SG135034A1 - Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems - Google Patents
Stationary and dynamic radial transverse electric polarizer for high numerical aperture systemsInfo
- Publication number
- SG135034A1 SG135034A1 SG200403098-7A SG2004030987A SG135034A1 SG 135034 A1 SG135034 A1 SG 135034A1 SG 2004030987 A SG2004030987 A SG 2004030987A SG 135034 A1 SG135034 A1 SG 135034A1
- Authority
- SG
- Singapore
- Prior art keywords
- stationary
- numerical aperture
- transverse electric
- high numerical
- dynamic radial
- Prior art date
Links
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F41—WEAPONS
- F41B—WEAPONS FOR PROJECTING MISSILES WITHOUT USE OF EXPLOSIVE OR COMBUSTIBLE PROPELLANT CHARGE; WEAPONS NOT OTHERWISE PROVIDED FOR
- F41B11/00—Compressed-gas guns, e.g. air guns; Steam guns
- F41B11/60—Compressed-gas guns, e.g. air guns; Steam guns characterised by the supply of compressed gas
- F41B11/62—Compressed-gas guns, e.g. air guns; Steam guns characterised by the supply of compressed gas with pressure supplied by a gas cartridge
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/04—Arrangement or mounting of valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0323—Valves
- F17C2205/0335—Check-valves or non-return valves
Landscapes
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Polarising Elements (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/786,473 US7206059B2 (en) | 2003-02-27 | 2004-02-26 | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
Publications (1)
Publication Number | Publication Date |
---|---|
SG135034A1 true SG135034A1 (en) | 2007-09-28 |
Family
ID=35010856
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200403098-7A SG135034A1 (en) | 2004-02-26 | 2004-06-01 | Stationary and dynamic radial transverse electric polarizer for high numerical aperture systems |
Country Status (4)
Country | Link |
---|---|
KR (1) | KR100597039B1 (en) |
CN (1) | CN100570415C (en) |
SG (1) | SG135034A1 (en) |
TW (1) | TWI319124B (en) |
Families Citing this family (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7259829B2 (en) * | 2004-07-26 | 2007-08-21 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US7889315B2 (en) * | 2006-04-13 | 2011-02-15 | Asml Netherlands B.V. | Lithographic apparatus, lens interferometer and device manufacturing method |
US8755113B2 (en) * | 2006-08-31 | 2014-06-17 | Moxtek, Inc. | Durable, inorganic, absorptive, ultra-violet, grid polarizer |
DE102007055063A1 (en) * | 2007-11-16 | 2009-05-28 | Carl Zeiss Smt Ag | Illumination device of a microlithographic projection exposure apparatus |
US20090265148A1 (en) * | 2008-04-16 | 2009-10-22 | Synopsys, Inc. | Modeling a sector-polarized-illumination source in an optical lithography system |
CN102722034B (en) * | 2012-02-11 | 2015-10-07 | 深圳市光峰光电技术有限公司 | Light splitting device and relevant source |
KR101633821B1 (en) * | 2012-09-11 | 2016-06-27 | 자카리 에이 밀러 | Adjustable dynamic filter |
US9354374B2 (en) | 2013-10-24 | 2016-05-31 | Moxtek, Inc. | Polarizer with wire pair over rib |
CN108885289B (en) * | 2016-03-04 | 2021-09-03 | 应用材料公司 | Wire grid polarizer manufacturing method |
CN106054303A (en) * | 2016-07-08 | 2016-10-26 | 西北工业大学 | Microstructure device for obtaining angular polarized light or radial polarized light |
WO2018212943A1 (en) | 2017-05-16 | 2018-11-22 | Applied Materials, Inc. | Wire grid polarizer manufacturing methods using frequency doubling interference lithography |
EP3540499A1 (en) | 2018-03-13 | 2019-09-18 | Thomson Licensing | Image sensor comprising a color splitter with two different refractive indexes |
EP3540479A1 (en) * | 2018-03-13 | 2019-09-18 | Thomson Licensing | Diffraction grating comprising double-materials structures |
