- VILCJCGEZXAXTO-UHFFFAOYSA-N 2,2,2-tetramine Chemical compound NCCNCCNCCN VILCJCGEZXAXTO-UHFFFAOYSA-N 0.000 description 2
- YNDCPHMNPGEGLV-UHFFFAOYSA-N 2-[(2-amino-1-methylcyclohexyl)methyl]-2-methylcyclohexan-1-amine Chemical compound C1CCCC(N)C1(C)CC1(C)CCCCC1N YNDCPHMNPGEGLV-UHFFFAOYSA-N 0.000 description 2
- AOBIOSPNXBMOAT-UHFFFAOYSA-N 2-[2-(oxiran-2-ylmethoxy)ethoxymethyl]oxirane Chemical compound C1OC1COCCOCC1CO1 AOBIOSPNXBMOAT-UHFFFAOYSA-N 0.000 description 2
- WXHLLJAMBQLULT-UHFFFAOYSA-N 2-[[6-[4-(2-hydroxyethyl)piperazin-1-yl]-2-methylpyrimidin-4-yl]amino]-n-(2-methyl-6-sulfanylphenyl)-1,3-thiazole-5-carboxamide;hydrate Chemical compound O.C=1C(N2CCN(CCO)CC2)=NC(C)=NC=1NC(S1)=NC=C1C(=O)NC1=C(C)C=CC=C1S WXHLLJAMBQLULT-UHFFFAOYSA-N 0.000 description 2
- 125000004182 2-chlorophenyl group Chemical group [H]C1=C([H])C(Cl)=C(*)C([H])=C1[H] 0.000 description 2
- VHSHLMUCYSAUQU-UHFFFAOYSA-N 2-hydroxypropyl methacrylate Chemical compound CC(O)COC(=O)C(C)=C VHSHLMUCYSAUQU-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 2
- RNLHGQLZWXBQNY-UHFFFAOYSA-N 3-(aminomethyl)-3,5,5-trimethylcyclohexan-1-amine Chemical compound CC1(C)CC(N)CC(C)(CN)C1 RNLHGQLZWXBQNY-UHFFFAOYSA-N 0.000 description 2
- OECTYKWYRCHAKR-UHFFFAOYSA-N 4-vinylcyclohexene dioxide Chemical compound C1OC1C1CC2OC2CC1 OECTYKWYRCHAKR-UHFFFAOYSA-N 0.000 description 2
- NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
- 229920003319 Araldite® Polymers 0.000 description 2
- SDDLEVPIDBLVHC-UHFFFAOYSA-N Bisphenol Z Chemical compound C1=CC(O)=CC=C1C1(C=2C=CC(O)=CC=2)CCCCC1 SDDLEVPIDBLVHC-UHFFFAOYSA-N 0.000 description 2
- RPNUMPOLZDHAAY-UHFFFAOYSA-N Diethylenetriamine Chemical compound NCCNCCN RPNUMPOLZDHAAY-UHFFFAOYSA-N 0.000 description 2
- PEEHTFAAVSWFBL-UHFFFAOYSA-N Maleimide Chemical compound O=C1NC(=O)C=C1 PEEHTFAAVSWFBL-UHFFFAOYSA-N 0.000 description 2
- 229920000877 Melamine resin Polymers 0.000 description 2
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 description 2
- LSDPWZHWYPCBBB-UHFFFAOYSA-N Methanethiol Chemical group SC LSDPWZHWYPCBBB-UHFFFAOYSA-N 0.000 description 2
- NTIZESTWPVYFNL-UHFFFAOYSA-N Methyl isobutyl ketone Chemical compound CC(C)CC(C)=O NTIZESTWPVYFNL-UHFFFAOYSA-N 0.000 description 2
- VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 2
- FXHOOIRPVKKKFG-UHFFFAOYSA-N N,N-Dimethylacetamide Chemical compound CN(C)C(C)=O FXHOOIRPVKKKFG-UHFFFAOYSA-N 0.000 description 2
- CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 2
- NQRYJNQNLNOLGT-UHFFFAOYSA-N Piperidine Chemical compound C1CCNCC1 NQRYJNQNLNOLGT-UHFFFAOYSA-N 0.000 description 2
- 239000004952 Polyamide Substances 0.000 description 2
- 239000002202 Polyethylene glycol Substances 0.000 description 2
- BGNXCDMCOKJUMV-UHFFFAOYSA-N Tert-Butylhydroquinone Chemical compound CC(C)(C)C1=CC(O)=CC=C1O BGNXCDMCOKJUMV-UHFFFAOYSA-N 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
- 125000001931 aliphatic group Chemical group 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- IMUDHTPIFIBORV-UHFFFAOYSA-N aminoethylpiperazine Chemical compound NCCN1CCNCC1 IMUDHTPIFIBORV-UHFFFAOYSA-N 0.000 description 2
- 150000008064 anhydrides Chemical class 0.000 description 2
- UHOVQNZJYSORNB-UHFFFAOYSA-N benzene Substances C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 2
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 2
- GCTPMLUUWLLESL-UHFFFAOYSA-N benzyl prop-2-enoate Chemical compound C=CC(=O)OCC1=CC=CC=C1 GCTPMLUUWLLESL-UHFFFAOYSA-N 0.000 description 2
- 239000004202 carbamide Substances 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- 239000003086 colorant Substances 0.000 description 2
- 238000009833 condensation Methods 0.000 description 2
- 230000005494 condensation Effects 0.000 description 2
- PESYEWKSBIWTAK-UHFFFAOYSA-N cyclopenta-1,3-diene;titanium(2+) Chemical class [Ti+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 PESYEWKSBIWTAK-UHFFFAOYSA-N 0.000 description 2
- 125000001559 cyclopropyl group Chemical group [H]C1([H])C([H])([H])C1([H])* 0.000 description 2
- 125000004980 cyclopropylene group Chemical group 0.000 description 2
- 150000008049 diazo compounds Chemical class 0.000 description 2
- KEIQPMUPONZJJH-UHFFFAOYSA-N dicyclohexylmethanediamine Chemical compound C1CCCCC1C(N)(N)C1CCCCC1 KEIQPMUPONZJJH-UHFFFAOYSA-N 0.000 description 2
- FJKIXWOMBXYWOQ-UHFFFAOYSA-N ethenoxyethane Chemical compound CCOC=C FJKIXWOMBXYWOQ-UHFFFAOYSA-N 0.000 description 2
- AZDCYKCDXXPQIK-UHFFFAOYSA-N ethenoxymethylbenzene Chemical compound C=COCC1=CC=CC=C1 AZDCYKCDXXPQIK-UHFFFAOYSA-N 0.000 description 2
- 125000001495 ethyl group Chemical group [H]C([H])([H])C([H])([H])* 0.000 description 2
- 125000003827 glycol group Chemical group 0.000 description 2
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 2
- CATSNJVOTSVZJV-UHFFFAOYSA-N heptan-2-one Chemical compound CCCCCC(C)=O CATSNJVOTSVZJV-UHFFFAOYSA-N 0.000 description 2
- 150000002460 imidazoles Chemical class 0.000 description 2
- IQPQWNKOIGAROB-UHFFFAOYSA-N isocyanate group Chemical group [N-]=C=O IQPQWNKOIGAROB-UHFFFAOYSA-N 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 150000007974 melamines Chemical class 0.000 description 2
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 2
- QOHMWDJIBGVPIF-UHFFFAOYSA-N n',n'-diethylpropane-1,3-diamine Chemical compound CCN(CC)CCCN QOHMWDJIBGVPIF-UHFFFAOYSA-N 0.000 description 2
- YDSPXEVWSDMKEJ-UHFFFAOYSA-N n-anthracen-1-ylprop-2-enamide Chemical compound C1=CC=C2C=C3C(NC(=O)C=C)=CC=CC3=CC2=C1 YDSPXEVWSDMKEJ-UHFFFAOYSA-N 0.000 description 2
- 150000002829 nitrogen Chemical group 0.000 description 2
- JFNLZVQOOSMTJK-KNVOCYPGSA-N norbornene Chemical compound C1[C@@H]2CC[C@H]1C=C2 JFNLZVQOOSMTJK-KNVOCYPGSA-N 0.000 description 2
- WRAQQYDMVSCOTE-UHFFFAOYSA-N phenyl prop-2-enoate Chemical compound C=CC(=O)OC1=CC=CC=C1 WRAQQYDMVSCOTE-UHFFFAOYSA-N 0.000 description 2
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 2
- 229920002647 polyamide Polymers 0.000 description 2
- 229920001223 polyethylene glycol Polymers 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 229920001451 polypropylene glycol Polymers 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 125000004805 propylene group Chemical group [H]C([H])([H])C([H])([*:1])C([H])([H])[*:2] 0.000 description 2
- ZDYVRSLAEXCVBX-UHFFFAOYSA-N pyridinium p-toluenesulfonate Chemical compound C1=CC=[NH+]C=C1.CC1=CC=C(S([O-])(=O)=O)C=C1 ZDYVRSLAEXCVBX-UHFFFAOYSA-N 0.000 description 2
- 238000010992 reflux Methods 0.000 description 2
- YGSDEFSMJLZEOE-UHFFFAOYSA-N salicylic acid Chemical compound OC(=O)C1=CC=CC=C1O YGSDEFSMJLZEOE-UHFFFAOYSA-N 0.000 description 2
- 239000003381 stabilizer Substances 0.000 description 2
- KZNICNPSHKQLFF-UHFFFAOYSA-N succinimide Chemical compound O=C1CCC(=O)N1 KZNICNPSHKQLFF-UHFFFAOYSA-N 0.000 description 2
- 239000004094 surface-active agent Substances 0.000 description 2
- 239000004250 tert-Butylhydroquinone Substances 0.000 description 2
- 235000019281 tert-butylhydroquinone Nutrition 0.000 description 2
- FAGUFWYHJQFNRV-UHFFFAOYSA-N tetraethylenepentamine Chemical compound NCCNCCNCCNCCN FAGUFWYHJQFNRV-UHFFFAOYSA-N 0.000 description 2
- CNHDIAIOKMXOLK-UHFFFAOYSA-N toluquinol Chemical compound CC1=CC(O)=CC=C1O CNHDIAIOKMXOLK-UHFFFAOYSA-N 0.000 description 2
- IMNIMPAHZVJRPE-UHFFFAOYSA-N triethylenediamine Chemical compound C1CN2CCN1CC2 IMNIMPAHZVJRPE-UHFFFAOYSA-N 0.000 description 2
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 2
- 150000003672 ureas Chemical class 0.000 description 2
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 2
- 239000008096 xylene Substances 0.000 description 2
- YUOCJTKDRNYTFJ-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)S(=O)(=O)ON1C(=O)CCC1=O YUOCJTKDRNYTFJ-UHFFFAOYSA-N 0.000 description 1
- OKRLWHAZMUFONP-UHFFFAOYSA-N (2,5-dioxopyrrolidin-1-yl) trifluoromethanesulfonate Chemical compound FC(F)(F)S(=O)(=O)ON1C(=O)CCC1=O OKRLWHAZMUFONP-UHFFFAOYSA-N 0.000 description 1
- OEZWIIUNRMEKGW-UHFFFAOYSA-N (2-bromophenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1Br OEZWIIUNRMEKGW-UHFFFAOYSA-N 0.000 description 1
- HZBSQYSUONRRMW-UHFFFAOYSA-N (2-hydroxyphenyl) 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1O HZBSQYSUONRRMW-UHFFFAOYSA-N 0.000 description 1
- FDYDISGSYGFRJM-UHFFFAOYSA-N (2-methyl-2-adamantyl) 2-methylprop-2-enoate Chemical compound C1C(C2)CC3CC1C(OC(=O)C(=C)C)(C)C2C3 FDYDISGSYGFRJM-UHFFFAOYSA-N 0.000 description 1
- YRPLSAWATHBYFB-UHFFFAOYSA-N (2-methyl-2-adamantyl) prop-2-enoate Chemical compound C1C(C2)CC3CC1C(C)(OC(=O)C=C)C2C3 YRPLSAWATHBYFB-UHFFFAOYSA-N 0.000 description 1
- POTYORUTRLSAGZ-UHFFFAOYSA-N (3-chloro-2-hydroxypropyl) prop-2-enoate Chemical compound ClCC(O)COC(=O)C=C POTYORUTRLSAGZ-UHFFFAOYSA-N 0.000 description 1
- JHPBZFOKBAGZBL-UHFFFAOYSA-N (3-hydroxy-2,2,4-trimethylpentyl) 2-methylprop-2-enoate Chemical class CC(C)C(O)C(C)(C)COC(=O)C(C)=C JHPBZFOKBAGZBL-UHFFFAOYSA-N 0.000 description 1
- MUTGBJKUEZFXGO-OLQVQODUSA-N (3as,7ar)-3a,4,5,6,7,7a-hexahydro-2-benzofuran-1,3-dione Chemical compound C1CCC[C@@H]2C(=O)OC(=O)[C@@H]21 MUTGBJKUEZFXGO-OLQVQODUSA-N 0.000 description 1
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 1
- HHYVKZVPYXHHCG-UHFFFAOYSA-M (7,7-dimethyl-3-oxo-4-bicyclo[2.2.1]heptanyl)methanesulfonate;diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.C1CC2(CS([O-])(=O)=O)C(=O)CC1C2(C)C HHYVKZVPYXHHCG-UHFFFAOYSA-M 0.000 description 1
- FJALTVCJBKZXKY-UHFFFAOYSA-M (7,7-dimethyl-3-oxo-4-bicyclo[2.2.1]heptanyl)methanesulfonate;triphenylsulfanium Chemical compound C1CC2(CS([O-])(=O)=O)C(=O)CC1C2(C)C.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FJALTVCJBKZXKY-UHFFFAOYSA-M 0.000 description 1
- MIOPJNTWMNEORI-GMSGAONNSA-N (S)-camphorsulfonic acid Chemical compound C1C[C@@]2(CS(O)(=O)=O)C(=O)C[C@@H]1C2(C)C MIOPJNTWMNEORI-GMSGAONNSA-N 0.000 description 1
- ZWKNLRXFUTWSOY-QPJJXVBHSA-N (e)-3-phenylprop-2-enenitrile Chemical compound N#C\C=C\C1=CC=CC=C1 ZWKNLRXFUTWSOY-QPJJXVBHSA-N 0.000 description 1
- VLLPVDKADBYKLM-UHFFFAOYSA-M 1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate;triphenylsulfanium Chemical compound [O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 VLLPVDKADBYKLM-UHFFFAOYSA-M 0.000 description 1
- MCEKOERWHIKDFW-UHFFFAOYSA-N 1,1,3,3-tetrakis(butoxymethyl)urea Chemical compound CCCCOCN(COCCCC)C(=O)N(COCCCC)COCCCC MCEKOERWHIKDFW-UHFFFAOYSA-N 0.000 description 1
- GQNTZAWVZSKJKE-UHFFFAOYSA-N 1,1,3,3-tetrakis(methoxymethyl)urea Chemical compound COCN(COC)C(=O)N(COC)COC GQNTZAWVZSKJKE-UHFFFAOYSA-N 0.000 description 1
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical group C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- LFKLPJRVSHJZPL-UHFFFAOYSA-N 1,2:7,8-diepoxyoctane Chemical compound C1OC1CCCCC1CO1 LFKLPJRVSHJZPL-UHFFFAOYSA-N 0.000 description 1
- OUPZKGBUJRBPGC-UHFFFAOYSA-N 1,3,5-tris(oxiran-2-ylmethyl)-1,3,5-triazinane-2,4,6-trione Chemical compound O=C1N(CC2OC2)C(=O)N(CC2OC2)C(=O)N1CC1CO1 OUPZKGBUJRBPGC-UHFFFAOYSA-N 0.000 description 1
- FSAONUPVUVBQHL-UHFFFAOYSA-N 1,3-bis(4-azidophenyl)prop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C=CC(=O)C1=CC=C(N=[N+]=[N-])C=C1 FSAONUPVUVBQHL-UHFFFAOYSA-N 0.000 description 1
- YHMYGUUIMTVXNW-UHFFFAOYSA-N 1,3-dihydrobenzimidazole-2-thione Chemical compound C1=CC=C2NC(S)=NC2=C1 YHMYGUUIMTVXNW-UHFFFAOYSA-N 0.000 description 1
- WZCQRUWWHSTZEM-UHFFFAOYSA-N 1,3-phenylenediamine Chemical compound NC1=CC=CC(N)=C1 WZCQRUWWHSTZEM-UHFFFAOYSA-N 0.000 description 1
- RXYPXQSKLGGKOL-UHFFFAOYSA-N 1,4-dimethylpiperazine Chemical compound CN1CCN(C)CC1 RXYPXQSKLGGKOL-UHFFFAOYSA-N 0.000 description 1
- AXTADRUCVAUCRS-UHFFFAOYSA-N 1-(2-hydroxyethyl)pyrrole-2,5-dione Chemical compound OCCN1C(=O)C=CC1=O AXTADRUCVAUCRS-UHFFFAOYSA-N 0.000 description 1
- OQZQDGSYKKFLTE-UHFFFAOYSA-N 1-(4-azidophenyl)-3-phenylprop-2-en-1-one Chemical compound C1=CC(N=[N+]=[N-])=CC=C1C(=O)C=CC1=CC=CC=C1 OQZQDGSYKKFLTE-UHFFFAOYSA-N 0.000 description 1
- HYRIDYFBEXCCIA-UHFFFAOYSA-N 1-(4-azidophenyl)ethanone Chemical compound CC(=O)C1=CC=C(N=[N+]=[N-])C=C1 HYRIDYFBEXCCIA-UHFFFAOYSA-N 0.000 description 1
- VXNZUUAINFGPBY-UHFFFAOYSA-N 1-Butene Chemical group CCC=C VXNZUUAINFGPBY-UHFFFAOYSA-N 0.000 description 1
- DPOPGHCRRJYPMP-UHFFFAOYSA-N 1-[diazo(methylsulfonyl)methyl]sulfonyl-4-methylbenzene Chemical compound CC1=CC=C(S(=O)(=O)C(=[N+]=[N-])S(C)(=O)=O)C=C1 DPOPGHCRRJYPMP-UHFFFAOYSA-N 0.000 description 1
- GYQQFWWMZYBCIB-UHFFFAOYSA-N 1-[diazo-(4-methylphenyl)sulfonylmethyl]sulfonyl-4-methylbenzene Chemical compound C1=CC(C)=CC=C1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=C(C)C=C1 GYQQFWWMZYBCIB-UHFFFAOYSA-N 0.000 description 1
- KPAPHODVWOVUJL-UHFFFAOYSA-N 1-benzofuran;1h-indene Chemical compound C1=CC=C2CC=CC2=C1.C1=CC=C2OC=CC2=C1 KPAPHODVWOVUJL-UHFFFAOYSA-N 0.000 description 1
- MKRBAPNEJMFMHU-UHFFFAOYSA-N 1-benzylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1CC1=CC=CC=C1 MKRBAPNEJMFMHU-UHFFFAOYSA-N 0.000 description 1
- DURPTKYDGMDSBL-UHFFFAOYSA-N 1-butoxybutane Chemical compound CCCCOCCCC DURPTKYDGMDSBL-UHFFFAOYSA-N 0.000 description 1
- RMSGQZDGSZOJMU-UHFFFAOYSA-N 1-butyl-2-phenylbenzene Chemical group CCCCC1=CC=CC=C1C1=CC=CC=C1 RMSGQZDGSZOJMU-UHFFFAOYSA-N 0.000 description 1
- BQTPKSBXMONSJI-UHFFFAOYSA-N 1-cyclohexylpyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C1CCCCC1 BQTPKSBXMONSJI-UHFFFAOYSA-N 0.000 description 1
- GXZPMXGRNUXGHN-UHFFFAOYSA-N 1-ethenoxy-2-methoxyethane Chemical compound COCCOC=C GXZPMXGRNUXGHN-UHFFFAOYSA-N 0.000 description 1
- UVHXEHGUEKARKZ-UHFFFAOYSA-N 1-ethenylanthracene Chemical compound C1=CC=C2C=C3C(C=C)=CC=CC3=CC2=C1 UVHXEHGUEKARKZ-UHFFFAOYSA-N 0.000 description 1
- GRLHOORFDPGKMC-UHFFFAOYSA-N 1-fluoro-2-methylprop-1-ene Chemical group CC(C)=CF GRLHOORFDPGKMC-UHFFFAOYSA-N 0.000 description 1
- JRHNUZCXXOTJCA-UHFFFAOYSA-N 1-fluoropropane Chemical compound CCCF JRHNUZCXXOTJCA-UHFFFAOYSA-N 0.000 description 1
- 239000012956 1-hydroxycyclohexylphenyl-ketone Substances 0.000 description 1
- 125000006439 1-n-propyl cyclopropyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C1(*)C([H])([H])C1([H])[H] 0.000 description 1
- IGGDKDTUCAWDAN-UHFFFAOYSA-N 1-vinylnaphthalene Chemical compound C1=CC=C2C(C=C)=CC=CC2=C1 IGGDKDTUCAWDAN-UHFFFAOYSA-N 0.000 description 1
- IUGNCEABJSRDPG-UHFFFAOYSA-N 2,2,2-trichloroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(Cl)(Cl)Cl IUGNCEABJSRDPG-UHFFFAOYSA-N 0.000 description 1
- JYNDMWZEMQAWTD-UHFFFAOYSA-N 2,2,2-trichloroethyl prop-2-enoate Chemical compound ClC(Cl)(Cl)COC(=O)C=C JYNDMWZEMQAWTD-UHFFFAOYSA-N 0.000 description 1
- QTKPMCIBUROOGY-UHFFFAOYSA-N 2,2,2-trifluoroethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCC(F)(F)F QTKPMCIBUROOGY-UHFFFAOYSA-N 0.000 description 1
- VBHXIMACZBQHPX-UHFFFAOYSA-N 2,2,2-trifluoroethyl prop-2-enoate Chemical compound FC(F)(F)COC(=O)C=C VBHXIMACZBQHPX-UHFFFAOYSA-N 0.000 description 1
- FGPFIXISGWXSCE-UHFFFAOYSA-N 2,2-bis(oxiran-2-ylmethoxymethyl)propane-1,3-diol Chemical compound C1OC1COCC(CO)(CO)COCC1CO1 FGPFIXISGWXSCE-UHFFFAOYSA-N 0.000 description 1
- KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
- GQHTUMJGOHRCHB-UHFFFAOYSA-N 2,3,4,6,7,8,9,10-octahydropyrimido[1,2-a]azepine Chemical compound C1CCCCN2CCCN=C21 GQHTUMJGOHRCHB-UHFFFAOYSA-N 0.000 description 1
- AUFZRCJENRSRLY-UHFFFAOYSA-N 2,3,5-trimethylhydroquinone Chemical compound CC1=CC(O)=C(C)C(C)=C1O AUFZRCJENRSRLY-UHFFFAOYSA-N 0.000 description 1
- AHDSRXYHVZECER-UHFFFAOYSA-N 2,4,6-tris[(dimethylamino)methyl]phenol Chemical compound CN(C)CC1=CC(CN(C)C)=C(O)C(CN(C)C)=C1 AHDSRXYHVZECER-UHFFFAOYSA-N 0.000 description 1
- 125000004215 2,4-difluorophenyl group Chemical group [H]C1=C([H])C(*)=C(F)C([H])=C1F 0.000 description 1
- 150000003923 2,5-pyrrolediones Chemical class 0.000 description 1
- MLIWQXBKMZNZNF-UHFFFAOYSA-N 2,6-bis[(4-azidophenyl)methylidene]-4-methylcyclohexan-1-one Chemical compound O=C1C(=CC=2C=CC(=CC=2)N=[N+]=[N-])CC(C)CC1=CC1=CC=C(N=[N+]=[N-])C=C1 MLIWQXBKMZNZNF-UHFFFAOYSA-N 0.000 description 1
- AZUHIVLOSAPWDM-UHFFFAOYSA-N 2-(1h-imidazol-2-yl)-1h-imidazole Chemical class C1=CNC(C=2NC=CN=2)=N1 AZUHIVLOSAPWDM-UHFFFAOYSA-N 0.000 description 1
- XXXFZKQPYACQLD-UHFFFAOYSA-N 2-(2-hydroxyethoxy)ethyl acetate Chemical compound CC(=O)OCCOCCO XXXFZKQPYACQLD-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- DVPBWLLOGOINDW-UHFFFAOYSA-N 2-(5-bromo-1h-indol-3-yl)acetamide Chemical compound C1=C(Br)C=C2C(CC(=O)N)=CNC2=C1 DVPBWLLOGOINDW-UHFFFAOYSA-N 0.000 description 1
- GHTVHGGJFHMYBA-UHFFFAOYSA-N 2-(7-oxabicyclo[4.1.0]heptane-4-carbonyloxy)ethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCCOC(=O)C1CC2OC2CC1 GHTVHGGJFHMYBA-UHFFFAOYSA-N 0.000 description 1
- FALRKNHUBBKYCC-UHFFFAOYSA-N 2-(chloromethyl)pyridine-3-carbonitrile Chemical compound ClCC1=NC=CC=C1C#N FALRKNHUBBKYCC-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- FDZMLNCJBYFJBH-UHFFFAOYSA-N 2-[(2,3-dibromophenoxy)methyl]oxirane Chemical compound BrC1=CC=CC(OCC2OC2)=C1Br FDZMLNCJBYFJBH-UHFFFAOYSA-N 0.000 description 1
- SSOVVTOURMQUSM-UHFFFAOYSA-N 2-[(4-propylphenoxy)methyl]oxirane Chemical compound C1=CC(CCC)=CC=C1OCC1OC1 SSOVVTOURMQUSM-UHFFFAOYSA-N 0.000 description 1
- HHRACYLRBOUBKM-UHFFFAOYSA-N 2-[(4-tert-butylphenoxy)methyl]oxirane Chemical compound C1=CC(C(C)(C)C)=CC=C1OCC1OC1 HHRACYLRBOUBKM-UHFFFAOYSA-N 0.000 description 1
- FUIQBJHUESBZNU-UHFFFAOYSA-N 2-[(dimethylazaniumyl)methyl]phenolate Chemical compound CN(C)CC1=CC=CC=C1O FUIQBJHUESBZNU-UHFFFAOYSA-N 0.000 description 1
- SYEWHONLFGZGLK-UHFFFAOYSA-N 2-[1,3-bis(oxiran-2-ylmethoxy)propan-2-yloxymethyl]oxirane Chemical compound C1OC1COCC(OCC1OC1)COCC1CO1 SYEWHONLFGZGLK-UHFFFAOYSA-N 0.000 description 1
- SEFYJVFBMNOLBK-UHFFFAOYSA-N 2-[2-[2-(oxiran-2-ylmethoxy)ethoxy]ethoxymethyl]oxirane Chemical compound C1OC1COCCOCCOCC1CO1 SEFYJVFBMNOLBK-UHFFFAOYSA-N 0.000 description 1
- SHKUUQIDMUMQQK-UHFFFAOYSA-N 2-[4-(oxiran-2-ylmethoxy)butoxymethyl]oxirane Chemical compound C1OC1COCCCCOCC1CO1 SHKUUQIDMUMQQK-UHFFFAOYSA-N 0.000 description 1
- CCJAYIGMMRQRAO-UHFFFAOYSA-N 2-[4-[(2-hydroxyphenyl)methylideneamino]butyliminomethyl]phenol Chemical compound OC1=CC=CC=C1C=NCCCCN=CC1=CC=CC=C1O CCJAYIGMMRQRAO-UHFFFAOYSA-N 0.000 description 1
- WTYYGFLRBWMFRY-UHFFFAOYSA-N 2-[6-(oxiran-2-ylmethoxy)hexoxymethyl]oxirane Chemical compound C1OC1COCCCCCCOCC1CO1 WTYYGFLRBWMFRY-UHFFFAOYSA-N 0.000 description 1
- KUAUJXBLDYVELT-UHFFFAOYSA-N 2-[[2,2-dimethyl-3-(oxiran-2-ylmethoxy)propoxy]methyl]oxirane Chemical compound C1OC1COCC(C)(C)COCC1CO1 KUAUJXBLDYVELT-UHFFFAOYSA-N 0.000 description 1
- PPEASEWKOGNDKZ-UHFFFAOYSA-N 2-[[2,6-bis(oxiran-2-ylmethyl)phenoxy]methyl]oxirane Chemical compound C1OC1COC(C(=CC=C1)CC2OC2)=C1CC1CO1 PPEASEWKOGNDKZ-UHFFFAOYSA-N 0.000 description 1
