SG122929A1 - Substrate table, method of measuring a position ofa substrate and a lithographic apparatus - Google Patents

Substrate table, method of measuring a position ofa substrate and a lithographic apparatus

Info

Publication number
SG122929A1
SG122929A1 SG200507500A SG200507500A SG122929A1 SG 122929 A1 SG122929 A1 SG 122929A1 SG 200507500 A SG200507500 A SG 200507500A SG 200507500 A SG200507500 A SG 200507500A SG 122929 A1 SG122929 A1 SG 122929A1
Authority
SG
Singapore
Prior art keywords
substrate
measuring
lithographic apparatus
position ofa
substrate table
Prior art date
Application number
SG200507500A
Other languages
English (en)
Inventor
Van Henricus Wilhelmus Ma Buel
Franciscus Godefridus C Bijnen
Jacobus Burghoorn
Hoite Pieter Theodoor Tolsma
Ten Peter Berge
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of SG122929A1 publication Critical patent/SG122929A1/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088—Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7003—Alignment type or strategy, e.g. leveling, global alignment
    • G03F9/7007—Alignment other than original with workpiece
    • G03F9/7011—Pre-exposure scan; original with original holder alignment; Prealignment, i.e. workpiece with workpiece holder
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7073—Alignment marks and their environment
    • G03F9/7084—Position of mark on substrate, i.e. position in (x, y, z) of mark, e.g. buried or resist covered mark, mark on rearside, at the substrate edge, in the circuit area, latent image mark, marks in plural levels

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Multimedia (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
SG200507500A 2004-11-29 2005-11-25 Substrate table, method of measuring a position ofa substrate and a lithographic apparatus SG122929A1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US10/998,180 US7251018B2 (en) 2004-11-29 2004-11-29 Substrate table, method of measuring a position of a substrate and a lithographic apparatus

Publications (1)

Publication Number Publication Date
SG122929A1 true SG122929A1 (en) 2006-06-29

Family

ID=35966026

Family Applications (1)

Application Number Title Priority Date Filing Date
SG200507500A SG122929A1 (en) 2004-11-29 2005-11-25 Substrate table, method of measuring a position ofa substrate and a lithographic apparatus

Country Status (7)

Country Link
US (1) US7251018B2 (fr)
EP (1) EP1662327A3 (fr)
JP (1) JP2006157013A (fr)
KR (1) KR100734589B1 (fr)
CN (1) CN1782884A (fr)
SG (1) SG122929A1 (fr)
TW (1) TW200630759A (fr)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050118532A1 (en) * 2003-11-14 2005-06-02 International Business Machines Corporation Back to Front Alignment with Latent Imaging
US7442476B2 (en) * 2004-12-27 2008-10-28 Asml Netherlands B.V. Method and system for 3D alignment in wafer scale integration
US20060267231A1 (en) * 2005-05-27 2006-11-30 Asml Netherlands B.V. Imprint lithography
US7611960B2 (en) * 2006-04-24 2009-11-03 Taiwan Semiconductor Manufacturing Company, Ltd. Method and system for wafer backside alignment
US7683351B2 (en) * 2006-12-01 2010-03-23 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE102007043896A1 (de) * 2007-09-14 2009-04-02 Carl Zeiss Smt Ag Mikrooptik zur Messung der Position eines Luftbildes
JP2010245123A (ja) * 2009-04-01 2010-10-28 Mitsuboshi Diamond Industrial Co Ltd 透過照明付きテーブル
CN102483576A (zh) 2009-09-08 2012-05-30 卡尔蔡司Smt有限责任公司 低表面外形变形的光学元件
US8846494B2 (en) 2011-07-07 2014-09-30 Aptina Imaging Corporation Alignment marks and alignment methods for aligning backside components to frontside components in integrated circuits
US9207549B2 (en) 2011-12-29 2015-12-08 Nikon Corporation Exposure apparatus and exposure method, and device manufacturing method with encoder of higher reliability for position measurement
US10770327B2 (en) 2017-07-28 2020-09-08 Taiwan Semiconductor Manufacturing Co., Ltd. System and method for correcting non-ideal wafer topography
US10585360B2 (en) * 2017-08-25 2020-03-10 Applied Materials, Inc. Exposure system alignment and calibration method

Family Cites Families (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4596467A (en) 1984-03-16 1986-06-24 Hughes Aircraft Company Dissimilar superimposed grating precision alignment and gap measurement systems
EP0355496A3 (fr) * 1988-08-15 1990-10-10 Sumitomo Heavy Industries Co., Ltd. Détecteur de position utilisant une plaque de zones fresnel sectorielle
JPH03154803A (ja) * 1989-11-13 1991-07-02 Tosoh Corp 位置合わせ方法
JPH07183187A (ja) * 1993-12-22 1995-07-21 Nikon Corp アライメント装置
JPH07297115A (ja) * 1994-04-28 1995-11-10 Ushio Inc マスクとワークの位置合わせ方法および装置
US5808742A (en) 1995-05-31 1998-09-15 Massachusetts Institute Of Technology Optical alignment apparatus having multiple parallel alignment marks
KR0174486B1 (ko) * 1995-09-28 1999-02-01 이해규 노광 장비에서 시시디 카메라를 이용한 정렬 장치
JP3428829B2 (ja) 1996-08-27 2003-07-22 キヤノン株式会社 位置合わせ方法及びそれを用いた投影露光装置
US5929997A (en) 1997-07-02 1999-07-27 Winbond Electronics Corp. Alignment-mark measurements on the backside of a wafer for synchronous wafer alignment
US6376329B1 (en) 1997-08-04 2002-04-23 Nikon Corporation Semiconductor wafer alignment using backside illumination
US5985764A (en) 1997-12-22 1999-11-16 Taiwan Semiconductor Manufacturing Company, Ltd. Layer independent alignment system
US6768539B2 (en) * 2001-01-15 2004-07-27 Asml Netherlands B.V. Lithographic apparatus
US6525805B2 (en) 2001-05-14 2003-02-25 Ultratech Stepper, Inc. Backside alignment system and method
TW594431B (en) * 2002-03-01 2004-06-21 Asml Netherlands Bv Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
EP1341046A3 (fr) 2002-03-01 2004-12-15 ASML Netherlands B.V. Méthodes de calibration, substrats de calibration, appareil lithographique et méthodes pour la fabrication de dispositifs
SG124270A1 (en) 2002-12-16 2006-08-30 Asml Netherlands Bv Lithographic apparatus with alignment subsystem, device manufacturing method using alignment, and alignment structure
US7288779B2 (en) 2003-12-17 2007-10-30 Asml Netherlands B.V. Method for position determination, method for overlay optimization, and lithographic projection apparatus
US7292339B2 (en) 2004-07-09 2007-11-06 Asml Netherlands B.V. Alignment method and apparatus, lithographic apparatus, device manufacturing method, and alignment tool

Also Published As

Publication number Publication date
US7251018B2 (en) 2007-07-31
EP1662327A3 (fr) 2006-09-13
CN1782884A (zh) 2006-06-07
JP2006157013A (ja) 2006-06-15
TW200630759A (en) 2006-09-01
KR20060059834A (ko) 2006-06-02
US20060114442A1 (en) 2006-06-01
EP1662327A2 (fr) 2006-05-31
KR100734589B1 (ko) 2007-07-02

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