SG160341A1 - Method of treating waste developing solution - Google Patents

Method of treating waste developing solution

Info

Publication number
SG160341A1
SG160341A1 SG201001308-4A SG2010013084A SG160341A1 SG 160341 A1 SG160341 A1 SG 160341A1 SG 2010013084 A SG2010013084 A SG 2010013084A SG 160341 A1 SG160341 A1 SG 160341A1
Authority
SG
Singapore
Prior art keywords
developing solution
taa
solution
waste
hydroxide aqueous
Prior art date
Application number
SG201001308-4A
Inventor
Yoshifumi Yamashita
Hajime Okido
Toru Nonaka
Original Assignee
Tokuyama Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokuyama Corp filed Critical Tokuyama Corp
Publication of SG160341A1 publication Critical patent/SG160341A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Water Treatment By Electricity Or Magnetism (AREA)
  • Automation & Control Theory (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Hydrology & Water Resources (AREA)
  • Water Supply & Treatment (AREA)
  • Heat Treatment Of Water, Waste Water Or Sewage (AREA)
  • Removal Of Specific Substances (AREA)

Abstract

METHOD OF TREATING WASTE DEVELOPMENT SOLUTION A by selecting a step of measuring the concentration of tetraalkylammonium (TAA) and the contents of metal impurities in the waste developing solution that contains a tetraalkylammonium hydroxide aqueous solution, and refining the waste developing solution depending upon the measured contents of metal impurities per the TAA to regenerate the TAA hydroxide aqueous solution that can be used as the developing solution, a step of disposing the waste developing solution, or a step of diluting the waste developing solution with the unused TAA hydroxide aqueous solution and refining the diluted waste developing solution to regenerate the TAA hydroxide aqueous solution that can be used as the developing solution, wherein the content of metal impurities of 50 ppm per the TAA is regarded to be a reference for selecting the step. This method makes it possible to refine the waste developing solution containing the TAA hydroxide discharged from the step of developing a photoresist maintaining stability for extended periods of time and, hence, to regenerate a highly pure TAA hydroxide aqueous solution that can be reused as the developing solution even for a step of developing a photoresist that requires a high degree of precision.
SG201001308-4A 2004-11-30 2005-11-29 Method of treating waste developing solution SG160341A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004346917 2004-11-30

Publications (1)

Publication Number Publication Date
SG160341A1 true SG160341A1 (en) 2010-04-29

Family

ID=36565186

Family Applications (1)

Application Number Title Priority Date Filing Date
SG201001308-4A SG160341A1 (en) 2004-11-30 2005-11-29 Method of treating waste developing solution

Country Status (6)

Country Link
JP (1) JP4810436B2 (en)
KR (1) KR100954250B1 (en)
CN (1) CN101111804A (en)
SG (1) SG160341A1 (en)
TW (1) TWI375134B (en)
WO (1) WO2006059760A1 (en)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2008056671A1 (en) * 2006-11-09 2008-05-15 Tokuyama Corporation Method of neutralizing developer waste liquid containing tetraalkylammonium hydroxide
CN101794086B (en) * 2009-02-02 2012-07-25 和舰科技(苏州)有限公司 Device and method for separating waste developer from DI water
EP2423751B1 (en) * 2009-04-24 2013-12-11 Asahi Kasei E-materials Corporation Developing apparatus, process for treating developing solution, process for producing printing plate, and filter apparatus
CN102127766A (en) * 2009-07-15 2011-07-20 深圳市惠尔能科技有限公司 Process for recycling circuit board micro-etching waste liquid
US20110159447A1 (en) 2009-12-25 2011-06-30 Tokyo Ohka Kogyo Co., Ltd. Developing solution for photolithography, method for forming resist pattern, and method and apparatus for producing developing solution for photolithography
WO2012128119A1 (en) * 2011-03-23 2012-09-27 栗田工業株式会社 Treatment method for photoresist development wastewater
BR112014010571A2 (en) * 2011-11-04 2017-06-13 Fujifilm Corporation METHOD FOR RECYCLING RESIDUAL LIQUID FROM A PLATE MANUFACTURING PROCESS FOR A PLANOGRAPHIC PRINTING PLATE PRECURSOR
JP5862211B2 (en) * 2011-11-08 2016-02-16 大日本印刷株式会社 Method for determining washing conditions for cell culture supports
JPWO2018043697A1 (en) * 2016-09-02 2019-06-24 富士フイルム株式会社 Method of purifying organic solvent and apparatus for purifying organic solvent
CN108623052A (en) * 2017-03-22 2018-10-09 三福化工股份有限公司 The recovery method of tetramethylammonium hydroxide in the secondary liquid waste of development waste liquid
JP7055326B2 (en) * 2017-09-15 2022-04-18 株式会社ササクラ Development waste liquid treatment equipment and treatment method

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3110513B2 (en) * 1991-10-16 2000-11-20 クロリンエンジニアズ株式会社 Method for regenerating tetraalkylammonium hydroxide
DE69703428T2 (en) * 1996-07-23 2001-04-19 Tokuyama Corp., Tokuya METHOD FOR PRODUCING AQUEOUS SOLUTIONS OF TETRAALKYLAMMONIUM HYDROXIDES
JPH11142380A (en) * 1997-11-12 1999-05-28 Japan Organo Co Ltd Method for recycling photoresist developer waste solution
JP3671644B2 (en) * 1998-01-05 2005-07-13 オルガノ株式会社 Photoresist developing waste liquid recycling method and apparatus
JP3728945B2 (en) 1998-10-30 2005-12-21 オルガノ株式会社 Method and apparatus for recovering and reusing developer from photoresist developer waste
JP2001141721A (en) * 1999-11-12 2001-05-25 Tokuyama Corp Analytical method of trace metallic impurity
JP2002253931A (en) * 2001-02-28 2002-09-10 Toray Ind Inc Method and apparatus for manufacturing regenerated tetraalkylammonium hydroxide
JP2003071455A (en) * 2001-08-30 2003-03-11 Hitachi Ltd Method and apparatus for treating waste liquid containing tetraalkylammonium
JP3741642B2 (en) * 2001-11-30 2006-02-01 株式会社トクヤマ Method for treating waste liquid containing tetraalkylammonium ions
JP2003190949A (en) * 2001-12-27 2003-07-08 Tokuyama Corp Method for regeneration of photoresist developing waste solution

Also Published As

Publication number Publication date
KR100954250B1 (en) 2010-04-23
JP4810436B2 (en) 2011-11-09
TWI375134B (en) 2012-10-21
TW200634447A (en) 2006-10-01
CN101111804A (en) 2008-01-23
KR20070090221A (en) 2007-09-05
WO2006059760A1 (en) 2006-06-08
JPWO2006059760A1 (en) 2008-06-05

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