SG157980A1 - Substrate drying - Google Patents
Substrate dryingInfo
- Publication number
- SG157980A1 SG157980A1 SG200804789-6A SG2008047896A SG157980A1 SG 157980 A1 SG157980 A1 SG 157980A1 SG 2008047896 A SG2008047896 A SG 2008047896A SG 157980 A1 SG157980 A1 SG 157980A1
- Authority
- SG
- Singapore
- Prior art keywords
- ipa
- vapor
- nitrogen
- generator
- vessel
- Prior art date
Links
Landscapes
- Cleaning Or Drying Semiconductors (AREA)
- Drying Of Solid Materials (AREA)
Abstract
The present invention relates to an apparatus and method for generating inert polar organic compound vapor to be used for drying electronic substrate, more particularly semiconductor wafer. The polar organic compound is isopropyl alcohol (IPA) and the inert nitrogen gas (N2). The apparatus is a vapor generator (10) comprising of a vessel which continuously receives IPA from an IPA supply (12) line. Amount of IPA in the vessel is maintained at a fixed quantity by continuous liquid level feedback control. An ultrasonic nebulizer is installed at the bottom of the IPA vapor generator (10) and it is powered by an external oscillator that generates ultrasonic oscillations. The ultrasonic nebulizer (11) generates ultrasonic energy which converts the IPA into fine particles, i.e. mist. The vapor generator also has an inlet for nitrogen supply (14). The nitrogen supplied into the generator (10) carries the IPA mist away to form an IPA and nitrogen vapor mixture. The mixture is then transported to a drying chamber (18) where the wafer is cleaned and dried. FIGURE 1 accompanies the abstract.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG200804789-6A SG157980A1 (en) | 2008-06-24 | 2008-06-24 | Substrate drying |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
SG200804789-6A SG157980A1 (en) | 2008-06-24 | 2008-06-24 | Substrate drying |
Publications (1)
Publication Number | Publication Date |
---|---|
SG157980A1 true SG157980A1 (en) | 2010-01-29 |
Family
ID=41591710
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200804789-6A SG157980A1 (en) | 2008-06-24 | 2008-06-24 | Substrate drying |
Country Status (1)
Country | Link |
---|---|
SG (1) | SG157980A1 (en) |
Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050100481A (en) * | 2004-04-14 | 2005-10-19 | 삼성전자주식회사 | Apparatus for drying a wafer |
KR20060057224A (en) * | 2004-11-23 | 2006-05-26 | 삼성전자주식회사 | Ipa vapor dryer |
US20060151006A1 (en) * | 2005-01-12 | 2006-07-13 | Chang-Hyeon Nam | Substrate dryer and a drying method |
KR20060096806A (en) * | 2005-03-04 | 2006-09-13 | 세메스 주식회사 | Apparatus for wafer transaction |
-
2008
- 2008-06-24 SG SG200804789-6A patent/SG157980A1/en unknown
Patent Citations (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR20050100481A (en) * | 2004-04-14 | 2005-10-19 | 삼성전자주식회사 | Apparatus for drying a wafer |
KR20060057224A (en) * | 2004-11-23 | 2006-05-26 | 삼성전자주식회사 | Ipa vapor dryer |
US20060151006A1 (en) * | 2005-01-12 | 2006-07-13 | Chang-Hyeon Nam | Substrate dryer and a drying method |
KR20060096806A (en) * | 2005-03-04 | 2006-09-13 | 세메스 주식회사 | Apparatus for wafer transaction |
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