- ZJRAAAWYHORFHN-UHFFFAOYSA-N 2-[[2,6-dibromo-4-[2-[3,5-dibromo-4-(oxiran-2-ylmethoxy)phenyl]propan-2-yl]phenoxy]methyl]oxirane Chemical compound C=1C(Br)=C(OCC2OC2)C(Br)=CC=1C(C)(C)C(C=C1Br)=CC(Br)=C1OCC1CO1 ZJRAAAWYHORFHN-UHFFFAOYSA-N 0.000 description 1
- AGXAFZNONAXBOS-UHFFFAOYSA-N 2-[[3-(oxiran-2-ylmethyl)phenyl]methyl]oxirane Chemical compound C=1C=CC(CC2OC2)=CC=1CC1CO1 AGXAFZNONAXBOS-UHFFFAOYSA-N 0.000 description 1
- WZKPOAWBXHEIKH-UHFFFAOYSA-N 2-[[4-[1,3-bis[4-(oxiran-2-ylmethoxy)phenyl]propyl]phenoxy]methyl]oxirane Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C=1C=CC(OCC2OC2)=CC=1)CCC(C=C1)=CC=C1OCC1CO1 WZKPOAWBXHEIKH-UHFFFAOYSA-N 0.000 description 1
- AOUSBQVEVZBMNI-UHFFFAOYSA-N 2-bromoethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCBr AOUSBQVEVZBMNI-UHFFFAOYSA-N 0.000 description 1
- CDZAAIHWZYWBSS-UHFFFAOYSA-N 2-bromoethyl prop-2-enoate Chemical compound BrCCOC(=O)C=C CDZAAIHWZYWBSS-UHFFFAOYSA-N 0.000 description 1
- XRCRJFOGPCJKPF-UHFFFAOYSA-N 2-butylbenzene-1,4-diol Chemical compound CCCCC1=CC(O)=CC=C1O XRCRJFOGPCJKPF-UHFFFAOYSA-N 0.000 description 1
- SBYMUDUGTIKLCR-UHFFFAOYSA-N 2-chloroethenylbenzene Chemical compound ClC=CC1=CC=CC=C1 SBYMUDUGTIKLCR-UHFFFAOYSA-N 0.000 description 1
- VUIWJRYTWUGOOF-UHFFFAOYSA-N 2-ethenoxyethanol Chemical compound OCCOC=C VUIWJRYTWUGOOF-UHFFFAOYSA-N 0.000 description 1
- HXDLWJWIAHWIKI-UHFFFAOYSA-N 2-hydroxyethyl acetate Chemical compound CC(=O)OCCO HXDLWJWIAHWIKI-UHFFFAOYSA-N 0.000 description 1
- OMIGHNLMNHATMP-UHFFFAOYSA-N 2-hydroxyethyl prop-2-enoate Chemical compound OCCOC(=O)C=C OMIGHNLMNHATMP-UHFFFAOYSA-N 0.000 description 1
- PPPFYBPQAPISCT-UHFFFAOYSA-N 2-hydroxypropyl acetate Chemical compound CC(O)COC(C)=O PPPFYBPQAPISCT-UHFFFAOYSA-N 0.000 description 1
- GWZMWHWAWHPNHN-UHFFFAOYSA-N 2-hydroxypropyl prop-2-enoate Chemical compound CC(O)COC(=O)C=C GWZMWHWAWHPNHN-UHFFFAOYSA-N 0.000 description 1
- CTHJQRHPNQEPAB-UHFFFAOYSA-N 2-methoxyethenylbenzene Chemical compound COC=CC1=CC=CC=C1 CTHJQRHPNQEPAB-UHFFFAOYSA-N 0.000 description 1
- YXYJVFYWCLAXHO-UHFFFAOYSA-N 2-methoxyethyl 2-methylprop-2-enoate Chemical compound COCCOC(=O)C(C)=C YXYJVFYWCLAXHO-UHFFFAOYSA-N 0.000 description 1
- HFCUBKYHMMPGBY-UHFFFAOYSA-N 2-methoxyethyl prop-2-enoate Chemical compound COCCOC(=O)C=C HFCUBKYHMMPGBY-UHFFFAOYSA-N 0.000 description 1
- LWRBVKNFOYUCNP-UHFFFAOYSA-N 2-methyl-1-(4-methylsulfanylphenyl)-2-morpholin-4-ylpropan-1-one Chemical compound C1=CC(SC)=CC=C1C(=O)C(C)(C)N1CCOCC1 LWRBVKNFOYUCNP-UHFFFAOYSA-N 0.000 description 1
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 1
- IJSVVICYGLOZHA-UHFFFAOYSA-N 2-methyl-n-phenylprop-2-enamide Chemical compound CC(=C)C(=O)NC1=CC=CC=C1 IJSVVICYGLOZHA-UHFFFAOYSA-N 0.000 description 1
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 1
- BNCADMBVWNPPIZ-UHFFFAOYSA-N 2-n,2-n,4-n,4-n,6-n,6-n-hexakis(methoxymethyl)-1,3,5-triazine-2,4,6-triamine Chemical compound COCN(COC)C1=NC(N(COC)COC)=NC(N(COC)COC)=N1 BNCADMBVWNPPIZ-UHFFFAOYSA-N 0.000 description 1
- LNPQMDSMIGLHSR-UHFFFAOYSA-N 2-oxaspiro[3.5]non-5-ene-1,3-dione Chemical compound O=C1OC(=O)C11C=CCCC1 LNPQMDSMIGLHSR-UHFFFAOYSA-N 0.000 description 1
- ILZXXGLGJZQLTR-UHFFFAOYSA-N 2-phenylethyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCC1=CC=CC=C1 ILZXXGLGJZQLTR-UHFFFAOYSA-N 0.000 description 1
- 125000005809 3,4,5-trimethoxyphenyl group Chemical group [H]C1=C(OC([H])([H])[H])C(OC([H])([H])[H])=C(OC([H])([H])[H])C([H])=C1* 0.000 description 1
- REEBWSYYNPPSKV-UHFFFAOYSA-N 3-[(4-formylphenoxy)methyl]thiophene-2-carbonitrile Chemical compound C1=CC(C=O)=CC=C1OCC1=C(C#N)SC=C1 REEBWSYYNPPSKV-UHFFFAOYSA-N 0.000 description 1
- WVRNUXJQQFPNMN-VAWYXSNFSA-N 3-[(e)-dodec-1-enyl]oxolane-2,5-dione Chemical compound CCCCCCCCCC\C=C\C1CC(=O)OC1=O WVRNUXJQQFPNMN-VAWYXSNFSA-N 0.000 description 1
- JJZNCUHIYJBAMS-UHFFFAOYSA-N 3-phenyl-2h-1,2-oxazol-5-one Chemical compound N1OC(=O)C=C1C1=CC=CC=C1 JJZNCUHIYJBAMS-UHFFFAOYSA-N 0.000 description 1
- URDOJQUSEUXVRP-UHFFFAOYSA-N 3-triethoxysilylpropyl 2-methylprop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C(C)=C URDOJQUSEUXVRP-UHFFFAOYSA-N 0.000 description 1
- XDQWJFXZTAWJST-UHFFFAOYSA-N 3-triethoxysilylpropyl prop-2-enoate Chemical compound CCO[Si](OCC)(OCC)CCCOC(=O)C=C XDQWJFXZTAWJST-UHFFFAOYSA-N 0.000 description 1
- QEQQAFXMPDXVSV-UHFFFAOYSA-N 4-[1,2,2,3,3,3-hexafluoro-1-(4-hydroxyphenyl)propyl]phenol Chemical compound C1=CC(O)=CC=C1C(F)(C(F)(F)C(F)(F)F)C1=CC=C(O)C=C1 QEQQAFXMPDXVSV-UHFFFAOYSA-N 0.000 description 1
- ZRIRUWWYQXWRNY-UHFFFAOYSA-N 4-[2-[4-hydroxy-3,5-bis(hydroxymethyl)phenyl]propan-2-yl]-2,6-bis(hydroxymethyl)phenol Chemical compound C=1C(CO)=C(O)C(CO)=CC=1C(C)(C)C1=CC(CO)=C(O)C(CO)=C1 ZRIRUWWYQXWRNY-UHFFFAOYSA-N 0.000 description 1
- FAUAZXVRLVIARB-UHFFFAOYSA-N 4-[[4-[bis(oxiran-2-ylmethyl)amino]phenyl]methyl]-n,n-bis(oxiran-2-ylmethyl)aniline Chemical compound C1OC1CN(C=1C=CC(CC=2C=CC(=CC=2)N(CC2OC2)CC2OC2)=CC=1)CC1CO1 FAUAZXVRLVIARB-UHFFFAOYSA-N 0.000 description 1
- CXXSQMDHHYTRKY-UHFFFAOYSA-N 4-amino-2,3,5-tris(oxiran-2-ylmethyl)phenol Chemical compound C1=C(O)C(CC2OC2)=C(CC2OC2)C(N)=C1CC1CO1 CXXSQMDHHYTRKY-UHFFFAOYSA-N 0.000 description 1
- SDJOUGYEUFYPLL-UHFFFAOYSA-N 4-azidobenzaldehyde Chemical compound [N-]=[N+]=NC1=CC=C(C=O)C=C1 SDJOUGYEUFYPLL-UHFFFAOYSA-N 0.000 description 1
- PQXPAFTXDVNANI-UHFFFAOYSA-N 4-azidobenzoic acid Chemical compound OC(=O)C1=CC=C(N=[N+]=[N-])C=C1 PQXPAFTXDVNANI-UHFFFAOYSA-N 0.000 description 1
- RJWBTWIBUIGANW-UHFFFAOYSA-N 4-chlorobenzenesulfonic acid Chemical compound OS(=O)(=O)C1=CC=C(Cl)C=C1 RJWBTWIBUIGANW-UHFFFAOYSA-N 0.000 description 1
- FEPBITJSIHRMRT-UHFFFAOYSA-N 4-hydroxybenzenesulfonic acid Chemical compound OC1=CC=C(S(O)(=O)=O)C=C1 FEPBITJSIHRMRT-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-M 4-hydroxybenzoate Chemical compound OC1=CC=C(C([O-])=O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-M 0.000 description 1
- YKXAYLPDMSGWEV-UHFFFAOYSA-N 4-hydroxybutyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OCCCCO YKXAYLPDMSGWEV-UHFFFAOYSA-N 0.000 description 1
- NDWUBGAGUCISDV-UHFFFAOYSA-N 4-hydroxybutyl prop-2-enoate Chemical compound OCCCCOC(=O)C=C NDWUBGAGUCISDV-UHFFFAOYSA-N 0.000 description 1
- ULPDSNLBZMHGPI-UHFFFAOYSA-N 4-methyl-7-oxabicyclo[4.1.0]heptane Chemical compound C1C(C)CCC2OC21 ULPDSNLBZMHGPI-UHFFFAOYSA-N 0.000 description 1
- VQVIHDPBMFABCQ-UHFFFAOYSA-N 5-(1,3-dioxo-2-benzofuran-5-carbonyl)-2-benzofuran-1,3-dione Chemical compound C1=C2C(=O)OC(=O)C2=CC(C(C=2C=C3C(=O)OC(=O)C3=CC=2)=O)=C1 VQVIHDPBMFABCQ-UHFFFAOYSA-N 0.000 description 1
- IZSHZLKNFQAAKX-UHFFFAOYSA-N 5-cyclopenta-2,4-dien-1-ylcyclopenta-1,3-diene Chemical group C1=CC=CC1C1C=CC=C1 IZSHZLKNFQAAKX-UHFFFAOYSA-N 0.000 description 1
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 1
- MWSKJDNQKGCKPA-UHFFFAOYSA-N 6-methyl-3a,4,5,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1CC(C)=CC2C(=O)OC(=O)C12 MWSKJDNQKGCKPA-UHFFFAOYSA-N 0.000 description 1
- GZVHEAJQGPRDLQ-UHFFFAOYSA-N 6-phenyl-1,3,5-triazine-2,4-diamine Chemical compound NC1=NC(N)=NC(C=2C=CC=CC=2)=N1 GZVHEAJQGPRDLQ-UHFFFAOYSA-N 0.000 description 1
- NHJIDZUQMHKGRE-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-yl 2-(7-oxabicyclo[4.1.0]heptan-4-yl)acetate Chemical compound C1CC2OC2CC1OC(=O)CC1CC2OC2CC1 NHJIDZUQMHKGRE-UHFFFAOYSA-N 0.000 description 1
- YXALYBMHAYZKAP-UHFFFAOYSA-N 7-oxabicyclo[4.1.0]heptan-4-ylmethyl 7-oxabicyclo[4.1.0]heptane-4-carboxylate Chemical compound C1CC2OC2CC1C(=O)OCC1CC2OC2CC1 YXALYBMHAYZKAP-UHFFFAOYSA-N 0.000 description 1
- ZCYVEMRRCGMTRW-UHFFFAOYSA-N 7553-56-2 Chemical compound [I] ZCYVEMRRCGMTRW-UHFFFAOYSA-N 0.000 description 1
- GOYGTBXFJBGGLI-UHFFFAOYSA-N 7a-but-1-enyl-3a-methyl-4,5-dihydro-2-benzofuran-1,3-dione Chemical compound C1=CCCC2(C)C(=O)OC(=O)C21C=CCC GOYGTBXFJBGGLI-UHFFFAOYSA-N 0.000 description 1
- KNDQHSIWLOJIGP-UHFFFAOYSA-N 826-62-0 Chemical compound C1C2C3C(=O)OC(=O)C3C1C=C2 KNDQHSIWLOJIGP-UHFFFAOYSA-N 0.000 description 1
- LPEKGGXMPWTOCB-UHFFFAOYSA-N 8beta-(2,3-epoxy-2-methylbutyryloxy)-14-acetoxytithifolin Natural products COC(=O)C(C)O LPEKGGXMPWTOCB-UHFFFAOYSA-N 0.000 description 1
- HRPVXLWXLXDGHG-UHFFFAOYSA-N Acrylamide Chemical compound NC(=O)C=C HRPVXLWXLXDGHG-UHFFFAOYSA-N 0.000 description 1
- 239000005711 Benzoic acid Substances 0.000 description 1
- 229930185605 Bisphenol Natural products 0.000 description 1
- LCFVJGUPQDGYKZ-UHFFFAOYSA-N Bisphenol A diglycidyl ether Chemical compound C=1C=C(OCC2OC2)C=CC=1C(C)(C)C(C=C1)=CC=C1OCC1CO1 LCFVJGUPQDGYKZ-UHFFFAOYSA-N 0.000 description 1
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 description 1
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- HENMPNIFWNMGQV-UHFFFAOYSA-N C(C1CO1)OC1=CC(OCC2CO2)=CC=C1.C(C1CO1)OCC(COCC1CO1)(COCC1CO1)COCC1CO1 Chemical compound C(C1CO1)OC1=CC(OCC2CO2)=CC=C1.C(C1CO1)OCC(COCC1CO1)(COCC1CO1)COCC1CO1 HENMPNIFWNMGQV-UHFFFAOYSA-N 0.000 description 1
- BSQOHKHSKVTWSZ-UHFFFAOYSA-N CC(C)(C(CC1)C2)C1(CS(O)(=O)=O)C2=O.I Chemical compound CC(C)(C(CC1)C2)C1(CS(O)(=O)=O)C2=O.I BSQOHKHSKVTWSZ-UHFFFAOYSA-N 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- FBPFZTCFMRRESA-FSIIMWSLSA-N D-Glucitol Natural products OC[C@H](O)[C@H](O)[C@@H](O)[C@H](O)CO FBPFZTCFMRRESA-FSIIMWSLSA-N 0.000 description 1
- FBPFZTCFMRRESA-JGWLITMVSA-N D-glucitol Chemical compound OC[C@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-JGWLITMVSA-N 0.000 description 1
- MQJKPEGWNLWLTK-UHFFFAOYSA-N Dapsone Chemical compound C1=CC(N)=CC=C1S(=O)(=O)C1=CC=C(N)C=C1 MQJKPEGWNLWLTK-UHFFFAOYSA-N 0.000 description 1
- YXHKONLOYHBTNS-UHFFFAOYSA-N Diazomethane Chemical compound C=[N+]=[N-] YXHKONLOYHBTNS-UHFFFAOYSA-N 0.000 description 1
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- IMROMDMJAWUWLK-UHFFFAOYSA-N Ethenol Chemical compound OC=C IMROMDMJAWUWLK-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- XXRCUYVCPSWGCC-UHFFFAOYSA-N Ethyl pyruvate Chemical compound CCOC(=O)C(C)=O XXRCUYVCPSWGCC-UHFFFAOYSA-N 0.000 description 1
- CWYNVVGOOAEACU-UHFFFAOYSA-N Fe2+ Chemical compound [Fe+2] CWYNVVGOOAEACU-UHFFFAOYSA-N 0.000 description 1
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- UIHCLUNTQKBZGK-UHFFFAOYSA-N Methyl isobutyl ketone Natural products CCC(C)C(C)=O UIHCLUNTQKBZGK-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- LGRFSURHDFAFJT-UHFFFAOYSA-N Phthalic anhydride Natural products C1=CC=C2C(=O)OC(=O)C2=C1 LGRFSURHDFAFJT-UHFFFAOYSA-N 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- LCXXNKZQVOXMEH-UHFFFAOYSA-N Tetrahydrofurfuryl methacrylate Chemical compound CC(=C)C(=O)OCC1CCCO1 LCXXNKZQVOXMEH-UHFFFAOYSA-N 0.000 description 1
- ZJCCRDAZUWHFQH-UHFFFAOYSA-N Trimethylolpropane Chemical compound CCC(CO)(CO)CO ZJCCRDAZUWHFQH-UHFFFAOYSA-N 0.000 description 1
- QYKIQEUNHZKYBP-UHFFFAOYSA-N Vinyl ether Chemical compound C=COC=C QYKIQEUNHZKYBP-UHFFFAOYSA-N 0.000 description 1
- YMOONIIMQBGTDU-VOTSOKGWSA-N [(e)-2-bromoethenyl]benzene Chemical compound Br\C=C\C1=CC=CC=C1 YMOONIIMQBGTDU-VOTSOKGWSA-N 0.000 description 1
- QLBRROYTTDFLDX-UHFFFAOYSA-N [3-(aminomethyl)cyclohexyl]methanamine Chemical compound NCC1CCCC(CN)C1 QLBRROYTTDFLDX-UHFFFAOYSA-N 0.000 description 1
- QFKJMDYQKVPGNM-UHFFFAOYSA-N [benzenesulfonyl(diazo)methyl]sulfonylbenzene Chemical compound C=1C=CC=CC=1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1=CC=CC=C1 QFKJMDYQKVPGNM-UHFFFAOYSA-N 0.000 description 1
- GLGXSTXZLFQYKJ-UHFFFAOYSA-N [cyclohexylsulfonyl(diazo)methyl]sulfonylcyclohexane Chemical compound C1CCCCC1S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C1CCCCC1 GLGXSTXZLFQYKJ-UHFFFAOYSA-N 0.000 description 1
- FDTRPMUFAMGRNM-UHFFFAOYSA-N [diazo(trifluoromethylsulfonyl)methyl]sulfonyl-trifluoromethane Chemical compound FC(F)(F)S(=O)(=O)C(=[N+]=[N-])S(=O)(=O)C(F)(F)F FDTRPMUFAMGRNM-UHFFFAOYSA-N 0.000 description 1
- KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
- XRLHGXGMYJNYCR-UHFFFAOYSA-N acetic acid;2-(2-hydroxypropoxy)propan-1-ol Chemical compound CC(O)=O.CC(O)COC(C)CO XRLHGXGMYJNYCR-UHFFFAOYSA-N 0.000 description 1
- 150000003926 acrylamides Chemical class 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- 239000001361 adipic acid Substances 0.000 description 1
- 235000011037 adipic acid Nutrition 0.000 description 1
- 125000005250 alkyl acrylate group Chemical group 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- FVFZFANLRPXUIE-UHFFFAOYSA-N anthracen-1-yl 2-methylprop-2-enoate Chemical compound C1=CC=C2C=C3C(OC(=O)C(=C)C)=CC=CC3=CC2=C1 FVFZFANLRPXUIE-UHFFFAOYSA-N 0.000 description 1
- 125000005577 anthracene group Chemical group 0.000 description 1
- 125000005428 anthryl group Chemical group [H]C1=C([H])C([H])=C2C([H])=C3C(*)=C([H])C([H])=C([H])C3=C([H])C2=C1[H] 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- MIAUJDCQDVWHEV-UHFFFAOYSA-N benzene-1,2-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=CC=C1S(O)(=O)=O MIAUJDCQDVWHEV-UHFFFAOYSA-N 0.000 description 1
- XJHABGPPCLHLLV-UHFFFAOYSA-N benzo[de]isoquinoline-1,3-dione Chemical compound C1=CC(C(=O)NC2=O)=C3C2=CC=CC3=C1 XJHABGPPCLHLLV-UHFFFAOYSA-N 0.000 description 1
- UMIVXZPTRXBADB-UHFFFAOYSA-N benzocyclobutene Chemical compound C1=CC=C2CCC2=C1 UMIVXZPTRXBADB-UHFFFAOYSA-N 0.000 description 1
- 235000010233 benzoic acid Nutrition 0.000 description 1
- BWHOZHOGCMHOBV-UHFFFAOYSA-N benzylideneacetone Chemical compound CC(=O)C=CC1=CC=CC=C1 BWHOZHOGCMHOBV-UHFFFAOYSA-N 0.000 description 1
- VGZKCAUAQHHGDK-UHFFFAOYSA-M bis(4-tert-butylphenyl)iodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC(C(C)(C)C)=CC=C1[I+]C1=CC=C(C(C)(C)C)C=C1 VGZKCAUAQHHGDK-UHFFFAOYSA-M 0.000 description 1
- DJUWPHRCMMMSCV-UHFFFAOYSA-N bis(7-oxabicyclo[4.1.0]heptan-4-ylmethyl) hexanedioate Chemical compound C1CC2OC2CC1COC(=O)CCCCC(=O)OCC1CC2OC2CC1 DJUWPHRCMMMSCV-UHFFFAOYSA-N 0.000 description 1
- JRPRCOLKIYRSNH-UHFFFAOYSA-N bis(oxiran-2-ylmethyl) benzene-1,2-dicarboxylate Chemical compound C=1C=CC=C(C(=O)OCC2OC2)C=1C(=O)OCC1CO1 JRPRCOLKIYRSNH-UHFFFAOYSA-N 0.000 description 1
- MQDJYUACMFCOFT-UHFFFAOYSA-N bis[2-(1-hydroxycyclohexyl)phenyl]methanone Chemical compound C=1C=CC=C(C(=O)C=2C(=CC=CC=2)C2(O)CCCCC2)C=1C1(O)CCCCC1 MQDJYUACMFCOFT-UHFFFAOYSA-N 0.000 description 1
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Substances BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 description 1
- 229910052794 bromium Inorganic materials 0.000 description 1
- PVEOYINWKBTPIZ-UHFFFAOYSA-N but-3-enoic acid Chemical compound OC(=O)CC=C PVEOYINWKBTPIZ-UHFFFAOYSA-N 0.000 description 1
- JHIWVOJDXOSYLW-UHFFFAOYSA-N butyl 2,2-difluorocyclopropane-1-carboxylate Chemical compound CCCCOC(=O)C1CC1(F)F JHIWVOJDXOSYLW-UHFFFAOYSA-N 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 229930003836 cresol Natural products 0.000 description 1
- 125000006637 cyclobutyl carbonyl group Chemical group 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- 125000004976 cyclobutylene group Chemical group 0.000 description 1
- OIWOHHBRDFKZNC-UHFFFAOYSA-N cyclohexyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1CCCCC1 OIWOHHBRDFKZNC-UHFFFAOYSA-N 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- KBLWLMPSVYBVDK-UHFFFAOYSA-N cyclohexyl prop-2-enoate Chemical compound C=CC(=O)OC1CCCCC1 KBLWLMPSVYBVDK-UHFFFAOYSA-N 0.000 description 1
- 125000004956 cyclohexylene group Chemical group 0.000 description 1
- 125000006638 cyclopentyl carbonyl group Chemical group 0.000 description 1
- 125000006255 cyclopropyl carbonyl group Chemical group [H]C1([H])C([H])([H])C1([H])C(*)=O 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 150000004985 diamines Chemical class 0.000 description 1
- 239000012954 diazonium Substances 0.000 description 1
- GPLRAVKSCUXZTP-UHFFFAOYSA-N diglycerol Chemical compound OCC(O)COCC(O)CO GPLRAVKSCUXZTP-UHFFFAOYSA-N 0.000 description 1
- 239000000539 dimer Substances 0.000 description 1
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 1
- KQHMXJWVIVPSIG-UHFFFAOYSA-K dioxido-sulfanylidene-sulfido-lambda5-phosphane tributyl(3-ethylhexan-3-yl)phosphanium Chemical compound [O-]P([O-])([S-])=S.CCCC[P+](CCCC)(CCCC)C(CC)(CC)CCC.CCCC[P+](CCCC)(CCCC)C(CC)(CC)CCC.CCCC[P+](CCCC)(CCCC)C(CC)(CC)CCC KQHMXJWVIVPSIG-UHFFFAOYSA-K 0.000 description 1
- OZLBDYMWFAHSOQ-UHFFFAOYSA-N diphenyliodanium Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1 OZLBDYMWFAHSOQ-UHFFFAOYSA-N 0.000 description 1
- ORPDKMPYOLFUBA-UHFFFAOYSA-M diphenyliodanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate Chemical compound C=1C=CC=CC=1[I+]C1=CC=CC=C1.[O-]S(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ORPDKMPYOLFUBA-UHFFFAOYSA-M 0.000 description 1
- SBQIJPBUMNWUKN-UHFFFAOYSA-M diphenyliodanium;trifluoromethanesulfonate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C=1C=CC=CC=1[I+]C1=CC=CC=C1 SBQIJPBUMNWUKN-UHFFFAOYSA-M 0.000 description 1
- ZZTCPWRAHWXWCH-UHFFFAOYSA-N diphenylmethanediamine Chemical compound C=1C=CC=CC=1C(N)(N)C1=CC=CC=C1 ZZTCPWRAHWXWCH-UHFFFAOYSA-N 0.000 description 1
- POLCUAVZOMRGSN-UHFFFAOYSA-N dipropyl ether Chemical compound CCCOCCC POLCUAVZOMRGSN-UHFFFAOYSA-N 0.000 description 1
- SZXQTJUDPRGNJN-UHFFFAOYSA-N dipropylene glycol Chemical compound OCCCOCCCO SZXQTJUDPRGNJN-UHFFFAOYSA-N 0.000 description 1
- 238000007323 disproportionation reaction Methods 0.000 description 1
- BIAWWFZNZAIXRF-UHFFFAOYSA-N ditert-butyl 1-benzoylcyclohexa-3,5-diene-1,3-dicarboperoxoate Chemical compound C1C(C(=O)OOC(C)(C)C)=CC=CC1(C(=O)OOC(C)(C)C)C(=O)C1=CC=CC=C1 BIAWWFZNZAIXRF-UHFFFAOYSA-N 0.000 description 1
- KGGOIDKBHYYNIC-UHFFFAOYSA-N ditert-butyl 4-[3,4-bis(tert-butylperoxycarbonyl)benzoyl]benzene-1,2-dicarboperoxoate Chemical compound C1=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=CC=C1C(=O)C1=CC=C(C(=O)OOC(C)(C)C)C(C(=O)OOC(C)(C)C)=C1 KGGOIDKBHYYNIC-UHFFFAOYSA-N 0.000 description 1
- ODQWQRRAPPTVAG-GZTJUZNOSA-N doxepin Chemical compound C1OC2=CC=CC=C2C(=C/CCN(C)C)/C2=CC=CC=C21 ODQWQRRAPPTVAG-GZTJUZNOSA-N 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 125000005745 ethoxymethyl group Chemical group [H]C([H])([H])C([H])([H])OC([H])([H])* 0.000 description 1
- UHKJHMOIRYZSTH-UHFFFAOYSA-N ethyl 2-ethoxypropanoate Chemical compound CCOC(C)C(=O)OCC UHKJHMOIRYZSTH-UHFFFAOYSA-N 0.000 description 1
- SUPCQIBBMFXVTL-UHFFFAOYSA-N ethyl 2-methylprop-2-enoate Chemical compound CCOC(=O)C(C)=C SUPCQIBBMFXVTL-UHFFFAOYSA-N 0.000 description 1
- 229940117360 ethyl pyruvate Drugs 0.000 description 1
- JHYNXXDQQHTCHJ-UHFFFAOYSA-M ethyl(triphenyl)phosphanium;bromide Chemical compound [Br-].C=1C=CC=CC=1[P+](C=1C=CC=CC=1)(CC)C1=CC=CC=C1 JHYNXXDQQHTCHJ-UHFFFAOYSA-M 0.000 description 1
