JP2012515559A - 制御された先端部材負荷用蒸着を含む大面積均質アレイの製作方法 - Google Patents
制御された先端部材負荷用蒸着を含む大面積均質アレイの製作方法 Download PDFInfo
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- JP2012515559A JP2012515559A JP2011548193A JP2011548193A JP2012515559A JP 2012515559 A JP2012515559 A JP 2012515559A JP 2011548193 A JP2011548193 A JP 2011548193A JP 2011548193 A JP2011548193 A JP 2011548193A JP 2012515559 A JP2012515559 A JP 2012515559A
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- G—PHYSICS
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- G—PHYSICS
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
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- B—PERFORMING OPERATIONS; TRANSPORTING
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- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- G—PHYSICS
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01Q—SCANNING-PROBE TECHNIQUES OR APPARATUS; APPLICATIONS OF SCANNING-PROBE TECHNIQUES, e.g. SCANNING PROBE MICROSCOPY [SPM]
- G01Q80/00—Applications, other than SPM, of scanning-probe techniques
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
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Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14744809P | 2009-01-26 | 2009-01-26 | |
| US61/147,448 | 2009-01-26 | ||
| PCT/US2010/022013 WO2010085767A1 (en) | 2009-01-26 | 2010-01-25 | Large area, homogeneous array fabrication including controlled tip loading vapor deposition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2012515559A true JP2012515559A (ja) | 2012-07-12 |
| JP2012515559A5 JP2012515559A5 (enExample) | 2013-03-14 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
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| JP2011548193A Pending JP2012515559A (ja) | 2009-01-26 | 2010-01-25 | 制御された先端部材負荷用蒸着を含む大面積均質アレイの製作方法 |
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| Country | Link |
|---|---|
| US (1) | US20100229264A1 (enExample) |
| EP (1) | EP2389613A1 (enExample) |
| JP (1) | JP2012515559A (enExample) |
| KR (1) | KR20110119665A (enExample) |
| AU (1) | AU2010206592A1 (enExample) |
| CA (1) | CA2750425A1 (enExample) |
| SG (1) | SG172854A1 (enExample) |
| WO (1) | WO2010085767A1 (enExample) |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| US8214916B2 (en) * | 2009-01-26 | 2012-07-03 | Nanoink, Inc. | Large area, homogeneous array fabrication including leveling with use of bright spots |
| AU2010206594A1 (en) * | 2009-01-26 | 2011-07-28 | Nanoink, Inc. | Large area, homogeneous array fabrication including homogeneous substrates |
| US9267963B2 (en) * | 2012-11-08 | 2016-02-23 | The Board Of Trustees Of The Leland Stanford Junior University | Interferometric atomic-force microscopy device and method |
| US9276190B2 (en) | 2013-10-01 | 2016-03-01 | The Pen | Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material by modified MOCVD |
| US9040339B2 (en) | 2013-10-01 | 2015-05-26 | The Pen | Practical method of producing an aerogel composite continuous thin film thermoelectric semiconductor material |
| CN107210353A (zh) * | 2015-02-13 | 2017-09-26 | 泽·佩恩 | 产生气凝胶复合的连续薄膜热电半导体材料的实用方法 |
| CN116124838B (zh) * | 2023-03-27 | 2025-08-22 | 厦门大学 | 一种WTe2电极单分子测试芯片及其制备方法 |
| WO2025085812A1 (en) * | 2023-10-20 | 2025-04-24 | The Regents Of The University Of California | Devices for droplet deposition and methods of making thereof |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007126689A1 (en) * | 2006-04-19 | 2007-11-08 | Northwestern University | Article for parallel lithography with two-dimensional pen arrays |
| WO2008091279A2 (en) * | 2006-06-28 | 2008-07-31 | Northwestern University | Etching and hole arrays |
| WO2008112713A1 (en) * | 2007-03-13 | 2008-09-18 | Nanoink, Inc. | Nanolithography with use of viewports |
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| GB8910566D0 (en) * | 1989-05-08 | 1989-06-21 | Amersham Int Plc | Imaging apparatus and method |
| US5171992A (en) | 1990-10-31 | 1992-12-15 | International Business Machines Corporation | Nanometer scale probe for an atomic force microscope, and method for making same |
| US6827979B2 (en) * | 1999-01-07 | 2004-12-07 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or produced thereby |