EP3591700A1 (en) | 2018-07-02 | 2020-01-08 | Thomson Licensing | Image sensor comprising a color splitter with two different refractive indexes, and different height |
Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3653741A (en) * | 1970-02-16 | 1972-04-04 | Alvin M Marks | Electro-optical dipolar material |
US5559583A (en) * | 1994-02-24 | 1996-09-24 | Nec Corporation | Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer |
DE19621512A1 (en) * | 1996-05-29 | 1997-12-04 | Univ Schiller Jena | Polarisation establishment with respect to wavelength of source spectra |
US6191880B1 (en) * | 1995-09-23 | 2001-02-20 | Carl-Zeiss-Stiftung | Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
WO2001051964A1 (en) * | 2000-01-11 | 2001-07-19 | Moxtek | Imbedded wire grid polarizer for the visible spectrum |
US20010022687A1 (en) * | 1992-12-14 | 2001-09-20 | Kazuhiro Takahashi | Reflection and refraction optical system and projection exposure apparatus using the same |
US6381068B1 (en) * | 1999-03-19 | 2002-04-30 | 3M Innovative Properties Company | Reflective projection screen and projection system |
US20020167727A1 (en) * | 2001-03-27 | 2002-11-14 | Hansen Douglas P. | Patterned wire grid polarizer and method of use |
US20020176166A1 (en) * | 2001-05-22 | 2002-11-28 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Polarizer and microlithography projection system with a polarizer |
US20030206347A1 (en) * | 2002-05-02 | 2003-11-06 | Robert Sabia | Optical isolators and methods of manufacture |
-
2004
- 2004-03-09 TW TW093106253A patent/TWI319124B/en not_active IP Right Cessation
- 2004-03-09 KR KR1020040015702A patent/KR100597039B1/en not_active IP Right Cessation
- 2004-04-06 CN CNB2004100335266A patent/CN100570415C/en not_active Expired - Fee Related
- 2004-06-01 SG SG200403098-7A patent/SG135034A1/en unknown
Patent Citations (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3653741A (en) * | 1970-02-16 | 1972-04-04 | Alvin M Marks | Electro-optical dipolar material |
US20010022687A1 (en) * | 1992-12-14 | 2001-09-20 | Kazuhiro Takahashi | Reflection and refraction optical system and projection exposure apparatus using the same |
US5559583A (en) * | 1994-02-24 | 1996-09-24 | Nec Corporation | Exposure system and illuminating apparatus used therein and method for exposing a resist film on a wafer |
US6191880B1 (en) * | 1995-09-23 | 2001-02-20 | Carl-Zeiss-Stiftung | Radial polarization-rotating optical arrangement and microlithographic projection exposure system incorporating said arrangement |
DE19621512A1 (en) * | 1996-05-29 | 1997-12-04 | Univ Schiller Jena | Polarisation establishment with respect to wavelength of source spectra |
US6381068B1 (en) * | 1999-03-19 | 2002-04-30 | 3M Innovative Properties Company | Reflective projection screen and projection system |
WO2001051964A1 (en) * | 2000-01-11 | 2001-07-19 | Moxtek | Imbedded wire grid polarizer for the visible spectrum |
US20020167727A1 (en) * | 2001-03-27 | 2002-11-14 | Hansen Douglas P. | Patterned wire grid polarizer and method of use |
US20020176166A1 (en) * | 2001-05-22 | 2002-11-28 | Carl Zeiss Semiconductor Manufacturing Technologies Ag | Polarizer and microlithography projection system with a polarizer |
US20030206347A1 (en) * | 2002-05-02 | 2003-11-06 | Robert Sabia | Optical isolators and methods of manufacture |
Also Published As
Publication number | Publication date |
---|---|
KR100597039B1 (en) | 2006-07-04 |
CN1661478A (en) | 2005-08-31 |
TWI319124B (en) | 2010-01-01 |
CN100570415C (en) | 2009-12-16 |
KR20050087690A (en) | 2005-08-31 |
TW200528927A (en) | 2005-09-01 |
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