- 125000004672 ethylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- 125000000816 ethylene group Chemical group [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
- 230000001747 exhibiting effect Effects 0.000 description 1
- 239000003925 fat Substances 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 229910052731 fluorine Inorganic materials 0.000 description 1
- 239000011737 fluorine Substances 0.000 description 1
- XUCNUKMRBVNAPB-UHFFFAOYSA-N fluoroethene Chemical group FC=C XUCNUKMRBVNAPB-UHFFFAOYSA-N 0.000 description 1
- 125000003784 fluoroethyl group Chemical group [H]C([H])(F)C([H])([H])* 0.000 description 1
- 125000004216 fluoromethyl group Chemical group [H]C([H])(F)* 0.000 description 1
- ANSXAPJVJOKRDJ-UHFFFAOYSA-N furo[3,4-f][2]benzofuran-1,3,5,7-tetrone Chemical compound C1=C2C(=O)OC(=O)C2=CC2=C1C(=O)OC2=O ANSXAPJVJOKRDJ-UHFFFAOYSA-N 0.000 description 1
- VOZRXNHHFUQHIL-UHFFFAOYSA-N glycidyl methacrylate Chemical compound CC(=C)C(=O)OCC1CO1 VOZRXNHHFUQHIL-UHFFFAOYSA-N 0.000 description 1
- VPVSTMAPERLKKM-UHFFFAOYSA-N glycoluril Chemical compound N1C(=O)NC2NC(=O)NC21 VPVSTMAPERLKKM-UHFFFAOYSA-N 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- FLBJFXNAEMSXGL-UHFFFAOYSA-N het anhydride Chemical compound O=C1OC(=O)C2C1C1(Cl)C(Cl)=C(Cl)C2(Cl)C1(Cl)Cl FLBJFXNAEMSXGL-UHFFFAOYSA-N 0.000 description 1
- VBZWSGALLODQNC-UHFFFAOYSA-N hexafluoroacetone Chemical compound FC(F)(F)C(=O)C(F)(F)F VBZWSGALLODQNC-UHFFFAOYSA-N 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-M hexanoate Chemical compound CCCCCC([O-])=O FUZZWVXGSFPDMH-UHFFFAOYSA-M 0.000 description 1
- LNCPIMCVTKXXOY-UHFFFAOYSA-N hexyl 2-methylprop-2-enoate Chemical compound CCCCCCOC(=O)C(C)=C LNCPIMCVTKXXOY-UHFFFAOYSA-N 0.000 description 1
- LNMQRPPRQDGUDR-UHFFFAOYSA-N hexyl prop-2-enoate Chemical compound CCCCCCOC(=O)C=C LNMQRPPRQDGUDR-UHFFFAOYSA-N 0.000 description 1
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 229910010272 inorganic material Inorganic materials 0.000 description 1
- 239000011147 inorganic material Substances 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000011630 iodine Substances 0.000 description 1
- 229910052740 iodine Inorganic materials 0.000 description 1
- XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- ZFSLODLOARCGLH-UHFFFAOYSA-N isocyanuric acid Chemical compound OC1=NC(O)=NC(O)=N1 ZFSLODLOARCGLH-UHFFFAOYSA-N 0.000 description 1
- 125000001449 isopropyl group Chemical group [H]C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 150000002605 large molecules Chemical class 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 239000007769 metal material Substances 0.000 description 1
- 125000005397 methacrylic acid ester group Chemical group 0.000 description 1
- 125000005395 methacrylic acid group Chemical group 0.000 description 1
- 229940098779 methanesulfonic acid Drugs 0.000 description 1
- 229940057867 methyl lactate Drugs 0.000 description 1
- CWKLZLBVOJRSOM-UHFFFAOYSA-N methyl pyruvate Chemical compound COC(=O)C(C)=O CWKLZLBVOJRSOM-UHFFFAOYSA-N 0.000 description 1
- XJRBAMWJDBPFIM-UHFFFAOYSA-N methyl vinyl ether Chemical compound COC=C XJRBAMWJDBPFIM-UHFFFAOYSA-N 0.000 description 1
- 125000004674 methylcarbonyl group Chemical group CC(=O)* 0.000 description 1
- 125000001570 methylene group Chemical group [H]C([H])([*:1])[*:2] 0.000 description 1
- VYKXQOYUCMREIS-UHFFFAOYSA-N methylhexahydrophthalic anhydride Chemical compound C1CCCC2C(=O)OC(=O)C21C VYKXQOYUCMREIS-UHFFFAOYSA-N 0.000 description 1
- WFKDPJRCBCBQNT-UHFFFAOYSA-N n,2-dimethylprop-2-enamide Chemical compound CNC(=O)C(C)=C WFKDPJRCBCBQNT-UHFFFAOYSA-N 0.000 description 1
- QRWZCJXEAOZAAW-UHFFFAOYSA-N n,n,2-trimethylprop-2-enamide Chemical compound CN(C)C(=O)C(C)=C QRWZCJXEAOZAAW-UHFFFAOYSA-N 0.000 description 1
- 229940088644 n,n-dimethylacrylamide Drugs 0.000 description 1
- YLGYACDQVQQZSW-UHFFFAOYSA-N n,n-dimethylprop-2-enamide Chemical compound CN(C)C(=O)C=C YLGYACDQVQQZSW-UHFFFAOYSA-N 0.000 description 1
- ADGJZVKOKVENDN-UHFFFAOYSA-N n-(butoxymethyl)-2-methylprop-2-enamide Chemical compound CCCCOCNC(=O)C(C)=C ADGJZVKOKVENDN-UHFFFAOYSA-N 0.000 description 1
- LSWADWIFYOAQRZ-UHFFFAOYSA-N n-(ethoxymethyl)prop-2-enamide Chemical compound CCOCNC(=O)C=C LSWADWIFYOAQRZ-UHFFFAOYSA-N 0.000 description 1
- DNTMQTKDNSEIFO-UHFFFAOYSA-N n-(hydroxymethyl)-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCO DNTMQTKDNSEIFO-UHFFFAOYSA-N 0.000 description 1
- YOZHLACIXDCHPV-UHFFFAOYSA-N n-(methoxymethyl)-2-methylprop-2-enamide Chemical compound COCNC(=O)C(C)=C YOZHLACIXDCHPV-UHFFFAOYSA-N 0.000 description 1
- CEBFLGHPYLIZSC-UHFFFAOYSA-N n-benzyl-2-methylprop-2-enamide Chemical compound CC(=C)C(=O)NCC1=CC=CC=C1 CEBFLGHPYLIZSC-UHFFFAOYSA-N 0.000 description 1
- OHLHOLGYGRKZMU-UHFFFAOYSA-N n-benzylprop-2-enamide Chemical compound C=CC(=O)NCC1=CC=CC=C1 OHLHOLGYGRKZMU-UHFFFAOYSA-N 0.000 description 1
- 125000004108 n-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000004676 n-butylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- ZIWDVJPPVMGJGR-UHFFFAOYSA-N n-ethyl-2-methylprop-2-enamide Chemical compound CCNC(=O)C(C)=C ZIWDVJPPVMGJGR-UHFFFAOYSA-N 0.000 description 1
- SWPMNMYLORDLJE-UHFFFAOYSA-N n-ethylprop-2-enamide Chemical compound CCNC(=O)C=C SWPMNMYLORDLJE-UHFFFAOYSA-N 0.000 description 1
- 125000001280 n-hexyl group Chemical group C(CCCCC)* 0.000 description 1
- SEEYREPSKCQBBF-UHFFFAOYSA-N n-methylmaleimide Chemical compound CN1C(=O)C=CC1=O SEEYREPSKCQBBF-UHFFFAOYSA-N 0.000 description 1
- YPHQUSNPXDGUHL-UHFFFAOYSA-N n-methylprop-2-enamide Chemical compound CNC(=O)C=C YPHQUSNPXDGUHL-UHFFFAOYSA-N 0.000 description 1
- 125000000740 n-pentyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- BPCNEKWROYSOLT-UHFFFAOYSA-N n-phenylprop-2-enamide Chemical compound C=CC(=O)NC1=CC=CC=C1 BPCNEKWROYSOLT-UHFFFAOYSA-N 0.000 description 1
- 125000004123 n-propyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])* 0.000 description 1
- 125000006252 n-propylcarbonyl group Chemical group [H]C([H])([H])C([H])([H])C([H])([H])C(*)=O 0.000 description 1
- RDMQYWPHYCZEKB-UHFFFAOYSA-N naphthalene-1-sulfonate;pyridin-1-ium Chemical compound C1=CC=[NH+]C=C1.C1=CC=C2C(S(=O)(=O)[O-])=CC=CC2=C1 RDMQYWPHYCZEKB-UHFFFAOYSA-N 0.000 description 1
- PSZYNBSKGUBXEH-UHFFFAOYSA-N naphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=CC2=C1 PSZYNBSKGUBXEH-UHFFFAOYSA-N 0.000 description 1
- 125000002347 octyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 150000002903 organophosphorus compounds Chemical class 0.000 description 1
- RPQRDASANLAFCM-UHFFFAOYSA-N oxiran-2-ylmethyl prop-2-enoate Chemical compound C=CC(=O)OCC1CO1 RPQRDASANLAFCM-UHFFFAOYSA-N 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- QUBQYFYWUJJAAK-UHFFFAOYSA-N oxymethurea Chemical compound OCNC(=O)NCO QUBQYFYWUJJAAK-UHFFFAOYSA-N 0.000 description 1
- FJKROLUGYXJWQN-UHFFFAOYSA-N papa-hydroxy-benzoic acid Natural products OC(=O)C1=CC=C(O)C=C1 FJKROLUGYXJWQN-UHFFFAOYSA-N 0.000 description 1
- WXZMFSXDPGVJKK-UHFFFAOYSA-N pentaerythritol Chemical compound OCC(CO)(CO)CO WXZMFSXDPGVJKK-UHFFFAOYSA-N 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 229960004624 perflexane Drugs 0.000 description 1
- ZJIJAJXFLBMLCK-UHFFFAOYSA-N perfluorohexane Chemical compound FC(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F ZJIJAJXFLBMLCK-UHFFFAOYSA-N 0.000 description 1
- YFSUTJLHUFNCNZ-UHFFFAOYSA-N perfluorooctane-1-sulfonic acid Chemical compound OS(=O)(=O)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)C(F)(F)F YFSUTJLHUFNCNZ-UHFFFAOYSA-N 0.000 description 1
- QIWKUEJZZCOPFV-UHFFFAOYSA-N phenyl 2-methylprop-2-enoate Chemical compound CC(=C)C(=O)OC1=CC=CC=C1 QIWKUEJZZCOPFV-UHFFFAOYSA-N 0.000 description 1
- IGALFTFNPPBUDN-UHFFFAOYSA-N phenyl-[2,3,4,5-tetrakis(oxiran-2-ylmethyl)phenyl]methanediamine Chemical compound C=1C(CC2OC2)=C(CC2OC2)C(CC2OC2)=C(CC2OC2)C=1C(N)(N)C1=CC=CC=C1 IGALFTFNPPBUDN-UHFFFAOYSA-N 0.000 description 1
- 150000004714 phosphonium salts Chemical group 0.000 description 1
- 229920002492 poly(sulfone) Polymers 0.000 description 1
- 229920000058 polyacrylate Polymers 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920000768 polyamine Polymers 0.000 description 1
- 229920002577 polybenzoxazole Polymers 0.000 description 1
- 239000004417 polycarbonate Substances 0.000 description 1
- 229920000515 polycarbonate Polymers 0.000 description 1
- 238000012643 polycondensation polymerization Methods 0.000 description 1
- 238000006068 polycondensation reaction Methods 0.000 description 1
- 229920000728 polyester Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920001289 polyvinyl ether Polymers 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 150000003141 primary amines Chemical class 0.000 description 1
- BOQSSGDQNWEFSX-UHFFFAOYSA-N propan-2-yl 2-methylprop-2-enoate Chemical compound CC(C)OC(=O)C(C)=C BOQSSGDQNWEFSX-UHFFFAOYSA-N 0.000 description 1
- LYBIZMNPXTXVMV-UHFFFAOYSA-N propan-2-yl prop-2-enoate Chemical compound CC(C)OC(=O)C=C LYBIZMNPXTXVMV-UHFFFAOYSA-N 0.000 description 1
- 125000001436 propyl group Chemical group [H]C([*])([H])C([H])([H])C([H])([H])[H] 0.000 description 1
- HNJBEVLQSNELDL-UHFFFAOYSA-N pyrrolidin-2-one Chemical compound O=C1CCCN1 HNJBEVLQSNELDL-UHFFFAOYSA-N 0.000 description 1
- 150000003242 quaternary ammonium salts Chemical class 0.000 description 1
- 125000002943 quinolinyl group Chemical group N1=C(C=CC2=CC=CC=C12)* 0.000 description 1
- 125000001567 quinoxalinyl group Chemical group N1=C(C=NC2=CC=CC=C12)* 0.000 description 1
- 229960004889 salicylic acid Drugs 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 238000007650 screen-printing Methods 0.000 description 1
- 125000002914 sec-butyl group Chemical group [H]C([H])([H])C([H])([H])C([H])(*)C([H])([H])[H] 0.000 description 1
- 150000003335 secondary amines Chemical class 0.000 description 1
- 150000003376 silicon Chemical class 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- 239000000600 sorbitol Substances 0.000 description 1
- 150000003440 styrenes Chemical class 0.000 description 1
- 229940014800 succinic anhydride Drugs 0.000 description 1
- 229960002317 succinimide Drugs 0.000 description 1
- 150000005846 sugar alcohols Polymers 0.000 description 1
- 150000003459 sulfonic acid esters Chemical class 0.000 description 1
- 125000006253 t-butylcarbonyl group Chemical group [H]C([H])([H])C(C(*)=O)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- MUTNCGKQJGXKEM-UHFFFAOYSA-N tamibarotene Chemical compound C=1C=C2C(C)(C)CCC(C)(C)C2=CC=1NC(=O)C1=CC=C(C(O)=O)C=C1 MUTNCGKQJGXKEM-UHFFFAOYSA-N 0.000 description 1
- 125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
- JRMUNVKIHCOMHV-UHFFFAOYSA-M tetrabutylammonium bromide Chemical compound [Br-].CCCC[N+](CCCC)(CCCC)CCCC JRMUNVKIHCOMHV-UHFFFAOYSA-M 0.000 description 1
- 229920005992 thermoplastic resin Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- YRHRIQCWCFGUEQ-UHFFFAOYSA-N thioxanthen-9-one Chemical class C1=CC=C2C(=O)C3=CC=CC=C3SC2=C1 YRHRIQCWCFGUEQ-UHFFFAOYSA-N 0.000 description 1
- 150000003918 triazines Chemical class 0.000 description 1
- TUQOTMZNTHZOKS-UHFFFAOYSA-N tributylphosphine Chemical compound CCCCP(CCCC)CCCC TUQOTMZNTHZOKS-UHFFFAOYSA-N 0.000 description 1
- ITMCEJHCFYSIIV-UHFFFAOYSA-N triflic acid Chemical compound OS(=O)(=O)C(F)(F)F ITMCEJHCFYSIIV-UHFFFAOYSA-N 0.000 description 1
- 125000005951 trifluoromethanesulfonyloxy group Chemical group 0.000 description 1
- SRPWOOOHEPICQU-UHFFFAOYSA-N trimellitic anhydride Chemical compound OC(=O)C1=CC=C2C(=O)OC(=O)C2=C1 SRPWOOOHEPICQU-UHFFFAOYSA-N 0.000 description 1
- QXJQHYBHAIHNGG-UHFFFAOYSA-N trimethylolethane Chemical compound OCC(C)(CO)CO QXJQHYBHAIHNGG-UHFFFAOYSA-N 0.000 description 1
- FAYMLNNRGCYLSR-UHFFFAOYSA-M triphenylsulfonium triflate Chemical compound [O-]S(=O)(=O)C(F)(F)F.C1=CC=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 FAYMLNNRGCYLSR-UHFFFAOYSA-M 0.000 description 1
- JABYJIQOLGWMQW-UHFFFAOYSA-N undec-4-ene Chemical compound CCCCCCC=CCCC JABYJIQOLGWMQW-UHFFFAOYSA-N 0.000 description 1
- 239000011800 void material Substances 0.000 description 1
- CHJMFFKHPHCQIJ-UHFFFAOYSA-L zinc;octanoate Chemical compound [Zn+2].CCCCCCCC([O-])=O.CCCCCCCC([O-])=O CHJMFFKHPHCQIJ-UHFFFAOYSA-L 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J171/00—Adhesives based on polyethers obtained by reactions forming an ether link in the main chain; Adhesives based on derivatives of such polymers
- C09J171/08—Polyethers derived from hydroxy compounds or from their metallic derivatives
- C09J171/10—Polyethers derived from hydroxy compounds or from their metallic derivatives from phenols
- C09J171/12—Polyphenylene oxides
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G65/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G65/34—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives
- C08G65/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols
- C08G65/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule from hydroxy compounds or their metallic derivatives derived from phenols from phenols (I) and other compounds (II), e.g. OH-Ar-OH + X-Ar-X, where X is halogen atom, i.e. leaving group
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
- C09J181/00—Adhesives based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing sulfur, with or without nitrogen, oxygen, or carbon only; Adhesives based on polysulfones; Adhesives based on derivatives of such polymers
- C09J181/06—Polysulfones; Polyethersulfones
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G2650/00—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule
- C08G2650/28—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type
- C08G2650/38—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group
- C08G2650/40—Macromolecular compounds obtained by reactions forming an ether link in the main chain of the macromolecule characterised by the polymer type containing oxygen in addition to the ether group containing ketone groups, e.g. polyarylethylketones, PEEK or PEK
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Compositions Of Macromolecular Compounds (AREA)
Abstract
【課題】 種々の有機溶媒に容易に溶解して、塗布性良く十分な厚さの接着層を形成することが可能で、且つその接着層がメタルバンプ接合、CVD、イオン拡散工程などの高温プロセスにおいて熱重量減が極めて少なく、密着性が良好な高耐熱性接着剤組成物を提供する。【解決手段】 下記式(1):【化1】(式中、Xはスルホニル基又はカルボニル基を表し、Ar1及びAr2はそれぞれ炭素原子数6乃至30のアリーレン基を表し、T1はフルオロアルキレン基、環状アルキレン基、置換基を有するアリーレン基、又は置換基を有していても良いアリーレン基とフルオロアルキレン基若しくは環状アルキレン基との組み合わせを表す。)で表される単位構造を含むポリマーを含む接着剤組成物。アリーレン基がフェニレン基、ナフチレン基、又はアントリレン基である。ポリマーが1種類の単位構造を有する単独重合体であるか、又は少なくとも2種類の単位構造を有する共重合体である。【選択図】 なしPROBLEM TO BE SOLVED: To easily form an adhesive layer having a sufficient thickness by being easily dissolved in various organic solvents, and the adhesive layer is a high-temperature process such as metal bump bonding, CVD, or ion diffusion process. Provides a high heat-resistant adhesive composition with extremely low thermal weight loss and good adhesion. The following formula (1): ## STR1 ## wherein X represents a sulfonyl group or a carbonyl group, Ar1 and Ar2 each represent an arylene group having 6 to 30 carbon atoms, and T1 represents a fluoroalkylene group , A cyclic alkylene group, an arylene group having a substituent, or a combination of an arylene group which may have a substituent and a fluoroalkylene group or a cyclic alkylene group. Adhesive composition. The arylene group is a phenylene group, a naphthylene group, or an anthrylene group. The polymer is a homopolymer having one type of unit structure or a copolymer having at least two types of unit structures. [Selection figure] None
Description
本発明は接着剤組成物に関するものである。さらに詳しくは、ICチップなどの半導体製品や光学系製品などの積層体を形成する工程において被積層物間を接着する接着剤組成物に関するものである。 The present invention relates to an adhesive composition. More specifically, the present invention relates to an adhesive composition that adheres laminates in a step of forming a laminate of a semiconductor product such as an IC chip or an optical product.
近年、携帯電話やICカード等の電子機器の高機能化、小型化に伴い、半導体デバイスの高集積化が求められている。その手法として、半導体そのものの微細化や半導体素子を縦方向に積み上げるスタック構造が検討されている。
スタック構造の作製においては、半導体素子間の接合に接着剤が使用される。
しかし、公知の接着剤として知られているアクリル樹脂やエポキシ樹脂、シリコーン樹脂は耐熱性が250℃程度しかなく、メタルバンプの電極接合やイオン拡散工程など、250℃以上もの高温が求められるような工程では使用できないという問題がある。In recent years, as electronic devices such as mobile phones and IC cards become more functional and smaller in size, higher integration of semiconductor devices has been demanded. As a technique for this, miniaturization of the semiconductor itself and a stack structure in which semiconductor elements are stacked in the vertical direction are being studied.
In manufacturing the stack structure, an adhesive is used for bonding between semiconductor elements.
However, acrylic resins, epoxy resins, and silicone resins that are known as known adhesives have a heat resistance of only about 250 ° C., and high temperatures of 250 ° C. or higher are required, such as metal bump electrode bonding and ion diffusion processes. There is a problem that it cannot be used in the process.
一方、ガラス基材にシリコーン樹脂を含浸させた無機系絶縁基板上に、30体積%乃至45体積%のポリエーテルエーテルケトン樹脂粉末と熱硬化性樹脂とを含むアンダーコート膜を形成した厚膜技術用基板が開示されている(特許文献1)。 On the other hand, a thick film technology in which an undercoat film containing 30% to 45% by volume of polyether ether ketone resin powder and a thermosetting resin is formed on an inorganic insulating substrate in which a glass substrate is impregnated with a silicone resin. A substrate is disclosed (Patent Document 1).
上記アンダーコート膜を形成した基板は水分や熱に対する寸法変化が非常に小さく耐湿性等に優れるものである。しかし、これらアンダーコート膜に含まれるポリエーテルエーテルケトンは溶剤や樹脂溶液中に溶けないので、塗布型の接着剤とすることができず、ペースト状インクの形態にしてスクリーン印刷法で基板を被覆する方法がとられていた。また、この組成物ではポリエーテルエーテルケトン樹脂の含有量が増えすぎるとスクリーン印刷可能なインクを形成できないので、該樹脂を30体積%乃至45体積%の割合でのみしか含有できず、耐熱性に問題がある。
上述のように公知の接着剤として知られているアクリル樹脂やエポキシ樹脂、シリコーン樹脂は、耐熱性が250℃程度しかなく、250℃以上もの高温下で使用することはできない。
一方、特許文献1にポリエーテルエーテルケトンのような全芳香族ポリエーテルの接着剤が例示されているが、溶媒溶解性が極めて低く溶解性を示さないため、溶媒選択性に乏しく、厚膜化が難しい。更に塗布性も十分ではないという問題がある。
溶媒溶解性向上の方法として、長鎖アルキルに代表される柔軟な構造を導入することが提案されているが、総じて耐熱性が低下するという問題がある。The substrate on which the undercoat film is formed has a very small dimensional change with respect to moisture and heat and is excellent in moisture resistance and the like. However, the polyether ether ketone contained in these undercoat films does not dissolve in the solvent or resin solution, so it cannot be used as a coating-type adhesive, and the substrate is coated by screen printing in the form of paste ink. The way to do was taken. Further, in this composition, if the content of the polyetheretherketone resin is excessively increased, a screen-printable ink cannot be formed. Therefore, the resin can be contained only in a proportion of 30% to 45% by volume, and the heat resistance is improved. There's a problem.
