SG134991A1 - Lithographic apparatus and a measurement system - Google Patents

Lithographic apparatus and a measurement system

Info

Publication number
SG134991A1
SG134991A1 SG200305709-8A SG2003057098A SG134991A1 SG 134991 A1 SG134991 A1 SG 134991A1 SG 2003057098 A SG2003057098 A SG 2003057098A SG 134991 A1 SG134991 A1 SG 134991A1
Authority
SG
Singapore
Prior art keywords
measurement system
lithographic apparatus
lithographic
measurement
Prior art date
Application number
SG200305709-8A
Other languages
English (en)
Inventor
Der Laan Hans Van
Johannes Jacobus Mat Baselmans
Dijsseldonk Antonius Johan Van
Martinus Hendrikus An Leenders
Johannes Hubertus Joseph Moors
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG134991A1 publication Critical patent/SG134991A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G03F7/706—Aberration measurement

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Testing Of Optical Devices Or Fibers (AREA)
SG200305709-8A 2002-09-30 2003-09-26 Lithographic apparatus and a measurement system SG134991A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP02256794 2002-09-30

Publications (1)

Publication Number Publication Date
SG134991A1 true SG134991A1 (en) 2007-09-28

Family

ID=32479813

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200305709-8A SG134991A1 (en) 2002-09-30 2003-09-26 Lithographic apparatus and a measurement system

Country Status (8)

Country Link
US (1) US6940587B2 (ja)
EP (1) EP1403714B1 (ja)
JP (1) JP3998627B2 (ja)
KR (1) KR100565105B1 (ja)
CN (1) CN100559273C (ja)
DE (1) DE60332697D1 (ja)
SG (1) SG134991A1 (ja)
TW (1) TWI255970B (ja)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050275841A1 (en) * 2004-06-09 2005-12-15 Asml Netherlands B.V. Alignment marker and lithographic apparatus and device manufacturing method using the same
US7528931B2 (en) 2004-12-20 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7834975B2 (en) 2004-12-27 2010-11-16 Asml Netherlands B.V. Method and exposure apparatus for performing a tilted focus and a device manufactured accordingly
JP2006332586A (ja) * 2005-04-25 2006-12-07 Canon Inc 測定装置、露光装置及び方法、並びに、デバイス製造方法
JP2006339448A (ja) * 2005-06-02 2006-12-14 Canon Inc 受光ユニットを有する露光装置
US20070081138A1 (en) * 2005-10-11 2007-04-12 Asml Netherlands B.V. Lithographic projection apparatus, device manufacturing methods and mask for use in a device manufacturing method
JP2007234685A (ja) 2006-02-28 2007-09-13 Canon Inc 測定装置、当該測定装置を有する露光装置及びデバイス製造方法
US7580113B2 (en) * 2006-06-23 2009-08-25 Asml Netherlands B.V. Method of reducing a wave front aberration, and computer program product
US20080259458A1 (en) * 2007-04-18 2008-10-23 Advanced Micro Devices, Inc. EUV diffractive optical element for semiconductor wafer lithography and method for making same
US8189172B2 (en) * 2007-06-14 2012-05-29 Asml Netherlands B.V. Lithographic apparatus and method
US8692974B2 (en) * 2007-06-14 2014-04-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method using pupil filling by telecentricity control
NL1036695A1 (nl) 2008-05-15 2009-11-17 Asml Netherlands Bv Lithographic apparatus.
DE102012204704A1 (de) * 2012-03-23 2013-09-26 Carl Zeiss Smt Gmbh Messvorrichtung zum Vermessen einer Abbildungsgüte eines EUV-Objektives
DE102012207865B3 (de) * 2012-05-11 2013-07-11 Carl Zeiss Smt Gmbh Optische Baugruppe für die EUV-Lithographie
US9335206B2 (en) * 2012-08-30 2016-05-10 Kla-Tencor Corporation Wave front aberration metrology of optics of EUV mask inspection system
DE102014221313A1 (de) 2014-10-21 2016-04-21 Carl Zeiss Smt Gmbh Beleuchtung für die EUV-Projektionslithografie
CN107003447B (zh) * 2014-11-24 2020-03-24 Asml荷兰有限公司 辐射束设备
CN106324995B (zh) * 2015-05-12 2017-12-12 中国科学院上海光学精密机械研究所 光刻机原位快速高空间分辨率波像差检测装置及方法
CN106323981B (zh) * 2015-06-23 2017-11-14 南京理工大学 基于偏轴型位相波带片干涉显微检测装置
DE102016200847A1 (de) * 2016-01-21 2017-07-27 Dr. Johannes Heidenhain Gesellschaft Mit Beschränkter Haftung Optische Positionsmesseinrichtung
JP7325961B2 (ja) 2016-06-03 2023-08-15 エーエスエムエル ネザーランズ ビー．ブイ． パターニングデバイス
DE102017200428B3 (de) 2017-01-12 2018-06-21 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage sowie Verfahren zum Vermessen eines Abbildungsfehlers
DE102017203376B3 (de) 2017-03-02 2018-05-24 Carl Zeiss Smt Gmbh Messvorrichtung und Verfahren zur Vermessung eines Wellenfrontfehlers eines abbildenden optischen Systems sowie Projektionsbelichtungsanlage für die Mikrolithographie
DE102018204626A1 (de) 2018-03-27 2019-04-04 Carl Zeiss Smt Gmbh Beleuchtungsmaske sowie Verfahren zu deren Herstellung
EP4350440A1 (en) * 2022-10-06 2024-04-10 ASML Netherlands B.V. Methods and system for determining aberrations of a projection system

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296891A (en) * 1990-05-02 1994-03-22 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Illumination device
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
EP1231514A1 (en) * 2001-02-13 2002-08-14 Asm Lithography B.V. Measurement of wavefront aberrations in a lithographic projection apparatus

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19824030A1 (de) * 1998-05-29 1999-12-02 Zeiss Carl Fa Katadioptrisches Projektionsobjektiv mit adaptivem Spiegel und Projektionsbelichtungsverfahren
TW550377B (en) * 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5296891A (en) * 1990-05-02 1994-03-22 Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V. Illumination device
US6285497B1 (en) * 1998-08-06 2001-09-04 Euv Llc Diffractive element in extreme-UV lithography condenser
EP1231514A1 (en) * 2001-02-13 2002-08-14 Asm Lithography B.V. Measurement of wavefront aberrations in a lithographic projection apparatus

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
RESEARCH DISCLOSURE VOL. 335, NO. 107 *

Also Published As

Publication number Publication date
DE60332697D1 (de) 2010-07-08
EP1403714A2 (en) 2004-03-31
EP1403714B1 (en) 2010-05-26
KR100565105B1 (ko) 2006-03-30
CN100559273C (zh) 2009-11-11
JP3998627B2 (ja) 2007-10-31
US20040114119A1 (en) 2004-06-17
TW200413861A (en) 2004-08-01
EP1403714A3 (en) 2007-01-10
CN1497350A (zh) 2004-05-19
JP2004289116A (ja) 2004-10-14
KR20040030322A (ko) 2004-04-09
US6940587B2 (en) 2005-09-06
TWI255970B (en) 2006-06-01

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