SG128657A1 - Method and system for maskless lithography real-.time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation - Google Patents

Method and system for maskless lithography real-.time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation

Info

Publication number
SG128657A1
SG128657A1 SG200604436A SG200604436A SG128657A1 SG 128657 A1 SG128657 A1 SG 128657A1 SG 200604436 A SG200604436 A SG 200604436A SG 200604436 A SG200604436 A SG 200604436A SG 128657 A1 SG128657 A1 SG 128657A1
Authority
SG
Singapore
Prior art keywords
real
feature representation
achieve optimum
time pattern
maskless lithography
Prior art date
Application number
SG200604436A
Other languages
English (en)
Inventor
Azat M Latypov
Johannes Jacobus Mat Baselmans
Kars Zeger Troost
Original Assignee
Asml Holding Nv
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Holding Nv, Asml Netherlands Bv filed Critical Asml Holding Nv
Publication of SG128657A1 publication Critical patent/SG128657A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F2203/00—Function characteristic
    • G02F2203/12—Function characteristic spatial light modulator

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
SG200604436A 2005-06-30 2006-06-29 Method and system for maskless lithography real-.time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation SG128657A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US11/170,065 US7209275B2 (en) 2005-06-30 2005-06-30 Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation

Publications (1)

Publication Number Publication Date
SG128657A1 true SG128657A1 (en) 2007-01-30

Family

ID=37106972

Family Applications (2)

Application Number Title Priority Date Filing Date
SG200805427-2A SG144940A1 (en) 2005-06-30 2006-06-29 Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
SG200604436A SG128657A1 (en) 2005-06-30 2006-06-29 Method and system for maskless lithography real-.time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation

Family Applications Before (1)

Application Number Title Priority Date Filing Date
SG200805427-2A SG144940A1 (en) 2005-06-30 2006-06-29 Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation

Country Status (7)

Country Link
US (2) US7209275B2 (zh)
EP (1) EP1739495A1 (zh)
JP (1) JP4417351B2 (zh)
KR (2) KR100770672B1 (zh)
CN (1) CN1900827A (zh)
SG (2) SG144940A1 (zh)
TW (1) TWI300886B (zh)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7209275B2 (en) * 2005-06-30 2007-04-24 Asml Holding N.V. Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
US7593017B2 (en) * 2006-08-15 2009-09-22 3M Innovative Properties Company Display simulator
JP2009075557A (ja) * 2007-06-26 2009-04-09 Carl Zeiss Smt Ag リソグラフィのための複数のアクチュエータおよび照明装置を制御する方法および装置
US7986603B1 (en) * 2007-09-29 2011-07-26 Silicon Light Machines Corporation Spatial light modulator for holographic data storage
DE102008000589B4 (de) * 2008-03-11 2018-02-01 Seereal Technologies S.A. Verfahren zur Kodierung von computergenerierten Hologrammen in pixelierten Lichtmodulatoren
KR101657053B1 (ko) * 2008-04-24 2016-09-13 마이크로닉 마이데이타 에이비 구조화된 거울 표면을 가진 공간적 광 조절기
JP5953657B2 (ja) * 2011-05-17 2016-07-20 株式会社ニコン 空間光変調器、露光装置、及びデバイス製造方法
KR101254143B1 (ko) * 2011-11-22 2013-04-18 주식회사 나래나노텍 노광 장치용 라인 광원 모듈, 및 이를 구비한 패턴 형성용 노광 장치 및 노광 시스템
CN102722085A (zh) * 2012-05-11 2012-10-10 中国科学院光电技术研究所 一种无掩模数字投影光刻的图形拼接方法
CN102914949B (zh) * 2012-09-17 2015-12-09 天津芯硕精密机械有限公司 一种用于扫描式无掩膜光刻机倾斜slm曝光的数据处理方法
CN103489185B (zh) * 2013-09-13 2016-03-30 天津大学 最大粘聚性的超像素网格的快速图像目标检测与分割方法
JP6676941B2 (ja) * 2015-12-01 2020-04-08 株式会社ニコン 制御装置及び制御方法、露光装置及び露光方法、デバイス製造方法、データ生成方法、並びに、プログラム
US10901327B2 (en) * 2018-12-20 2021-01-26 Canon Kabushiki Kaisha Automatic defect analyzer for nanoimprint lithography using image analysis