As described above, acrylic resins, epoxy resins, and silicone resins known as known adhesives have a heat resistance of only about 250 ° C., and cannot be used at a high temperature of 250 ° C. or higher.
On the other hand, an adhesive of wholly aromatic polyether such as polyether ether ketone is exemplified in Patent Document 1, but the solvent solubility is extremely low and the solubility is not exhibited, so the solvent selectivity is poor and the film thickness is increased. Is difficult. Furthermore, there is a problem that the applicability is not sufficient.
As a method for improving solvent solubility, it has been proposed to introduce a flexible structure typified by long-chain alkyl, but there is a problem that heat resistance generally decreases.
本発明は、上記の問題点に鑑みてなされたものであり、その目的は、種々の有機溶媒に容易に溶解して、塗布性良く十分な厚さの接着層を形成することが可能で、且つその接着層がメタルバンプ接合、CVD、イオン拡散工程などの高温プロセスにおいて熱重量減が極めて少なく、密着性が良好な高耐熱性接着剤組成物を提供する。 The present invention has been made in view of the above-mentioned problems, and its purpose is that it can be easily dissolved in various organic solvents to form an adhesive layer with sufficient coatability and sufficient thickness, In addition, the adhesive layer provides a high heat-resistant adhesive composition having a very low thermal weight loss and good adhesion in a high temperature process such as metal bump bonding, CVD, or ion diffusion process.
本発明は第1観点として、下記式(1):
第2観点として、前記アリーレン基がフェニレン基、ナフチレン基、又はアントリレン基である第1観点に記載の接着剤組成物、
第3観点として、前記ポリマーが1種類の単位構造を有する単独重合体である第1観点又は第2観点に記載の接着剤組成物、
第4観点として、前記ポリマーが少なくとも2種類の単位構造を有する共重合体である第1観点又は第2観点に記載の接着剤組成物、
第5観点として、前記Ar1及びAr2がそれぞれ下記式(2):
第6観点として、前記T1が下記式(3)で表される基である上記式(1)で表される単位構造、前記T1が下記式(4)で表される基である上記式(1)で表される単位構造、又はそれらの単位構造の組み合わせを含むポリマーを含む第1観点乃至第5観点のいずれか1つに記載の接着剤組成物、
第7観点として、前記式(3)中、R2が少なくとも第3級炭素構造を有する基を含む基を表し、n2が1乃至4の整数である第6観点に記載の接着剤組成物、
第8観点として、更に式(5):
第9観点として、前記アリーレン基がフェニレン基、ナフチレン基、又はアントリレン基である第8観点に記載の接着剤組成物、
第10観点として、前記T3が式(6):
第11観点として、前記第3級炭素構造を有する基がターシャリーブチル基である第1観点乃至第10観点のいずれか1つに記載の接着剤組成物、
第12観点として、前記ポリマーの重量平均分子量が500乃至5000000である第1観点乃至第11観点のいずれか1つに記載の接着剤組成物、
第13観点として、更に架橋剤を含む第1観点乃至第12観点のいずれか1つに記載の接着剤組成物、
第14観点として、更に溶剤を含み、0.001乃至5000Pa・sの粘度を有する第1観点乃至第13観点のいずれか1つに記載の接着剤組成物、
第15観点として、少なくとも2つの被接着物と、該被接着物間に設けられた第1観点乃至第14観点のいずれか1つに記載の接着剤組成物から形成した0.1μm乃至200μmの接着層とを含む積層体、
第16観点として、前記被接着物がそれぞれシリコン基板、ガラス基板、樹脂基板、又はセラミックス基板からなる群から選択される第15観点に記載の積層体、に関する。As a first aspect of the present invention, the following formula (1):
As a second aspect, the adhesive composition according to the first aspect, wherein the arylene group is a phenylene group, a naphthylene group, or an anthrylene group,
As a third aspect, the adhesive composition according to the first aspect or the second aspect, wherein the polymer is a homopolymer having one type of unit structure,
As a fourth aspect, the adhesive composition according to the first aspect or the second aspect, wherein the polymer is a copolymer having at least two types of unit structures,
As a fifth aspect, the Ar 1 and Ar 2 are each represented by the following formula (2):
The as sixth aspect, wherein T 1 is a group unit structure represented by the above formula (1) is a group represented by the following formula (3), wherein T 1 is represented by the following formula (4) above The adhesive composition according to any one of the first to fifth aspects, comprising a polymer comprising a unit structure represented by formula (1) or a combination of these unit structures;
As a seventh aspect, the adhesive composition according to the sixth aspect, in which, in the formula (3), R 2 represents a group containing a group having at least a tertiary carbon structure, and n2 is an integer of 1 to 4.
As an eighth aspect, formula (5):
As a ninth aspect, the adhesive composition according to the eighth aspect, wherein the arylene group is a phenylene group, a naphthylene group, or an anthrylene group,
As a tenth aspect, the T 3 is the formula (6):
As an eleventh aspect, the adhesive composition according to any one of the first to tenth aspects, wherein the group having a tertiary carbon structure is a tertiary butyl group,
As a twelfth aspect, the adhesive composition according to any one of the first aspect to the eleventh aspect, wherein the polymer has a weight average molecular weight of 500 to 5000000.
As a thirteenth aspect, the adhesive composition according to any one of the first to twelfth aspects, further including a crosslinking agent,
As a fourteenth aspect, the adhesive composition according to any one of the first aspect to the thirteenth aspect, further including a solvent and having a viscosity of 0.001 to 5000 Pa · s,
As a fifteenth aspect, an adhesive composition of 0.1 μm to 200 μm formed from at least two adherends and the adhesive composition according to any one of the first aspect to the fourteenth aspect provided between the adherends. A laminate comprising an adhesive layer,
As a sixteenth aspect, the present invention relates to the laminate according to the fifteenth aspect, in which the adherend is selected from the group consisting of a silicon substrate, a glass substrate, a resin substrate, or a ceramic substrate.
本発明によれば、本発明の接着剤組成物は芳香族ポリエーテルエーテルケトンや芳香族ポリエーテルエーテルスルホン等の芳香族ポリエーテル構造を有するポリマーを含むことで、種々の溶媒に容易に溶解することができ、良好な塗布性を得ることが可能である。また、本発明の接着剤組成物は、接着するのに十分な厚さの接着層を形成することができ、且つメタルバンプ接合、CVD、イオン拡散工程などの高温プロセスにおいて熱重量減が極めて少なく、高温プロセス後も高い密着性を有する接着層を形成できる。
これにより、本発明のポリエーテル構造を有するポリマーを含む接着剤組成物は、高温プロセスにおいて加工が必要な半導体デバイス等に用いられる電子基板等の被加工物(例えば、加熱処理、加圧処理、又はリソグラフィー等を通じて加工される積層物質)の接着に有効である。
また、本発明の積層体は高耐熱性の接着層を有するので、高温プロセスにおいて被接着物を加工でき及び高温条件下において使用できる。According to the present invention, the adhesive composition of the present invention contains a polymer having an aromatic polyether structure such as aromatic polyetheretherketone or aromatic polyetherethersulfone, so that it easily dissolves in various solvents. And good coatability can be obtained. In addition, the adhesive composition of the present invention can form an adhesive layer having a sufficient thickness for bonding, and extremely low thermal weight loss in high-temperature processes such as metal bump bonding, CVD, and ion diffusion processes. An adhesive layer having high adhesion can be formed even after a high temperature process.
Thereby, the adhesive composition containing the polymer having a polyether structure of the present invention is a workpiece such as an electronic substrate used for a semiconductor device or the like that needs to be processed in a high temperature process (for example, heat treatment, pressure treatment, Or, it is effective for adhesion of a laminated material processed through lithography or the like.
In addition, since the laminate of the present invention has a high heat-resistant adhesive layer, the adherend can be processed in a high temperature process and can be used under high temperature conditions.
本発明は式(1)で表される単位構造を含むポリマーを含む接着剤組成物である。
上記接着剤組成物は式(1)で表される単位構造を含むポリマーと溶剤とを含み、さらに任意成分として接着剤の性能を改良するための付加的樹脂、粘着付与剤、可塑剤、接着助剤、安定剤、着色剤、界面活性剤等を含有することができる。
本発明の接着剤組成物は固形分として、0.1乃至80質量%、好ましくは1乃至60質量%である。固形分は接着剤組成物に対して、該接着剤組成物から溶剤を取り除いた残部の割合で示される。固形分中に占める式(1)で表される単位構造を含むポリマーの割合は30乃至100質量%、好ましくは50乃至100質量%とすることが可能である。This invention is an adhesive composition containing the polymer containing the unit structure represented by Formula (1).
The above-mentioned adhesive composition contains a polymer containing a unit structure represented by the formula (1) and a solvent, and, as an optional component, an additional resin, a tackifier, a plasticizer, an adhesive for improving the performance of the adhesive Auxiliaries, stabilizers, colorants, surfactants and the like can be contained.
The adhesive composition of the present invention has a solid content of 0.1 to 80% by mass, preferably 1 to 60% by mass. Solid content is shown with the ratio of the remainder which remove | eliminated the solvent from this adhesive composition with respect to adhesive composition. The proportion of the polymer containing the unit structure represented by the formula (1) in the solid content can be 30 to 100% by mass, preferably 50 to 100% by mass.
本発明に用いられるポリマーは熱可塑性樹脂であることが好ましい。
本発明に用いられるポリマーの分子量は重量平均分子量として、500乃至5000000、好ましくは1000乃至1000000、好ましくは1000乃至100000である。The polymer used in the present invention is preferably a thermoplastic resin.
The molecular weight of the polymer used in the present invention is 500 to 5000000, preferably 1000 to 1000000, and preferably 1000 to 100000 as a weight average molecular weight.
式(1)中、Xはスルホニル基又はカルボニル基を表し、Ar1及びAr2はそれぞれ炭素原子数6乃至30のアリーレン基を表し、T1はフルオロアルキレン基、環状アルキレン基、置換基を有するアリーレン基、又は置換基を有していても良いアリーレン基とフルオロアルキレン基若しくは環状アルキレン基との組み合わせを表す。
置換基を有するアリーレン基は、以下に述べられる置換基を有するアリーレン基を表す。
置換基を有していても良いアリーレン基は置換又は非置換のアリーレン基を表し、これらのアリーレン基と、フルオロアルキレン基又は環状アルキレン基との組み合わせを表す。
アリーレン基としては、フェニレン基、ナフチル基、又はアントリル基等が挙げられ、フェニレン基又はナフチル基が好ましい。
上記フロオロアルキレン基としては炭素原子数1乃至10のフルオロアルキレン基が挙げられ、その具体例としては、例えばフルオロメチレン基、フルオロエチレン基、フルオロ−n−プロピレン基、フルオロイソプロピレン基、フルオロプロパン−2,2−ジイル基、フルオロ−n−ブチレン基、フルオロイソブチレン基、フルオロ−s−ブチレン基、フルオロ−t−ブチレン基等が挙げられる。中でもパーフルオロプロパン−2,2−ジイル基等の炭素原子数1乃至4のフルオロアルキレン基が挙げられる。これらのフルオロアルキレン基としては、完全フッ素化(パーフルオロ化)されたアルキレン基も、一部フッ素化されたアルキレン基(モノフルオロ化、ジフルオロ化等)も用いることができる。
環状アルキレン基としては、炭素原子数が3乃至30の環状アルキレン基が挙げられ、例えば、シクロプロピレン基、シクロブチレン基、シクロヘキシレン基、1−メチル−シクロペンチレン基、2−メチル−シクロペンチレン基、3−メチル−シクロペンチレン基、1−エチル−シクロブチレン基、2−エチル−シクロブチレン基、3−エチル−シクロブチレン基、1,2−ジメチル−シクロブチレン基、1,3−ジメチル−シクロブチレン基、2,2−ジメチル−シクロブチレン基、2,3−ジメチル−シクロブチレン基、2,4−ジメチル−シクロブチレン基、3,3−ジメチル−シクロブチレン基、1−n−プロピル−シクロプロピレン基、2−n−プロピル−シクロプロピレン基、1−i−プロピル−シクロプロピレン基、2−i−プロピル−シクロプロピレン基、1,2,2−トリメチル−シクロプロピレン基、1,2,3−トリメチル−シクロプロピレン基、2,2,3−トリメチル−シクロプロピレン基、1−エチル−2−メチル−シクロプロピレン基、2−エチル−1−メチル−シクロプロピレン基、2−エチル−2−メチル−シクロプロピレン基及び2−エチル−3−メチル−シクロプロピレン基等が挙げられる。また、アダマンタン、ノルボルネンから誘導される2価の有機基を用いることができる。In formula (1), X represents a sulfonyl group or a carbonyl group, Ar 1 and Ar 2 each represent an arylene group having 6 to 30 carbon atoms, and T 1 has a fluoroalkylene group, a cyclic alkylene group, or a substituent. An arylene group or a combination of an arylene group which may have a substituent and a fluoroalkylene group or a cyclic alkylene group is represented.
The arylene group having a substituent represents an arylene group having a substituent described below.
The arylene group which may have a substituent represents a substituted or unsubstituted arylene group, and represents a combination of these arylene groups with a fluoroalkylene group or a cyclic alkylene group.
Examples of the arylene group include a phenylene group, a naphthyl group, and an anthryl group, and a phenylene group or a naphthyl group is preferable.
Examples of the fluoroalkylene group include a fluoroalkylene group having 1 to 10 carbon atoms. Specific examples thereof include a fluoromethylene group, a fluoroethylene group, a fluoro-n-propylene group, a fluoroisopropylene group, and a fluoropropane. Examples include -2,2-diyl group, fluoro-n-butylene group, fluoroisobutylene group, fluoro-s-butylene group, and fluoro-t-butylene group. Among them, C1-C4 fluoroalkylene groups such as perfluoropropane-2,2-diyl group are exemplified. As these fluoroalkylene groups, a fully fluorinated (perfluorinated) alkylene group or a partially fluorinated alkylene group (monofluorinated, difluorinated, etc.) can be used.
Examples of the cyclic alkylene group include cyclic alkylene groups having 3 to 30 carbon atoms, such as cyclopropylene group, cyclobutylene group, cyclohexylene group, 1-methyl-cyclopentylene group, 2-methyl-cyclopentylene. Len group, 3-methyl-cyclopentylene group, 1-ethyl-cyclobutylene group, 2-ethyl-cyclobutylene group, 3-ethyl-cyclobutylene group, 1,2-dimethyl-cyclobutylene group, 1,3- Dimethyl-cyclobutylene group, 2,2-dimethyl-cyclobutylene group, 2,3-dimethyl-cyclobutylene group, 2,4-dimethyl-cyclobutylene group, 3,3-dimethyl-cyclobutylene group, 1-n- Propyl-cyclopropylene group, 2-n-propyl-cyclopropylene group, 1-i-propyl-cyclopropylene group, 2-i Propyl-cyclopropylene group, 1,2,2-trimethyl-cyclopropylene group, 1,2,3-trimethyl-cyclopropylene group, 2,2,3-trimethyl-cyclopropylene group, 1-ethyl-2-methyl- Examples include cyclopropylene group, 2-ethyl-1-methyl-cyclopropylene group, 2-ethyl-2-methyl-cyclopropylene group, and 2-ethyl-3-methyl-cyclopropylene group. Further, a divalent organic group derived from adamantane or norbornene can be used.
本発明に用いられる式(1)で表される単位構造を含むポリマーで、T1はこれらの官能基を単独で用いることも、複数組み合わせて用いることもできる。
上記ポリマーは繰り返し単位構造が1種類からなる単独重合体として用いることも、繰り返し単位構造が2種類又はそれ以上である共重合体として用いることができる。In the polymer including a unit structure represented by the formula (1) used in the present invention, T 1 can be used alone or in combination of these functional groups.
The polymer can be used as a homopolymer having one type of repeating unit structure, or can be used as a copolymer having two or more repeating unit structures.
本発明では、Ar1及びAr2がそれぞれ式(2)で表される基である上記式(1)で表される単位構造を含むポリマーを含むことができる。
式(2)中、R1は炭素原子数1乃至10のアルキル基、炭素原子数1乃至4のフルオロアルキル基、ヒドロキシル基、アリル基、アリロキシ基、アミノ基、シアノ基、ニトロ基、アシル基、アシルオキシ基、カルボキシル基、第3級炭素構造を有する基、環状アルキル基、又はそれらの組み合わせを表し、n1は0乃至4の整数を表す。
式(2)中、R1を表すアルキル基としては炭素原子数1乃至10のアルキル基であり、例えばメチル基、エチル基、n−プロピル基、i−プロピル基、n−ブチル基、i−ブチル基、s−ブチル基、t−ブチル基、n−ペンチル基、1−メチル−n−ブチル基、2−メチル−n−ブチル基、3−メチル−n−ブチル基、1,1−ジメチル−n−プロピル基、1,2−ジメチル−n−プロピル基、2,2−ジメチル−n−プロピル基、1−エチル−n−プロピル基、n−ヘキシル基、1−メチル−n−ペンチル基、2−メチル−n−ペンチル基、3−メチル−n−ペンチル基、4−メチル−n−ペンチル基、1,1−ジメチル−n−ブチル基、1,2−ジメチル−n−ブチル基、1,3−ジメチル−n−ブチル基、2,2−ジメチル−n−ブチル基、2,3−ジメチル−n−ブチル基、3,3−ジメチル−n−ブチル基、1−エチル−n−ブチル基、2−エチル−n−ブチル基、1,1,2−トリメチル−n−プロピル基、1,2,2−トリメチル−n−プロピル基、1−エチル−1−メチル−n−プロピル基、1−エチル−2−メチル−n−プロピル基等が挙げられる。
フルオロアルキル基としては、炭素原子数1乃至10のフルオロアルキル基が挙げられ、また炭素原子数1乃至4のフルオロアルキル基が挙げられる。例えばフルオロメチル基、フルオロエチル基、フルオロ−n−プロピル基、フルオロイソプロピル基、フルオロ−n−ブチル基、フルオロイソブチル基、フルオロ−s−ブチル基、フルオロ−t−ブチル基等が挙げられる。これらのフルオロアルキル基としては、完全フッ素化(パーフルオロ化)や、一部フッ素化されたアルキル基を用いることができる。
アシル基としては、炭素原子数2乃至10のアシル基が挙げられ、例えば、メチルカルボニル基、エチルカルボニル基、n−プロピルカルボニル基、i−プロピルカルボニル基、シクロプロピルカルボニル基、n−ブチルカルボニル基、i−ブチルカルボニル基、s−ブチルカルボニル基、t−ブチルカルボニル基、シクロブチルカルボニル基、1−メチル−シクロプロピルカルボニル基、2−メチル−シクロプロピルカルボニル基、n−ペンチルカルボニル基、1−メチル−n−ブチルカルボニル基、2−メチル−n−ブチルカルボニル基、3−メチル−n−ブチルカルボニル基、1,1−ジメチル−n−プロピルカルボニル基、1,2−ジメチル−n−プロピルカルボニル基、2,2−ジメチル−n−プロピルカルボニル基、1−エチル−n−プロピルカルボニル基、シクロペンチルカルボニル基、1−メチル−シクロブチルカルボニル基、2−メチル−シクロブチルカルボニル基、3−メチル−シクロブチルカルボニル基、1,2−ジメチル−シクロプロピルカルボニル基、2,3−ジメチル−シクロプロピルカルボニル基、1−エチル−シクロプロピルカルボニル基、2−エチル−シクロプロピルカルボニル基、n−ヘキシルカルボニル基、1−メチル−n−ペンチルカルボニル基、2−メチル−n−ペンチルカルボニル基、3−メチル−n−ペンチルカルボニル基、4−メチル−n−ペンチルカルボニル基、1,1−ジメチル−n−ブチルカルボニル基、1,2−ジメチル−n−ブチルカルボニル基、1,3−ジメチル−n−ブチルカルボニル基、2,2−ジメチル−n−ブチルカルボニル基、2,3−ジメチル−n−ブチルカルボニル基、3,3−ジメチル−n−ブチルカルボニル基、1−エチル−n−ブチルカルボニル基、2−エチル−n−ブチルカルボニル基、1,1,2−トリメチル−n−プロピルカルボニル基等が挙げられる。
アシルオキシ基としては炭素原子数2乃至10のアシルオキシ基が挙げられ、例えば、メチルカルボニルオキシ基、エチルカルボニルオキシ基、n−プロピルカルボニルオキシ基、i−プロピルカルボニルオキシ基、シクロプロピルカルボニルオキシ基、n−ブチルカルボニルオキシ基、i−ブチルカルボニルオキシ基、s−ブチルカルボニルオキシ基、t−ブチルカルボニルオキシ基、シクロブチルカルボニルオキシ基、1−メチル−シクロプロピルカルボニルオキシ基、2−メチル−シクロプロピルカルボニルオキシ基、n−ペンチルカルボニルオキシ基、1−メチル−n−ブチルカルボニルオキシ基、2−メチル−n−ブチルカルボニルオキシ基、3−メチル−n−ブチルカルボニルオキシ基、1,1−ジメチル−n−プロピルカルボニルオキシ基、1,2−ジメチル−n−プロピルカルボニルオキシ基、2,2−ジメチル−n−プロピルカルボニルオキシ基、1−エチル−n−プロピルカルボニルオキシ基、シクロペンチルカルボニルオキシ基、1−メチル−シクロブチルカルボニルオキシ基、2−メチル−シクロブチルカルボニルオキシ基、3−メチル−シクロブチルカルボニルオキシ基、1,2−ジメチル−シクロプロピルカルボニルオキシ基、2,3−ジメチル−シクロプロピルカルボニルオキシ基、1−エチル−シクロプロピルカルボニルオキシ基、2−エチル−シクロプロピルカルボニルオキシ基、n−ヘキシルカルボニルオキシ基、1−メチル−n−ペンチルカルボニルオキシ基、2−メチル−n−ペンチルカルボニルオキシ基、3−メチル−n−ペンチルカルボニルオキシ基、4−メチル−n−ペンチルカルボニルオキシ基、1,1−ジメチル−n−ブチルカルボニルオキシ基、1,2−ジメチル−n−ブチルカルボニルオキシ基、1,3−ジメチル−n−ブチルカルボニルオキシ基、2,2−ジメチル−n−ブチルカルボニルオキシ基、2,3−ジメチル−n−ブチルカルボニルオキシ基、3,3−ジメチル−n−ブチルカルボニルオキシ基、1−エチル−n−ブチルカルボニルオキシ基、2−エチル−n−ブチルカルボニルオキシ基、1,1,2−トリメチル−n−プロピルカルボニルオキシ基等が挙げられる。
第3級炭素構造を有する基はタ−シャリーブチル基を好ましく用いることができる。
環状アルキル基としては、炭素原子数が3乃至30の環状アルキル基が挙げられ、例えば、シクロプロピル基、シクロブチル基、シクロヘキシル基、1−メチル−シクロペンチル基、2−メチル−シクロペンチル基、3−メチル−シクロペンチル基、1−エチル−シクロブチル基、2−エチル−シクロブチル基、3−エチル−シクロブチル基、1,2−ジメチル−シクロブチル基、1,3−ジメチル−シクロブチル基、2,2−ジメチル−シクロブチル基、2,3−ジメチル−シクロブチル基、2,4−ジメチル−シクロブチル基、3,3−ジメチル−シクロブチル基、1−n−プロピル−シクロプロピル基、2−n−プロピル−シクロプロピル基、1−i−プロピル−シクロプロピル基、2−i−プロピル−シクロプロピル基、1,2,2−トリメチル−シクロプロピル基、1,2,3−トリメチル−シクロプロピル基、2,2,3−トリメチル−シクロプロピル基、1−エチル−2−メチル−シクロプロピル基、2−エチル−1−メチル−シクロプロピル基、2−エチル−2−メチル−シクロプロピル基及び2−エチル−3−メチル−シクロプロピル基等が挙げられる。また、アダマンタン、ノルボルネンから誘導される1価の有機基を用いることができる。In this invention, the polymer containing the unit structure represented by the said Formula (1) whose Ar < 1 > and Ar < 2 > are groups each represented by Formula (2) can be included.
In the formula (2), R 1 is an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 4 carbon atoms, a hydroxyl group, an allyl group, an allyloxy group, an amino group, a cyano group, a nitro group, or an acyl group. , An acyloxy group, a carboxyl group, a group having a tertiary carbon structure, a cyclic alkyl group, or a combination thereof, and n1 represents an integer of 0 to 4.
In formula (2), the alkyl group representing R 1 is an alkyl group having 1 to 10 carbon atoms, such as a methyl group, ethyl group, n-propyl group, i-propyl group, n-butyl group, i- Butyl, s-butyl, t-butyl, n-pentyl, 1-methyl-n-butyl, 2-methyl-n-butyl, 3-methyl-n-butyl, 1,1-dimethyl -N-propyl group, 1,2-dimethyl-n-propyl group, 2,2-dimethyl-n-propyl group, 1-ethyl-n-propyl group, n-hexyl group, 1-methyl-n-pentyl group 2-methyl-n-pentyl group, 3-methyl-n-pentyl group, 4-methyl-n-pentyl group, 1,1-dimethyl-n-butyl group, 1,2-dimethyl-n-butyl group, 1,3-dimethyl-n-butyl group, 2,2-dimethyl-n-butyl group Group, 2,3-dimethyl-n-butyl group, 3,3-dimethyl-n-butyl group, 1-ethyl-n-butyl group, 2-ethyl-n-butyl group, 1,1,2-trimethyl -N-propyl group, 1,2,2-trimethyl-n-propyl group, 1-ethyl-1-methyl-n-propyl group, 1-ethyl-2-methyl-n-propyl group and the like can be mentioned.
