SG166695A1 - A coating apparatus - Google Patents

A coating apparatus

Info

Publication number
SG166695A1
SG166695A1 SG200903386-1A SG2009033861A SG166695A1 SG 166695 A1 SG166695 A1 SG 166695A1 SG 2009033861 A SG2009033861 A SG 2009033861A SG 166695 A1 SG166695 A1 SG 166695A1
Authority
SG
Singapore
Prior art keywords
chamber
plasma
horizontal plane
plasma beam
coating
Prior art date
Application number
SG200903386-1A
Inventor
Cheah Li Kang
Original Assignee
Cotec Pte Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Cotec Pte Ltd filed Critical Cotec Pte Ltd
Priority to SG200903386-1A priority Critical patent/SG166695A1/en
Priority to PCT/SG2010/000186 priority patent/WO2010134892A1/en
Publication of SG166695A1 publication Critical patent/SG166695A1/en

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

This invention relates to for coating a substrate comprising: a chamber; a cathodic arc source for generating and projecting a plasma beam along a plasma beam path within the chamber, the projected plasma crossing a horizontal plane within the chamber; a moveable holder having a planar mounting surface that is generally parallel to said horizontal plane, the moveable holder being configured to move the planar mounting surface relative to the horizontal plane within the chamber and into the path of the plasma beam to form a plasma coating on the substrate. (Fig. 1)
SG200903386-1A 2009-05-18 2009-05-18 A coating apparatus SG166695A1 (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
SG200903386-1A SG166695A1 (en) 2009-05-18 2009-05-18 A coating apparatus
PCT/SG2010/000186 WO2010134892A1 (en) 2009-05-18 2010-05-17 A coating apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
SG200903386-1A SG166695A1 (en) 2009-05-18 2009-05-18 A coating apparatus

Publications (1)

Publication Number Publication Date
SG166695A1 true SG166695A1 (en) 2010-12-29

Family

ID=43126395

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200903386-1A SG166695A1 (en) 2009-05-18 2009-05-18 A coating apparatus

Country Status (2)

Country Link
SG (1) SG166695A1 (en)
WO (1) WO2010134892A1 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP2602354A1 (en) 2011-12-05 2013-06-12 Pivot a.s. Filtered cathodic vacuum arc deposition apparatus and method

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB9722648D0 (en) * 1997-10-24 1997-12-24 Univ Nanyang ARC monitoring
US6103074A (en) * 1998-02-14 2000-08-15 Phygen, Inc. Cathode arc vapor deposition method and apparatus
CA2305938C (en) * 2000-04-10 2007-07-03 Vladimir I. Gorokhovsky Filtered cathodic arc deposition method and apparatus

Also Published As

Publication number Publication date
WO2010134892A1 (en) 2010-11-25

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