SG172854A1 - Large area, homogeneous array fabrication including controlled tip loading vapor deposition - Google Patents
Large area, homogeneous array fabrication including controlled tip loading vapor deposition Download PDFInfo
- Publication number
- SG172854A1 SG172854A1 SG2011049004A SG2011049004A SG172854A1 SG 172854 A1 SG172854 A1 SG 172854A1 SG 2011049004 A SG2011049004 A SG 2011049004A SG 2011049004 A SG2011049004 A SG 2011049004A SG 172854 A1 SG172854 A1 SG 172854A1
- Authority
- SG
- Singapore
- Prior art keywords
- tips
- array
- cantilevers
- article
- substrate
- Prior art date
Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q60/00—Particular types of SPM [Scanning Probe Microscopy] or microscopes; Essential components thereof
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q80/00—Applications, other than SPM, of scanning-probe techniques
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Crystallography & Structural Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Radiology & Medical Imaging (AREA)
- Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
- General Health & Medical Sciences (AREA)
- Health & Medical Sciences (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Micromachines (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Micro-Organisms Or Cultivation Processes Thereof (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14744809P | 2009-01-26 | 2009-01-26 | |
| PCT/US2010/022013 WO2010085767A1 (en) | 2009-01-26 | 2010-01-25 | Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG172854A1 true SG172854A1 (en) | 2011-08-29 |
Family
ID=41786393
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2011049004A SG172854A1 (en) | 2009-01-26 | 2010-01-25 | Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US20100229264A1 (enExample) |
| EP (1) | EP2389613A1 (enExample) |
| JP (1) | JP2012515559A (enExample) |
| KR (1) | KR20110119665A (enExample) |
| AU (1) | AU2010206592A1 (enExample) |
| CA (1) | CA2750425A1 (enExample) |
| SG (1) | SG172854A1 (enExample) |
| WO (1) | WO2010085767A1 (enExample) |
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8214916B2 (en) * | 2009-01-26 | 2012-07-03 | Nanoink, Inc. | Large area, homogeneous array fabrication including leveling with use of bright spots |
| AU2010206594A1 (en) * | 2009-01-26 | 2011-07-28 | Nanoink, Inc. | Large area, homogeneous array fabrication including homogeneous substrates |
| US9267963B2 (en) * | 2012-11-08 | 2016-02-23 | The Board Of Trustees Of The Leland Stanford Junior University | Interferometric atomic-force microscopy device and method |
| US9276190B2 (en) | 2013-10-01 | 2016-03-01 | The Pen | Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD |
| US9040339B2 (en) | 2013-10-01 | 2015-05-26 | The Pen | Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material |
| CN107210353A (zh) * | 2015-02-13 | 2017-09-26 | 泽·佩恩 | 产生气凝胶复合的连续薄膜热电半导体材料的实用方法 |
| CN116124838B (zh) * | 2023-03-27 | 2025-08-22 | 厦门大学 | 一种WTe2电极单分子测试芯片及其制备方法 |
| WO2025085812A1 (en) * | 2023-10-20 | 2025-04-24 | The Regents Of The University Of California | Devices for droplet deposition and methods of making thereof |
Family Cites Families (37)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB8910566D0 (en) * | 1989-05-08 | 1989-06-21 | Amersham Int Plc | Imaging apparatus and method |
| US5171992A (en) | 1990-10-31 | 1992-12-15 | International Business Machines Corporation | Nanometer scale probe for an atomic force microscope, and method for making same |
| US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| US6635311B1 (en) * | 1999-01-07 | 2003-10-21 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or products thereby |
| IL134631A0 (en) * | 2000-02-20 | 2001-04-30 | Yeda Res & Dev | Constructive nanolithography |
| EP1146376A1 (en) * | 2000-04-12 | 2001-10-17 | Triple-O Microscopy GmbH | Method and apparatus for the controlled conditioning of scanning probes |
| US7291284B2 (en) | 2000-05-26 | 2007-11-06 | Northwestern University | Fabrication of sub-50 nm solid-state nanostructures based on nanolithography |
| US6642129B2 (en) * | 2001-07-26 | 2003-11-04 | The Board Of Trustees Of The University Of Illinois | Parallel, individually addressable probes for nanolithography |
