SG126732A1 - Lithographic apparatus and device manufacturing method - Google Patents
Lithographic apparatus and device manufacturing methodInfo
- Publication number
- SG126732A1 SG126732A1 SG200305710A SG200305710A SG126732A1 SG 126732 A1 SG126732 A1 SG 126732A1 SG 200305710 A SG200305710 A SG 200305710A SG 200305710 A SG200305710 A SG 200305710A SG 126732 A1 SG126732 A1 SG 126732A1
- Authority
- SG
- Singapore
- Prior art keywords
- device manufacturing
- lithographic apparatus
- base frame
- supporting elements
- balance mass
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70766—Reaction force control means, e.g. countermass
Landscapes
- General Physics & Mathematics (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Atmospheric Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Toxicology (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Vibration Prevention Devices (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP02256793 | 2002-09-30 |
Publications (1)
Publication Number | Publication Date |
---|---|
SG126732A1 true SG126732A1 (en) | 2006-11-29 |
Family
ID=32842680
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
SG200305710A SG126732A1 (en) | 2002-09-30 | 2003-09-26 | Lithographic apparatus and device manufacturing method |
Country Status (6)
Country | Link |
---|---|
US (2) | US7239369B2 (ja) |
JP (2) | JP3895319B2 (ja) |
KR (1) | KR100573665B1 (ja) |
CN (1) | CN100421024C (ja) |
SG (1) | SG126732A1 (ja) |
TW (1) | TWI250387B (ja) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6947125B2 (en) * | 2003-08-27 | 2005-09-20 | Asml Holding N.V. | Bearing arrangement for reaction mass in a controlled environment |
US7075623B2 (en) * | 2003-11-17 | 2006-07-11 | Asml Holding N.V. | Flexure-supported split reaction mass |
US7609385B2 (en) * | 2005-08-18 | 2009-10-27 | Alcatel-Lucent Usa Inc. | Method and apparatus for characterization of the response of optical devices |
US8102505B2 (en) * | 2007-03-20 | 2012-01-24 | Asml Netherlands B.V. | Lithographic apparatus comprising a vibration isolation support device |
US8044373B2 (en) * | 2007-06-14 | 2011-10-25 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US8144310B2 (en) * | 2008-04-14 | 2012-03-27 | Asml Netherlands B.V. | Positioning system, lithographic apparatus and device manufacturing method |
GB0808524D0 (en) * | 2008-05-12 | 2008-06-18 | Magnomatics Ltd | Magnetic pole-piece structure |
US8441615B2 (en) * | 2008-09-04 | 2013-05-14 | Nikon Corporation | System for isolating an exposure apparatus |
WO2013036116A1 (en) * | 2011-09-09 | 2013-03-14 | Mapper Lithography Ip B.V. | Support structure for wafer table |
CN103858057A (zh) | 2011-09-09 | 2014-06-11 | 迈普尔平版印刷Ip有限公司 | 振动隔绝模块和基板处理系统 |
WO2013039387A1 (en) * | 2011-09-12 | 2013-03-21 | Mapper Lithography Ip B.V. | Guidance for target processing tool |
US9370865B1 (en) * | 2012-05-23 | 2016-06-21 | Western Digital Technologies, Inc. | Flexure based compliance device for use with an assembly device |
US9733027B2 (en) * | 2012-08-16 | 2017-08-15 | Minus K. Technology, Inc. | Thermal straps for spacecraft |
DE102012220925A1 (de) * | 2012-11-15 | 2013-11-14 | Carl Zeiss Smt Gmbh | Dämpfungsanordnung zur Dissipation von Schwingungsenergie eines Elementes in einem System, insbesondere in einer mikrolithographischen Projektionsbelichtungsanlage |
US10077865B2 (en) * | 2014-06-05 | 2018-09-18 | The Regents Of The University Of Michigan | Magnet assisted stage for vibration and heat reduction in wafer scanning |
WO2017089085A1 (en) | 2015-11-23 | 2017-06-01 | Asml Netherlands B.V. | Vibration isolation device, lithographic apparatus and method to tune a vibration isolation device |
KR20180094032A (ko) * | 2015-12-15 | 2018-08-22 | 칼 짜이스 에스엠테 게엠베하 | 리소그래피 장치용 광학 디바이스 및 리소그래피 장치 |
EP3670958A1 (en) * | 2018-12-21 | 2020-06-24 | ASML Netherlands B.V. | Positioning device, stiffness reduction device and electron beam apparatus |
US11454992B1 (en) * | 2019-05-24 | 2022-09-27 | Meta Platforms Technologies, Llc | Flexure guidance system |
EP4020086A1 (en) * | 2020-12-28 | 2022-06-29 | ASML Netherlands B.V. | A metrology apparatus and a metrology method |