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US5748164A (en) * 1994-12-22 1998-05-05 Displaytech, Inc. Active matrix liquid crystal image generator
US6312134B1 (en) * 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
SE9800665D0 (sv) * 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
US7302111B2 (en) * 2001-09-12 2007-11-27 Micronic Laser Systems A.B. Graphics engine for high precision lithography
US6618185B2 (en) * 2001-11-28 2003-09-09 Micronic Laser Systems Ab Defective pixel compensation method
EP1324136A1 (en) * 2001-12-28 2003-07-02 ASML Netherlands B.V. Lithographic projection apparatus and device manufacturing method
JP2004006440A (ja) 2002-04-10 2004-01-08 Fuji Photo Film Co Ltd レーザ装置、露光ヘッド、及び露光装置
JP2003345030A (ja) 2002-05-23 2003-12-03 Fuji Photo Film Co Ltd 露光装置
JP2004062157A (ja) 2002-06-07 2004-02-26 Fuji Photo Film Co Ltd 光配線回路の製造方法、及びその光配線回路を備えた光配線基板
JP2004157219A (ja) 2002-11-05 2004-06-03 Fuji Photo Film Co Ltd 露光ヘッドおよび露光装置
US6831768B1 (en) * 2003-07-31 2004-12-14 Asml Holding N.V. Using time and/or power modulation to achieve dose gray-scaling in optical maskless lithography
SG110196A1 (en) 2003-09-22 2005-04-28 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7189498B2 (en) * 2004-01-08 2007-03-13 Lsi Logic Corporation Process and apparatus for generating a strong phase shift optical pattern for use in an optical direct write lithography process
US6847461B1 (en) * 2004-01-29 2005-01-25 Asml Holding N.V. System and method for calibrating a spatial light modulator array using shearing interferometry
US7190434B2 (en) * 2004-02-18 2007-03-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US6963434B1 (en) * 2004-04-30 2005-11-08 Asml Holding N.V. System and method for calculating aerial image of a spatial light modulator
US7102733B2 (en) * 2004-08-13 2006-09-05 Asml Holding N.V. System and method to compensate for static and dynamic misalignments and deformations in a maskless lithography tool
US7126672B2 (en) * 2004-12-27 2006-10-24 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7317510B2 (en) * 2004-12-27 2008-01-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7330239B2 (en) * 2005-04-08 2008-02-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method utilizing a blazing portion of a contrast device
US7400382B2 (en) * 2005-04-28 2008-07-15 Asml Holding N.V. Light patterning device using tilting mirrors in a superpixel form
US7209275B2 (en) * 2005-06-30 2007-04-24 Asml Holding N.V. Method and system for maskless lithography real-time pattern rasterization and using computationally coupled mirrors to achieve optimum feature representation
US7738077B2 (en) * 2006-07-31 2010-06-15 Asml Netherlands B.V. Patterning device utilizing sets of stepped mirrors and method of using same

Also Published As

Publication number Publication date
TW200707135A (en) 2007-02-16
KR100770672B1 (ko) 2007-10-29
TWI300886B (en) 2008-09-11
JP2007013160A (ja) 2007-01-18
EP1739495A1 (en) 2007-01-03
CN1900827A (zh) 2007-01-24
US7209275B2 (en) 2007-04-24
KR20070069107A (ko) 2007-07-02
US7773287B2 (en) 2010-08-10
KR100767827B1 (ko) 2007-10-18
US20070002419A1 (en) 2007-01-04
US20070268547A1 (en) 2007-11-22
KR20070003705A (ko) 2007-01-05
JP4417351B2 (ja) 2010-02-17
SG144940A1 (en) 2008-08-28

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