Examples of the fluoroalkyl group include a fluoroalkyl group having 1 to 10 carbon atoms, and a fluoroalkyl group having 1 to 4 carbon atoms. Examples thereof include a fluoromethyl group, a fluoroethyl group, a fluoro-n-propyl group, a fluoroisopropyl group, a fluoro-n-butyl group, a fluoroisobutyl group, a fluoro-s-butyl group, and a fluoro-t-butyl group. As these fluoroalkyl groups, fully fluorinated (perfluorinated) or partially fluorinated alkyl groups can be used.
Examples of the acyl group include an acyl group having 2 to 10 carbon atoms, such as a methylcarbonyl group, an ethylcarbonyl group, an n-propylcarbonyl group, an i-propylcarbonyl group, a cyclopropylcarbonyl group, and an n-butylcarbonyl group. I-butylcarbonyl group, s-butylcarbonyl group, t-butylcarbonyl group, cyclobutylcarbonyl group, 1-methyl-cyclopropylcarbonyl group, 2-methyl-cyclopropylcarbonyl group, n-pentylcarbonyl group, 1- Methyl-n-butylcarbonyl group, 2-methyl-n-butylcarbonyl group, 3-methyl-n-butylcarbonyl group, 1,1-dimethyl-n-propylcarbonyl group, 1,2-dimethyl-n-propylcarbonyl Group, 2,2-dimethyl-n-propylcarbonyl group, 1-ethyl n-propylcarbonyl group, cyclopentylcarbonyl group, 1-methyl-cyclobutylcarbonyl group, 2-methyl-cyclobutylcarbonyl group, 3-methyl-cyclobutylcarbonyl group, 1,2-dimethyl-cyclopropylcarbonyl group, 2, 3-dimethyl-cyclopropylcarbonyl group, 1-ethyl-cyclopropylcarbonyl group, 2-ethyl-cyclopropylcarbonyl group, n-hexylcarbonyl group, 1-methyl-n-pentylcarbonyl group, 2-methyl-n-pentyl Carbonyl group, 3-methyl-n-pentylcarbonyl group, 4-methyl-n-pentylcarbonyl group, 1,1-dimethyl-n-butylcarbonyl group, 1,2-dimethyl-n-butylcarbonyl group, 1,3 -Dimethyl-n-butylcarbonyl group, 2,2-dimethyl-n Butylcarbonyl group, 2,3-dimethyl-n-butylcarbonyl group, 3,3-dimethyl-n-butylcarbonyl group, 1-ethyl-n-butylcarbonyl group, 2-ethyl-n-butylcarbonyl group, 1, Examples include 1,2-trimethyl-n-propylcarbonyl group.
Examples of the acyloxy group include an acyloxy group having 2 to 10 carbon atoms, such as a methylcarbonyloxy group, an ethylcarbonyloxy group, an n-propylcarbonyloxy group, an i-propylcarbonyloxy group, a cyclopropylcarbonyloxy group, n -Butylcarbonyloxy group, i-butylcarbonyloxy group, s-butylcarbonyloxy group, t-butylcarbonyloxy group, cyclobutylcarbonyloxy group, 1-methyl-cyclopropylcarbonyloxy group, 2-methyl-cyclopropylcarbonyl Oxy group, n-pentylcarbonyloxy group, 1-methyl-n-butylcarbonyloxy group, 2-methyl-n-butylcarbonyloxy group, 3-methyl-n-butylcarbonyloxy group, 1,1-dimethyl-n -Propylcarbo Ruoxy group, 1,2-dimethyl-n-propylcarbonyloxy group, 2,2-dimethyl-n-propylcarbonyloxy group, 1-ethyl-n-propylcarbonyloxy group, cyclopentylcarbonyloxy group, 1-methyl-cyclo Butylcarbonyloxy group, 2-methyl-cyclobutylcarbonyloxy group, 3-methyl-cyclobutylcarbonyloxy group, 1,2-dimethyl-cyclopropylcarbonyloxy group, 2,3-dimethyl-cyclopropylcarbonyloxy group, 1 -Ethyl-cyclopropylcarbonyloxy group, 2-ethyl-cyclopropylcarbonyloxy group, n-hexylcarbonyloxy group, 1-methyl-n-pentylcarbonyloxy group, 2-methyl-n-pentylcarbonyloxy group, 3- Methyl-n-pentylca Bonyloxy group, 4-methyl-n-pentylcarbonyloxy group, 1,1-dimethyl-n-butylcarbonyloxy group, 1,2-dimethyl-n-butylcarbonyloxy group, 1,3-dimethyl-n-butylcarbonyl Oxy group, 2,2-dimethyl-n-butylcarbonyloxy group, 2,3-dimethyl-n-butylcarbonyloxy group, 3,3-dimethyl-n-butylcarbonyloxy group, 1-ethyl-n-butylcarbonyl An oxy group, 2-ethyl-n-butylcarbonyloxy group, 1,1,2-trimethyl-n-propylcarbonyloxy group and the like can be mentioned.
As the group having a tertiary carbon structure, a tertiary butyl group can be preferably used.
Examples of the cyclic alkyl group include cyclic alkyl groups having 3 to 30 carbon atoms, such as cyclopropyl group, cyclobutyl group, cyclohexyl group, 1-methyl-cyclopentyl group, 2-methyl-cyclopentyl group, 3-methyl. -Cyclopentyl group, 1-ethyl-cyclobutyl group, 2-ethyl-cyclobutyl group, 3-ethyl-cyclobutyl group, 1,2-dimethyl-cyclobutyl group, 1,3-dimethyl-cyclobutyl group, 2,2-dimethyl-cyclobutyl Group, 2,3-dimethyl-cyclobutyl group, 2,4-dimethyl-cyclobutyl group, 3,3-dimethyl-cyclobutyl group, 1-n-propyl-cyclopropyl group, 2-n-propyl-cyclopropyl group, 1 -I-propyl-cyclopropyl group, 2-i-propyl-cyclopropyl group, 1,2,2 Trimethyl-cyclopropyl group, 1,2,3-trimethyl-cyclopropyl group, 2,2,3-trimethyl-cyclopropyl group, 1-ethyl-2-methyl-cyclopropyl group, 2-ethyl-1-methyl- Examples include a cyclopropyl group, a 2-ethyl-2-methyl-cyclopropyl group, and a 2-ethyl-3-methyl-cyclopropyl group. Further, a monovalent organic group derived from adamantane or norbornene can be used.
本発明に用いるポリマーは、上記Ar1及びAr2の選択とは別に、又は上記Ar1及びAr2の選択と共に、T1が式(3)で表される基である上記式(1)で表される単位構造、T1が式(4)で表される基である上記式(1)で表される単位構造、又はそれらの単位構造の組み合わせを含むポリマーを含むことができる。
即ち、Ar1及びAr2が式(2)で表される基である上記式(1)で表される単位構造、T1が式(3)で表される基である上記式(1)で表される単位構造、T1が式(4)で表される基である上記式(1)で表される単位構造、Ar1及びAr2が式(2)で表される基であり且つT1が式(3)で表される基である上記式(1)で表される単位構造、Ar1及びAr2が式(2)で表される基であり且つT1が式(4)で表される基である上記式(1)で表される単位構造、又はこれらの組み合わせを含むポリマーを用いることができる。Polymer used in the present invention, apart from the selection of the Ar 1 and Ar 2, or together with selecting the Ar 1 and Ar 2, the formula T 1 is a group represented by the formula (3) (1) unit structure represented, T 1 can include a polymer containing a combination of unit structures, or their unit structure represented by the formula is a group represented by (4) the formula (1).
That is, Ar 1 and Ar 2 are a unit structure represented by the above formula (1) which is a group represented by the formula (2), and T 1 is a group represented by the formula (3). A unit structure represented by the above formula, a unit structure represented by the above formula (1) in which T 1 is a group represented by the formula (4), Ar 1 and Ar 2 are groups represented by the formula (2) And T 1 is a group represented by formula (3), Ar 1 and Ar 2 are groups represented by formula (2), and T 1 is represented by formula (3). A polymer containing the unit structure represented by the above formula (1), which is a group represented by 4), or a combination thereof can be used.
式(3)及び(4)中、R2、R3及びR4はそれぞれ炭素原子数1乃至10のアルキル基、炭素原子数1乃至4のフルオロアルキル基、ヒドロキシル基、アリル基、アリロキシ基、アミノ基、シアノ基、ニトロ基、アシル基、アシルオキシ基、カルボキシル基、第3級炭素構造を有する基、環状アルキル基、又はそれらの組み合わせであり、n2、n3及びn4はそれぞれ0乃至4の整数を表す。T2はフルオロアルキレン基、環状アルキレン基、又はこれらの組み合わせを表す。
炭素原子数1乃至10のアルキル基、炭素原子数1乃至4のフルオロアルキル基、第3級炭素構造を有する基、環状アルキル基、アシル基、及びアシルオキシ基は上述の例示を用いることができる。
フルオロアルキレン基及び環状アルキレン基は上述の例示を用いることができ、これらを単独で用いることも、組み合わせて用いることもできる。
式(3)ではR2が少なくとも第3級炭素構造を有する基を含み、n2が1乃至4の整数である単位構造を用いることができる。In formulas (3) and (4), R 2 , R 3 and R 4 are each an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 4 carbon atoms, a hydroxyl group, an allyl group, an allyloxy group, An amino group, a cyano group, a nitro group, an acyl group, an acyloxy group, a carboxyl group, a group having a tertiary carbon structure, a cyclic alkyl group, or a combination thereof, and n2, n3 and n4 are each an integer of 0 to 4 Represents. T 2 represents a fluoroalkylene group, a cyclic alkylene group, or a combination thereof.
The above-mentioned examples can be used for the alkyl group having 1 to 10 carbon atoms, the fluoroalkyl group having 1 to 4 carbon atoms, the group having a tertiary carbon structure, the cyclic alkyl group, the acyl group, and the acyloxy group.
The above-mentioned illustrations can be used for the fluoroalkylene group and the cyclic alkylene group, and these can be used alone or in combination.
In the formula (3), a unit structure in which R 2 includes at least a group having a tertiary carbon structure and n2 is an integer of 1 to 4 can be used.
本発明は式(1)で表される単位構造に加え、更に式(5)で表される単位構造を含む共重合体を用いることができる。式(5)中、Xはスルホニル基又はカルボニル基を表し、Ar3及びAr4はそれぞれ炭素原子数6乃至30のアリーレン基を表し、T3はアルキレン基、スルホニル基、カルボニル基、炭素原子数6乃至30のアリーレン基、又はこれらの組み合わせを表す。これらのアリーレン基、アルキレン基は上述の例示を用いることができる。
式(5)においてアリーレン基としては、置換若しくは非置換のフェニレン基、ナフチレン基、又はアントリレン基を用いることができる。
式(5)において、上記アルキレン基としては炭素原子数1乃至10のアルキレン基が挙げられ、これらのアルキレン基は例えばメチレン基、エチレン基、プロピレン基、イソプロピレン基、プロパン−2,2−ジイル基、n−ブチレン基、イソブチレン基、s−ブチレン基、t−ブチレン基等が挙げられる。中でもプロパン−2,2−ジイル基等の炭素原子数1乃至4のアルキレン基が挙げられる。
式(5)においてT3としては式(6)で表される基を用いることができる。式(6)中、R5及びR6はそれぞれ炭素原子数1乃至10のアルキル基、炭素原子数1乃至4のフルオロアルキル基、ヒドロキシル基、アリル基、アリロキシ基、アミノ基、シアノ基、ニトロ基、アシル基、アシルオキシ基、カルボキシル基、第3級炭素構造を有する基、環状アルキル基、又はそれらの組み合わせで表され、n5及びn6はそれぞれ0乃至4の整数を表す。T4はアルキレン基、スルホニル基、カルボニル基、炭素原子数6乃至30のアリーレン基、又はこれらの組み合わせを表す。上記アルキル基、炭素原子数1乃至4のフルオロアルキル基、アシル基、アシルオキシ基、第3級炭素構造を有する基、環状アルキル基、アルキレン基、及びアリーレン基としては上述の例示を用いることができる。
本発明において第3級炭素構造を有する基は、第3級炭素構造を有する官能基である。この官能基が炭素原子上の水素原子と置換して第4級炭素を生じる。この第3級炭素構造の第3級炭素原子に結合している有機基は、メチル基、エチル基、プロピル基等のアルキル基や、フェニル基等のアリール基が例示され、中でもメチル基が好ましく用いられる。3つのメチル基を有するターシャリーブチル基は第3級炭素構造を有する基として好ましく用いることができる。In the present invention, in addition to the unit structure represented by the formula (1), a copolymer containing a unit structure represented by the formula (5) can be used. In formula (5), X represents a sulfonyl group or a carbonyl group, Ar 3 and Ar 4 each represent an arylene group having 6 to 30 carbon atoms, and T 3 represents an alkylene group, a sulfonyl group, a carbonyl group, or the number of carbon atoms. It represents 6 to 30 arylene groups or a combination thereof. As these arylene group and alkylene group, the above-mentioned examples can be used.
In the formula (5), as the arylene group, a substituted or unsubstituted phenylene group, naphthylene group, or anthrylene group can be used.
In the formula (5), the alkylene group includes an alkylene group having 1 to 10 carbon atoms. These alkylene groups include, for example, a methylene group, an ethylene group, a propylene group, an isopropylene group, propane-2,2-diyl. Group, n-butylene group, isobutylene group, s-butylene group, t-butylene group and the like. Among them, an alkylene group having 1 to 4 carbon atoms such as a propane-2,2-diyl group is exemplified.
In the formula (5), a group represented by the formula (6) can be used as T 3 . In the formula (6), R 5 and R 6 are each an alkyl group having 1 to 10 carbon atoms, a fluoroalkyl group having 1 to 4 carbon atoms, a hydroxyl group, an allyl group, an allyloxy group, an amino group, a cyano group, or a nitro group. Group, an acyl group, an acyloxy group, a carboxyl group, a group having a tertiary carbon structure, a cyclic alkyl group, or a combination thereof, and n5 and n6 each represents an integer of 0 to 4. T 4 represents an alkylene group, a sulfonyl group, a carbonyl group, an arylene group having 6 to 30 carbon atoms, or a combination thereof. Examples of the alkyl group, the fluoroalkyl group having 1 to 4 carbon atoms, the acyl group, the acyloxy group, the group having a tertiary carbon structure, the cyclic alkyl group, the alkylene group, and the arylene group can be exemplified above. .
In the present invention, the group having a tertiary carbon structure is a functional group having a tertiary carbon structure. This functional group replaces a hydrogen atom on the carbon atom to produce a quaternary carbon. Examples of the organic group bonded to the tertiary carbon atom of the tertiary carbon structure include an alkyl group such as a methyl group, an ethyl group, and a propyl group, and an aryl group such as a phenyl group. Among them, a methyl group is preferable. Used. A tertiary butyl group having three methyl groups can be preferably used as a group having a tertiary carbon structure.
本発明に用いられる式(1)で表される単位構造は以下に例示することができる。
式(1)で表される単位構造を含む上記ポリマーは末端がヒドロキシル基やハロゲン基であるか、又はそのヒドロキシル基の水素原子やハロゲン基をフェニル基などで置換してキャッピングしたものでも良い。このキャッピング基としては下記式(A)で表される。
本発明には、架橋剤を用いてもよい。その架橋剤に特に制限は無いがポリマーの官能基と反応可能な置換基を2つ以上、例えば2乃至6個、又は2乃至4個有する架橋剤が好ましい。固形分中に占める架橋剤の割合は、0乃至50質量%、好ましくは5乃至40質量%とすることが可能である。 In the present invention, a crosslinking agent may be used. The crosslinking agent is not particularly limited, but a crosslinking agent having two or more, for example, 2 to 6, or 2 to 4 substituents capable of reacting with the functional group of the polymer is preferable. The proportion of the crosslinking agent in the solid content can be 0 to 50% by mass, preferably 5 to 40% by mass.
本発明に用いられる架橋剤としては、ヒドロキシメチル基又はアルコキシメチル基で置換された窒素原子を有する含窒素化合物が挙げられる。例えば、ヒドロキシメチル基、メトキシメチル基、エトキシメチル基、ブトキシメチル基、及びヘキシルオキシメチル基等の基で置換された窒素原子を有する含窒素化合物である。また、エポキシ基含有化合物、エポキシ基含有ポリマー、アリル基含有化合物、アリル基含有ポリマー、イソシアネート基含有化合物、イソシアネート基含有ポリマーを架橋剤として用いることができる。 Examples of the crosslinking agent used in the present invention include nitrogen-containing compounds having a nitrogen atom substituted with a hydroxymethyl group or an alkoxymethyl group. For example, a nitrogen-containing compound having a nitrogen atom substituted with a group such as a hydroxymethyl group, a methoxymethyl group, an ethoxymethyl group, a butoxymethyl group, and a hexyloxymethyl group. Moreover, an epoxy group-containing compound, an epoxy group-containing polymer, an allyl group-containing compound, an allyl group-containing polymer, an isocyanate group-containing compound, or an isocyanate group-containing polymer can be used as a crosslinking agent.
含窒素化合物としては具体的には、ヘキサメトキシメチルメラミン、テトラメトキシメチルベンゾグアナミン、1,3,4,6−テトラキス(ブトキシメチル)グリコールウリル、1,3,4,6−テトラキス(ヒドロキシメチル)グリコールウリル、1,3−ビス(ヒドロキシメチル)尿素、1,1,3,3−テトラキス(ブトキシメチル)尿素、1,1,3,3−テトラキス(メトキシメチル)尿素、1,3−ビス(ヒドロキシメチル)−4,5−ジヒドロキシ−2−イミダゾリノン及び1,3−ビス(メトキシメチル)−4,5−ジメトキシ−2−イミダゾリノン等の含窒素化合物が挙げられる。
架橋剤としては、また、三井サイテック(株)製メトキシメチルタイプメラミン化合物(商品名サイメル300、サイメル301、サイメル303、サイメル350)、ブトキシメチルタイプメラミン化合物(商品名マイコート506、マイコート508)、グリコールウリル化合物(商品名サイメル1170、パウダーリンク1174)、メチル化尿素樹脂(商品名UFR65)、ブチル化尿素樹脂(商品名UFR300、U−VAN10S60、U−VAN10R、U−VAN11HV)、大日本インキ化学工業(株)製尿素/ホルムアルデヒド系樹脂(高縮合型、商品名ベッカミンJ−300S、ベッカミンP−955、ベッカミンN)等の市販されている化合物を挙げることができる。
また、架橋剤としては、アミノ基の水素原子がヒドロキシメチル基又はアルコキシメチル基で置換された前記のようなメラミン化合物、尿素化合物、グリコールウリル化合物及びベンゾグアナミン化合物を縮合させて得られる化合物であってもよい。例えば、米国特許6323310号に記載されている、メラミン化合物(商品名サイメル303)とベンゾグアナミン化合物(商品名サイメル1123)から製造される高分子量の化合物を架橋性化合物として使用することができる。
また、架橋剤としては、N−ヒドロキシメチルアクリルアミド、N−メトキシメチルメタクリルアミド、N−エトキシメチルアクリルアミド及びN−ブトキシメチルメタクリルアミド等のヒドロキシメチル基又はアルコキシメチル基で置換されたアクリルアミド化合物又はメタクリルアミド化合物を使用して製造されるポリマー化合物を用いることができる。そのようなポリマー化合物としては、例えば、ポリ(N−ブトキシメチルアクリルアミド)、N−ブトキシメチルアクリルアミドとスチレンの共重合体、N−ヒドロキシメチルメタクリルアミドとメチルメタクリレートの共重合体、N−エトキシメチルメタクリルアミドとベンジルメタクリレートの共重合体、及びN−ブトキシメチルアクリルアミドとベンジルメタクリレートと2−ヒドロキシプロピルメタクリレートの共重合体等を挙げることができる。Specific examples of nitrogen-containing compounds include hexamethoxymethyl melamine, tetramethoxymethyl benzoguanamine, 1,3,4,6-tetrakis (butoxymethyl) glycoluril, 1,3,4,6-tetrakis (hydroxymethyl) glycol. Uril, 1,3-bis (hydroxymethyl) urea, 1,1,3,3-tetrakis (butoxymethyl) urea, 1,1,3,3-tetrakis (methoxymethyl) urea, 1,3-bis (hydroxy) And nitrogen-containing compounds such as methyl) -4,5-dihydroxy-2-imidazolinone and 1,3-bis (methoxymethyl) -4,5-dimethoxy-2-imidazolinone.
As cross-linking agents, methoxymethyl type melamine compounds (trade names: Cymel 300, Cymel 301, Cymel 303, Cymel 350) manufactured by Mitsui Cytec Co., Ltd., butoxymethyl type melamine compounds (trade names: Mycoat 506, Mycoat 508) , Glycoluril compound (trade name Cymel 1170, powder link 1174), methylated urea resin (trade name UFR65), butylated urea resin (trade names UFR300, U-VAN10S60, U-VAN10R, U-VAN11HV), Dainippon Ink Examples include commercially available compounds such as urea / formaldehyde resin (high condensation type, trade name Becamine J-300S, Becamine P-955, Becamine N) manufactured by Chemical Industry Co., Ltd.
The crosslinking agent is a compound obtained by condensing the melamine compound, urea compound, glycoluril compound and benzoguanamine compound as described above in which the hydrogen atom of the amino group is substituted with a hydroxymethyl group or an alkoxymethyl group. Also good. For example, a high molecular weight compound produced from a melamine compound (trade name Cymel 303) and a benzoguanamine compound (trade name Cymel 1123) described in US Pat. No. 6,323,310 can be used as the crosslinkable compound.
As the crosslinking agent, N-hydroxymethyl acrylamide, N-methoxymethyl methacrylamide, N-ethoxymethyl acrylamide, N-butoxymethyl methacrylamide and the like acrylamide compound or methacrylamide substituted with hydroxymethyl group or alkoxymethyl group Polymer compounds produced using the compounds can be used. Examples of such a polymer compound include poly (N-butoxymethyl acrylamide), a copolymer of N-butoxymethyl acrylamide and styrene, a copolymer of N-hydroxymethyl methacrylamide and methyl methacrylate, and N-ethoxymethyl methacryl. Examples thereof include a copolymer of amide and benzyl methacrylate, a copolymer of N-butoxymethylacrylamide, benzyl methacrylate, and 2-hydroxypropyl methacrylate.
エポキシ基を含有する架橋剤としては例えば1個乃至6個、また2個乃至4個のエポキシ環を有する化合物を使用することができる。エポキシ環を有する化合物としては、例えば、ジオール化合物、トリオール化合物、ジカルボン酸化合物及びトリカルボン酸化合物等の2個以上の水酸基又はカルボキシル基を有する化合物と、エピクロルヒドリン等のグリシジル化合物から製造することができる、2個以上のグリシジルエーテル構造又はグリシジルエステル構造を有する化合物を挙げることができる。例えば1,4−ブタンジオールジグリシジルエーテル、1,2−エポキシ−4−(エポキシエチル)シクロヘキサン、グリセロールトリグリシジルエーテル、ジエチレングリコールジグリシジルエーテル、2,6−ジグリシジルフェニルグリシジルエーテル、1,1,3−トリス[p−(2,3−エポキシプロポキシ)フェニル]プロパン、1,2−シクロヘキサンジカルボン酸ジグリシジルエステル、4,4’−メチレンビス(N,N−ジグリシジルアニリン)、3,4−エポキシシクロヘキシルメチル−3,4−エポキシシクロヘキサンカルボキシレート、トリメチロールエタントリグリシジルエーテル、トリグリシジル−p−アミノフェノール、テトラグリシジルメタキシレンジアミン、テトラグリシジルジアミノジフェニルメタン、テトラグリシジル−1,3−ビスアミノメチルシクロヘキサン、ビスフェノール−A−ジグリシジルエーテル、ビスフェノール−S−ジグリシジルエーテル、ペンタエリスリトールテトラグリシジルエーテルレゾルシノールジグリシジルエーテル、フタル酸ジグリシジルエステル、ネオペンチルグリコールジグリシジルエーテル、ポリプロピレングリコールジグリシジルエーテル、テトラブロモビスフェノール−A−ジグリシジルエーテル、ビスフェノールヘキサフルオロアセトンジグリシジルエーテル、ペンタエリスリトールジグリシジルエーテル、トリス−(2,3−エポキシプロピル)イソシアヌレート、モノアリルジグリシジルイソシアヌレート、ジグリセロールポリジグリシジルエーテル、ペンタエリスリトールポリグリシジルエーテル、1,4−ビス(2,3−エポキシプロポキシパーフルオロイソプロピル)シクロヘキサン、ソルビトールポリグリシジルエーテル、トリメチロールプロパンポリグリシジルエーテル、レゾルシンジグリシジルエーテル、1,6−へキサンジオールジグリシジルエーテル、ポリエチレングリコールジグリシジルエーテル、フェニルグリシジルエーテル、p−ターシャリーブチルフェニルグリシジルエーテル、アジピン酸ジグリシジルエーテル、o−フタル酸ジグリシジルエーテル、ジブロモフェニルグリシジルエーテル、1,2,7,8−ジエポキシオクタン、1,6−ジメチロールパーフルオロヘキサンジグリシジルエーテル、4,4’−ビス(2,3−エポキシプロポキシパーフルオロイソプロピル)ジフェニルエーテル、2,2−ビス(4−グリシジルオキシフェニル)プロパン、3,4−エポキシシクロヘキシルメチル−3’,4’−エポキシシクロヘキサンカルボキシレート、3,4−エポキシシクロヘキシルオキシラン、2−(3,4−エポキシシクロヘキシル)−3’,4’−エポキシ−1,3−ジオキサン−5−スピロシクロヘキサン、1,2−エチレンジオキシ−ビス(3,4−エポキシシクロヘキシルメタン)、4’,5’−エポキシ−2’−メチルシクロヘキシルメチル−4,5−エポキシ−2−メチルシクロヘキサンカルボキシレート、エチレングリコール−ビス(3,4−エポキシシクロヘキサンカルボキシレート)、ビス−(3,4−エポキシシクロヘキシルメチル)アジペート、及びビス(2,3−エポキシシクロペンチル)エーテル等を挙げることができる。
架橋剤は、1種の化合物のみを使用することができ、また、2種以上の化合物を組み合わせて用いることもできる。As the crosslinking agent containing an epoxy group, for example, a compound having 1 to 6 or 2 to 4 epoxy rings can be used. As the compound having an epoxy ring, for example, it can be produced from a compound having two or more hydroxyl groups or carboxyl groups such as a diol compound, a triol compound, a dicarboxylic acid compound and a tricarboxylic acid compound, and a glycidyl compound such as epichlorohydrin. Mention may be made of compounds having two or more glycidyl ether structures or glycidyl ester structures. For example, 1,4-butanediol diglycidyl ether, 1,2-epoxy-4- (epoxyethyl) cyclohexane, glycerol triglycidyl ether, diethylene glycol diglycidyl ether, 2,6-diglycidyl phenyl glycidyl ether, 1,1,3 -Tris [p- (2,3-epoxypropoxy) phenyl] propane, 1,2-cyclohexanedicarboxylic acid diglycidyl ester, 4,4'-methylenebis (N, N-diglycidylaniline), 3,4-epoxycyclohexyl Methyl-3,4-epoxycyclohexanecarboxylate, trimethylolethane triglycidyl ether, triglycidyl-p-aminophenol, tetraglycidylmetaxylenediamine, tetraglycidyldiaminodiphenylmethane, Traglycidyl-1,3-bisaminomethylcyclohexane, bisphenol-A-diglycidyl ether, bisphenol-S-diglycidyl ether, pentaerythritol tetraglycidyl ether resorcinol diglycidyl ether, phthalic acid diglycidyl ester, neopentyl glycol diglycidyl ether , Polypropylene glycol diglycidyl ether, tetrabromobisphenol-A-diglycidyl ether, bisphenol hexafluoroacetone diglycidyl ether, pentaerythritol diglycidyl ether, tris- (2,3-epoxypropyl) isocyanurate, monoallyl diglycidyl isocyanurate , Diglycerol polydiglycidyl ether, pentaerythritol polyglycidyl ether 1,4-bis (2,3-epoxypropoxyperfluoroisopropyl) cyclohexane, sorbitol polyglycidyl ether, trimethylolpropane polyglycidyl ether, resorcin diglycidyl ether, 1,6-hexanediol diglycidyl ether, polyethylene glycol Diglycidyl ether, phenyl glycidyl ether, p-tertiary butyl phenyl glycidyl ether, adipic acid diglycidyl ether, o-phthalic acid diglycidyl ether, dibromophenyl glycidyl ether, 1,2,7,8-diepoxyoctane, 1, 6-dimethylol perfluorohexane diglycidyl ether, 4,4′-bis (2,3-epoxypropoxyperfluoroisopropyl) diphenyl ether, 2,2-bi (4-glycidyloxyphenyl) propane, 3,4-epoxycyclohexylmethyl-3 ′, 4′-epoxycyclohexanecarboxylate, 3,4-epoxycyclohexyloxirane, 2- (3,4-epoxycyclohexyl) -3 ′, 4'-epoxy-1,3-dioxane-5-spirocyclohexane, 1,2-ethylenedioxy-bis (3,4-epoxycyclohexylmethane), 4 ', 5'-epoxy-2'-methylcyclohexylmethyl- 4,5-epoxy-2-methylcyclohexanecarboxylate, ethylene glycol-bis (3,4-epoxycyclohexanecarboxylate), bis- (3,4-epoxycyclohexylmethyl) adipate, and bis (2,3-epoxycyclopentyl) ) Ether can be mentioned .
