SG133555A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG133555A1 SG133555A1 SG200608882-7A SG2006088827A SG133555A1 SG 133555 A1 SG133555 A1 SG 133555A1 SG 2006088827 A SG2006088827 A SG 2006088827A SG 133555 A1 SG133555 A1 SG 133555A1
- Authority
- SG
- Singapore
- Prior art keywords
- device manufacturing
- lithographic apparatus
- lithographic
- manufacturing
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
- G03F7/70741—Handling masks outside exposure position, e.g. reticle libraries
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Library & Information Science (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/316,359 US7961291B2 (en) | 2005-12-23 | 2005-12-23 | Lithographic apparatus and device manufacturing method |
Publications (1)
Publication Number | Publication Date |
---|---|
SG133555A1 true SG133555A1 (en) | 2007-07-30 |
Family
ID=37898369
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200608882-7A SG133555A1 (en) | 2005-12-23 | 2006-12-20 | Lithographic apparatus and device manufacturing method |
Country Status (7)
Country | Link |
---|---|
US (1) | US7961291B2 (ko) |
EP (1) | EP1801654A1 (ko) |
JP (1) | JP4669833B2 (ko) |
KR (1) | KR100832079B1 (ko) |
CN (1) | CN1987662B (ko) |
SG (1) | SG133555A1 (ko) |
TW (1) | TWI346257B (ko) |
Family Cites Families (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4984953A (en) * | 1987-02-20 | 1991-01-15 | Canon Kabushiki Kaisha | Plate-like article conveying system |
JPH06181166A (ja) | 1992-12-14 | 1994-06-28 | Nikon Corp | 投影露光装置 |
JP3287058B2 (ja) | 1993-04-23 | 2002-05-27 | 株式会社ニコン | 露光装置 |
US5852490A (en) * | 1996-09-30 | 1998-12-22 | Nikon Corporation | Projection exposure method and apparatus |
JPH10239855A (ja) | 1997-02-28 | 1998-09-11 | Nikon Corp | 基板搬送装置 |
KR20010032714A (ko) * | 1997-12-03 | 2001-04-25 | 오노 시게오 | 기판 반송방법 및 기판 반송장치, 이것을 구비한 노광장치및 이 노광장치를 이용한 디바이스 제조방법 |
US20040075822A1 (en) * | 1998-07-03 | 2004-04-22 | Nikon Corporation | Exposure apparatus and its making method, substrate carrying method, device manufacturing method and device |
EP1052547A3 (en) | 1999-04-21 | 2002-07-31 | Asm Lithography B.V. | Mask-handling apparatus for lithographic projection apparatus |
US6549277B1 (en) * | 1999-09-28 | 2003-04-15 | Nikon Corporation | Illuminance meter, illuminance measuring method and exposure apparatus |
JP2002158155A (ja) * | 2000-11-17 | 2002-05-31 | Canon Inc | 露光装置および露光方法 |
US6492077B1 (en) | 2001-04-23 | 2002-12-10 | Taiwan Semiconductor Manufacturing Company | Multiple-reticle mask holder and aligner |
WO2003017344A1 (fr) * | 2001-08-20 | 2003-02-27 | Nikon Corporation | Procede de remplacement de masque et dispositif d'exposition |
US6897940B2 (en) | 2002-06-21 | 2005-05-24 | Nikon Corporation | System for correcting aberrations and distortions in EUV lithography |
KR100974141B1 (ko) * | 2002-11-28 | 2010-08-04 | 도쿄엘렉트론가부시키가이샤 | 기판 처리 장치 |
JP4315420B2 (ja) * | 2003-04-18 | 2009-08-19 | キヤノン株式会社 | 露光装置及び露光方法 |
US6781674B1 (en) * | 2003-05-29 | 2004-08-24 | Asml Holding N.V. | System and method to increase throughput in a dual substrate stage double exposure lithography system |
KR20060007211A (ko) * | 2004-07-19 | 2006-01-24 | 삼성전자주식회사 | 노광 시스템 |
-
2005
- 2005-12-23 US US11/316,359 patent/US7961291B2/en active Active
-
2006
- 2006-12-11 TW TW095146299A patent/TWI346257B/zh active
- 2006-12-15 JP JP2006338015A patent/JP4669833B2/ja active Active
- 2006-12-20 SG SG200608882-7A patent/SG133555A1/en unknown
- 2006-12-20 KR KR1020060131246A patent/KR100832079B1/ko active IP Right Grant
- 2006-12-21 EP EP06077289A patent/EP1801654A1/en not_active Withdrawn
- 2006-12-22 CN CN200610170159.3A patent/CN1987662B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
KR100832079B1 (ko) | 2008-05-27 |
CN1987662B (zh) | 2013-08-14 |
JP2007189217A (ja) | 2007-07-26 |
EP1801654A1 (en) | 2007-06-27 |
CN1987662A (zh) | 2007-06-27 |
KR20070066904A (ko) | 2007-06-27 |
TWI346257B (en) | 2011-08-01 |
JP4669833B2 (ja) | 2011-04-13 |
US20070146678A1 (en) | 2007-06-28 |
US7961291B2 (en) | 2011-06-14 |
TW200728936A (en) | 2007-08-01 |
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