SG158001A1 - Method for manufacturing metal-based ceramic composite target containing noble metal - Google Patents
Method for manufacturing metal-based ceramic composite target containing noble metalInfo
- Publication number
- SG158001A1 SG158001A1 SG200808346-1A SG2008083461A SG158001A1 SG 158001 A1 SG158001 A1 SG 158001A1 SG 2008083461 A SG2008083461 A SG 2008083461A SG 158001 A1 SG158001 A1 SG 158001A1
- Authority
- SG
- Singapore
- Prior art keywords
- metal
- powder
- ceramic
- noble metal
- manufacturing
- Prior art date
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F3/00—Manufacture of workpieces or articles from metallic powder characterised by the manner of compacting or sintering; Apparatus specially adapted therefor ; Presses and furnaces
- B22F3/12—Both compacting and sintering
- B22F3/14—Both compacting and sintering simultaneously
- B22F3/15—Hot isostatic pressing
-
- C—CHEMISTRY; METALLURGY
- C22—METALLURGY; FERROUS OR NON-FERROUS ALLOYS; TREATMENT OF ALLOYS OR NON-FERROUS METALS
- C22C—ALLOYS
- C22C32/00—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ
- C22C32/001—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides
- C22C32/0015—Non-ferrous alloys containing at least 5% by weight but less than 50% by weight of oxides, carbides, borides, nitrides, silicides or other metal compounds, e.g. oxynitrides, sulfides, whether added as such or formed in situ with only oxides with only single oxides as main non-metallic constituents
- C22C32/0026—Matrix based on Ni, Co, Cr or alloys thereof
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B22—CASTING; POWDER METALLURGY
- B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
- B22F2998/00—Supplementary information concerning processes or compositions relating to powder metallurgy
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Powder Metallurgy (AREA)
- Physical Vapour Deposition (AREA)
- Magnetic Record Carriers (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Manufacture Of Alloys Or Alloy Compounds (AREA)
Abstract
A method for manufacturing a metal-based ceramic composite target containing noble metal is provided, which includes firstly applying a ceramic powder uniformly onto a surface of a magnetic metal powder by using a wet powder mixing process, and drying it to obtain a ceramic-metal composite powder, and then uniformly mixing a noble metal powder with the ceramic-metal powder by using a dry powder mixing process, and finally making the ceramic-metal composite powder into a compact target by using a molding and compacting process. The manufacturing method of the present invention can uniformly mix the powders of the magnetic metal, the ceramic, and the noble metal, and reduce the loss of the noble metal is powder in the production process of the target, so as to improve the quality of the target and decrease the production cost thereof.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
TW097122747A TWI396759B (en) | 2008-06-18 | 2008-06-18 | A method for producing a metal - based ceramic composite target containing noble metal |
Publications (1)
Publication Number | Publication Date |
---|---|
SG158001A1 true SG158001A1 (en) | 2010-01-29 |
Family
ID=41431494
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200808346-1A SG158001A1 (en) | 2008-06-18 | 2008-11-11 | Method for manufacturing metal-based ceramic composite target containing noble metal |
Country Status (4)
Country | Link |
---|---|
US (1) | US20090317280A1 (en) |
JP (1) | JP4913116B2 (en) |
SG (1) | SG158001A1 (en) |
TW (1) | TWI396759B (en) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI402366B (en) * | 2010-03-30 | 2013-07-21 | China Steel Corp | Method of manufacturing cobalt alloy-based ceramic composite sputtering target |
JP5240228B2 (en) * | 2010-04-09 | 2013-07-17 | Tdk株式会社 | Sputtering target and method for manufacturing perpendicular magnetic recording medium |
TWI573882B (en) * | 2016-08-10 | 2017-03-11 | 中國鋼鐵股份有限公司 | Copper gallium alloy sputtering target and method of producing the same and application thereof |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6762142B2 (en) * | 2001-09-26 | 2004-07-13 | Matsushita Electric Industrial Co., Ltd. | Dielectric ceramic and dielectric device |
CN1290911C (en) * | 2002-06-05 | 2006-12-20 | 昭和电工株式会社 | Powder comprising silica-coated zinc oxide, organic polymer composition containing the powder and shaped article thereof |
US6759005B2 (en) * | 2002-07-23 | 2004-07-06 | Heraeus, Inc. | Fabrication of B/C/N/O/Si doped sputtering targets |
JP2004339586A (en) * | 2003-05-19 | 2004-12-02 | Mitsubishi Materials Corp | Sputtering target for forming magnetic recording film, and its production method |
JP4422574B2 (en) * | 2004-07-30 | 2010-02-24 | 三井金属鉱業株式会社 | Sputtering target material comprising ceramic-metal composite material and method for producing the same |
WO2007080781A1 (en) * | 2006-01-13 | 2007-07-19 | Nippon Mining & Metals Co., Ltd. | Nonmagnetic material particle dispersed ferromagnetic material sputtering target |
JP2008078496A (en) * | 2006-09-22 | 2008-04-03 | Mitsui Mining & Smelting Co Ltd | OXIDE CONTAINING Co-BASED ALLOY MAGNETIC FILM, OXIDE CONTAINING Co-BASED ALLOY TARGET, AND MANUFACTURING METHOD THEREOF |
JP5155565B2 (en) * | 2007-01-04 | 2013-03-06 | 三井金属鉱業株式会社 | CoCrPt-based sputtering target and method for producing the same |
US20090053089A1 (en) * | 2007-08-20 | 2009-02-26 | Heraeus Inc. | HOMOGENEOUS GRANULATED METAL BASED and METAL-CERAMIC BASED POWDERS |
-
2008
- 2008-06-18 TW TW097122747A patent/TWI396759B/en not_active IP Right Cessation
- 2008-09-26 US US12/238,477 patent/US20090317280A1/en not_active Abandoned
- 2008-11-11 SG SG200808346-1A patent/SG158001A1/en unknown
- 2008-12-09 JP JP2008312839A patent/JP4913116B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
TW201000651A (en) | 2010-01-01 |
JP4913116B2 (en) | 2012-04-11 |
JP2010001562A (en) | 2010-01-07 |
US20090317280A1 (en) | 2009-12-24 |
TWI396759B (en) | 2013-05-21 |
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