As the cross-linking agent, only one compound can be used, or two or more compounds can be used in combination.
本発明の接着剤組成物は架橋触媒を含むことができる。架橋触媒を使用することにより、架橋性化合物の反応が促進される。
架橋触媒としては、p−トルエンスルホン酸、トリフルオロメタンスルホン酸、メタンスルホン酸、ピリジニウム−p−トルエンスルホン酸、サリチル酸、カンファースルホン酸、スルホサリチル酸、クエン酸、安息香酸、及びヒドロキシ安息香酸等の酸化合物が使用できる。
架橋触媒としては、芳香族スルホン酸化合物が使用できる。芳香族スルホン酸化合物の具体例としては、p−トルエンスルホン酸、ピリジニウム−p−トルエンスルホン酸、スルホサリチル酸、4−クロロベンゼンスルホン酸、4−ヒドロキシベンゼンスルホン酸、ベンゼンジスルホン酸、1−ナフタレンスルホン酸、及びピリジニウム−1−ナフタレンスルホン酸等を挙げることができる。The adhesive composition of the present invention can contain a crosslinking catalyst. By using a crosslinking catalyst, the reaction of the crosslinkable compound is promoted.
Examples of crosslinking catalysts include p-toluenesulfonic acid, trifluoromethanesulfonic acid, methanesulfonic acid, pyridinium-p-toluenesulfonic acid, salicylic acid, camphorsulfonic acid, sulfosalicylic acid, citric acid, benzoic acid, and hydroxybenzoic acid. Compounds can be used.
An aromatic sulfonic acid compound can be used as the crosslinking catalyst. Specific examples of the aromatic sulfonic acid compound include p-toluenesulfonic acid, pyridinium-p-toluenesulfonic acid, sulfosalicylic acid, 4-chlorobenzenesulfonic acid, 4-hydroxybenzenesulfonic acid, benzenedisulfonic acid, and 1-naphthalenesulfonic acid. And pyridinium-1-naphthalenesulfonic acid.
エポキシ基を有する架橋剤を用いる場合は、架橋触媒としてフェノール樹脂、アミン類、ポリアミド樹脂、イミダゾール類、ポリメルカプタン、酸無水物等を使用できる。
フェノール樹脂としては、例えばフェノールノボラック樹脂、クレゾールノボラック樹脂等が挙げられる。
アミン類としては、例えばピペリジン、N,N−ジメチルピペラジン、トリエチレンジアミン、2,4,6−トリス(ジメチルアミノメチル)フェノール、ベンジルジメチルアミン、2−(ジメチルアミノメチル)フェノール、ジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、ジエチルアミノプロピルアミン、N−アミノエチルピペラジン、ジ(1−メチル−2−アミノシクロヘキシル)メタン、メンセンジアミン、イソフオロンジアミン、ジアミノジシクロヘキシルメタン、1,3−ジアミノメチルシクロヘキサン、キシレンジアミン、メタフェニレンジアミン、ジアミノジフェニルメタン、ジアミノジフェニルスルホン等が挙げられる。これらの中でジエチレントリアミン、トリエチレンテトラミン、テトラエチレンペンタミン、ジエチルアミノプロピルアミン、N−アミノエチルピペラジン、ジ(1−メチル−2−アミノシクロヘキシル)メタン、メンセンジアミン、イソフオロンジアミン、ジアミノジシクロヘキシルメタン等は好ましく用いることができる。
ポリアミド樹脂としては、ダイマー酸とポリアミンの縮合により生成するもので、分子中に一級アミンと二級アミンを有するポリアミドアミンが挙げられる。
イミダゾール類としては、2−メチルイミダゾール、2−エチル−4−メチルイミダゾール、1−シアノエチル−2−ウンデシルイミダゾリウムトリメリテート、エポキシイミダゾールアダクト等が挙げられる。
ポリメルカプタンとしては、例えばポリプロピレングリコール鎖の末端にメルカプタン基が存在するものや、ポリエチレングリコール鎖の末端にメルカプタン基が存在するものが挙げられる。
酸無水物としては一分子中に複数のカルボキシル基を有する化合物の無水物が好ましい。これらの酸無水物としては、無水フタル酸、無水トリメリット酸、無水ピロメリット酸、無水ベンゾフェノンテトラカルボン酸、エチレングリコールビストリメリテート、グリセロールトリストリメリテート、無水マレイン酸、テトラヒドロ無水フタル酸、メチルテトラヒドロ無水フタル酸、エンドメチレンテトラヒドロ無水フタル酸、メチルエンドメチレンテトラヒドロ無水フタル酸、メチルブテニルテトラヒドロ無水フタル酸、ドデセニル無水コハク酸、ヘキサヒドロ無水フタル酸、メチルヘキサヒドロ無水フタル酸、無水コハク酸、メチルシクロヘキセンジカルボン酸無水物、クロレンド酸無水物等が挙げられる。
また、その他の架橋触媒として、トリフェニルホスフィンやトリブチルホスフィンなどの有機リン化合物、エチルトリフェニルホスフォニウムブロマイド、テトラブチルホスホニウムジチオリン酸ジエチル等の第4級ホスフォニウム塩、1,8−ジアザビシクロ(5,4,0)ウンデカン−7−エン、1,8−ジアザビシクロ(5,4,0)ウンデカン−7−エンとオクチル酸の塩、オクチル酸亜鉛、テトラブチルアンモニウムブロミド等の第4級アンモニウム塩が挙げられる。When a crosslinking agent having an epoxy group is used, a phenol resin, an amine, a polyamide resin, an imidazole, a polymercaptan, an acid anhydride, or the like can be used as a crosslinking catalyst.
Examples of the phenol resin include phenol novolac resin and cresol novolac resin.
Examples of amines include piperidine, N, N-dimethylpiperazine, triethylenediamine, 2,4,6-tris (dimethylaminomethyl) phenol, benzyldimethylamine, 2- (dimethylaminomethyl) phenol, diethylenetriamine, and triethylenetetramine. , Tetraethylenepentamine, diethylaminopropylamine, N-aminoethylpiperazine, di (1-methyl-2-aminocyclohexyl) methane, mensendiamine, isophoronediamine, diaminodicyclohexylmethane, 1,3-diaminomethylcyclohexane, xylene Examples include diamine, metaphenylenediamine, diaminodiphenylmethane, and diaminodiphenylsulfone. Among these, diethylenetriamine, triethylenetetramine, tetraethylenepentamine, diethylaminopropylamine, N-aminoethylpiperazine, di (1-methyl-2-aminocyclohexyl) methane, mensendiamine, isophoronediamine, diaminodicyclohexylmethane, etc. Can be preferably used.
The polyamide resin is produced by condensation of dimer acid and polyamine, and includes a polyamide amine having a primary amine and a secondary amine in the molecule.
Examples of imidazoles include 2-methylimidazole, 2-ethyl-4-methylimidazole, 1-cyanoethyl-2-undecylimidazolium trimellitate, epoxy imidazole adduct, and the like.
Examples of the polymercaptan include those having a mercaptan group at the end of a polypropylene glycol chain and those having a mercaptan group at the end of a polyethylene glycol chain.
The acid anhydride is preferably an anhydride of a compound having a plurality of carboxyl groups in one molecule. These acid anhydrides include phthalic anhydride, trimellitic anhydride, pyromellitic anhydride, benzophenone tetracarboxylic anhydride, ethylene glycol bistrimellitate, glycerol trislimitate, maleic anhydride, tetrahydrophthalic anhydride, methyl Tetrahydrophthalic anhydride, endomethylenetetrahydrophthalic anhydride, methylendomethylenetetrahydrophthalic anhydride, methylbutenyltetrahydrophthalic anhydride, dodecenyl succinic anhydride, hexahydrophthalic anhydride, methylhexahydrophthalic anhydride, succinic anhydride, methyl Examples include cyclohexene dicarboxylic acid anhydride and chlorendic acid anhydride.
Other crosslinking catalysts include organic phosphorus compounds such as triphenylphosphine and tributylphosphine, quaternary phosphonium salts such as ethyltriphenylphosphonium bromide, diethyl tetrabutylphosphonium dithiophosphate, 1,8-diazabicyclo (5, Quaternary ammonium salts such as 4,0) undecan-7-ene, 1,8-diazabicyclo (5,4,0) undecan-7-ene and octyl acid, zinc octylate, tetrabutylammonium bromide It is done.
アリル基を有する架橋剤を用いる場合には、硬化触媒として例えばラジカル重合開始剤及びカチオン重合開始剤を使用することができる。
ラジカル重合開始剤としては、例えばイミダゾール化合物、ジアゾ化合物、ビスイミダゾール化合物、N−アリールグリシン化合物、有機アジド化合物、チタノセン化合物、アルミナート化合物、有機過酸化物、N−アルコキシピリジニウム塩化合物、及びチオキサントン化合物等が挙げられる。
有機アジド化合物としては、p−アジドベンズアルデヒド、p−アジドアセトフェノン、p−アジド安息香酸、p−アジドベンザルアセトフェノン、4,4’−ジアジドカルコン、4,4’−ジアジドジフェニルスルフィド、及び2,6−ビス(4’−アジドベンザル)−4−メチルシクロヘキサノン等を挙げることができる。
ジアゾ化合物としては、1−ジアゾ−2,5−ジエトキシ−4−p−トリルメルカプトベンゼンボロフルオリド、1−ジアゾ−4−N,N−ジメチルアミノベンゼンクロリド、及び1−ジアゾ−4−N,N−ジエチルアミノベンゼンボロフルオリド等を挙げることができる。
ビスイミダゾール化合物としては、2,2’−ビス(o−クロロフェニル)−4,5,4’,5’−テトラキス(3,4,5−トリメトキシフェニル)1,2’−ビスイミダゾール、及び2,2’−ビス(o−クロロフェニル)4,5,4’,5’−テトラフェニル−1,2’−ビスイミダゾール等を挙げることができる。
チタノセン化合物としては、ジシクロペンタジエニル−チタン−ジクロリド、ジシクロペンタジエニル−チタン−ビスフェニル、ジシクロペンタジエニル−チタン−ビス(2,3,4,5,6−ペンタフルオロフェニル)、ジシクロペンタジエニル−チタン−ビス(2,3,5,6−テトラフルオロフェニル)、ジシクロペンタジエニル−チタン−ビス(2,4,6−トリフルオロフェニル)、ジシクロペンタジエニル−チタン−ビス(2,6−ジフルオロフェニル)、ジシクロペンタジエニル−チタン−ビス(2,4−ジフルオロフェニル)、ビス(メチルシクロペンタジエニル)−チタン−ビス(2,3,4,5,6−ペンタフルオロフェニル)、ビス(メチルシクロペンタジエニル)−チタン−ビス(2,3,5,6−テトラフルオロフェニル)、ビス(メチルシクロペンタジエニル)−チタン−ビス(2,6−ジフルオロフェニル)、及びジシクロペンタジエニル−チタン−ビス(2,6−ジフルオロ−3−(1H−ピロール−1−イル)−フェニル)等を挙げることができる。
ラジカル重合開始剤としては、また、1,3−ジ(tert−ブチルジオキシカルボニル)ベンゾフェノン、3,3’,4,4’−テトラキス(tert−ブチルジオキシカルボニル)ベンゾフェノン、3−フェニル−5−イソオキサゾロン、2−メルカプトベンズイミダゾール、2,2−ジメトキシ−1,2−ジフェニルエタン−1−オン、1−ヒドロキシ−シクロヘキシル−フェニル−ケトン、及び2−ベンジル−2−ジメチルアミノ−1−(4−モルフォリノフェニル)−ブタノン等を挙げることができる。In the case of using a crosslinking agent having an allyl group, for example, a radical polymerization initiator and a cationic polymerization initiator can be used as a curing catalyst.
Examples of radical polymerization initiators include imidazole compounds, diazo compounds, bisimidazole compounds, N-aryl glycine compounds, organic azide compounds, titanocene compounds, aluminate compounds, organic peroxides, N-alkoxypyridinium salt compounds, and thioxanthone compounds. Etc.
Examples of organic azide compounds include p-azidobenzaldehyde, p-azidoacetophenone, p-azidobenzoic acid, p-azidobenzalacetophenone, 4,4′-diazidochalcone, 4,4′-diazidodiphenyl sulfide, and 2 , 6-bis (4′-azidobenzal) -4-methylcyclohexanone and the like.
Examples of the diazo compound include 1-diazo-2,5-diethoxy-4-p-tolylmercaptobenzeneborofluoride, 1-diazo-4-N, N-dimethylaminobenzene chloride, and 1-diazo-4-N, Examples thereof include N-diethylaminobenzeneborofluoride.
Examples of the bisimidazole compound include 2,2′-bis (o-chlorophenyl) -4,5,4 ′, 5′-tetrakis (3,4,5-trimethoxyphenyl) 1,2′-bisimidazole, and 2 , 2'-bis (o-chlorophenyl) 4,5,4 ', 5'-tetraphenyl-1,2'-bisimidazole and the like.
As titanocene compounds, dicyclopentadienyl-titanium-dichloride, dicyclopentadienyl-titanium-bisphenyl, dicyclopentadienyl-titanium-bis (2,3,4,5,6-pentafluorophenyl) Dicyclopentadienyl-titanium-bis (2,3,5,6-tetrafluorophenyl), dicyclopentadienyl-titanium-bis (2,4,6-trifluorophenyl), dicyclopentadienyl -Titanium-bis (2,6-difluorophenyl), dicyclopentadienyl-titanium-bis (2,4-difluorophenyl), bis (methylcyclopentadienyl) -titanium-bis (2,3,4, 5,6-pentafluorophenyl), bis (methylcyclopentadienyl) -titanium-bis (2,3,5,6-tetrafluoro Enyl), bis (methylcyclopentadienyl) -titanium-bis (2,6-difluorophenyl), and dicyclopentadienyl-titanium-bis (2,6-difluoro-3- (1H-pyrrol-1-) Yl) -phenyl) and the like.
As the radical polymerization initiator, 1,3-di (tert-butyldioxycarbonyl) benzophenone, 3,3 ′, 4,4′-tetrakis (tert-butyldioxycarbonyl) benzophenone, 3-phenyl-5 -Isoxazolone, 2-mercaptobenzimidazole, 2,2-dimethoxy-1,2-diphenylethane-1-one, 1-hydroxy-cyclohexyl-phenyl-ketone, and 2-benzyl-2-dimethylamino-1- ( 4-morpholinophenyl) -butanone and the like can be mentioned.
カチオン重合開始剤としては、スルホン酸エステル、スルホンイミド化合物、ジスルホニルジアゾメタン化合物、ジアルキル−4−ヒドロキシスルホニウム塩、アリールスルホン酸−p−ニトロベンジルエステル、シラノール−アルミニウム錯体、(η6−ベンゼン)(η5−シクロペンタジエニル)鉄(II)等が挙げられる。
スルホンイミド化合物としては、例えば、N−(トリフルオロメタンスルホニルオキシ)スクシンイミド、N−(ノナフルオロ−ノルマルブタンスルホニルオキシ)スクシンイミド、N−(カンファースルホニルオキシ)スクシンイミド及びN−(トリフルオロメタンスルホニルオキシ)ナフタルイミド等が挙げられる。
ジスルホニルジアゾメタン化合物としては、例えば、ビス(トリフルオロメチルスルホニル)ジアゾメタン、ビス(シクロヘキシルスルホニル)ジアゾメタン、ビス(フェニルスルホニル)ジアゾメタン、ビス(p−トルエンスルホニル)ジアゾメタン、ビス(2,4−ジメチルベンゼンスルホニル)ジアゾメタン、及びメチルスルホニル−p−トルエンスルホニルジアゾメタン等が挙げられる。
カチオン重合開始剤としては、また、2−メチル−1−(4−メチルチオフェニル)−2−モルフォリノプロパン−1−オンを挙げることができる。
また、芳香族ヨードニウム塩化合物、芳香族スルホニウム塩化合物、芳香族ジアゾニウム塩化合物、芳香族ホスホニウム塩化合物、トリアジン化合物及び鉄アレーン錯体化合物等は、ラジカル重合開始剤としても、カチオン重合開始剤としても用いることができる。
芳香族ヨードニウム塩化合物としては、ジフェニルヨードニウムヘキサフルオロホスフエート、ジフェニルヨードニウムトリフルオロメタンスルホネート、ジフェニルヨードニウムノナフルオロ−ノルマルブタンスルホネート、ジフェニルヨードニウムパーフルオロ−ノルマルオクタンスルホネート、ジフェニルヨードニウムカンファースルホネート、ビス(4−tert−ブチルフェニル)ヨードニウムカンファースルホネート及びビス(4−tert−ブチルフェニル)ヨードニウムトリフルオロメタンスルホネート等が挙げられる。
芳香族スルホニウム塩化合物としては、例えば、トリフェニルスルホニウムヘキサフルオロアンチモネート、トリフェニルスルホニウムノナフルオロノルマルブタンスルホネート、トリフェニルスルホニウムカンファースルホネート及びトリフェニルスルホニウムトリフルオロメタンスルホネート等が挙げられる。
架橋触媒は、1種のみを使用することができ、また、2種以上を組み合わせて用いることもできる。Examples of the cationic polymerization initiator include sulfonic acid ester, sulfonimide compound, disulfonyldiazomethane compound, dialkyl-4-hydroxysulfonium salt, arylsulfonic acid-p-nitrobenzyl ester, silanol-aluminum complex, (η6-benzene) (η5 -Cyclopentadienyl) iron (II) and the like.
Examples of the sulfonimide compound include N- (trifluoromethanesulfonyloxy) succinimide, N- (nonafluoro-normalbutanesulfonyloxy) succinimide, N- (camphorsulfonyloxy) succinimide, N- (trifluoromethanesulfonyloxy) naphthalimide, and the like. Is mentioned.
Examples of the disulfonyldiazomethane compound include bis (trifluoromethylsulfonyl) diazomethane, bis (cyclohexylsulfonyl) diazomethane, bis (phenylsulfonyl) diazomethane, bis (p-toluenesulfonyl) diazomethane, and bis (2,4-dimethylbenzenesulfonyl). ) Diazomethane, methylsulfonyl-p-toluenesulfonyldiazomethane, and the like.
Examples of the cationic polymerization initiator may include 2-methyl-1- (4-methylthiophenyl) -2-morpholinopropan-1-one.
In addition, aromatic iodonium salt compounds, aromatic sulfonium salt compounds, aromatic diazonium salt compounds, aromatic phosphonium salt compounds, triazine compounds and iron arene complex compounds are used as radical polymerization initiators and cationic polymerization initiators. be able to.
Aromatic iodonium salt compounds include diphenyliodonium hexafluorophosphate, diphenyliodonium trifluoromethanesulfonate, diphenyliodonium nonafluoro-normal butanesulfonate, diphenyliodonium perfluoro-normaloctanesulfonate, diphenyliodonium camphorsulfonate, bis (4-tert- Examples thereof include butylphenyl) iodonium camphorsulfonate and bis (4-tert-butylphenyl) iodonium trifluoromethanesulfonate.
Examples of the aromatic sulfonium salt compound include triphenylsulfonium hexafluoroantimonate, triphenylsulfonium nonafluoronormal butane sulfonate, triphenylsulfonium camphorsulfonate, triphenylsulfonium trifluoromethanesulfonate, and the like.
Only 1 type can be used for a crosslinking catalyst and it can also be used in combination of 2 or more type.
架橋触媒はポリマーに対して0乃至10質量部、又は0.01乃至10質量部、又は0.05乃至8質量部、又は0.1乃至5質量部、又は0.3乃至3質量部、又は0.5乃至1質量部で使用することができる。 The crosslinking catalyst is 0 to 10 parts by mass, or 0.01 to 10 parts by mass, or 0.05 to 8 parts by mass, or 0.1 to 5 parts by mass, or 0.3 to 3 parts by mass, or It can be used at 0.5 to 1 part by mass.
また、本発明に用いられる被接着物としては例えば、シリコン基板、ガラス基板、樹脂基板、及びセラミック基板を例示することができる。これら基板は本発明の積層体の支持体として使用することができる。 Moreover, as a to-be-adhered object used for this invention, a silicon substrate, a glass substrate, a resin substrate, and a ceramic substrate can be illustrated, for example. These substrates can be used as a support for the laminate of the present invention.
本発明に用いられる被接着物としては例えば、シリコン、酸化シリコン、ガラス、窒化シリコンなどの無機材料、アルミニウム、銅などの金属材料、ポリアミド樹脂、ポリイミド樹脂、エポキシ樹脂、ポリアクリル酸樹脂、ポリメタクリル酸樹脂、ポリベンゾオキサゾール樹脂、ポリヒドロキシスチレン樹脂、ベンゾシクロブテン樹脂などの樹脂材料等が挙げられる。 Examples of the adherend used in the present invention include inorganic materials such as silicon, silicon oxide, glass, and silicon nitride, metal materials such as aluminum and copper, polyamide resin, polyimide resin, epoxy resin, polyacrylic acid resin, and polymethacrylic resin. Examples thereof include resin materials such as acid resins, polybenzoxazole resins, polyhydroxystyrene resins, and benzocyclobutene resins.
接着剤組成物は、スピン塗布するために有機溶剤を用いて溶解させることができる。ポリマーが有機溶剤に溶解し、その溶液粘度が0.001乃至5000Pa・sの粘度を示す範囲で、そのポリマー溶液をスピンコート性を示す塗布液とすることができる。
上記有機溶剤としては、その他半導体工程で使用できる溶媒であれば特に限定はないが、シクロヘキサノン、メチルイソアミルケトン、2−ヘプタノン等のケトン類;エチレングリコール、エチレングリコールモノアセテート、ジエチレングリコール、ジエチレングリコールモノアセテート、プロピレングリコール、プロピレングリコールモノアセテート、ジプロピレングリコール又はジプロピレングリコールモノアセテートのモノメチルエーテル、モノエチルエーテル、モノプロピルエーテル、モノブチルエーテル又はモノフェニルエーテル等の多価アルコール類及びその誘導体;ジオキサン等の環式エーテル類;並びに乳酸メチル、乳酸エチル、酢酸メチル、酢酸エチル、酢酸ブチル、ピルビン酸メチル、ピルビン酸エチル、メトキシプロピオン酸メチル、エトキシプロピオン酸エチル等のエステル類を用いることが好ましい。これらは単独で用いてもよく、2種以上を混合して用いてもよい。The adhesive composition can be dissolved using an organic solvent for spin coating. As long as the polymer is dissolved in an organic solvent and the solution viscosity is in the range of 0.001 to 5000 Pa · s, the polymer solution can be used as a coating solution exhibiting spin coating properties.
The organic solvent is not particularly limited as long as it is a solvent that can be used in other semiconductor processes; ketones such as cyclohexanone, methyl isoamyl ketone, and 2-heptanone; ethylene glycol, ethylene glycol monoacetate, diethylene glycol, diethylene glycol monoacetate, Polyhydric alcohols such as propylene glycol, propylene glycol monoacetate, dipropylene glycol or dipropylene glycol monoacetate, such as monomethyl ether, monoethyl ether, monopropyl ether, monobutyl ether or monophenyl ether and their derivatives; cyclic such as dioxane Ethers; and methyl lactate, ethyl lactate, methyl acetate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate, Methyl acid, are preferably used esters such as ethyl ethoxypropionate. These may be used alone or in combination of two or more.
