SG133555A1 - Lithographic apparatus and device manufacturing method - Google Patents

Lithographic apparatus and device manufacturing method

Info

Publication number
SG133555A1
SG133555A1 SG200608882-7A SG2006088827A SG133555A1 SG 133555 A1 SG133555 A1 SG 133555A1 SG 2006088827 A SG2006088827 A SG 2006088827A SG 133555 A1 SG133555 A1 SG 133555A1
Authority
SG
Singapore
Prior art keywords
device manufacturing
lithographic apparatus
lithographic
manufacturing
Prior art date
Application number
SG200608882-7A
Other languages
English (en)
Inventor
Erik Roelof Loopstra
Bernardus Antonius Luttikhuis
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG133555A1 publication Critical patent/SG133555A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
    • G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
SG200608882-7A 2005-12-23 2006-12-20 Lithographic apparatus and device manufacturing method SG133555A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/316,359 US7961291B2 (en) 2005-12-23 2005-12-23 Lithographic apparatus and device manufacturing method

Publications (1)

Publication Number Publication Date
SG133555A1 true SG133555A1 (en) 2007-07-30

Family

ID=37898369

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200608882-7A SG133555A1 (en) 2005-12-23 2006-12-20 Lithographic apparatus and device manufacturing method

Country Status (7)

Country Link
US (1) US7961291B2 (zh)
EP (1) EP1801654A1 (zh)
JP (1) JP4669833B2 (zh)
KR (1) KR100832079B1 (zh)
CN (1) CN1987662B (zh)
SG (1) SG133555A1 (zh)
TW (1) TWI346257B (zh)

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4984953A (en) * 1987-02-20 1991-01-15 Canon Kabushiki Kaisha Plate-like article conveying system
JPH06181166A (ja) 1992-12-14 1994-06-28 Nikon Corp 投影露光装置
JP3287058B2 (ja) 1993-04-23 2002-05-27 株式会社ニコン 露光装置
US5852490A (en) * 1996-09-30 1998-12-22 Nikon Corporation Projection exposure method and apparatus
JPH10239855A (ja) 1997-02-28 1998-09-11 Nikon Corp 基板搬送装置
WO1999028220A1 (fr) * 1997-12-03 1999-06-10 Nikon Corporation Dispositif et procede de transfert de substrats
US20040075822A1 (en) * 1998-07-03 2004-04-22 Nikon Corporation Exposure apparatus and its making method, substrate carrying method, device manufacturing method and device
EP1052547A3 (en) 1999-04-21 2002-07-31 Asm Lithography B.V. Mask-handling apparatus for lithographic projection apparatus
US6549277B1 (en) * 1999-09-28 2003-04-15 Nikon Corporation Illuminance meter, illuminance measuring method and exposure apparatus
JP2002158155A (ja) * 2000-11-17 2002-05-31 Canon Inc 露光装置および露光方法
US6492077B1 (en) 2001-04-23 2002-12-10 Taiwan Semiconductor Manufacturing Company Multiple-reticle mask holder and aligner
JPWO2003017344A1 (ja) * 2001-08-20 2004-12-09 株式会社ニコン マスク交換方法及び露光装置
US6897940B2 (en) 2002-06-21 2005-05-24 Nikon Corporation System for correcting aberrations and distortions in EUV lithography
US7379785B2 (en) * 2002-11-28 2008-05-27 Tokyo Electron Limited Substrate processing system, coating/developing apparatus, and substrate processing apparatus
JP4315420B2 (ja) * 2003-04-18 2009-08-19 キヤノン株式会社 露光装置及び露光方法
US6781674B1 (en) 2003-05-29 2004-08-24 Asml Holding N.V. System and method to increase throughput in a dual substrate stage double exposure lithography system
KR20060007211A (ko) * 2004-07-19 2006-01-24 삼성전자주식회사 노광 시스템

Also Published As

Publication number Publication date
TW200728936A (en) 2007-08-01
TWI346257B (en) 2011-08-01
EP1801654A1 (en) 2007-06-27
KR20070066904A (ko) 2007-06-27
KR100832079B1 (ko) 2008-05-27
US7961291B2 (en) 2011-06-14
JP2007189217A (ja) 2007-07-26
CN1987662A (zh) 2007-06-27
CN1987662B (zh) 2013-08-14
US20070146678A1 (en) 2007-06-28
JP4669833B2 (ja) 2011-04-13

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