GB2601106B - High density plasma source - Google Patents

High density plasma source Download PDF

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Publication number
GB2601106B
GB2601106B GB2015096.7A GB202015096A GB2601106B GB 2601106 B GB2601106 B GB 2601106B GB 202015096 A GB202015096 A GB 202015096A GB 2601106 B GB2601106 B GB 2601106B
Authority
GB
United Kingdom
Prior art keywords
high density
plasma source
density plasma
source
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
GB2015096.7A
Other versions
GB2601106A (en
GB202015096D0 (en
Inventor
Michael Thwaites David
John Thwaites Michael
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Plasma Quest Ltd
Original Assignee
Plasma Quest Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Plasma Quest Ltd filed Critical Plasma Quest Ltd
Priority to GB2015096.7A priority Critical patent/GB2601106B/en
Publication of GB202015096D0 publication Critical patent/GB202015096D0/en
Publication of GB2601106A publication Critical patent/GB2601106A/en
Application granted granted Critical
Publication of GB2601106B publication Critical patent/GB2601106B/en
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/32119—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H01J37/3211—Antennas, e.g. particular shapes of coils
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32669—Particular magnets or magnet arrangements for controlling the discharge
GB2015096.7A 2020-09-24 2020-09-24 High density plasma source Active GB2601106B (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
GB2015096.7A GB2601106B (en) 2020-09-24 2020-09-24 High density plasma source

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB2015096.7A GB2601106B (en) 2020-09-24 2020-09-24 High density plasma source

Publications (3)

Publication Number Publication Date
GB202015096D0 GB202015096D0 (en) 2020-11-11
GB2601106A GB2601106A (en) 2022-05-25
GB2601106B true GB2601106B (en) 2024-02-07

Family

ID=73197228

Family Applications (1)

Application Number Title Priority Date Filing Date
GB2015096.7A Active GB2601106B (en) 2020-09-24 2020-09-24 High density plasma source

Country Status (1)

Country Link
GB (1) GB2601106B (en)

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20030079838A1 (en) * 2001-10-22 2003-05-01 Tokyo Electron Limited Of Tbs Broadcast Center Protection of dielectric window in inductively coupled plasma generation
US6565717B1 (en) * 1997-09-15 2003-05-20 Applied Materials, Inc. Apparatus for sputtering ionized material in a medium to high density plasma
US20080083615A1 (en) * 2006-09-29 2008-04-10 Tokyo Electron Limited Thermal-Stress-Failure-Resistant Dielectric Windows in Vacuum Processing Systems
TW201230889A (en) * 2011-01-10 2012-07-16 Lig Adp Co Ltd Plasma processing apparatus (2)

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6565717B1 (en) * 1997-09-15 2003-05-20 Applied Materials, Inc. Apparatus for sputtering ionized material in a medium to high density plasma
US20030079838A1 (en) * 2001-10-22 2003-05-01 Tokyo Electron Limited Of Tbs Broadcast Center Protection of dielectric window in inductively coupled plasma generation
US20080083615A1 (en) * 2006-09-29 2008-04-10 Tokyo Electron Limited Thermal-Stress-Failure-Resistant Dielectric Windows in Vacuum Processing Systems
TW201230889A (en) * 2011-01-10 2012-07-16 Lig Adp Co Ltd Plasma processing apparatus (2)

Also Published As

Publication number Publication date
GB2601106A (en) 2022-05-25
GB202015096D0 (en) 2020-11-11

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