| US6635311B1 (en) * | 1999-01-07 | 2003-10-21 | Northwestern University | Methods utilizing scanning probe microscope tips and products therefor or products thereby |
| IL134631A0 (en) * | 2000-02-20 | 2001-04-30 | Yeda Res & Dev | Constructive nanolithography |
| EP1146376A1 (en) * | 2000-04-12 | 2001-10-17 | Triple-O Microscopy GmbH | Method and apparatus for the controlled conditioning of scanning probes |
| US7291284B2 (en) | 2000-05-26 | 2007-11-06 | Northwestern University | Fabrication of sub-50 nm solid-state nanostructures based on nanolithography |
| US6642129B2 (en) * | 2001-07-26 | 2003-11-04 | The Board Of Trustees Of The University Of Illinois | Parallel, individually addressable probes for nanolithography |
| KR20040086322A (ko) | 2002-01-31 | 2004-10-08 | 아토피나 | 정전기 방지 스티렌계 중합체 조성물 |
| US7279046B2 (en) * | 2002-03-27 | 2007-10-09 | Nanoink, Inc. | Method and apparatus for aligning patterns on a substrate |
| US7060977B1 (en) * | 2002-05-14 | 2006-06-13 | Nanoink, Inc. | Nanolithographic calibration methods |
| EP1363164B1 (en) * | 2002-05-16 | 2015-04-29 | NaWoTec GmbH | Procedure for etching of materials at the surface with focussed electron beam induced chemical reactions at said surface |
| WO2004007207A1 (en) * | 2002-07-11 | 2004-01-22 | Willett International Limited | Method for coating printed images |
| AU2003287618A1 (en) * | 2002-11-12 | 2004-06-03 | Nanoink, Inc. | Methods and apparatus for ink delivery to nanolithographic probe systems |
| US20050003172A1 (en) * | 2002-12-17 | 2005-01-06 | General Electric Company | 7FAstage 1 abradable coatings and method for making same |
| US20040228962A1 (en) * | 2003-05-16 | 2004-11-18 | Chang Liu | Scanning probe microscopy probe and method for scanning probe contact printing |
| WO2005048283A2 (en) * | 2003-07-18 | 2005-05-26 | Northwestern University | Surface and site-specific polymerization by direct-write lithography |
| US20050088173A1 (en) * | 2003-10-24 | 2005-04-28 | Abraham David W. | Method and apparatus for tunable magnetic force interaction in a magnetic force microscope |
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| KR20100056453A (ko) | 2007-08-08 | 2010-05-27 | 노쓰웨스턴유니버시티 | 캔틸레버 어레이에 대해 독립적으로 어드레스 가능한 자가 보정 잉킹 방법 |
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| WO2009132321A1 (en) | 2008-04-25 | 2009-10-29 | Northwestern University | Polymer pen lithography |
| US8214916B2 (en) * | 2009-01-26 | 2012-07-03 | Nanoink, Inc. | Large area, homogeneous array fabrication including leveling with use of bright spots |
| KR20110119666A (ko) * | 2009-01-26 | 2011-11-02 | 나노잉크, 인크. | 기판 온도 조절을 포함하는 넓은 면적의 균일한 어레이 제작 |
| AU2010206594A1 (en) * | 2009-01-26 | 2011-07-28 | Nanoink, Inc. | Large area, homogeneous array fabrication including homogeneous substrates |
-
2010
- 2010-01-25 CA CA2750425A patent/CA2750425A1/en not_active Abandoned
- 2010-01-25 WO PCT/US2010/022013 patent/WO2010085767A1/en not_active Ceased
- 2010-01-25 JP JP2011548193A patent/JP2012515559A/ja active Pending
- 2010-01-25 US US12/656,311 patent/US20100229264A1/en not_active Abandoned
- 2010-01-25 EP EP10702947A patent/EP2389613A1/en not_active Withdrawn
- 2010-01-25 SG SG2011049004A patent/SG172854A1/en unknown
- 2010-01-25 KR KR1020117017430A patent/KR20110119665A/ko not_active Withdrawn
- 2010-01-25 AU AU2010206592A patent/AU2010206592A1/en not_active Abandoned
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007126689A1 (en) * | 2006-04-19 | 2007-11-08 | Northwestern University | Article for parallel lithography with two-dimensional pen arrays |
| WO2008091279A2 (en) * | 2006-06-28 | 2008-07-31 | Northwestern University | Etching and hole arrays |
| WO2008112713A1 (en) * | 2007-03-13 | 2008-09-18 | Nanoink, Inc. | Nanolithography with use of viewports |
Also Published As
| Publication number | Publication date |
|---|---|
| EP2389613A1 (en) | 2011-11-30 |
| KR20110119665A (ko) | 2011-11-02 |
| AU2010206592A1 (en) | 2011-07-28 |
| SG172854A1 (en) | 2011-08-29 |
| CA2750425A1 (en) | 2010-07-29 |
| WO2010085767A1 (en) | 2010-07-29 |
| US20100229264A1 (en) | 2010-09-09 |
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