| KR20040086322A (ko) | 2002-01-31 | 2004-10-08 | 아토피나 | 정전기 방지 스티렌계 중합체 조성물 |
| US7279046B2 (en) * | 2002-03-27 | 2007-10-09 | Nanoink, Inc. | Method and apparatus for aligning patterns on a substrate |
| US7060977B1 (en) * | 2002-05-14 | 2006-06-13 | Nanoink, Inc. | Nanolithographic calibration methods |
| EP1363164B1 (en) * | 2002-05-16 | 2015-04-29 | NaWoTec GmbH | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| WO2004007207A1 (en) * | 2002-07-11 | 2004-01-22 | Willett International Limited | Method for coating printed images |
| AU2003287618A1 (en) * | 2002-11-12 | 2004-06-03 | Nanoink, Inc. | Methods and apparatus for ink delivery to nanolithographic probe systems |
| US20050003172A1 (en) * | 2002-12-17 | 2005-01-06 | General Electric Company | 7FAstage 1 abradable coatings and method for making same |
| US20040228962A1 (en) * | 2003-05-16 | 2004-11-18 | Chang Liu | Scanning probe microscopy probe and method for scanning probe contact printing |
| WO2005048283A2 (en) * | 2003-07-18 | 2005-05-26 | Northwestern University | Surface and site-specific polymerization by direct-write lithography |
| US20050088173A1 (en) * | 2003-10-24 | 2005-04-28 | Abraham David W. | Method and apparatus for tunable magnetic force interaction in a magnetic force microscope |
| US20050196535A1 (en) * | 2004-03-02 | 2005-09-08 | Weigel Scott J. | Solvents and methods using same for removing silicon-containing residues from a substrate |
| US7690325B2 (en) | 2004-04-30 | 2010-04-06 | Bioforce Nanosciences, Inc. | Method and apparatus for depositing material onto a surface |
| US20060242740A1 (en) * | 2004-08-11 | 2006-10-26 | California Institute Of Technology | Method and device for surfactant activated Dip-Pen Nanolithography |
| WO2006106818A1 (ja) * | 2005-03-31 | 2006-10-12 | Japan Science And Technology Agency | 走査型プローブ顕微鏡用カンチレバー及びそれを具備する走査型プローブ顕微鏡 |
| GB0509213D0 (en) * | 2005-05-04 | 2005-06-15 | Univ Durham | A method for creating a chemically patterned surface |
| WO2007126689A1 (en) * | 2006-04-19 | 2007-11-08 | Northwestern University | Article for parallel lithography with two-dimensional pen arrays |
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| US8256017B2 (en) * | 2006-08-31 | 2012-08-28 | Nanoink, Inc. | Using optical deflection of cantilevers for alignment |
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| WO2009070796A1 (en) * | 2007-11-29 | 2009-06-04 | President And Fellows Of Harvard College | Assembly and deposition of materials using a superhydrophobic surface structure |
| AU2009210719A1 (en) | 2008-02-05 | 2009-08-13 | Nanoink, Inc. | Array and cantilever array leveling |
| WO2009132321A1 (en) | 2008-04-25 | 2009-10-29 | Northwestern University | Polymer pen lithography |
| US8214916B2 (en) * | 2009-01-26 | 2012-07-03 | Nanoink, Inc. | Large area, homogeneous array fabrication including leveling with use of bright spots |
| KR20110119666A (ko) * | 2009-01-26 | 2011-11-02 | 나노잉크, 인크. | 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작 |
| AU2010206594A1 (en) * | 2009-01-26 | 2011-07-28 | Nanoink, Inc. | Large area, homogeneous array fabrication including homogeneous substrates |
-
2010
- 2010-01-25 CA CA2750425A patent/CA2750425A1/en not_active Abandoned
- 2010-01-25 WO PCT/US2010/022013 patent/WO2010085767A1/en not_active Ceased
- 2010-01-25 JP JP2011548193A patent/JP2012515559A/ja active Pending
- 2010-01-25 US US12/656,311 patent/US20100229264A1/en not_active Abandoned
- 2010-01-25 EP EP10702947A patent/EP2389613A1/en not_active Withdrawn
- 2010-01-25 SG SG2011049004A patent/SG172854A1/en unknown
- 2010-01-25 KR KR1020117017430A patent/KR20110119665A/ko not_active Withdrawn
- 2010-01-25 AU AU2010206592A patent/AU2010206592A1/en not_active Abandoned
Also Published As
| Publication number | Publication date |
|---|---|
| EP2389613A1 (en) | 2011-11-30 |
| KR20110119665A (ko) | 2011-11-02 |
| AU2010206592A1 (en) | 2011-07-28 |
| CA2750425A1 (en) | 2010-07-29 |
| WO2010085767A1 (en) | 2010-07-29 |
| US20100229264A1 (en) | 2010-09-09 |
| JP2012515559A (ja) | 2012-07-12 |
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