SG173346A1 - Inductively coupled coil and inductively coupled apparatus using the same - Google Patents
Inductively coupled coil and inductively coupled apparatus using the same Download PDFInfo
- Publication number
- SG173346A1 SG173346A1 SG2011048964A SG2011048964A SG173346A1 SG 173346 A1 SG173346 A1 SG 173346A1 SG 2011048964 A SG2011048964 A SG 2011048964A SG 2011048964 A SG2011048964 A SG 2011048964A SG 173346 A1 SG173346 A1 SG 173346A1
- Authority
- SG
- Singapore
- Prior art keywords
- inductively coupled
- coupled coil
- segment
- respective branches
- reaction chamber
- Prior art date
Links
- 238000006243 chemical reaction Methods 0.000 claims abstract description 40
- 238000000059 patterning Methods 0.000 claims description 15
- 239000003990 capacitor Substances 0.000 claims description 14
- 230000000630 rising effect Effects 0.000 claims description 4
- 238000005530 etching Methods 0.000 description 22
- 239000007789 gas Substances 0.000 description 13
- 238000009826 distribution Methods 0.000 description 10
- 238000000034 method Methods 0.000 description 10
- 230000008569 process Effects 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 230000005684 electric field Effects 0.000 description 6
- 238000009616 inductively coupled plasma Methods 0.000 description 5
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 230000001965 increasing effect Effects 0.000 description 4
- 230000005672 electromagnetic field Effects 0.000 description 3
- 230000004907 flux Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000011295 pitch Substances 0.000 description 2
- 239000012495 reaction gas Substances 0.000 description 2
- 238000009827 uniform distribution Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 230000005674 electromagnetic induction Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000005281 excited state Effects 0.000 description 1
- 230000001939 inductive effect Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 230000005596 ionic collisions Effects 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 150000003254 radicals Chemical class 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F17/00—Fixed inductances of the signal type
- H01F17/02—Fixed inductances of the signal type without magnetic core
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F21/00—Variable inductances or transformers of the signal type
- H01F21/02—Variable inductances or transformers of the signal type continuously variable, e.g. variometers
- H01F21/04—Variable inductances or transformers of the signal type continuously variable, e.g. variometers by relative movement of turns or parts of windings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F38/00—Adaptations of transformers or inductances for specific applications or functions
- H01F38/14—Inductive couplings
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Power Engineering (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Plasma Technology (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN2006101125705A CN101131893B (zh) | 2006-08-23 | 2006-08-23 | 电感耦合线圈及电感耦合等离子体装置 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG173346A1 true SG173346A1 (en) | 2011-08-29 |
Family
ID=39129107
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2011048964A SG173346A1 (en) | 2006-08-23 | 2007-08-14 | Inductively coupled coil and inductively coupled apparatus using the same |
Country Status (4)
| Country | Link |
|---|---|
| KR (1) | KR101068746B1 (zh) |
| CN (1) | CN101131893B (zh) |
| SG (1) | SG173346A1 (zh) |
| WO (2) | WO2008031321A1 (zh) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR101308687B1 (ko) * | 2011-06-20 | 2013-09-13 | 에이피티씨 주식회사 | 균일한 플라즈마 밀도를 위한 플라즈마 소스 및 이를 이용한 플라즈마 챔버 |
| CN103906338B (zh) * | 2012-12-31 | 2016-06-08 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 一种等离子体装置 |
| US10211030B2 (en) * | 2015-06-15 | 2019-02-19 | Applied Materials, Inc. | Source RF power split inner coil to improve BCD and etch depth performance |
| CN106783539A (zh) * | 2016-12-07 | 2017-05-31 | 武汉新芯集成电路制造有限公司 | 一种减少晶圆离子损伤方法及离子发生器 |
| CA3019433A1 (en) | 2017-10-02 | 2019-04-02 | Flexopack S.A. | Multilayer cling film |
| CN116590681B (zh) * | 2023-06-16 | 2023-10-31 | 中科纳微真空科技(合肥)有限公司 | 一种射频平面阴极 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5309063A (en) * | 1993-03-04 | 1994-05-03 | David Sarnoff Research Center, Inc. | Inductive coil for inductively coupled plasma production apparatus |
| FR2790328B1 (fr) * | 1999-02-26 | 2001-04-20 | Memscap | Composant inductif, transformateur integre, notamment destines a etre incorpores dans un circuit radiofrequence,et circuit integre associe avec un tel composant inductif ou transformateur integre |
| US6685798B1 (en) * | 2000-07-06 | 2004-02-03 | Applied Materials, Inc | Plasma reactor having a symmetrical parallel conductor coil antenna |
| CN2726076Y (zh) * | 2004-06-29 | 2005-09-14 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 电感耦合线圈及其电感耦合等离子体装置 |
| CN2785105Y (zh) * | 2005-01-27 | 2006-05-31 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 电感耦合线圈及其电感耦合等离子体装置 |
-
2006
- 2006-08-23 CN CN2006101125705A patent/CN101131893B/zh active Active
-
2007
- 2007-08-14 KR KR1020097001534A patent/KR101068746B1/ko active IP Right Grant
- 2007-08-14 WO PCT/CN2007/002451 patent/WO2008031321A1/zh active Application Filing
- 2007-08-14 WO PCT/CN2007/002450 patent/WO2008031320A1/zh active Application Filing
- 2007-08-14 SG SG2011048964A patent/SG173346A1/en unknown
Also Published As
| Publication number | Publication date |
|---|---|
| WO2008031320A1 (fr) | 2008-03-20 |
| CN101131893B (zh) | 2011-12-07 |
| CN101131893A (zh) | 2008-02-27 |
| KR20090033877A (ko) | 2009-04-06 |
| WO2008031321A1 (fr) | 2008-03-20 |
| KR101068746B1 (ko) | 2011-09-28 |
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