Family Cites Families (25)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US12108A (en) * | 1854-12-19 | Improvement in life-preserving seats | ||
US6762A (en) * | 1849-10-02 | Mode of operating brakes for cars | ||
JPS63153819A (ja) | 1986-12-18 | 1988-06-27 | Canon Inc | 露光装置のステ−ジ搭載機構 |
JPH0543439Y2 (ja) | 1987-09-03 | 1993-11-01 | ||
US5523193A (en) * | 1988-05-31 | 1996-06-04 | Texas Instruments Incorporated | Method and apparatus for patterning and imaging member |
EP0527166B1 (de) * | 1990-05-02 | 1995-06-14 | Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. | Belichtungsvorrichtung |
US5229872A (en) * | 1992-01-21 | 1993-07-20 | Hughes Aircraft Company | Exposure device including an electrically aligned electronic mask for micropatterning |
JP3255707B2 (ja) | 1992-06-02 | 2002-02-12 | 日立建機株式会社 | 微細位置決め装置 |
WO1997033205A1 (en) * | 1996-03-06 | 1997-09-12 | Philips Electronics N.V. | Differential interferometer system and lithographic step-and-scan apparatus provided with such a system |
DE69717975T2 (de) * | 1996-12-24 | 2003-05-28 | Asml Netherlands Bv | In zwei richtungen ausgewogenes positioniergerät, sowie lithographisches gerät mit einem solchen positioniergerät |
ATE216091T1 (de) | 1997-01-29 | 2002-04-15 | Micronic Laser Systems Ab | Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl |
SE509062C2 (sv) | 1997-02-28 | 1998-11-30 | Micronic Laser Systems Ab | Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster |
US6262796B1 (en) | 1997-03-10 | 2001-07-17 | Asm Lithography B.V. | Positioning device having two object holders |
JPH11315883A (ja) * | 1998-04-30 | 1999-11-16 | Canon Inc | 除振装置、露光装置およびデバイス製造方法 |
EP1111469B1 (en) | 1999-12-21 | 2007-10-17 | ASML Netherlands B.V. | Lithographic apparatus with a balanced positioning system |
TWI264617B (en) * | 1999-12-21 | 2006-10-21 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
TW546551B (en) * | 1999-12-21 | 2003-08-11 | Asml Netherlands Bv | Balanced positioning system for use in lithographic apparatus |
EP1111470B1 (en) | 1999-12-21 | 2007-03-07 | ASML Netherlands B.V. | Lithographic apparatus with a balanced positioning system |
TW509823B (en) | 2000-04-17 | 2002-11-11 | Asml Netherlands Bv | Lithographic apparatus, device manufacturing method, and device manufactured thereby |
JP2002022868A (ja) | 2000-07-07 | 2002-01-23 | Sumitomo Heavy Ind Ltd | X−yステージの可動テーブルの支持構造 |
US6476402B1 (en) * | 2000-07-19 | 2002-11-05 | Samsung Electronics Co., Ltd. | Apparatus for pyroelectric emission lithography using patterned emitter |
US6499936B2 (en) * | 2001-02-17 | 2002-12-31 | Yokogawa Electric Corporation | Transfer system |
US20030202865A1 (en) * | 2002-04-25 | 2003-10-30 | Applied Materials, Inc. | Substrate transfer apparatus |
JP3947501B2 (ja) | 2002-06-07 | 2007-07-25 | エーエスエムエル ネザーランズ ビー.ブイ. | リソグラフィ用機器およびデバイスの製造方法 |
EP1369745B1 (en) | 2002-06-07 | 2013-02-27 | ASML Netherlands B.V. | Lihographic apparatus and device manufaturing method |
-
2003
- 2003-09-26 CN CNB031648606A patent/CN100421024C/zh not_active Expired - Fee Related
- 2003-09-26 US US10/670,791 patent/US7239369B2/en not_active Expired - Lifetime
- 2003-09-26 JP JP2003373440A patent/JP3895319B2/ja not_active Expired - Fee Related
- 2003-09-26 SG SG200305710A patent/SG126732A1/en unknown
- 2003-09-26 TW TW092126652A patent/TWI250387B/zh not_active IP Right Cessation
- 2003-09-26 KR KR1020030066981A patent/KR100573665B1/ko not_active IP Right Cessation
-
2006
- 2006-11-06 US US11/593,022 patent/US7417711B2/en not_active Expired - Lifetime
- 2006-11-06 JP JP2006300304A patent/JP2007040537A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
KR20040030315A (ko) | 2004-04-09 |
TWI250387B (en) | 2006-03-01 |
CN100421024C (zh) | 2008-09-24 |
JP3895319B2 (ja) | 2007-03-22 |
US7417711B2 (en) | 2008-08-26 |
KR100573665B1 (ko) | 2006-04-24 |
TW200410053A (en) | 2004-06-16 |
US7239369B2 (en) | 2007-07-03 |
US20070052944A1 (en) | 2007-03-08 |
CN1497319A (zh) | 2004-05-19 |
JP2004289115A (ja) | 2004-10-14 |
US20040160585A1 (en) | 2004-08-19 |
JP2007040537A (ja) | 2007-02-15 |
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