SG135034A1 - Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems - Google Patents

Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems

Info

Publication number
SG135034A1
SG135034A1 SG200403098-7A SG2004030987A SG135034A1 SG 135034 A1 SG135034 A1 SG 135034A1 SG 2004030987 A SG2004030987 A SG 2004030987A SG 135034 A1 SG135034 A1 SG 135034A1
Authority
SG
Singapore
Prior art keywords
stationary
numerical aperture
transverse electric
high numerical
dynamic radial
Prior art date
Application number
SG200403098-7A
Inventor
Alexander Straaijer
Kevin Cummings
Marcel Mathijs Theodo Dierichs
Donis George Flagello
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from US10/786,473 external-priority patent/US7206059B2/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG135034A1 publication Critical patent/SG135034A1/en

Links

Classifications

    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F41WEAPONS
    • F41BWEAPONS FOR PROJECTING MISSILES WITHOUT USE OF EXPLOSIVE OR COMBUSTIBLE PROPELLANT CHARGE; WEAPONS NOT OTHERWISE PROVIDED FOR
    • F41B11/00Compressed-gas guns, e.g. air guns; Steam guns
    • F41B11/60Compressed-gas guns, e.g. air guns; Steam guns characterised by the supply of compressed gas
    • F41B11/62Compressed-gas guns, e.g. air guns; Steam guns characterised by the supply of compressed gas with pressure supplied by a gas cartridge
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C13/00Details of vessels or of the filling or discharging of vessels
    • F17C13/04Arrangement or mounting of valves
    • FMECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F17STORING OR DISTRIBUTING GASES OR LIQUIDS
    • F17CVESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
    • F17C2205/00Vessel construction, in particular mounting arrangements, attachments or identifications means
    • F17C2205/03Fluid connections, filters, valves, closure means or other attachments
    • F17C2205/0302Fittings, valves, filters, or components in connection with the gas storage device
    • F17C2205/0323Valves
    • F17C2205/0335Check-valves or non-return valves

Landscapes

  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Polarising Elements (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200403098-7A 2004-02-26 2004-06-01 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems SG135034A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/786,473 US7206059B2 (en) 2003-02-27 2004-02-26 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems

Publications (1)

Publication Number Publication Date
SG135034A1 true SG135034A1 (en) 2007-09-28

Family

ID=35010856

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200403098-7A SG135034A1 (en) 2004-02-26 2004-06-01 Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems

Country Status (4)

Country Link
KR (1) KR100597039B1 (en)
CN (1) CN100570415C (en)
SG (1) SG135034A1 (en)
TW (1) TWI319124B (en)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7259829B2 (en) * 2004-07-26 2007-08-21 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7889315B2 (en) * 2006-04-13 2011-02-15 Asml Netherlands B.V. Lithographic apparatus, lens interferometer and device manufacturing method
US8755113B2 (en) * 2006-08-31 2014-06-17 Moxtek, Inc. Durable, inorganic, absorptive, ultra-violet, grid polarizer
DE102007055063A1 (en) * 2007-11-16 2009-05-28 Carl Zeiss Smt Ag Illumination device of a microlithographic projection exposure apparatus
US20090265148A1 (en) * 2008-04-16 2009-10-22 Synopsys, Inc. Modeling a sector-polarized-illumination source in an optical lithography system
CN102722034B (en) * 2012-02-11 2015-10-07 深圳市光峰光电技术有限公司 Light splitting device and relevant source
KR101633821B1 (en) * 2012-09-11 2016-06-27 자카리 에이 밀러 Adjustable dynamic filter
US9354374B2 (en) 2013-10-24 2016-05-31 Moxtek, Inc. Polarizer with wire pair over rib
CN108885289B (en) * 2016-03-04 2021-09-03 应用材料公司 Wire grid polarizer manufacturing method
CN106054303A (en) * 2016-07-08 2016-10-26 西北工业大学 Microstructure device for obtaining angular polarized light or radial polarized light
WO2018212943A1 (en) 2017-05-16 2018-11-22 Applied Materials, Inc. Wire grid polarizer manufacturing methods using frequency doubling interference lithography
EP3540499A1 (en) 2018-03-13 2019-09-18 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes
EP3540479A1 (en) * 2018-03-13 2019-09-18 Thomson Licensing Diffraction grating comprising double-materials structures
EP3591700A1 (en) 2018-07-02 2020-01-08 Thomson Licensing Image sensor comprising a color splitter with two different refractive indexes, and different height

Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3653741A (en) * 1970-02-16 1972-04-04 Alvin M Marks Electro-optical dipolar material
US5559583A (en) * 1994-02-24 1996-09-24 Nec Corporation Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer
DE19621512A1 (en) * 1996-05-29 1997-12-04 Univ Schiller Jena Polarisation establishment with respect to wavelength of source spectra
US6191880B1 (en) * 1995-09-23 2001-02-20 Carl-Zeiss-Stiftung Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement
WO2001051964A1 (en) * 2000-01-11 2001-07-19 Moxtek Imbedded wire grid polarizer for the visible spectrum
US20010022687A1 (en) * 1992-12-14 2001-09-20 Kazuhiro Takahashi Reflection and refraction optical system and projection exposure apparatus using the same
US6381068B1 (en) * 1999-03-19 2002-04-30 3M Innovative Properties Company Reflective projection screen and projection system
US20020167727A1 (en) * 2001-03-27 2002-11-14 Hansen Douglas P. Patterned wire grid polarizer and method of use
US20020176166A1 (en) * 2001-05-22 2002-11-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Polarizer and microlithography projection system with a polarizer
US20030206347A1 (en) * 2002-05-02 2003-11-06 Robert Sabia Optical isolators and methods of manufacture

Patent Citations (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3653741A (en) * 1970-02-16 1972-04-04 Alvin M Marks Electro-optical dipolar material
US20010022687A1 (en) * 1992-12-14 2001-09-20 Kazuhiro Takahashi Reflection and refraction optical system and projection exposure apparatus using the same
US5559583A (en) * 1994-02-24 1996-09-24 Nec Corporation Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer
US6191880B1 (en) * 1995-09-23 2001-02-20 Carl-Zeiss-Stiftung Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement
DE19621512A1 (en) * 1996-05-29 1997-12-04 Univ Schiller Jena Polarisation establishment with respect to wavelength of source spectra
US6381068B1 (en) * 1999-03-19 2002-04-30 3M Innovative Properties Company Reflective projection screen and projection system
WO2001051964A1 (en) * 2000-01-11 2001-07-19 Moxtek Imbedded wire grid polarizer for the visible spectrum
US20020167727A1 (en) * 2001-03-27 2002-11-14 Hansen Douglas P. Patterned wire grid polarizer and method of use
US20020176166A1 (en) * 2001-05-22 2002-11-28 Carl Zeiss Semiconductor Manufacturing Technologies Ag Polarizer and microlithography projection system with a polarizer
US20030206347A1 (en) * 2002-05-02 2003-11-06 Robert Sabia Optical isolators and methods of manufacture

Also Published As

Publication number Publication date
KR100597039B1 (en) 2006-07-04
CN1661478A (en) 2005-08-31
TWI319124B (en) 2010-01-01
CN100570415C (en) 2009-12-16
KR20050087690A (en) 2005-08-31
TW200528927A (en) 2005-09-01

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