本実施の形態に係る接着剤組成物には、本発明における本質的な特性を損なわない範囲で、さらに、混和性のある添加剤、例えば接着剤の性能を改良するための付加的樹脂、粘着付与剤、可塑剤、接着助剤、安定剤、着色剤、界面活性剤などの慣用されているものを添加することができる。
接着剤の性能を改良するための付加的樹脂(ポリマー)としては、ポリエステル、ポリスチレン、ポリイミド、アクリルポリマー、メタクリルポリマー、ポリビニルエーテル、フェノールノボラック、ナフトールノボラック、ポリエーテル、ポリアミド、及びポリカーボネート等の付加重合ポリマー又は縮重合ポリマーを使用することができる。ベンゼン環、ナフタレン環、アントラセン環、トリアジン環、キノリン環、及びキノキサリン環等の芳香環構造を有するポリマーが好ましく使用される。
そのような付加的樹脂(ポリマー)としては、例えば、ベンジルアクリレート、ベンジルメタクリレート、フェニルアクリレート、ナフチルアクリレート、アントリルメタクリレート、アントリルメチルメタクリレート、スチレン、ヒドロキシスチレン、ベンジルビニルエーテル、及びN−フェニルマレイミド等の付加重合性モノマーをその構造単位として含む付加重合ポリマーや、フェノールノボラック、及びナフトールノボラック等の縮重合ポリマーが挙げられる。
また、付加的樹脂(ポリマー)としては芳香環構造を有さないポリマーを使用することができる。そのようなポリマーとしては、例えば、アルキルアクリレート、アルキルメタクリレート、ビニルエーテル、アルキルビニルエーテル、アクリロニトリル、マレイミド、N−アルキルマレイミド、及びマレイン酸無水物等の芳香環構造を有さない付加重合性モノマーのみをその構造単位として含む付加重合ポリマーが挙げられる。
付加的樹脂(ポリマー)として付加重合ポリマーが使用される場合、そのポリマーは単独重合体でもよく共重合体であってもよい。付加重合系ポリマーの製造には付加重合性モノマーが使用される。そのような付加重合性モノマーとしてはアクリル酸、メタクリル酸、アクリル酸エステル化合物、メタクリル酸エステル化合物、アクリルアミド化合物、メタクリルアミド化合物、ビニル化合物、スチレン化合物、マレイミド化合物、マレイン酸無水物、及びアクリロニトリル等が挙げられる。
アクリル酸エステル化合物としては、メチルアクリレート、エチルアクリレート、ノルマルヘキシルアクリレート、イソプロピルアクリレート、シクロヘキシルアクリレート、ベンジルアクリレート、フェニルアクリレート、アントリルメチルアクリレート、2−ヒドロキシエチルアクリレート、3−クロロ−2−ヒドロキシプロピルアクリレート、2−ヒドロキシプロピルアクリレート、2,2,2−トリフルオロエチルアクリレート、2,2,2−トリクロロエチルアクリレート、2−ブロモエチルアクリレート、4−ヒドロキシブチルアクリレート、2−メトキシエチルアクリレート、テトラヒドロフルフリルアクリレート、2−メチル−2−アダマンチルアクリレート、5−アクリロイルオキシ−6−ヒドロキシノルボルネン−2−カルボキシリック−6−ラクトン、3−アクリロキシプロピルトリエトキシシラン、及びグリシジルアクリレート等が挙げられる。
メタクリル酸エステル化合物としては、メチルメタクリレート、エチルメタクリレート、ノルマルヘキシルメタクリレート、イソプロピルメタクリレート、シクロヘキシルメタクリレート、ベンジルメタクリレート、フェニルメタクリレート、アントリルメチルメタクリレート、2−ヒドロキシエチルメタクリレート、2−ヒドロキシプロピルメタクリレート、2,2,2−トリフルオロエチルメタクリレート、2,2,2−トリクロロエチルメタクリレート、2−ブロモエチルメタクリレート、4−ヒドロキシブチルメタクリレート、2−メトキシエチルメタクリレート、テトラヒドロフルフリルメタクリレート、2−メチル−2−アダマンチルメタクリレート、5−メタクリロイルオキシ−6−ヒドロキシノルボルネン−2−カルボキシリック−6−ラクトン、3−メタクリロキシプロピルトリエトキシシラン、グリシジルメタクリレート、2−フェニルエチルメタクリレート、ヒドロキシフェニルメタクリレート、及びブロモフェニルメタクリレート等が挙げられる。
アクリルアミド化合物としては、アクリルアミド、N−メチルアクリルアミド、N−エチルアクリルアミド、N−ベンジルアクリルアミド、N−フェニルアクリルアミド、N,N−ジメチルアクリルアミド、及びN−アントリルアクリルアミド等が挙げられる。
メタクリルアミド化合物としては、メタクリルアミド、N−メチルメタクリルアミド、N−エチルメタクリルアミド、N−ベンジルメタクリルアミド、N−フェニルメタクリルアミド、N,N−ジメチルメタクリルアミド、及びN−アントリルアクリルアミド等が挙げられる。
ビニル化合物としては、ビニルアルコール、2−ヒドロキシエチルビニルエーテル、メチルビニルエーテル、エチルビニルエーテル、ベンジルビニルエーテル、ビニル酢酸、ビニルトリメトキシシラン、2−クロロエチルビニルエーテル、2−メトキシエチルビニルエーテル、ビニルナフタレン、及びビニルアントラセン等が挙げられる。
スチレン化合物としては、スチレン、ヒドロキシスチレン、クロロスチレン、ブロモスチレン、メトキシスチレン、シアノスチレン、及びアセチルスチレン等が挙げられる。
マレイミド化合物としては、マレイミド、N−メチルマレイミド、N−フェニルマレイミド、N−シクロヘキシルマレイミド、N−ベンジルマレイミド、及びN−ヒドロキシエチルマレイミド等が挙げられる。In the adhesive composition according to the present embodiment, a miscible additive, for example, an additional resin or an adhesive for improving the performance of the adhesive, as long as the essential characteristics of the present invention are not impaired. Commonly used agents such as an imparting agent, a plasticizer, an adhesion aid, a stabilizer, a colorant, and a surfactant can be added.
Additional resins (polymers) for improving adhesive performance include addition polymerization of polyester, polystyrene, polyimide, acrylic polymer, methacrylic polymer, polyvinyl ether, phenol novolac, naphthol novolac, polyether, polyamide, polycarbonate, etc. Polymers or polycondensation polymers can be used. A polymer having an aromatic ring structure such as a benzene ring, naphthalene ring, anthracene ring, triazine ring, quinoline ring and quinoxaline ring is preferably used.
Examples of such additional resin (polymer) include benzyl acrylate, benzyl methacrylate, phenyl acrylate, naphthyl acrylate, anthryl methacrylate, anthryl methyl methacrylate, styrene, hydroxystyrene, benzyl vinyl ether, and N-phenylmaleimide. Examples include addition polymerization polymers containing an addition polymerizable monomer as a structural unit, and condensation polymerization polymers such as phenol novolac and naphthol novolak.
Further, as the additional resin (polymer), a polymer having no aromatic ring structure can be used. Examples of such a polymer include only addition polymerizable monomers having no aromatic ring structure such as alkyl acrylate, alkyl methacrylate, vinyl ether, alkyl vinyl ether, acrylonitrile, maleimide, N-alkyl maleimide, and maleic anhydride. An addition polymerization polymer containing as a structural unit is mentioned.
When an addition polymerization polymer is used as the additional resin (polymer), the polymer may be a homopolymer or a copolymer. An addition polymerizable monomer is used for the production of the addition polymerization type polymer. Examples of such addition polymerizable monomers include acrylic acid, methacrylic acid, acrylic ester compounds, methacrylic ester compounds, acrylamide compounds, methacrylamide compounds, vinyl compounds, styrene compounds, maleimide compounds, maleic anhydride, and acrylonitrile. Can be mentioned.
As acrylic ester compounds, methyl acrylate, ethyl acrylate, normal hexyl acrylate, isopropyl acrylate, cyclohexyl acrylate, benzyl acrylate, phenyl acrylate, anthryl methyl acrylate, 2-hydroxyethyl acrylate, 3-chloro-2-hydroxypropyl acrylate, 2-hydroxypropyl acrylate, 2,2,2-trifluoroethyl acrylate, 2,2,2-trichloroethyl acrylate, 2-bromoethyl acrylate, 4-hydroxybutyl acrylate, 2-methoxyethyl acrylate, tetrahydrofurfuryl acrylate, 2-methyl-2-adamantyl acrylate, 5-acryloyloxy-6-hydroxynorbornene-2- Rubokishirikku 6- lactone, 3-acryloxypropyl triethoxysilane, and the like, such as glycidyl acrylate.
Methacrylic acid ester compounds include methyl methacrylate, ethyl methacrylate, normal hexyl methacrylate, isopropyl methacrylate, cyclohexyl methacrylate, benzyl methacrylate, phenyl methacrylate, anthryl methyl methacrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl methacrylate, 2,2, 2-trifluoroethyl methacrylate, 2,2,2-trichloroethyl methacrylate, 2-bromoethyl methacrylate, 4-hydroxybutyl methacrylate, 2-methoxyethyl methacrylate, tetrahydrofurfuryl methacrylate, 2-methyl-2-adamantyl methacrylate, 5 -Methacryloyloxy-6-hydroxynorbornene-2-carboxy Click-6-lactone, 3-methacryloxypropyl triethoxysilane, glycidyl methacrylate, 2-phenylethyl methacrylate, hydroxyphenyl methacrylate, and bromophenyl methacrylate.
Examples of the acrylamide compound include acrylamide, N-methylacrylamide, N-ethylacrylamide, N-benzylacrylamide, N-phenylacrylamide, N, N-dimethylacrylamide, and N-anthrylacrylamide.
Examples of the methacrylamide compound include methacrylamide, N-methyl methacrylamide, N-ethyl methacrylamide, N-benzyl methacrylamide, N-phenyl methacrylamide, N, N-dimethyl methacrylamide, and N-anthryl acrylamide. It is done.
Examples of vinyl compounds include vinyl alcohol, 2-hydroxyethyl vinyl ether, methyl vinyl ether, ethyl vinyl ether, benzyl vinyl ether, vinyl acetic acid, vinyl trimethoxysilane, 2-chloroethyl vinyl ether, 2-methoxyethyl vinyl ether, vinyl naphthalene, and vinyl anthracene. Is mentioned.
Examples of the styrene compound include styrene, hydroxystyrene, chlorostyrene, bromostyrene, methoxystyrene, cyanostyrene, and acetylstyrene.
Examples of the maleimide compound include maleimide, N-methylmaleimide, N-phenylmaleimide, N-cyclohexylmaleimide, N-benzylmaleimide, and N-hydroxyethylmaleimide.
本発明の接着剤組成物に使用される付加的樹脂(ポリマー)の分子量としては、重量平均分子量として、例えば、1000乃至1000000であり、又は3000乃至300000であり、また、例えば5000乃至200000であり、又は10000乃至100000である。
本発明の接着剤組成物に付加的樹脂(ポリマー)が含まれる場合、その含有量としては、固形分中で例えば0乃至40質量%であり、又は0乃至20質量%であり、又は1乃至19質量%である。The molecular weight of the additional resin (polymer) used in the adhesive composition of the present invention is, for example, 1000 to 1000000, or 3000 to 300000, for example, 5000 to 200000, as a weight average molecular weight. Or 10,000 to 100,000.
When an additional resin (polymer) is included in the adhesive composition of the present invention, the content thereof is, for example, 0 to 40% by mass, 0 to 20% by mass, or 1 to 19% by mass.
粘着付与剤は、接着層の弾性率、粘性制御、表面状態制御のために添加される。かかる粘着付与剤の種類は、接着層の粘性を考慮して定めることが好ましいが、具体的に、脂肪族系石油樹脂、芳香族系石油樹脂、脂肪族・芳香族共重合系石油樹脂、脂環族系水添石油樹脂、アルキルフェノール樹脂、キシレン樹脂、クマロンインデン樹脂、テルペン樹脂、テルペンフェノール樹脂、芳香族変性テルペン樹脂、水素化テルペン樹脂、ロジン系樹脂、水添ロジン系樹脂、不均化ロジン系樹脂、二量化ロジン系樹脂、エステル化ロジン系樹脂等の1種単独又は2種以上の組み合わせが挙げられる。粘着付与剤は接着剤組成物の主成分であるポリエーテル100重量部に対して0乃至100重量部の割合で含有することができる。
したがって、かかる粘着付与剤の添加量を0乃至100重量部の範囲内の値とすることがより好ましく、0乃至50重量部の範囲内の値とすることがさらに好ましい。The tackifier is added for controlling the elastic modulus, viscosity control, and surface state of the adhesive layer. The type of tackifier is preferably determined in consideration of the viscosity of the adhesive layer. Specifically, aliphatic petroleum resins, aromatic petroleum resins, aliphatic / aromatic copolymer petroleum resins, fats Cyclic hydrogenated petroleum resin, alkylphenol resin, xylene resin, coumarone indene resin, terpene resin, terpene phenol resin, aromatic modified terpene resin, hydrogenated terpene resin, rosin resin, hydrogenated rosin resin, disproportionation One type or a combination of two or more types of rosin resin, dimerized rosin resin, esterified rosin resin and the like can be mentioned. The tackifier can be contained in a proportion of 0 to 100 parts by weight with respect to 100 parts by weight of the polyether which is the main component of the adhesive composition.
Therefore, the amount of the tackifier added is more preferably in the range of 0 to 100 parts by weight, and still more preferably in the range of 0 to 50 parts by weight.
また、本発明は、少なくとも2つの被接着物と、これら被接着物間に設けられた本発明の接着剤組成物から形成した接着層とを含む積層体に関する。
本発明は、第1の被接着物上に本発明の接着剤組成物をスピンコートで塗布し50乃至300℃で焼成し接着層を形成する工程、形成された接着層を介して第2の被接着物を第1の被接着物に接着する工程を含む方法によって、被接着物の積層体を得ることができる。さらに、積層体の被接着物層を加工する工程を含むことができる。
また、さらに第2の被接着物上に接着層を形成する工程、形成された接着層を介して第3の被接着物を第2の被接着物に接着する工程、及び必要に応じて接着により得られた被接着物層を加工する工程を繰り返して、複数の被接着物及びその間に形成された接着層からなる積層体を形成することもできる。
本発明では、半導体ウェハーにスピンコートで塗布した接着剤の厚さが0.1μm以上200μm以下とすることができる。厚さが0.1μmより薄すぎると表面の凹凸を追従できず接着時にボイドが入る可能性があり、200μmより厚すぎると接着層にクラックが生じる可能性がある。より好ましくは接着層の厚さは1μm乃至50μmである。The present invention also relates to a laminate comprising at least two adherends and an adhesive layer formed from the adhesive composition of the present invention provided between the adherends.
The present invention includes a step of applying the adhesive composition of the present invention on a first adherend by spin coating and baking at 50 to 300 ° C. to form an adhesive layer, and the second adhesive layer is formed through the formed adhesive layer. By the method including the step of bonding the adherend to the first adherend, a laminate of the adherend can be obtained. Furthermore, the process of processing the to-be-adhered layer of a laminated body can be included.
Further, a step of forming an adhesive layer on the second adherend, a step of adhering the third adherend to the second adherend through the formed adhesive layer, and bonding as necessary The laminated body which consists of a several to-be-adhered thing and the contact bonding layer formed among them can also be formed by repeating the process of processing the to-be-adhered article layer obtained by this.
In the present invention, the thickness of the adhesive applied to the semiconductor wafer by spin coating can be 0.1 μm or more and 200 μm or less. If the thickness is less than 0.1 μm, the surface irregularities cannot be followed and voids may be formed during bonding, and if it is more than 200 μm, cracks may occur in the adhesive layer. More preferably, the thickness of the adhesive layer is 1 μm to 50 μm.
以下に本発明に係る接着剤組成物の特性を確認した実施例について説明する。
ただし本発明はこの実施例に限定されるものではない。
以下に記載する合成例で得られた高分子化合物のGPC分析は、下記の装置を用い、下記の測定条件に従いなされた。
装置:一体型高速GPCシステム HLC−8220GPC 東ソー株式会社製
カラム:KF−G、KF804L
カラム温度:40℃
溶媒:THF
流量:1.0mL/分
標準試料:ポリスチレン
ディテクター:R1The Example which confirmed the characteristic of the adhesive composition which concerns on this invention below is demonstrated.
However, the present invention is not limited to this embodiment.
The GPC analysis of the polymer compound obtained in the synthesis example described below was performed according to the following measurement conditions using the following apparatus.
Apparatus: Integrated high-speed GPC system HLC-8220GPC manufactured by Tosoh Corporation Column: KF-G, KF804L
Column temperature: 40 ° C
Solvent: THF
Flow rate: 1.0 mL / min Standard sample: Polystyrene Detector: R1
合成例1
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン20.10g、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン24.77g、炭酸カリウム29.02g、N−メチル−2−ピロリジノン369.50gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと1mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルエーテルスルホン(式(1−1)に相当)を得た。得られた芳香族ポリエーテルのGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量は18600であった。Synthesis example 1
In a flask equipped with a stirrer, a reflux device, a thermometer, and a dropping tank, 20.10 g of 4,4′-dichlorodiphenyl-sulfone, 24.77 g of 2,2-bis (4-hydroxyphenyl) hexafluoropropane, potassium carbonate 29.02 g and N-methyl-2-pyrrolidinone 369.50 g were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 1 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and vacuum-dried at 85 ° C. for 1 day to obtain an aromatic polyether ether sulfone (corresponding to the formula (1-1)) used in the present invention. When the GPC analysis of the obtained aromatic polyether was conducted, the weight average molecular weight was 18600 in standard polystyrene conversion.
合成例2
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン68.20g、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン84.06g、炭酸カリウム103.68g、N−メチル−2−ピロリジノン456.98gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。その後キャッピング剤として4−フルオロベンゼントリフルオリド32.83gをN−メチル−2−ピロリジノン160.48gに溶解させたサンプルを滴下し、さらに20h攪拌させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液100mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルを置換基でキャッピングしたものを得た。得られた芳香族ポリエーテルエーテルスルホン(式(1−1)に相当)のGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量は17000であった。Synthesis example 2
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 68.20 g of 4,4′-dichlorodiphenyl-sulfone, 84.06 g of 2,2-bis (4-hydroxyphenyl) hexafluoropropane, potassium carbonate 103.68 g and N-methyl-2-pyrrolidinone 456.98 g were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. Thereafter, a sample prepared by dissolving 32.83 g of 4-fluorobenzene trifluoride in 160.48 g of N-methyl-2-pyrrolidinone as a capping agent was dropped, and the mixture was further stirred for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 100 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid at a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and vacuum-dried at 85 ° C. for 1 day to obtain a product obtained by capping the aromatic polyether used in the present invention with a substituent. When the GPC analysis of the obtained aromatic polyether ether sulfone (equivalent to Formula (1-1)) was performed, the weight average molecular weight was 17000 in standard polystyrene conversion.
合成例3
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン16.37g、tert−ブチルヒドロキノン9.97g、炭酸カリウム24.90g、N−メチル−2−ピロリジノン79.04gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。その後キャッピング剤として4−フルオロベンゼントリフルオリド7.90gをN−メチル−2−ピロリジノン28.94gに溶解させたサンプルを滴下し、さらに20h攪拌させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルを置換基でキャッピングしたものを得た。得られた芳香族ポリエーテルエーテルスルホン(式(1−2)に相当)のGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量は14800であった。Synthesis example 3
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 16.37 g of 4,4′-dichlorodiphenyl-sulfone, 9.97 g of tert-butylhydroquinone, 24.90 g of potassium carbonate, N-methyl-2- 79.04 g of pyrrolidinone was added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. Thereafter, a sample prepared by dissolving 7.90 g of 4-fluorobenzene trifluoride in 28.94 g of N-methyl-2-pyrrolidinone as a capping agent was dropped, and the mixture was further stirred for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and vacuum-dried at 85 ° C. for 1 day to obtain a product obtained by capping the aromatic polyether used in the present invention with a substituent. When the GPC analysis of the obtained aromatic polyether ether sulfone (equivalent to Formula (1-2)) was performed, the weight average molecular weight was 14800 in standard polystyrene conversion.
合成例4
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン13.64g、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサン13.42g、炭酸カリウム20.78g、N−メチル−2−ピロリジノン81.23gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。その後4−フルオロベンゼントリフルオリド6.55gをN−メチル−2−ピロリジノン28.75gに溶解させたサンプルを滴下し、さらに20h攪拌させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルを(置換基でキャッピングしたものを得た。得られた芳香族ポリエーテルエーテルスルホン(式(1−3)に相当)のGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量は14600であった。Synthesis example 4
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 13.64 g of 4,4′-dichlorodiphenyl-sulfone, 13.42 g of 1,1-bis (4-hydroxyphenyl) cyclohexane, potassium carbonate 20. 78 g and 81.23 g of N-methyl-2-pyrrolidinone were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. Thereafter, a sample prepared by dissolving 6.55 g of 4-fluorobenzene trifluoride in 28.75 g of N-methyl-2-pyrrolidinone was added dropwise and further stirred for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and vacuum-dried at 85 ° C. for 1 day to obtain an aromatic polyether (capped with a substituent) used in the present invention. The obtained aromatic polyether When GPC analysis of ether sulfone (corresponding to the formula (1-3)) was performed, the weight average molecular weight was 14600 in terms of standard polystyrene.
合成例5
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン13.64g、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン8.41g、2,2−ビス(4−ヒドロキシフェニル)プロパン5.71g、炭酸カリウム34.56g、N−メチル−2−ピロリジノン83.44gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。その後4−フルオロベンゼントリフルオリド6.56gをN−メチル−2−ピロリジノン29.56gに溶解させたサンプルを滴下し、さらに20h攪拌させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルを置換基でキャッピングしたものを得た。得られた芳香族ポリエーテルエーテルスルホン(式(1−4)に相当)のGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量17700であった。Synthesis example 5
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 13.64 g of 4,4′-dichlorodiphenyl-sulfone, 8.41 g of 2,2-bis (4-hydroxyphenyl) hexafluoropropane, 2, 2-bis (4-hydroxyphenyl) propane 5.71 g, potassium carbonate 34.56 g, and N-methyl-2-pyrrolidinone 83.44 g were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. Thereafter, a sample prepared by dissolving 6.56 g of 4-fluorobenzene trifluoride in 29.56 g of N-methyl-2-pyrrolidinone was added dropwise and further stirred for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and vacuum-dried at 85 ° C. for 1 day to obtain a product obtained by capping the aromatic polyether used in the present invention with a substituent. When GPC analysis of the obtained aromatic polyether ether sulfone (corresponding to the formula (1-4)) was performed, the weight average molecular weight was 17700 in terms of standard polystyrene.
合成例6
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン13.64g、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン8.41g、tert−ブチルヒドロキノン4.16g、炭酸カリウム34.55g、N−メチル−2−ピロリジノン78.95gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。その後4−フルオロベンゼントリフルオリド6.56gをN−メチル−2−ピロリジノン28.06gに溶解させたサンプルを滴下し、さらに20h攪拌させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルを置換基でキャッピングしたものを得た。得られた芳香族ポリエーテルエーテルスルホン(式(1−5)に相当)のGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量17300であった。Synthesis Example 6
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 13.64 g of 4,4′-dichlorodiphenyl-sulfone, 8.41 g of 2,2-bis (4-hydroxyphenyl) hexafluoropropane, tert- 4.16 g of butylhydroquinone, 34.55 g of potassium carbonate, and 78.95 g of N-methyl-2-pyrrolidinone were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. Thereafter, a sample prepared by dissolving 6.56 g of 4-fluorobenzene trifluoride in 28.06 g of N-methyl-2-pyrrolidinone was added dropwise, and the mixture was further stirred for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and vacuum-dried at 85 ° C. for 1 day to obtain a product obtained by capping the aromatic polyether used in the present invention with a substituent. When GPC analysis of the obtained aromatic polyether ether sulfone (corresponding to the formula (1-5)) was performed, the weight average molecular weight was 17300 in terms of standard polystyrene.
合成例7
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジフルオロベンゾフェノン94.26g、tert−ブチルヒドロキノン44.88g、メチルヒドロキノン33.52g、炭酸カリウム82.10g、N−メチル−2−ピロリジノン764.27gを入れた。その後フラスコ内を窒素置換した後、140℃まで加熱し20h反応させた。合成された芳香族ポリエーテルエーテルケトンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルを置換基でキャッピングしたものを得た。得られた芳香族ポリエーテルエーテルケトン(式(1−6)に相当)のGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量15200であった。Synthesis example 7
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 94.26 g of 4,4′-difluorobenzophenone, 44.88 g of tert-butylhydroquinone, 33.52 g of methylhydroquinone, 82.10 g of potassium carbonate, N— 764.27 g of methyl-2-pyrrolidinone was added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 140 ° C. and reacted for 20 hours. The synthesized aromatic polyetheretherketone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water, and vacuum-dried at 85 ° C. for 1 day to obtain a product obtained by capping the aromatic polyether used in the present invention with a substituent. When the GPC analysis of the obtained aromatic polyetheretherketone (corresponding to the formula (1-6)) was performed, the weight average molecular weight was 15200 in terms of standard polystyrene.
合成例8
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニルスルホン14.07g、1,1−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン8.40g、1,1−ビス(4−ヒドロキシフェニル)シクロヘキサン6.71g、炭酸カリウム20.75g、N−メチル−2−ピロリジノン87.68gを入れた。その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルエーテルスルホン(式(1−7)に相当)を得た。得られた芳香族ポリエーテルのGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量43000であった。Synthesis Example 8
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 14.07 g of 4,4′-dichlorodiphenylsulfone, 8.40 g of 1,1-bis (4-hydroxyphenyl) hexafluoropropane, 1,1 -6.71 g of bis (4-hydroxyphenyl) cyclohexane, 20.75 g of potassium carbonate, and 87.68 g of N-methyl-2-pyrrolidinone were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, the mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and vacuum-dried at 85 ° C. for 1 day to obtain an aromatic polyether ether sulfone (corresponding to the formula (1-7)) used in the present invention. When the GPC analysis of the obtained aromatic polyether was conducted, it was the weight average molecular weight 43000 in standard polystyrene conversion.
合成例9
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジフルオロベンゾフェノン74.19g、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン94.14g、トリメチルヒドロキノン18.26g、炭酸カリウム60.81g、N−メチル−2−ピロリジノン742.22gを入れた。その後フラスコ内を窒素置換した後、140℃まで加熱し20h反応させた。合成された芳香族ポリエーテルエーテルケトンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルエーテルケトン(式(1−8)に相当)を得た。得られた芳香族ポリエーテルのGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量24700であった。Synthesis Example 9
In a flask equipped with a stirrer, a reflux condenser, a thermometer, and a dropping tank, 74.19 g of 4,4′-difluorobenzophenone, 94.14 g of 2,2-bis (4-hydroxyphenyl) hexafluoropropane, and trimethylhydroquinone 18. 26 g, potassium carbonate 60.81 g, and N-methyl-2-pyrrolidinone 742.22 g were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 140 ° C. and reacted for 20 hours. The synthesized aromatic polyetheretherketone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and vacuum-dried at 85 ° C. for 1 day to obtain an aromatic polyetheretherketone (corresponding to the formula (1-8)) used in the present invention. When the GPC analysis of the obtained aromatic polyether was conducted, it was the weight average molecular weight 24700 in standard polystyrene conversion.
合成例10
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジフルオロベンゾフェノン40.42g、2,2−ビス(4−ヒドロキシフェニル)ヘキサフルオロプロパン73.97g、2,2−ビス(4−ヒドロキシ−3,5−ジヒドロキシメチルフェニル)プロパン4.03g、炭酸カリウム32.01g、N−メチル−2−ピロリジノン752.16gを入れた。その後フラスコ内を窒素置換した後、140℃まで加熱し20h反応させた。合成された芳香族ポリエーテルエーテルケトンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ本発明で用いられる芳香族ポリエーテルエーテルケトン(式(1−9)に相当)を得た。得られた芳香族ポリエーテルのGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量19000であった。Synthesis Example 10
In a flask equipped with a stirrer, a refluxer, a thermometer, and a dropping tank, 40.42 g of 4,4′-difluorobenzophenone, 73.97 g of 2,2-bis (4-hydroxyphenyl) hexafluoropropane, 2,2- Bis (4-hydroxy-3,5-dihydroxymethylphenyl) propane (4.03 g), potassium carbonate (32.01 g), and N-methyl-2-pyrrolidinone (752.16 g) were added. Thereafter, the inside of the flask was purged with nitrogen, and then heated to 140 ° C. and reacted for 20 hours. The synthesized aromatic polyetheretherketone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and vacuum-dried at 85 ° C. for 1 day to obtain an aromatic polyether ether ketone (corresponding to the formula (1-9)) used in the present invention. When the GPC analysis of the obtained aromatic polyether was conducted, it was weight average molecular weight 19000 in standard polystyrene conversion.
比較合成例1
攪拌装置、還流器、温度計、滴下槽を備えているフラスコに4,4’−ジクロロジフェニル−スルホン15.00g、2,2−ビス(4−ヒドロキシフェニル)プロパン12.56g、炭酸カリウム8.37g、N−メチル−2−ピロリジノン82.61gを入れ、その後フラスコ内を窒素置換した後、160℃まで加熱し20h反応させた。合成された芳香族ポリエーテルエーテルスルホンを室温まで冷却させた後、ろ過してろ液を回収し、N−メチル−2−ピロリジノンと2mol/l塩酸の体積比が90:10の混合液30mlと混合させた。その後この混合溶液をメタノールに投入し再沈精製を行った。
その後得られた沈殿をメタノールと水にて洗浄し、85℃で1日真空乾燥させ比較例1で用いられる芳香族ポリエーテルエーテルスルホン(式(2−1)に相当)を得た。得られた芳香族ポリエーテルのGPC分析を行ったところ、標準ポリスチレン換算にて重量平均分子量で16700であった。
In a flask equipped with a stirrer, a refluxer, a thermometer and a dropping tank, 12.00 g of 4,4′-dichlorodiphenyl-sulfone, 12.56 g of 2,2-bis (4-hydroxyphenyl) propane, potassium carbonate; 37 g and N-methyl-2-pyrrolidinone 82.61 g were added, and then the atmosphere in the flask was replaced with nitrogen, and then heated to 160 ° C. and reacted for 20 hours. The synthesized aromatic polyether ether sulfone is cooled to room temperature and then filtered to collect the filtrate, which is mixed with 30 ml of a mixture of N-methyl-2-pyrrolidinone and 2 mol / l hydrochloric acid having a volume ratio of 90:10. I let you. Thereafter, this mixed solution was poured into methanol for reprecipitation purification.
Thereafter, the obtained precipitate was washed with methanol and water and vacuum-dried at 85 ° C. for 1 day to obtain an aromatic polyether ether sulfone (corresponding to the formula (2-1)) used in Comparative Example 1. When the GPC analysis of the obtained aromatic polyether was conducted, it was 16700 in weight average molecular weight in standard polystyrene conversion.
比較合成例2
市販品で合成されたアクリル樹脂であるポリメタクリル酸メチル(和光純薬工業株式会社製)を準備した。Comparative Synthesis Example 2
Polymethyl methacrylate (manufactured by Wako Pure Chemical Industries, Ltd.), which is an acrylic resin synthesized as a commercial product, was prepared.
(溶媒溶解性評価)
合成例1乃至10及び比較合成例1より得られた芳香族ポリエーテル及び比較合成例2のアクリル樹脂5質量部に対して、それぞれ溶剤として(1)プロピレングリコールモノメチルエーテル(PGME)、(2)プロピレングリコールモノメチルエーテルアセテート(PGMEA)、(3)乳酸エチル(EL)、(4)シクロヘキサノン(Cy)、(5)N−メチル−2−ピロリジノン(NMP)、(6)ジメチルアセトアミド(DMAC)、(7)4−メチル2−ペンタノン(MIBK)、(8)5−メチル−2−ヘキサノン(MIAK)、(9)アセト酢酸エチル(EAA)、(10)ガンマブチルラクトン(GBL)、(11)シクロペンタノン(Cp)を95質量部の割合で加えて溶解性を評価した。
結果を表1に示す。○は溶解、△は微溶、×は不溶を示す。(Solvent solubility evaluation)
(1) Propylene glycol monomethyl ether (PGME) and (2) as solvents for the aromatic polyether obtained from Synthesis Examples 1 to 10 and Comparative Synthesis Example 1 and 5 parts by mass of the acrylic resin of Comparative Synthesis Example 2, respectively. Propylene glycol monomethyl ether acetate (PGMEA), (3) ethyl lactate (EL), (4) cyclohexanone (Cy), (5) N-methyl-2-pyrrolidinone (NMP), (6) dimethylacetamide (DMAC), ( 7) 4-methyl 2-pentanone (MIBK), (8) 5-methyl-2-hexanone (MIAK), (9) ethyl acetoacetate (EAA), (10) gamma butyl lactone (GBL), (11) cyclo Pentanone (Cp) was added at a ratio of 95 parts by mass to evaluate the solubility.
The results are shown in Table 1. ○ is dissolved, Δ is slightly dissolved, and × is insoluble.
合成例1乃至10より得られた芳香族ポリエーテルは比較合成例2として使用したアクリル樹脂と同様の溶解性を示し、比較合成例1で得られたポリスルホンより高い溶解性を示した。 The aromatic polyethers obtained from Synthesis Examples 1 to 10 showed the same solubility as the acrylic resin used as Comparative Synthesis Example 2, and higher solubility than the polysulfone obtained in Comparative Synthesis Example 1.
(耐熱性評価)
合成例1乃至10及び比較合成例1より得られた芳香族ポリエーテル並びに比較合成例2として使用したポリメタクリル酸メチルの耐熱性についてTG−DTA(ブルカーエイエックスエス株式会社製、TG/DTA2010SR)にて10℃/分で昇温し5質量%の減量を生ずる温度から評価した。結果を表2に示す。(Heat resistance evaluation)
Regarding the heat resistance of the aromatic polyether obtained from Synthesis Examples 1 to 10 and Comparative Synthesis Example 1 and the polymethyl methacrylate used as Comparative Synthesis Example 2 TG-DTA (Bulker AXS, TG / DTA2010SR) The temperature was raised at 10 ° C./min and the temperature at which a weight loss of 5 mass% was produced was evaluated. The results are shown in Table 2.
本発明に用いられる合成例1乃至10の芳香族ポリエーテルは比較合成例1の芳香族ポリエーテルと同様に5質量%重量減温度がいずれも450℃以上となり、比較合成例2のアクリル樹脂と比較して高い耐熱性を示した。 As for the aromatic polyethers of Synthesis Examples 1 to 10 used in the present invention, the 5% by weight weight loss temperature is 450 ° C. or more as in the case of the aromatic polyether of Comparative Synthesis Example 1, and the acrylic resin of Comparative Synthesis Example 2 High heat resistance was shown in comparison.
(接着剤組成物の調整)
合成例1乃至10及び比較合成例1より得られた芳香族ポリエーテル並びに比較合成例2のアクリル樹脂を使用して、それぞれ下記組成にて接着剤組成物を調製した。(Adjustment of adhesive composition)
Using the aromatic polyethers obtained from Synthesis Examples 1 to 10 and Comparative Synthesis Example 1 and the acrylic resin of Comparative Synthesis Example 2, adhesive compositions were prepared with the following compositions, respectively.
実施例1
合成例1より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 1
The aromatic polyether obtained from Synthesis Example 1 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例2
合成例2より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 2
The aromatic polyether obtained from Synthesis Example 2 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例3
合成例3より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 3
The aromatic polyether obtained from Synthesis Example 3 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例4
合成例4より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 4
The aromatic polyether obtained from Synthesis Example 4 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例5
合成例5より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 5
The aromatic polyether obtained from Synthesis Example 5 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例6
合成例6より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 6
The aromatic polyether obtained from Synthesis Example 6 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例7
合成例7より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 7
The aromatic polyether obtained from Synthesis Example 7 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例8
合成例8より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 8
The aromatic polyether obtained from Synthesis Example 8 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例9
合成例9より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 9
The aromatic polyether obtained from Synthesis Example 9 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例10
合成例10より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 10
The aromatic polyether obtained from Synthesis Example 10 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
実施例11
合成例10より得られた芳香族ポリエーテルに対して5質量%のサイメル303(架橋剤)をシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 11
5 mass% of Cymel 303 (crosslinking agent) was dissolved in cyclohexanone with respect to the aromatic polyether obtained from Synthesis Example 10 to prepare an adhesive composition containing 20 mass% as a solid content.
実施例12
合成例7より得られた芳香族ポリエーテルに対して5質量%のパインクリスタルKE100(可塑剤、荒川化学工業株式会社製、商品名、成分はエステル化ロジン樹脂)をシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Example 12
5% by mass of Pine Crystal KE100 (plasticizer, manufactured by Arakawa Chemical Industry Co., Ltd., trade name, component: esterified rosin resin) with respect to the aromatic polyether obtained from Synthesis Example 7 was dissolved in cyclohexanone and solid An adhesive composition containing 20% by mass was prepared.
比較例1
比較合成例1より得られた芳香族ポリエーテルをN−メチル−2−ピロリジノン中に溶解させ、固形分として10質量%含有する接着剤組成物を調製した。Comparative Example 1
The aromatic polyether obtained from Comparative Synthesis Example 1 was dissolved in N-methyl-2-pyrrolidinone to prepare an adhesive composition containing 10% by mass as a solid content.
比較例2
比較合成例2のポリメタクリル酸メチルをシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。Comparative Example 2
The polymethylmethacrylate of Comparative Synthesis Example 2 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content.
(塗布性評価)
実施例1乃至12、比較例1及び比較例2で得られた接着剤組成物をそれぞれ塗布条件1000rpm、30秒間でシリコンウェハー上にスピン塗布し、100℃及び250℃でそれぞれ2分間ずつのベークを行って形成した膜について評価を行った。結果を表3に示す。(Applicability evaluation)
The adhesive compositions obtained in Examples 1 to 12, Comparative Example 1 and Comparative Example 2 were each spin-coated on a silicon wafer under application conditions of 1000 rpm for 30 seconds, and baked at 100 ° C. and 250 ° C. for 2 minutes each. The film formed by performing the evaluation was evaluated. The results are shown in Table 3.
比較例1で調整した接着剤組成物は、塗布不良が生じ均一な膜を形成することができなかったのに対し、本発明の実施例1乃至12で調整した芳香族ポリエーテルの接着剤組成物と比較合成例2として使用したアクリル樹脂の接着剤組成物は何れも1μm以上の均一な膜を形成することができた。 The adhesive composition prepared in Comparative Example 1 was poor in coating and could not form a uniform film, whereas the aromatic polyether adhesive composition prepared in Examples 1 to 12 of the present invention. The adhesive composition of the acrylic resin used as Comparative Example 2 and the product was able to form a uniform film of 1 μm or more.
(接着性評価)
実施例1乃至12、比較例1及び2で得られた接着剤組成物をシリコンウェハー上に1000rpm、30秒間の塗布条件で塗布した後、100℃及び250℃でそれぞれ2分間のベークを行ってシリコンウェハー上にそれぞれ塗布膜を形成した。このシリコンウェハーを2cm角に切り取り、270℃のホットプレート上にあらかじめ静置しておいたガラスウェハー上に塗布面を下向きにして置いて上から圧着し、接着性を評価した。結果を表4に示す。ガラスウェハー面から見た状態でボイド(孔)がなく接着された場合を良好とした。(Adhesion evaluation)
The adhesive compositions obtained in Examples 1 to 12 and Comparative Examples 1 and 2 were applied on a silicon wafer at 1000 rpm for 30 seconds and then baked at 100 ° C. and 250 ° C. for 2 minutes, respectively. A coating film was formed on each silicon wafer. This silicon wafer was cut into 2 cm squares, placed on a glass wafer that had been allowed to stand in advance on a 270 ° C. hot plate, the coated surface was faced down, and pressure-bonded from above to evaluate the adhesion. The results are shown in Table 4. The case where it adhered without a void (hole) in the state seen from the glass wafer surface was made favorable.
比較例1で得られた接着剤組成物は接着不良が発生し、均一に接着することができなかったのに対して、本発明の実施例1乃至12の接着剤組成物、比較例2の接着剤組成物は良好な接着性を示した。 The adhesive composition obtained in Comparative Example 1 had poor adhesion and could not be uniformly bonded, whereas the adhesive compositions of Examples 1 to 12 of the present invention and Comparative Example 2 The adhesive composition showed good adhesion.
(接着力評価サンプルの作製)
合成例7及び合成例9で調整した芳香族ポリエーテル、並びに比較合成例2のアクリル樹脂の接着力評価サンプルを下記方法で作製した。(Preparation of adhesive strength evaluation sample)
Samples for evaluating the adhesive strength of the aromatic polyether prepared in Synthesis Example 7 and Synthesis Example 9 and the acrylic resin of Comparative Synthesis Example 2 were prepared by the following method.
実施例13
合成例7より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として27質量%含有する接着剤組成物を調製した。得られた接着剤組成物を塗布条件1500rpm、60秒間で4インチのシリコンウェハー上にスピン塗布し、100℃及び230℃でそれぞれ2分間ずつのベークを行って、膜厚が5.5μmの膜を形成した。その後、貼り合せ装置(アユミ工業株式会社製、VJ−300)を使用して、真空度10Pa以下、温度250℃、貼り合せ圧力300Kgの条件下でシリコンウェハーを膜を介して4インチガラスウェハーと接着させた。そのウェハーをダイシング装置(ディスコ株式会社製、DAD321)で1cm角に切断し、サンプルを作製した。Example 13
The aromatic polyether obtained from Synthesis Example 7 was dissolved in cyclohexanone to prepare an adhesive composition containing 27% by mass as a solid content. The obtained adhesive composition was spin-coated on a 4-inch silicon wafer for 60 seconds under a coating condition of 1500 rpm, and baked at 100 ° C. and 230 ° C. for 2 minutes each to form a film having a thickness of 5.5 μm. Formed. Then, using a bonding apparatus (Ayumi Kogyo Co., Ltd., VJ-300), a silicon wafer is formed into a 4-inch glass wafer through a film under the conditions of a vacuum of 10 Pa or less, a temperature of 250 ° C., and a bonding pressure of 300 kg. Glued. The wafer was cut into 1 cm square by a dicing apparatus (DAD321, manufactured by DISCO Corporation) to prepare a sample.
実施例14
合成例9より得られた芳香族ポリエーテルをシクロヘキサノン中に溶解させ、固形分として27質量%含有する接着剤組成物を調製した。得られた接着剤組成物を塗布条件1500rpm、60秒間で4インチのシリコンウェハー上にスピン塗布し、100℃及び230℃でそれぞれ2分間ずつのベークを行って、膜厚が4.9μmの膜を形成した。その後、貼り合せ装置(アユミ工業株式会社製、VJ−300)を使用して、真空度10Pa以下、温度270℃、貼り合せ圧力300Kgの条件下でシリコンウェハーを膜を介して4インチガラスウェハーと接着させた。そのウェハーをダイシング装置(ディスコ株式会社製、DAD321)1cm角に切断し、サンプルを作製した。Example 14
The aromatic polyether obtained from Synthesis Example 9 was dissolved in cyclohexanone to prepare an adhesive composition containing 27% by mass as a solid content. The obtained adhesive composition was spin-coated on a 4-inch silicon wafer for 60 seconds under application conditions of 1500 rpm, and baked at 100 ° C. and 230 ° C. for 2 minutes each, and a film thickness of 4.9 μm. Formed. Then, using a bonding apparatus (Ayumi Kogyo Co., Ltd., VJ-300), a silicon wafer is formed into a 4-inch glass wafer through a film under the conditions of a vacuum degree of 10 Pa or less, a temperature of 270 ° C., and a bonding pressure of 300 kg. Glued. The wafer was cut into a 1 cm square dicing device (DAD321, manufactured by DISCO Corporation) to prepare a sample.
比較例3
比較合成例2のアクリル樹脂をシクロヘキサノン中に溶解させ、固形分として20質量%含有する接着剤組成物を調製した。得られた接着剤組成物を塗布条件1300rpm、60秒間で4インチのシリコンウェハー上にスピン塗布し、100℃及び200℃でそれぞれ2分間ずつのベークを行って、膜厚が5.0μmの膜を形成した。その後、貼り合せ装置(アユミ工業株式会社製、VJ−300)を使用して、真空度10Pa以下、温度270℃、貼り合せ圧力400Kgの条件下でシリコンウェハーを膜を介して4インチガラスウェハーと接着させた。そのウェハーをダイシングソー(株式会社ディスコ製、DAD321)を使用して1cm角に切断し、サンプルを作製した。Comparative Example 3
The acrylic resin of Comparative Synthesis Example 2 was dissolved in cyclohexanone to prepare an adhesive composition containing 20% by mass as a solid content. The obtained adhesive composition was spin-coated on a 4-inch silicon wafer for 60 seconds under a coating condition of 1300 rpm, and baked for 2 minutes each at 100 ° C. and 200 ° C. to form a film having a thickness of 5.0 μm. Formed. Then, using a bonding apparatus (Ayumi Kogyo Co., Ltd., VJ-300), a silicon wafer is formed into a 4-inch glass wafer through a film under conditions of a vacuum of 10 Pa or less, a temperature of 270 ° C., and a bonding pressure of 400 kg. Glued. The wafer was cut into 1 cm square using a dicing saw (manufactured by DISCO Corporation, DAD321) to prepare a sample.
(接着力評価1)
実施例13及び実施例14並びに比較例3で得られた接着力評価サンプルの両面にアラルダイト2014(ハンツマン・アドバンスト・マテリアルズ株式会社製、商品名)を塗布し、接着力(せん断)測定用専用冶具に両面を接着後、オートグラフ(株式会社島津製作所製、オートグラフAGS−100NX)で接着力(せん断)を評価した。接着力は1mm/分の引っ張り速度で測定した。結果を表5に示す。(Adhesive strength evaluation 1)
Araldite 2014 (trade name, manufactured by Huntsman Advanced Materials Co., Ltd.) was applied to both surfaces of the adhesive strength evaluation samples obtained in Example 13 and Example 14 and Comparative Example 3, and was used exclusively for adhesive strength (shear) measurement. After both surfaces were bonded to the jig, the adhesive force (shear) was evaluated with an autograph (manufactured by Shimadzu Corporation, Autograph AGS-100NX). The adhesive force was measured at a pulling speed of 1 mm / min. The results are shown in Table 5.
表5中、接着力の値が1000N以上とは、上記接着力測定機の測定限界以上であることを示す。 In Table 5, an adhesive strength value of 1000 N or more indicates that the adhesive strength measuring instrument is at least the measurement limit.
実施例13及び実施例14で得られたサンプルは、比較例3で得られたサンプルより、高い接着力を示した。 The samples obtained in Example 13 and Example 14 showed higher adhesion than the sample obtained in Comparative Example 3.
(接着力評価2)
実施例13及び実施例14並びに比較例3で得られた接着力評価サンプルを350℃に熱したホットプレート上に1時間静置し、静置後のサンプルの両面にアラルダイト2014(ハンツマン・アドバンスト・マテリアルズ株式会社製、商品名)を塗布し、接着せん断力測定用専用冶具に両面を接着後、オートグラフ(株式会社島津製作所製、オートグラフAGS−100NX)で接着力(せん断)を評価した。接着力は1mm/分の引っ張り速度で測定した。結果を表6に示す。(Adhesive strength evaluation 2)
The adhesive strength evaluation samples obtained in Examples 13 and 14 and Comparative Example 3 were allowed to stand on a hot plate heated to 350 ° C. for 1 hour, and Araldite 2014 (Huntsman Advanced Materials Co., Ltd., product name) was applied, and both sides were bonded to a dedicated jig for measuring adhesive shear force, and then the adhesive strength (shear) was evaluated by Autograph (manufactured by Shimadzu Corporation, Autograph AGS-100NX). . The adhesive force was measured at a pulling speed of 1 mm / min. The results are shown in Table 6.
表6中、接着力の値が1000N以上とは、上記接着力測定機の測定限界以上であることを示す。 In Table 6, an adhesive strength value of 1000 N or more indicates that the adhesive strength measuring instrument is at least the measurement limit.
実施例13及び実施例14で得られたサンプルは、高い接着力を維持したのに対し、比較例3で得られたサンプルは接着力が低下した。 The samples obtained in Example 13 and Example 14 maintained high adhesive strength, whereas the sample obtained in Comparative Example 3 had reduced adhesive strength.
種々の有機溶媒に容易に溶解して、塗布性良く十分な厚さの接着層を形成することが可能で、且つその接着層がメタルバンプ接合、CVD、イオン拡散工程などの高温プロセスにおいて熱重量減が極めて少なく、密着性が良好な高耐熱性接着剤組成物とすることができる。 It can be easily dissolved in various organic solvents to form a sufficiently thick adhesive layer with good coatability, and the adhesive layer can be thermally weighted in high-temperature processes such as metal bump bonding, CVD, and ion diffusion processes. It is possible to obtain a high heat-resistant adhesive composition with very little reduction and good adhesion.
Claims (16)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012528646A JP5790946B2 (en) | 2010-08-10 | 2011-08-02 | Adhesive composition containing aromatic polyether derivative |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2010179368 | 2010-08-10 | ||
JP2010179368 | 2010-08-10 | ||
PCT/JP2011/067677 WO2012020665A1 (en) | 2010-08-10 | 2011-08-02 | Adhesive composition comprising aromatic polyether derivative |
JP2012528646A JP5790946B2 (en) | 2010-08-10 | 2011-08-02 | Adhesive composition containing aromatic polyether derivative |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2012020665A1 true JPWO2012020665A1 (en) | 2013-10-28 |
JP5790946B2 JP5790946B2 (en) | 2015-10-07 |
Family
ID=45567634
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012528646A Active JP5790946B2 (en) | 2010-08-10 | 2011-08-02 | Adhesive composition containing aromatic polyether derivative |
Country Status (5)
Country | Link |
---|---|
JP (1) | JP5790946B2 (en) |
KR (1) | KR101929835B1 (en) |
SG (1) | SG187763A1 (en) |
TW (1) | TWI555809B (en) |
WO (1) | WO2012020665A1 (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111051385B (en) * | 2017-06-26 | 2022-12-27 | 巴斯夫欧洲公司 | Novel film polymers and films |
CN109679089A (en) * | 2018-12-29 | 2019-04-26 | 福州通尔达电线电缆有限公司 | A kind of polyether-ether-ketone and its synthetic method containing nitrogen, sulphur cooperative flame retardant material |
CN109679090A (en) * | 2018-12-29 | 2019-04-26 | 福州通尔达电线电缆有限公司 | A kind of poly(aryl ether ketone) and its synthetic method containing nitrogen, sulphur cooperative flame retardant material |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO1986004079A1 (en) * | 1985-01-04 | 1986-07-17 | Raychem Corporation | Compositions of poly(imides) having phenylindane diamines and/or dianhydride moieties in the poly(imide) backbone |
EP0467847A1 (en) * | 1990-07-20 | 1992-01-22 | Ciba-Geigy Ag | Polyarylene ether with tetraphenylethylene units |
DE4306708A1 (en) * | 1993-03-04 | 1994-09-08 | Basf Ag | Molding compositions based on polyarylene ethers with anhydride groups |
JP2004018739A (en) * | 2002-06-18 | 2004-01-22 | Nitto Denko Corp | Adhesive composition and flexible printed circuit board formed from the same composition |
JP2005264008A (en) * | 2004-03-19 | 2005-09-29 | Toyobo Co Ltd | Crosslinkable sulfo-containing polyarylene ether compound |
JP5532203B2 (en) * | 2009-06-03 | 2014-06-25 | 日産化学工業株式会社 | Adhesive composition |
-
2011
- 2011-08-02 SG SG2013009444A patent/SG187763A1/en unknown
- 2011-08-02 WO PCT/JP2011/067677 patent/WO2012020665A1/en active Application Filing
- 2011-08-02 KR KR1020137001553A patent/KR101929835B1/en active IP Right Grant
- 2011-08-02 JP JP2012528646A patent/JP5790946B2/en active Active
- 2011-08-09 TW TW100128348A patent/TWI555809B/en active
Also Published As
Publication number | Publication date |
---|---|
JP5790946B2 (en) | 2015-10-07 |
KR20130131282A (en) | 2013-12-03 |
TW201219527A (en) | 2012-05-16 |
KR101929835B1 (en) | 2018-12-18 |
WO2012020665A1 (en) | 2012-02-16 |
SG187763A1 (en) | 2013-03-28 |
TWI555809B (en) | 2016-11-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP6098825B2 (en) | POLYMER, COMPOSITION CONTAINING SAME, AND ADHESIVE COMPOSITION | |
US10174168B2 (en) | Composition for forming passivation film, including resin having carbon-carbon multiple bond | |
KR102426418B1 (en) | Film-forming composition including thermosetting resin | |
US20230265325A1 (en) | Laminate, release agent composition, and method for manufacturing processed semiconductor substrate | |
JP5790946B2 (en) | Adhesive composition containing aromatic polyether derivative | |
JP5790945B2 (en) | Adhesive composition containing resin having multiple bonds of carbon and carbon | |
JP6226141B2 (en) | Adhesive composition or underfill composition | |
TWI636095B (en) | Thermoset resin composition containing polymer having specific terminal structure | |
WO2022210068A1 (en) | Adhesive composition, laminate, method for manufacturing laminate, and method for manufacturing processed substrate | |
TW202140698A (en) | Composition for forming release layer for alkali glass, and release layer |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20140318 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20150114 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20150313 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20150708 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20150721 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 5790946 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
S533 | Written request for registration of change of name |
Free format text: JAPANESE INTERMEDIATE CODE: R313533 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |